US20010013423A1 - Flip chip attach on flexible circuit carrier using chip with metallic cap on solder - Google Patents

Flip chip attach on flexible circuit carrier using chip with metallic cap on solder Download PDF

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Publication number
US20010013423A1
US20010013423A1 US08/932,864 US93286497A US2001013423A1 US 20010013423 A1 US20010013423 A1 US 20010013423A1 US 93286497 A US93286497 A US 93286497A US 2001013423 A1 US2001013423 A1 US 2001013423A1
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United States
Prior art keywords
solder
circuit carrier
flexible circuit
carrier
flexible
Prior art date
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Abandoned
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US08/932,864
Inventor
Hormazdyar M. Dalal
Kenneth M. Fallon
Gene J. Gaudenzi
Cynthia S. Milkovich
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Individual
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Individual
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Priority to US08/932,864 priority Critical patent/US20010013423A1/en
Publication of US20010013423A1 publication Critical patent/US20010013423A1/en
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    • HELECTRICITY
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    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/11Manufacturing methods
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    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/563Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
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    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
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    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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    • Y10T29/49146Assembling to base an electrical component, e.g., capacitor, etc. with encapsulating, e.g., potting, etc.

Definitions

  • the present invention relates generally to an improved and cost saving Direct Chip Attach (DCA) on Flexible circuit carriers using Flip Chip Attach (FCA) technology. More particularly, the invention encompasses a structure where at least one Integrated Circuit Chip can be directly attached to a flexible substrate. This direct attachment can be done using C4 (Controlled Collapsed Chip Connection) technology by capping the already reflowed solder balls and forming a eutectic solder composition. A method for such direct chip attachment to the flexible card is also disclosed.
  • C4 Controlled Collapsed Chip Connection
  • Electronic products typically comprise of plurality of components.
  • the packaging of these components follow a hierarchy where an Integrated Circuit (IC) chip comprising of semiconductor micro-devices are connected (1st level assembly) to carriers made of ceramic or organic laminates comprising one or several layers of metal interconnection lines.
  • IC Integrated Circuit
  • carriers may also contain some other discrete devices like capacitors, resistors etc.
  • modules are called modules.
  • DASD Direct Access Storage Discs
  • static region comprised of IC chips on an input card
  • dynamic region comprised of memory discs
  • Flexible Printed Circuit Boards A close proximity of static and dynamic regions is required to increase the performance of such DASD. This requires direct bonding of IC chips on Flexible circuit carrier connected to the disc drive.
  • TAB Tape Automated Bonding
  • TAB is not capable of taking full advantage of the Very Large Scale Integration which not only requires close spacing of I/O pads but also requires an array pattern to accommodate the vast number of I/O pads.
  • TAB itself is a first level of packaging, hence TAB mounting of chips on Flexible circuit carrier precludes it from the Direct Chip Attach technology.
  • TAB TAB
  • Still yet another shortcoming is that rework is economically unfeasible.
  • the C4 or Controlled Collapse Chip Connection technology has been successfully employed for 1st level assembly of chip on ceramic carriers.
  • the C4 technology is described in detail by many authors, see for example, Microelectronics Packaging handbook, edited by, Rao R. Tummala and Eugene J. Rymaszewski, pages 366-391 (1989), the disclosure of which is incorporated herein by reference.
  • the C4 interconnection is comprised of two main elements, a solder wettable pad called Ball Limiting Metallurgy (BLM), and a ball of solder.
  • the BLM is comprised of an adhesive layer like Cr or TiW, and a solder reflowable layer like copper or nickel.
  • the BLM materials and their thicknesses are judiciously chosen to provide good and reliable electrical, mechanical and thermal stability to interconnect structure.
  • the solder material used for C4 is preferably a low percentage (about 2 percent to about 10 percent) tin alloyed with lead. This combination is used:
  • a method for flexible substrates which matches the Legg and Schrottke's scheme of “tinning” the substrate with eutectic alloy, is shown by Milkovich et al., in U.S. patent application Ser. No. 08/071,630, entitled “Manufacturing Flexible Circuit Board Assemblies with Common Heat Spreaders”, filed on Jun. 3, 1993, and assigned to the assignee of the instant patent application, and the disclosure of which is incorporated herein by reference.
  • “decals” of eutectic solder balls with required footprint are first formed which is subsequently transferred on the flexible circuit carrier. Decals are formed by electroplating solder balls on a stainless steel plate.
  • This method requires a photo-imageable solder mask on the Flexible circuit carrier circuit, holes corresponding to the required footprint are developed out in this mask.
  • the decals are transferred by placing the flipped stainless steel plate on flexible circuit carrier card and reflowing.
  • Flexible printed circuit cards are typically made of polyimides, for example Pyralux (Trade Mark of E. I. duPont de Nemours & Co., Inc.).
  • Polyimides for example Pyralux (Trade Mark of E. I. duPont de Nemours & Co., Inc.).
  • Milkovich et al. “Double Sided Flexible Carrier with Discretes and Thermally Enhanced FCA/COF” IEEE 43rd ECTC Proceedings, June 1993, pages 16-21, have demonstrated methods of circuitization and device attachments on both sides of the flexible circuit carrier; the disclosure of which is incorporated herein by reference.
  • One of the disadvantage of this method is poor yield.
  • a second approach for lowering the joining temperature for Direct Chip Attach is to provide a low melting Solder On Chip (SOC) C4 rather than on the carrier conductor.
  • SOC Solder On Chip
  • 5,075,965 disclose a method, where an inhomogeneous, anisotropic column consists of lead rich bottom and tin rich top of sufficient thickness to form eutectic alloy. The resulting as-deposited and un-reflowed column is then joined onto the card's conductor.
  • Eiji et al. in Japanese Patent Publication No. 62-117346, describes an anisotropic column structure of low and high melting solders.
  • the basic objective of this invention is essentially to provide an increase height of a solder joint rather than to provide a low melting solder joining process.
  • a high-melting point metallic layer is secured to a chip and a substrate and a low-melting point metallic layer is then formed. the two low-melting point metallic layers are then joined and thereby the chip is joined to the substrate.
  • IBM Technical Disclosure Bulletin entitled “Indium-Lead-Indium Chip Joining”, W. A. Dawson et al., vol. 11, No. 11, page 1528 (April 1969), discloses the standard capping of lead with either indium or tin for diffusion bonding. In order to alleviate the problem of chip collapse onto the surface of the substrate an intermediate temperature is employed.
  • a bump completely composed of low melting composition is a feature to be avoided as the high tin content reacts with all of the copper of the adhesive layer (BLM) giving a thick intermetallic layer.
  • BLM adhesive layer
  • High stresses of reacted BLM have been known to cause solder pads to fall off and to create insulation cracking.
  • the eutectic solder bumps also have poor electromigration and thermal fatigue lifetime. It is also known that low melting eutectic solder suffers from void formation due to thermal migration which causes circuit failure.
  • This invention relates generally to interconnection in electronic circuit packages, and more particularly shows a new solder interconnection technology to make a Direct Chip Attachment (DCA) on Flexible organic circuit carrier.
  • DCA Direct Chip Attachment
  • a method for preparing the flexible circuit carrier card for direct device attachment using low melting Solder On Chip (SOC) where the low melting eutectic alloy is formed during joining operation and is localized at the tip of the standard high melting C4 ball.
  • SOC Solder On Chip
  • the invention is a novel method and structure for providing direct device attach to flexible circuit card using a novel solder interconnection scheme.
  • Another purpose of this invention is to provide a method for simultaneously joining devices on Flexible card using the DCA/SOC, the method of the instant, along with various Flip Chip, SMT and/or BGA (Ball Grid Array) technologies.
  • Another purpose of this invention is to provide a Flexible circuit card/device assembly which has increased performance.
  • Yet another purpose of this invention is to provide for a Flexible circuit carrier card which is low in cost, easy to build and possesses high reliability.
  • Still yet another purpose of this invention is to provide a Flexible circuit carrier card with mounted devices which has low profile, is compact in design and has low weight.
  • Yet another purpose of this invention is to have a Flexible card which is compatible with wafer level electrical test and burn-in.
  • this invention comprises a method of directly attaching an electronic device onto a flexible circuit carrier, said method comprising the steps of:
  • this invention comprises a flexible electronic carrier comprising a flexible device carrier and at least one electronic device electrically connected thereto by at least one solder ball, wherein said solder ball has a cap of at least one low melting point cap forming a eutectic.
  • FIG. 1 shows a cross-section of a flexible circuit carrier substrate having at least one flexible sheet with at least one circuit on at least one surface.
  • FIG. 2 shows a cross-section of the flexible circuit carrier substrate of FIG. 1, after a stiffener has been secured using at least one adhesive.
  • FIG. 3 shows a cross-section of the flexible circuit carrier substrate after at least one layer of an organic material has been adhered adjacent to the circuits.
  • FIG. 4 shows a flexible circuit carrier that has been site-dressed for joining at least one electronic device.
  • FIG. 5 shows the securing of the flexible circuit carrier of FIG. 4, onto a support jig.
  • FIG. 6 shows the securing of one or more of electronic devices onto the site-dressed flexible circuit carrier card.
  • FIG. 7 shows an enlarged view of a solder ball interconnect having at least one metallic cap being secured to a single metallic pad.
  • FIG. 8 shows an enlarged cross-sectional view of the solder interconnect of FIG. 7, secured to the metallic pad after the reflow operation.
  • FIG. 9 is an enlarged cross-sectional view after at least one encapsulant has encapsulated at least one solder connection of FIG. 8.
  • the invention basically encompasses a flexible circuit carrier with metallic conductor lines, such as, copper. Openings are made at sites which will be electrically connected to an electronic device using reflowed solder with a metallic cap. Ashing of the surface of the flexible circuit carrier could also be done to improve the adhesion and the flow of encapsulants. Solder paste could be screened for SMT, solder balls could be placed for BGA, or, solder could also be placed by solder injection for various flip chip attach methods. Likewise, either one or both surfaces of the flexible circuit carrier could be prepared to secure various electronic devices.
  • the invention also encompasses the formation of a direct chip attach (DCA) on the flexible circuit carrier surface. This is done by aligning the solder interconnections with a cap of low melting point metal on the chip with the corresponding footprints on the flexible circuit carrier. The assembly is then held at a bias temperature of about 150° C. and then individual chips are heated, preferably with Infra Red (IR) heat source to a temperature of between about 190° C. to about 220° C. in a nitrogen or a forming gas environment. The assembly is then cooled and the chip is preferably encapsulated with an epoxy based encapsulant, such as, HYSOL 4511, Trade Name used by Dexter Hysol of California, USA.
  • DCA direct chip attach
  • An advantage of this invention is the fact that the method is applicable for all levels of packaging, i.e., for highest level packaging, involving chip joining to motherboard or flexible circuit carrier cards or PCMCIA (Personal Computer Memory Card International Association) cards.
  • PCMCIA Personal Computer Memory Card International Association
  • This invention basically came about as an unexpected result which showed that low melting point solder that is deposited atop a reflowed solder mass alloys only with enough solder mass to form a volume of eutectic alloy. It was also found that relatively little or no further interdiffusion took place even after multiple times of eutectic melting cycles. This is believed to be due to that fact that the amount of low melting point atop the solder mass was equivalent to eutectic composition for the deposited mass of low melting point metal. Thus, a desired volume of eutectic liquid atop a solid solder mass is formed without any need for a barrier.
  • a volume of eutectic liquid remains present, whenever the joint temperature is raised to eutectic temperature, even after joining on copper interconnections of circuit carrier; this liquid formation at the joint interface presents an ideal condition for easy removal of the joined chip for the purposes of chip replacement without mechanically or thermally affecting other components on the board.
  • solder interconnections using solder balls having a cap of low melting point metal allows for making a low temperature chip attachment directly to any of the higher levels of packaging substrates.
  • the solder ball After the solder ball has been formed using standard methods it is reflowed to give the solder ball a smooth surface.
  • This method does not need tinning of the carrier or substrate to which the chip is to be joined, which makes this method economical.
  • FIG. 1 shows a flexible sheet 10 , preferably a polyamide based flexible material, on which at least one metallic line, such as a copper film, is laminated using at least one first thermo-plastic adhesive 12 , and then the copper film is circuitized to form a plurality of circuits 14 .
  • the flexible sheet 10 could be selected from a group comprising organic substrate, multi-layer organic substrate, ceramic substrate or multi-layer ceramic substrate, to name a few.
  • the circuit carrier substrate 15 could be made with interlevel wiring (not shown) of one or more layers, and/or wiring channels on either or both surfaces.
  • circuits 14 are only shown on one surface.
  • At least one stiffener 18 such as a metal foil 18 , or for example, an aluminum foil 18 , is laminated on the backside of the circuit carrier substrate 15 , using at least one second thermo-plastic adhesive 16 , as more clearly shown in FIG. 2. It is preferred that the thickness of the stiffener 18 , is at least about 2 mil, and preferably between about 3 mil to about 5 mil. At least one of the layers for the stiffener 18 , could be selected from a group comprising aluminum, molybdenum, silicon, tantalum or titanium, to name a few.
  • a photo-imageable organic material 20 such as, for example, PSR4000 (Trade Name used by Taiyo Co., Japan), is then screened on top of the circuit carrier substrate 15 , and pre-baked at 80° C.
  • PSR4000 is optional.
  • the solder mask is not required.
  • PSR4000 is used here to demonstrate its need to act as solder dam to prevent lateral flow of solder.
  • the organic material 20 is then exposed and developed.
  • the organic material 20 is next cured at 150° C. This curing process opens a large area, corresponding to the device size. Holes corresponding to foot print of C4 solder balls on IC chips are opened for devices to be joined. This produces a flexible ribbon or card 25 , as clearly shown in FIG. 3.
  • FIG. 4 shows the top view of a flexible circuit carrier 23 , having wires or circuits 14 , and electrical interconnections 22 , 24 , 26 and 28 , to receive electronic devices with various joining technologies.
  • interconnection 22 could be a pad 22 , which is used for joining of DCA/SOC
  • interconnection 24 could be solder 24 , that has been placed using a solder injection method for FCA (Flip Chip Attach).
  • interconnection 26 could be screened solder 26 , such as BGA (Ball Grid Array) 26
  • interconnect 28 could be screened solder 28 , for SMT (Surface Mount Technology), etc..
  • the surface of the organic material 20 can optionally be oxygen ashed at about 130 mT pressure for about 30 minutes. This roughens the surface of the organic material 20 , and this surface roughness improves the flowability of chip encapsulant which are used later.
  • FIG. 5 shows the flexible circuit carrier 23 , after it is placed on a specially designed fixture or jig 30 .
  • the jig or fixture 30 is preferably made of a glass re-enforced thermosetting polymer.
  • the purpose of this jig or fixture 30 is to ensure planarity of the flexible circuit carrier card 23 , during reflow operations.
  • the flexible circuit carrier 23 is securely held at the four corners on the jig or fixture 30 , using spring loaded clamps 32 and 34 .
  • FIG. 6 shows the securing of one or more of electronic devices 42 , 44 , 46 and 48 , onto the site-dressed flexible circuit carrier 23 , which is itself secured to the jig 30 .
  • eutectic Pb—Sn solder is applied on the interconnects or pads 22 , 24 , 26 and 28 . It is preferred that the eutectic solder paste is screened on the SMT pads 28 , eutectic balls are placed for Ball Grid Array pads 26 , and eutectic solder is injected on pads 24 , for FCA, etc. A no clean solder flux is applied at the DCA/SOC sites 22 .
  • An IC chip 42 having C4 solder balls 41 , with tin Cap 43 , is next aligned to the DCA/SOC chip site 22 .
  • Other electronic devices 44 , 46 and 48 are aligned to their appropriate sites as shown in FIG. 6.
  • electronic device 44 with interconnects 45 , is aligned with interconnect 24
  • electronic device 46 is aligned with interconnect 26
  • electronic device 48 with interconnects 49 , is aligned with interconnect 28 , etc..
  • the electronic devices may be discretes like resistors, capacitors, power supplies, IC chips or may be another package like Thin Quad Flat Pack (TQFP), Ball Grid Array (BGA) package, Tape Ball Grid Array (TBGA), amplifying device, circuit carrier card, etc..
  • TQFP Thin Quad Flat Pack
  • BGA Ball Grid Array
  • TBGA Tape Ball Grid Array
  • amplifying device circuit carrier card, etc.
  • This assembly is then reflowed, preferably, in a belt type furnace.
  • heat for the solder reflow could be provided by at least one focused IR lamp. It is preferred that the belt speed and zone temperatures are adjusted so as to give a temperature profile where the assembly of FIG. 6, spends from about 3 to about 5 minutes above about 155° C., and, between about 15 to about 75 seconds at a maximum temperature of about 190° C. to about 230° C.
  • the maximum reflow temperature for the solder is between about 190° C. and about 230° C.
  • the solder reflow is above about 150° C. for between about 2 to about 5 minutes.
  • the time for solder reflow at maximum temperature is between about 15 to about 90 seconds.
  • the solder reflow is preferably performed in an environment selected from a group comprising dry nitrogen, forming gas or hydrogen. It should be noted that the heat cycle required for joining this chip is identical to that required for SMT or for Ball Grid Array joining heat profiles, this adds the advantage of simultaneous reflow joining of SOC chips as well as SMT and/or BGA devices. For lower maximum temperature a higher time is required at the maximum temperature.
  • FIG. 7 shows an enlarged view of chip 42 , and DCA/SOC interconnection or pad 22 , of FIG. 6.
  • the chip or electronic device 42 has a solder ball 41 , that has a cap of low melting point metal 43 .
  • the solder ball 41 is itself secured to a pad 52 , via a BLM 56 .
  • a layer of insulator 54 protects the surface of the chip 42 .
  • the low melting point metal cap 43 on the solder ball 41 , alloys with the solder ball 41 , to form an eutectic composition 53 , which melts at about 183° C.
  • the volume of eutectic liquid is enough to envelope the exposed pad 22 , such as, a copper pad 22 , of flexible circuit carrier 23 , and the surface tension of this eutectic liquid provides self aligning of the chip 42 , to the exposed copper pad 22 , on the flexible circuit carrier 23 .
  • the reflow temperature cycle evaporates the protective layer, if any, and also the flux, and hence no post cleaning is required.
  • FIG. 8 shows an enlarged cross-sectional view of a single interconnect of FIG. 7, after the chip joining operation creating chip-on-flex carrier 50 . It can be clearly seen that the chip 42 , has been secured to the flexible circuit carrier 23 , and that an eutectic solder 53 , has been formed between the interconnect pad 22 , and solder 51 .
  • FIG. 9 is an enlarged view of the electronic device or chip 42 , after it has been joined to the flexible circuit carrier 23 , forming the chip-on-flex carrier 50 .
  • suitable encapsulant 60 for example, HYSOL 4511, or an epoxy 60 , can be provided under and over the electronic device or chip 42 , and then cured. It has been found that the oxygen ashing step considerably improves the flow of the encapsulant under the chip 42 .
  • This encapsulant as shown in FIG. 9, primarily protects the electrical connection that is formed between the chip 42 , and the flexible circuit carrier 23 .
  • the solder ball 41 is preferably a high melting point solder ball, such as, for example, a solder ball with about 97 percent lead and about 3 percent tin, which is formed over the ball limiting metallurgy 56 .
  • the solder ball 41 could be formed either by evaporation or an electroplating methods of solder deposition. Before the inventive step of this invention is applied to the solder ball 41 , it is preferred that all the processing steps of the semiconductor, such as, wafer testing, electrical testing have been completed and the solder has been re-flowed to bring it back to its spherical shape.
  • the IC chip 42 could be a semiconductor wafer, wherein a plurality of devices (not shown) have been formed by conventional methods and interconnected through IC chip internal wires in one or more layers.
  • the high melting point solder ball is between about 2 percent to about 10 percent Sn, with the balance being Pb, on the chip with at least one capping layer of low melting point metal, such as, tin, thereby, providing eutectic solder at the tip of the high melting solder ball.
  • the flexible circuit carrier substrate 10 could be made of polyamide, polyester or polyethylene based material, in flexible form, with interlevel wiring (not shown) of one or more layers, and/or wiring channels on either or both surfaces.
  • the electronic devices typically have electrically conductive feature, such as pad, pins, etc., and wherein material for the electrically conductive features is selected from a group comprising Au, Co, Cr, Cu, Fe, Ni, TiW, phased Cr and Cu, and alloys thereof.
  • At least one layer of at least one low melting point metal is formed on the solder ball by a method selected from a group comprising Radio Frequency evaporation, E-beam evaporation, electroplating, electroless plating or injection.
  • the at least one low melting point metal s selected from a group comprising of bismuth, indium, tin or alloys thereof.
  • At least one low melting point metal caps between about 10 percent to about 90 percent of the exposed surface of the solder ball, and preferably caps between about 20 percent to about 80 percent of the exposed surface of the solder ball, and more preferably caps between about 30 percent to about 50 percent of the exposed surface of the solder ball.
  • the low melting point metal could completely envelope the solder ball.
  • the average thickness of the at least one low melting point metal cap is between about 15 to about 50 micrometers.
  • the material for the flexible circuit carrier could be selected from a group comprising polyimides, poly tetra flouro ethylene (PTFE), polyester or resin-impregnated fabrics, to name a few.

Abstract

A structure and method is disclosed for directly attaching a device or package on flexible organic circuit carriers having low cost and high reliability.
IC chips with a new solder interconnect structure, comprised of a layer of pure tin, deposited on the top of high melting Pb—Sn solder balls are employed for joining.
These methods, techniques and metallurgical structures enables direct attachment of electronic devices of any complexity to any substrate and to any level of packaging hierarchy.
Also, devices or packages having other joining technologies, eg. SMT, BGA, TBGA, etc. could be joined onto the flexible circuit carrier.

Description

    CROSS-REFERENCE TO RELATED PATENT APPLICATIONS
  • This patent application is related to U.S. patent application Ser. No. 08/476,475, entitled, “METHOD FOR FORMING REFLOWED SOLDER BALL WITH LOW MELTING POINT METAL CAP”, filed on Jun. 7, 1995, U.S. patent application Ser. No. 08/476,474, entitled, “REFLOWED SOLDER BALL WITH LOW MELTING POINT METAL CAP”, filed on Jun. 7, 1995, U.S. patent application Ser. No. 08/476,466, entitled, “METHOD FOR MAKING DIRECT CHIP ATTACH CIRCUIT CARD”, filed on Jun. 7, 1995, and U.S. patent application Ser. No. 08/476,472, entitled, “DIRECT CHIP ATTACH CIRCUIT CARD”, filed on Jun. 7, 1995, presently assigned to the assignee of the instant application and the disclosure of which is incorporated herein by reference. [0001]
  • FIELD OF THE INVENTION
  • The present invention relates generally to an improved and cost saving Direct Chip Attach (DCA) on Flexible circuit carriers using Flip Chip Attach (FCA) technology. More particularly, the invention encompasses a structure where at least one Integrated Circuit Chip can be directly attached to a flexible substrate. This direct attachment can be done using C4 (Controlled Collapsed Chip Connection) technology by capping the already reflowed solder balls and forming a eutectic solder composition. A method for such direct chip attachment to the flexible card is also disclosed. [0002]
  • BACKGROUND OF THE INVENTION
  • Semiconductor devices are becoming smaller and more dense with the evolution of new technology. However, increases in circuit density produce a corresponding challenge to improve chip and chip connections in order to remain competitive. Whereas significant process improvements are being made by reducing process variability, process improvements alone are not sufficient to increase both yield and reliability of these products. Further, the packaging technology has not been able to keep pace with IC (Integrated Circuit) chip miniaturization for performance improvements. [0003]
  • Electronic products typically comprise of plurality of components. The packaging of these components follow a hierarchy where an Integrated Circuit (IC) chip comprising of semiconductor micro-devices are connected (1st level assembly) to carriers made of ceramic or organic laminates comprising one or several layers of metal interconnection lines. These carriers may also contain some other discrete devices like capacitors, resistors etc. Thus assembled carriers with IC chips, along with some kind of sealing and cooling methodology, are called modules. [0004]
  • These modules, in turn, are connected to cards (2nd level assembly) usually made of organic laminates with printed circuits on either side of the card. [0005]
  • These cards are then connected to boards (3rd level assembly). Such 3 levels of hierarchy is required in many electronic applications, such as, in computer CPUs where performance of complex functions is required. [0006]
  • Increased integration in present day IC chips require product miniaturization by eliminating first, second or both levels of packaging. For example, in Direct Access Storage Discs (DASD), read/write functions provided by a static region, comprised of IC chips on an input card, are cross linked to a dynamic region, comprised of memory discs, via Flexible Printed Circuit Boards. A close proximity of static and dynamic regions is required to increase the performance of such DASD. This requires direct bonding of IC chips on Flexible circuit carrier connected to the disc drive. [0007]
  • The Tape Automated Bonding (TAB) is the most common method presently used for chip attachment on Flexible circuit carrier because it is also the most common method for first level packaging and it is suitable for mounting on flexible base. [0008]
  • However, TAB is not capable of taking full advantage of the Very Large Scale Integration which not only requires close spacing of I/O pads but also requires an array pattern to accommodate the vast number of I/O pads. [0009]
  • The TAB itself is a first level of packaging, hence TAB mounting of chips on Flexible circuit carrier precludes it from the Direct Chip Attach technology. [0010]
  • Another shortcoming of TAB is that it requires additional space to accommodate the wire leads, this limits its capability in bringing the static and dynamic regions close enough. [0011]
  • Yet another limiting factor for use of TAB is difficulty in testing and/or burning-in of these mounted chips; this limits the yield thus making the product expensive. [0012]
  • Still yet another shortcoming is that rework is economically unfeasible. [0013]
  • These limitations necessitate use of a C[0014] 4 like technology for joining chips on circuit careers.
  • The C4 or Controlled Collapse Chip Connection technology has been successfully employed for 1st level assembly of chip on ceramic carriers. The C4 technology is described in detail by many authors, see for example, Microelectronics Packaging handbook, edited by, Rao R. Tummala and Eugene J. Rymaszewski, pages 366-391 (1989), the disclosure of which is incorporated herein by reference. [0015]
  • The C4 interconnection is comprised of two main elements, a solder wettable pad called Ball Limiting Metallurgy (BLM), and a ball of solder. The BLM is comprised of an adhesive layer like Cr or TiW, and a solder reflowable layer like copper or nickel. The BLM materials and their thicknesses are judiciously chosen to provide good and reliable electrical, mechanical and thermal stability to interconnect structure. The solder material used for C4 is preferably a low percentage (about 2 percent to about 10 percent) tin alloyed with lead. This combination is used: [0016]
  • (i) to prevent melting of the reflowed solder ball or C4 during the next level of packaging interconnection, [0017]
  • (ii) to reduce reaction between copper of BLM and tin, as high stresses resulting from excessive copper-tin intermetallic imparts a high stress concentration on underlaying passivation, and, [0018]
  • (iii) for better thermal fatigue characteristic offered by lower Sn (tin) percentage. [0019]
  • Presently, there are two problems that limit the use of current C4 technology for 2nd or higher level assembly, or, for Direct Chip Attach on card. First it limits the interconnection to Pin-Through-Hole (PTH) technology and precludes the use of space saving Surface Mount Technology (SMT), because a joining temperature higher than melting point of the SMT solder is required. Second, the relatively high joining temperature (between about 340° C. to about 380° C.) precludes the use of organic card material. [0020]
  • There are two ways to lower the joining temperature for DCA. One approach is to provide an eutectic (or lower melting) solder on a card metallization. A method pertaining to this approach is described in U.S. Pat. No. 4,967,950 to Legg and Schrottke, which is presently assigned to the assignee of the instant patent application. Legg and Schrottke describes a general scheme for attaching IC chips to flexible substrate (laminate) using C4s. The substrate is “tinned” with an alloy of eutectic composition in its contact region with the solder balls on the base of the chip. [0021]
  • The method of pre-coating the card, or an organic carrier, by eutectic solder is taught by Fallon et al., U.S. patent application Ser. No. 08/387,686, entitled “Process for Selective Application of Solder to Circuit Packages”, filed on Feb. 13, 1995, and the disclosure of which is incorporated herein by reference. In this method, eutectic solder is electroplated on copper conductors of printed circuit card precisely where the Chip C4 bumps would make contact. [0022]
  • Another method of pre-coating the card, or an organic carrier, by eutectic solder is taught by Nishimura, U.S. Pat. No. 5,238,176, entitled “Method and apparatus for forming bump”, assigned to the assignee of the instant patent application, and the disclosure of which is incorporated herein by reference. In this method, precise amount of eutectic solder, in liquid state, is injected at sites on copper conductors of laminated circuit card through an injector head having openings pertaining to the card part number used. The above methods are limited to rigid substrates. [0023]
  • A method for flexible substrates, which matches the Legg and Schrottke's scheme of “tinning” the substrate with eutectic alloy, is shown by Milkovich et al., in U.S. patent application Ser. No. 08/071,630, entitled “Manufacturing Flexible Circuit Board Assemblies with Common Heat Spreaders”, filed on Jun. 3, 1993, and assigned to the assignee of the instant patent application, and the disclosure of which is incorporated herein by reference. In this method, “decals” of eutectic solder balls with required footprint are first formed which is subsequently transferred on the flexible circuit carrier. Decals are formed by electroplating solder balls on a stainless steel plate. This method requires a photo-imageable solder mask on the Flexible circuit carrier circuit, holes corresponding to the required footprint are developed out in this mask. The decals are transferred by placing the flipped stainless steel plate on flexible circuit carrier card and reflowing. Flexible printed circuit cards are typically made of polyimides, for example Pyralux (Trade Mark of E. I. duPont de Nemours & Co., Inc.). Using this technique, Milkovich et al., “Double Sided Flexible Carrier with Discretes and Thermally Enhanced FCA/COF” IEEE 43rd ECTC Proceedings, June 1993, pages 16-21, have demonstrated methods of circuitization and device attachments on both sides of the flexible circuit carrier; the disclosure of which is incorporated herein by reference. One of the disadvantage of this method is poor yield. [0024]
  • A second approach for lowering the joining temperature for Direct Chip Attach (DCA), is to provide a low melting Solder On Chip (SOC) C4 rather than on the carrier conductor. Carey et al., in U.S. Pat. No. 5,075,965 and Agarwala et al., in U.S. Pat. Nos. 5,251,806 and 5,130,779, which are presently assigned to the assignee of the instant patent application, and Japanese Patent Publication No. 62-117346 to Eiji et al., describe various schemes to provide low melting solder on chips. Carey et al., in U.S. Pat. No. 5,075,965, disclose a method, where an inhomogeneous, anisotropic column consists of lead rich bottom and tin rich top of sufficient thickness to form eutectic alloy. The resulting as-deposited and un-reflowed column is then joined onto the card's conductor. [0025]
  • To circumvent the thermodynamically driven tendency for interdiffusion, Agarwala et al., in U.S. Pat. Nos. 5,251,806 and 5,130,779, showed a structure where the low melt component is separated from the high melt component by interposing a barrier metal layer. This structure does show a hierarchy of solder material, however, in this structure the column of high melting solder never get reflowed. Because, the stacked solder does not get reflowed there is no metallurgical reaction between the solder stack and the adhesive pad of BLM which is known to cause poor mechanical integrity of the C4 joint. [0026]
  • Eiji et al., in Japanese Patent Publication No. 62-117346, describes an anisotropic column structure of low and high melting solders. The basic objective of this invention is essentially to provide an increase height of a solder joint rather than to provide a low melting solder joining process. In Eiji et al., a high-melting point metallic layer is secured to a chip and a substrate and a low-melting point metallic layer is then formed. the two low-melting point metallic layers are then joined and thereby the chip is joined to the substrate. [0027]
  • IBM Technical Disclosure Bulletin, entitled “Indium-Lead-Indium Chip Joining”, W. A. Dawson et al., vol. 11, No. 11, page 1528 (April 1969), discloses the standard capping of lead with either indium or tin for diffusion bonding. In order to alleviate the problem of chip collapse onto the surface of the substrate an intermediate temperature is employed. [0028]
  • For the purpose of this invention a bump completely composed of low melting composition is a feature to be avoided as the high tin content reacts with all of the copper of the adhesive layer (BLM) giving a thick intermetallic layer. High stresses of reacted BLM have been known to cause solder pads to fall off and to create insulation cracking. The eutectic solder bumps also have poor electromigration and thermal fatigue lifetime. It is also known that low melting eutectic solder suffers from void formation due to thermal migration which causes circuit failure. [0029]
  • Yet another drawback of inhomogeneous, anisotropic solder column is that this structure is unfavorable for electrical tests of circuitry before joining the chips on carriers as the electrical probes gouge into the low melt cap during testing and destroy the cap. Furthermore, for the chip burn-in it is also not feasible to use any of the known multilayered solder balls, as the temperature that is generally used is between about 120° C. and about 150° C. for burn-in which will cause inter diffusion of the low and the high melt components even before the joining operation begins. [0030]
  • This invention relates generally to interconnection in electronic circuit packages, and more particularly shows a new solder interconnection technology to make a Direct Chip Attachment (DCA) on Flexible organic circuit carrier. [0031]
  • According to the present invention a method is provided for preparing the flexible circuit carrier card for direct device attachment using low melting Solder On Chip (SOC) where the low melting eutectic alloy is formed during joining operation and is localized at the tip of the standard high melting C4 ball. [0032]
  • PURPOSES AND SUMMARY OF THE INVENTION
  • The invention is a novel method and structure for providing direct device attach to flexible circuit card using a novel solder interconnection scheme. [0033]
  • Accordingly, it is a purpose of the present invention to provide a method for preparing the flexible circuit carrier card for direct device attachment using a novel solder interconnection scheme. [0034]
  • Another purpose of this invention is to provide a method for simultaneously joining devices on Flexible card using the DCA/SOC, the method of the instant, along with various Flip Chip, SMT and/or BGA (Ball Grid Array) technologies. [0035]
  • It is a further purpose of the present invention to provide a method of directly attaching one or more of devices using one or more of joining technologies and having flexibility to discretely remove and replace devices joined with various technologies. [0036]
  • Another purpose of this invention is to provide a Flexible circuit card/device assembly which has increased performance. [0037]
  • Yet another purpose of this invention is to provide for a Flexible circuit carrier card which is low in cost, easy to build and possesses high reliability. [0038]
  • Still yet another purpose of this invention is to provide a Flexible circuit carrier card with mounted devices which has low profile, is compact in design and has low weight. [0039]
  • Yet another purpose of this invention is to have a Flexible card which is compatible with wafer level electrical test and burn-in. [0040]
  • Therefore, in one aspect this invention comprises a method of directly attaching an electronic device onto a flexible circuit carrier, said method comprising the steps of: [0041]
  • (a) providing said electronic device with at least one reflowed solder ball, wherein said reflowed solder ball has at least one coating of at least one low melting point metal to form a metallic cap, [0042]
  • (b) adhering at least one layer of at least one stiffener sheet with at least one thermo-plastic adhesive onto at least one surface of a flexible sheet, [0043]
  • (c) forming at least one electrically conductive metal line on said at least one surface of said flexible sheet, [0044]
  • (d) coating at least a portion of said flexible carrier with at least one insulator material, and removing selective portions of said insulator material and exposing selective portions of said metal line, and forming a flexible circuit carrier, [0045]
  • (e) screening eutectic solder paste to coat selective sites on said flexible circuit carrier, [0046]
  • (f) placing said flexible circuit carrier on an assembly fixture to hold said flexible circuit carrier, [0047]
  • (g) dispensing at least one solder flux at selective sites on said flexible circuit carrier, [0048]
  • (h) aligning and placing said electronic device onto said flexible circuit carrier, such that reflowed solder ball with metallic cap makes contacts with said solder flux, and upon heating forms an electrical connection between said electronic device and said flexible circuit carrier. [0049]
  • In another aspect this invention comprises a flexible electronic carrier comprising a flexible device carrier and at least one electronic device electrically connected thereto by at least one solder ball, wherein said solder ball has a cap of at least one low melting point cap forming a eutectic. [0050]
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • The features of the invention believed to be novel and the elements characteristic of the invention are set forth with particularity in the appended claims. The drawings are for illustration purposes only and are not drawn to scale. Furthermore, like numbers represent like features in the drawings. The invention itself, however, both as to organization and method of operation, may best be understood by reference to the detailed description which follows taken in conjunction with the accompanying drawings in which: [0051]
  • FIG. 1, shows a cross-section of a flexible circuit carrier substrate having at least one flexible sheet with at least one circuit on at least one surface. [0052]
  • FIG. 2, shows a cross-section of the flexible circuit carrier substrate of FIG. 1, after a stiffener has been secured using at least one adhesive. [0053]
  • FIG. 3, shows a cross-section of the flexible circuit carrier substrate after at least one layer of an organic material has been adhered adjacent to the circuits. [0054]
  • FIG. 4, shows a flexible circuit carrier that has been site-dressed for joining at least one electronic device. [0055]
  • FIG. 5, shows the securing of the flexible circuit carrier of FIG. 4, onto a support jig. [0056]
  • FIG. 6, shows the securing of one or more of electronic devices onto the site-dressed flexible circuit carrier card. [0057]
  • FIG. 7, shows an enlarged view of a solder ball interconnect having at least one metallic cap being secured to a single metallic pad. [0058]
  • FIG. 8, shows an enlarged cross-sectional view of the solder interconnect of FIG. 7, secured to the metallic pad after the reflow operation. [0059]
  • FIG. 9, is an enlarged cross-sectional view after at least one encapsulant has encapsulated at least one solder connection of FIG. 8. [0060]
  • DETAILED DESCRIPTION OF THE INVENTION
  • The invention basically encompasses a flexible circuit carrier with metallic conductor lines, such as, copper. Openings are made at sites which will be electrically connected to an electronic device using reflowed solder with a metallic cap. Ashing of the surface of the flexible circuit carrier could also be done to improve the adhesion and the flow of encapsulants. Solder paste could be screened for SMT, solder balls could be placed for BGA, or, solder could also be placed by solder injection for various flip chip attach methods. Likewise, either one or both surfaces of the flexible circuit carrier could be prepared to secure various electronic devices. [0061]
  • The invention also encompasses the formation of a direct chip attach (DCA) on the flexible circuit carrier surface. This is done by aligning the solder interconnections with a cap of low melting point metal on the chip with the corresponding footprints on the flexible circuit carrier. The assembly is then held at a bias temperature of about 150° C. and then individual chips are heated, preferably with Infra Red (IR) heat source to a temperature of between about 190° C. to about 220° C. in a nitrogen or a forming gas environment. The assembly is then cooled and the chip is preferably encapsulated with an epoxy based encapsulant, such as, HYSOL 4511, Trade Name used by Dexter Hysol of California, USA. [0062]
  • An advantage of this invention is the fact that the method is applicable for all levels of packaging, i.e., for highest level packaging, involving chip joining to motherboard or flexible circuit carrier cards or PCMCIA (Personal Computer Memory Card International Association) cards. [0063]
  • This invention basically came about as an unexpected result which showed that low melting point solder that is deposited atop a reflowed solder mass alloys only with enough solder mass to form a volume of eutectic alloy. It was also found that relatively little or no further interdiffusion took place even after multiple times of eutectic melting cycles. This is believed to be due to that fact that the amount of low melting point atop the solder mass was equivalent to eutectic composition for the deposited mass of low melting point metal. Thus, a desired volume of eutectic liquid atop a solid solder mass is formed without any need for a barrier. A volume of eutectic liquid remains present, whenever the joint temperature is raised to eutectic temperature, even after joining on copper interconnections of circuit carrier; this liquid formation at the joint interface presents an ideal condition for easy removal of the joined chip for the purposes of chip replacement without mechanically or thermally affecting other components on the board. [0064]
  • As stated earlier that the solder interconnections using solder balls having a cap of low melting point metal allows for making a low temperature chip attachment directly to any of the higher levels of packaging substrates. After the solder ball has been formed using standard methods it is reflowed to give the solder ball a smooth surface. A layer of metal, such as tin, preferably, pure tin, is deposited on the top of the solder balls. This structure results in localizing of the eutectic alloy, formed upon subsequent low temperature joining cycle, on top of the solder ball even after multiple low temperature reflow cycles. [0065]
  • This method does not need tinning of the carrier or substrate to which the chip is to be joined, which makes this method economical. [0066]
  • It has also been noticed that whenever temperature is raised slightly above the eutectic temperature, the structure always forms a liquid fillet around the joint with copper wires. This liquid fillet formation results in substantial thermal fatigue life improvement for reduced stress at interface; and secondly, provides an easy means to remove chip for the purpose of chip replacement and field repairs. [0067]
  • These methods, techniques and metallurgical structures enables direct attachment of devices of any complexity to any substrate and to any level of packaging hierarchy; thereby, making the products more economical and more compact as well as resulting a better performance. [0068]
  • Referring now to the drawings, wherein like reference numerals represent the same or similar parts throughout, FIG. 1, shows a [0069] flexible sheet 10, preferably a polyamide based flexible material, on which at least one metallic line, such as a copper film, is laminated using at least one first thermo-plastic adhesive 12, and then the copper film is circuitized to form a plurality of circuits 14. The flexible sheet 10, could be selected from a group comprising organic substrate, multi-layer organic substrate, ceramic substrate or multi-layer ceramic substrate, to name a few. To those skilled in the art, it should be apparent that the circuit carrier substrate 15, could be made with interlevel wiring (not shown) of one or more layers, and/or wiring channels on either or both surfaces. For the ease of understanding circuits 14, are only shown on one surface.
  • After the [0070] circuit carrier substrate 15, has been formed, at least one stiffener 18, such as a metal foil 18, or for example, an aluminum foil 18, is laminated on the backside of the circuit carrier substrate 15, using at least one second thermo-plastic adhesive 16, as more clearly shown in FIG. 2. It is preferred that the thickness of the stiffener 18, is at least about 2 mil, and preferably between about 3 mil to about 5 mil. At least one of the layers for the stiffener 18, could be selected from a group comprising aluminum, molybdenum, silicon, tantalum or titanium, to name a few.
  • As shown in FIG. 3, a photo-imageable [0071] organic material 20, such as, for example, PSR4000 (Trade Name used by Taiyo Co., Japan), is then screened on top of the circuit carrier substrate 15, and pre-baked at 80° C. The use of PSR4000 is optional. For the method of the present invention, the solder mask is not required. PSR4000 is used here to demonstrate its need to act as solder dam to prevent lateral flow of solder. The organic material 20, is then exposed and developed.
  • The [0072] organic material 20, is next cured at 150° C. This curing process opens a large area, corresponding to the device size. Holes corresponding to foot print of C4 solder balls on IC chips are opened for devices to be joined. This produces a flexible ribbon or card 25, as clearly shown in FIG. 3.
  • FIG. 4, shows the top view of a [0073] flexible circuit carrier 23, having wires or circuits 14, and electrical interconnections 22, 24, 26 and 28, to receive electronic devices with various joining technologies. For example, interconnection 22, could be a pad 22, which is used for joining of DCA/SOC, interconnection 24, could be solder 24, that has been placed using a solder injection method for FCA (Flip Chip Attach). Similarly, interconnection 26, could be screened solder 26, such as BGA (Ball Grid Array) 26, and interconnect 28, could be screened solder 28, for SMT (Surface Mount Technology), etc..
  • The surface of the [0074] organic material 20, can optionally be oxygen ashed at about 130 mT pressure for about 30 minutes. This roughens the surface of the organic material 20, and this surface roughness improves the flowability of chip encapsulant which are used later.
  • FIG. 5, shows the [0075] flexible circuit carrier 23, after it is placed on a specially designed fixture or jig 30. The jig or fixture 30, is preferably made of a glass re-enforced thermosetting polymer. The purpose of this jig or fixture 30, is to ensure planarity of the flexible circuit carrier card 23, during reflow operations. The flexible circuit carrier 23, is securely held at the four corners on the jig or fixture 30, using spring loaded clamps 32 and 34.
  • FIG. 6, shows the securing of one or more of [0076] electronic devices 42, 44, 46 and 48, onto the site-dressed flexible circuit carrier 23, which is itself secured to the jig 30. Depending upon the joining technology that is going to be used eutectic Pb—Sn solder is applied on the interconnects or pads 22, 24, 26 and 28. It is preferred that the eutectic solder paste is screened on the SMT pads 28, eutectic balls are placed for Ball Grid Array pads 26, and eutectic solder is injected on pads 24, for FCA, etc. A no clean solder flux is applied at the DCA/SOC sites 22.
  • An [0077] IC chip 42, having C4 solder balls 41, with tin Cap 43, is next aligned to the DCA/SOC chip site 22. Other electronic devices 44, 46 and 48, are aligned to their appropriate sites as shown in FIG. 6. For example, electronic device 44, with interconnects 45, is aligned with interconnect 24, electronic device 46, is aligned with interconnect 26, electronic device 48, with interconnects 49, is aligned with interconnect 28, etc.. It should be obvious to artisan in the field, that the electronic devices may be discretes like resistors, capacitors, power supplies, IC chips or may be another package like Thin Quad Flat Pack (TQFP), Ball Grid Array (BGA) package, Tape Ball Grid Array (TBGA), amplifying device, circuit carrier card, etc..
  • This assembly is then reflowed, preferably, in a belt type furnace. However, heat for the solder reflow could be provided by at least one focused IR lamp. It is preferred that the belt speed and zone temperatures are adjusted so as to give a temperature profile where the assembly of FIG. 6, spends from about 3 to about 5 minutes above about 155° C., and, between about 15 to about 75 seconds at a maximum temperature of about 190° C. to about 230° C. The maximum reflow temperature for the solder is between about 190° C. and about 230° C. The solder reflow is above about 150° C. for between about 2 to about 5 minutes. The time for solder reflow at maximum temperature is between about 15 to about 90 seconds. The solder reflow is preferably performed in an environment selected from a group comprising dry nitrogen, forming gas or hydrogen. It should be noted that the heat cycle required for joining this chip is identical to that required for SMT or for Ball Grid Array joining heat profiles, this adds the advantage of simultaneous reflow joining of SOC chips as well as SMT and/or BGA devices. For lower maximum temperature a higher time is required at the maximum temperature. [0078]
  • FIG. 7, shows an enlarged view of [0079] chip 42, and DCA/SOC interconnection or pad 22, of FIG. 6. The chip or electronic device 42, has a solder ball 41, that has a cap of low melting point metal 43. The solder ball 41, is itself secured to a pad 52, via a BLM 56. Preferably, a layer of insulator 54, protects the surface of the chip 42. During the heating cycle the low melting point metal cap 43, on the solder ball 41, alloys with the solder ball 41, to form an eutectic composition 53, which melts at about 183° C. The volume of eutectic liquid is enough to envelope the exposed pad 22, such as, a copper pad 22, of flexible circuit carrier 23, and the surface tension of this eutectic liquid provides self aligning of the chip 42, to the exposed copper pad 22, on the flexible circuit carrier 23. The reflow temperature cycle evaporates the protective layer, if any, and also the flux, and hence no post cleaning is required.
  • FIG. 8, shows an enlarged cross-sectional view of a single interconnect of FIG. 7, after the chip joining operation creating chip-on-[0080] flex carrier 50. It can be clearly seen that the chip 42, has been secured to the flexible circuit carrier 23, and that an eutectic solder 53, has been formed between the interconnect pad 22, and solder 51.
  • FIG. 9 is an enlarged view of the electronic device or [0081] chip 42, after it has been joined to the flexible circuit carrier 23, forming the chip-on-flex carrier 50. In order to protect the electrical connections between the electronic device 42, such as, chip 42, and the flexible circuit carrier 23, suitable encapsulant 60, for example, HYSOL 4511, or an epoxy 60, can be provided under and over the electronic device or chip 42, and then cured. It has been found that the oxygen ashing step considerably improves the flow of the encapsulant under the chip 42. This encapsulant as shown in FIG. 9, primarily protects the electrical connection that is formed between the chip 42, and the flexible circuit carrier 23.
  • The [0082] solder ball 41, is preferably a high melting point solder ball, such as, for example, a solder ball with about 97 percent lead and about 3 percent tin, which is formed over the ball limiting metallurgy 56. The solder ball 41, could be formed either by evaporation or an electroplating methods of solder deposition. Before the inventive step of this invention is applied to the solder ball 41, it is preferred that all the processing steps of the semiconductor, such as, wafer testing, electrical testing have been completed and the solder has been re-flowed to bring it back to its spherical shape.
  • It should be apparent that the [0083] IC chip 42, could be a semiconductor wafer, wherein a plurality of devices (not shown) have been formed by conventional methods and interconnected through IC chip internal wires in one or more layers.
  • It is preferred that the high melting point solder ball is between about 2 percent to about 10 percent Sn, with the balance being Pb, on the chip with at least one capping layer of low melting point metal, such as, tin, thereby, providing eutectic solder at the tip of the high melting solder ball. [0084]
  • To those skilled in the art, it should be obvious that the flexible [0085] circuit carrier substrate 10, could be made of polyamide, polyester or polyethylene based material, in flexible form, with interlevel wiring (not shown) of one or more layers, and/or wiring channels on either or both surfaces.
  • The electronic devices typically have electrically conductive feature, such as pad, pins, etc., and wherein material for the electrically conductive features is selected from a group comprising Au, Co, Cr, Cu, Fe, Ni, TiW, phased Cr and Cu, and alloys thereof. [0086]
  • It is preferred that at least one layer of at least one low melting point metal is formed on the solder ball by a method selected from a group comprising Radio Frequency evaporation, E-beam evaporation, electroplating, electroless plating or injection. [0087]
  • And, wherein the at least one low melting point metal s selected from a group comprising of bismuth, indium, tin or alloys thereof. [0088]
  • It is preferred that at least one low melting point metal, caps between about 10 percent to about 90 percent of the exposed surface of the solder ball, and preferably caps between about 20 percent to about 80 percent of the exposed surface of the solder ball, and more preferably caps between about 30 percent to about 50 percent of the exposed surface of the solder ball. However, in some cased the low melting point metal could completely envelope the solder ball. [0089]
  • The average thickness of the at least one low melting point metal cap is between about 15 to about 50 micrometers. [0090]
  • It should be appreciated that other materials for the flexible circuit carrier could be used, such as, the material for the flexible circuit carrier could be selected from a group comprising polyimides, poly tetra flouro ethylene (PTFE), polyester or resin-impregnated fabrics, to name a few. [0091]
  • While the present invention has been particularly described, in conjunction with a specific preferred embodiment, it is evident that many alternatives, modifications and variations will be apparent to those skilled in the art in light of the foregoing description. It is therefore contemplated that the appended claims will embrace any such alternatives, modifications and variations as falling within the true scope and spirit of the present invention. [0092]

Claims (45)

What is claimed is:
1. A method of directly attaching an electronic device onto a flexible circuit carrier, said method comprising the steps of:
(a) providing said electronic device with at least one reflowed solder ball, wherein said reflowed solder ball has at least one coating of at least one low melting point metal to form a metallic cap,
(b) adhering at least one layer of at least one stiffener sheet with at least one thermo-plastic adhesive onto at least one surface of a flexible sheet,
(c) forming at least one electrically conductive metal line on said at least one surface of said flexible sheet,
(d) coating at least a portion of said flexible carrier with at least one insulator material, and removing selective portions of said insulator material and exposing selective portions of said metal line, and forming a flexible circuit carrier,
(e) screening eutectic solder paste to coat selective sites on said flexible circuit carrier,
(f) placing said flexible circuit carrier on an assembly fixture to hold said flexible circuit carrier,
(g) dispensing at least one solder flux at selective sites on said flexible circuit carrier,
(h) aligning and placing said electronic device onto said flexible circuit carrier, such that reflowed solder ball with metallic cap makes contacts with said solder flux, and upon heating forms an electrical connection between said electronic device and said flexible circuit carrier.
2. The method of
claim 1
, wherein at least a portion of said electronic device is encapsulated with at least one epoxy.
3. The method of
claim 1
, wherein at least a portion of said flexible circuit carrier is encapsulated with at least one epoxy.
4. The method of
claim 1
, wherein at least a portion of the surface of said insulator material is roughened.
5. The method of
claim 4
, wherein- said surface is roughened using oxygen plasma.
6. The method of
claim 1
, wherein a portion of said flexible circuit carrier is screened and reflowed using eutectic solder.
7. The method of
claim 6
, wherein said eutectic solder is deposited using a method selected from a group consisting of solder injection, electroplating, electroless plating, and decal placements.
8. The method of
claim 1
, wherein a portion of said flexible circuit carrier is screened and reflowed using eutectic solder, and wherein said eutectic solder provides screened ball grid array electrical connection.
9. The method of
claim 1
, wherein said electronic device is selected from a group consisting of an IC chip, a capacitor, a resistor, a circuit carrier card, a power supplier and an amplifying device.
10. The method of
claim 1
, wherein said flexible sheet is selected from a group consisting of organic substrate, multi-layer organic substrate, ceramic substrate and multi-layer ceramic substrate.
11. The method of
claim 1
, wherein said solder ball is selected from a group consisting of high melting point solder and low melting point solder.
12. The method of
claim 1
, wherein said solder ball is on an electrically conductive feature of said electronic device.
13. The method of
claim 12
, wherein material for said electrically conductive feature is selected from a group consisting of Au, Co, Cr, Cu, Fe, Ni, TiW, phased Cr and Cu, and alloys thereof.
14. The method of
claim 12
, wherein said electrically conductive feature is in electrical contact with at least one internal electrically conductive feature.
15. The method of
claim 1
, wherein said eutectic solder is selected from a group consisting of Pb, Bi, In, Sn, Ag, Au, and alloys thereof.
16. The method of
claim 1
, wherein said solder ball comprises of a lead-tin alloy, and wherein said alloy contains between about 2 percent to about 10 percent tin.
17. The method of
claim 1
, wherein said solder ball comprises of a lead-tin alloy, and wherein said alloy contains between about 90 percent to about 98 percent lead.
18. The method of
claim 1
, wherein said solder ball is formed on said electronic device using a method selected from the group consisting of evaporation, electroplating and solder injection.
19. The method of
claim 1
, wherein said at least one layer of at least one low melting point metal is formed on said solder ball by a method selected from a group consisting of Radio Frequency evaporation, E-beam evaporation, electroplating, electroless plating and injection.
20. The method of
claim 1
, wherein said at least one low melting point metal is selected from a group consisting of bismuth, indium, tin and alloys thereof.
21. The method of
claim 1
, wherein said at least one low melting point alloy is selected from a group consisting of lead, bismuth, indium, tin and alloys thereof.
22. The method of
claim 1
, wherein said at least one low melting point metal completely envelopes said solder ball.
23. The method of
claim 1
, wherein heat for said solder reflow is provided by at least one focused IR lamp.
24. The method of
claim 1
, wherein average thickness of said at least one low melting point metal cap is between about 15 to about 50 micro-meters.
25. The method of
claim 1
, wherein said at least one low melting point metal, caps between about 10 percent to about 90 percent of the exposed surface of said solder ball, and preferably caps between about 20 percent to about 80 percent of the exposed surface of said solder ball, and more preferably caps between about 30 percent to about 50 percent of the exposed surface of said solder ball.
26. The method of
claim 1
, where thickness of said at least one low melting point metal cap is chosen to provide a eutectic volume of between about 5 percent to about 50 percent of the volume of said solder ball, and preferably between about 10 percent to about 30 percent of the volume of said solder ball.
27. The method of
claim 1
, wherein at least a portion of said metal cap is secured to an electrically conductive feature on said flexible circuit carrier.
28. The method of
claim 27
, wherein material for said electrically conductive feature is selected from a group consisting of Au, Co, Cr, Cu, Fe, Ni, Ta, Ti, TiW, phased Cr and Cu, and alloys thereof.
29. The method of
claim 1
, wherein said flexible circuit carrier is selected from a group consisting of an interposer, a first level package, a PCMCIA card, a disc drive, a second level package, and a mother board.
30. The method of
claim 1
, wherein maximum reflow temperature for said solder is between about 190 and about 230° C.
31. The method of
claim 1
, wherein said step of solder reflow is above about 150° C. for between about 2 to about 5 minutes.
32. The method of
claim 1
, wherein time for solder reflow at maximum temperature is between about 15 to about 90 seconds.
33. The method of
claim 1
, wherein said solder reflow is performed in an environment selected from a group consisting of dry nitrogen, forming gas and hydrogen.
34. The method of
claim 1
, wherein said flexible circuit carrier is either a flexible organic laminated card or a flexible inorganic laminated card.
35. The method of
claim 34
, wherein material for said flexible organic circuit carrier is selected from a group consisting of polyimides, poly tetra flouro ethylene (PTFE), polyester and resin-impregnated fabrics.
36. The method of joining an electronic device, having C4 solder balls with tin cap, on a flexible circuit carrier of
claim 1
, comprising the steps of:
(a) aligning C4 balls of said electronic device with corresponding openings in said passivation layer of said flexible circuit carrier,
(b) holding said electronic device in place by surface tension afforded by solder flux, and
(c) reflowing said C4 solder to bond said electronic device to the flexible circuit carrier.
37. The method of
claim 36
, wherein at least a portion of said electronic device is encapsulated with at least one epoxy.
38. A flexible electronic carrier comprising a flexible device carrier and at least one electronic device electrically-connected thereto by at least one solder ball, wherein said solder ball has a cap of at least one low melting point cap forming a eutectic.
39. The carrier of
claim 38
, wherein said electronic card has at least one SMT secured thereto.
40. The carrier of
claim 38
, wherein said electronic card has a ball grid array.
41. The carrier of
claim 38
, wherein said electronic card has a SMT connection.
42. The carrier of
claim 38
, wherein at least a portion of said electronic card has at least one coating of an insulator material.
43. The carrier of
claim 38
, wherein at least a portion of said electronic device is encapsulated with at least one epoxy.
44. The carrier of
claim 38
, wherein said flexible device carrier has at least one stiffener secured to at least one side.
45. The carrier of
claim 44
, wherein said stiffener is selected from a group consisting of aluminum, molybdenum, silicon, tantalum and titanium.
US08/932,864 1996-10-31 1997-09-18 Flip chip attach on flexible circuit carrier using chip with metallic cap on solder Abandoned US20010013423A1 (en)

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Cited By (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6730541B2 (en) * 1997-11-20 2004-05-04 Texas Instruments Incorporated Wafer-scale assembly of chip-size packages
US20040198074A1 (en) * 2003-04-01 2004-10-07 Swier Wayne K. Electrical interconnect assemblies and methods of forming same
WO2004112128A2 (en) * 2003-06-09 2004-12-23 Staktek Group, L.P. Low profile stacking system and method
US20050051792A1 (en) * 2003-09-09 2005-03-10 Citizen Electronics Co., Ltd. Semiconductor package
US20050062144A1 (en) * 2001-10-26 2005-03-24 Staktek Group, L.P. Memory expansion and chip scale stacking system and method
US20050072835A1 (en) * 2003-10-01 2005-04-07 Samsung Electronics Co., Ltd. SnAgAu solder bumps, method of manufacturing the same, and method of bonding light emitting device using the same
US20050110164A1 (en) * 2003-11-10 2005-05-26 Chippac, Inc. Bump-on-lead flip chip interconnection
US6913343B2 (en) 2003-04-30 2005-07-05 Hewlett-Packard Development Company, L.P. Methods for forming and protecting electrical interconnects and resultant assemblies
US20050233571A1 (en) * 2003-08-22 2005-10-20 Advanced Semiconductor Engineering, Inc. Flip chip package, semiconductor package with bumps and method for manufacturing semiconductor package with bumps
US6985362B2 (en) * 2000-09-07 2006-01-10 International Business Machines Corporation Printed circuit board and electronic package using same
US20060091525A1 (en) * 2004-11-04 2006-05-04 Ngk Spark Plug Co., Ltd. Wiring board with semiconductor component
US20060131263A1 (en) * 2003-04-30 2006-06-22 Kawamura Naoto A Slotted substrates and methods and systems for forming same
US20070235873A1 (en) * 2006-03-28 2007-10-11 Cheng Hsu M Pad structures and methods for forming pad structures
US20070252274A1 (en) * 2006-04-26 2007-11-01 Daubenspeck Timothy H Method for forming c4 connections on integrated circuit chips and the resulting devices
US20080237591A1 (en) * 2002-08-08 2008-10-02 Elm Technology Corporation Vertical system integration
US20090067210A1 (en) * 1997-04-04 2009-03-12 Leedy Glenn J Three dimensional structure memory
US20090175104A1 (en) * 1997-04-04 2009-07-09 Leedy Glenn J Three dimensional structure memory
US20090230552A1 (en) * 2004-11-10 2009-09-17 Stats Chippac, Ltd. Bump-on-Lead Flip Chip Interconnection
US20090250811A1 (en) * 2004-11-10 2009-10-08 Stats Chippac, Ltd. Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask
US20090264025A1 (en) * 2006-04-14 2009-10-22 Kabushiki Kaisha Nihon Micronics Probe sheet and electrical connecting apparatus
US20100008056A1 (en) * 2004-02-02 2010-01-14 Panasonic Corporation Stereoscopic electronic circuit device, and relay board and relay frame used therein
US20100007019A1 (en) * 2008-04-03 2010-01-14 Stats Chippac, Ltd. Semiconductor Device and Method of Forming Composite Bump-on-Lead Interconnection
US7656678B2 (en) 2001-10-26 2010-02-02 Entorian Technologies, Lp Stacked module systems
US20100029099A1 (en) * 2006-04-07 2010-02-04 Kabushiki Kaisha Nihon Micronics Electrical connecting apparatus
US7659633B2 (en) * 2004-11-10 2010-02-09 Stats Chippac, Ltd. Solder joint flip chip interconnection having relief structure
US20100065966A1 (en) * 2006-12-14 2010-03-18 Stats Chippac, Ltd. Solder Joint Flip Chip Interconnection
US20100099222A1 (en) * 2006-12-14 2010-04-22 Stats Chippac, Ltd. Solder Joint Flip Chip Interconnection Having Relief Structure
US20100105224A1 (en) * 2006-09-28 2010-04-29 Kabushiki Kaisha Nihon Micronics Electrical connecting apparatus
US7719098B2 (en) 2001-10-26 2010-05-18 Entorian Technologies Lp Stacked modules and method
US7737549B2 (en) 2004-09-03 2010-06-15 Entorian Technologies Lp Circuit module with thermal casing systems
US7760513B2 (en) 2004-09-03 2010-07-20 Entorian Technologies Lp Modified core for circuit module system and method
US7768796B2 (en) 2004-09-03 2010-08-03 Entorian Technologies L.P. Die module system
US7804985B2 (en) 2006-11-02 2010-09-28 Entorian Technologies Lp Circuit module having force resistant construction
US20110074024A1 (en) * 2003-11-10 2011-03-31 Stats Chippac, Ltd. Semiconductor Device and Method of Forming Bump-on-Lead Interconnection
US20110074022A1 (en) * 2000-03-10 2011-03-31 Stats Chippac, Ltd. Semiconductor Device and Method of Forming Flipchip Interconnect Structure
US20110084386A1 (en) * 2003-11-10 2011-04-14 Stats Chippac, Ltd. Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask
US20110121464A1 (en) * 2009-11-24 2011-05-26 Stats Chippac, Ltd. Semiconductor Device and Method of Forming Electrical Interconnect with Stress Relief Void
US20110151627A1 (en) * 2009-12-18 2011-06-23 International Business Machines Corporation Overcoming laminate warpage and misalignment in flip-chip packages
US20110159444A1 (en) * 2006-04-14 2011-06-30 Kabushiki Kaisha Nihon Micronics Method for manufacturing probe sheet
US20110186989A1 (en) * 2010-02-04 2011-08-04 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor Device and Bump Formation Process
US20110285023A1 (en) * 2010-05-20 2011-11-24 Taiwan Semiconductor Manufacturing Company, Ltd. Substrate Interconnections having Different Sizes
USRE44500E1 (en) 2003-11-10 2013-09-17 Stats Chippac, Ltd. Semiconductor device and method of forming composite bump-on-lead interconnection
USRE44608E1 (en) 2003-11-10 2013-11-26 Stats Chippac, Ltd. Solder joint flip chip interconnection
US8674500B2 (en) 2003-12-31 2014-03-18 Stats Chippac, Ltd. Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask
US8841779B2 (en) 2005-03-25 2014-09-23 Stats Chippac, Ltd. Semiconductor device and method of forming high routing density BOL BONL and BONP interconnect sites on substrate
US9105530B2 (en) 2012-09-18 2015-08-11 Taiwan Semiconductor Manufacturing Company, Ltd. Conductive contacts having varying widths and method of manufacturing same
US9159665B2 (en) 2005-03-25 2015-10-13 Stats Chippac, Ltd. Flip chip interconnection having narrow interconnection sites on the substrate
US20160029486A1 (en) * 2014-07-24 2016-01-28 Samsung Electro-Mechanics Co., Ltd. Solder joint structure and electronic component module including the same
US9299674B2 (en) 2012-04-18 2016-03-29 Taiwan Semiconductor Manufacturing Company, Ltd. Bump-on-trace interconnect
US9425136B2 (en) 2012-04-17 2016-08-23 Taiwan Semiconductor Manufacturing Company, Ltd. Conical-shaped or tier-shaped pillar connections
US9646923B2 (en) 2012-04-17 2017-05-09 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor devices, methods of manufacture thereof, and packaged semiconductor devices
US9875988B2 (en) 2015-10-29 2018-01-23 Semtech Corporation Semiconductor device and method of forming DCALGA package using semiconductor die with micro pillars
USRE47600E1 (en) 2003-11-10 2019-09-10 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming electrical interconnect with stress relief void

Families Citing this family (96)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19633486C1 (en) 1996-08-20 1998-01-15 Heraeus Sensor Nite Gmbh Manufacturing method for circuit board with thin conduction paths and good solderable connection-contact regions e.g for measurement resistor or heating element
US6117759A (en) * 1997-01-03 2000-09-12 Motorola Inc. Method for multiplexed joining of solder bumps to various substrates during assembly of an integrated circuit package
IT1291779B1 (en) * 1997-02-17 1999-01-21 Magnetek Spa PROCEDURE FOR THE REALIZATION OF PRINTED CIRCUITS AND PRINTED CIRCUITS THUS OBTAINED
US5877560A (en) * 1997-02-21 1999-03-02 Raytheon Company Flip chip microwave module and fabrication method
US6330967B1 (en) * 1997-03-13 2001-12-18 International Business Machines Corporation Process to produce a high temperature interconnection
US6082610A (en) * 1997-06-23 2000-07-04 Ford Motor Company Method of forming interconnections on electronic modules
US6050481A (en) * 1997-06-25 2000-04-18 International Business Machines Corporation Method of making a high melting point solder ball coated with a low melting point solder
US6059172A (en) * 1997-06-25 2000-05-09 International Business Machines Corporation Method for establishing electrical communication between a first object having a solder ball and a second object
US6407461B1 (en) * 1997-06-27 2002-06-18 International Business Machines Corporation Injection molded integrated circuit chip assembly
US6297559B1 (en) * 1997-07-10 2001-10-02 International Business Machines Corporation Structure, materials, and applications of ball grid array interconnections
US6120885A (en) 1997-07-10 2000-09-19 International Business Machines Corporation Structure, materials, and methods for socketable ball grid
US6025649A (en) * 1997-07-22 2000-02-15 International Business Machines Corporation Pb-In-Sn tall C-4 for fatigue enhancement
US6074895A (en) * 1997-09-23 2000-06-13 International Business Machines Corporation Method of forming a flip chip assembly
US6121678A (en) 1997-12-19 2000-09-19 Stmicroelectronics, Inc. Wrap-around interconnect for fine pitch ball grid array
US6235996B1 (en) * 1998-01-28 2001-05-22 International Business Machines Corporation Interconnection structure and process module assembly and rework
US6607613B2 (en) 1998-07-10 2003-08-19 International Business Machines Corporation Solder ball with chemically and mechanically enhanced surface properties
US6250540B1 (en) 1999-04-30 2001-06-26 International Business Machines Corporation Fluxless joining process for enriched solders
US6056831A (en) 1998-07-10 2000-05-02 International Business Machines Corporation Process for chemically and mechanically enhancing solder surface properties
US6337509B2 (en) 1998-07-16 2002-01-08 International Business Machines Corporation Fixture for attaching a conformal chip carrier to a flip chip
JP4239310B2 (en) * 1998-09-01 2009-03-18 ソニー株式会社 Manufacturing method of semiconductor device
JP3351355B2 (en) * 1998-09-29 2002-11-25 株式会社デンソー Electronic component mounting structure
US6329713B1 (en) * 1998-10-21 2001-12-11 International Business Machines Corporation Integrated circuit chip carrier assembly comprising a stiffener attached to a dielectric substrate
US6657313B1 (en) * 1999-01-19 2003-12-02 International Business Machines Corporation Dielectric interposer for chip to substrate soldering
US6657309B1 (en) * 1999-02-08 2003-12-02 Rohm Co., Ltd. Semiconductor chip and semiconductor device of chip-on-chip structure
US6404212B1 (en) 1999-02-18 2002-06-11 St Assembly Test Services Pte Ltd Testing of BGA and other CSP packages using probing techniques
US6524346B1 (en) * 1999-02-26 2003-02-25 Micron Technology, Inc. Stereolithographic method for applying materials to electronic component substrates and resulting structures
US6127731A (en) * 1999-03-11 2000-10-03 International Business Machines Corporation Capped solder bumps which form an interconnection with a tailored reflow melting point
JP3209977B2 (en) * 1999-04-02 2001-09-17 沖電気工業株式会社 Semiconductor module
JP3428488B2 (en) * 1999-04-12 2003-07-22 株式会社村田製作所 Electronic component manufacturing method
US6341418B1 (en) * 1999-04-29 2002-01-29 International Business Machines Corporation Method for direct chip attach by solder bumps and an underfill layer
US6333209B1 (en) 1999-04-29 2001-12-25 International Business Machines Corporation One step method for curing and joining BGA solder balls
US6281576B1 (en) 1999-06-16 2001-08-28 International Business Machines Corporation Method of fabricating structure for chip micro-joining
US6805278B1 (en) 1999-10-19 2004-10-19 Fci America Technology, Inc. Self-centering connector with hold down
CA2313551A1 (en) * 1999-10-21 2001-04-21 International Business Machines Corporation Wafer integrated rigid support ring
CN1119830C (en) * 2000-04-27 2003-08-27 中国科学院上海冶金研究所 Device transfering technology
DE50014427D1 (en) * 2000-07-28 2007-08-02 Infineon Technologies Ag Method for contacting a semiconductor component
JP2002076589A (en) 2000-08-31 2002-03-15 Hitachi Ltd Electronic device and its manufacturing method
US6931723B1 (en) 2000-09-19 2005-08-23 International Business Machines Corporation Organic dielectric electronic interconnect structures and method for making
JP2004520722A (en) * 2001-05-17 2004-07-08 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ Article having a substrate and a chip attached to the substrate
JP3634773B2 (en) * 2001-06-08 2005-03-30 アルプス電気株式会社 Magnetic head and manufacturing method thereof
US6869831B2 (en) * 2001-09-14 2005-03-22 Texas Instruments Incorporated Adhesion by plasma conditioning of semiconductor chip surfaces
US6670071B2 (en) * 2002-01-15 2003-12-30 Quallion Llc Electric storage battery construction and method of manufacture
US6622380B1 (en) 2002-02-12 2003-09-23 Micron Technology, Inc. Methods for manufacturing microelectronic devices and methods for mounting microelectronic packages to circuit boards
US6877653B2 (en) * 2002-02-27 2005-04-12 Advanced Semiconductor Engineering, Inc. Method of modifying tin to lead ratio in tin-lead bump
USRE41914E1 (en) 2002-05-10 2010-11-09 Ponnusamy Palanisamy Thermal management in electronic displays
US6849935B2 (en) * 2002-05-10 2005-02-01 Sarnoff Corporation Low-cost circuit board materials and processes for area array electrical interconnections over a large area between a device and the circuit board
US6838114B2 (en) 2002-05-24 2005-01-04 Micron Technology, Inc. Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
US6821347B2 (en) 2002-07-08 2004-11-23 Micron Technology, Inc. Apparatus and method for depositing materials onto microelectronic workpieces
US6955725B2 (en) * 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US6791845B2 (en) * 2002-09-26 2004-09-14 Fci Americas Technology, Inc. Surface mounted electrical components
DE10258798A1 (en) * 2002-12-16 2004-07-22 Siemens Ag Method and device for partially applying adhesive to electronic components, mounting device for mounting components
DE10258800A1 (en) * 2002-12-16 2004-07-08 Siemens Ag Method and device for applying an adhesive layer to flat components, placement device for loading flat components
US7335396B2 (en) * 2003-04-24 2008-02-26 Micron Technology, Inc. Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers
US7235138B2 (en) * 2003-08-21 2007-06-26 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
US7344755B2 (en) * 2003-08-21 2008-03-18 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers
US7422635B2 (en) 2003-08-28 2008-09-09 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
US7056806B2 (en) * 2003-09-17 2006-06-06 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
US7282239B2 (en) * 2003-09-18 2007-10-16 Micron Technology, Inc. Systems and methods for depositing material onto microfeature workpieces in reaction chambers
US7323231B2 (en) * 2003-10-09 2008-01-29 Micron Technology, Inc. Apparatus and methods for plasma vapor deposition processes
US7581511B2 (en) * 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
US7647886B2 (en) * 2003-10-15 2010-01-19 Micron Technology, Inc. Systems for depositing material onto workpieces in reaction chambers and methods for removing byproducts from reaction chambers
US7258892B2 (en) * 2003-12-10 2007-08-21 Micron Technology, Inc. Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition
US7167375B2 (en) * 2004-01-16 2007-01-23 Motorola, Inc. Populated printed wiring board and method of manufacture
US7906393B2 (en) * 2004-01-28 2011-03-15 Micron Technology, Inc. Methods for forming small-scale capacitor structures
US7584942B2 (en) * 2004-03-31 2009-09-08 Micron Technology, Inc. Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
US20050249873A1 (en) * 2004-05-05 2005-11-10 Demetrius Sarigiannis Apparatuses and methods for producing chemically reactive vapors used in manufacturing microelectronic devices
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) * 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
TWI331370B (en) * 2004-06-18 2010-10-01 Megica Corp Connection between two circuitry components
US8067837B2 (en) * 2004-09-20 2011-11-29 Megica Corporation Metallization structure over passivation layer for IC chip
KR100701641B1 (en) * 2004-08-02 2007-03-30 도레이새한 주식회사 Method and apparatus for manufacturing flexible printed circuit board depositing copper plating layer by vapor deposition
US7383629B2 (en) * 2004-11-19 2008-06-10 Endicott Interconnect Technologies, Inc. Method of making circuitized substrates utilizing smooth-sided conductive layers as part thereof
CN100441069C (en) * 2005-01-21 2008-12-03 财团法人工业技术研究院 Electronic component package and packaging method
US20060165873A1 (en) * 2005-01-25 2006-07-27 Micron Technology, Inc. Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes
US20060237138A1 (en) * 2005-04-26 2006-10-26 Micron Technology, Inc. Apparatuses and methods for supporting microelectronic devices during plasma-based fabrication processes
KR20080014823A (en) 2005-05-04 2008-02-14 엔엑스피 비 브이 A device comprising a sensor module
NL1029954C2 (en) * 2005-09-14 2007-03-15 Assembleon Nv Method for heating a strip-shaped carrier as well as such a device.
TW200816421A (en) * 2006-09-29 2008-04-01 Novatek Microelectronics Corp Chip package, chip structure and manufacturing process thereof
US20080160751A1 (en) * 2006-12-28 2008-07-03 Mengzhi Pang Microelectronic die including solder caps on bumping sites thereof and method of making same
CN101262744B (en) * 2007-03-08 2011-01-19 奈电软性科技电子(珠海)有限公司 False sticker
US20110019378A1 (en) * 2009-07-27 2011-01-27 Tod A. Byquist Composite micro-contacts
CN101661916B (en) * 2009-09-18 2012-05-09 可富科技股份有限公司 Structure for re-wiring layer on soft film flip chip encapsulation
CN102064117B (en) * 2010-11-19 2013-09-11 上海凯虹电子有限公司 Method for encapsulating small-size chip
EP2641208B1 (en) 2010-11-19 2020-04-29 Nagravision S.A. Method to detect cloned software
CN102225500A (en) * 2011-05-30 2011-10-26 昆山元崧电子科技有限公司 Auxiliary welding clamp for fuse
CN102323451A (en) * 2011-05-30 2012-01-18 华南理工大学 A kind of method and device that detects interconnection solder joint electric migration performance
US8240545B1 (en) * 2011-08-11 2012-08-14 Western Digital (Fremont), Llc Methods for minimizing component shift during soldering
US9831170B2 (en) * 2011-12-30 2017-11-28 Deca Technologies, Inc. Fully molded miniaturized semiconductor module
JP5502139B2 (en) * 2012-05-16 2014-05-28 日本特殊陶業株式会社 Wiring board
TWI490508B (en) * 2012-12-17 2015-07-01 Princo Corp Flexible testing device and testing method thereof
US20140239569A1 (en) 2013-02-26 2014-08-28 International Business Machines Corporation Universal clamping fixture to maintain laminate flatness during chip join
TWI467711B (en) * 2013-09-10 2015-01-01 Chipbond Technology Corp Semiconductorstructure
JP6489713B2 (en) * 2015-02-13 2019-03-27 パイクリスタル株式会社 Method for forming multilayer circuit board and multilayer circuit board formed thereby
US10403577B1 (en) * 2018-05-03 2019-09-03 Invensas Corporation Dielets on flexible and stretchable packaging for microelectronics
KR20210114789A (en) * 2020-03-11 2021-09-24 동우 화인켐 주식회사 Touch sensor module and image display device including the same
US11728273B2 (en) 2020-09-04 2023-08-15 Adeia Semiconductor Bonding Technologies Inc. Bonded structure with interconnect structure

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62117346A (en) * 1985-11-18 1987-05-28 Fujitsu Ltd Semiconductor device
US4967950A (en) * 1989-10-31 1990-11-06 International Business Machines Corporation Soldering method
JPH0417390A (en) * 1990-05-10 1992-01-22 Matsushita Electric Ind Co Ltd Bonding of electronic parts
US5130779A (en) * 1990-06-19 1992-07-14 International Business Machines Corporation Solder mass having conductive encapsulating arrangement
US5251806A (en) * 1990-06-19 1993-10-12 International Business Machines Corporation Method of forming dual height solder interconnections
JPH0499393A (en) * 1990-08-08 1992-03-31 Nec Corp Method for soldering electronic component to hybrid integrated circuit
US5075965A (en) * 1990-11-05 1991-12-31 International Business Machines Low temperature controlled collapse chip attach process
JP2940269B2 (en) * 1990-12-26 1999-08-25 日本電気株式会社 Connecting method of integrated circuit element
JPH04297091A (en) * 1991-03-26 1992-10-21 Furukawa Electric Co Ltd:The Solder coating printed circuit board and manufacture thereof
JPH0666314B2 (en) * 1991-05-31 1994-08-24 インターナショナル・ビジネス・マシーンズ・コーポレイション Bump forming method and apparatus
US5261155A (en) * 1991-08-12 1993-11-16 International Business Machines Corporation Method for bonding flexible circuit to circuitized substrate to provide electrical connection therebetween using different solders
US5297333A (en) * 1991-09-24 1994-03-29 Nec Corporation Packaging method for flip-chip type semiconductor device
JPH05152733A (en) * 1991-11-30 1993-06-18 Suzuki Motor Corp Printed wiring board for surface mount
US5289631A (en) * 1992-03-04 1994-03-01 Mcnc Method for testing, burn-in, and/or programming of integrated circuit chips
US5489750A (en) * 1993-03-11 1996-02-06 Matsushita Electric Industrial Co., Ltd. Method of mounting an electronic part with bumps on a circuit board
US5478420A (en) * 1994-07-28 1995-12-26 International Business Machines Corporation Process for forming open-centered multilayer ceramic substrates
AU3415095A (en) * 1994-09-06 1996-03-27 Sheldahl, Inc. Printed circuit substrate having unpackaged integrated circuit chips directly mounted thereto and method of manufacture
US5634268A (en) * 1995-06-07 1997-06-03 International Business Machines Corporation Method for making direct chip attach circuit card

Cited By (151)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8841778B2 (en) 1997-04-04 2014-09-23 Glenn J Leedy Three dimensional memory structure
US20090174082A1 (en) * 1997-04-04 2009-07-09 Glenn J Leedy Three dimensional structure memory
US20100171224A1 (en) * 1997-04-04 2010-07-08 Leedy Glenn J Three dimensional structure memory
US20100171225A1 (en) * 1997-04-04 2010-07-08 Leedy Glenn J Three dimensional structure memory
US8796862B2 (en) 1997-04-04 2014-08-05 Glenn J Leedy Three dimensional memory structure
US8933570B2 (en) * 1997-04-04 2015-01-13 Elm Technology Corp. Three dimensional structure memory
US9401183B2 (en) 1997-04-04 2016-07-26 Glenn J. Leedy Stacked integrated memory device
US20090218700A1 (en) * 1997-04-04 2009-09-03 Leedy Glenn J Three dimensional structure memory
US20090219772A1 (en) * 1997-04-04 2009-09-03 Leedy Glenn J Three dimensional structure memory
US8824159B2 (en) 1997-04-04 2014-09-02 Glenn J. Leedy Three dimensional structure memory
US20110198672A1 (en) * 1997-04-04 2011-08-18 Leedy Glenn J Three dimensional structure memory
US20090230501A1 (en) * 1997-04-04 2009-09-17 Leedy Glenn J Three dimensional structure memory
US20090067210A1 (en) * 1997-04-04 2009-03-12 Leedy Glenn J Three dimensional structure memory
US20090219742A1 (en) * 1997-04-04 2009-09-03 Leedy Glenn J Three dimensional structure memory
US8928119B2 (en) 1997-04-04 2015-01-06 Glenn J. Leedy Three dimensional structure memory
US20090175104A1 (en) * 1997-04-04 2009-07-09 Leedy Glenn J Three dimensional structure memory
US20090219743A1 (en) * 1997-04-04 2009-09-03 Leedy Glenn J Three dimensional structure memory
US8629542B2 (en) 1997-04-04 2014-01-14 Glenn J. Leedy Three dimensional structure memory
US8653672B2 (en) 1997-04-04 2014-02-18 Glenn J Leedy Three dimensional structure memory
US8907499B2 (en) 1997-04-04 2014-12-09 Glenn J Leedy Three dimensional structure memory
US6730541B2 (en) * 1997-11-20 2004-05-04 Texas Instruments Incorporated Wafer-scale assembly of chip-size packages
US20120241945A9 (en) * 2000-03-10 2012-09-27 Stats Chippac, Ltd. Semiconductor Device and Method of Forming Flipchip Interconnect Structure
US10388626B2 (en) * 2000-03-10 2019-08-20 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming flipchip interconnect structure
US20110074022A1 (en) * 2000-03-10 2011-03-31 Stats Chippac, Ltd. Semiconductor Device and Method of Forming Flipchip Interconnect Structure
US6985362B2 (en) * 2000-09-07 2006-01-10 International Business Machines Corporation Printed circuit board and electronic package using same
US7719098B2 (en) 2001-10-26 2010-05-18 Entorian Technologies Lp Stacked modules and method
US7656678B2 (en) 2001-10-26 2010-02-02 Entorian Technologies, Lp Stacked module systems
US20050062144A1 (en) * 2001-10-26 2005-03-24 Staktek Group, L.P. Memory expansion and chip scale stacking system and method
US8587102B2 (en) 2002-08-08 2013-11-19 Glenn J Leedy Vertical system integration
US20080284611A1 (en) * 2002-08-08 2008-11-20 Elm Technology Corporation Vertical system integration
US20090194768A1 (en) * 2002-08-08 2009-08-06 Leedy Glenn J Vertical system integration
US20080237591A1 (en) * 2002-08-08 2008-10-02 Elm Technology Corporation Vertical system integration
US6905342B2 (en) 2003-04-01 2005-06-14 Hewlett-Packard Development Company, L.P. Protected electrical interconnect assemblies
US20040198074A1 (en) * 2003-04-01 2004-10-07 Swier Wayne K. Electrical interconnect assemblies and methods of forming same
US20050248617A1 (en) * 2003-04-30 2005-11-10 Mohammad Akhavain Methods for forming and protecting electrical interconnects and resultant assemblies
US7338149B2 (en) 2003-04-30 2008-03-04 Hewlett-Packard Development Company, L.P. Methods for forming and protecting electrical interconnects and resultant assemblies
US7083267B2 (en) 2003-04-30 2006-08-01 Hewlett-Packard Development Company, L.P. Slotted substrates and methods and systems for forming same
US20060131263A1 (en) * 2003-04-30 2006-06-22 Kawamura Naoto A Slotted substrates and methods and systems for forming same
US6913343B2 (en) 2003-04-30 2005-07-05 Hewlett-Packard Development Company, L.P. Methods for forming and protecting electrical interconnects and resultant assemblies
WO2004112128A3 (en) * 2003-06-09 2005-07-14 Staktek Group Lp Low profile stacking system and method
WO2004112128A2 (en) * 2003-06-09 2004-12-23 Staktek Group, L.P. Low profile stacking system and method
US20050233571A1 (en) * 2003-08-22 2005-10-20 Advanced Semiconductor Engineering, Inc. Flip chip package, semiconductor package with bumps and method for manufacturing semiconductor package with bumps
US7199400B2 (en) * 2003-09-09 2007-04-03 Citizen Electronics Co., Ltd. Semiconductor package
US20050051792A1 (en) * 2003-09-09 2005-03-10 Citizen Electronics Co., Ltd. Semiconductor package
CN100413632C (en) * 2003-10-01 2008-08-27 三星电子株式会社 Snagau solder bumps, method of manufacturing the same, and method of bonding light emitting device using the same
US7219825B2 (en) * 2003-10-01 2007-05-22 Samsung Electronics Co., Ltd. SnAgAu solder bumps, method of manufacturing the same, and method of bonding light emitting device using the same
US20050072835A1 (en) * 2003-10-01 2005-04-07 Samsung Electronics Co., Ltd. SnAgAu solder bumps, method of manufacturing the same, and method of bonding light emitting device using the same
USRE44431E1 (en) 2003-11-10 2013-08-13 Stats Chippac, Ltd. Bump-on-lead flip chip interconnection
USRE44761E1 (en) 2003-11-10 2014-02-11 Stats Chippac, Ltd. Solder joint flip chip interconnection having relief structure
US9373573B2 (en) 2003-11-10 2016-06-21 STATS ChipPAC Pte. Ltd. Solder joint flip chip interconnection
US9379084B2 (en) 2003-11-10 2016-06-28 STATS ChipPAC Pte. Ltd. Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask
US20100164100A1 (en) * 2003-11-10 2010-07-01 Stats Chippac, Ltd. Bump-on-Lead Flip Chip Interconnection
US7700407B2 (en) 2003-11-10 2010-04-20 Stats Chippac, Ltd. Method of forming a bump-on-lead flip chip interconnection having higher escape routing density
US9385101B2 (en) 2003-11-10 2016-07-05 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming bump-on-lead interconnection
US20050110164A1 (en) * 2003-11-10 2005-05-26 Chippac, Inc. Bump-on-lead flip chip interconnection
US9064858B2 (en) 2003-11-10 2015-06-23 Stats Chippac, Ltd. Semiconductor device and method of forming bump-on-lead interconnection
US9029196B2 (en) 2003-11-10 2015-05-12 Stats Chippac, Ltd. Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask
US7368817B2 (en) * 2003-11-10 2008-05-06 Chippac, Inc. Bump-on-lead flip chip interconnection
US20080213941A1 (en) * 2003-11-10 2008-09-04 Pendse Rajendra D Bump-on-Lead Flip Chip Interconnection
US8810029B2 (en) 2003-11-10 2014-08-19 Stats Chippac, Ltd. Solder joint flip chip interconnection
US20110074024A1 (en) * 2003-11-10 2011-03-31 Stats Chippac, Ltd. Semiconductor Device and Method of Forming Bump-on-Lead Interconnection
US8759972B2 (en) 2003-11-10 2014-06-24 Stats Chippac, Ltd. Semiconductor device and method of forming composite bump-on-lead interconnection
US20110084386A1 (en) * 2003-11-10 2011-04-14 Stats Chippac, Ltd. Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask
US20140131869A1 (en) * 2003-11-10 2014-05-15 Stats Chippac, Ltd. Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask
USRE44355E1 (en) 2003-11-10 2013-07-09 Stats Chippac, Ltd. Method of forming a bump-on-lead flip chip interconnection having higher escape routing density
USRE47600E1 (en) 2003-11-10 2019-09-10 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming electrical interconnect with stress relief void
USRE44608E1 (en) 2003-11-10 2013-11-26 Stats Chippac, Ltd. Solder joint flip chip interconnection
USRE44579E1 (en) 2003-11-10 2013-11-05 Stats Chippac, Ltd. Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask
US7973406B2 (en) 2003-11-10 2011-07-05 Stats Chippac, Ltd. Bump-on-lead flip chip interconnection
US9922915B2 (en) 2003-11-10 2018-03-20 STATS ChipPAC Pte. Ltd. Bump-on-lead flip chip interconnection
US8574959B2 (en) 2003-11-10 2013-11-05 Stats Chippac, Ltd. Semiconductor device and method of forming bump-on-lead interconnection
US20110215468A1 (en) * 2003-11-10 2011-09-08 Stats Chippac, Ltd. Bump-on-Lead Flip Chip Interconnection
USRE44562E1 (en) 2003-11-10 2013-10-29 Stats Chippac, Ltd. Solder joint flip chip interconnection having relief structure
US9899286B2 (en) 2003-11-10 2018-02-20 STATS ChipPAC Pte. Ltd. Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask
US8558378B2 (en) 2003-11-10 2013-10-15 Stats Chippac, Ltd. Bump-on-lead flip chip interconnection
USRE44524E1 (en) 2003-11-10 2013-10-08 Stats Chippac, Ltd. Bump-on-lead flip chip interconnection
US8188598B2 (en) 2003-11-10 2012-05-29 Stats Chippac, Ltd. Bump-on-lead flip chip interconnection
USRE44500E1 (en) 2003-11-10 2013-09-17 Stats Chippac, Ltd. Semiconductor device and method of forming composite bump-on-lead interconnection
US9219045B2 (en) * 2003-11-10 2015-12-22 Stats Chippac, Ltd. Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask
USRE44377E1 (en) 2003-11-10 2013-07-16 Stats Chippac, Ltd. Bump-on-lead flip chip interconnection
US9865556B2 (en) 2003-11-10 2018-01-09 STATS ChipPAC Pte Ltd. Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask
US9773685B2 (en) 2003-11-10 2017-09-26 STATS ChipPAC Pte. Ltd. Solder joint flip chip interconnection having relief structure
US8674500B2 (en) 2003-12-31 2014-03-18 Stats Chippac, Ltd. Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask
US20100008056A1 (en) * 2004-02-02 2010-01-14 Panasonic Corporation Stereoscopic electronic circuit device, and relay board and relay frame used therein
US7768796B2 (en) 2004-09-03 2010-08-03 Entorian Technologies L.P. Die module system
US7737549B2 (en) 2004-09-03 2010-06-15 Entorian Technologies Lp Circuit module with thermal casing systems
US7760513B2 (en) 2004-09-03 2010-07-20 Entorian Technologies Lp Modified core for circuit module system and method
US7488896B2 (en) * 2004-11-04 2009-02-10 Ngk Spark Plug Co., Ltd. Wiring board with semiconductor component
US20060091525A1 (en) * 2004-11-04 2006-05-04 Ngk Spark Plug Co., Ltd. Wiring board with semiconductor component
US20090230552A1 (en) * 2004-11-10 2009-09-17 Stats Chippac, Ltd. Bump-on-Lead Flip Chip Interconnection
US7901983B2 (en) 2004-11-10 2011-03-08 Stats Chippac, Ltd. Bump-on-lead flip chip interconnection
US20090250811A1 (en) * 2004-11-10 2009-10-08 Stats Chippac, Ltd. Semiconductor Device and Method of Self-Confinement of Conductive Bump Material During Reflow Without Solder Mask
US7659633B2 (en) * 2004-11-10 2010-02-09 Stats Chippac, Ltd. Solder joint flip chip interconnection having relief structure
US8026128B2 (en) 2004-11-10 2011-09-27 Stats Chippac, Ltd. Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask
US10580749B2 (en) 2005-03-25 2020-03-03 STATS ChipPAC Pte. Ltd. Semiconductor device and method of forming high routing density interconnect sites on substrate
US8841779B2 (en) 2005-03-25 2014-09-23 Stats Chippac, Ltd. Semiconductor device and method of forming high routing density BOL BONL and BONP interconnect sites on substrate
US9159665B2 (en) 2005-03-25 2015-10-13 Stats Chippac, Ltd. Flip chip interconnection having narrow interconnection sites on the substrate
US20070235873A1 (en) * 2006-03-28 2007-10-11 Cheng Hsu M Pad structures and methods for forming pad structures
US7759776B2 (en) * 2006-03-28 2010-07-20 Taiwan Semiconductor Manufacturing Co., Ltd. Space transformer having multi-layer pad structures
US7934944B2 (en) 2006-04-07 2011-05-03 Kabushiki Kaisha Nihon Micronics Electrical connecting apparatus
US20100029099A1 (en) * 2006-04-07 2010-02-04 Kabushiki Kaisha Nihon Micronics Electrical connecting apparatus
US20110159444A1 (en) * 2006-04-14 2011-06-30 Kabushiki Kaisha Nihon Micronics Method for manufacturing probe sheet
US7800001B2 (en) * 2006-04-14 2010-09-21 Kabushiki Kaisha Nihon Micronics Probe sheet and electrical connecting apparatus
US20090264025A1 (en) * 2006-04-14 2009-10-22 Kabushiki Kaisha Nihon Micronics Probe sheet and electrical connecting apparatus
US8202684B2 (en) 2006-04-14 2012-06-19 Kabushiki Kaisha Nihon Micronics Method for manufacturing probe sheet
US20070252274A1 (en) * 2006-04-26 2007-11-01 Daubenspeck Timothy H Method for forming c4 connections on integrated circuit chips and the resulting devices
US7635643B2 (en) 2006-04-26 2009-12-22 International Business Machines Corporation Method for forming C4 connections on integrated circuit chips and the resulting devices
US20100105224A1 (en) * 2006-09-28 2010-04-29 Kabushiki Kaisha Nihon Micronics Electrical connecting apparatus
US7934945B2 (en) 2006-09-28 2011-05-03 Kabushiki Kaisha Nihon Micronics Electrical connecting apparatus
US7804985B2 (en) 2006-11-02 2010-09-28 Entorian Technologies Lp Circuit module having force resistant construction
US8129841B2 (en) 2006-12-14 2012-03-06 Stats Chippac, Ltd. Solder joint flip chip interconnection
US20100065966A1 (en) * 2006-12-14 2010-03-18 Stats Chippac, Ltd. Solder Joint Flip Chip Interconnection
US8216930B2 (en) 2006-12-14 2012-07-10 Stats Chippac, Ltd. Solder joint flip chip interconnection having relief structure
US20100099222A1 (en) * 2006-12-14 2010-04-22 Stats Chippac, Ltd. Solder Joint Flip Chip Interconnection Having Relief Structure
US8076232B2 (en) 2008-04-03 2011-12-13 Stats Chippac, Ltd. Semiconductor device and method of forming composite bump-on-lead interconnection
US20100007019A1 (en) * 2008-04-03 2010-01-14 Stats Chippac, Ltd. Semiconductor Device and Method of Forming Composite Bump-on-Lead Interconnection
TWI508200B (en) * 2009-05-22 2015-11-11 Stats Chippac Ltd Semiconductor device and method of self-confinement of conductive bump material during reflow without solder mask
US8350384B2 (en) 2009-11-24 2013-01-08 Stats Chippac, Ltd. Semiconductor device and method of forming electrical interconnect with stress relief void
US20110121464A1 (en) * 2009-11-24 2011-05-26 Stats Chippac, Ltd. Semiconductor Device and Method of Forming Electrical Interconnect with Stress Relief Void
US8304290B2 (en) * 2009-12-18 2012-11-06 International Business Machines Corporation Overcoming laminate warpage and misalignment in flip-chip packages
US20110151627A1 (en) * 2009-12-18 2011-06-23 International Business Machines Corporation Overcoming laminate warpage and misalignment in flip-chip packages
US9960134B2 (en) 2010-02-04 2018-05-01 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device and bump formation process
US10522491B2 (en) 2010-02-04 2019-12-31 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device and bump formation process
US11348889B2 (en) 2010-02-04 2022-05-31 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device and bump formation process
US20110186989A1 (en) * 2010-02-04 2011-08-04 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor Device and Bump Formation Process
US9455183B2 (en) 2010-02-04 2016-09-27 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor device and bump formation process
US9773755B2 (en) 2010-05-20 2017-09-26 Taiwan Semiconductor Manufacturing Company, Ltd. Substrate interconnections having different sizes
US20110285023A1 (en) * 2010-05-20 2011-11-24 Taiwan Semiconductor Manufacturing Company, Ltd. Substrate Interconnections having Different Sizes
US9142533B2 (en) * 2010-05-20 2015-09-22 Taiwan Semiconductor Manufacturing Company, Ltd. Substrate interconnections having different sizes
KR101807311B1 (en) 2010-12-03 2017-12-08 스태츠 칩팩 피티이. 엘티디. Semiconductor device and method of forming bump-on-lead interconnection
US10056345B2 (en) 2012-04-17 2018-08-21 Taiwan Semiconductor Manufacturing Company, Ltd. Conical-shaped or tier-shaped pillar connections
US10153243B2 (en) 2012-04-17 2018-12-11 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor devices, methods of manufacture thereof, and packaged semiconductor devices
US11315896B2 (en) 2012-04-17 2022-04-26 Taiwan Semiconductor Manufacturing Company, Ltd. Conical-shaped or tier-shaped pillar connections
US9425136B2 (en) 2012-04-17 2016-08-23 Taiwan Semiconductor Manufacturing Company, Ltd. Conical-shaped or tier-shaped pillar connections
US9646923B2 (en) 2012-04-17 2017-05-09 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor devices, methods of manufacture thereof, and packaged semiconductor devices
US11682651B2 (en) 2012-04-18 2023-06-20 Taiwan Semiconductor Manufacturing Company Bump-on-trace interconnect
US9991224B2 (en) 2012-04-18 2018-06-05 Taiwan Semiconductor Manufacturing Company, Ltd. Bump-on-trace interconnect having varying widths and methods of forming same
US9299674B2 (en) 2012-04-18 2016-03-29 Taiwan Semiconductor Manufacturing Company, Ltd. Bump-on-trace interconnect
US10510710B2 (en) 2012-04-18 2019-12-17 Taiwan Semiconductor Manufacturing Company, Ltd. Bump-on-trace interconnect
US10847493B2 (en) 2012-04-18 2020-11-24 Taiwan Semiconductor Manufacturing, Ltd. Bump-on-trace interconnect
US9508668B2 (en) 2012-09-18 2016-11-29 Taiwan Semiconductor Manufacturing Company, Ltd. Conductive contacts having varying widths and method of manufacturing same
US10319691B2 (en) 2012-09-18 2019-06-11 Taiwan Semiconductor Manufacturing Company Solderless interconnection structure and method of forming same
US10008459B2 (en) 2012-09-18 2018-06-26 Taiwan Semiconductor Manufacturing Company Structures having a tapering curved profile and methods of making same
US9966346B2 (en) 2012-09-18 2018-05-08 Taiwan Semiconductor Manufacturing Company Bump structure and method of forming same
US9953939B2 (en) 2012-09-18 2018-04-24 Taiwan Semiconductor Manufacturing Company, Ltd. Conductive contacts having varying widths and method of manufacturing same
US11043462B2 (en) 2012-09-18 2021-06-22 Taiwan Semiconductor Manufacturing Company Solderless interconnection structure and method of forming same
US9496233B2 (en) 2012-09-18 2016-11-15 Taiwan Semiconductor Manufacturing Company, Ltd. Interconnection structure and method of forming same
US9105530B2 (en) 2012-09-18 2015-08-11 Taiwan Semiconductor Manufacturing Company, Ltd. Conductive contacts having varying widths and method of manufacturing same
US9111817B2 (en) 2012-09-18 2015-08-18 Taiwan Semiconductor Manufacturing Company, Ltd. Bump structure and method of forming same
US20160029486A1 (en) * 2014-07-24 2016-01-28 Samsung Electro-Mechanics Co., Ltd. Solder joint structure and electronic component module including the same
US9875988B2 (en) 2015-10-29 2018-01-23 Semtech Corporation Semiconductor device and method of forming DCALGA package using semiconductor die with micro pillars

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SG53104A1 (en) 1998-09-28
CN1181619A (en) 1998-05-13
CN1128469C (en) 2003-11-19
MY123847A (en) 2006-06-30
US5729896A (en) 1998-03-24

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