US20030021944A1 - Combination loop textile - Google Patents
Combination loop textile Download PDFInfo
- Publication number
- US20030021944A1 US20030021944A1 US09/751,998 US75199800A US2003021944A1 US 20030021944 A1 US20030021944 A1 US 20030021944A1 US 75199800 A US75199800 A US 75199800A US 2003021944 A1 US2003021944 A1 US 2003021944A1
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- US
- United States
- Prior art keywords
- loops
- base substrate
- receiving
- stiff
- filament
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
- B32B3/02—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by features of form at particular places, e.g. in edge regions
- B32B3/08—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by features of form at particular places, e.g. in edge regions characterised by added members at particular parts
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- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
- A47L13/00—Implements for cleaning floors, carpets, furniture, walls, or wall coverings
- A47L13/10—Scrubbing; Scouring; Cleaning; Polishing
- A47L13/16—Cloths; Pads; Sponges
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form
- B32B3/02—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by features of form at particular places, e.g. in edge regions
- B32B3/06—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar form; Layered products having particular features of form characterised by features of form at particular places, e.g. in edge regions for securing layers together; for attaching the product to another member, e.g. to a support, or to another product, e.g. groove/tongue, interlocking
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- D—TEXTILES; PAPER
- D03—WEAVING
- D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
- D03D1/00—Woven fabrics designed to make specified articles
- D03D1/0017—Woven household fabrics
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- D—TEXTILES; PAPER
- D03—WEAVING
- D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
- D03D15/00—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used
- D03D15/40—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used characterised by the structure of the yarns or threads
- D03D15/49—Woven fabrics characterised by the material, structure or properties of the fibres, filaments, yarns, threads or other warp or weft elements used characterised by the structure of the yarns or threads textured; curled; crimped
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- D—TEXTILES; PAPER
- D03—WEAVING
- D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
- D03D27/00—Woven pile fabrics
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- D—TEXTILES; PAPER
- D03—WEAVING
- D03D—WOVEN FABRICS; METHODS OF WEAVING; LOOMS
- D03D27/00—Woven pile fabrics
- D03D27/02—Woven pile fabrics wherein the pile is formed by warp or weft
- D03D27/06—Warp pile fabrics
- D03D27/08—Terry fabrics
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- D—TEXTILES; PAPER
- D04—BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
- D04B—KNITTING
- D04B1/00—Weft knitting processes for the production of fabrics or articles not dependent on the use of particular machines; Fabrics or articles defined by such processes
- D04B1/02—Pile fabrics or articles having similar surface features
- D04B1/04—Pile fabrics or articles having similar surface features characterised by thread material
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- D—TEXTILES; PAPER
- D04—BRAIDING; LACE-MAKING; KNITTING; TRIMMINGS; NON-WOVEN FABRICS
- D04B—KNITTING
- D04B21/00—Warp knitting processes for the production of fabrics or articles not dependent on the use of particular machines; Fabrics or articles defined by such processes
- D04B21/02—Pile fabrics or articles having similar surface features
- D04B21/04—Pile fabrics or articles having similar surface features characterised by thread material
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- D—TEXTILES; PAPER
- D10—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
- D10B—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
- D10B2321/00—Fibres made from polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds
- D10B2321/08—Fibres made from polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds polymers of unsaturated carboxylic acids or unsaturated organic esters, e.g. polyacrylic esters, polyvinyl acetate
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- D—TEXTILES; PAPER
- D10—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
- D10B—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
- D10B2331/00—Fibres made from polymers obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds, e.g. polycondensation products
- D10B2331/02—Fibres made from polymers obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds, e.g. polycondensation products polyamides
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- D—TEXTILES; PAPER
- D10—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
- D10B—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
- D10B2331/00—Fibres made from polymers obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds, e.g. polycondensation products
- D10B2331/04—Fibres made from polymers obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds, e.g. polycondensation products polyesters, e.g. polyethylene terephthalate [PET]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/23907—Pile or nap type surface or component
- Y10T428/23929—Edge feature or configured or discontinuous surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/23907—Pile or nap type surface or component
- Y10T428/23929—Edge feature or configured or discontinuous surface
- Y10T428/23936—Differential pile length or surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/23907—Pile or nap type surface or component
- Y10T428/23957—Particular shape or structure of pile
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/23907—Pile or nap type surface or component
- Y10T428/23957—Particular shape or structure of pile
- Y10T428/23964—U-, V-, or W-shaped or continuous strand, filamentary material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/23907—Pile or nap type surface or component
- Y10T428/23993—Composition of pile or adhesive
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
- Y10T442/40—Knit fabric [i.e., knit strand or strip material]
- Y10T442/425—Including strand which is of specific structural definition
- Y10T442/431—Cross-sectional configuration of strand material is specified
Definitions
- the present invention generally relates to textiles having loops extending outwardly from a base material.
- Loop textiles have many applications. As an example, terry cloth loop textiles have been used for cleaning purposes. However, the terry cloth loops do not always provide a surface sufficient for scrubbing a surface. Therefore, there is a need for loop textiles having different characteristics for engaging another item.
- FIG. 1 is a cross-sectional view of an embodiment of the present invention, illustrated as a loop textile.
- FIG. 2 is a cross-sectional view of another embodiment of the present invention.
- FIG. 3 is a cross-sectional view of yet another embodiment of the present invention.
- FIG. 4A-F are enlarged cross-sectional views of a filament from a loop of the textile in FIGS. 1 - 3 .
- FIG. 5 is a block diagram illustrating one embodiment of a method for forming the loop textiles in FIGS. 1 - 3 .
- the textiles 10 , 20 and 30 generally include a base substrate 100 with a first surface 110 and a second surface 120 , a plurality of first and second receiving loops 210 , 220 extending from the base substrate 100 , and a plurality of first and second stiff loops 310 , 320 extending from the base substrate 100 .
- the base substrate 100 is a knitted cloth formed from a plurality of substrate yarns 101 .
- the base substrate 100 is illustrated in FIGS. 1 - 3 as a knitted cloth, the base substrate 100 can be any material that provides a flexible cloth-like base from which the loops 210 , 220 , 310 , 320 can extend.
- the base substrate can also be woven, non-woven, foam (open or closed cell), film, or any other similar web-like material.
- the base substrate 100 is absorbent.
- the base substrate 100 can receive particles.
- the first receiving loops 210 are a yarn that originate and extend outwardly from the first surface 110 of the base substrate 100 , and return into the first surface 110 of the base substrate 100 .
- the second receiving loops 220 are a yarn that originate and extend outwardly from the second surface 120 of the base substrate 100 , and return into the second surface 120 of the base substrate 100 .
- the height (h) of the receiving loop 210 , 220 is between about 0.1 millimeter and about 5 millimeters
- the width (w) of the receiving loop 210 , 220 is between about 0.1 millimeters and about 5 millimeters at the widest point.
- the height (h) of the receiving loop 210 , 220 is between about 0.3 millimeter and about 3 millimeters, and the width (w) of the receiving loop 210 , 220 is between about 0.3 millimeters and about 3 millimeters at the widest point.
- the receiving loop 210 , 220 extends to a height (h) of about 0.8 millimeters from the base substrate 100 , and is about 1.0 millimeter wide (w) at the widest point.
- the receiving loops 210 , 220 are absorbent and/or retain particles.
- the yarn forming the first and second receiving loops 210 , 220 is the same yarn as the substrate yarn 101 forming the base substrate 100 .
- the yarn forming the first and second receiving loops 210 , 220 can be a different yarn than the substrate yarn 101 forming the base substrate 100 .
- the yarn forming the receiving loops 210 , 220 can be filament or staple yarns, textured or non-textured, and include an appropriate surface finish.
- the receiving loops 210 , 220 have a denier per yarn of greater than about 10 in one embodiment, and greater than about 20 in another embodiment.
- the receiving loops 210 , 220 also have a denier per yarn of less than about 1000 in one embodiment, and less than about 500 in another embodiment.
- the receiving loops 210 , 220 can have from 10 to 10,000 filaments per yarn, and at least one of the filaments can range from about 0.01 to about 5 denier per filament.
- the receiving loops 210 , 220 have at least one filament with a denier per filament of less than about 1.
- the first stiff loops 310 are a yarn that originate and extend outwardly from the first surface 110 of the base substrate 100 , and return into the first surface 110 of the base substrate 100 .
- the second stiff loops 320 are a yarn that originate and extend outwardly from the second surface 120 of the base substrate 100 , and return into the second surface 120 of the base substrate 100 .
- the stiff loops 310 , 320 have a height and width that is generally sufficient to receive material within the stiff loops 310 , 320 when the textile 10 , 20 , 30 passes over another surface.
- the height (h) of the stiff loop 310 , 320 is between about 0.1 millimeter and about 5 millimeters, and the width (w) of the stiff loop 310 , 320 is between about 0.1 millimeters and about 5 millimeters at the widest point. In another embodiment, the height (h) of the stiff loop 310 , 320 is between about 0.3 millimeter and about 3 millimeters, and the width (w) of the stiff loop 310 , 320 is between about 0.3 millimeters and about 3 millimeters at the widest point. In a particular embodiment, the stiff loop 310 , 320 extends to a height (h) of about 1.0 millimeters from the base substrate 100 , and is about 0.8 millimeter wide (w) at the widest point.
- the stiff loops 310 , 320 are a mono-filament yarn.
- the yarn forming the stiff loops 310 , 320 can be either a mono-filament yarn or a multiple filament yarn.
- the yarn forming the stiff loops 310 , 320 has at least one filament with a denier per filament of at least about 10.
- the yarn forming the stiff loops 310 , 320 have at least one filament with a denier per filament of at least about 20.
- the yarn forming the stiff loops 310 , 320 have a denier per yarn of no greater than about 500 in one embodiment, and about 1000 in another embodiment.
- FIG. 4A-F there are shown enlarged cross-section of various embodiments of filaments that can be used in the yarn of the stiff loops 310 , 320 from FIGS. 1 - 3 .
- the cross-section of the filaments used in the yarn of the stiff loops 310 , 320 can be circular, or as shown in FIGS. 4 A-F, or another cross-section.
- FIG. 4A is illustrated a filament having an elliptical cross-section.
- FIG. 4B is illustrated a filament having a rectangular cross-section.
- FIG. 4C is illustrated a filament having a square cross-section.
- FIG. 4D is illustrated a filament having a tear drop shaped cross-section.
- FIG. 4E is illustrated a filament having a crescent shaped cross-section.
- FIG. 4F is illustrated a filament having a multi-lobe cross-section, such as a tri-lobe.
- the cross-section of the filament(s) forming the stiff loops 310 , 320 have an aspect ratio of greater than 1.2, as illustrated in FIGS. 4 A-F.
- an aspect ratio shall mean the width of the cross-section at its widest point divided by the width of the cross-section at its narrowest point.
- the cross-section of the filament(s) forming the stiff loops 310 , 320 have at least one corner edge, as illustrated in FIGS. 4 B-F.
- the cross-section of the filament(s) forming the stiff loops 310 , 320 have a cross-section with at least a portion of the cross-section being concave, as illustrated in FIGS. 4 E-F.
- concave shall mean a shape that the outer perimeter extends within a straight line drawn between any two points on the outer perimeter.
- the cross sections of the filaments can either be all one type of cross-section, or multiple cross-sections can be used for the filaments forming the various stiff loops 310 , 320 .
- the cross sections of the filaments forming the yarns can either be all of one type of cross-section (homogeneous), or multiple types of cross-sections (heterogeneous).
- the various stiff loops 310 , 320 can be yarns of different filaments, including any combination of homogenous yarns and/or heterogeneous yarns.
- the various stiff loops 310 , 320 can be combinations of any of the mono-filament yarns and multiple filament yarns.
- the yarn forming the stiff loops 310 , 320 can be stiffer than the material of the base substrate 110 .
- the yarn forming the first and second stiff loops 310 , 320 can also be stiffer than the material of the receiving loops 210 , 220 .
- filaments forming the stiff loops 310 , 320 are at least about a 10 denier per filament size larger than the filaments forming the receiving loops 210 , 220 .
- the textile 10 , 20 , 30 having the two type of loops 210 , 220 , and 310 , 320 can be imparted with favorable absorbency characteristics.
- Absorbency is defined by the mass of water absorbed by a textile per mass of textile. A common test procedure for this characteristic is the Institute of Environmental Science & Technology (IEST), Control Division Recommended Practice 004.2, test IEST-RP-CC004.2, “Evaluating Wiping Materials Used in Cleanrooms and Other Controlled Environments”.
- the textile 10 , 20 , 30 has an absorbency rate of at least about 2 grams of water per gram of textile.
- the textile 10 , 20 , 30 has an absorbency rate of at least about 2.5 grams of water per gram of textile.
- the textile 10 , 20 , 30 has an absorbency rate of at least about 3 grams of water per gram of textile.
- the first receiving loops 210 and the first stiff loops 310 originate at about the same location in the first side 110 of the base substrate 100 , and return to the first side 110 of the base substrate 100 at about the same location as each other.
- the second receiving loops 220 and the second stiff loops 320 originate at about the same location in the second side 120 of the base substrate 100 , and return at about the same location in the second side 120 of the base substrate 100 as each other.
- the loop textile 10 has been illustrated in FIG.
- the present invention may have only receiving loops 210 and stiff loops 310 on the first side 110 , receiving loops 210 and stiff loops 310 on the first side 110 with only receiving loops 220 on the second side 120 , receiving loops 210 and stiff loops 310 on the first side 110 with only stiff loops 320 on the second side 120 , or only receiving loops 210 on the first side 110 with only stiff loops 320 on the second side 120 .
- the first receiving loops 210 and the first stiff loops 310 originate in the first side 110 of the base substrate 100 and return into the first side 110 of the base substrate 100 .
- the first receiving loops 210 can originate and return adjacent to each other, or adjacent to first stiff loops 310 .
- the first stiff loops 310 can originate and return adjacent to each other, or adjacent to first receiving loops 210 .
- the second receiving loops 220 and the second stiff loops 320 originate in the second side 120 of the base substrate 100 and return to the second side 120 of the base substrate 100 .
- the second receiving loops 220 can originate and return adjacent to each other, or adjacent to second stiff loops 320 .
- the second stiff loops 320 can originate and return adjacent to each other, or adjacent to second receiving loops 220 .
- the loop textile 20 has been illustrated in FIG. 2 with receiving loops 210 , 220 and stiff loops 310 , 320 on both sides 110 , 120 of the base substrate 100 , it is contemplated that the present invention may have only receiving loops 210 and stiff loops 310 on the first side 110 , receiving loops 210 and stiff loops 310 on the first side 110 with only receiving loops 220 on the second side 120 , receiving loops 210 and stiff loops 310 on the first side 110 with only stiff loops 320 on the second side 120 , or only receiving loops 210 on the first side 110 with only stiff loops 320 on the second side 120 .
- the first receiving loops 210 and the first stiff loops 310 originate in the first side 110 of the base substrate 100 and return into the first side 110 of the base substrate 100 .
- the first receiving loops 210 can originate and return adjacent to each other, or adjacent to first stiff loops 310 .
- the first stiff loops 310 can originate and return adjacent to each other, or adjacent to first receiving loops 210 .
- the second receiving loops 220 and the second stiff loops 320 originate at about the same location in the second side 120 of the base substrate 100 , and return at about the same location in the second side 120 of the base substrate 100 as each other.
- the loop textile 30 has been illustrated in FIG.
- the present invention may have only receiving loops 210 and stiff loops 310 on the first side 110 , receiving loops 210 and stiff loops 310 on the first side 110 with only receiving loops 220 on the second side 120 , receiving loops 210 and stiff loops 310 on the first side 110 with only stiff loops 320 on the second side 120 , or only receiving loops 210 on the first side 110 with only stiff loops 320 on the second side 120 .
