DE69734564D1 - Verfahren zur erzeugung einer monoschicht von teilchen und damit hergestellte produkte - Google Patents

Verfahren zur erzeugung einer monoschicht von teilchen und damit hergestellte produkte

Info

Publication number
DE69734564D1
DE69734564D1 DE69734564T DE69734564T DE69734564D1 DE 69734564 D1 DE69734564 D1 DE 69734564D1 DE 69734564 T DE69734564 T DE 69734564T DE 69734564 T DE69734564 T DE 69734564T DE 69734564 D1 DE69734564 D1 DE 69734564D1
Authority
DE
Germany
Prior art keywords
particles
arrays
monochicht
producing
products manufactured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69734564T
Other languages
English (en)
Other versions
DE69734564T2 (de
Inventor
B Mcardle
Joseph Burke
K Welch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Henkel Loctite Ireland Ltd
Henkel Loctite Corp
Original Assignee
Henkel Loctite Ireland Ltd
Henkel Loctite Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/693,833 external-priority patent/US5916641A/en
Application filed by Henkel Loctite Ireland Ltd, Henkel Loctite Corp filed Critical Henkel Loctite Ireland Ltd
Application granted granted Critical
Publication of DE69734564D1 publication Critical patent/DE69734564D1/de
Publication of DE69734564T2 publication Critical patent/DE69734564T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • H05K3/323—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives by applying an anisotropic conductive adhesive layer over an array of pads
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/34—Imagewise removal by selective transfer, e.g. peeling away
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R4/00—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation
    • H01R4/04—Electrically-conductive connections between two or more conductive members in direct contact, i.e. touching one another; Means for effecting or maintaining such contact; Electrically-conductive connections having two or more spaced connecting locations for conductors and using contact members penetrating insulation using electrically conductive adhesives
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001—Core members of the layer connector
    • H01L2224/29099—Material
    • H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298—Fillers
    • H01L2224/29299—Base material
    • H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01019—Potassium [K]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01079—Gold [Au]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/06—Polymers
    • H01L2924/078—Adhesive characteristics other than chemical
    • H01L2924/0781—Adhesive characteristics other than chemical being an ohmic electrical conductor
    • H01L2924/07811—Extrinsic, i.e. with electrical conductive fillers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/102—Material of the semiconductor or solid state bodies
    • H01L2924/1025—Semiconducting materials
    • H01L2924/10251—Elemental semiconductors, i.e. Group IV
    • H01L2924/10253—Silicon [Si]
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/08—Magnetic details
    • H05K2201/083—Magnetic materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
    • H05K2201/09945—Universal aspects, e.g. universal inner layers or via grid, or anisotropic interposer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
    • H05K2203/0769—Dissolving insulating materials, e.g. coatings, not used for developing resist after exposure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
    • H05K2203/104—Using magnetic force, e.g. to align particles or for a temporary connection during processing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacturing Of Electrical Connectors (AREA)
  • Manufacturing Of Micro-Capsules (AREA)
DE69734564T 1996-08-01 1997-08-01 Verfahren zur erzeugung einer monoschicht von teilchen und damit hergestellte produkte Expired - Fee Related DE69734564T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US693833 1996-08-01
US08/693,833 US5916641A (en) 1996-08-01 1996-08-01 Method of forming a monolayer of particles
PCT/US1997/013677 WO1998006007A1 (en) 1996-08-01 1997-08-01 A method of forming a monolayer of particles, and products formed thereby

Publications (2)

Publication Number Publication Date
DE69734564D1 true DE69734564D1 (de) 2005-12-15
DE69734564T2 DE69734564T2 (de) 2006-08-10

Family

ID=26792685

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69734564T Expired - Fee Related DE69734564T2 (de) 1996-08-01 1997-08-01 Verfahren zur erzeugung einer monoschicht von teilchen und damit hergestellte produkte

Country Status (9)

Country Link
US (1) US6180226B1 (de)
EP (1) EP0855049B1 (de)
JP (1) JP3878677B2 (de)
KR (1) KR100583053B1 (de)
AT (1) ATE309556T1 (de)
AU (1) AU734452B2 (de)
BR (1) BR9706597A (de)
DE (1) DE69734564T2 (de)
WO (1) WO1998006007A1 (de)

Families Citing this family (93)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69737883T2 (de) 1996-04-25 2008-03-06 Bioarray Solutions Ltd. Licht-regulierte, elektrokinetische zusammensetzung von partikeln an oberflächen
US6387707B1 (en) 1996-04-25 2002-05-14 Bioarray Solutions Array Cytometry
US7622294B2 (en) 1997-03-14 2009-11-24 Trustees Of Tufts College Methods for detecting target analytes and enzymatic reactions
US20030027126A1 (en) 1997-03-14 2003-02-06 Walt David R. Methods for detecting target analytes and enzymatic reactions
AU756945B2 (en) 1997-05-23 2003-01-30 Bioarray Solutions Ltd Color-encoding and in-situ interrogation of matrix-coupled chemical compounds
JPH10338860A (ja) * 1997-06-06 1998-12-22 Bridgestone Corp 異方性導電フィルム
JP4275237B2 (ja) * 1998-03-17 2009-06-10 大日本印刷株式会社 低反射帯電防止性ハードコートフイルム
US6274939B1 (en) * 1998-09-11 2001-08-14 American Electronic Components Resin ceramic compositions having magnetic properties
JP2000133836A (ja) * 1998-10-22 2000-05-12 Japan Science & Technology Corp 波長可変発光素子及びその製造方法
US6475555B2 (en) * 1999-10-29 2002-11-05 International Business Machines Corporation Process for screening features on an electronic substrate with a low viscosity paste
US6488405B1 (en) * 2000-03-08 2002-12-03 Advanced Micro Devices, Inc. Flip chip defect analysis using liquid crystal
US20050288458A1 (en) 2002-07-29 2005-12-29 Klemarczyk Philip T Reworkable thermosetting resin composition
US7012120B2 (en) 2000-03-31 2006-03-14 Henkel Corporation Reworkable compositions of oxirane(s) or thirane(s)-containing resin and curing agent
JP4744778B2 (ja) * 2000-06-21 2011-08-10 バイオアレイ ソルーションズ リミテッド 特定のランダム粒子アレイを適用した複数の被検体分子の分析方法
US9709559B2 (en) * 2000-06-21 2017-07-18 Bioarray Solutions, Ltd. Multianalyte molecular analysis using application-specific random particle arrays
ITVE20010026A1 (it) * 2001-05-18 2002-11-18 Giorgio Trani Film flessibile strutturalmente modificabile, per realizzare oggetti dimensionalmente e strutturalmente stabili, in particolare contenitori
US6487002B1 (en) * 2001-06-11 2002-11-26 Xerox Corporation Large area micro-structure template for creation of closely packed arrays
US7262063B2 (en) 2001-06-21 2007-08-28 Bio Array Solutions, Ltd. Directed assembly of functional heterostructures
US6603080B2 (en) 2001-09-27 2003-08-05 Andrew Corporation Circuit board having ferrite powder containing layer
JP4377689B2 (ja) 2001-10-15 2009-12-02 バイオアレイ ソリューションズ リミテッド 同時尋問及び酵素仲介検出による多型遺伝子座の複合分析
US6548189B1 (en) 2001-10-26 2003-04-15 General Electric Company Epoxy adhesive
NL1019349C2 (nl) * 2001-11-12 2003-05-13 Univ Delft Tech Werkwijze voor het laten uitharden van een vloeibare massa.
US6887737B1 (en) 2001-12-13 2005-05-03 Henkel Corporation Epoxidized acetals and thioacetals, episulfidized acetals and thioacetals, and reworkable thermosetting resin compositions formulated therefrom
US20030155656A1 (en) * 2002-01-18 2003-08-21 Chiu Cindy Chia-Wen Anisotropically conductive film
WO2003061949A1 (en) * 2002-01-18 2003-07-31 Avery Dennison Corporation Sheet having microsized architecture
WO2003062133A2 (en) * 2002-01-18 2003-07-31 Avery Dennison Corporation Covered microchamber structures
AU2003210425A1 (en) * 2002-03-06 2003-09-16 Akzo Nobel Coatings International B.V. Water borne coating composition for film transfer and casting process
US20030183332A1 (en) * 2002-03-26 2003-10-02 Simila Charles E. Screen printed thermal expansion standoff
US7704321B2 (en) * 2002-05-13 2010-04-27 Rutgers, The State University Polycrystalline material having a plurality of single crystal particles
US7022303B2 (en) * 2002-05-13 2006-04-04 Rutgers, The State University Single-crystal-like materials
ITTO20020772A1 (it) * 2002-09-06 2004-03-07 Fiat Ricerche Metodo per la realizzazione di strutture tridimensionali
US6737364B2 (en) * 2002-10-07 2004-05-18 International Business Machines Corporation Method for fabricating crystalline-dielectric thin films and devices formed using same
AU2003298655A1 (en) 2002-11-15 2004-06-15 Bioarray Solutions, Ltd. Analysis, secure access to, and transmission of array images
WO2004051678A1 (ja) * 2002-11-29 2004-06-17 Neomax Co., Ltd. 耐食性希土類系永久磁石の製造方法、耐食性希土類系永久磁石、ワークのディップスピンコーティング法およびワークの塗膜形成方法
US8518304B1 (en) 2003-03-31 2013-08-27 The Research Foundation Of State University Of New York Nano-structure enhancements for anisotropic conductive material and thermal interposers
JP4657916B2 (ja) * 2003-05-14 2011-03-23 ラトガース，ザ ステート ユニバーシティ 単結晶様物質
WO2005029705A2 (en) * 2003-09-18 2005-03-31 Bioarray Solutions, Ltd. Number coding for identification of subtypes of coded types of solid phase carriers
NZ546072A (en) * 2003-09-22 2009-08-28 Bioarray Solutions Ltd Surface immobilized polyelectrolyte with multiple functional groups capable of covalently bonding to biomolecules
WO2005045059A2 (en) * 2003-10-28 2005-05-19 Bioarray Solutions Ltd. Allele assignment and probe selection in multiplexed assays of polymorphic targets
WO2005042763A2 (en) * 2003-10-28 2005-05-12 Bioarray Solutions Ltd. Optimization of gene expression analysis using immobilized capture probes
EP1694859B1 (de) 2003-10-29 2015-01-07 Bioarray Solutions Ltd Multiplex-nukleinsäureanalyse mittels fragmentierung doppelsträngiger dna
TWI299502B (en) * 2004-01-05 2008-08-01 Au Optronics Corp Conductive material with a laminated structure
KR100809568B1 (ko) * 2004-04-23 2008-03-04 마츠시다 덴코 가부시키가이샤 정전 무화기를 구비한 가열 송풍 장치
JP2005315767A (ja) * 2004-04-30 2005-11-10 Mitsui Mining & Smelting Co Ltd 電子部品実装用フィルムキャリアテープ用絶縁フィルムの検査方法、検査装置、該フィルムの打ち抜き加工装置及び該加工装置の制御方法
US7078095B2 (en) * 2004-07-07 2006-07-18 Xerox Corporation Adhesive film exhibiting anisotropic electrical conductivity
US7363170B2 (en) * 2004-07-09 2008-04-22 Bio Array Solutions Ltd. Transfusion registry network providing real-time interaction between users and providers of genetically characterized blood products
US7848889B2 (en) 2004-08-02 2010-12-07 Bioarray Solutions, Ltd. Automated analysis of multiplexed probe-target interaction patterns: pattern matching and allele identification
US8859680B2 (en) * 2004-09-01 2014-10-14 Ppg Industries Ohio, Inc Poly(ureaurethane)s, articles and coatings prepared therefrom and methods of making the same
US20090280329A1 (en) 2004-09-01 2009-11-12 Ppg Industries Ohio, Inc. Polyurethanes, Articles and Coatings Prepared Therefrom and Methods of Making the Same
US20070225468A1 (en) * 2004-09-01 2007-09-27 Rukavina Thomas G Polyurethanes prepared from polyester polyols and/or polycaprolactone polyols, articles and coatings prepared therefrom and methods of making the same
US20070148471A1 (en) * 2004-09-01 2007-06-28 Rukavina Thomas G Impact resistant polyurethane and poly(ureaurethane) articles and methods of making the same
US11248083B2 (en) 2004-09-01 2022-02-15 Ppg Industries Ohio, Inc. Aircraft windows
US11591436B2 (en) 2004-09-01 2023-02-28 Ppg Industries Ohio, Inc. Polyurethane article and methods of making the same
US8207286B2 (en) * 2004-09-01 2012-06-26 Ppg Industries Ohio, Inc Methods for preparing polyurethanes
US8399559B2 (en) 2004-09-01 2013-03-19 Ppg Industries Ohio, Inc. Polyurethanes, articles and coatings prepared therefrom and methods of making the same
US8604153B2 (en) 2004-09-01 2013-12-10 Ppg Industries Ohio, Inc. Poly(ureaurethane)s, articles and coatings prepared therefrom and methods of making the same
US8653220B2 (en) 2004-09-01 2014-02-18 Ppg Industries Ohio, Inc. Poly(ureaurethane)s, articles and coatings prepared therefrom and methods of making the same
US9598527B2 (en) 2004-09-01 2017-03-21 Ppg Industries Ohio, Inc. Polyurethanes, articles and coatings prepared therefrom and methods of making the same
US8933166B2 (en) 2004-09-01 2015-01-13 Ppg Industries Ohio, Inc. Poly(ureaurethane)s, articles and coatings prepared therefrom and methods of making the same
US8889815B2 (en) 2004-09-01 2014-11-18 Ppg Industries Ohio, Inc. Reinforced polyurethanes and poly(ureaurethane)s, methods of making the same and articles prepared therefrom
US8399094B2 (en) 2004-09-01 2013-03-19 Ppg Industries Ohio, Inc. Multilayer laminated articles including polyurethane and/or poly(ureaurethane) layers and methods of making the same
US11149107B2 (en) 2004-09-01 2021-10-19 Ppg Industries Ohio, Inc. Polyurethanes, articles and coatings prepared therefrom and methods of making the same
US20090280709A1 (en) 2004-09-01 2009-11-12 Ppg Industries Ohio, Inc. Polyurethanes, Articles and Coatings Prepared Therefrom and Methods of Making the Same
US11008418B2 (en) 2004-09-01 2021-05-18 Ppg Industries Ohio, Inc. Polyurethanes, articles and coatings prepared therefrom and methods of making the same
US8349986B2 (en) 2004-09-01 2013-01-08 Ppg Industries Ohio, Inc. Poly(ureaurethane)s, articles and coatings prepared therefrom and methods of making the same
US8734951B2 (en) 2004-09-01 2014-05-27 Ppg Industries Ohio, Inc. Polyurethanes, articles and coatings prepared therefrom and methods of making the same
US8927675B2 (en) 2004-09-01 2015-01-06 Ppg Industries Ohio, Inc. Poly(ureaurethane)s, articles and coatings prepared therefrom and methods of making the same
US9464169B2 (en) 2004-09-01 2016-10-11 Ppg Industries Ohio, Inc. Polyurethanes, articles and coatings prepared therefrom and methods of making the same
JP4677749B2 (ja) * 2004-09-21 2011-04-27 富士ゼロックス株式会社 磁性素子を有する情報媒体の情報検知装置
US8486629B2 (en) 2005-06-01 2013-07-16 Bioarray Solutions, Ltd. Creation of functionalized microparticle libraries by oligonucleotide ligation or elongation
US20060280912A1 (en) * 2005-06-13 2006-12-14 Rong-Chang Liang Non-random array anisotropic conductive film (ACF) and manufacturing processes
US8802214B2 (en) 2005-06-13 2014-08-12 Trillion Science, Inc. Non-random array anisotropic conductive film (ACF) and manufacturing processes
JP2007018760A (ja) * 2005-07-05 2007-01-25 Asahi Kasei Electronics Co Ltd ガラス基板接続用異方導電フィルム
US7526856B2 (en) * 2006-03-27 2009-05-05 Hitachi Global Technologies Netherlands B.V. Method for fabricating a magnetic head using a ferrofluid mask
WO2008009447A2 (de) * 2006-07-21 2008-01-24 Leonhard Kurz Stiftung & Co. Kg Mehrschichtkörper mit elektrisch leitfähiger polymerschicht und verfahren zur dessen herstellung
US7923488B2 (en) * 2006-10-16 2011-04-12 Trillion Science, Inc. Epoxy compositions
DE102007017641A1 (de) 2007-04-13 2008-10-16 Infineon Technologies Ag Aushärtung von Schichten am Halbleitermodul mittels elektromagnetischer Felder
US8057889B2 (en) * 2007-05-21 2011-11-15 Corning Incorporated Method for producing anisoptropic bulk materials
JP4400668B2 (ja) 2007-11-01 2010-01-20 株式会社豊田中央研究所 微小物体が固定化された固相体の製造方法及びその利用
NO333507B1 (no) * 2009-06-22 2013-06-24 Condalign As Fremgangsmate for a lage et anisotropisk, ledende lag og en derav frembrakt gjenstand
US9102851B2 (en) 2011-09-15 2015-08-11 Trillion Science, Inc. Microcavity carrier belt and method of manufacture
US9475963B2 (en) 2011-09-15 2016-10-25 Trillion Science, Inc. Fixed array ACFs with multi-tier partially embedded particle morphology and their manufacturing processes
US9046684B1 (en) * 2012-07-12 2015-06-02 Google Inc. Method for selectively treating surfaces
KR101407080B1 (ko) * 2012-11-29 2014-06-12 아주대학교산학협력단 입자 정렬을 이용한 코팅 방법 및 이에 의해 제조된 입자 코팅 기판
US9777197B2 (en) * 2013-10-23 2017-10-03 Sunray Scientific, Llc UV-curable anisotropic conductive adhesive
GB2524791B (en) * 2014-04-02 2018-10-03 At & S Austria Tech & Systemtechnik Ag Placement of component in circuit board intermediate product by flowable adhesive layer on carrier substrate
JP7119288B2 (ja) * 2016-05-05 2022-08-17 デクセリアルズ株式会社 フィラー配置フィルム
WO2017191772A1 (ja) 2016-05-05 2017-11-09 デクセリアルズ株式会社 フィラー配置フィルム
MX2020000863A (es) 2017-07-25 2020-08-20 Magnomer Llc Metodos y composiciones para plasticos magnetizables.
JP7260829B2 (ja) * 2017-08-23 2023-04-19 デクセリアルズ株式会社 スペーサ含有テープ
JP7066998B2 (ja) 2017-08-23 2022-05-16 デクセリアルズ株式会社 スペーサ含有テープ
US11158450B2 (en) 2019-06-17 2021-10-26 International Business Machines Corporation Particle-based, anisotropic composite materials for magnetic cores
CN114907604A (zh) * 2022-04-29 2022-08-16 深圳市华星光电半导体显示技术有限公司 减反膜及其制作方法以及显示面板

Family Cites Families (78)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2647065A (en) * 1950-05-18 1953-07-28 William M Scholl Apparatus for and method of making adhesive tape
DE1047968B (de) * 1957-06-08 1958-12-31 Beiersdorf & Co Ag P Verfahren und Vorrichtung zur Herstellung von flaechenmaessig begrenzten Klebstoffaufstrichen
US3128544A (en) 1959-04-28 1964-04-14 William D Allingham Method of making a panel
US3073304A (en) * 1960-08-08 1963-01-15 Kendall & Co Perforated adhesive tape and bandage formed therewith
US3359145A (en) 1964-12-28 1967-12-19 Monsanto Res Corp Electrically conducting adhesive
US3457919A (en) * 1966-06-22 1969-07-29 Smith & Nephew Adhesive surgical and other tapes,plasters,bandages,dressings,and the like
US3898349A (en) 1966-07-26 1975-08-05 Grace W R & Co Polyene/polythiol paint vehicle
US3661744A (en) 1966-07-26 1972-05-09 Grace W R & Co Photocurable liquid polyene-polythiol polymer compositions
US4008341A (en) 1968-10-11 1977-02-15 W. R. Grace & Co. Curable liquid polymer compositions
US3917538A (en) 1973-01-17 1975-11-04 Ferrofluidics Corp Ferrofluid compositions and process of making same
US3996308A (en) 1974-02-19 1976-12-07 Avery Products Corporation Anaerobic pressure sensitive adhesive composition
US4100088A (en) 1976-07-02 1978-07-11 Xerox Corporation Imaging composition
US4170677A (en) 1977-11-16 1979-10-09 The United States Of America As Represented By The Secretary Of The Army Anisotropic resistance bonding technique
US4368131A (en) 1978-09-18 1983-01-11 Exxon Research And Engineering Co. Composition for use in a magnetically fluidized bed
US4215209A (en) 1979-06-22 1980-07-29 National Starch And Chemical Corporation Anaerobic curing composition and process for preparing same
JPS5785873A (en) 1980-11-14 1982-05-28 Matsushita Electric Ind Co Ltd Production of anisotropic electrically conductive adhesive
US4430239A (en) 1981-10-21 1984-02-07 Ferrofluidics Corporation Ferrofluid composition and method of making and using same
US4472461A (en) * 1982-07-06 1984-09-18 The Kendall Company Method for producing perforations in an adhesive-coated porous web
NO153277C (no) 1983-11-11 1986-02-19 Inst Energiteknik Fremgangsmaate og anordning for aa bringe legemer nedsenket i vaeske til aa danne regelmessige strukturmoenstre.
GB8402801D0 (en) 1984-02-02 1984-03-07 Ici Plc Dispersion
US4548862A (en) 1984-09-04 1985-10-22 Minnesota Mining And Manufacturing Company Flexible tape having bridges of electrically conductive particles extending across its pressure-sensitive adhesive layer
JPS61189607A (ja) 1985-02-19 1986-08-23 Nok Corp 磁性流体の製造方法
GB8504481D0 (en) 1985-02-21 1985-03-27 Soszek P Circuitry
US4604229A (en) 1985-03-20 1986-08-05 Ferrofluidics Corporation Electrically conductive ferrofluid compositions and method of preparing and using same
JPS61231066A (ja) 1985-04-06 1986-10-15 Fujikura Kasei Kk 異方導電性ホツトメルト接着剤
JPS61277179A (ja) 1985-05-31 1986-12-08 ソニ−ケミカル株式会社 導電異方性接着シ−ト
JPS61276873A (ja) 1985-05-31 1986-12-06 Sony Chem Kk 導電異方性接着剤
JPS61287974A (ja) 1985-06-14 1986-12-18 Showa Electric Wire & Cable Co Ltd 異方導電性接着剤
JPS62127194A (ja) 1985-11-28 1987-06-09 Fujikura Ltd 異方導電性はんだ接合材料の製造方法
US4644101A (en) 1985-12-11 1987-02-17 At&T Bell Laboratories Pressure-responsive position sensor
US5076950A (en) 1985-12-20 1991-12-31 Syntex (U.S.A.) Inc. Magnetic composition for particle separation
US4935147A (en) 1985-12-20 1990-06-19 Syntex (U.S.A.) Inc. Particle separation method
JPS62177877A (ja) 1986-01-31 1987-08-04 住友スリ−エム株式会社 異方導電性フイルムコネクタ
US4740657A (en) 1986-02-14 1988-04-26 Hitachi, Chemical Company, Ltd Anisotropic-electroconductive adhesive composition, method for connecting circuits using the same, and connected circuit structure thus obtained
US4737112A (en) 1986-09-05 1988-04-12 American Telephone And Telegraph Company, At&T Bell Laboratories Anisotropically conductive composite medium
EP0265077A3 (de) 1986-09-25 1989-03-08 Sheldahl, Inc. Ein Anisotropisches Klebemittel zum Verbinden elektrischer Bauelemente
US4808638A (en) 1986-10-14 1989-02-28 Loctite Corporation Thiolene compositions on based bicyclic 'ene compounds
US4741850A (en) 1986-10-31 1988-05-03 Hitachi Metals, Ltd. Super paramagnetic fluids and methods of making super paramagnetic fluids
US4701276A (en) 1986-10-31 1987-10-20 Hitachi Metals, Ltd. Super paramagnetic fluids and methods of making super paramagnetic fluids
US4855079A (en) 1986-10-31 1989-08-08 Hitachi Metals, Ltd. Super paramagnetic fluids and methods of making super paramagnetic fluids
JPH0766886B2 (ja) 1986-11-11 1995-07-19 日本精工株式会社 導電性磁性流体組成物
US4960614A (en) * 1987-02-06 1990-10-02 Key-Tech, Inc. Printed circuit board
JPH0727813B2 (ja) 1987-03-03 1995-03-29 日本精工株式会社 磁性流体組成物
US4997717A (en) 1987-03-27 1991-03-05 Ciba-Geigy Corporation Photocurable abrasives
JPS63239904A (ja) 1987-03-27 1988-10-05 Nippon Seiko Kk 光硬化型磁性流体
AU598370B2 (en) 1987-06-12 1990-06-21 Minnesota Mining And Manufacturing Company Process for metal fibers
JPS6454085A (en) 1987-08-25 1989-03-01 Matsushita Electric Ind Co Ltd Conductive adhesive
US4963220A (en) 1988-01-22 1990-10-16 Dymax Corporation Adhesive system utilizing metal ion-containing activator
SE8800394L (sv) 1988-02-08 1989-08-09 Skf Nova Ab Superparamagnetiska vaetskor
AU612771B2 (en) 1988-02-26 1991-07-18 Minnesota Mining And Manufacturing Company Electrically conductive pressure-sensitive adhesive tape
US4965007A (en) 1988-05-10 1990-10-23 Eastman Kodak Company Encapsulated superparamagnetic particles
JPH0395298A (ja) 1989-05-11 1991-04-19 Nippon Seiko Kk 導電性磁性流体組成物とその製造方法
US5128215A (en) 1989-05-19 1992-07-07 Minnesota Mining & Manufacturing Company Magnetic recording media binder resin comprising a mixture of a straight block copolymer and a star block copolymer
US5064550A (en) 1989-05-26 1991-11-12 Consolidated Chemical Consulting Co. Superparamagnetic fluids and methods of making superparamagnetic fluids
US5167850A (en) 1989-06-27 1992-12-01 Trw Inc. Fluid responsive to magnetic field
US5180888A (en) 1989-08-10 1993-01-19 Casio Computer Co., Ltd. Conductive bonding agent and a conductive connecting method
US5075034A (en) 1989-09-08 1991-12-24 The Dexter Corporation Induction curable two-component structural adhesive with improved process ability
US4992190A (en) 1989-09-22 1991-02-12 Trw Inc. Fluid responsive to a magnetic field
JP2580344B2 (ja) 1989-10-25 1997-02-12 日本精工株式会社 磁性流体組成物とその製造方法及び磁性流体シ―ル装置
US5380549A (en) 1990-02-14 1995-01-10 Harvison; Eric J. Method for forming traffic surfaces having double-coated bonding of anti-slip particles and containing retro-reflective beads
WO1991014251A1 (fr) * 1990-03-07 1991-09-19 Tonen Chemical Corporation Etiquette en polyethylene et procede de fabrication
US5147573A (en) 1990-11-26 1992-09-15 Omni Quest Corporation Superparamagnetic liquid colloids
US5084490A (en) 1990-12-10 1992-01-28 Loctite (Ireland) Limited Styryloxy compounds and polymers thereof
US5141970A (en) 1990-12-10 1992-08-25 Loctite (Ireland) Limited Method of forming high-temperature resistant polymers
JP3231814B2 (ja) 1991-07-12 2001-11-26 ミネソタ マイニング アンド マニュファクチャリング カンパニー 異方性導電膜
US5286417A (en) 1991-12-06 1994-02-15 International Business Machines Corporation Method and composition for making mechanical and electrical contact
US5221417A (en) 1992-02-20 1993-06-22 At&T Bell Laboratories Conductive adhesive film techniques
EP0560072A3 (de) 1992-03-13 1993-10-06 Nitto Denko Corporation Anisotropisch-elektroleitende Klebe-Schicht und diese verwendende Verbindungsstruktur
JP3198607B2 (ja) 1992-03-31 2001-08-13 ソニー株式会社 磁気記録再生方法
JPH06122857A (ja) 1992-10-09 1994-05-06 Nippon Ferrofluidics Kk 導電性接着剤及び接着方法
US5382373A (en) 1992-10-30 1995-01-17 Lord Corporation Magnetorheological materials based on alloy particles
CA2122089A1 (en) * 1993-04-30 1994-10-31 Glen H. Bayer, Jr. Method and apparatus for applying a coating material to a receiving surface
US5346558A (en) 1993-06-28 1994-09-13 W. R. Grace & Co.-Conn. Solderable anisotropically conductive composition and method of using same
US5366140A (en) 1993-09-30 1994-11-22 Minnesota Mining And Manufacturing Company Patterned array of uniform metal microbeads
US5443876A (en) 1993-12-30 1995-08-22 Minnesota Mining And Manufacturing Company Electrically conductive structured sheets
KR100389743B1 (ko) 1994-01-27 2003-10-04 록타이트(아일랜드) 리미티드 두세트의전도체사이에이방성전도성경로및결합을제공하기위한조성물및방법
TW277152B (de) 1994-05-10 1996-06-01 Hitachi Chemical Co Ltd
US5851644A (en) * 1995-08-01 1998-12-22 Loctite (Ireland) Limited Films and coatings having anisotropic conductive pathways therein

Also Published As

Publication number Publication date
KR100583053B1 (ko) 2006-09-22
JPH11514755A (ja) 1999-12-14
ATE309556T1 (de) 2005-11-15
JP3878677B2 (ja) 2007-02-07
BR9706597A (pt) 1999-07-20
DE69734564T2 (de) 2006-08-10
AU734452B2 (en) 2001-06-14
US6180226B1 (en) 2001-01-30
EP0855049B1 (de) 2005-11-09
KR19990063922A (ko) 1999-07-26
WO1998006007A1 (en) 1998-02-12
AU4051197A (en) 1998-02-25
EP0855049A1 (de) 1998-07-29

Similar Documents

Publication Publication Date Title
DE69734564D1 (de) Verfahren zur erzeugung einer monoschicht von teilchen und damit hergestellte produkte
DE69809382D1 (de) Verfahren und Zusammensetzungen zur Herstellung von Kupferoberflächen mit verbesserter Haftung und damit hergestellte Gegenstände
DE69943160D1 (de) Verfahren zur herstellung einer detektoranordnung einschliesslich eines gassensors und mit diesem verfahren hergestellte detektoranordnung
DE59604690D1 (de) Sicherheitsdokument mit einem sicherheitselement und verfahren zu dessen herstellung
DE69014396D1 (de) Verfahren zur Herstellung von permeationsbeständigen Silikonelastomer enthaltenden Mehrschichtstrukturen sowie dadurch hergestellte Artikel.
DE69834559D1 (de) Sauerstoffhaltige phosphorpulver ,verfahren zur herstellung phosphorpulver und vorrichtungen damit
DE50210526D1 (de) Verfahren zur herstellung eines aus mehreren schichten bestehenden dreidimensionalen bauteils
DE3587206D1 (de) Verfahren zur herstellung von polymeren mit einfoermiger teilchengroesse.
DE69020012T2 (de) Herstellung einer isolierenden Schicht, zum Beispiel in einem aktiven Matrix-Bauelement.
DK1392481T3 (da) Fremgangsmåde til fremstilling af et tredimensionalt böjningsdeformerbart fladeelement
DE59711923D1 (de) Verfahren zur herstellung von geformten oder ungeformten polyolmassen und hergestelle zusammensetzungen
DE69428912T2 (de) Verfahren zur herstellung von pentafluorethan
ATE205605T1 (de) Verfahren und vorrichtung zur herstellung einer transpondereinheit sowie transpondereinheit
DE69025986D1 (de) Schaltungsstruktur, gebildet durch Formen mit Einsetzung eines elektrischen und/oder optischen Durchlassungsmediums und Verfahren zur Herstellung dieser Schaltungsstruktur.
ATE472368T1 (de) Verfahren zur herstellung von bis(perfluoralkyl)phosphinsäuren und deren salze
BR0313626A (pt) Composição ignifugada, processo de fabricação de uma composição ignifugada, processo de fabricação de um artigo e artigo
DE3676833D1 (de) Verfahren zur herstellung von perfluorpolyaethern mit regulierter molekuelmasse aus dem produkt erhalten in der c2f4 photooxydation.
ATE519859T1 (de) Verfahren zur herstellung von ausgewählten intermolekularen quervernetzungen in nukleinsäuren und ihre verwendungen
DE50214572D1 (de) Verfahren zum verbinden von zwei körpern
ATE221904T1 (de) Verfahren zur herstellung von flächengebilden auf basis nachwachsender rohstoffe
ATE480582T1 (de) Verfahren zur herstellung von expandierbaren styrolpolymerisaten
DE69113546D1 (de) Elektrischer kontakt, verfahren zu dessen herstellung und verfahren zur herstellung von einem elektrischen kontakt und zu dessen befestigung an einem bandförmigen streifen aus metallischem material.
DE69805139T2 (de) Fahrdraht aus Kupfer und Verfahren zur Herstellung einer Fahrdraht aus Kupfer
ATE334132T1 (de) Non-metallocene, verfahren zur herstellung von diesen und deren verwendung zur polymerisation von olefinen
DE59811481D1 (de) Kunststoffplatte sowie verfahren zur herstellung einer solchen

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee