DE69719150T2 - Strahlungsempfindliche Harzzusammensetzung - Google Patents

Strahlungsempfindliche Harzzusammensetzung

Info

Publication number
DE69719150T2
DE69719150T2 DE69719150T DE69719150T DE69719150T2 DE 69719150 T2 DE69719150 T2 DE 69719150T2 DE 69719150 T DE69719150 T DE 69719150T DE 69719150 T DE69719150 T DE 69719150T DE 69719150 T2 DE69719150 T2 DE 69719150T2
Authority
DE
Germany
Prior art keywords
resin composition
sensitive resin
radiation sensitive
radiation
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69719150T
Other languages
English (en)
Other versions
DE69719150D1 (de
Inventor
Takayoshi Tanabe
Eiichi Kobayashi
Makoto Shimizu
Shin-Ichiro Iwanaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Application granted granted Critical
Publication of DE69719150D1 publication Critical patent/DE69719150D1/de
Publication of DE69719150T2 publication Critical patent/DE69719150T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
DE69719150T 1996-11-14 1997-11-14 Strahlungsempfindliche Harzzusammensetzung Expired - Lifetime DE69719150T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31688896A JP3695024B2 (ja) 1996-11-14 1996-11-14 半導体デバイス製造用感放射線性樹脂組成物

Publications (2)

Publication Number Publication Date
DE69719150D1 DE69719150D1 (de) 2003-03-27
DE69719150T2 true DE69719150T2 (de) 2003-07-10

Family

ID=18082032

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69719150T Expired - Lifetime DE69719150T2 (de) 1996-11-14 1997-11-14 Strahlungsempfindliche Harzzusammensetzung

Country Status (5)

