DE69835363D1 - Kontinuierliche abscheidung eines isolierenden materials mittels mehrerer unter alternierend positiver und negativer spannung stehender anoden - Google Patents

Kontinuierliche abscheidung eines isolierenden materials mittels mehrerer unter alternierend positiver und negativer spannung stehender anoden

Info

Publication number
DE69835363D1
DE69835363D1 DE69835363T DE69835363T DE69835363D1 DE 69835363 D1 DE69835363 D1 DE 69835363D1 DE 69835363 T DE69835363 T DE 69835363T DE 69835363 T DE69835363 T DE 69835363T DE 69835363 D1 DE69835363 D1 DE 69835363D1
Authority
DE
Germany
Prior art keywords
negative voltage
insulating materials
under alternative
several anodes
continuous decision
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69835363T
Other languages
English (en)
Other versions
DE69835363T2 (de
Inventor
S Schatz
A Scholl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Energy Industries Inc
Original Assignee
Advanced Energy Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Energy Industries Inc filed Critical Advanced Energy Industries Inc
Application granted granted Critical
Publication of DE69835363D1 publication Critical patent/DE69835363D1/de
Publication of DE69835363T2 publication Critical patent/DE69835363T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3438—Electrodes other than cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3444—Associated circuits
DE69835363T 1997-05-28 1998-05-26 Kontinuierliche abscheidung eines isolierenden materials mittels mehrerer unter alternierend positiver und negativer spannung stehender anoden Expired - Lifetime DE69835363T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US864766 1997-05-28
US08/864,766 US5897753A (en) 1997-05-28 1997-05-28 Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages
PCT/US1998/010666 WO1998054749A1 (en) 1997-05-28 1998-05-26 Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages

Publications (2)

Publication Number Publication Date
DE69835363D1 true DE69835363D1 (de) 2006-09-07
DE69835363T2 DE69835363T2 (de) 2006-11-23

Family

ID=25344027

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69841048T Expired - Lifetime DE69841048D1 (de) 1997-05-28 1998-05-26 System und Verfahren zum kontinuierlichen Abscheiden von isolierendem Material mittels mehrerer, alternativ zwischen positiven und negativen Spannungen geschalteter Anoden
DE69835363T Expired - Lifetime DE69835363T2 (de) 1997-05-28 1998-05-26 Kontinuierliche abscheidung eines isolierenden materials mittels mehrerer unter alternierend positiver und negativer spannung stehender anoden

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69841048T Expired - Lifetime DE69841048D1 (de) 1997-05-28 1998-05-26 System und Verfahren zum kontinuierlichen Abscheiden von isolierendem Material mittels mehrerer, alternativ zwischen positiven und negativen Spannungen geschalteter Anoden

Country Status (6)

Country Link
US (2) US5897753A (de)
EP (2) EP1016122B1 (de)
JP (1) JP4208970B2 (de)
KR (1) KR100627862B1 (de)
DE (2) DE69841048D1 (de)
WO (1) WO1998054749A1 (de)

