US20020135080A1 - Semiconductor device and method for fabricating same - Google Patents
Semiconductor device and method for fabricating same Download PDFInfo
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- US20020135080A1 US20020135080A1 US09/974,871 US97487101A US2002135080A1 US 20020135080 A1 US20020135080 A1 US 20020135080A1 US 97487101 A US97487101 A US 97487101A US 2002135080 A1 US2002135080 A1 US 2002135080A1
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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Abstract
Description
- The present invention relates to semiconductor devices and methods for fabricating the same, and more particularly, to a semiconductor device in which a chip is disposed on a substrate and electrically connected to external devices via array-arranged conductive elements, and a method for fabricating the semiconductor device.
- A BGA (ball grid arrayed) semiconductor device provides a semiconductor chip disposed therein with sufficient I/O connections in response to highly performing semiconductor devices desired for use with electronic products. However, such a conventional BGA semiconductor device has the following drawbacks.
- First, the conventional BGA semiconductor device has its overall height to be the sum of heights including a portion of an encapsulant higher than the chip, the chip, a substrate mounted with the chip, and solder balls implanted on a bottom surface of the substrate. In other words, such a structure makes the BGA semiconductor device hard to be miniaturized in profile, unless the foregoing components of the BGA semiconductor device are individually reduced in dimension. This therefore restricts the application of the BGA semiconductor device for use in a low-profile product.
- Second, in the BGA semiconductor device, the chip is bonded to the substrate by means of an adhesive. Due to a great difference in coefficient of thermal expansion between the chip and the substrate, during a temperature cycle in subsequent fabricating processes or practical operation, thermal stress is generated and leads to delamination occurring at a bonding interface between the chip and the substrate. This greatly affects quality and reliability of fabricated products.
- Moreover, after mounting the chip on the substrate via the adhesive such as silver paste, in order to stabilize the adhesive for firmly bonding the semiconductor to the substrate, an additional curing process is often performed for the adhesive. This not only increases the fabrication cost, but makes the fabrication time not able to be further reduced.
- Further, for the solder balls implanted in the BGA semiconductor device, due to dimensional inaccuracy of the solder balls, or the occurrence of warpage in the substrate resulted from the thermal stress, the solder balls implanted on the substrate can not be positioned in satisfactory coplanarity. This therefore detrimentally affects electrical connection established between the solder balls and the external devices such as a printed circuit board by using surface mounted technology (SMT).
- A primary objective of the present invention is to provide a semiconductor device and a method for fabricating the same, in which the semiconductor device can be significantly miniaturized in profile.
- Another objective of the present invention is to provide a semiconductor device and a method for fabricating the same, in which thermal stress and delamination can be effectively prevented from occurrence, so as to improve quality and reliability of the semiconductor device.
- A further objective of the present invention is to provide a semiconductor device and a method for fabricating the same, in which fabrication processes are simplified, and the fabrication cost is reduced.
- A further objective of the present invention is to provide a semiconductor device and a method for fabricating the same, in which electrical connection of the semiconductor device to external devices can be improved.
- In accordance with the foregoing and other objectives, the present invention proposes a semiconductor device and a method for fabricating the same. The semiconductor device of the invention comprises: a substrate formed with an opening, and disposed with a plurality of conductive traces on a side thereof, a chip having an active side and an opposing inactive side, and accommodated in the opening of the substrate, wherein the chip is dimensionally smaller in surface area than the opening; a plurality of first conductive elements for connecting the active side of the chip to the conductive traces on the substrate, so as to establish electrical connection between the chip and the substrate; a plurality of array-arranged second conductive elements disposed on the substrate, and electrically connected to the conductive traces on the substrate; and an encapsulant formed on the substrate for encapsulating the chip, the first conductive elements, the second conductive elements and the conductive traces, in a manner that the inactive side of the chip is coplanarly positioned with a side of the substrate with no conductive trace disposed thereon, and bottom sides of the second conductive elements are exposed to outside of the encapsulant and coplanarly positioned with a bottom side of the encapsulant.
- The method for fabricating a semiconductor device of the invention comprises the steps of: providing a substrate formed with an opening, and disposed with a plurality of conductive traces on a side thereof; providing a chip having an active side and an opposing inactive side, and accommodating the chip in the opening of the substrate, wherein the chip is dimensionally smaller in surface area than the opening; forming a plurality of first conductive elements for connecting the active side of the chip to the conductive traces on the substrate, so as to establish electrical connection between the chip and the substrate; disposing a plurality of array-arranged second conductive elements on the substrate, wherein the second conductive elements are electrically connected to the conductive traces on the substrate; and forming an encapsulant on the substrate for encapsulating the chip, the first conductive elements, the second conductive elements and the conductive traces, in a manner that the inactive side of the chip is coplanarly positioned with a side of the substrate with no conductive trace disposed thereon, and bottom sides of the second conductive elements are exposed to outside of the encapsulant and coplanarly positioned with a bottom side of the encapsulant.
- In a preferred embodiment of the invention, the encapsulant is formed to fill up the opening of the substrate, and the inactive side of the chip is exposed to the outside of the encapsulant, in a manner that a coplane is formed among the inactive side of the chip, a side of the encapsulant exposed to outside of the opening, and the side of the substrate disposed with the conductive traces thereon.
- In another preferred embodiment of the invention, the encapsulant covers the side of the substrate with no conductive trace disposed thereon and the inactive side of the chip, thereby allowing the substrate and the chip to be interposed between the portion of the encapsulant formed on the side of the substrate having the conductive traces and the portion of the encapsulant formed on the side with no conductive trace. This therefore significantly reduces thermal stress acting between the substrate and the encapsulant, so as to effectively prevent warpage of the substrate from occurrence.
- In a further preferred embodiment of the invention, a tape is adhered on the side of the substrate with no conductive trace for covering the opening, and for attaching the inactive side of the chip to the tape. Moreover, an additional encapsulant is formed on the side of the substrate with no conductive trace and the tape, corresponding to the foregoing encapsulant for encapsulating the chip, the fit conductive elements, the second conductive elements and the conductive traces. This therefore makes the substrate interposed between the encapsulants.
- The present invention can be more fully understood by reading the following detailed description of the preferred embodiments, with reference made to the accompanying drawings, wherein:
- FIG. 1 is a sectional view of a semiconductor device of a first preferred embodiment of the invention;
- FIGS.2A-2G are schematic diagrams depicting a method for fabricating a semiconductor device of FIG. 1;
- FIG. 3 is a sectional view of a semiconductor device of a second preferred embodiment of the invention;
- FIG. 4 is a sectional view of a semiconductor device of a third preferred embodiment of the invention;
- FIG. 5 is a sectional view of a semiconductor device of a fourth preferred embodiment of the invention; and
- FIG. 6 is a sectional view of a semiconductor device of a fifth preferred embodiment of the invention.
- First Preferred Embodiment
- As shown in FIG. 1, a
semiconductor device 1 of a first embodiment of the invention includes asubstrate 10; achip 11 accommodated in anopening 100 formed in thesubstrate 10; a plurality ofgold wires 12 for electrically connecting thechip 11 to thesubstrate 10; a plurality of array-arrangedconductive bumps 13 disposed on thesubstrate 10, and electrically connected to thesubstrate 10; and anencapsulant 14 for encapsulating thechip 11, thegold wires 12 and theconductive bumps 13. - The
substrate 10 has afirst side 101 and asecond side 102, wherein theopening 100 is formed to penetrate from thefirst side 101 to thesecond side 102, and a plurality ofconductive traces 103 are disposed on thefirst side 101. - The
chip 11 is dimensionally smaller in cross-sectional area than theopening 100, so that thechip 11 is accommodated in theopening 100 in a manner as not to come into contact with thesubstrate 10. Thechip 11 can have a thickness smaller than, equal to or larger than that of thesubstrate 10; however, thechip 11 is preferably not to be thicker than thesubstrate 10, so as to keep thesemiconductor device 1 low in overall height. Moreover, thechip 11 has anactive side 110 and an opposinginactive side 111, wherein theactive side 110 faces the same as thefirst side 101 of thesubstrate 10 when thechip 11 is positioned within theopening 100. This allows thegold wires 12 to connect theactive side 110 of thechip 11 to theconductive traces 103 of thesubstrate 10, so as to establish the electrical connection between thechip 11 and thesubstrate 10. - The
conductive traces 103 on thesubstrate 10 have terminal ends thereof electrically connected to theconductive bumps 13, thereby allowing thechip 11 to be electrically connected to external devices such as a printed circuit board via theconductive bumps 13. Theconductive bumps 13 can be mounted on thesubstrate 10 by using a conventional printing or plating means in a manner that,bottom sides 130 of theconductive bumps 13 are precisely positioned to be slightly higher thantops 120 of wire loops of thegold wires 12. This makes thegold wires 12 not exposed to outside of theencapsulant 14 after completely forming theencapsulant 14 on thesubstrate 10. In addition, the printing or plating means employed for mounting theconductive bumps 13 is more cost-effective to implement than using a ball implantation machine to implant solder balls on thesubstrate 10. - The
encapsulant 14 can be formed on thesubstrate 10 by heating and melting a material such as epoxy resin. Besides encapsulating thechip 11, thegold wires 12, theconductive traces 103 and theconductive bumps 13, theencapsulant 14 can completely fill up theopening 100 of thesubstrate 10, wherein theinactive side 111 of thechip 11 is exposed to outside of a top side 141 of theencapsulant 14 in theopening 100 in a manner that, theinactive side 111, the top side 141 and thesecond side 102 of thesubstrate 10 are coplanarly positioned. Therefore, as theinactive side 111 of thechip 11 is in direct contact with the atmosphere, heat generated by thechip 11 can be dissipated through theinactive side 11 to the atmosphere, and thus heat dissipating efficiency of thesemiconductor device 1 can be improved. - The
encapsulant 14 is formed on thefirst side 101 of thesubstrate 10 in a manner that, thebottom sides 130 of theconductive bumps 13 are exposed to outside of abottom side 140 of theencapsulant 14, and coplanarly positioned with thebottom side 140. This coplane therefore allows thesemiconductor device 1 to be well electrically connected to the external devices such as the printed circuit board, wherein theconductive bumps 13 can be effectively connected to corresponding connecting pads on the external devices, and thus processibility of thesemiconductor device 1 is improved. Moreover, theencapsulant 14 completely encapsulates thefirst side 101 of thesubstrate 10, and hermetically encloses theconductive traces 103. As such, there is no need to form a solder mask layer on thefirst side 101 for covering theconductive traces 103, ad thus the fabrication cost and thickness of thesubstrate 10 can be reduced. - Therefore, as described above, the
semiconductor device 1 of the invention having thechip 11 accommodated in theopening 100 of thesubstrate 10 makes the overall height thereof smaller than that of a conventional semiconductor device. This is therefore preferable in response to profile miniaturization demand. Further, in the provision of a bottom side good in planarity, thesemiconductor device 1 is capable of forming effective electrical connection to the external devices, and thus has better processibility than the conventional semiconductor device. - A method for fabricating the
foregoing semiconductor device 1 of the first embodiment of the invention is depicted with reference to FIGS. 2A-2G. Referring first to FIG. 2A, asubstrate 10 having afirst side 101 and an opposingsecond side 102 is provided, wherein arectangular opening 100 is formed in thesubstrate 10, and a plurality ofconductive traces 103 are disposed on thefirst side 101. - Referring to FIG. 2B, an appropriate
