DE69715380D1 - Gerät zur Belichtung mittels geladenem Teilchenstrahl mit einer Trägertisch-Positionsmesseinrichtung - Google Patents

Gerät zur Belichtung mittels geladenem Teilchenstrahl mit einer Trägertisch-Positionsmesseinrichtung

Info

Publication number
DE69715380D1
DE69715380D1 DE69715380T DE69715380T DE69715380D1 DE 69715380 D1 DE69715380 D1 DE 69715380D1 DE 69715380 T DE69715380 T DE 69715380T DE 69715380 T DE69715380 T DE 69715380T DE 69715380 D1 DE69715380 D1 DE 69715380D1
Authority
DE
Germany
Prior art keywords
exposure
charged particle
particle beam
position measuring
table position
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69715380T
Other languages
English (en)
Other versions
DE69715380T2 (de
Inventor
Kenichi Kawakami
Tatsuro Ohkawa
Kazushi Ishida
Akiyoshi Tsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Fujitsu Ltd
Original Assignee
Advantest Corp
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp, Fujitsu Ltd filed Critical Advantest Corp
Application granted granted Critical
Publication of DE69715380D1 publication Critical patent/DE69715380D1/de
Publication of DE69715380T2 publication Critical patent/DE69715380T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H01J37/3045—Object or beam position registration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
DE69715380T 1997-04-10 1997-10-16 Gerät zur Belichtung mittels geladenem Teilchenstrahl mit einer Trägertisch-Positionsmesseinrichtung Expired - Fee Related DE69715380T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09224797A JP3678533B2 (ja) 1997-04-10 1997-04-10 荷電粒子ビーム露光装置

Publications (2)

Publication Number Publication Date
DE69715380D1 true DE69715380D1 (de) 2002-10-17
DE69715380T2 DE69715380T2 (de) 2003-02-13

Family

ID=14049106

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69715380T Expired - Fee Related DE69715380T2 (de) 1997-04-10 1997-10-16 Gerät zur Belichtung mittels geladenem Teilchenstrahl mit einer Trägertisch-Positionsmesseinrichtung

Country Status (6)

Country Link
US (1) US5966200A (de)
EP (1) EP0878822B1 (de)
JP (1) JP3678533B2 (de)
KR (1) KR100281848B1 (de)
DE (1) DE69715380T2 (de)
TW (1) TW367559B (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11307445A (ja) * 1998-04-23 1999-11-05 Nikon Corp 荷電粒子線露光装置及びその投影マスク
EP2027966B1 (de) * 2007-08-20 2010-04-21 Soonhan Engineering Corp. Probensteg mit flexiblem Mechanismusmodul zur Aufnahme der Gleitdeformation
KR100973530B1 (ko) * 2007-08-20 2010-08-02 순환엔지니어링 주식회사 슬라이드변형흡수용 유연기구모듈을 이용한 시편이송장치
JP2015211119A (ja) 2014-04-25 2015-11-24 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置
CN109490307B (zh) * 2019-01-24 2023-11-03 沈阳工程学院 基于小孔成像测量金属线胀系数的装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4063103A (en) * 1975-04-11 1977-12-13 Tokyo Shibaura Electric Co., Ltd. Electron beam exposure apparatus
JPS5398781A (en) * 1976-11-25 1978-08-29 Jeol Ltd Electron ray exposure unit
JPS5754319A (ja) * 1980-09-18 1982-03-31 Fujitsu Ltd Denshibiimurokosochi
JPS57162431A (en) * 1981-03-31 1982-10-06 Jeol Ltd Method for exposure to electron beam
US4642438A (en) * 1984-11-19 1987-02-10 International Business Machines Corporation Workpiece mounting and clamping system having submicron positioning repeatability
JPS62272722A (ja) * 1986-05-21 1987-11-26 Clarion Co Ltd Ｔｔｌ論理レベルｃｍｏｓ入力バツフア
JPS62273722A (ja) * 1986-05-21 1987-11-27 Nec Corp 電子ビ−ム露光装置
US4891526A (en) * 1986-12-29 1990-01-02 Hughes Aircraft Company X-Y-θ-Z positioning stage
JPH0785112B2 (ja) * 1987-02-16 1995-09-13 キヤノン株式会社 ステージ装置
US4943730A (en) * 1988-09-19 1990-07-24 Jeol Ltd. Charged particle beam lithography method
JPH0513037A (ja) * 1991-07-02 1993-01-22 Fujitsu Ltd 荷電粒子ビーム装置及びその制御方法
US5325180A (en) * 1992-12-31 1994-06-28 International Business Machines Corporation Apparatus for identifying and distinguishing temperature and system induced measuring errors
US5786601A (en) * 1994-06-28 1998-07-28 Leica Lithography Systems Ltd. Electron beam lithography machine
JPH09223475A (ja) * 1996-02-19 1997-08-26 Nikon Corp 電磁偏向器、及び該偏向器を用いた荷電粒子線転写装置

