DE69834737D1 - Plasmastrahl-verfahren und -vorrichtung zur herstellung von beschichtungen sowie dadurch erhaltene beschichtungen - Google Patents
Plasmastrahl-verfahren und -vorrichtung zur herstellung von beschichtungen sowie dadurch erhaltene beschichtungenInfo
- Publication number
- DE69834737D1 DE69834737D1 DE69834737T DE69834737T DE69834737D1 DE 69834737 D1 DE69834737 D1 DE 69834737D1 DE 69834737 T DE69834737 T DE 69834737T DE 69834737 T DE69834737 T DE 69834737T DE 69834737 D1 DE69834737 D1 DE 69834737D1
- Authority
- DE
- Germany
- Prior art keywords
- coatings
- plasma
- fast method
- producing
- coatings obtained
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/269—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension including synthetic resin or polymer layer or component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/27—Web or sheet containing structurally defined element or component, the element or component having a specified weight per unit area [e.g., gms/sq cm, lbs/sq ft, etc.]
- Y10T428/273—Web or sheet containing structurally defined element or component, the element or component having a specified weight per unit area [e.g., gms/sq cm, lbs/sq ft, etc.] of coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/920,419 US6203898B1 (en) | 1997-08-29 | 1997-08-29 | Article comprising a substrate having a silicone coating |
US920419 | 1997-08-29 | ||
PCT/US1998/017721 WO1999010560A1 (en) | 1997-08-29 | 1998-08-26 | Jet plasma process and apparatus for deposition of coatings and coatings thus obtained |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69834737D1 true DE69834737D1 (de) | 2006-07-06 |
DE69834737T2 DE69834737T2 (de) | 2007-03-01 |
Family
ID=25443719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1998634737 Expired - Lifetime DE69834737T2 (de) | 1997-08-29 | 1998-08-26 | Plasmastrahlverfahren und -vorrichtung zur herstellung von beschichtungen sowi e dadurch erhaltene beschichtungen |
Country Status (10)
Country | Link |
---|---|
US (4) | US6203898B1 (de) |
EP (1) | EP1021592B1 (de) |
JP (1) | JP2001514328A (de) |
KR (1) | KR100623540B1 (de) |
CN (1) | CN1125190C (de) |
AU (1) | AU8921898A (de) |
CA (1) | CA2298697A1 (de) |
DE (1) | DE69834737T2 (de) |
TW (1) | TW453900B (de) |
WO (1) | WO1999010560A1 (de) |
Families Citing this family (109)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6203898B1 (en) * | 1997-08-29 | 2001-03-20 | 3M Innovatave Properties Company | Article comprising a substrate having a silicone coating |
US6045864A (en) | 1997-12-01 | 2000-04-04 | 3M Innovative Properties Company | Vapor coating method |
US6391149B1 (en) * | 1998-06-04 | 2002-05-21 | Advanced Cardiovascular Systems, Inc. | Method and apparatus for concentrating a solute in solution with a solvent |
SE520491C2 (sv) * | 1999-04-07 | 2003-07-15 | Tetra Laval Holdings & Finance | Förpackningslaminat med barriäregenskaper mot gas och aromämnen |
KR100320197B1 (ko) * | 1999-08-21 | 2002-01-10 | 구자홍 | 직류전원 플라즈마중합 연속처리장치 |
US20070196682A1 (en) * | 1999-10-25 | 2007-08-23 | Visser Robert J | Three dimensional multilayer barrier and method of making |
US6866901B2 (en) * | 1999-10-25 | 2005-03-15 | Vitex Systems, Inc. | Method for edge sealing barrier films |
US20100330748A1 (en) | 1999-10-25 | 2010-12-30 | Xi Chu | Method of encapsulating an environmentally sensitive device |
US7198832B2 (en) * | 1999-10-25 | 2007-04-03 | Vitex Systems, Inc. | Method for edge sealing barrier films |
US6623861B2 (en) * | 2001-04-16 | 2003-09-23 | Battelle Memorial Institute | Multilayer plastic substrates |
US6413645B1 (en) | 2000-04-20 | 2002-07-02 | Battelle Memorial Institute | Ultrabarrier substrates |
US20090191342A1 (en) * | 1999-10-25 | 2009-07-30 | Vitex Systems, Inc. | Method for edge sealing barrier films |
US6674140B2 (en) * | 2000-02-01 | 2004-01-06 | Analog Devices, Inc. | Process for wafer level treatment to reduce stiction and passivate micromachined surfaces and compounds used therefor |
US6573030B1 (en) * | 2000-02-17 | 2003-06-03 | Applied Materials, Inc. | Method for depositing an amorphous carbon layer |
US6749813B1 (en) | 2000-03-05 | 2004-06-15 | 3M Innovative Properties Company | Fluid handling devices with diamond-like films |
US6696157B1 (en) | 2000-03-05 | 2004-02-24 | 3M Innovative Properties Company | Diamond-like glass thin films |
US6795636B1 (en) | 2000-03-05 | 2004-09-21 | 3M Innovative Properties Company | Radiation-transmissive films on glass articles |
WO2002032591A2 (en) * | 2000-10-19 | 2002-04-25 | Picosep A/S | A material useful for the separation of organic compounds, processes for its preparation and use of the material |
US9255329B2 (en) * | 2000-12-06 | 2016-02-09 | Novellus Systems, Inc. | Modulated ion-induced atomic layer deposition (MII-ALD) |
DE10104613A1 (de) * | 2001-02-02 | 2002-08-22 | Bosch Gmbh Robert | Plasmaanlage und Verfahren zur Erzeugung einer Funktionsbeschichtung |
US7085616B2 (en) * | 2001-07-27 | 2006-08-01 | Applied Materials, Inc. | Atomic layer deposition apparatus |
US7106939B2 (en) | 2001-09-19 | 2006-09-12 | 3M Innovative Properties Company | Optical and optoelectronic articles |
US20090208754A1 (en) * | 2001-09-28 | 2009-08-20 | Vitex Systems, Inc. | Method for edge sealing barrier films |
EP1448807A4 (de) * | 2001-10-30 | 2005-07-13 | Massachusetts Inst Technology | Fluorkohlenstoff-organosilicium-copolymere und nach dem hfcvd-verfahren hergestellte überzüge |
US8765484B2 (en) * | 2002-02-07 | 2014-07-01 | The Regents Of The University Of California | Optically encoded particles |
US7931787B2 (en) * | 2002-02-26 | 2011-04-26 | Donald Bennett Hilliard | Electron-assisted deposition process and apparatus |
US6541397B1 (en) * | 2002-03-29 | 2003-04-01 | Applied Materials, Inc. | Removable amorphous carbon CMP stop |
US6878418B2 (en) * | 2002-03-29 | 2005-04-12 | Seagate Technology Llc | Method for making zone-bonded lubricant layer for magnetic hard discs |
US8808457B2 (en) | 2002-04-15 | 2014-08-19 | Samsung Display Co., Ltd. | Apparatus for depositing a multilayer coating on discrete sheets |
US8900366B2 (en) * | 2002-04-15 | 2014-12-02 | Samsung Display Co., Ltd. | Apparatus for depositing a multilayer coating on discrete sheets |
CN100335376C (zh) * | 2002-04-26 | 2007-09-05 | 北海制罐株式会社 | 内表面经涂覆的塑料容器及其制造方法 |
US6808745B2 (en) * | 2002-08-22 | 2004-10-26 | Eastman Kodak Company | Method of coating micro-electromechanical devices |
US7344505B2 (en) * | 2002-10-15 | 2008-03-18 | Transoma Medical, Inc. | Barriers and methods for pressure measurement catheters |
CN1723741B (zh) * | 2002-12-12 | 2012-09-05 | 株式会社半导体能源研究所 | 发光装置、制造装置、成膜方法及清洁方法 |
US7648925B2 (en) * | 2003-04-11 | 2010-01-19 | Vitex Systems, Inc. | Multilayer barrier stacks and methods of making multilayer barrier stacks |
US7510913B2 (en) * | 2003-04-11 | 2009-03-31 | Vitex Systems, Inc. | Method of making an encapsulated plasma sensitive device |
CA2460296C (en) * | 2003-05-23 | 2012-02-14 | Sulzer Metco Ag | A hybrid method for the coating of a substrate by a thermal application of the coating |
JP3844755B2 (ja) * | 2003-08-27 | 2006-11-15 | Tdk株式会社 | 磁気記録媒体の製造方法 |
US20050079278A1 (en) * | 2003-10-14 | 2005-04-14 | Burrows Paul E. | Method and apparatus for coating an organic thin film on a substrate from a fluid source with continuous feed capability |
AU2004286265A1 (en) * | 2003-10-29 | 2005-05-12 | Ribomed Biotechnologies, Inc. | Compositions, methods and detection technologies for reiterative oligonucleotide synthesis |
US7638440B2 (en) * | 2004-03-12 | 2009-12-29 | Applied Materials, Inc. | Method of depositing an amorphous carbon film for etch hardmask application |
JP4879159B2 (ja) * | 2004-03-05 | 2012-02-22 | アプライド マテリアルズ インコーポレイテッド | アモルファス炭素膜堆積のためのcvdプロセス |
US20050271799A1 (en) * | 2004-06-02 | 2005-12-08 | Fuji Photo Film Co., Ltd. | Method for producing magnetic recording medium |
US20060002234A1 (en) * | 2004-06-30 | 2006-01-05 | Lobe Henry J | Anti-biofouling seismic streamer casing and method of manufacture |
US8377147B2 (en) * | 2004-07-19 | 2013-02-19 | The Regents Of The University Of California | Control of materials and porous magnetic particles |
WO2008027090A2 (en) * | 2006-05-17 | 2008-03-06 | The Regents Of The University Of California | Control of materials and porous magnetic particles |
US7645492B2 (en) * | 2004-07-30 | 2010-01-12 | Exatec Llc | Plasma coating system for accommodating substrates of different shapes |
DE102004041905A1 (de) * | 2004-08-30 | 2006-03-02 | Infineon Technologies Ag | Reaktiver Sputterprozess zur Optimierung der thermischen Stabilität dünner Chalkogenidschichten |
DE102004057762B4 (de) * | 2004-11-30 | 2010-11-11 | Advanced Micro Devices Inc., Sunnyvale | Verfahren zur Herstellung einer Halbleiterstruktur mit Ausbilden eines Feldeffekttransistors mit einem verspannten Kanalgebiet |
WO2006116841A1 (en) * | 2005-04-29 | 2006-11-09 | National Research Council Of Canada | Method of on-line thickness measurement of applied coatings |
US20070020451A1 (en) * | 2005-07-20 | 2007-01-25 | 3M Innovative Properties Company | Moisture barrier coatings |
US7767498B2 (en) | 2005-08-25 | 2010-08-03 | Vitex Systems, Inc. | Encapsulated devices and method of making |
EP1969618B1 (de) * | 2005-12-29 | 2018-01-24 | 3M Innovative Properties Company | Verfahren zum atomisieren von material für beschichtungsprozesse |
CA2582312C (en) * | 2006-05-05 | 2014-05-13 | Sulzer Metco Ag | A method for the manufacture of a coating |
US20070286954A1 (en) * | 2006-06-13 | 2007-12-13 | Applied Materials, Inc. | Methods for low temperature deposition of an amorphous carbon layer |
KR100761000B1 (ko) * | 2006-06-30 | 2007-10-04 | 한국과학기술연구원 | 가스분산 플라즈마 스프레이 코팅법에 의한 탄소복합체의제조방법과 이를 이용한 이차전지 음극소재로서의 응용 |
US8088502B2 (en) * | 2006-09-20 | 2012-01-03 | Battelle Memorial Institute | Nanostructured thin film optical coatings |
US20100068542A1 (en) * | 2006-12-29 | 2010-03-18 | 3M Innovative Properties Company | Method of making inorganic or inorganic/organic hybrid films |
US8241713B2 (en) * | 2007-02-21 | 2012-08-14 | 3M Innovative Properties Company | Moisture barrier coatings for organic light emitting diode devices |
KR20090126273A (ko) * | 2007-03-28 | 2009-12-08 | 다우 코닝 코포레이션 | 실리콘 및 탄소를 함유하는 장벽층의 롤투롤 플라즈마 화학 기상 증착법 |
US20080254233A1 (en) * | 2007-04-10 | 2008-10-16 | Kwangduk Douglas Lee | Plasma-induced charge damage control for plasma enhanced chemical vapor deposition processes |
US7649316B2 (en) * | 2007-07-13 | 2010-01-19 | Micron Technology, Inc. | Assemblies for plasma-enhanced treatment of substrates |
US20090061649A1 (en) * | 2007-08-28 | 2009-03-05 | International Business Machines Corporation | LOW k POROUS SiCOH DIELECTRIC AND INTEGRATION WITH POST FILM FORMATION TREATMENT |
US20090093128A1 (en) * | 2007-10-08 | 2009-04-09 | Martin Jay Seamons | Methods for high temperature deposition of an amorphous carbon layer |
EP2088612A1 (de) * | 2007-12-21 | 2009-08-12 | Applied Materials, Inc. | Verfahren zur Erhitzung oder Reinigung einer Materialbahn oder einer Folie |
CN101909873B (zh) * | 2007-12-28 | 2016-10-19 | 3M创新有限公司 | 用于阳光控制及其它用途的红外线反射膜 |
CN104327758A (zh) * | 2007-12-28 | 2015-02-04 | 3M创新有限公司 | 柔性封装膜系统 |
US20090263668A1 (en) * | 2008-04-21 | 2009-10-22 | 3M Innovative Properties Company | Durable coating of an oligomer and methods of applying |
US20090269923A1 (en) * | 2008-04-25 | 2009-10-29 | Lee Sang M | Adhesion and electromigration improvement between dielectric and conductive layers |
DE102008022145B4 (de) * | 2008-05-05 | 2015-03-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zum Hochleistungs-Puls-Gasfluß-Sputtern |
KR20110033210A (ko) * | 2008-06-30 | 2011-03-30 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 무기 또는 무기/유기 혼성 장벽 필름 제조 방법 |
US9337446B2 (en) * | 2008-12-22 | 2016-05-10 | Samsung Display Co., Ltd. | Encapsulated RGB OLEDs having enhanced optical output |
US9184410B2 (en) | 2008-12-22 | 2015-11-10 | Samsung Display Co., Ltd. | Encapsulated white OLEDs having enhanced optical output |
US20100167002A1 (en) * | 2008-12-30 | 2010-07-01 | Vitex Systems, Inc. | Method for encapsulating environmentally sensitive devices |
PL2401232T3 (pl) * | 2009-02-24 | 2016-10-31 | Bezpośrednie napylanie próżniowe wspomagane plazmą z współosiowej drążonej katody i związany z nim sposób | |
US8030226B2 (en) * | 2009-04-10 | 2011-10-04 | Kimberly-Clark Worldwide, Inc. | Wet wipes having a liquid wipe composition with anti-adhesion component |
KR20120106953A (ko) | 2009-11-18 | 2012-09-27 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 다층 광학 필름 |
US20110151222A1 (en) * | 2009-12-22 | 2011-06-23 | Agc Flat Glass North America, Inc. | Anti-reflective coatings and methods of making the same |
US8590338B2 (en) | 2009-12-31 | 2013-11-26 | Samsung Mobile Display Co., Ltd. | Evaporator with internal restriction |
CN102918177B (zh) * | 2010-05-31 | 2015-09-09 | 株式会社捷太格特 | 覆盖部件的制造方法 |
JP5042343B2 (ja) * | 2010-06-18 | 2012-10-03 | 株式会社豊田中央研究所 | 成膜方法及び成膜装置 |
US9997657B2 (en) | 2010-07-02 | 2018-06-12 | 3M Innovative Properties Company | Barrier assembly |
US9254506B2 (en) | 2010-07-02 | 2016-02-09 | 3M Innovative Properties Company | Moisture resistant coating for barrier films |
KR20170137207A (ko) | 2010-10-06 | 2017-12-12 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 나노실리카계 코팅 및 배리어층을 갖는 반사방지 물품 |
KR102115937B1 (ko) | 2010-10-06 | 2020-05-27 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 나노실리카계 코팅을 갖는 반사방지 물품 |
US9321254B2 (en) | 2010-12-08 | 2016-04-26 | 3M Innovative Properties Company | Article and method of making and using the same |
US9653327B2 (en) | 2011-05-12 | 2017-05-16 | Applied Materials, Inc. | Methods of removing a material layer from a substrate using water vapor treatment |
CN103732337B (zh) * | 2011-08-26 | 2017-03-08 | 埃克阿泰克有限责任公司 | 有机树脂层压板、制造和使用该有机树脂层压板的方法 |
US9440164B2 (en) | 2011-09-14 | 2016-09-13 | Aquasource Technologies Corporation | System and method for water treatment |
CN102333410B (zh) * | 2011-09-16 | 2013-02-06 | 西安交通大学 | 一种用于刻蚀光阻材料的大气压冷等离子体射流装置 |
KR101985053B1 (ko) | 2012-03-27 | 2019-05-31 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 광 지향 매체를 포함하는 광기전 모듈 및 이를 제조하는 방법 |
DE102012009801A1 (de) * | 2012-05-16 | 2013-11-21 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung und Verfahren zum Beschichten elektrisch leitfähiger Faserwerkstoffe |
JP5973790B2 (ja) * | 2012-05-28 | 2016-08-23 | 株式会社中山アモルファス | 耐食性、導電性、成形性に優れた薄板およびその製造方法 |
TWI610806B (zh) | 2012-08-08 | 2018-01-11 | 3M新設資產公司 | 障壁膜,製造該障壁膜之方法,及包含該障壁膜之物件 |
WO2014160886A2 (en) * | 2013-03-27 | 2014-10-02 | Washington State University | Systems and methods for treating material surfaces |
CN103342573B (zh) * | 2013-07-10 | 2014-07-02 | 航天材料及工艺研究所 | 一种金刚石薄膜增强碳/碳复合材料热导率的方法 |
US9476485B2 (en) * | 2014-03-14 | 2016-10-25 | Ford Global Technologies, Llc | Diamond-like carbon coating on chain guides and tensioning arms for internal combustion engines |
DE102014113899A1 (de) * | 2014-09-25 | 2016-03-31 | Von Ardenne Gmbh | Verfahren und Vorrichtung zur homogenen Beschichtung dielektrischer Substrate |
EP3362744A4 (de) | 2015-10-12 | 2019-06-12 | 3M Innovative Properties Company | Mit solarmodulen nutzbare lichtumleitende folie |
US11679412B2 (en) | 2016-06-13 | 2023-06-20 | Gvd Corporation | Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles |
WO2017218561A1 (en) | 2016-06-13 | 2017-12-21 | Gvd Coproraton | Methods for plasma depositing polymers comprising cyclic siloxanes and related compositions and articles |
US10487403B2 (en) * | 2016-12-13 | 2019-11-26 | Silcotek Corp | Fluoro-containing thermal chemical vapor deposition process and article |
GB201717996D0 (en) * | 2017-10-31 | 2017-12-13 | Portal Medical Ltd | Medicament dispenser device |
AU2019213710B2 (en) | 2018-01-30 | 2021-08-12 | 3M Innovative Properties Company | Light redirecting device and solar cell module comprising said device |
CN108410372B (zh) * | 2018-04-03 | 2021-03-16 | 苏州睿研纳米医学科技有限公司 | 硅橡胶的粘接方法及硅橡胶粘接件 |
WO2020044240A1 (en) | 2018-08-31 | 2020-03-05 | 3M Innovative Properties Company | Light redirecting film having stray-light mitigation properties useful with solar modules |
US20200354826A1 (en) * | 2019-05-08 | 2020-11-12 | Intevac, Inc. | Method to produce high density diamond like carbon thin films |
CN110241397B (zh) * | 2019-07-24 | 2023-06-23 | 安徽贝意克设备技术有限公司 | 一种卧式多层磁控镀膜复合cvd设备及其工作方法 |
CN114616373A (zh) * | 2019-09-23 | 2022-06-10 | 旭硝子欧洲玻璃公司 | 带有碳基涂层的织物基材及其制造方法 |
Family Cites Families (109)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3475307A (en) * | 1965-02-04 | 1969-10-28 | Continental Can Co | Condensation of monomer vapors to increase polymerization rates in a glow discharge |
GB1168641A (en) * | 1966-05-19 | 1969-10-29 | British Iron Steel Research | Formation of Polymer Coatings on Substrates. |
US3503859A (en) | 1967-05-02 | 1970-03-31 | Nat Distillers Chem Corp | Corona discharge treatment of polymer film to increase the adhesion characteristics thereof |
US3585434A (en) | 1968-01-24 | 1971-06-15 | Hitachi Ltd | Plasma jet generating apparatus |
US3652325A (en) | 1968-12-13 | 1972-03-28 | Air Reduction | Vapor deposition process |
US3569661A (en) | 1969-06-09 | 1971-03-09 | Air Prod & Chem | Method and apparatus for establishing a cathode stabilized (collimated) plasma arc |
US3641973A (en) | 1970-11-25 | 1972-02-15 | Air Reduction | Vacuum coating apparatus |
US3783227A (en) | 1971-04-15 | 1974-01-01 | M Aitken | Fully energized plasma jet |
US3754117A (en) | 1971-12-08 | 1973-08-21 | Anvar | Device for corona treatment of a layer of plastic material |
US3883679A (en) | 1973-08-08 | 1975-05-13 | Airco Inc | Vapor source assembly |
US4166018A (en) | 1974-01-31 | 1979-08-28 | Airco, Inc. | Sputtering process and apparatus |
US4046659A (en) | 1974-05-10 | 1977-09-06 | Airco, Inc. | Method for coating a substrate |
US4013532A (en) | 1975-03-03 | 1977-03-22 | Airco, Inc. | Method for coating a substrate |
US4006268A (en) | 1975-03-17 | 1977-02-01 | Airco, Inc. | Vapor collimation in vacuum deposition of coatings |
US4076866A (en) | 1975-03-30 | 1978-02-28 | Massachusetts Institute Of Technology | Method of growing films by flash vaporization |
US4065097A (en) | 1976-05-17 | 1977-12-27 | Airco, Inc. | Slot sealing valve for vacuum coating apparatus |
GB1582231A (en) | 1976-08-13 | 1981-01-07 | Nat Res Dev | Application of a layer of carbonaceous material to a surface |
DE2941908C2 (de) | 1979-10-17 | 1986-07-03 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zum Herstellen einer eine Silizium-Schicht aufweisenden Solarzelle |
US4290384A (en) | 1979-10-18 | 1981-09-22 | The Perkin-Elmer Corporation | Coating apparatus |
SU924063A1 (ru) | 1980-01-09 | 1982-04-30 | Inst Elektroniki Im U A Arifov | Способ изготовления селективной мембраны i ♦ |
JPS5711448A (en) | 1980-06-23 | 1982-01-21 | Toshiba Corp | Hollow cathode discharge device |
JPS57134558A (en) | 1981-02-16 | 1982-08-19 | Fuji Photo Film Co Ltd | Production of organic vapor deposited thin film |
US4702963A (en) | 1981-04-03 | 1987-10-27 | Optical Coating Laboratory, Inc. | Flexible polymer film with vapor impermeable coating |
JPS57208181A (en) | 1981-06-17 | 1982-12-21 | Hitachi Ltd | Manufacture of photoelectric conversion film |
US4434188A (en) | 1981-12-17 | 1984-02-28 | National Institute For Researches In Inorganic Materials | Method for synthesizing diamond |
JPS58162194A (ja) | 1982-03-23 | 1983-09-26 | Ulvac Corp | 音響用振動板 |
US4407712A (en) | 1982-06-01 | 1983-10-04 | The United States Of America As Represented By The Secretary Of The Army | Hollow cathode discharge source of metal vapor |
GB2122224B (en) | 1982-06-23 | 1986-06-11 | Atomic Energy Authority Uk | Ion beam carbon layers |
US4486286A (en) | 1982-09-28 | 1984-12-04 | Nerken Research Corp. | Method of depositing a carbon film on a substrate and products obtained thereby |
DE3316693A1 (de) | 1983-05-06 | 1984-11-08 | Leybold-Heraeus GmbH, 5000 Köln | Verfahren zum herstellen von amorphen kohlenstoffschichten auf substraten und durch das verfahren beschichtete substrate |
US4557946A (en) | 1983-06-03 | 1985-12-10 | Edward Sacher | Moisture impermeability or organosilicone films |
DE3335623A1 (de) | 1983-09-30 | 1985-04-11 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung einer kohlenstoff enthaltenden schicht, kohlenstoff enthaltende schicht, verwendung einer kohlenstoff enthaltenden schicht und vorrichtung zur durchfuehrung eines verfahrens zur herstellung einer kohlenstoff enthaltenden schicht |
US4526833A (en) | 1983-10-03 | 1985-07-02 | Minnesota Mining And Manufacturing Company | Magnetic recording medium having a perfluoropolyether polymer protective coating |
US4490774A (en) | 1983-12-19 | 1984-12-25 | General Electric Company | Capacitors containing polyfunctional acrylate polymers as dielectrics |
US5097800A (en) | 1983-12-19 | 1992-03-24 | Spectrum Control, Inc. | High speed apparatus for forming capacitors |
US4533710A (en) | 1983-12-19 | 1985-08-06 | General Electric Company | 1,2-Alkanediol diacrylate monomers and polymers thereof useful as capacitor dielectrics |
US5018048A (en) | 1983-12-19 | 1991-05-21 | Spectrum Control, Inc. | Miniaturized monolithic multi-layer capacitor and apparatus and method for making |
US5125138A (en) | 1983-12-19 | 1992-06-30 | Spectrum Control, Inc. | Miniaturized monolithic multi-layer capacitor and apparatus and method for making same |
US4515931A (en) | 1983-12-19 | 1985-05-07 | General Electric Company | Polyfunctional acrylate monomers and polymers thereof useful as capacitor dielectrics |
US5032461A (en) | 1983-12-19 | 1991-07-16 | Spectrum Control, Inc. | Method of making a multi-layered article |
US4698256A (en) | 1984-04-02 | 1987-10-06 | American Cyanamid Company | Articles coated with adherent diamondlike carbon films |
DE3413019A1 (de) | 1984-04-06 | 1985-10-17 | Robert Bosch Gmbh, 7000 Stuttgart | Verfahren zum aufbringen einer duennen, transparenten schicht auf der oberflaeche optischer elemente |
US4647818A (en) | 1984-04-16 | 1987-03-03 | Sfe Technologies | Nonthermionic hollow anode gas discharge electron beam source |
US4490229A (en) | 1984-07-09 | 1984-12-25 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Deposition of diamondlike carbon films |
US4645977A (en) | 1984-08-31 | 1987-02-24 | Matsushita Electric Industrial Co., Ltd. | Plasma CVD apparatus and method for forming a diamond like carbon film |
US4770940A (en) | 1984-09-10 | 1988-09-13 | Ovonic Synthetic Materials Company | Glow discharge method of applying a carbon coating onto a substrate and coating applied thereby |
US4663183A (en) | 1984-09-10 | 1987-05-05 | Energy Conversion Devices, Inc. | Glow discharge method of applying a carbon coating onto a substrate |
EP0242460A1 (de) | 1985-01-18 | 1987-10-28 | SPECTRUM CONTROL, INC. (a Pennsylvania corporation) | Zerstäuber zum Verdampfen eines Monomers |
JPS61210518A (ja) | 1985-03-13 | 1986-09-18 | Matsushita Electric Ind Co Ltd | 磁気記録媒体の製造方法 |
US4725345A (en) | 1985-04-22 | 1988-02-16 | Kabushiki Kaisha Kenwood | Method for forming a hard carbon thin film on article and applications thereof |
US4603082A (en) | 1985-04-29 | 1986-07-29 | Rca Corporation | Diamond-like film |
US4666784A (en) | 1985-07-26 | 1987-05-19 | Toyo Boseki Kabushiki Kaisha | Magnetic recording medium |
US4755426A (en) | 1986-01-18 | 1988-07-05 | Hitachi Maxell, Ltd. | Magnetic recording medium and production of the same |
JPS62183023A (ja) | 1986-02-05 | 1987-08-11 | Tdk Corp | 磁気記録媒体 |
US4804590A (en) | 1986-02-06 | 1989-02-14 | Nihon Shinku Gijutsu Kabushiki Kaisha | Abrasion resistant magnetic recording member |
US4833031A (en) | 1986-03-20 | 1989-05-23 | Matsushita Electric Industrial Co., Ltd. | Magnetic recording medium |
JPH07114016B2 (ja) | 1986-06-12 | 1995-12-06 | 株式会社東芝 | 磁気記録媒体及びその製造方法 |
US4954371A (en) | 1986-06-23 | 1990-09-04 | Spectrum Control, Inc. | Flash evaporation of monomer fluids |
JP2582553B2 (ja) | 1986-07-04 | 1997-02-19 | キヤノン株式会社 | プラズマcvd法による機能性堆積膜形成装置 |
JPS6326827A (ja) | 1986-07-21 | 1988-02-04 | Hitachi Ltd | 磁気記録媒体の製造方法 |
US4756964A (en) | 1986-09-29 | 1988-07-12 | The Dow Chemical Company | Barrier films having an amorphous carbon coating and methods of making |
JPS63107898A (ja) | 1986-10-23 | 1988-05-12 | Natl Inst For Res In Inorg Mater | プラズマを用いるダイヤモンドの合成法 |
US4861662A (en) | 1987-02-03 | 1989-08-29 | Akashic Memories Corporation | Protective layer for magnetic disk |
US4933300A (en) | 1987-02-12 | 1990-06-12 | Hideomi Koinuma | Process for forming multilayer thin film |
US5238705A (en) | 1987-02-24 | 1993-08-24 | Semiconductor Energy Laboratory Co., Ltd. | Carbonaceous protective films and method of depositing the same |
IT1204006B (it) | 1987-05-05 | 1989-02-23 | Eniricerche Spa | Procedimento per la preparazione di film poliolefinici metallizzabili |
ZA884511B (en) | 1987-07-15 | 1989-03-29 | Boc Group Inc | Method of plasma enhanced silicon oxide deposition |
US4847469A (en) | 1987-07-15 | 1989-07-11 | The Boc Group, Inc. | Controlled flow vaporizer |
US4888199A (en) | 1987-07-15 | 1989-12-19 | The Boc Group, Inc. | Plasma thin film deposition process |
US5230931A (en) | 1987-08-10 | 1993-07-27 | Semiconductor Energy Laboratory Co., Ltd. | Plasma-assisted cvd of carbonaceous films by using a bias voltage |
US4935303A (en) | 1987-10-15 | 1990-06-19 | Canon Kabushiki Kaisha | Novel diamond-like carbon film and process for the production thereof |
US4932331A (en) | 1987-10-16 | 1990-06-12 | Canon Kabushiki Kaisha | Novel single-bond carbon film and process for the production thereof |
US5009924A (en) | 1987-10-19 | 1991-04-23 | Energy Sciences Inc. | Process to permit improvement of functional properties of polyolefin articles by electron-beam initiated polymerization |
US5270028A (en) | 1988-02-01 | 1993-12-14 | Sumitomo Electric Industries, Ltd. | Diamond and its preparation by chemical vapor deposition method |
FR2631346B1 (fr) | 1988-05-11 | 1994-05-20 | Air Liquide | Revetement protecteur multicouche pour substrat, procede de protection de substrat par depot par plasma d'un tel revetement, revetements obtenus et leurs applications |
US5016565A (en) | 1988-09-01 | 1991-05-21 | Canon Kabushiki Kaisha | Microwave plasma chemical vapor deposition apparatus for forming functional deposited film with means for stabilizing plasma discharge |
US5185179A (en) | 1988-10-11 | 1993-02-09 | Semiconductor Energy Laboratory Co., Ltd. | Plasma processing method and products thereof |
US4948485A (en) * | 1988-11-23 | 1990-08-14 | Plasmacarb Inc. | Cascade arc plasma torch and a process for plasma polymerization |
IT1227877B (it) | 1988-11-25 | 1991-05-14 | Eniricerche S P A Agip S P A | Procedimento per la deposizione via plasma di strati multipli dimate riale amorfo a composizione variabile |
US5077135A (en) | 1989-04-12 | 1991-12-31 | Energy Sciences Inc. | Siloxane polymers and copolymers as barrier coatings and method of producing barrier coating properties therewith |
US5017403A (en) | 1989-04-13 | 1991-05-21 | Massachusetts Institute Of Technology | Process for forming planarized films |
US5002794A (en) | 1989-08-31 | 1991-03-26 | The Board Of Regents Of The University Of Washington | Method of controlling the chemical structure of polymeric films by plasma |
US5068124A (en) | 1989-11-17 | 1991-11-26 | International Business Machines Corporation | Method for depositing high quality silicon dioxide by pecvd |
JPH0721858B2 (ja) | 1989-12-11 | 1995-03-08 | 松下電器産業株式会社 | 磁気記録媒体およびその製造方法 |
DE3941202A1 (de) | 1989-12-14 | 1990-06-07 | Krupp Gmbh | Verfahren zur erzeugung von schichten aus harten kohlenstoffmodifikationen und vorrichtung zur durchfuehrung des verfahrens |
US5091208A (en) | 1990-03-05 | 1992-02-25 | Wayne State University | Novel susceptor for use in chemical vapor deposition apparatus and its method of use |
US5052339A (en) | 1990-10-16 | 1991-10-01 | Air Products And Chemicals, Inc. | Radio frequency plasma enhanced chemical vapor deposition process and reactor |
US5215822A (en) | 1991-03-01 | 1993-06-01 | Energy Sciences, Inc. | Method of imbuing organic polymer films with improved gas impermeability characteristics and improved barrier coatings therefor |
US5204145A (en) | 1991-03-04 | 1993-04-20 | General Electric Company | Apparatus for producing diamonds by chemical vapor deposition and articles produced therefrom |
US5198263A (en) | 1991-03-15 | 1993-03-30 | The United States Of America As Represented By The United States Department Of Energy | High rate chemical vapor deposition of carbon films using fluorinated gases |
US5314540A (en) | 1991-03-22 | 1994-05-24 | Nippondenso Co., Ltd. | Apparatus for forming diamond film |
JPH07109034B2 (ja) | 1991-04-08 | 1995-11-22 | ワイケイケイ株式会社 | 硬質多層膜形成体およびその製造方法 |
US5342660A (en) * | 1991-05-10 | 1994-08-30 | Celestech, Inc. | Method for plasma jet deposition |
JPH0525648A (ja) | 1991-07-15 | 1993-02-02 | Matsushita Electric Ind Co Ltd | プラズマcvd成膜方法 |
US5286534A (en) | 1991-12-23 | 1994-02-15 | Minnesota Mining And Manufacturing Company | Process for plasma deposition of a carbon rich coating |
US5232791A (en) | 1991-12-23 | 1993-08-03 | Minnesota Mining And Manufacturing Company | Magnetic recording medium having a carbon rich coating |
JP3008666B2 (ja) | 1992-04-30 | 2000-02-14 | 松下電器産業株式会社 | 金属薄膜型磁気記録媒体の製造方法 |
US5565249A (en) * | 1992-05-07 | 1996-10-15 | Fujitsu Limited | Method for producing diamond by a DC plasma jet |
DE4239511A1 (de) | 1992-11-25 | 1994-05-26 | Leybold Ag | Verfahren und Vorrichtung zum Beschichten von Substraten |
US5298587A (en) | 1992-12-21 | 1994-03-29 | The Dow Chemical Company | Protective film for articles and method |
CA2112308C (en) | 1993-01-22 | 2000-08-15 | Louis K. Bigelow | Method of making white diamond film |
JPH06340023A (ja) * | 1993-06-02 | 1994-12-13 | Toyobo Co Ltd | バリア性包装袋 |
US5457298A (en) | 1993-07-27 | 1995-10-10 | Tulip Memory Systems, Inc. | Coldwall hollow-cathode plasma device for support of gas discharges |
US5440446A (en) * | 1993-10-04 | 1995-08-08 | Catalina Coatings, Inc. | Acrylate coating material |
JP3700177B2 (ja) * | 1993-12-24 | 2005-09-28 | セイコーエプソン株式会社 | 大気圧プラズマ表面処理装置 |
US5464667A (en) | 1994-08-16 | 1995-11-07 | Minnesota Mining And Manufacturing Company | Jet plasma process and apparatus |
JP3440714B2 (ja) * | 1995-12-11 | 2003-08-25 | ソニー株式会社 | シリコン化合物系絶縁膜の成膜方法 |
US6203898B1 (en) * | 1997-08-29 | 2001-03-20 | 3M Innovatave Properties Company | Article comprising a substrate having a silicone coating |
TW540248B (en) | 2000-07-19 | 2003-07-01 | Koninkl Philips Electronics Nv | Method and device for generating a multiplexed MPEG signal |
-
1997
- 1997-08-29 US US08/920,419 patent/US6203898B1/en not_active Expired - Lifetime
-
1998
- 1998-08-26 CA CA 2298697 patent/CA2298697A1/en not_active Abandoned
- 1998-08-26 CN CN98808670A patent/CN1125190C/zh not_active Expired - Fee Related
- 1998-08-26 DE DE1998634737 patent/DE69834737T2/de not_active Expired - Lifetime
- 1998-08-26 JP JP2000507863A patent/JP2001514328A/ja active Pending
- 1998-08-26 EP EP19980941074 patent/EP1021592B1/de not_active Expired - Lifetime
- 1998-08-26 AU AU89218/98A patent/AU8921898A/en not_active Abandoned
- 1998-08-26 WO PCT/US1998/017721 patent/WO1999010560A1/en active IP Right Grant
- 1998-08-26 KR KR1020007002023A patent/KR100623540B1/ko not_active IP Right Cessation
- 1998-08-28 TW TW87114305A patent/TW453900B/zh active
-
2001
- 2001-01-12 US US09/759,803 patent/US6348237B2/en not_active Expired - Lifetime
- 2001-10-22 US US10/014,267 patent/US20020102361A1/en not_active Abandoned
-
2004
- 2004-08-02 US US10/909,735 patent/US7189436B2/en not_active Expired - Fee Related
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EP1021592A1 (de) | 2000-07-26 |
US6348237B2 (en) | 2002-02-19 |
WO1999010560A1 (en) | 1999-03-04 |
TW453900B (en) | 2001-09-11 |
CN1125190C (zh) | 2003-10-22 |
EP1021592B1 (de) | 2006-05-31 |
KR20010023383A (ko) | 2001-03-26 |
CA2298697A1 (en) | 1999-03-04 |
US20020102361A1 (en) | 2002-08-01 |
US7189436B2 (en) | 2007-03-13 |
CN1268982A (zh) | 2000-10-04 |
US20050003098A1 (en) | 2005-01-06 |
KR100623540B1 (ko) | 2006-09-13 |
AU8921898A (en) | 1999-03-16 |
JP2001514328A (ja) | 2001-09-11 |
US6203898B1 (en) | 2001-03-20 |
DE69834737T2 (de) | 2007-03-01 |
US20010002284A1 (en) | 2001-05-31 |
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