DE69735406D1 - Glasschaltungssubstrat und Verfahren zu dessen Herstellung - Google Patents

Glasschaltungssubstrat und Verfahren zu dessen Herstellung

Info

Publication number
DE69735406D1
DE69735406D1 DE69735406T DE69735406T DE69735406D1 DE 69735406 D1 DE69735406 D1 DE 69735406D1 DE 69735406 T DE69735406 T DE 69735406T DE 69735406 T DE69735406 T DE 69735406T DE 69735406 D1 DE69735406 D1 DE 69735406D1
Authority
DE
Germany
Prior art keywords
production
circuit substrate
glass circuit
glass
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69735406T
Other languages
English (en)
Other versions
DE69735406T2 (de
Inventor
Yoshiaki Tomari
Makoto Kameyama
Yasuyuki Nakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP28407396A external-priority patent/JP3478684B2/ja
Priority claimed from JP00638497A external-priority patent/JP3535684B2/ja
Priority claimed from JP16715297A external-priority patent/JPH1112787A/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69735406D1 publication Critical patent/DE69735406D1/de
Publication of DE69735406T2 publication Critical patent/DE69735406T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/42Coating with noble metals
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12528Semiconductor component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12597Noncrystalline silica or noncrystalline plural-oxide component [e.g., glass, etc.]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12861Group VIII or IB metal-base component
    • Y10T428/12875Platinum group metal-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12861Group VIII or IB metal-base component
    • Y10T428/12882Cu-base component alternative to Ag-, Au-, or Ni-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12861Group VIII or IB metal-base component
    • Y10T428/12889Au-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12861Group VIII or IB metal-base component
    • Y10T428/12896Ag-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
DE69735406T 1996-10-25 1997-10-24 Glasschaltungssubstrat und Verfahren zu dessen Herstellung Expired - Lifetime DE69735406T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP28407396A JP3478684B2 (ja) 1996-10-25 1996-10-25 ガラス回路基板
JP28407396 1996-10-25
JP00638497A JP3535684B2 (ja) 1997-01-17 1997-01-17 ガラス製配線基板
JP638497 1997-01-17
JP16715297 1997-06-24
JP16715297A JPH1112787A (ja) 1997-06-24 1997-06-24 ガラス製配線基板及びその製造方法

Publications (2)

Publication Number Publication Date
DE69735406D1 true DE69735406D1 (de) 2006-05-04
DE69735406T2 DE69735406T2 (de) 2006-08-31

Family

ID=27277135

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69735406T Expired - Lifetime DE69735406T2 (de) 1996-10-25 1997-10-24 Glasschaltungssubstrat und Verfahren zu dessen Herstellung

Country Status (3)

Country Link
US (1) US6156413A (de)
EP (1) EP0838980B1 (de)
DE (1) DE69735406T2 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
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US6436816B1 (en) * 1998-07-31 2002-08-20 Industrial Technology Research Institute Method of electroless plating copper on nitride barrier
US6406750B1 (en) * 1999-05-28 2002-06-18 Osaka Municipal Government Process of forming catalyst nuclei on substrate, process of electroless-plating substrate, and modified zinc oxide film
US6585904B2 (en) * 2001-02-15 2003-07-01 Peter Kukanskis Method for the manufacture of printed circuit boards with plated resistors
US20040126548A1 (en) * 2001-05-28 2004-07-01 Waseda University ULSI wiring and method of manufacturing the same
WO2003008938A2 (de) * 2001-07-16 2003-01-30 Siemens Aktiengesellschaft Verfahren zum bestimmen der haftfestigkeit einer beschichtung auf einem bauteil
US20040082859A1 (en) 2002-07-01 2004-04-29 Alan Schaer Method and apparatus employing ultrasound energy to treat body sphincters
US7380690B2 (en) * 2003-01-17 2008-06-03 Ricoh Company, Ltd. Solution jet type fabrication apparatus, method, solution containing fine particles, wiring pattern substrate, device substrate
MY148655A (en) * 2003-11-27 2013-05-15 Fuji Photo Film Co Ltd Metal pattern forming method, metal pattern obtained by the same, printed wiring board, conductive film forming method, and conductive film obtained by the same
JP4539282B2 (ja) * 2004-04-16 2010-09-08 富士電機デバイステクノロジー株式会社 垂直磁気記録媒体用ディスク基板及びそれを用いた垂直磁気記録媒体
US20060210837A1 (en) * 2004-04-16 2006-09-21 Fuji Electric Device Method of plating on a glass base plate, a method of manufacturing a disk substrate for a perpendicular magnetic recording medium, a disk substrate for a perpendicular magnetic recording medium, and a perpendicular magnetic recording medium
JP4475026B2 (ja) * 2004-06-11 2010-06-09 富士電機デバイステクノロジー株式会社 無電解めっき方法、磁気記録媒体および磁気記録装置
US7291380B2 (en) * 2004-07-09 2007-11-06 Hewlett-Packard Development Company, L.P. Laser enhanced plating for forming wiring patterns
JP4479528B2 (ja) * 2004-07-27 2010-06-09 富士電機デバイステクノロジー株式会社 ガラス基体へのめっき方法、そのめっき方法を用いる磁気記録媒体用ディスク基板の製造方法及び垂直磁気記録媒体の製造方法
JP4479571B2 (ja) * 2005-04-08 2010-06-09 富士電機デバイステクノロジー株式会社 磁気記録媒体の製造方法
US7670951B2 (en) 2005-06-27 2010-03-02 Intel Corporation Grid array connection device and method
KR100688833B1 (ko) * 2005-10-25 2007-03-02 삼성전기주식회사 인쇄회로기판의 도금층 형성방법 및 이로부터 제조된인쇄회로기판
US8974445B2 (en) 2009-01-09 2015-03-10 Recor Medical, Inc. Methods and apparatus for treatment of cardiac valve insufficiency
EP2995350B1 (de) 2009-10-30 2016-08-03 ReCor Medical, Inc. Vorrichtung zur behandlung von bluthochdruck durch perkutane ultrschall-nierendenervation
US8207453B2 (en) * 2009-12-17 2012-06-26 Intel Corporation Glass core substrate for integrated circuit devices and methods of making the same
US9420707B2 (en) 2009-12-17 2016-08-16 Intel Corporation Substrate for integrated circuit devices including multi-layer glass core and methods of making the same
WO2013133827A1 (en) 2012-03-07 2013-09-12 Intel Corporation Glass clad microelectronic substrate
US9001520B2 (en) 2012-09-24 2015-04-07 Intel Corporation Microelectronic structures having laminated or embedded glass routing structures for high density packaging
US9615453B2 (en) 2012-09-26 2017-04-04 Ping-Jung Yang Method for fabricating glass substrate package
US10622310B2 (en) 2012-09-26 2020-04-14 Ping-Jung Yang Method for fabricating glass substrate package
JP6322696B2 (ja) 2013-03-14 2018-05-09 リコール メディカル インコーポレイテッドReCor Medical, Inc. 超音波による神経調節システム
JP6337080B2 (ja) 2013-03-14 2018-06-06 リコール メディカル インコーポレイテッドReCor Medical, Inc. 超音波トランスデューサーをめっき又はコーティングする方法

Family Cites Families (13)

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Publication number Priority date Publication date Assignee Title
NL7204641A (de) * 1972-04-07 1973-10-09
US3754939A (en) * 1972-05-23 1973-08-28 Us Army Electroless deposition of palladium alloys
US4255194A (en) * 1979-01-15 1981-03-10 Mine Safety Appliances Company Palladium alloy baths for the electroless deposition
DE3125730A1 (de) * 1981-06-30 1983-01-13 Siemens AG, 1000 Berlin und 8000 München Verfahren zum metallisieren elektrischer bauelemente
US4424241A (en) * 1982-09-27 1984-01-03 Bell Telephone Laboratories, Incorporated Electroless palladium process
JPH0269720A (ja) * 1988-09-06 1990-03-08 Seiko Epson Corp パネル基板
JPH0417211A (ja) * 1990-05-09 1992-01-22 Akira Fujishima 絶縁体への導電性層形成法
DE4113686A1 (de) * 1991-04-26 1992-10-29 Licentia Gmbh Verfahren zum herstellen eines leiterbahnenmusters, insbesondere einer fluessigkristallanzeigevorrichtung
JPH0661619A (ja) * 1992-05-29 1994-03-04 Akira Fujishima 回路基板の製造方法
US5882736A (en) * 1993-05-13 1999-03-16 Atotech Deutschland Gmbh palladium layers deposition process
JPH07314603A (ja) * 1993-12-28 1995-12-05 Nippon Denkai Kk 銅張積層体、多層プリント回路板及びそれらの処理方法
JPH08271869A (ja) * 1995-03-30 1996-10-18 Kyocera Corp 液晶表示パネルの製造方法
JP3058063B2 (ja) * 1995-10-18 2000-07-04 株式会社村田製作所 無電解めっきのための活性化触媒液および無電解めっき方法

Also Published As

Publication number Publication date
EP0838980A3 (de) 1999-04-28
US6156413A (en) 2000-12-05
DE69735406T2 (de) 2006-08-31
EP0838980A2 (de) 1998-04-29
EP0838980B1 (de) 2006-03-08

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