DE69718295T2 - Reversible und irreversible uberzugszusammensetzungen auf wasserbasis - Google Patents
Reversible und irreversible uberzugszusammensetzungen auf wasserbasisInfo
- Publication number
- DE69718295T2 DE69718295T2 DE69718295T DE69718295T DE69718295T2 DE 69718295 T2 DE69718295 T2 DE 69718295T2 DE 69718295 T DE69718295 T DE 69718295T DE 69718295 T DE69718295 T DE 69718295T DE 69718295 T2 DE69718295 T2 DE 69718295T2
- Authority
- DE
- Germany
- Prior art keywords
- reversible
- coating compositions
- based coating
- irreversible water
- irreversible
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/44—Preparation of metal salts or ammonium salts
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/12—Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/22—Esters containing halogen
- C08F220/24—Esters containing halogen containing perhaloalkyl radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
- C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/52—Amides or imides
- C08F220/54—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide
- C08F220/60—Amides, e.g. N,N-dimethylacrylamide or N-isopropylacrylamide containing nitrogen in addition to the carbonamido nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/606,179 US5674934A (en) | 1996-02-23 | 1996-02-23 | Reversible and irreversible water-based coatings |
PCT/US1997/000726 WO1997031042A1 (en) | 1996-02-23 | 1997-01-14 | Reversible and irreversible water-based coatings |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69718295D1 DE69718295D1 (de) | 2003-02-13 |
DE69718295T2 true DE69718295T2 (de) | 2003-09-04 |
Family
ID=24426901
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69718295T Expired - Fee Related DE69718295T2 (de) | 1996-02-23 | 1997-01-14 | Reversible und irreversible uberzugszusammensetzungen auf wasserbasis |
Country Status (10)
Country | Link |
---|---|
US (1) | US5674934A (de) |
EP (1) | EP0882079B1 (de) |
JP (1) | JP2000505128A (de) |
KR (1) | KR19990087256A (de) |
AR (1) | AR005968A1 (de) |
AU (1) | AU1701897A (de) |
CA (1) | CA2245782A1 (de) |
DE (1) | DE69718295T2 (de) |
ID (1) | ID19486A (de) |
WO (1) | WO1997031042A1 (de) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6197844B1 (en) * | 1996-09-13 | 2001-03-06 | 3M Innovative Properties Company | Floor finish compositions |
US5910532A (en) * | 1997-05-29 | 1999-06-08 | The Dow Chemical Company | Multisolvent-based film-forming compositions |
US5990238A (en) * | 1997-09-19 | 1999-11-23 | 3M Innovative Properties Company | Release coating for adhesive articles and method |
US5914299A (en) * | 1997-09-19 | 1999-06-22 | Minnesota Mining And Manufacturing Company | Abrasive articles including a polymeric additive |
US6025404A (en) * | 1998-02-20 | 2000-02-15 | The Dow Chemical Company | Rapid set latexes and foamed articles prepared therefrom |
US6326447B1 (en) | 1998-06-19 | 2001-12-04 | E. I. Du Pont De Nemours And Company | Polymeric compositions for soil release on fabrics |
US6191211B1 (en) | 1998-09-11 | 2001-02-20 | The Dow Chemical Company | Quick-set film-forming compositions |
US6165308A (en) * | 1998-11-06 | 2000-12-26 | Lilly Industries, Inc. | In-press process for coating composite substrates |
US6297337B1 (en) * | 1999-05-19 | 2001-10-02 | Pmd Holdings Corp. | Bioadhesive polymer compositions |
US6271289B1 (en) | 1999-11-16 | 2001-08-07 | E. I. Du Pont De Nemours And Company | Stain resistant compositions |
EP1282493B1 (de) * | 2000-04-20 | 2010-11-24 | Masonite Corporation | Umgekehrtes geformtes paneel |
US7021015B2 (en) | 2000-04-20 | 2006-04-04 | Masonite Corporation | Reverse molded plant-on panel component, method of manufacture, and method of decorating a door therewith |
US20020150732A1 (en) * | 2001-02-09 | 2002-10-17 | Manisha Sarkar | Image receptor sheet containing vinylpyridine copolymer |
DE10214578B4 (de) | 2001-04-03 | 2009-06-04 | Nippon Shokubai Co. Ltd. | Vernetzbare Harzzusammensetzung |
US6994745B2 (en) * | 2001-04-05 | 2006-02-07 | Kansai Paint Co., Ltd. | Pigment dispersing resin |