Country Link
US (1) US5994022A (de)
EP (1) EP0843220B1 (de)
JP (1) JP3695024B2 (de)
KR (1) KR100524561B1 (de)
DE (1) DE69719150T2 (de)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3645365B2 (ja) * 1996-08-15 2005-05-11 富士写真フイルム株式会社 遠紫外線露光用感光性樹脂組成物
JP3985359B2 (ja) * 1998-09-18 2007-10-03 住友化学株式会社 レジスト組成物
US6140015A (en) * 1998-12-10 2000-10-31 International Business Machines Corporation Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching
US6852466B2 (en) 1998-12-23 2005-02-08 Shipley Company, L.L.C. Photoresist compositions particularly suitable for short wavelength imaging
JP3931484B2 (ja) * 1999-06-03 2007-06-13 住友化学株式会社 ポジ型フォトレジスト組成物
KR100533364B1 (ko) * 1999-11-02 2005-12-06 주식회사 하이닉스반도체 레지스트 플로우 공정용 포토레지스트 조성물 및 이를이용한 콘택홀의 형성방법
JP2001290275A (ja) * 2000-02-03 2001-10-19 Fuji Photo Film Co Ltd ポジ型フォトレジスト組成物
US20030022097A1 (en) * 2000-05-05 2003-01-30 Arch Specialty Chemicals, Inc Tertiary-butyl acrylate polymers and their use in photoresist compositions
EP1182506B1 (de) * 2000-08-21 2010-10-27 Tokyo Ohka Kogyo Co., Ltd. Vernetzte, positiv arbeitende Photoresist-Zusammensetzung
US6645695B2 (en) 2000-09-11 2003-11-11 Shipley Company, L.L.C. Photoresist composition
JP3901997B2 (ja) * 2001-11-27 2007-04-04 富士通株式会社 レジスト材料、レジストパターン及びその製造方法、並びに、半導体装置及びその製造方法
TW200401164A (en) * 2002-03-01 2004-01-16 Shipley Co Llc Photoresist compositions
KR20030076093A (ko) * 2002-03-22 2003-09-26 크린크리에티브 주식회사 감광성 수지 제거용 조성물
CN1527136B (zh) * 2003-03-05 2014-02-26 希普利公司 光致抗蚀剂组合物
WO2005100412A1 (ja) * 2004-04-13 2005-10-27 Tokyo Ohka Kogyo Co., Ltd. 高分子化合物、該高分子化合物を含有するフォトレジスト組成物、およびレジストパターン形成方法
JP2006003861A (ja) * 2004-05-19 2006-01-05 Mitsui Chemicals Inc ポジ型感光性レジスト組成物およびその製造方法
KR100596364B1 (ko) * 2004-05-31 2006-07-03 주식회사 엘지화학 감광성 수지 조성물 및 이를 이용하여 제조된 액정표시소자
US7700659B2 (en) 2005-03-24 2010-04-20 Advanced Cardiovascular Systems, Inc. Implantable devices formed of non-fouling methacrylate or acrylate polymers
US9381279B2 (en) 2005-03-24 2016-07-05 Abbott Cardiovascular Systems Inc. Implantable devices formed on non-fouling methacrylate or acrylate polymers
JP4953717B2 (ja) * 2006-05-19 2012-06-13 リンテック株式会社 光学機能性フィルム貼合用粘着剤、光学機能性フィルム及びその製造方法
US7923200B2 (en) * 2007-04-09 2011-04-12 Az Electronic Materials Usa Corp. Composition for coating over a photoresist pattern comprising a lactam
JP5069494B2 (ja) * 2007-05-01 2012-11-07 ＡｚエレクトロニックマテリアルズＩｐ株式会社 微細化パターン形成用水溶性樹脂組成物およびこれを用いた微細パターン形成方法
EP2177952A4 (de) * 2007-08-10 2011-05-04 Fujifilm Corp Positiv arbeitende resistzusammensetzung und strukturbildungsverfahren mit der positiv arbeitenden resistzusammensetzung
KR20090076754A (ko) * 2008-01-08 2009-07-13 주식회사 엘지화학 광학 필름, 위상차 필름, 보호 필름 및 이들을 포함하는액정 표시 장치
KR20090076753A (ko) * 2008-01-08 2009-07-13 주식회사 엘지화학 투명한 수지 조성물
JP5216573B2 (ja) * 2008-03-31 2013-06-19 富士フイルム株式会社 感活性光線または感放射線性樹脂組成物及びそれを用いたパターン形成方法
US8613986B2 (en) 2008-04-30 2013-12-24 Lg Chem, Ltd. Optical film and information technology apparatus comprising the same
KR101105424B1 (ko) * 2008-04-30 2012-01-17 주식회사 엘지화학 수지 조성물 및 이를 이용하여 형성된 광학 필름
KR101091534B1 (ko) * 2008-04-30 2011-12-13 주식회사 엘지화학 광학 필름 및 이를 포함하는 정보전자 장치
JP5286102B2 (ja) * 2009-02-06 2013-09-11 富士フイルム株式会社 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法
TW201106101A (en) * 2009-06-01 2011-02-16 Fujifilm Electronic Materials Chemically amplified positive photoresist composition
US9057960B2 (en) * 2013-02-04 2015-06-16 International Business Machines Corporation Resist performance for the negative tone develop organic development process
US20210200084A1 (en) * 2019-12-31 2021-07-01 Rohm And Haas Electronic Materials Llc Polymers and photoresist compositions

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4600683A (en) * 1985-04-22 1986-07-15 International Business Machines Corp. Cross-linked polyalkenyl phenol based photoresist compositions
JPS63147159A (ja) * 1986-12-11 1988-06-20 Fuji Photo Film Co Ltd 光重合性組成物
EP0422628A3 (en) * 1989-10-13 1992-02-26 E.I. Du Pont De Nemours And Company Photosensitive element
KR100233367B1 (ko) * 1993-04-15 1999-12-01 카나가와 치히로 레지스트 재료
JP3203995B2 (ja) * 1993-12-24 2001-09-04 ジェイエスアール株式会社 感放射線性樹脂組成物
JP3341131B2 (ja) * 1994-03-18 2002-11-05 コニカ株式会社 感光性組成物及び画像形成方法

Also Published As

Publication number Publication date
KR100524561B1 (ko) 2006-04-21
JP3695024B2 (ja) 2005-09-14
KR19980042384A (ko) 1998-08-17
EP0843220A1 (de) 1998-05-20
US5994022A (en) 1999-11-30
EP0843220B1 (de) 2003-02-19
DE69719150D1 (de) 2003-03-27
JPH10142800A (ja) 1998-05-29

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