DE69905201D1 - Schlammfrei aufbereitung von kupfer-cmp-abfällen - Google Patents
Schlammfrei aufbereitung von kupfer-cmp-abfällenInfo
- Publication number
- DE69905201D1 DE69905201D1 DE69905201T DE69905201T DE69905201D1 DE 69905201 D1 DE69905201 D1 DE 69905201D1 DE 69905201 T DE69905201 T DE 69905201T DE 69905201 T DE69905201 T DE 69905201T DE 69905201 D1 DE69905201 D1 DE 69905201D1
- Authority
- DE
- Germany
- Prior art keywords
- sludge
- free treatment
- copper cmp
- cmp waste
- waste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F11/00—Treatment of sludge; Devices therefor
- C02F11/004—Sludge detoxification
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
- C02F1/4676—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electroreduction
- C02F1/4678—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electroreduction of metals
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/10—Inorganic compounds
- C02F2101/20—Heavy metals or heavy metal compounds
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/225,210 US6306282B1 (en) | 1999-01-04 | 1999-01-04 | Sludge-free treatment of copper CMP wastes |
PCT/US1999/018184 WO2000040512A1 (en) | 1999-01-04 | 1999-08-10 | Sludge-free treatment of copper cmp wastes |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69905201D1 true DE69905201D1 (de) | 2003-03-06 |
DE69905201T2 DE69905201T2 (de) | 2003-10-23 |
Family
ID=22843982
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69905201T Expired - Fee Related DE69905201T2 (de) | 1999-01-04 | 1999-08-10 | Schlammfrei aufbereitung von kupfer-cmp-abfällen |
Country Status (6)
Country | Link |
---|---|
US (1) | US6306282B1 (de) |
EP (1) | EP1149051B1 (de) |
JP (1) | JP2002534252A (de) |
KR (1) | KR20010101382A (de) |
DE (1) | DE69905201T2 (de) |
WO (1) | WO2000040512A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6203705B1 (en) * | 1999-10-22 | 2001-03-20 | Koch Microelectronic Service Company, Inc. | Process for treating waste water containing copper |
US6905608B2 (en) * | 2002-01-22 | 2005-06-14 | Exergy Technologies Corporation | Advanced electrodeionization for fluid recycling |
US7488423B2 (en) * | 2005-08-02 | 2009-02-10 | Siemens Water Technologies Holding Corp. | System and method of slurry treatment |
CN101758457B (zh) * | 2010-01-19 | 2012-05-30 | 中国科学院上海微系统与信息技术研究所 | 一种化学机械抛光液回收和重复利用的方法 |
CN101786775A (zh) * | 2010-02-10 | 2010-07-28 | 中南大学 | 一种从电镀污泥中选择性回收铜和镍的方法 |
JP5802609B2 (ja) * | 2011-09-07 | 2015-10-28 | ジー・フォースジャパン株式会社 | クーラント再生方法 |
JP6499496B2 (ja) | 2015-04-15 | 2019-04-10 | 株式会社Screenホールディングス | 廃液処理方法および廃液処理装置 |
KR101659707B1 (ko) * | 2015-09-01 | 2016-09-26 | 인천화학 주식회사 | 구리함유폐액을 이용한 구리회수장치 및 이에 따른 구리회수방법 |
US20230174394A1 (en) * | 2020-04-07 | 2023-06-08 | Evoqua Water Technologies Llc | Treatment of slurry copper wastewater with ultrafiltration and ion exchange |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4066520A (en) * | 1976-09-01 | 1978-01-03 | Envirotech Corporation | Slurry electrowinning process |
GB2146316A (en) | 1983-09-08 | 1985-04-17 | Little Inc A | Precious metals recovery |
AU2959292A (en) | 1991-11-14 | 1993-06-15 | Lennart Olausson | Method relating to the flushing of a purification plant |
DE4214974A1 (de) | 1992-05-06 | 1993-11-11 | Ultra Systems Gmbh Uv Oxidatio | Zerstörung von freien und komplexen Cyaniden, AOX, Mineralöl, Komplexbildnern, CSB, Nitrit, Chromat und Abtrennung von Metallen in Abwässern |
US5340370A (en) | 1993-11-03 | 1994-08-23 | Intel Corporation | Slurries for chemical mechanical polishing |
EP0979211B1 (de) | 1997-04-28 | 2003-02-19 | Infineon Technologies AG | Verfahren zur behandlung von abwasser aus einem chemisch-mechanischen polierprozess in der chipfertigung |
-
1999
- 1999-01-04 US US09/225,210 patent/US6306282B1/en not_active Expired - Lifetime
- 1999-08-10 WO PCT/US1999/018184 patent/WO2000040512A1/en not_active Application Discontinuation
- 1999-08-10 KR KR1020017008530A patent/KR20010101382A/ko not_active Application Discontinuation
- 1999-08-10 DE DE69905201T patent/DE69905201T2/de not_active Expired - Fee Related
- 1999-08-10 EP EP99941034A patent/EP1149051B1/de not_active Expired - Lifetime
- 1999-08-10 JP JP2000592228A patent/JP2002534252A/ja not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
US6306282B1 (en) | 2001-10-23 |
EP1149051B1 (de) | 2003-01-29 |
WO2000040512A1 (en) | 2000-07-13 |
KR20010101382A (ko) | 2001-11-14 |
EP1149051A1 (de) | 2001-10-31 |
JP2002534252A (ja) | 2002-10-15 |
DE69905201T2 (de) | 2003-10-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |