DE69906180D1 - Vorrichtung für die plasmagestützte Gasphasenabscheidung - Google Patents

Vorrichtung für die plasmagestützte Gasphasenabscheidung

Info

Publication number: DE69906180D1
Authority: DE; Germany
Prior art keywords: plasma; vapor deposition; assisted vapor; assisted; deposition
Prior art date: 1998-04-28
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE69906180T

Other languages

English (en)

Other versions

DE69906180T2 (de

Inventor

Masayoshi Murata

Yoshiaki Takeuchi

Hiroshi Mashima

Akemi Takano

Hirohisa Yoshida

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Mitsubishi Heavy Industries Ltd

Original Assignee

Mitsubishi Heavy Industries Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1998-04-28

Filing date

1999-01-16

Publication date

2003-04-30

1999-01-16 Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd

2003-04-30 Application granted granted Critical

2003-04-30 Publication of DE69906180D1 publication Critical patent/DE69906180D1/de

2003-11-20 Publication of DE69906180T2 publication Critical patent/DE69906180T2/de

2019-01-17 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape

DE69906180T 1998-04-28 1999-01-16 Vorrichtung für die plasmagestützte Gasphasenabscheidung Expired - Lifetime DE69906180T2 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP10119142A JP2961103B1 (ja)	1998-04-28	1998-04-28	プラズマ化学蒸着装置

Publications (2)

Publication Number	Publication Date
DE69906180D1 true DE69906180D1 (de)	2003-04-30
DE69906180T2 DE69906180T2 (de)	2003-11-20

Family

ID=14753969

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69906180T Expired - Lifetime DE69906180T2 (de)	1998-04-28	1999-01-16	Vorrichtung für die plasmagestützte Gasphasenabscheidung

Country Status (6)

Country	Link
US (1)	US6363881B2 (de)
EP (1)	EP0955665B1 (de)
JP (1)	JP2961103B1 (de)
AU (1)	AU715335B2 (de)
DE (1)	DE69906180T2 (de)
ES (1)	ES2196655T3 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3697110B2 (ja) *	1998-05-29	2005-09-21	三菱重工業株式会社	プラズマ化学蒸着装置
JP3872620B2 (ja) *	1999-10-19	2007-01-24	三菱重工業株式会社	プラズマ生成装置
WO2002013225A2 (en) *	2000-08-08	2002-02-14	Tokyo Electron Limited	Plasma processing method and apparatus
JP3637291B2 (ja) *	2001-05-01	2005-04-13	三菱重工業株式会社	プラズマ化学蒸着装置における高周波プラズマの大面積均一化方法及び装置
JP3872741B2 (ja) *	2002-10-01	2007-01-24	三菱重工業株式会社	プラズマ化学蒸着装置
US7032536B2 (en) *	2002-10-11	2006-04-25	Sharp Kabushiki Kaisha	Thin film formation apparatus including engagement members for support during thermal expansion
JP3846881B2 (ja) *	2003-04-04	2006-11-15	日本エー・エス・エム株式会社	プラズマ処理装置及びシリコン酸化膜を形成する方法
CN100562209C (zh) *	2004-02-09	2009-11-18	周星工程股份有限公司	用于产生等离子的电源供应器及包括其的等离子设备
US20070048456A1 (en) *	2004-09-14	2007-03-01	Keshner Marvin S	Plasma enhanced chemical vapor deposition apparatus and method
EP1812949B1 (de) *	2004-11-12	2010-07-07	Oerlikon Trading AG, Trübbach	Impedanzanpassung eines kapazitiv gekoppelten hf-plasmareaktors mit eignung für grossflächige substrate
JP5309426B2 (ja) *	2006-03-29	2013-10-09	株式会社Ｉｈｉ	微結晶シリコン膜形成方法及び太陽電池
JP4324205B2 (ja) *	2007-03-30	2009-09-02	三井造船株式会社	プラズマ生成装置およびプラズマ成膜装置
US20100085129A1 (en) *	2008-10-06	2010-04-08	Asm Japan K.K.	Impedance matching apparatus for plasma-enhanced reaction reactor
TW201023695A (en) *	2008-12-09	2010-06-16	Ind Tech Res Inst	Capacitively coupled plasma (CCP) generator with two input ports
US10242843B2 (en)	2009-02-10	2019-03-26	HELYSSEN Sàrl	Apparatus for large area plasma processing
KR100938782B1 (ko) *	2009-07-06	2010-01-27	주식회사 테스	플라즈마 발생용 전극 및 플라즈마 발생장치
JP5517509B2 (ja) *	2009-07-08	2014-06-11	三菱重工業株式会社	真空処理装置
TWI432100B (zh) *	2009-11-25	2014-03-21	Ind Tech Res Inst	電漿產生裝置
KR101415552B1 (ko) *	2009-12-21	2014-07-07	주식회사 미코	접지구조물, 이를 구비하는 히터 및 화학기상 증착장치
US8333166B2 (en) *	2011-05-04	2012-12-18	Nordson Corporation	Plasma treatment systems and methods for uniformly distributing radiofrequency power between multiple electrodes
JP2013004172A (ja) *	2011-06-10	2013-01-07	Tokyo Electron Ltd	高周波電力分配装置およびそれを用いた基板処理装置
CN104409309B (zh) *	2014-12-01	2016-09-21	逢甲大学	大面积等离子体处理装置与均匀等离子体生成方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3569777A (en) *	1969-07-28	1971-03-09	Int Plasma Corp	Impedance matching network for plasma-generating apparatus
US4253047A (en) *	1977-05-23	1981-02-24	General Electric Company	Starting electrodes for solenoidal electric field discharge lamps
JPS5944797A (ja) *	1982-09-07	1984-03-13	増田　閃一	物体の静電的処理装置
US4626876A (en) *	1984-01-25	1986-12-02	Ricoh Company, Ltd.	Solid state corona discharger
JP2635021B2 (ja) *	1985-09-26	1997-07-30	宣夫御子柴	堆積膜形成法及びこれに用いる装置
JP2989279B2 (ja) *	1991-01-21	1999-12-13	三菱重工業株式会社	プラズマｃｖｄ装置
JP3406936B2 (ja)	1993-03-23	2003-05-19	キヤノン株式会社	超短波を用いたプラズマｃｖｄ法及び該プラズマｃｖｄ装置
US5589737A (en) *	1994-12-06	1996-12-31	Lam Research Corporation	Plasma processor for large workpieces
DE4446297A1 (de) *	1994-12-23	1996-06-27	Balzers Hochvakuum	Heizanordnung, Vakuumprozeßkammer mit einer solchen und Betrieb einer derartigen Vakuumprozeßkammer
JPH0971867A (ja) *	1995-09-01	1997-03-18	Mitsubishi Heavy Ind Ltd	プラズマｃｖｄ装置
JP3310875B2 (ja) *	1996-07-30	2002-08-05	三菱重工業株式会社	プラズマｃｖｄ装置
AU726151B2 (en) *	1998-04-08	2000-11-02	Mitsubishi Heavy Industries, Ltd.	Plasma CVD apparatus