AU2003250076B2 (en) * | 2002-08-09 | 2009-02-19 | Akzo Nobel Coatings International B.V. | Acid-capped quaternised polymer and compositions comprising such polymer |
US20050053797A1 (en) * | 2003-06-27 | 2005-03-10 | Rumph Scott W. | Systems and methods for manufacturing, treating, and selling raw building materials |
US8263670B2 (en) * | 2007-08-06 | 2012-09-11 | E.I. Du Pont De Nemours And Company | Mixed fluoroalkyl-alkyl surfactants |
ES2592689T3 (es) * | 2010-09-29 | 2016-12-01 | Fujifilm Corporation | Aparato de ósmosis directa y proceso de ósmosis directa |
MX2012007272A (es) | 2012-06-21 | 2013-12-23 | Mexicano Inst Petrol | Procedimiento de sintesis de una resina polimerica base agua podapa con nanotubos de dioxido de titanio con aplicacion como recubrimiento anticorrosivo. |
EP2945994B1 (de) | 2013-01-18 | 2018-07-11 | Basf Se | Beschichtungszusammensetzungen auf basis von acryldispersionen |
DE102014207517A1 (de) * | 2013-04-21 | 2014-12-04 | Wieland Kg | Korrosions-Inhibitoren, verbesserte Farbe und korrosionsschützende Beschichtung |
WO2017218742A1 (en) * | 2016-06-16 | 2017-12-21 | Sun Chemical Corporation | Stabilized carbonic acid method for solvation of cationic & amphoteric compounds |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3947396A (en) * | 1972-04-28 | 1976-03-30 | The Dow Chemical Company | Coacervation of anion-containing aqueous disperse systems with amphoteric polyelectrolytes |
AU3747378A (en) * | 1977-06-27 | 1980-02-21 | Univ Melbourne | Amphoteric latices |
US4544723A (en) * | 1982-07-23 | 1985-10-01 | Eastman Kodak Company | Vinyl acetate polymers and latex compositions containing same |
US4582663A (en) * | 1983-11-21 | 1986-04-15 | The Dow Chemical Company | Amphoteric latexes containing pH independent and pH dependent bound charges |
US4544697A (en) * | 1983-11-21 | 1985-10-01 | The Dow Chemical Company | Amphoteric latexes containing pH independent and pH dependent bound charges |
JPS6172071A (ja) * | 1984-09-17 | 1986-04-14 | Yuuhoo Chem Kk | 被覆剤組成物 |
CA1262798A (en) * | 1984-11-23 | 1989-11-07 | William I. Harris | Method for preparation of anion exchange resins having very low chlorine content |
US4704324A (en) * | 1985-04-03 | 1987-11-03 | The Dow Chemical Company | Semi-permeable membranes prepared via reaction of cationic groups with nucleophilic groups |
DE3609829A1 (de) * | 1986-03-22 | 1987-09-24 | Basf Ag | Verfahren zur herstellung von pulverfoermigen vernetzten copolymerisaten |
US4929666A (en) * | 1987-05-14 | 1990-05-29 | The Dow Chemical Company | Fluorocarbon containing, reactive polymeric surfactants and coating compositions therefrom |
US4859384A (en) * | 1987-11-18 | 1989-08-22 | Filmtec Corp. | Novel polyamide reverse osmosis membranes |
US5310581A (en) * | 1989-12-29 | 1994-05-10 | The Dow Chemical Company | Photocurable compositions |
-
1996
- 1996-02-23 US US08/606,179 patent/US5674934A/en not_active Expired - Lifetime
-
1997
- 1997-01-14 KR KR1019980706657A patent/KR19990087256A/ko active IP Right Grant
- 1997-01-14 WO PCT/US1997/000726 patent/WO1997031042A1/en active IP Right Grant
- 1997-01-14 EP EP97902972A patent/EP0882079B1/de not_active Expired - Lifetime
- 1997-01-14 JP JP9530148A patent/JP2000505128A/ja active Pending
- 1997-01-14 CA CA002245782A patent/CA2245782A1/en not_active Abandoned
- 1997-01-14 DE DE69718295T patent/DE69718295T2/de not_active Expired - Fee Related
- 1997-01-14 AU AU17018/97A patent/AU1701897A/en not_active Abandoned
- 1997-02-21 AR ARP970100725A patent/AR005968A1/es unknown
- 1997-02-24 ID IDP970547A patent/ID19486A/id unknown
Also Published As
Publication number | Publication date |
---|---|
JP2000505128A (ja) | 2000-04-25 |
EP0882079A1 (de) | 1998-12-09 |
DE69718295D1 (de) | 2003-02-13 |
ID19486A (id) | 1998-07-16 |
KR19990087256A (ko) | 1999-12-15 |
AU1701897A (en) | 1997-09-10 |
CA2245782A1 (en) | 1997-08-28 |
WO1997031042A1 (en) | 1997-08-28 |
EP0882079B1 (de) | 2003-01-08 |
AR005968A1 (es) | 1999-07-21 |
US5674934A (en) | 1997-10-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |