DE69738276D1 - Elektronenstrahl-Belichtungsgerät, Belichtungsverfahren und Verfahren zur Erzeugung eines Objekts - Google Patents

Elektronenstrahl-Belichtungsgerät, Belichtungsverfahren und Verfahren zur Erzeugung eines Objekts

Info

Publication number
DE69738276D1
DE69738276D1 DE69738276T DE69738276T DE69738276D1 DE 69738276 D1 DE69738276 D1 DE 69738276D1 DE 69738276 T DE69738276 T DE 69738276T DE 69738276 T DE69738276 T DE 69738276T DE 69738276 D1 DE69738276 D1 DE 69738276D1
Authority
DE
Germany
Prior art keywords
creating
electron beam
exposure
exposure apparatus
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69738276T
Other languages
English (en)
Other versions
DE69738276T2 (de
Inventor
Masato Muraki
Susumu Gotoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP04587896A external-priority patent/JP3647128B2/ja
Priority claimed from JP10123396A external-priority patent/JP3647136B2/ja
Priority claimed from JP8150988A external-priority patent/JPH09330868A/ja
Priority claimed from JP15099096A external-priority patent/JP3647143B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69738276D1 publication Critical patent/DE69738276D1/de
Publication of DE69738276T2 publication Critical patent/DE69738276T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302—Controlling tubes by external information, e.g. programme control
    • H01J37/3023—Programme control
    • H01J37/3026—Patterning strategy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3177—Multi-beam, e.g. fly's eye, comb probe
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69738276T 1996-03-04 1997-03-04 Elektronenstrahl-Belichtungsgerät, Belichtungsverfahren und Verfahren zur Erzeugung eines Objekts Expired - Lifetime DE69738276T2 (de)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP04587896A JP3647128B2 (ja) 1996-03-04 1996-03-04 電子ビーム露光装置とその露光方法
JP4587896 1996-03-04
JP10123396A JP3647136B2 (ja) 1996-04-23 1996-04-23 電子ビーム露光装置
JP10123396 1996-04-23
JP15098896 1996-06-12
JP8150988A JPH09330868A (ja) 1996-06-12 1996-06-12 電子ビーム露光方法及びそれを用いたデバイス製造方法
JP15099096 1996-06-12
JP15099096A JP3647143B2 (ja) 1996-06-12 1996-06-12 電子ビーム露光装置及びその露光方法

Publications (2)

Publication Number Publication Date
DE69738276D1 true DE69738276D1 (de) 2007-12-27
DE69738276T2 DE69738276T2 (de) 2008-04-03

Family

ID=27461793

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69738276T Expired - Lifetime DE69738276T2 (de) 1996-03-04 1997-03-04 Elektronenstrahl-Belichtungsgerät, Belichtungsverfahren und Verfahren zur Erzeugung eines Objekts

Country Status (4)

Country Link
US (4) US5834783A (de)
EP (4) EP1369896A3 (de)
KR (1) KR100225335B1 (de)
DE (1) DE69738276T2 (de)

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* Cited by examiner, † Cited by third party
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EP1369897A2 (de) 2003-12-10
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KR970067575A (ko) 1997-10-13
US5973332A (en) 1999-10-26
EP0794552B1 (de) 2007-11-14
US6166387A (en) 2000-12-26
EP1369897A3 (de) 2005-01-19
DE69738276T2 (de) 2008-04-03
EP1369896A2 (de) 2003-12-10
US6323499B1 (en) 2001-11-27
EP0794552A2 (de) 1997-09-10
EP1369896A3 (de) 2004-12-22
US5834783A (en) 1998-11-10
EP1369895B1 (de) 2012-05-09
KR100225335B1 (ko) 1999-10-15
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