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US5897753A (en) * 1997-05-28 1999-04-27 Advanced Energy Industries, Inc. Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages
US6579805B1 (en) * 1999-01-05 2003-06-17 Ronal Systems Corp. In situ chemical generator and method
US6245435B1 (en) 1999-03-01 2001-06-12 Moen Incorporated Decorative corrosion and abrasion resistant coating
US6818103B1 (en) 1999-10-15 2004-11-16 Advanced Energy Industries, Inc. Method and apparatus for substrate biasing in multiple electrode sputtering systems
WO2001029278A1 (en) * 1999-10-15 2001-04-26 Advanced Energy Industries, Inc. Method and apparatus for substrate biasing in multiple electrode sputtering systems
US6433553B1 (en) * 1999-10-27 2002-08-13 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for eliminating displacement current from current measurements in a plasma processing system
JP2003516706A (ja) * 1999-12-07 2003-05-13 アドバンスト・エナジー・インダストリーズ・インコーポレイテッド フラックス制御変圧器を有する電源
US6444945B1 (en) 2001-03-28 2002-09-03 Cp Films, Inc. Bipolar plasma source, plasma sheet source, and effusion cell utilizing a bipolar plasma source
US7026057B2 (en) 2002-01-23 2006-04-11 Moen Incorporated Corrosion and abrasion resistant decorative coating
US6760213B2 (en) * 2002-03-04 2004-07-06 Hitachi High-Technologies Corporation Electrostatic chuck and method of treating substrate using electrostatic chuck
US6824653B2 (en) * 2003-02-21 2004-11-30 Agilent Technologies, Inc Magnetron with controlled DC power
US7375035B2 (en) * 2003-04-29 2008-05-20 Ronal Systems Corporation Host and ancillary tool interface methodology for distributed processing
US7429714B2 (en) * 2003-06-20 2008-09-30 Ronal Systems Corporation Modular ICP torch assembly
JP4658506B2 (ja) * 2004-03-31 2011-03-23 浩史 滝川 パルスアークプラズマ生成用電源回路及びパルスアークプラズマ処理装置
US7211179B2 (en) * 2004-12-17 2007-05-01 Advanced Energy Industries, Inc. Dual anode AC supply for continuous deposition of a cathode material
US7342361B2 (en) * 2005-05-11 2008-03-11 Dublin City University Plasma source
IES20050301A2 (en) * 2005-05-11 2006-11-15 Univ Dublin City Plasma source
US20070068794A1 (en) * 2005-09-23 2007-03-29 Barret Lippey Anode reactive dual magnetron sputtering
WO2007051461A1 (de) * 2005-11-04 2007-05-10 Von Ardenne Anlagentechnik Gmbh Verfahren und anordnung zum redundanten anoden-sputtern
US7850828B2 (en) * 2006-09-15 2010-12-14 Cardinal Cg Company Enhanced virtual anode
US20080083611A1 (en) * 2006-10-06 2008-04-10 Tegal Corporation High-adhesive backside metallization
JP4825742B2 (ja) * 2007-06-26 2011-11-30 株式会社アルバック 成膜装置
PL217715B1 (pl) * 2007-09-25 2014-08-29 Ardenne Anlagentech Gmbh Sposób i układ z dwiema anodami do nadmiarowego napylania anodowego
US20090246385A1 (en) * 2008-03-25 2009-10-01 Tegal Corporation Control of crystal orientation and stress in sputter deposited thin films
US8691057B2 (en) * 2008-03-25 2014-04-08 Oem Group Stress adjustment in reactive sputtering
US8482375B2 (en) * 2009-05-24 2013-07-09 Oem Group, Inc. Sputter deposition of cermet resistor films with low temperature coefficient of resistance
DE102010047963A1 (de) * 2010-10-08 2012-04-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Magnetron-Vorrichtung und Verfahren zum gepulsten Betreiben einer Magnetron-Vorrichtung
CN103201407A (zh) * 2011-01-12 2013-07-10 日新电机株式会社 等离子体装置
JP2014089876A (ja) * 2012-10-30 2014-05-15 Tokyo Electron Ltd プラズマ処理装置
US9812296B2 (en) 2015-02-03 2017-11-07 Cardinal Cg Company Sputtering apparatus including gas distribution system
US11049702B2 (en) 2015-04-27 2021-06-29 Advanced Energy Industries, Inc. Rate enhanced pulsed DC sputtering system
US9812305B2 (en) 2015-04-27 2017-11-07 Advanced Energy Industries, Inc. Rate enhanced pulsed DC sputtering system
DE102015106535B4 (de) * 2015-04-28 2021-02-04 VON ARDENNE Asset GmbH & Co. KG Sputteranordnung
US10373811B2 (en) * 2015-07-24 2019-08-06 Aes Global Holdings, Pte. Ltd Systems and methods for single magnetron sputtering
US9721765B2 (en) 2015-11-16 2017-08-01 Agc Flat Glass North America, Inc. Plasma device driven by multiple-phase alternating or pulsed electrical current

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DE4237517A1 (de) * 1992-11-06 1994-05-11 Leybold Ag Vorrichtung zum Beschichten eines Substrats, insbesondere mit elektrisch nichtleitenden Schichten
US5718813A (en) * 1992-12-30 1998-02-17 Advanced Energy Industries, Inc. Enhanced reactive DC sputtering system
US5616225A (en) * 1994-03-23 1997-04-01 The Boc Group, Inc. Use of multiple anodes in a magnetron for improving the uniformity of its plasma
US5651865A (en) * 1994-06-17 1997-07-29 Eni Preferential sputtering of insulators from conductive targets
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US5897753A (en) * 1997-05-28 1999-04-27 Advanced Energy Industries, Inc. Continuous deposition of insulating material using multiple anodes alternated between positive and negative voltages

Also Published As

Publication number Publication date
DE69841048D1 (de) 2009-09-17
EP1016122B1 (de) 2006-07-26
JP4208970B2 (ja) 2009-01-14
DE69835363T2 (de) 2006-11-23
US5897753A (en) 1999-04-27
US6183605B1 (en) 2001-02-06
EP1458006A1 (de) 2004-09-15
KR100627862B1 (ko) 2006-09-25
EP1016122A1 (de) 2000-07-05
JP2002501577A (ja) 2002-01-15
WO1998054749A1 (en) 1998-12-03
KR20010013110A (ko) 2001-02-26
EP1458006B1 (de) 2009-08-05

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