DE69935795D1 - Exzentrisch rotierendes bearbeitungsgerät für flache medien - Google Patents

Exzentrisch rotierendes bearbeitungsgerät für flache medien

Info

Publication number
DE69935795D1
DE69935795D1 DE69935795T DE69935795T DE69935795D1 DE 69935795 D1 DE69935795 D1 DE 69935795D1 DE 69935795 T DE69935795 T DE 69935795T DE 69935795 T DE69935795 T DE 69935795T DE 69935795 D1 DE69935795 D1 DE 69935795D1
Authority
DE
Germany
Prior art keywords
bowl
rotor
flat media
rotating machine
eccentric rotating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69935795T
Other languages
English (en)
Other versions
DE69935795T2 (de
Inventor
Daniel P Bexten
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Semitool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semitool Inc filed Critical Semitool Inc
Publication of DE69935795D1 publication Critical patent/DE69935795D1/de
Application granted granted Critical
Publication of DE69935795T2 publication Critical patent/DE69935795T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
DE69935795T 1998-06-30 1999-06-21 Exzentrisch rotierendes bearbeitungsgerät für flache medien Expired - Lifetime DE69935795T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US107878 1998-06-30
US09/107,878 US6125863A (en) 1998-06-30 1998-06-30 Offset rotor flat media processor
PCT/US1999/013984 WO2000000301A1 (en) 1998-06-30 1999-06-21 Offset rotor flat media processor

Publications (2)

Publication Number Publication Date
DE69935795D1 true DE69935795D1 (de) 2007-05-24
DE69935795T2 DE69935795T2 (de) 2007-12-27

Family

ID=22318945

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69935795T Expired - Lifetime DE69935795T2 (de) 1998-06-30 1999-06-21 Exzentrisch rotierendes bearbeitungsgerät für flache medien

Country Status (6)

Country Link
US (1) US6125863A (de)
EP (1) EP1115511B1 (de)
JP (1) JP2002519856A (de)
AT (1) ATE359132T1 (de)
DE (1) DE69935795T2 (de)
WO (1) WO2000000301A1 (de)

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US6350322B1 (en) 1997-03-21 2002-02-26 Micron Technology, Inc. Method of reducing water spotting and oxide growth on a semiconductor structure
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US6691720B2 (en) * 2001-07-16 2004-02-17 Semitool, Inc. Multi-process system with pivoting process chamber
US20040025901A1 (en) * 2001-07-16 2004-02-12 Semitool, Inc. Stationary wafer spin/spray processor
US6895981B2 (en) * 2002-07-19 2005-05-24 Semitool, Inc. Cross flow processor
WO2004012242A1 (en) * 2002-07-26 2004-02-05 Applied Materials, Inc. Hydrophilic components for a spin-rinse-dryer
US7289734B2 (en) * 2002-12-24 2007-10-30 Tropic Networks Inc. Method and system for multi-level power management in an optical network
US20060201541A1 (en) * 2005-03-11 2006-09-14 Semiconductor Energy Laboratory Co., Ltd. Cleaning-drying apparatus and cleaning-drying method
KR100829923B1 (ko) * 2006-08-30 2008-05-16 세메스 주식회사 스핀헤드 및 이를 이용하는 기판처리방법
WO2009114043A1 (en) * 2008-03-07 2009-09-17 Automation Technology, Inc. Solar wafer cleaning systems, apparatus and methods
US9421617B2 (en) 2011-06-22 2016-08-23 Tel Nexx, Inc. Substrate holder
US8967935B2 (en) 2011-07-06 2015-03-03 Tel Nexx, Inc. Substrate loader and unloader
AT515531B1 (de) * 2014-09-19 2015-10-15 Siconnex Customized Solutions Gmbh Halterungssystem und Beschickungsverfahren für scheibenförmige Objekte
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CN115228828B (zh) * 2022-09-20 2023-01-24 山东鲁西药业有限公司 一种药品原料清洗装置

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Also Published As

Publication number Publication date
ATE359132T1 (de) 2007-05-15
EP1115511A1 (de) 2001-07-18
EP1115511A4 (de) 2005-04-20
WO2000000301A1 (en) 2000-01-06
JP2002519856A (ja) 2002-07-02
US6125863A (en) 2000-10-03
EP1115511B1 (de) 2007-04-11
DE69935795T2 (de) 2007-12-27

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