EP1929595A2 - Thermal-expansion tolerant, preionizer electrode for a gas discharge laser - Google Patents
Thermal-expansion tolerant, preionizer electrode for a gas discharge laserInfo
- Publication number
- EP1929595A2 EP1929595A2 EP06804111A EP06804111A EP1929595A2 EP 1929595 A2 EP1929595 A2 EP 1929595A2 EP 06804111 A EP06804111 A EP 06804111A EP 06804111 A EP06804111 A EP 06804111A EP 1929595 A2 EP1929595 A2 EP 1929595A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- recited
- assembly
- electrode
- preionizer
- substantially cylindrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910001369 Brass Inorganic materials 0.000 claims description 5
- 239000010951 brass Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 229910010293 ceramic material Inorganic materials 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
- H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0384—Auxiliary electrodes, e.g. for pre-ionisation or triggering, or particular adaptations therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0388—Compositions, materials or coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Definitions
- the present invention relates to pulsed, gas discharge lasers.
- the present invention is particularly, but not exclusively useful as a gas discharge laser having a corona discharge preionizer to reduce discharge instabilities.
- gas discharge pulsed lasers such as ArF, XeF and KrF excimer lasers and molecular fluorine lasers are generally unstable.
- the glow discharge that is required for suitable laser emission does not occur.
- preionization which results in a uniform distribution of electrons in the gas discharge region immediately before the main gas discharge occurs can be used to produce high quality, consistent laser pulses.
- non-sparking corona discharge preionization has been developed and employed to create a substantially uniform emission of radiation which typically includes
- Corona discharge producing a uniform preionization can result in a good beam profile without hot spots, high energy stability, improved electrode lifetimes and redixced halogen consumption.
- a corona discharge is produced by establishing a potential difference across a dielectric material.
- a typical gas discharge laser may employ a pair of spaced apart, elongated (e.g. 60cm long) main discharge electrodes to initiate lasing in a gaseous material.
- a blower may be provided to circulate a laserable gaseous medium past the electrodes to quickly exhaust gas from the discharge region after a pulse and present a fresh portion of gas to the electrodes for the next pulse.
- a rather large elongated, somewhat rectangular discharge volume of fresh gaseous media is required to be uniformly preionized, immediately prior to a discharge between the main electrodes.
- an effective way to create a substantially uniform preionization generally involves the use of an elongated tube made of dielectric material that is aligned parallel to the discharge electrodes and positioned near the discharge region.
- a conductive preionization electrode (typically made of copper or brass), can then be placed in the bore of the tube and used to create a potential difference between the preionization electrode and one of the main discharge electrodes. This potential difference extends across the dielectric tube radially and results in a substantially uniform emission of photons that are emitted from the outer surface of the tube.
- an aluminum chamber housing is employed that envelops the gaseous media and the discharge region.
- Each end of the preionization electrode is then mechanically, and in some cases, electrically connected to the housing, which is then grounded.
- a potential difference between the preionization electrode and a main electrode is established when the main electrode is biased relative to ground.
- LTEC linear thermal expansion coefficient
- the preionization electrode is typically heated to a higher temperature than the aluminum housing, and as a consequence, the preionization electrode may expand much more than the stainless steel housing upon exposure to heat, and this expansion differential may cause the electrode to bow and crack the dielectric tube.
- a preionizer assembly for a gas discharge laser may include an electrode and a dielectric tube that defines a tube bore.
- the electrode may include a first elongated conductive member having a first end disposed in the bore of the tube.
- the electrode may include a second elongated conductive member having a first end disposed in the bore and spaced from the first end of the first conductive member.
- the first and second conductive members may be held at a same voltage potential.
- a portion of the first member may be formed as a rod defining a longitudinal axis and the first end of the first member may be formed with a substantially cylindrical shaped opening that is aligned with the longitudinal axis and has an inner diameter, D.
- a portion of the second member may be formed as a rod and the first end of the second member may be formed with a substantially cylindrical shaped projection having outer diameter, d, with d ⁇ D. With this structure, at least a portion of the substantially cylindrical shaped projection may be disposed within the substantially cylindrical shaped opening.
- Fig. 1 shows a cross-sectional view of a gas discharge laser chamber taken transverse to a laser axis
- Fig. 2 shows a cross-sectional view of a portion of a preionization system having a preionization electrode that includes two elongated conductive members
- Fig. 3 shows a full length side view of a first conductive member for use in the electrode shown in system shown in Fig. 2;
- Fig. 4 shows a full length side view (in partial cross-section) of a second conductive member for use in the electrode shown in system shown in Fig. 2;
- Fig. 5 shows a cross-sectional view of a portion of another embodiment of a preionization system having a preionization electrode that includes two elongated conductive members with each member having a substantially flat end;
- Fig. 6 shows a cross-sectional view of a portion of another embodiment of a preionization system having a preionization electrode that includes two elongated conductive members with one member having a concave end and the other member having a convex end; and
- Fig. 7 shows a cross-sectional view of a portion of another embodiment of a preionization system having a preionization electrode that includes two elongated conductive members with each member having rounded edges.
- a gas discharge chamber for a pulsed laser such as a KrF excimer laser, an XeF excimer laser, an ArF excimer laser or molecular fluorine laser
- the chamber 10 typically includes a chamber housing 12 that may be made of a relatively strong, corrosion resistant material, e.g. nickel-plated aluminum, and is generally rectangular in construction with closed ends. With this structure, the housing 12 may surround a volume 14 which holds a laserable gas medium.
- the chamber 10 may also include a gas discharge system having two elongated spaced apart electrodes 16, 18, one of which may be designated a cathode and the other an anode.
- a gas discharge region 20 is established in the space between electrodes 16, 18 and includes the laser's beam axis 22 which extends substantially normal to the page for the chamber 20 shown in Fig. 1.
- Each electrode 16, 18 may be elongated, for example, to a length of about 40-80cm and aligned in a direction generally parallel to the axis 22.
- the gas discharge region 20 for the chamber 10 shown is an elongated volume having a length approximating the length of the electrodes 16, 18 (i.e. 40-80cm) and a somewhat rectangular cross section, which may be, for example, 3mm wide by about 12mm in the direction of electrode spacing for an ArF excimer laser.
- main insulator 24 which may be made from a dielectric, e.g. ceramic material.
- electrode 18 is maintained at a constant reference potential, e.g. ground potential, and electrode 16 can be biased relative to the reference potential to initiate an electric discharge in the gas discharge region 20. It is to be appreciated that other biasing schemes are possible.
- Fig. 1 also shows that the chamber 10 also includes a preionization system having a hollow, dielectric tube 26, preionization electrode 28 and a conductive shim 30, which is not required for all embodiments.
- Fig. 2 shows that the preionization electrode 28 may include an elongated conductive member 32 having an end 34 that is disposed within the bore 36 of the dielectric tube 26, and an elongated conductive member 38 having an end 40 that is disposed within the bore 36 of the dielectric tube 26.
- members 32, 38 are aligned along a common axis 42 within the tube 26. At least one, and typically both of the members 32, 38 are disposed in the bore 36 of the tube 26 such that the member 32, 38 is able to move axially relative to the tube 26.
- the members 32, 34 may be made from a conductive material such as brass or copper and the dielectric tube 26 may be made of a ceramic.
- Fig. 2 further illustrates that the end 34 of the member 32 is axially spaced from the end 40 of the member 38 allowing axial movement of member 32 relative to member 38, for example, during thermal expansion of one or both of the members 32, 38.
- the end 40 of the member 38 is formed with a substantially cylindrical shaped opening 44 that is substantially aligned with axis 42.
- the end 34 of the member 32 is formed with a substantially cylindrical shaped projection 46.
- the opening 44 has an inner diameter, D
- the projection 46 has an outer diameter, d, with d ⁇ D to allow the projection 46 to fit inside and move within the opening 44.
- Fig. 3 shows the full length of the member 32.
- the member 32 includes a substantially cylindrical, rod portion 48 (having an outer diameter slightly less than the inner diameter of the tube 26) and a projection 46 which extends therefrom at ' end 34.
- the member 32 may also include a portion 50 having a reduced section (relative to the rod portion 48) to reduce arcing and a flange 52 for mounting the member 32 to a housing wall (not shown).
- the member 32 may have an overall length, L 1 , of about 34cm for use with an electrode 16 having a length of about 57cm.
- Fig. 4 shows the full length of the member 38.
- the member 38 includes a substantially cylindrical, rod portion 54 (having an outer diameter slightly less than the inner diameter of the tube 26) and an opening 44 which is formed at end 40.