sized polyimide tape 15 is adhered to thesecond side 102 of thesubstrate 10 for covering theopening 100 of thesubstrate 10. Therefore, the tape needs to be dimensionally larger than theopening 100. - Referring to FIG. 2C, a
chip 11 having anactive side 110 and an opposinginactive side 111 is placed in theopening 100 of thesubstrate 10, and theinactive side 111 of thechip 11 is attached to thetape 15 via an adhesive. Thereby, thechip 11 is adhered to thetape 15 with theactive side 110 of thechip 11 facing downwardly, and accommodated in theopening 100 without coming into contact with thesubstrate 10. - Referring to FIG. 2D, a plurality of
gold wires 12 are used to electrically connect theactive side 110 of thechip 11 to the correspondingconductive traces 103 on thesubstrate 10, so as to establish electrical connection between thechip 11 and thesubstrate 10. Beside thegold wires 12, conventional tape automated bonding (TAB) technology can also be employed for electrically connecting thechip 11 to thesubstrate 10. - Referring to FIG. 2E, terminals (not shown) of the
conductive traces 103 are disposed with correspondingconductive bumps 13 thereon by using a conventional printing or plating means, so as to allow thechip 11 to be electrically connected to external devices such as a printed circuit board via theconductive bumps 13, which are made of a conductive material such as copper, aluminium, copper alloy, aluminium alloy or tin/lead alloy. Since the conventional printing or plating means is employed for disposing theconductive bumps 13 on thesubstrate 10, it can thus more accurately control theconductive bumps 13 to be higher thantops 120 of wire loops formed by thegold wires 12. Moreover,bottom sides 130 of theconductive bumps 13 are coplanarly positioned. - Referring to FIG. 2F, after mounting the
conductive bumps 13 on thesubstrate 10, anencapsulant 14 is formed on thefirst side 101 of thesubstrate 10, in a manner as to completely fill up theopening 100 and hermetically encapsulate thechip 11, thegold wires 12 and the conductive traces 103. Moreover, theconductive bumps 13 are also encapsulated by theencapsulant 14 except for thebottom sides 130 thereof. That is, thebottom sides 130 of theconductive bumps 13 are exposed to outside of abottom side 140 of theencapsulant 14, and coplanarly positioned with thebottom side 140. This therefore provides good planarity for a bottom side of the fabricated product. Theencapsulant 14 can be formed by using a conventional molding, printing or glob top means, with no particular restriction. Besides, theencapsulant 14 can also be formed in a two-step process. First, after completing the wire bonding process in FIG. 2D and prior to mounting theconductive bumps 13 in FIG. 2E, an inner encapsulant (not designated by a reference numeral) is formed by using a glob top or molding means for encapsulating thechip 11 and thegold wires 12. Then, as shown in FIG. 2F, an outer encapsulant is formed by using a molding, printing or glob top means for encapsulating the conductive traces 103 on thesubstrate 10, theconductive bumps 13 and the inner encapsulant. As such, the inner encapsulant and the outer encapsulant combine to be theencapsulant 14. - Referring finally to FIG. 2G, after the
encapsulant 14 is completely formed in shape, thetape 15 is tore off from thesecond side 102 of thesubstrate 10, allowing theinactive side 111 of thechip 11 to be directly exposed to the atmosphere. This therefore allows heat generated by thechip 11 in operation to be dissipated directly through the exposedinactive side 111 to the atmosphere, thereby providing better heat dissipating efficiency for the fabricated product than the prior art. Alternatively, thetape 15 can be retained on thesubstrate 10; this therefore simplifies the fabrication processes, however it is disadvantageous in affecting the heat dissipating efficiency and appearance of the fabricated product. - Second Preferred Embodiment
- FIG. 3 illustrates a sectional view of a semiconductor device of a second embodiment of the invention. As shown in the drawing, the semiconductor device2 in the second embodiment is structurally identical to that in the first embodiment, with the only difference in that, in the semiconductor device 2, an
upper encapsulant 26 is formed on asecond side 202 of asubstrate 20 and dimensioned to be approximately same in thickness as anencapsulant 24 formed under afirst side 201 of thesubstrate 20. Theupper encapsulant 26 is made of a resin compound same as that used for forming theencapsulant 24, and thus thermal stress acting on thesubstrate 20 and achip 21 interposed between theencapsulants substrate 20 from occurrence, and improves quality of the fabricated semiconductor device 2. Further in no concern for the occurrence of warpage, electrical connection quality between the semiconductor device 2 and external devices such as a printed circuit board can be assured. In addition, theupper encapsulant 26 provides protection for thechip 21, and thus thechip 21 can have better mechanical strength and not be damaged easily by external impact. - Third Preferred Embodiment
- FIG. 4 illustrates a sectional view of a semiconductor device of a third embodiment of the invention. As shown in the drawing, the
semiconductor device 3 in the third embodiment is structurally identical to that in the first embodiment, with the only difference in that, in thesemiconductor device 3, atape 35 adhered to asecond side 302 of asubstrate 30 is used for disposing achip 31 thereon. Thetape 35 is retained on thesecond side 302 of thesubstrate 30 after an encapsulant 34 is completely formed in shape. This therefore simplifies the fabrication processes for thesemiconductor device 3 in no need to tear off thetape 35 from thesubstrate 30. The retainedtape 35 is then encapsulated by anupper encapsulant 36 formed on thesecond side 302 of thesubstrate 30. - Besides, the
tape 35 can be replaced by a heat sink made of a good conductive metal, and thechip 31 can be directly mounted on the heat sink for transmitting heat generated by thechip 31 directly to the heat sink, thus improving heat dissipating efficiency of the device. - Fourth Preferred Embodiment
- FIG. 5 illustrates a sectional view of a semiconductor device of a fourth embodiment of the invention. As shown in the drawing, the semiconductor device4 in the fourth embodiment is structurally identical to that in the first embodiment, with the only difference in that, in the semiconductor device 4, a
heat sink 47 dimensionally similar in surface area to asubstrate 40 is attached to asecond side 402 of thesubstrate 40 via a conventional adhesive, allowing one end of anopening 400 on thesecond side 402 of thesubstrate 40 to be covered by theheat sink 47. Then, achip 41 is accommodated in theopening 400 in a manner that thechip 41 is attached to theheat sink 47 through theopening 400 via an adhesive such as silver paste. Therefore, since thechip 41 is attached to theheat sink 47, and an exposed surface of theheat spreader 47 is in direct contact with the atmosphere, heat generated by thechip 41 can be directly dissipated through theheat sink 47 to the atmosphere, and thus heat dissipating efficiency of the semiconductor device 4 is improved. Further, since theheat sink 47 is similar in surface area to thesubstrate 40, and thus provides a larger heat dissipating area for the semiconductor device. - Fifth Preferred Embodiment
- FIG. 6 illustrates a sectional view of a semiconductor device of a fifth embodiment of the invention. As shown in the drawing, the semiconductor device5 in the fifth embodiment is structurally identical to that in the first embodiment, with the only difference in that, in the semiconductor device 5,
solder balls 53 are used for providing electrical connection between achip 51 and external devices, instead of the conductive bumps used in the first embodiment. Therefore, a plurality of array-arrangedsolder balls 53 are implanted on afirst side 501 of asubstrate 50 by using a conventional ball implantation machine, in a manner that thesolder balls 53 are electrically connected to correspondingconductive traces 503 on thefirst side 501 of thesubstrate 50. After completing the ball implantation, anencapsulant 54 is formed on thefirst side 501 of thesubstrate 50 to encapsulate thesolder balls 53. Generally the commonly used solder balls are higher than tops 520 of wire loop formed bygold wires 52, which are used for electrically connecting thesubstrate 50 to thechip 51. As such, after theencapsulant 54 is completely formed in shape, a grinding process is performed to grind theencapsulant 54 and thesolder balls 53 by using a conventional grinding machine (not shown), so that the thickness of theencapsulant 54 and the height of thesolder balls 53 can be simultaneously reduced. The thickness of theencapsulant 54 can only be reduced to an extent as not to expose thegold wires 52, which are necessarily encapsulated in theencapsulant 54.Bottom sides 530 of theground solder balls 53 are exposed to outside of theencapsulant 54, and coplanarly positioned with abottom surface 540 of theencapsulant 54. This therefore provides the semiconductor device 5 with good planarity for a processing plane (i.e. the exposed plane of the solder balls 53) and with good electrical connection to external devices. - The invention has been described using exemplary preferred embodiments. However, it is to be understood that the scope of the invention is not limited to the disclosed embodiments. On the contrary, it is intended to cover various modifications and similar arrangements. The scope of the claims, therefore, should be accorded the broadest interpretation so as to encompass all such modifications and similar arrangements.
Claims (19)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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US10/214,758 US6790712B2 (en) | 2001-03-21 | 2002-08-09 | Semiconductor device and method for fabricating the same |
US10/900,134 US6964888B2 (en) | 2001-03-21 | 2004-07-28 | Semiconductor device and method for fabricating the same |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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TW90106565A | 2001-03-21 | ||
TW90106565 | 2001-03-21 | ||
TW090106565A TW579581B (en) | 2001-03-21 | 2001-03-21 | Semiconductor device with chip separated from substrate and its manufacturing method |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US10/214,758 Division US6790712B2 (en) | 2001-03-21 | 2002-08-09 | Semiconductor device and method for fabricating the same |
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US20020135080A1 true US20020135080A1 (en) | 2002-09-26 |
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US10/214,758 Expired - Lifetime US6790712B2 (en) | 2001-03-21 | 2002-08-09 | Semiconductor device and method for fabricating the same |
US10/900,134 Expired - Lifetime US6964888B2 (en) | 2001-03-21 | 2004-07-28 | Semiconductor device and method for fabricating the same |
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US10/214,758 Expired - Lifetime US6790712B2 (en) | 2001-03-21 | 2002-08-09 | Semiconductor device and method for fabricating the same |
US10/900,134 Expired - Lifetime US6964888B2 (en) | 2001-03-21 | 2004-07-28 | Semiconductor device and method for fabricating the same |
Country Status (3)
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US (3) | US6459163B1 (en) |
AU (1) | AU7943101A (en) |
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- 2001-03-21 TW TW090106565A patent/TW579581B/en not_active IP Right Cessation
- 2001-10-12 US US09/974,871 patent/US6459163B1/en not_active Expired - Lifetime
- 2001-10-15 AU AU79431/01A patent/AU7943101A/en not_active Abandoned
-
2002
- 2002-08-09 US US10/214,758 patent/US6790712B2/en not_active Expired - Lifetime
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2004
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US6713857B1 (en) * | 2002-12-05 | 2004-03-30 | Ultra Tera Corporation | Low profile stacked multi-chip semiconductor package with chip carrier having opening and fabrication method of the semiconductor package |
EP1914803A1 (en) * | 2006-10-20 | 2008-04-23 | Broadcom Corporation | Low profile ball grid array (BGA) package witth exposed die and method of making same |
US20080096312A1 (en) * | 2006-10-20 | 2008-04-24 | Broadcom Corporation | Low profile ball grid array (BGA) package with exposed die and method of making same |
US8169067B2 (en) | 2006-10-20 | 2012-05-01 | Broadcom Corporation | Low profile ball grid array (BGA) package with exposed die and method of making same |
US20110186967A1 (en) * | 2008-12-05 | 2011-08-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Component Stacking Using Pre-Formed Adhesive Films |
US8664749B2 (en) | 2008-12-05 | 2014-03-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Component stacking using pre-formed adhesive films |
Also Published As
Publication number | Publication date |
---|---|
US20040266067A1 (en) | 2004-12-30 |
US20020192860A1 (en) | 2002-12-19 |
US6459163B1 (en) | 2002-10-01 |
US6790712B2 (en) | 2004-09-14 |
US6964888B2 (en) | 2005-11-15 |
TW579581B (en) | 2004-03-11 |
AU7943101A (en) | 2002-09-26 |
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