DE69827734D1 - Verfahren zur Entfernung von Ozon aus Ansaugluft einer CVD Vorrichtung - Google Patents

Verfahren zur Entfernung von Ozon aus Ansaugluft einer CVD Vorrichtung

Info

Publication number
DE69827734D1
DE69827734D1 DE69827734T DE69827734T DE69827734D1 DE 69827734 D1 DE69827734 D1 DE 69827734D1 DE 69827734 T DE69827734 T DE 69827734T DE 69827734 T DE69827734 T DE 69827734T DE 69827734 D1 DE69827734 D1 DE 69827734D1
Authority
DE
Germany
Prior art keywords
intake air
cvd device
removing ozone
ozone
cvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69827734T
Other languages
English (en)
Other versions
DE69827734T2 (de
Inventor
Chang-Jip Yang
Geun-Mok Youk
Chong-Hyeong Cho
Young-Kyou Park
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Application granted granted Critical
Publication of DE69827734D1 publication Critical patent/DE69827734D1/de
Publication of DE69827734T2 publication Critical patent/DE69827734T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B01D53/0407—Constructional details of adsorbing systems
    • B01D53/0446—Means for feeding or distributing gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
    • B01D46/0036—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions by adsorption or absorption
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/54—Particle separators, e.g. dust precipitators, using ultra-fine filter sheets or diaphragms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/56—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition
    • B01D46/62—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition connected in series
    • B01D46/64—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition connected in series arranged concentrically or coaxially
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B01D2253/102—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2257/00—Components to be removed
    • B01D2257/10—Single element gases other than halogens
    • B01D2257/106—Ozone
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2273/00—Operation of filters specially adapted for separating dispersed particles from gases or vapours
    • B01D2273/30—Means for generating a circulation of a fluid in a filtration system, e.g. using a pump or a fan
DE69827734T 1997-09-30 1998-09-23 Verfahren zur Entfernung von Ozon aus Ansaugluft einer CVD-Vorrichtung Expired - Lifetime DE69827734T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1019970050374A KR19990027844A (ko) 1997-09-30 1997-09-30 반도체장비의 공기유입장치 및 이를 이용한 화학물 오염 제거방법
KR9750374 1997-09-30

Publications (2)

Publication Number Publication Date
DE69827734D1 true DE69827734D1 (de) 2004-12-30
DE69827734T2 DE69827734T2 (de) 2005-12-15

Family

ID=19522033

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69827734T Expired - Lifetime DE69827734T2 (de) 1997-09-30 1998-09-23 Verfahren zur Entfernung von Ozon aus Ansaugluft einer CVD-Vorrichtung

Country Status (5)

Country Link
US (1) US6090188A (de)
EP (1) EP0904826B1 (de)
JP (1) JP4184478B2 (de)
KR (2) KR19990027844A (de)
DE (1) DE69827734T2 (de)

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JP2001135697A (ja) * 1999-11-05 2001-05-18 Sony Corp 基板移載装置および基板の搬送方法
US6440190B1 (en) * 2000-08-16 2002-08-27 Michael E. Goyetche Portable exhaust fan for removing airborne hazardous materials
KR100373843B1 (ko) * 2000-11-02 2003-02-26 (주)영인테크 챔버내 오염물 포집장치
KR20030029247A (ko) * 2001-10-05 2003-04-14 엘지전자 주식회사 Ｉｓ-95ｃ 이중 모드 단말기에서의 루프 필터 회로
KR100437471B1 (ko) * 2002-05-28 2004-06-23 삼성전자주식회사 가스 스크러버
KR100749772B1 (ko) * 2002-12-23 2007-08-17 삼성전자주식회사 공기 정화기
US7531017B2 (en) * 2003-07-28 2009-05-12 Flow Sciences, Inc. Lateral-flow biohazard safety enclosure
US20050108996A1 (en) 2003-11-26 2005-05-26 Latham Steven R. Filter system for an electronic equipment enclosure
US20050229562A1 (en) * 2004-04-16 2005-10-20 Dallas Andrew J Chemical filtration unit incorporating air transportation device
CA2526367A1 (en) 2005-10-19 2007-04-19 Ozone Nation Inc. Ozone distribution system for sports equipment
JP2007122914A (ja) * 2005-10-25 2007-05-17 Sharp Corp 有機エレクトロルミネッセンスディスプレイの製造方法及びそれに用いる製造装置
JP4830769B2 (ja) * 2006-10-06 2011-12-07 パナソニック株式会社 ファンフィルターユニット
KR100900406B1 (ko) * 2007-09-12 2009-06-02 호서대학교 산학협력단 케미컬 필터
US20110000654A1 (en) * 2008-02-26 2011-01-06 Joshi Shailesh N Fan and cooling device
KR100941666B1 (ko) * 2009-02-18 2010-02-11 주식회사 지티사이언 유해 가스 정화 및 중화 장치
US20100132320A1 (en) * 2010-01-27 2010-06-03 Ali Sharifi Air pollution dry cleaning apparatus
US8409337B1 (en) * 2010-06-08 2013-04-02 Aaf-Mcquay Inc. Air handling filtration equipment with adjustable media bed and method of use
US20150375602A1 (en) * 2014-06-27 2015-12-31 Gerald A. Fields Air Filtration Assembly
US20160016102A1 (en) * 2014-07-15 2016-01-21 Charles Weldon Maddox Filtration apparatus for contaminant emitting electronics
KR102488260B1 (ko) * 2016-03-07 2023-01-13 삼성디스플레이 주식회사 증착 장치 및 표시 장치의 제조 방법
US11493212B1 (en) * 2018-03-27 2022-11-08 Clark N. Harper Air filtration and cooling system
KR102151420B1 (ko) 2018-11-27 2020-09-03 주식회사 에코프로 케미컬 필터

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US3577710A (en) * 1968-09-30 1971-05-04 Elliot I Feldman Air-treatment apparatus
JPS56168816A (en) * 1980-05-29 1981-12-25 Nippon Soken Inc Device for preventing evaporation of fuel
JPS5737704U (de) * 1980-07-31 1982-02-27
JPS57148694U (de) * 1982-02-25 1982-09-18
JPS5974825U (ja) * 1982-11-11 1984-05-21 株式会社大林組 移動可能な空気浄化装置
JP2585244B2 (ja) * 1987-02-25 1997-02-26 株式会社日立製作所 薬品処理装置
JPH02126912A (ja) * 1988-11-04 1990-05-15 Shimizu Corp 空気清浄装置及びこれを用いたクリーンルーム
JP2736662B2 (ja) * 1988-11-04 1998-04-02 東芝セラミックス株式会社 半導体ウェーハの曇防止装置
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JPH0711780Y2 (ja) * 1990-02-21 1995-03-22 セイコー電子部品株式会社 清浄送風装置
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JPH0766165A (ja) * 1993-08-23 1995-03-10 Sony Corp 洗浄装置
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JPH08168628A (ja) * 1994-11-29 1996-07-02 Piyuaretsukusu:Kk 多機能エアフィルター及び該フィルターが組込まれた空気循環式クリーンユニット
JP3519212B2 (ja) * 1995-06-13 2004-04-12 高砂熱学工業株式会社 清浄な資材用保管庫
JP3519513B2 (ja) * 1995-07-26 2004-04-19 大日本スクリーン製造株式会社 装置本体部取付け型空調装置
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JPH09153533A (ja) * 1995-12-01 1997-06-10 Mitsubishi Electric Corp 半導体ウエハ保管システムおよびそのシステムを使用した半導体装置の製造方式
JPH09220425A (ja) * 1996-02-15 1997-08-26 Takasago Thermal Eng Co Ltd ケミカルフィルタ
JP3654612B2 (ja) * 1996-09-24 2005-06-02 株式会社ルネサステクノロジ クリーンルーム
JPH10106908A (ja) * 1996-10-01 1998-04-24 Mitsubishi Electric Corp ケミカルフリー乾燥空気の発生装置

Also Published As

Publication number Publication date
EP0904826A3 (de) 1999-05-12
US6090188A (en) 2000-07-18
JPH11114340A (ja) 1999-04-27
KR100311037B1 (ko) 2001-12-17
JP4184478B2 (ja) 2008-11-19
EP0904826B1 (de) 2004-11-24
DE69827734T2 (de) 2005-12-15
KR19990027844A (ko) 1999-04-15
KR19990029349A (ko) 1999-04-26
EP0904826A2 (de) 1999-03-31

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Legal Events

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