1998
- 1998-04-28 JP JP10119142A patent/JP2961103B1/ja not_active Expired - Fee Related
1999
- 1999-01-16 DE DE69906180T patent/DE69906180T2/de not_active Expired - Lifetime
- 1999-01-16 EP EP99100754A patent/EP0955665B1/de not_active Expired - Lifetime
- 1999-01-16 ES ES99100754T patent/ES2196655T3/es not_active Expired - Lifetime
- 1999-01-18 AU AU12141/99A patent/AU715335B2/en not_active Ceased
- 1999-01-19 US US09/232,600 patent/US6363881B2/en not_active Expired - Lifetime

Also Published As

Publication number	Publication date
EP0955665A2 (de)	1999-11-10
EP0955665A3 (de)	2000-06-07
DE69906180T2 (de)	2003-11-20
EP0955665B1 (de)	2003-03-26
ES2196655T3 (es)	2003-12-16
US20020000201A1 (en)	2002-01-03
AU715335B2 (en)	2000-01-20
US6363881B2 (en)	2002-04-02
AU1214199A (en)	1999-11-04
JP2961103B1 (ja)	1999-10-12
JPH11312647A (ja)	1999-11-09

Legal Events

Date	Code	Title	Description
2004-04-22	8364	No opposition during term of opposition

Publication	Publication Date	Title
DE69906180T2 (de)	2003-11-20	Vorrichtung für die plasmagestützte Gasphasenabscheidung
DE69504762D1 (de)	1998-10-22	Vorrichtung zur chemischen Gasphasenabscheidung
DE59603145D1 (de)	1999-10-28	Vorrichtung zur Zugabe von Reinigungsmitteln, insbesondere für Geschirrspülmaschinen
DE60042082D1 (de)	2009-06-04	Platinen vorrichtung für flachstrickmaschine
DE69938997D1 (de)	2008-08-14	Bauteil für die Oberflächenmontage
DE69901991T2 (de)	2003-04-10	Montageanordnung für ein einstellbares Pedal
DE69923226D1 (de)	2005-02-17	Beschleunigungsaufnehmer für autoreifen
DE69505417T2 (de)	1999-03-25	Konvergente vorrichtung für plasmajet
DE69930027D1 (de)	2006-04-27	Metallisierungsverfahren für Halbleiter
DE59902488D1 (de)	2002-10-02	Verteilvorrichtung für stückgut
DE69110514T2 (de)	1995-11-30	Vorrichtung für Mikrowellen-Plasma-CVD.
DE29812707U1 (de)	1998-12-10	Befestigungsvorrichtung für flächige Bauteile
DE69916946D1 (de)	2004-06-09	Vorrichtung für Achsgehäuse
DE69902311D1 (de)	2002-09-05	Plasma-CVD-Apparat
DE9418631U1 (de)	1995-03-16	Vorrichtung für die Unterputz-Dosenmontage
DE69613261T2 (de)	2002-06-13	Stanzeinrichtung für Lochbearbeitungen
DE29900383U1 (de)	1999-04-08	Vorrichtung zur Schwingungsverminderung für Fahrräder
DE29501632U1 (de)	1995-03-23	Vorrichtung für Handbohrmaschinen
DE69810757T2 (de)	2003-10-16	Vorrichtung für fahrzeug
DE69905697T2 (de)	2004-01-15	Vorrichtung für walzgeräte
DE69626602D1 (de)	2003-04-17	Vorrichtung für trickeffekte
DE29508578U1 (de)	1995-08-17	Betätigungsvorrichtung für Ausschlagwerkzeug
DE9416176U1 (de)	1994-12-01	Einfache, kraftsparende Vorrichtung für Fahrräder
DE69904258D1 (de)	2003-01-16	Betätigungsvorrichtung für die Rückhaltevorrichtung von Webkantenfransen
DE29803828U1 (de)	1998-09-03	Vorrichtung für Wundpflaster