EP1478682A1 - Anti-reflective coatings for photolithography and methods of preparation thereof - Google Patents

Anti-reflective coatings for photolithography and methods of preparation thereof

Info

Publication number
EP1478682A1
EP1478682A1 EP02793921A EP02793921A EP1478682A1 EP 1478682 A1 EP1478682 A1 EP 1478682A1 EP 02793921 A EP02793921 A EP 02793921A EP 02793921 A EP02793921 A EP 02793921A EP 1478682 A1 EP1478682 A1 EP 1478682A1
Authority
EP
European Patent Office
Prior art keywords
grams
absorbing
composition
agent
added
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP02793921A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1478682A4 (en
Inventor
Teresa Honeywell International Inc. BALDWIN
Joseph Honeywell International Inc. KENNEDY
Nancy Honeywell International Inc. IWAMOTO
Tadashi Honeywell International Inc. NAKANO
William Honeywell International Inc. BEDWELL
Jason Honeywell International Inc. STUCK
Mello Honeywell International Inc. HEBERT
Arlene Honeywell International Inc. SUEDMEYER
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/001,143 external-priority patent/US6824879B2/en
Priority claimed from PCT/US2001/045306 external-priority patent/WO2003044600A1/en
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of EP1478682A1 publication Critical patent/EP1478682A1/en
Publication of EP1478682A4 publication Critical patent/EP1478682A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Structural Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Architecture (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Paints Or Removers (AREA)
EP02793921A 2001-11-15 2002-11-12 ANTIREFLECTIVE LAYERS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF Withdrawn EP1478682A4 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10/001,143 US6824879B2 (en) 1999-06-10 2001-11-15 Spin-on-glass anti-reflective coatings for photolithography
WOPCT/US01/45306 2001-11-15
US1143 2001-11-15
PCT/US2001/045306 WO2003044600A1 (en) 2001-11-15 2001-11-15 Spin-on anti-reflective coatings for photolithography
PCT/US2002/036327 WO2003044078A1 (en) 2001-11-15 2002-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof

Publications (2)

Publication Number Publication Date
EP1478682A1 true EP1478682A1 (en) 2004-11-24
EP1478682A4 EP1478682A4 (en) 2005-06-15

Family

ID=26668624

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02793921A Withdrawn EP1478682A4 (en) 2001-11-15 2002-11-12 ANTIREFLECTIVE LAYERS FOR PHOTOLITHOGRAPHY AND METHODS OF PREPARATION THEREOF

Country Status (3)

Country Link
EP (1) EP1478682A4 (es)
AU (1) AU2002359387A1 (es)
WO (1) WO2003044078A1 (es)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100804873B1 (ko) 1999-06-10 2008-02-20 얼라이드시그날 인코퍼레이티드 포토리소그래피용 ｓｏｇ 반사방지 코팅
KR101148918B1 (ko) * 2003-04-17 2012-05-22 닛산 가가쿠 고교 가부시키 가이샤 다공질 하층막 및 다공질 하층막을 형성하기 위한 하층막형성 조성물
US7060637B2 (en) 2003-05-12 2006-06-13 Micron Technology, Inc. Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials
EP1627007B1 (en) 2003-05-23 2007-10-31 Dow Corning Corporation Siloxane resin-based anti-reflective coating composition having high wet etch rate
WO2005041255A2 (en) 2003-08-04 2005-05-06 Honeywell International, Inc. Coating composition optimization for via fill and photolithography applications and methods of preparation thereof
WO2005037907A1 (en) * 2003-10-07 2005-04-28 Honeywell International Inc. Coatings and hard mask compositions for integrated circuit applications, methods of production and uses thereof
KR20050040275A (ko) * 2003-10-28 2005-05-03 삼성전자주식회사 절연막 형성용 조성물 및 이를 이용한 절연막 또는 절연막패턴의 형성방법
US8053159B2 (en) * 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
KR101191098B1 (ko) 2004-12-17 2012-10-15 다우 코닝 코포레이션 실록산 수지 피복물
ATE400672T1 (de) 2004-12-17 2008-07-15 Dow Corning Verfahren zur ausbildung einer antireflexionsbeschichtung
US20060183055A1 (en) * 2005-02-15 2006-08-17 O'neill Mark L Method for defining a feature on a substrate
KR101324052B1 (ko) 2006-02-13 2013-11-01 다우 코닝 코포레이션 반사방지 코팅 재료
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
WO2009088600A1 (en) 2008-01-08 2009-07-16 Dow Corning Toray Co., Ltd. Silsesquioxane resins
EP2238198A4 (en) 2008-01-15 2011-11-16 Dow Corning RESINS BASED ON SILSESQUIOXANE
JP5378420B2 (ja) 2008-02-25 2013-12-25 ハネウェル・インターナショナル・インコーポレーテッド 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用
CN101990551B (zh) 2008-03-04 2012-10-03 陶氏康宁公司 倍半硅氧烷树脂
US8241707B2 (en) 2008-03-05 2012-08-14 Dow Corning Corporation Silsesquioxane resins
US7955782B2 (en) 2008-09-22 2011-06-07 Honeywell International Inc. Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9366964B2 (en) 2011-09-21 2016-06-14 Dow Global Technologies Llc Compositions and antireflective coatings for photolithography
JP6196194B2 (ja) 2014-08-19 2017-09-13 信越化学工業株式会社 紫外線吸収剤、レジスト下層膜形成用組成物、及びパターン形成方法
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
FI128886B (en) * 2019-02-25 2021-02-26 Pibond Oy Functional hydrogen silicon oxane polymers and their uses

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000077575A1 (en) * 1999-06-10 2000-12-21 Alliedsignal Inc. Spin-on-glass anti-reflective coatings for photolithography
WO2001064804A1 (en) * 2000-02-28 2001-09-07 Adsil, Lc Silane-based, coating compositions, coated articles obtained therefrom and methods of using same
WO2002006402A1 (en) * 2000-07-17 2002-01-24 Honeywell International Inc. Absorbing compounds for spin-on glass anti-reflective coatings for photolithography
EP1197511A1 (en) * 2000-10-10 2002-04-17 Shipley Company LLC Antireflective composition

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW354392B (en) * 1996-07-03 1999-03-11 Du Pont Photomask blanks

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000077575A1 (en) * 1999-06-10 2000-12-21 Alliedsignal Inc. Spin-on-glass anti-reflective coatings for photolithography
WO2001064804A1 (en) * 2000-02-28 2001-09-07 Adsil, Lc Silane-based, coating compositions, coated articles obtained therefrom and methods of using same
WO2002006402A1 (en) * 2000-07-17 2002-01-24 Honeywell International Inc. Absorbing compounds for spin-on glass anti-reflective coatings for photolithography
EP1197511A1 (en) * 2000-10-10 2002-04-17 Shipley Company LLC Antireflective composition

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO03044078A1 *

Also Published As

Publication number Publication date
EP1478682A4 (en) 2005-06-15
AU2002359387A1 (en) 2003-06-10
WO2003044078A1 (en) 2003-05-30
WO2003044078A9 (en) 2004-01-08

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