US20010009169A1 - Ti-Ni-based shape-memory alloy and method of manufacturing same - Google Patents

Ti-Ni-based shape-memory alloy and method of manufacturing same Download PDF

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US20010009169A1
US20010009169A1 US09/808,046 US80804601A US2001009169A1 US 20010009169 A1 US20010009169 A1 US 20010009169A1 US 80804601 A US80804601 A US 80804601A US 2001009169 A1 US2001009169 A1 US 2001009169A1
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alloy
shape
manufacturing
memory alloy
range
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Setsuo Kajiwara
Takehiko Kikuchi
Kazuyuki Ogawa
Shuichi Miyazaki
Takeshi Matsunaga
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Priority to US10/281,143 priority patent/US20030136481A1/en
Priority to US10/810,838 priority patent/US20040177904A1/en
Abandoned legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C45/00—Amorphous alloys
    • C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C14/00—Alloys based on titanium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C45/00—Amorphous alloys
    • C22C45/10—Amorphous alloys with molybdenum, tungsten, niobium, tantalum, titanium, or zirconium or Hf as the major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/006—Resulting in heat recoverable alloys with a memory effect
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/84—Manufacture, treatment, or detection of nanostructure
    • Y10S977/89—Deposition of materials, e.g. coating, cvd, or ald
    • Y10S977/891—Vapor phase deposition

Definitions

  • the present invention relates to a Ti—Ni-based shape-memory alloy and a method of manufacturing same. More particularly, the present invention relates to a novel Ti—Ni-based shape-memory alloy which is useful as an actuator for a micro-valve or a micro-machine without the need for a strict control of composition and which has a largely improved shape-memory property, and a method of manufacturing same.
  • Ti—Ni-based alloy As an alloy having shape-memory properties, Ti—Ni-based alloy has conventionally been known. A method of manufacturing this Ti—Ni-based alloy into a thin-film alloy is also known.
  • the thin-film shape-memory alloy is expected to be applicable to various precision areas.
  • a method for improving shape-memory properties such as shape recovering ability and recovery strain is known, which comprises crystallizing an amorphous alloy thin film vapor-deposited by sputtering, for example, by annealing the thin film at a temperature higher than the crystallization temperature, and then heat-treating the film at various temperatures.
  • the conventional technique has problems such that the improving effect of shape-memory properties is not sufficient, that the above-mentioned method for improving these properties requires strict control of the chemical composition of the Ti—Ni-based alloy, and furthermore, that two-stage heat treatments are required. Under such circumstances, therefore, it is very difficult even to obtain a limited improvement of shape-memory properties and to reduce the manufacturing cost.
  • the present invention has an object to provide a novel Ti—Ni-based shape-memory alloy which overcomes these drawbacks in the conventional technology as described above and allows remarkable improvement of shape-memory properties by a simple means, and a method of manufacturing same.
  • the present invention provides a Ti—Ni-based shape-memory alloy having a titanium content within a range of from 50 to 66 atomic %, wherein subnanometric precipitates generating coherent elastic strains in the parent phase are distributed.
  • the present invention provides also a method of manufacturing the above-mentioned alloy, which comprises the step of heat-treating an amorphous Ti—Ni-based alloy at a temperature within a range of from 600 to 800 K.
  • FIG. 1 shows a high-resolution electron photomicrograph illustrating the structure of an alloy thin film as an example of the present invention.
  • FIG. 2 shows an enlarged micrograph of the framed region of FIG. 1, revealing subnanometric plate precipitates and coherent elastic strains.
  • FIG. 3 shows various curves illustrating the results of thermal cycle tests under constant loads.
  • FIG. 4 shows a curve illustrating the relationship between maximum shape recovery strain and the heat treatment temperature.
  • FIG. 5 shows the relationship between a load (external stress) and shape recovery strain for various heat treatment temperature.
  • FIG. 6 shows the relationship between critical stress for slip and the heat treatment temperature.
  • the present invention makes it possible to remarkably improve shape-memory properties such as shape recovering ability and recovery strain through the construction as described above.
  • a special nanometer-scale precipitate is distributed in the parent phase thereof, and this precipitate produces a coherent elastic strain between the precipitate and the parent phase.
  • coherent elastic strain means an elastic strain caused by connection of the slightly different crystal lattice of the precipitate with that of the parent phase.
  • an alloy having such a feature is manufactured by applying a heat treatment to an amorphous alloy at a temperature within a range of from 600 to 800 K.
  • the heat treatment temperature is limited within the range of from 600 to 800 K, and the specimen must be heated directly from the amorphous state, in the present case, from the as-deposited state.
  • Typical heat treatment conditions are, for example, as follows:
  • Atmosphere Vacuum or an inert gas such as argon
  • Heating rate 5 to 50 K/minute
  • Cooling Rapid cooling.
  • the amorphous Ti—Ni-based alloy may be manufactured, for example, by the vapor deposition process into a thin film, or by any other appropriate method, and there is no particular limitation in this respect.
  • the alloy of the invention in the form of a thin film is expected to be used in such applications as an actuator for a micro-valve or a micro-machine hereafter, and is therefore a very important material.
  • the manufacturable thin film thickness covers a range from under 5 ⁇ m to 10 ⁇ m in general.
  • FIG. 1 illustrates an example of electronmicrograph thereof.
  • FIG. 2 is an enlarged micrograph thereof.
  • a number of thin plate precipitates are produced and distributed in the parent phase. These precipitates appear along the ⁇ 100 ⁇ bcc plane of the parent phase bcc(B2 type), and take the form of a disk having a thickness of about 0.5 nm (2 to 3 lattice planes) and a radius of from about 5 to 10 nm.
  • the precipitates are distributed at intervals of about 10 nm, i.e., in a nanometer scale.
  • the precipitate was confirmed to be Ti-rich by EDS analysis of field emission electron microscope.
  • FIG. 3 shows the result. As shown in this figure, there is no permanent strain under loads of up to 240 MPa, and a large shape recovery strain as 6% is available.
  • FIG. 4 illustrates the result of evaluation of the relationship between the heat-treatment temperature and the maximum shape recovery strain, indicating availability of a recovery strain of 5 to 6% through an annealing at a temperature within a range of from 700 to 800 K.
  • FIG. 5 shows the relationship between shape recovery strain and stress under load, various heat treatments.
  • FIG. 5 reveals that a recovery strain of at least 4.5% is obtained with a stress range of from 200 to 670 MPa.
  • the maximum loadable stress is 670 MPa.
  • FIG. 6 illustrates the effect of the heat-treatment temperature on the maximum stress loadable within a range in which a permanent strain (slip deformation) is not introduced into the sample.
  • shape-memory properties are remarkably improved through a heat-treatment at a temperature of from 600 to 800 K without the need for strictly controlling the composition or heat treatment. It is also possible to largely reduce the manufacturing cost.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Micromachines (AREA)

Abstract

To remarkably improve shape-memory properties without the need for strictly controlling the composition, the present invention provides a Ti—Ni-based shape-memory alloy having a titanium content within a range of from 50 to 55 atomic %, which comprises an amorphous alloy heat-treated at a temperature of from 600 to 800 K, in which subnanometric precipitates generating coherent elastic strains are formed and distributed in the bcc parent phase(B2).

Description

  • This is a divisional of Ser. No. 08/768,467, filed Dec. 18, 1996. [0001]
    • FIELD OF THE INVENTION
  • The present invention relates to a Ti—Ni-based shape-memory alloy and a method of manufacturing same. More particularly, the present invention relates to a novel Ti—Ni-based shape-memory alloy which is useful as an actuator for a micro-valve or a micro-machine without the need for a strict control of composition and which has a largely improved shape-memory property, and a method of manufacturing same. [0002]
    • PRIOR ART AND PROBLEMS
  • As an alloy having shape-memory properties, Ti—Ni-based alloy has conventionally been known. A method of manufacturing this Ti—Ni-based alloy into a thin-film alloy is also known. [0003]
  • The thin-film shape-memory alloy is expected to be applicable to various precision areas. In the case of Ti—Ni-based shape-memory alloy thin film, a method for improving shape-memory properties such as shape recovering ability and recovery strain is known, which comprises crystallizing an amorphous alloy thin film vapor-deposited by sputtering, for example, by annealing the thin film at a temperature higher than the crystallization temperature, and then heat-treating the film at various temperatures. [0004]
  • However, the conventional technique has problems such that the improving effect of shape-memory properties is not sufficient, that the above-mentioned method for improving these properties requires strict control of the chemical composition of the Ti—Ni-based alloy, and furthermore, that two-stage heat treatments are required. Under such circumstances, therefore, it is very difficult even to obtain a limited improvement of shape-memory properties and to reduce the manufacturing cost. [0005]
  • Therefore, the present invention has an object to provide a novel Ti—Ni-based shape-memory alloy which overcomes these drawbacks in the conventional technology as described above and allows remarkable improvement of shape-memory properties by a simple means, and a method of manufacturing same. [0006]
    • SUMMARY OF THE INVENTION
  • As means to solve the above-mentioned problems, the present invention provides a Ti—Ni-based shape-memory alloy having a titanium content within a range of from 50 to 66 atomic %, wherein subnanometric precipitates generating coherent elastic strains in the parent phase are distributed. [0007]
  • Further, the present invention provides also a method of manufacturing the above-mentioned alloy, which comprises the step of heat-treating an amorphous Ti—Ni-based alloy at a temperature within a range of from 600 to 800 K. [0008]
    • BRIEF DESCRIPTION OF DRAWINGS
  • FIG. 1 shows a high-resolution electron photomicrograph illustrating the structure of an alloy thin film as an example of the present invention. [0009]
  • FIG. 2 shows an enlarged micrograph of the framed region of FIG. 1, revealing subnanometric plate precipitates and coherent elastic strains. [0010]
  • FIG. 3 shows various curves illustrating the results of thermal cycle tests under constant loads. [0011]
  • FIG. 4 shows a curve illustrating the relationship between maximum shape recovery strain and the heat treatment temperature. [0012]
  • FIG. 5 shows the relationship between a load (external stress) and shape recovery strain for various heat treatment temperature. [0013]
  • FIG. 6 shows the relationship between critical stress for slip and the heat treatment temperature. [0014]
    • DETAILED DESCRIPTION OF THE INTENTION
  • The present invention makes it possible to remarkably improve shape-memory properties such as shape recovering ability and recovery strain through the construction as described above. [0015]
  • As to the chemical composition itself of the alloy, other elements may be added or mixed as impurities to this alloy comprising Ti (titanium) and Ni (nickel), so far as these elements do not impair the shape-memory properties of the invention. [0016]
  • With a titanium content of under 50 atomic %, it becomes difficult to achieve the object of the invention, and it is also the case with a titanium content of over 66 atomic %. [0017]
  • In the target alloy, a special nanometer-scale precipitate is distributed in the parent phase thereof, and this precipitate produces a coherent elastic strain between the precipitate and the parent phase. The term “coherent elastic strain” as herein used means an elastic strain caused by connection of the slightly different crystal lattice of the precipitate with that of the parent phase. In the present invention, an alloy having such a feature is manufactured by applying a heat treatment to an amorphous alloy at a temperature within a range of from 600 to 800 K. [0018]
  • The heat treatment temperature is limited within the range of from 600 to 800 K, and the specimen must be heated directly from the amorphous state, in the present case, from the as-deposited state. Typical heat treatment conditions are, for example, as follows: [0019]
  • Time: 10 minutes to 3 hours [0020]
  • Atmosphere: Vacuum or an inert gas such as argon [0021]
  • Heating rate: 5 to 50 K/minute [0022]
  • Cooling: Rapid cooling. [0023]
  • Needless to mention, these conditions are not limitative. In the already crystallized Ti—Ni-based alloy, generation and distribution of the above-mentioned precipitate are not observed by this heat treatment, and a remarkable improvement of properties is unavailable. With a temperature of over 800 K, an appropriate precipitate is not formed. With a temperature of under 600 K, diffusion of atoms becomes slower, and no precipitate is generated within a practicable period of time. In both cases, a remarkable improving effect of the properties is unavailable. [0024]
  • The amorphous Ti—Ni-based alloy may be manufactured, for example, by the vapor deposition process into a thin film, or by any other appropriate method, and there is no particular limitation in this respect. [0025]
  • It should particularly be noted that the alloy of the invention in the form of a thin film is expected to be used in such applications as an actuator for a micro-valve or a micro-machine hereafter, and is therefore a very important material. The manufacturable thin film thickness covers a range from under 5 μm to 10 μm in general. [0026]
  • The alloy and the manufacturing method thereof of the present invention are now described further in detail by means of examples. The invention is not, however, limited by the following examples. [0027]
    • EXAMPLES
  • Using a Ti—Ni target material, thin films of an amorphous Ti—Ni alloy containing 48.2 atomic % Ni were formed on a glass substrate by argon ion sputtering. The thickness of the films was about 7 μm and its composition was determined by electron probe X-ray microanalysis. [0028]
  • A thin film heat-treated at 745 K for 1 hr was observed by means of a high-resolution electron microscope. FIG. 1 illustrates an example of electronmicrograph thereof. FIG. 2 is an enlarged micrograph thereof. As is known from the micrographs of FIGS. 1 and 2, a number of thin plate precipitates are produced and distributed in the parent phase. These precipitates appear along the {100}bcc plane of the parent phase bcc(B2 type), and take the form of a disk having a thickness of about 0.5 nm (2 to 3 lattice planes) and a radius of from about 5 to 10 nm. The precipitates are distributed at intervals of about 10 nm, i.e., in a nanometer scale. The precipitate was confirmed to be Ti-rich by EDS analysis of field emission electron microscope. [0029]
  • For a specimen heat-treated at 765 K for 1 hr, changes in elongation were evaluated through thermal cycles under various loads. This specimen contained the same kind of precipitates as mentioned above. FIG. 3 shows the result. As shown in this figure, there is no permanent strain under loads of up to 240 MPa, and a large shape recovery strain as 6% is available. [0030]
  • FIG. 4 illustrates the result of evaluation of the relationship between the heat-treatment temperature and the maximum shape recovery strain, indicating availability of a recovery strain of 5 to 6% through an annealing at a temperature within a range of from 700 to 800 K. [0031]
  • FIG. 5 shows the relationship between shape recovery strain and stress under load, various heat treatments. [0032]
  • FIG. 5 reveals that a recovery strain of at least 4.5% is obtained with a stress range of from 200 to 670 MPa. The maximum loadable stress is 670 MPa. [0033]
  • FIG. 6 illustrates the effect of the heat-treatment temperature on the maximum stress loadable within a range in which a permanent strain (slip deformation) is not introduced into the sample. [0034]
  • It is confirmed, from the example as described above, that the invention permits remarkable improvement of shape-memory properties as compared with the conventional process. [0035]
  • According to the present invention, shape-memory properties are remarkably improved through a heat-treatment at a temperature of from 600 to 800 K without the need for strictly controlling the composition or heat treatment. It is also possible to largely reduce the manufacturing cost. [0036]

Claims (4)

What is claimed is:
1. A method of manufacturing a Ti—Ni-based shape-memory alloy having a titanium content within a range of from 50 to 66 atomic %, which comprises the step of forming and distributing a nanometer-scale precipitate generating a coherent elastic strain in a mother phase through a heat treatment of an amorphous Ti—Ni-based alloy at a temperature within a range of from 600 to 800 K.
2. The manufacturing method as claimed in
claim 1
, wherein said heat treatment is carried out in a single run.
3. The manufacturing method as claimed in
claim 1
, wherein said alloy is in a thin film shape.
4. The manufacturing method as claimed in
claim 2
, wherein said alloy is in a thin film shape.
US09/808,046 1996-03-22 2001-03-15 Ti-Ni-based shape-memory alloy and method of manufacturing same Abandoned US20010009169A1 (en)

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US10/281,143 US20030136481A1 (en) 1996-03-22 2002-10-28 Ti-Ni-based shape-memory alloy and method of manufacturing same
US10/810,838 US20040177904A1 (en) 1996-03-22 2004-03-29 Ti-Ni-based shape-memory alloy and method of manufacturing same

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US08/768,467 US6001195A (en) 1996-03-22 1996-12-18 Ti-Ni-based shape-memory alloy and method of manufacturing same
US32501799A 1999-06-03 1999-06-03
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US20040102837A1 (en) * 2002-11-25 2004-05-27 Boyle Christopher T. Implantable expandable medical devices having regions of differential mechanical properties and methods of making same
US6820676B2 (en) 1999-11-19 2004-11-23 Advanced Bio Prosthetic Surfaces, Ltd. Endoluminal device exhibiting improved endothelialization and method of manufacture thereof
US20040247386A1 (en) * 2003-06-04 2004-12-09 Union Seimitsu Co., Ltd. Screw attachment, fastening assembly having screw attachment, and process of releasing fastening assembly
US7704274B2 (en) 2002-09-26 2010-04-27 Advanced Bio Prothestic Surfaces, Ltd. Implantable graft and methods of making same
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US20100272538A1 (en) * 2007-12-03 2010-10-28 Tokai University Educational System Fastening body structure
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* Cited by examiner, † Cited by third party
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JPH10218700A (en) * 1997-02-07 1998-08-18 Natl Res Inst For Metals Alloy-based nanocrystal assembly and its production
US20010035236A1 (en) * 1998-03-16 2001-11-01 Akira Ishida Shape memory alloy with ductility and a making process of the same
US20020043456A1 (en) * 2000-02-29 2002-04-18 Ho Ken K. Bimorphic, compositionally-graded, sputter-deposited, thin film shape memory device
US20040191556A1 (en) * 2000-02-29 2004-09-30 Jardine Peter A. Shape memory device having two-way cyclical shape memory effect due to compositional gradient and method of manufacture
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US7316753B2 (en) * 2003-03-25 2008-01-08 Questek Innovations Llc Coherent nanodispersion-strengthened shape-memory alloys
US7192496B2 (en) * 2003-05-01 2007-03-20 Ati Properties, Inc. Methods of processing nickel-titanium alloys
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JP2009033727A (en) * 2007-06-22 2009-02-12 Semiconductor Energy Lab Co Ltd Semiconductor device
US8143721B2 (en) 2007-06-29 2012-03-27 Intel Corporation Package substrate dynamic pressure structure
US8475711B2 (en) 2010-08-12 2013-07-02 Ati Properties, Inc. Processing of nickel-titanium alloys
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RU2476619C2 (en) * 2011-03-17 2013-02-27 Федеральное государственное образовательное учреждение высшего профессионального образования "Национальный исследовательский технологический университет "МИСиС" Treatment method of titanium-nickel alloys with nickel content of 49-51 at % with shape memory effect and reversible shape memory effect (versions)
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US9752219B2 (en) 2012-11-16 2017-09-05 The Texas A&M University System Self-adaptive, ultra-low elastic modulus shape memory alloys
US9279171B2 (en) 2013-03-15 2016-03-08 Ati Properties, Inc. Thermo-mechanical processing of nickel-titanium alloys

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3741119A1 (en) * 1987-12-04 1989-06-15 Krupp Gmbh PRODUCTION OF SECONDARY POWDER PARTICLES WITH NANOCRISTALLINE STRUCTURE AND WITH SEALED SURFACES
KR890012013A (en) * 1988-01-22 1989-08-23 이정오 Ni-Ti Shape Memory Alloy and Manufacturing Method Thereof
US5061914A (en) * 1989-06-27 1991-10-29 Tini Alloy Company Shape-memory alloy micro-actuator
DE4220226A1 (en) * 1992-06-20 1993-12-23 Bosch Gmbh Robert Magnetostrictive converter
JPH0748637A (en) * 1993-08-04 1995-02-21 Yasubumi Furuya Metal matrix composite material enhanced in strength, damping capacity, radiation resistance and corrosion resistance
JPH0776747A (en) * 1993-09-10 1995-03-20 Olympus Optical Co Ltd Shape memory alloy and its production
US5825275A (en) * 1995-10-27 1998-10-20 University Of Maryland Composite shape memory micro actuator

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US8529616B2 (en) 2002-11-25 2013-09-10 Advanced Bio Prosthetic Surfaces, Ltd., a wholly owned subsidary of Palmaz Scientific, Inc. Implantable expandable medical devices having regions of differential mechanical properties and methods of making same
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US7699568B2 (en) * 2003-06-04 2010-04-20 Union Seimitsu Co. Ltd Screw attachment, fastening assembly having screw attachment, and process of releasing fastening assembly
US20100162550A1 (en) * 2003-06-04 2010-07-01 Kazuo Sugiyama Screw attachment, fastening assembly having screw attachment, and process of releasing fastening assembly
US20040247386A1 (en) * 2003-06-04 2004-12-09 Union Seimitsu Co., Ltd. Screw attachment, fastening assembly having screw attachment, and process of releasing fastening assembly
US8303222B2 (en) 2007-12-03 2012-11-06 Tokai University Educational System Fastening body structure
US20100272538A1 (en) * 2007-12-03 2010-10-28 Tokai University Educational System Fastening body structure

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