- the member 38 may also include a portion 56 having a reduced section (relative to the rod portion 54) to reduce arcing and a flange 58 which may mate with the dielectric tube 26 to prevent rotation.
- the member 38 may have an overall length, L 2 , of about 33.5cm for use with an electrode 16 having a length of 57 cm.
- Fig. 5 shows another embodiment of a preionization system having a preionization electrode 28' that includes an elongated conductive member 32' having a, substantially fiat
- the electrode 28' also may include an elongated conductive member 38' having a substantially flat end 40' that is disposed within the bore 36 of the dielectric tube 26 and axially spaced from the end 34' of member 32'. This axial spacing allows for thermal expansion of the members 32', 38' without cracking the dielectric tube 26.
- Fig. 6 shows another embodiment of a preionization system having a preionization electrode 28" that includes an elongated conductive member 32" having a substantially concave end 34" that is disposed within the bore 36 of the dielectric tube 26.
- the electrode 28" also may include an elongated conductive member 38" having a substantially convex end 40" that is disposed within the bore 36 of the dielectric tube 26 and axially spaced from the end 34" of member 32". This axial spacing allows for thermal expansion of the members 32", 38" without cracking the dielectric tube 26.
- FIG. 7 shows another embodiment of a preionization system having a preionization electrode 28'" that includes an elongated conductive member 32'" having a rounded end 34'" that is disposed within the bore 36 of the dielectric tube 26.
- the electrode 28"' also may include an elongated conductive member 38'" having a rounded end 40'" that is disposed within the bore 36 of the dielectric tube 26 and axially spaced from the end 34'" of member 32'". This axial spacing allows for thermal expansion of the members 32'", 38'" without cracking the dielectric tube 26.
- a voltage difference is applied radially across the dielectric tube 26 to establish a pre-ionization emission prior to a discharge between main electrode 16 and main electrode 18.
- This voltage potential can be effectuated in one of several different ways.
- a potential difference may be established between the preionization electrode 28 and a conductive shim 30.
- both members 32, 38 are typically held at a same voltage potential.
- the conducting shim 30 may be positioned between the tube 26 and main insulator 24 and may be elongated to extend substantially along the length of the dielectric tube 26. The conducting shim 30 may or may not be in electrical contact with the electrode 16.
- the members 32, 38 are electrically connected to the housing 12, which in turn, is connected to a reference potential, e.g. ground.
- a reference potential e.g. ground.
- the conducting shim 30 and / or one of the electrodes 16, 18 may then be biased relative to the reference potential to establish the voltage difference across the tube 26.
- preionization tube 26 may be positioned upstream of the discharge electrodes 16, 18, other arrangements may be equally suitable depending on the application.
- a preionization tube 26 may be positioned downstream of the discharge electrodes 16, 18 or a pair of preionization tubes 26 may be used, with one positioned upstream and the other positioned downstream of the discharge electrodes 16, 18.
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/237,535 US7542502B2 (en) | 2005-09-27 | 2005-09-27 | Thermal-expansion tolerant, preionizer electrode for a gas discharge laser |
PCT/US2006/037225 WO2007038412A2 (en) | 2005-09-27 | 2006-09-25 | Thermal-expansion tolerant, preionizer electrode for a gas discharge laser |
Publications (3)
Publication Number | Publication Date |
---|---|
EP1929595A2 true EP1929595A2 (en) | 2008-06-11 |
EP1929595A4 EP1929595A4 (en) | 2009-08-12 |
EP1929595B1 EP1929595B1 (en) | 2010-11-03 |
Family
ID=37900351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP06804111A Active EP1929595B1 (en) | 2005-09-27 | 2006-09-25 | Thermal-expansion tolerant, preionizer electrode for a gas discharge laser |
Country Status (6)
Country | Link |
---|---|
US (1) | US7542502B2 (en) |
EP (1) | EP1929595B1 (en) |
JP (1) | JP5349964B2 (en) |
KR (1) | KR101334614B1 (en) |
DE (1) | DE602006018033D1 (en) |
WO (1) | WO2007038412A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2446530C1 (en) * | 2011-01-28 | 2012-03-27 | Владимир Михайлович Борисов | Pulse-periodic gas-discharge laser |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BR112012009855A2 (en) | 2009-10-26 | 2018-06-26 | Prometheus Laboratoires Inc | methods for determining an effective amount of a drug, for optimizing therapy and / or reducing drug toxicity, for determining the presence or level of a drug, for optimizing the therapeutic amount of a drug, and for determining the presence or level of a drug. an autoantibody for a drug, and kit |
AU2012278802B2 (en) | 2011-07-06 | 2015-11-26 | Société des Produits Nestlé S.A. | Assays for detecting neutralizing autoantibodies to biologic therapy with TNF alpha |
KR20170091717A (en) | 2014-12-05 | 2017-08-09 | 네스텍 소시에테아노님 | Indirect homogeneous mobility shift assays for the detection of biologics in patient samples |
JP7381728B2 (en) * | 2019-10-11 | 2023-11-15 | サイマー リミテッド ライアビリティ カンパニー | Conductive material for discharge laser |
US11862922B2 (en) * | 2020-12-21 | 2024-01-02 | Energetiq Technology, Inc. | Light emitting sealed body and light source device |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2174755A (en) * | 1985-04-29 | 1986-11-12 | Teledyne Ind | Exhaust manifold for opposed cylinder ic engines |
US5331810A (en) * | 1992-05-21 | 1994-07-26 | Arvin Industries, Inc. | Low thermal capacitance exhaust system for an internal combustion engine |
US5337330A (en) * | 1992-10-09 | 1994-08-09 | Cymer Laser Technologies | Pre-ionizer for a laser |
EP0798823A1 (en) * | 1996-03-29 | 1997-10-01 | Cymer, Inc. | Low cost corona pre-ionizer for a laser |
WO2000060708A2 (en) * | 1999-03-31 | 2000-10-12 | Lambda Physik Ag. | Surface preionization for gas lasers |
EP1107401A1 (en) * | 1999-12-08 | 2001-06-13 | Ushio Research Institute of Technology, Inc. | Gas laser device that emits ultraviolet rays |
US6522679B1 (en) * | 2000-02-22 | 2003-02-18 | Tuilaser | Gas laser discharge unit |
US6650679B1 (en) * | 1999-02-10 | 2003-11-18 | Lambda Physik Ag | Preionization arrangement for gas laser |
US6937635B2 (en) * | 2000-06-09 | 2005-08-30 | Cymer, Inc. | High rep-rate laser with improved electrodes |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6522A (en) | 1849-06-12 | Padlock | ||
US679A (en) | 1838-04-07 | Safety life-preserver | ||
CH612298A5 (en) * | 1976-06-23 | 1979-07-13 | Battelle Memorial Institute | |
DE3313811A1 (en) * | 1983-04-15 | 1984-10-18 | Siemens AG, 1000 Berlin und 8000 München | TRANSVERSALLY EXCITED GAS LASER |
IT1197768B (en) * | 1983-12-29 | 1988-12-06 | Selenia Ind Elettroniche | CROWN EFFECT PREIONIZER FOR GAS LASER |
NO853264L (en) * | 1984-10-15 | 1986-04-16 | Siemens Ag | TRANSVERSAL EXCITED GAS WELDING AND PROCEDURE FOR ITS OPERATION. |
JPH02214178A (en) * | 1989-02-15 | 1990-08-27 | Hiromi Kawase | Hollow cathode type discharge device |
US5200970A (en) * | 1990-12-03 | 1993-04-06 | Summit Technology, Inc. | Methods and compositions for protecting laser excitation gases from contamination |
CA2066875C (en) * | 1991-04-23 | 1996-05-21 | Takuhiro Ono | Discharge-pumped gas laser with baffle partition for controlled laser gas flow at preionizers |
GB9320662D0 (en) * | 1993-10-07 | 1993-11-24 | Atomic Energy Authority Uk | Corona discharge reactor |
DE19523338A1 (en) * | 1994-06-29 | 1996-02-01 | Okaya Electric Industry Co | Discharge type overvoltage protection device for protection of electronic circuits |
DE4426723A1 (en) * | 1994-07-22 | 1996-01-25 | Atl Lasertechnik & Accessoires | Sliding discharge preionization for gas lasers |
US5818865A (en) * | 1997-05-16 | 1998-10-06 | Cymer, Inc. | Compact excimer laser insulator with integral pre-ionizer |
JP3390671B2 (en) * | 1998-04-27 | 2003-03-24 | 炳霖 ▲楊▼ | Manufacturing method of surge absorber without chip |
US6433482B1 (en) * | 1998-05-11 | 2002-08-13 | Wisconsin Alumni Research Foundation | Barium light source method and apparatus |
US6757315B1 (en) * | 1999-02-10 | 2004-06-29 | Lambda Physik Ag | Corona preionization assembly for a gas laser |
US6587718B2 (en) * | 1999-10-08 | 2003-07-01 | Scimed Life Systems, Inc. | Iontophoretic delivery to heart tissue |
WO2003023910A2 (en) * | 2001-09-13 | 2003-03-20 | Cymer, Inc. | High rep-rate laser with improved electrodes |
DE10231127B4 (en) * | 2001-09-19 | 2008-09-25 | Toshiba Lighting & Technology Corp. | High-pressure discharge lamp and filament |
US6950453B2 (en) * | 2003-07-03 | 2005-09-27 | Secretary, Department Of Atomic Energy Goverment Of India | Pulser driven, helium free transversely excited atmospheric-pressure (TEA) CO2 laser |
JP2005183068A (en) * | 2003-12-17 | 2005-07-07 | Ushio Inc | Discharge lamp |
JP2005251585A (en) * | 2004-03-04 | 2005-09-15 | Nec Lighting Ltd | Cold cathode fluorescent lamp |
US7522650B2 (en) * | 2004-03-31 | 2009-04-21 | Cymer, Inc. | Gas discharge laser chamber improvements |
-
2005
- 2005-09-27 US US11/237,535 patent/US7542502B2/en active Active
-
2006
- 2006-09-25 DE DE602006018033T patent/DE602006018033D1/en active Active
- 2006-09-25 WO PCT/US2006/037225 patent/WO2007038412A2/en active Application Filing
- 2006-09-25 JP JP2008533475A patent/JP5349964B2/en active Active
- 2006-09-25 EP EP06804111A patent/EP1929595B1/en active Active
- 2006-09-25 KR KR1020087009797A patent/KR101334614B1/en active IP Right Grant
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2174755A (en) * | 1985-04-29 | 1986-11-12 | Teledyne Ind | Exhaust manifold for opposed cylinder ic engines |
US5331810A (en) * | 1992-05-21 | 1994-07-26 | Arvin Industries, Inc. | Low thermal capacitance exhaust system for an internal combustion engine |
US5337330A (en) * | 1992-10-09 | 1994-08-09 | Cymer Laser Technologies | Pre-ionizer for a laser |
EP0798823A1 (en) * | 1996-03-29 | 1997-10-01 | Cymer, Inc. | Low cost corona pre-ionizer for a laser |
US6650679B1 (en) * | 1999-02-10 | 2003-11-18 | Lambda Physik Ag | Preionization arrangement for gas laser |
WO2000060708A2 (en) * | 1999-03-31 | 2000-10-12 | Lambda Physik Ag. | Surface preionization for gas lasers |
EP1107401A1 (en) * | 1999-12-08 | 2001-06-13 | Ushio Research Institute of Technology, Inc. | Gas laser device that emits ultraviolet rays |
US6522679B1 (en) * | 2000-02-22 | 2003-02-18 | Tuilaser | Gas laser discharge unit |
US6937635B2 (en) * | 2000-06-09 | 2005-08-30 | Cymer, Inc. | High rep-rate laser with improved electrodes |
Non-Patent Citations (1)
Title |
---|
See also references of WO2007038412A2 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2446530C1 (en) * | 2011-01-28 | 2012-03-27 | Владимир Михайлович Борисов | Pulse-periodic gas-discharge laser |
Also Published As
Publication number | Publication date |
---|---|
US20070091972A1 (en) | 2007-04-26 |
US7542502B2 (en) | 2009-06-02 |
WO2007038412A2 (en) | 2007-04-05 |
DE602006018033D1 (en) | 2010-12-16 |
KR20080068814A (en) | 2008-07-24 |
EP1929595B1 (en) | 2010-11-03 |
JP5349964B2 (en) | 2013-11-20 |
KR101334614B1 (en) | 2013-11-29 |
EP1929595A4 (en) | 2009-08-12 |
JP2009510783A (en) | 2009-03-12 |
WO2007038412A3 (en) | 2007-06-21 |
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