EP2359389A4 - Laser ablation tooling via sparse patterned masks - Google Patents
Laser ablation tooling via sparse patterned masksInfo
- Publication number
- EP2359389A4 EP2359389A4 EP09827940.9A EP09827940A EP2359389A4 EP 2359389 A4 EP2359389 A4 EP 2359389A4 EP 09827940 A EP09827940 A EP 09827940A EP 2359389 A4 EP2359389 A4 EP 2359389A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- laser ablation
- patterned masks
- via sparse
- tooling via
- sparse patterned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Laser Beam Processing (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/275,669 US20100129617A1 (en) | 2008-11-21 | 2008-11-21 | Laser ablation tooling via sparse patterned masks |
PCT/US2009/060402 WO2010059310A2 (en) | 2008-11-21 | 2009-10-13 | Laser ablation tooling via sparse patterned masks |
Publications (2)
Publication Number | Publication Date |
---|---|
EP2359389A2 EP2359389A2 (en) | 2011-08-24 |
EP2359389A4 true EP2359389A4 (en) | 2014-08-20 |
Family
ID=42196564
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP09827940.9A Withdrawn EP2359389A4 (en) | 2008-11-21 | 2009-10-13 | Laser ablation tooling via sparse patterned masks |
Country Status (6)
Country | Link |
---|---|
US (2) | US20100129617A1 (en) |
EP (1) | EP2359389A4 (en) |
JP (2) | JP2012509194A (en) |
KR (1) | KR101716908B1 (en) |
CN (1) | CN102217036B (en) |
WO (1) | WO2010059310A2 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100129617A1 (en) * | 2008-11-21 | 2010-05-27 | Corrigan Thomas R | Laser ablation tooling via sparse patterned masks |
US20110070398A1 (en) * | 2009-09-18 | 2011-03-24 | 3M Innovative Properties Company | Laser ablation tooling via distributed patterned masks |
KR101135537B1 (en) * | 2010-07-16 | 2012-04-13 | 삼성모바일디스플레이주식회사 | Laser irradiation apparatus |
CN102789125B (en) * | 2012-07-27 | 2013-11-13 | 京东方科技集团股份有限公司 | Mask plate, mat manufacturing method and LCD panel |
US9142778B2 (en) * | 2013-11-15 | 2015-09-22 | Universal Display Corporation | High vacuum OLED deposition source and system |
CN107532275B (en) * | 2015-02-05 | 2019-09-13 | 迈康尼股份公司 | It is shifted forward for induced with laser and the repetition methods of high yield and the donor material shifted forward by reusing multiple target backing material plates or discrete donor dot pattern recycles |
WO2018006416A1 (en) * | 2016-07-08 | 2018-01-11 | 华为技术有限公司 | Method and apparatus for performing optical treatment on housing surface |
KR20190126780A (en) * | 2017-02-09 | 2019-11-12 | 유에스 신써틱 코포레이션 | Energy processed polycrystalline diamond compacts and related methods |
US11097950B2 (en) * | 2017-05-15 | 2021-08-24 | Korea Electronics Technology Institute | Graphene fabrication method |
CN108907482B (en) * | 2018-09-26 | 2024-01-02 | 无锡先导智能装备股份有限公司 | Using method of laser jump type tab cutting and forming device and laser die cutting machine |
US11353995B2 (en) * | 2019-04-15 | 2022-06-07 | Elo Touch Solutions, Inc. | Laser-ablated gradient region of a touchscreen |
KR20210142049A (en) | 2020-05-15 | 2021-11-24 | 삼성디스플레이 주식회사 | Display device, mask assembly, apparatus and method for manufacturing a display device |
Citations (7)
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US20010006414A1 (en) * | 1998-06-19 | 2001-07-05 | Daniel Gelbart | High resolution optical stepper |
GB2409765A (en) * | 2003-12-29 | 2005-07-06 | Lg Philips Lcd Co Ltd | Mask for three-shot sequential lateral solidification |
US20060216649A1 (en) * | 2005-03-23 | 2006-09-28 | Asml Netherlands B.V. | Reduced pitch multiple exposure process |
EP1712954A1 (en) * | 2005-04-12 | 2006-10-18 | ASML MaskTools B.V. | A method, program product and apparatus for performing double exposure lithography |
WO2007029028A1 (en) * | 2005-09-06 | 2007-03-15 | Plastic Logic Limited | Laser ablation of electronic devices |
WO2007115028A2 (en) * | 2006-03-31 | 2007-10-11 | 3M Innovative Properties Company | Microstructured tool and method of making same using laser ablation |
WO2009115785A1 (en) * | 2008-03-18 | 2009-09-24 | M-Solv Ltd. | Method and apparatus for laser processing the surface of a drum |
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US7604381B2 (en) * | 2007-04-16 | 2009-10-20 | 3M Innovative Properties Company | Optical article and method of making |
US20080257871A1 (en) * | 2007-04-20 | 2008-10-23 | Leiser Judson M | Ablation device |
US20100129617A1 (en) * | 2008-11-21 | 2010-05-27 | Corrigan Thomas R | Laser ablation tooling via sparse patterned masks |
-
2008
- 2008-11-21 US US12/275,669 patent/US20100129617A1/en not_active Abandoned
-
2009
- 2009-10-13 KR KR1020117013922A patent/KR101716908B1/en active IP Right Grant
- 2009-10-13 EP EP09827940.9A patent/EP2359389A4/en not_active Withdrawn
- 2009-10-13 JP JP2011537454A patent/JP2012509194A/en active Pending
- 2009-10-13 WO PCT/US2009/060402 patent/WO2010059310A2/en active Application Filing
- 2009-10-13 CN CN200980146301.2A patent/CN102217036B/en active Active
-
2015
- 2015-09-15 JP JP2015181854A patent/JP6117881B2/en active Active
-
2017
- 2017-06-21 US US15/628,748 patent/US20170285457A1/en not_active Abandoned
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20010006414A1 (en) * | 1998-06-19 | 2001-07-05 | Daniel Gelbart | High resolution optical stepper |
GB2409765A (en) * | 2003-12-29 | 2005-07-06 | Lg Philips Lcd Co Ltd | Mask for three-shot sequential lateral solidification |
US20060216649A1 (en) * | 2005-03-23 | 2006-09-28 | Asml Netherlands B.V. | Reduced pitch multiple exposure process |
EP1712954A1 (en) * | 2005-04-12 | 2006-10-18 | ASML MaskTools B.V. | A method, program product and apparatus for performing double exposure lithography |
WO2007029028A1 (en) * | 2005-09-06 | 2007-03-15 | Plastic Logic Limited | Laser ablation of electronic devices |
WO2007115028A2 (en) * | 2006-03-31 | 2007-10-11 | 3M Innovative Properties Company | Microstructured tool and method of making same using laser ablation |
WO2009115785A1 (en) * | 2008-03-18 | 2009-09-24 | M-Solv Ltd. | Method and apparatus for laser processing the surface of a drum |
Also Published As
Publication number | Publication date |
---|---|
WO2010059310A2 (en) | 2010-05-27 |
US20170285457A1 (en) | 2017-10-05 |
JP6117881B2 (en) | 2017-04-19 |
KR101716908B1 (en) | 2017-03-17 |
US20100129617A1 (en) | 2010-05-27 |
KR20110095365A (en) | 2011-08-24 |
CN102217036A (en) | 2011-10-12 |
JP2012509194A (en) | 2012-04-19 |
EP2359389A2 (en) | 2011-08-24 |
WO2010059310A3 (en) | 2010-07-15 |
JP2015231638A (en) | 2015-12-24 |
CN102217036B (en) | 2014-04-23 |
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Ipc: G03F 1/20 20120101ALI20140715BHEP Ipc: B23K 26/06 20140101ALI20140715BHEP Ipc: G03F 1/00 20120101ALI20140715BHEP Ipc: G03F 7/24 20060101ALI20140715BHEP Ipc: H01L 21/027 20060101AFI20140715BHEP |
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17Q | First examination report despatched |
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18W | Application withdrawn |
Effective date: 20200515 |