Also Published As

Publication number Publication date
EP0878822B1 (de) 2002-09-11
KR19980079602A (ko) 1998-11-25
DE69715380T2 (de) 2003-02-13
US5966200A (en) 1999-10-12
TW367559B (en) 1999-08-21
JP3678533B2 (ja) 2005-08-03
JPH10284361A (ja) 1998-10-23
EP0878822A1 (de) 1998-11-18
KR100281848B1 (ko) 2001-04-02

Similar Documents

Publication Publication Date Title
DE69221665T2 (de) Verfahren zur Ermittlung einer Belichtung
DE69129260T2 (de) Gerät zur Messung der Teilchengrössenverteilung
DE69028592D1 (de) Gerät zur automatischen Generierung eines Index
DE69330425T2 (de) Geraet zur fuehrung gestreuten lichtes
DE68923941D1 (de) Verfahren und Gerät zur Messung der Eigenschaften einer Substanz mittels Lichtstreuung.
DE69227343T2 (de) Vorrichtung zur Kontrolle einer Entwicklerlösung
DE69133108D1 (de) Apparat zur dreidimensionalen Messung
DE68918144T2 (de) System zur Belichtung mittels geladener Teilchenstrahlen.
DE59302704D1 (de) Vorrichtung zur messung eines massestromes
DE69518967T2 (de) Vorrichtung zur Ortung eines sich bewegenden Körpers mit Antwortgeber
DE69130826D1 (de) Vorrichtung zur ermittlung der scharfstellungsposition
DE68920187D1 (de) Apparat zur Messung der an einer Strahlungsquelle angelegten Spitzenspannung.
DE69828765D1 (de) Vorrichtung zur Messung der optischen Dichte
DE69715380T2 (de) Gerät zur Belichtung mittels geladenem Teilchenstrahl mit einer Trägertisch-Positionsmesseinrichtung
DE69718526T2 (de) Vorrichtung zur Ermittlung der Position eines sich bewegenden Körpers
DE69123711T2 (de) Gerät zur Detektion der Position eines Lichtpunktes
DE69716797T2 (de) Gerät zur Messung der Lebensdauer einer Komponente eines Bilderzeugungsgerätes
DE69633037D1 (de) Elektronische Vorrichtung mit einer mittels Schwingungen ausgeführten Informationsfunktion
FI953088A (fi) Laite sähkökemiallisen vertalähteen varauksen mittaamiseksi
DE69228500T2 (de) Vorrichtung zur Messung einer Nullvoltphase
DE69027514T2 (de) Optisches Gerät zur Detektion der Modulation eines Lichtstrahls
DE59401961D1 (de) Einrichtung zur abrechnung der nutzung gebührenpflichtiger wegstrecken
DE69721419D1 (de) Gerät zur optischen differentiellen Messung des Gleitabstandes über einer magnetischen Platte
DE9406166U1 (de) Vorrichtung zur Halterung der Bremsbelagträger einer Scheibenbremse
NO173223C (no) Utsetningsanordning for frittfallbaat

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee