DE69734985D1 - Ram speicher und das in deren herstellung verwendete platindampfabscheidungsverfahren - Google Patents
Ram speicher und das in deren herstellung verwendete platindampfabscheidungsverfahrenInfo
- Publication number
- DE69734985D1 DE69734985D1 DE69734985T DE69734985T DE69734985D1 DE 69734985 D1 DE69734985 D1 DE 69734985D1 DE 69734985 T DE69734985 T DE 69734985T DE 69734985 T DE69734985 T DE 69734985T DE 69734985 D1 DE69734985 D1 DE 69734985D1
- Authority
- DE
- Germany
- Prior art keywords
- butyl
- propyl
- methyl
- platinum
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/92—Ketonic chelates
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F17/00—Metallocenes
- C07F17/02—Metallocenes of metals of Groups 8, 9 or 10 of the Periodic System
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/65—Electrodes comprising a noble metal or a noble metal oxide, e.g. platinum (Pt), ruthenium (Ru), ruthenium dioxide (RuO2), iridium (Ir), iridium dioxide (IrO2)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/673,372 US5783716A (en) | 1996-06-28 | 1996-06-28 | Platinum source compositions for chemical vapor deposition of platinum |
PCT/US1997/012762 WO1998000432A1 (en) | 1996-06-28 | 1997-06-27 | Platinum source compositions for chemical vapor deposition of platinum |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69734985D1 true DE69734985D1 (de) | 2006-02-02 |
Family
ID=24702388
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69734985T Expired - Lifetime DE69734985D1 (de) | 1996-06-28 | 1997-06-27 | Ram speicher und das in deren herstellung verwendete platindampfabscheidungsverfahren |
Country Status (6)
Country | Link |
---|---|
US (2) | US5783716A (de) |
EP (1) | EP0920435B1 (de) |
JP (1) | JP2001504159A (de) |
AT (1) | ATE314730T1 (de) |
DE (1) | DE69734985D1 (de) |
WO (1) | WO1998000432A1 (de) |
Families Citing this family (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3769711B2 (ja) | 1997-11-28 | 2006-04-26 | ローム株式会社 | キャパシタの製法 |
JP3321729B2 (ja) * | 1998-04-03 | 2002-09-09 | 株式会社高純度化学研究所 | トリメチル(エチルシクロペンタジエニル)白金とそ の製造方法及びそれを用いた白金含有薄膜の製造方法 |
US6284654B1 (en) * | 1998-04-16 | 2001-09-04 | Advanced Technology Materials, Inc. | Chemical vapor deposition process for fabrication of hybrid electrodes |
US6750110B1 (en) * | 1998-07-23 | 2004-06-15 | Micron Technology, Inc. | Continuous good step coverage CVD platinum metal deposition |
US6271131B1 (en) | 1998-08-26 | 2001-08-07 | Micron Technology, Inc. | Methods for forming rhodium-containing layers such as platinum-rhodium barrier layers |
US7098503B1 (en) * | 1998-08-27 | 2006-08-29 | Micron Technology, Inc. | Circuitry and capacitors comprising roughened platinum layers |
US6583022B1 (en) * | 1998-08-27 | 2003-06-24 | Micron Technology, Inc. | Methods of forming roughened layers of platinum and methods of forming capacitors |
US6261850B1 (en) * | 1998-09-03 | 2001-07-17 | Micron Technology, Inc. | Direct writing of low carbon conductive material |
US6323081B1 (en) * | 1998-09-03 | 2001-11-27 | Micron Technology, Inc. | Diffusion barrier layers and methods of forming same |
EP1130628A4 (de) * | 1998-10-14 | 2007-07-04 | Hitachi Ltd | Halbleitervorrichtung und herstellungsverfahren |
US6218293B1 (en) | 1998-11-13 | 2001-04-17 | Micron Technology, Inc. | Batch processing for semiconductor wafers to form aluminum nitride and titanium aluminum nitride |
US7012292B1 (en) | 1998-11-25 | 2006-03-14 | Advanced Technology Materials, Inc | Oxidative top electrode deposition process, and microelectronic device structure |
US6204178B1 (en) * | 1998-12-29 | 2001-03-20 | Micron Technology, Inc. | Nucleation and deposition of PT films using ultraviolet irradiation |
US6352944B1 (en) | 1999-02-10 | 2002-03-05 | Micron Technology, Inc. | Method of depositing an aluminum nitride comprising layer over a semiconductor substrate |
US6984591B1 (en) * | 2000-04-20 | 2006-01-10 | International Business Machines Corporation | Precursor source mixtures |
US6503314B1 (en) * | 2000-08-28 | 2003-01-07 | Sharp Laboratories Of America, Inc. | MOCVD ferroelectric and dielectric thin films depositions using mixed solvents |
US6660631B1 (en) * | 2000-08-31 | 2003-12-09 | Micron Technology, Inc. | Devices containing platinum-iridium films and methods of preparing such films and devices |
US7217615B1 (en) | 2000-08-31 | 2007-05-15 | Micron Technology, Inc. | Capacitor fabrication methods including forming a conductive layer |
JP3598068B2 (ja) | 2001-02-06 | 2004-12-08 | 松下電器産業株式会社 | 半導体装置の製造方法 |
GB2372404B (en) | 2001-02-16 | 2003-04-09 | Ericsson Telefon Ab L M | Telecommunications system |
US20030036242A1 (en) | 2001-08-16 | 2003-02-20 | Haining Yang | Methods of forming metal-comprising materials and capacitor electrodes; and capacitor constructions |
US6576538B2 (en) | 2001-08-30 | 2003-06-10 | Micron Technology, Inc. | Technique for high efficiency metalorganic chemical vapor deposition |
US6573199B2 (en) | 2001-08-30 | 2003-06-03 | Micron Technology, Inc. | Methods of treating dielectric materials with oxygen, and methods of forming capacitor constructions |
US6918960B2 (en) | 2001-11-28 | 2005-07-19 | Micron Technology, Inc. | CVD of PtRh with good adhesion and morphology |
US7105065B2 (en) * | 2002-04-25 | 2006-09-12 | Micron Technology, Inc. | Metal layer forming methods and capacitor electrode forming methods |
US7160577B2 (en) | 2002-05-02 | 2007-01-09 | Micron Technology, Inc. | Methods for atomic-layer deposition of aluminum oxides in integrated circuits |
FR2839982B1 (fr) | 2002-05-22 | 2005-04-15 | Centre Nat Rech Scient | Composition de precurseur pour le depot de cuivre sur un support |
WO2003106011A2 (en) * | 2002-06-12 | 2003-12-24 | Praxair Technology, Inc. | A method for producing organometallic compounds |
JP2004067601A (ja) * | 2002-08-07 | 2004-03-04 | Tanaka Kikinzoku Kogyo Kk | Cvd原料用の有機化合物及び該有機化合物を用いた金属又は金属化合物薄膜の製造方法 |
US7084078B2 (en) | 2002-08-29 | 2006-08-01 | Micron Technology, Inc. | Atomic layer deposited lanthanide doped TiOx dielectric films |
ES2268635T3 (es) * | 2003-03-03 | 2007-03-16 | Dechema Gesellschaft Fur Chemische Technik Und Biotechnologie E.V. | Procedimiento para recubrir un sustrato. |
US20050081907A1 (en) * | 2003-10-20 | 2005-04-21 | Lewis Larry N. | Electro-active device having metal-containing layer |
JP2005158842A (ja) * | 2003-11-21 | 2005-06-16 | Matsushita Electric Ind Co Ltd | 半導体装置及びその製造方法 |
US7166732B2 (en) * | 2004-06-16 | 2007-01-23 | Advanced Technology Materials, Inc. | Copper (I) compounds useful as deposition precursors of copper thin films |
US7588988B2 (en) | 2004-08-31 | 2009-09-15 | Micron Technology, Inc. | Method of forming apparatus having oxide films formed using atomic layer deposition |
US7662729B2 (en) | 2005-04-28 | 2010-02-16 | Micron Technology, Inc. | Atomic layer deposition of a ruthenium layer to a lanthanide oxide dielectric layer |
US7572695B2 (en) | 2005-05-27 | 2009-08-11 | Micron Technology, Inc. | Hafnium titanium oxide films |
US7927948B2 (en) | 2005-07-20 | 2011-04-19 | Micron Technology, Inc. | Devices with nanocrystals and methods of formation |
US7575978B2 (en) * | 2005-08-04 | 2009-08-18 | Micron Technology, Inc. | Method for making conductive nanoparticle charge storage element |
US7410910B2 (en) | 2005-08-31 | 2008-08-12 | Micron Technology, Inc. | Lanthanum aluminum oxynitride dielectric films |
FR2897070B1 (fr) * | 2006-02-03 | 2008-12-19 | Commissariat Energie Atomique | Procede dli-mocvd pour la fabrication d'electrodes pour reacteurs electrochimiques, electrodes obtenues par ce procede et pile a combustible et accumulateur mettant en oeuvre de telles electrodes |
DE102006050863A1 (de) * | 2006-10-27 | 2008-04-30 | Wacker Chemie Ag | Platinkatalysator |
WO2008069821A1 (en) * | 2006-12-05 | 2008-06-12 | Advanced Technology Materials, Inc. | Metal aminotroponiminates, bis-oxazolinates and guanidinates |
US7763511B2 (en) * | 2006-12-29 | 2010-07-27 | Intel Corporation | Dielectric barrier for nanocrystals |
US7750173B2 (en) * | 2007-01-18 | 2010-07-06 | Advanced Technology Materials, Inc. | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films |
US8367506B2 (en) | 2007-06-04 | 2013-02-05 | Micron Technology, Inc. | High-k dielectrics with gold nano-particles |
US20090275164A1 (en) * | 2008-05-02 | 2009-11-05 | Advanced Technology Materials, Inc. | Bicyclic guanidinates and bridging diamides as cvd/ald precursors |
CN103221548B (zh) | 2010-06-15 | 2017-04-12 | 代谢探索者公司 | 诱导型启动子在乙醇酸的产生中的用途 |
US8911827B2 (en) | 2011-04-20 | 2014-12-16 | Tanka Kikinzoku Kogyo K.K. | Chemical vapor deposition method using an organoplatinum compound |
JP5156120B1 (ja) | 2011-10-14 | 2013-03-06 | 田中貴金属工業株式会社 | 有機白金化合物からなる化学蒸着用原料及び該化学蒸着用原料を用いた化学蒸着法 |
JP5952460B1 (ja) | 2015-05-12 | 2016-07-13 | 田中貴金属工業株式会社 | 有機白金化合物からなる化学蒸着用原料及び該化学蒸着用原料を用いた化学蒸着法 |
JP5960321B1 (ja) | 2015-05-12 | 2016-08-02 | 田中貴金属工業株式会社 | 有機白金化合物からなる化学蒸着用原料及び該化学蒸着用原料を用いた化学蒸着法 |
JP6407370B1 (ja) * | 2017-07-25 | 2018-10-17 | 田中貴金属工業株式会社 | 有機白金化合物からなる気相蒸着用原料及び該気相蒸着用原料を用いた気相蒸着法 |
EP3956339A1 (de) * | 2020-03-20 | 2022-02-23 | UMICORE AG & Co. KG | Trimethylplatin(iv)-iodid |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4510094A (en) * | 1983-12-06 | 1985-04-09 | Minnesota Mining And Manufacturing Company | Platinum complex |
GB8526613D0 (en) * | 1985-10-29 | 1985-12-04 | Shell Int Research | Aldehydes |
JPH0254704A (ja) * | 1988-08-19 | 1990-02-23 | Tanaka Kikinzoku Kogyo Kk | 貴金属粒子の製造方法 |
US5130172A (en) * | 1988-10-21 | 1992-07-14 | The Regents Of The University Of California | Low temperature organometallic deposition of metals |
US4912072A (en) * | 1988-10-21 | 1990-03-27 | Gas Research Institute | Method for selective internal platinization of porous aluminosilicates |
CA1340871C (en) * | 1988-12-28 | 2000-01-04 | Robert W. Epperly | Method for reducing emissions from or increasing the utilizable energy of fuel for powering internal combustion engines |
US5104684A (en) * | 1990-05-25 | 1992-04-14 | Massachusetts Institute Of Technology | Ion beam induced deposition of metals |
US5116637A (en) * | 1990-06-04 | 1992-05-26 | Dow Corning Corporation | Amine catalysts for the low temperature conversion of silica precursors to silica |
US5840897A (en) * | 1990-07-06 | 1998-11-24 | Advanced Technology Materials, Inc. | Metal complex source reagents for chemical vapor deposition |
US5280012A (en) * | 1990-07-06 | 1994-01-18 | Advanced Technology Materials Inc. | Method of forming a superconducting oxide layer by MOCVD |
US5276226A (en) * | 1992-10-05 | 1994-01-04 | Exxon Research & Engineering Company | Low temperature halogenation of alkanes |
US5403620A (en) * | 1992-10-13 | 1995-04-04 | Regents Of The University Of California | Catalysis in organometallic CVD of thin metal films |
US5502227A (en) * | 1993-07-27 | 1996-03-26 | Cvd, Incorporated | Liquid indium source |
AU7614194A (en) * | 1993-08-19 | 1995-03-14 | Shell Internationale Research Maatschappij B.V. | Hydroformylation process |
JP4047382B2 (ja) * | 1995-08-04 | 2008-02-13 | マイクロコーティング テクノロジーズ | 超臨界付近および超臨界の流体溶液の溶射を用いた化学蒸着および粉体形成 |
EP0846097B1 (de) * | 1995-08-25 | 2000-11-02 | E.I. Du Pont De Nemours And Company | Hydroformylierungsverfahren. |
-
1996
- 1996-06-28 US US08/673,372 patent/US5783716A/en not_active Expired - Lifetime
-
1997
- 1997-06-27 DE DE69734985T patent/DE69734985D1/de not_active Expired - Lifetime
- 1997-06-27 JP JP50453098A patent/JP2001504159A/ja active Pending
- 1997-06-27 WO PCT/US1997/012762 patent/WO1998000432A1/en active IP Right Grant
- 1997-06-27 AT AT97936141T patent/ATE314730T1/de not_active IP Right Cessation
- 1997-06-27 EP EP97936141A patent/EP0920435B1/de not_active Expired - Lifetime
-
1998
- 1998-01-16 US US09/008,705 patent/US6162712A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6162712A (en) | 2000-12-19 |
EP0920435B1 (de) | 2005-12-28 |
ATE314730T1 (de) | 2006-01-15 |
WO1998000432A1 (en) | 1998-01-08 |
EP0920435A4 (de) | 2001-07-25 |
EP0920435A1 (de) | 1999-06-09 |
US5783716A (en) | 1998-07-21 |
JP2001504159A (ja) | 2001-03-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69734985D1 (de) | Ram speicher und das in deren herstellung verwendete platindampfabscheidungsverfahren | |
Pirrung et al. | Proofing of photolithographic DNA synthesis with 3 ‘, 5 ‘-dimethoxybenzoinyloxycarbonyl-protected deoxynucleoside phosphoramidites | |
Sosnowski et al. | Rapid determination of single base mismatch mutations in DNA hybrids by direct electric field control | |
Guadalupe et al. | Novel chemical pathways and charge-transport dynamics of electrodes modified with electropolymerized layers of [Co (v-terpy) 2] 2+ | |
DE59510492D1 (de) | Wasserbasierende organopolysiloxanhaltige Zusammensetzungen, Verfahren zu deren Herstellung und deren Verwendung | |
ATE139580T1 (de) | Gasversorgungsvorrichtung und ihre verwendung für eine filmabscheidungsanlage | |
DE59510270D1 (de) | Organopolysiloxanhaltige Zusammensetzungen auf Wasserbasis, Verfahren zu deren Herstellung sowie deren Verwendung | |
AR245718A1 (es) | Procedimiento para preparar un compuesto de imidazo (4,5-b)-piridina | |
ATE236170T1 (de) | Verfahren zur herstellung von fluoralkyl-gruppen tragenden siliciumorganischen verbindungen und deren verwendung | |
FR2692168B1 (fr) | Préparation et utilisation de nouveaux systèmes colloïdaux dispersibles à base de cyclodextrine, sous forme de nanosphères. | |
FI924569A (fi) | Foerfarande foer enantioselektiv framstaellning av fenylisoserinderivat | |
ATE153022T1 (de) | 3',5'-ditertbutyl-4'-hydroxyflavone, verfahren zu ihrer herstellung und pharmazeutische zusammensetzung mit antioxidations- und antivasokonstriktionsaktivität | |
Beckett et al. | The Reactions of Nitrofurans with Bacteria--II. Reduction of a Series of Antibacterial Nitrofurans by Aerobactor aerogenes | |
Burns et al. | Stereoelectronic requirements for a new class of asymmetric ketone reduction catalysts containing an N P O structural unit. | |
BR8306704A (pt) | Processo de preparacao de aldeidos ou de cetonas por oxidacao catalitica em meio liquidos dos alcoois primarios ou secundarios correspondentes | |
JPS6428556A (en) | Enzyme electrode | |
Bartak et al. | Decomposition of nitroaromatic anion radicals. The ambient behavior of the thiocyanate substituent | |
ATE144510T1 (de) | N-(isochinolein-5-yl)-sulfonyl azazykloalkane, verfahren zu deren herstellung und diese enthaltende pharmazeutische zusammenstellungen | |
ATE20466T1 (de) | Triazolyl-ketonoxime und -dioxime, verfahren zu ihrer herstellung und ihre verwendung als pflanzenwachstumsregulatoren. | |
DE69610563T2 (de) | Verfahren zur hydrierung von iminen | |
KR960702432A (ko) | P-알킬- 및p-아릴설포닐벤조산 유도체의 제조방법(process to prepare p-alkyl-and p-arylsulphonylbenzoic acid derivatives) | |
Choudhry et al. | Quantum yields for the photodecomposition of polychlorinated dibenzo-p-dioxins (PCDDs) in water-acetonitrile solution | |
JPS56115776A (en) | Preparation of 2-bromo-trifluoromethylpyridine | |
ES8306368A1 (es) | "procedimiento para la preparacion de derivados de 1,2,3-tiadiazol-5-il-urea". | |
TH9839EX (th) | อนุพันธ์โดโลเบนโซควิโนลีน,การเตรียมสารเหล่านั้นและการใช้สารเหล่าเป็นยาต่อต้านอาการหัวใจเต้นไม่ปกติ |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de |