DE69801032T2 - Verfahren zur Beschichtung eines Gegenstandes mit einem Polysilsesquioxan - Google Patents
Verfahren zur Beschichtung eines Gegenstandes mit einem PolysilsesquioxanInfo
- Publication number
- DE69801032T2 DE69801032T2 DE1998601032 DE69801032T DE69801032T2 DE 69801032 T2 DE69801032 T2 DE 69801032T2 DE 1998601032 DE1998601032 DE 1998601032 DE 69801032 T DE69801032 T DE 69801032T DE 69801032 T2 DE69801032 T2 DE 69801032T2
- Authority
- DE
- Germany
- Prior art keywords
- polysilsesquioxane
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/104—Coating to obtain optical fibres
- C03C25/105—Organic claddings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/104—Coating to obtain optical fibres
- C03C25/106—Single coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/24—Coatings containing organic materials
- C03C25/40—Organo-silicon compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/07—Aldehydes; Ketones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
- C08K5/5317—Phosphonic compounds, e.g. R—P(:O)(OR')2
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2913—Rod, strand, filament or fiber
- Y10T428/2933—Coated or with bond, impregnation or core
- Y10T428/2962—Silane, silicone or siloxane in coating
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/926,210 US5962067A (en) | 1997-09-09 | 1997-09-09 | Method for coating an article with a ladder siloxane polymer and coated article |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69801032D1 DE69801032D1 (de) | 2001-08-09 |
DE69801032T2 true DE69801032T2 (de) | 2002-06-06 |
Family
ID=25452899
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1998601032 Expired - Lifetime DE69801032T2 (de) | 1997-09-09 | 1998-09-01 | Verfahren zur Beschichtung eines Gegenstandes mit einem Polysilsesquioxan |
Country Status (4)
Country | Link |
---|---|
US (2) | US5962067A (de) |
EP (3) | EP1111019A3 (de) |
JP (1) | JP3481467B2 (de) |
DE (1) | DE69801032T2 (de) |
Families Citing this family (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5962067A (en) * | 1997-09-09 | 1999-10-05 | Lucent Technologies Inc. | Method for coating an article with a ladder siloxane polymer and coated article |
US6268457B1 (en) | 1999-06-10 | 2001-07-31 | Allied Signal, Inc. | Spin-on glass anti-reflective coatings for photolithography |
KR100804873B1 (ko) * | 1999-06-10 | 2008-02-20 | 얼라이드시그날 인코퍼레이티드 | 포토리소그래피용 sog 반사방지 코팅 |
KR100371070B1 (ko) * | 1999-12-02 | 2003-02-05 | 한국과학기술연구원 | 폴리지방족방향족실세스퀴옥산 및 그의 제조 방법 |
KR20000063142A (ko) * | 2000-02-17 | 2000-11-06 | 이응찬 | 폴리오르가노실세스키옥산 제조용 출발물질,폴리오르가노실세스키옥산 및 폴리오르가노실세스키옥산제조방법 |
US6891237B1 (en) * | 2000-06-27 | 2005-05-10 | Lucent Technologies Inc. | Organic semiconductor device having an active dielectric layer comprising silsesquioxanes |
US6368400B1 (en) * | 2000-07-17 | 2002-04-09 | Honeywell International | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
US6599995B2 (en) * | 2001-05-01 | 2003-07-29 | Korea Institute Of Science And Technology | Polyalkylaromaticsilsesquioxane and preparation method thereof |
US6856745B2 (en) * | 2002-07-02 | 2005-02-15 | Lucent Technologies Inc. | Waveguide and applications therefor |
US6842577B2 (en) * | 2002-12-02 | 2005-01-11 | Shipley Company L.L.C. | Photoimageable waveguide composition and waveguide formed therefrom |
US7041748B2 (en) | 2003-01-08 | 2006-05-09 | International Business Machines Corporation | Patternable low dielectric constant materials and their use in ULSI interconnection |
US20060004169A1 (en) * | 2003-01-10 | 2006-01-05 | Sherwood Walter J Jr | Ceramic-forming polymer material |
WO2004078866A1 (en) * | 2003-03-07 | 2004-09-16 | Henkel Corporation | Curable coating compositions |
US7297731B2 (en) | 2003-03-11 | 2007-11-20 | 3M Innovative Properties Company | Coating dispersions for optical fibers |
US20050069718A1 (en) * | 2003-09-30 | 2005-03-31 | Voss-Kehl Jessica L. | Printable insulating compositions and printable articles |
US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
US7072564B2 (en) * | 2003-11-25 | 2006-07-04 | Rohm And Haas Electronic Materials Llc | Waveguide compositions and waveguides formed therefrom |
JP5102428B2 (ja) * | 2003-11-25 | 2012-12-19 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 導波路組成物およびこれから形成された導波路 |
EP1586603B1 (de) * | 2004-04-14 | 2007-06-13 | Rohm and Haas Electronic Materials LLC | Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter |
US8901268B2 (en) | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
US20080088051A1 (en) * | 2006-10-16 | 2008-04-17 | Robert Harvey Moffett | Rotational molding paint-ready polyurethane |
KR100834351B1 (ko) * | 2006-11-24 | 2008-06-02 | 제일모직주식회사 | 멀티칩 패키지 밀봉용 에폭시 수지 조성물 및 이를이용한 멀티칩 패키지 |
US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
US8026035B2 (en) * | 2007-03-30 | 2011-09-27 | Cheil Industries, Inc. | Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same |
JP2009215344A (ja) * | 2008-03-07 | 2009-09-24 | Central Glass Co Ltd | 熱硬化性有機無機ハイブリッド透明材料 |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
CN103459027A (zh) * | 2011-03-31 | 2013-12-18 | 道康宁公司 | 包含膦酸酯催化剂的组合物以及制备和使用组合物的方法 |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
US8871425B2 (en) | 2012-02-09 | 2014-10-28 | Az Electronic Materials (Luxembourg) S.A.R.L. | Low dielectric photoimageable compositions and electronic devices made therefrom |
JP6512108B2 (ja) * | 2014-01-31 | 2019-05-15 | 住友化学株式会社 | Uv−led用ポリシルセスキオキサン系封止材組成物及びそのためのリン酸系触媒の使用 |
JP6442041B2 (ja) | 2014-07-29 | 2018-12-19 | オーエフエス ファイテル,エルエルシー | 光ファイバブラッググレーティングの製造のためのuv硬化性シルセスキオキサン含有ライトスルー光ファイバコーティング及びそれから製造されたファイバ |
CN107709614B (zh) * | 2015-03-31 | 2019-08-09 | 日本帕卡濑精株式会社 | 金属材料用表面处理剂和带表面处理被膜的金属材料 |
EP3194502A4 (de) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxanformulierungen und beschichtungen für optoelektronische anwendungen |
WO2018142552A1 (ja) * | 2017-02-02 | 2018-08-09 | 日立化成株式会社 | 繊維処理用の処理剤、繊維及びその製造方法並びに繊維シートの製造方法 |
IT201700089398A1 (it) | 2017-08-03 | 2019-02-03 | Freni Brembo Spa | Preforma per la realizzazione di un componente di impianto frenante, costituita in un materiale composito ceramico fibro-rinforzato ottenuto per formatura e pirolisi di un pre-preg |
US10947412B2 (en) | 2017-12-19 | 2021-03-16 | Honeywell International Inc. | Crack-resistant silicon-based planarizing compositions, methods and films |
US11015082B2 (en) | 2017-12-19 | 2021-05-25 | Honeywell International Inc. | Crack-resistant polysiloxane dielectric planarizing compositions, methods and films |
CN111909527B (zh) * | 2019-05-10 | 2021-09-28 | 中国科学院化学研究所 | 可交联的有机硅组合物及反应产物及制备方法和应用 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3453106A (en) * | 1965-06-21 | 1969-07-01 | Owens Illinois Inc | Compositions exhibiting persistent internal polarization where a photoconductive material is dispersed in a polysiloxane resin derived from trifunctional monomers |
US3450672A (en) * | 1967-01-12 | 1969-06-17 | Gen Electric | Organosilsesquioxanes and a method for making them |
GB1544065A (en) * | 1976-04-09 | 1979-04-11 | Deere & Co | Check valve and internal stop clip therefor |
US4264649A (en) | 1979-12-26 | 1981-04-28 | Corning Glass Works | Method for coating optical waveguide filaments |
JPS56129261A (en) * | 1980-03-17 | 1981-10-09 | Hitachi Ltd | Thin film-forming coating liquid composition |
JPS6356569A (ja) * | 1986-08-27 | 1988-03-11 | Fujitsu Ltd | 耐熱性樹脂塗料 |
US4835057A (en) | 1987-03-25 | 1989-05-30 | At&T Bell Laboratories | Glass fibers having organosilsesquioxane coatings and claddings |
US4981530A (en) | 1988-11-28 | 1991-01-01 | International Business Machines Corporation | Planarizing ladder-type silsesquioxane polymer insulation layer |
US5286572A (en) | 1988-11-28 | 1994-02-15 | International Business Machines Corporation | Planarizing ladder-type silsequioxane polymer insulation layer |
US5052779A (en) * | 1989-07-31 | 1991-10-01 | Sumitomo Electric Industries, Ltd. | Polymer clad optical fiber |
JP2712817B2 (ja) * | 1990-11-15 | 1998-02-16 | 信越化学工業株式会社 | ポリオルガノシロキサン樹脂の製造方法 |
JP3272002B2 (ja) * | 1991-09-02 | 2002-04-08 | 昭和電工株式会社 | ポリオルガノシルセスキオキサンの製造方法 |
US5232548A (en) | 1991-10-29 | 1993-08-03 | International Business Machines Corporation | Discrete fabrication of multi-layer thin film, wiring structures |
US5224265A (en) | 1991-10-29 | 1993-07-06 | International Business Machines Corporation | Fabrication of discrete thin film wiring structures |
JPH06200030A (ja) * | 1992-12-29 | 1994-07-19 | Nippon Zeon Co Ltd | シルセスキオキサンポリマーの製造法 |
EP0701277B1 (de) | 1994-05-27 | 2008-02-27 | Texas Instruments Incorporated | Verbindungsverfahren mit Benutzung eines porösen Isolators zur Reduzierung der Kapazitäten zwischen Leiterbahnen |
US5534731A (en) | 1994-10-28 | 1996-07-09 | Advanced Micro Devices, Incorporated | Layered low dielectric constant technology |
US5550405A (en) | 1994-12-21 | 1996-08-27 | Advanced Micro Devices, Incorporated | Processing techniques for achieving production-worthy, low dielectric, low interconnect resistance and high performance ICS |
JP3542185B2 (ja) * | 1995-02-02 | 2004-07-14 | ダウ コーニング アジア株式会社 | シリコーンレジン、これを含む組成物およびその硬化方法 |
JPH08245792A (ja) * | 1995-03-10 | 1996-09-24 | Mitsubishi Electric Corp | シリコーンラダーポリマー、シリコーンラダープレポリマーおよびそれらの製造方法 |
US5804607A (en) | 1996-03-21 | 1998-09-08 | International Business Machines Corporation | Process for making a foamed elastomeric polymer |
US5726211A (en) | 1996-03-21 | 1998-03-10 | International Business Machines Corporation | Process for making a foamed elastometric polymer |
US5854131A (en) | 1996-06-05 | 1998-12-29 | Advanced Micro Devices, Inc. | Integrated circuit having horizontally and vertically offset interconnect lines |
US5773197A (en) | 1996-10-28 | 1998-06-30 | International Business Machines Corporation | Integrated circuit device and process for its manufacture |
US5895263A (en) | 1996-12-19 | 1999-04-20 | International Business Machines Corporation | Process for manufacture of integrated circuit device |
US5883219A (en) | 1997-05-29 | 1999-03-16 | International Business Machines Corporation | Integrated circuit device and process for its manufacture |
US5962067A (en) * | 1997-09-09 | 1999-10-05 | Lucent Technologies Inc. | Method for coating an article with a ladder siloxane polymer and coated article |
-
1997
- 1997-09-09 US US08/926,210 patent/US5962067A/en not_active Expired - Lifetime
-
1998
- 1998-09-01 EP EP20000126681 patent/EP1111019A3/de not_active Withdrawn
- 1998-09-01 EP EP19980306989 patent/EP0902067B1/de not_active Expired - Lifetime
- 1998-09-01 EP EP20000126680 patent/EP1123955A3/de not_active Withdrawn
- 1998-09-01 DE DE1998601032 patent/DE69801032T2/de not_active Expired - Lifetime
- 1998-09-09 JP JP25489298A patent/JP3481467B2/ja not_active Expired - Fee Related
-
1999
- 1999-07-11 US US09/352,674 patent/US6251486B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH11189437A (ja) | 1999-07-13 |
US6251486B1 (en) | 2001-06-26 |
EP1123955A3 (de) | 2001-09-26 |
US5962067A (en) | 1999-10-05 |
DE69801032D1 (de) | 2001-08-09 |
JP3481467B2 (ja) | 2003-12-22 |
EP1111019A3 (de) | 2001-09-19 |
EP1111019A2 (de) | 2001-06-27 |
EP1123955A2 (de) | 2001-08-16 |
EP0902067B1 (de) | 2001-07-04 |
EP0902067A1 (de) | 1999-03-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69801032T2 (de) | Verfahren zur Beschichtung eines Gegenstandes mit einem Polysilsesquioxan | |
DE794839T1 (de) | Verfahren zur beschichtung einer oberfläche | |
DE19781838T1 (de) | Verfahren zur Beschichtung eines Substrats | |
DE69841545D1 (de) | Verfahren zur übertragung eines dünnfilms mit einem einschlusserzeugungschritt | |
DE69735999D1 (de) | Verfahren zur elektrobeschichtung eines nichtleitenden geformten kunststoffgegenstands | |
DE69304924T2 (de) | Verfahren zur herstellung eines beschichteten schleifmittels mit einem leitenden träger. | |
DE69804058D1 (de) | Verfahren zur Beschichtung eines gedruckten Aufzeichnungsmaterials | |
DE59603566D1 (de) | Verfahren zur mehrschichtlackierung | |
DE69300916T2 (de) | Verfahren zur Herstellung eines beschichteten Schleifmittels. | |
DE69815024D1 (de) | Verfahren zum Beschichten eines Bauelementes | |
DE69611684T2 (de) | Verfahren zur erhöhung der reichweite in einem tdma-system | |
DE69807892T2 (de) | Verfahren zur herstellung eines durchbrochenen artikels zur wiederbeschichtung | |
DE69510206T2 (de) | Verfahren zur abscheidung von pyro-kohlenstoff-beschichtungen in einem fliessbett | |
DE69705262T2 (de) | Verfahren zur Beschichtung eines Gegenstandes mit einer konformen Nickelbeschichtung | |
DE69612091T2 (de) | Verfahren zum beschichten mit einem fotokatalytischen halbleiter | |
DE69806551D1 (de) | Verfahren zur Herstellung eines Mehrschicht-Überzugfilms | |
DE59901823D1 (de) | Verfahren zur beschichtung einer oberfläche mit einem trennmittel | |
DE69526423D1 (de) | Verfahren zur beschichtung eines lumineszenten materials | |
DE69507273T2 (de) | Verfahren zur Bereitstellung einer Beschichtung mit maximalem Glanz | |
ATA170197A (de) | Verfahren zur anpassung eines brennerbeheizten heizgerätes | |
DE69714563D1 (de) | Verfahren zur Beschichtung eines lichtempfindlichen Materials | |
DE69605561D1 (de) | Verfahren zur beschichtung | |
DE69827326D1 (de) | Verfahren zur Herstellung eines bandförmigen Gegenstandes | |
DE69431365D1 (de) | Verfahren zur Beschichtung mittels MOCVD | |
DE69119497T2 (de) | Verfahren zur Beschichtung eines Gegenstandes mit einer Substanz |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de | ||
8370 | Indication of lapse of patent is to be deleted | ||
8364 | No opposition during term of opposition |