- the present invention can be a textile that has sections according to the textile 10 in FIG. 1 and sections according to the textile 20 in FIG. 2 on either side, or both sides, of the textile. Also, it is anticipated that the receiving loops 210 , 220 can be smaller, larger, or the same size as the stiff loops 310 , 320 , in height and/or width.
- FIG. 5 there is shown a block diagram of a method 500 of forming one embodiment of the textile according to any one of FIGS. 1 - 3 .
- the method 500 illustrated in FIG. 5 generally includes the steps of acquiring a sheet of polymer material 510 , slitting the sheet of polymer material into strips 520 , acquiring a receiving yarn 530 , and forming a base substrate and attaching the strips of polymer to the base substrate as stiff loops extending from the base substrate and attaching the receiving yarn to the base substrate as receiving loops extending from the base substrate 540 .
- the acquired sheet of polymer material can be a polymer that is extruded, cast, blown, or that is formed in any other manner that produces a sheet of polymer.
- the polymer can be polyethylene, polyester, polypropylene, or the like.
- the thickness of the sheet can be from about 0.0005 inches to about 0.005 inches. In one embodiment, the film is about 0.0015 inches thick.
- the sheet of polymer material is slit into individual filaments.
- a long sheet of polymer material is unrolled and engages a row of knives that slit the sheet of polymer from its original width to many strips of the polymer material, the number of strips determined by the number of knives.
- the width of the filaments can be from about 0.002 inches to about 0.25 inches.
- the individual filaments are strips of polymer that are about 0.0145 inches wide.
- step 540 the forming a base substrate and attaching the strips of polymer and receiving yarn can be performed by double knitting the base substrate, tucking the strips of polymer and receiving yarn into the base substrate, and knitting the polymer strips and receiving yarn into the base substrate as loops.
- the polymer strips and receiving yarn are attached as loops to the base substrate by attaching a first section of the strip of polymer and the receiving yarn to the base substrate 541 , bringing the strip of polymer and receiving yarn around sacrificial yarn, attaching a second section of the strip of polymer and receiving yarn to the base substrate on the opposite side of the sacrificial yarn from the first section of the strip of polymer and receiving yarn 542 , and removing the sacrificial yarn from between the base substrate and the strip of polymer and receiving yarn to form a stiff loop of the strip of polymer and a receiving loop of the receiving yarn 543 .
- the step of removing the sacrificial yarn is performed by dissolving the sacrificial yarn.
- a polymer sheet was acquired of a polyester film being about 0.0015 inches thick.
- the polymer sheet was slit into filament strips of about 0.0145 inches wide.
- a base substrate was formed from a substrate yarn of textured filament polyester yarn, having 34 filaments per yarn at a yarn denier of 150 (such as Dacron 56T by DuPont).
- the filament polymer strips were attached to the base substrate as stiff loops by tucking the filament polymer strips into a first side of the base substrate as it was being formed, and knitting the filament polymer strips into the base substrate around a one ply, 40 denier per filament, 12 filament sacrificial water-soluble poly(vinyl alcohol) yarn (such as Solvron by Nitivy) on the first side of the base substrate.
- a soft yarn of splittable of Nylon/PET, 150 denier per yarn, 48 filament (splittable into 48 ⁇ 11 528 filaments) (such as Wramp by Kuraray), was attached to the base substrate as receiving loops by tucking the soft yarn into a second side of the base substrate as it was being formed, and knitting the soft yarn into the base substrate around a one ply, 40 denier per filament, 12 filament sacrificial water-soluble poly(vinyl alcohol) yarn (such as Solvron by Nitivy) on the second side of the base substrate.
- the sacrificial yarn was removed by immersing the textile into a hot water scour of 160 F. After formation of the loops by dissolving the sacrificial yarn, the textile was dyed, slit to proper width, dried, and cut to the appropriate size.
- the textile according to this first example had an absorbency of about 3 grams of water per gram of textile.
- the first example was formed with an additional soft yarn being attached and knitted into the base substrate as receiving loops on the same side of the base substrate as the stiff loops.
- the textile according to this second example had an absorbency of about 4 grams of water per gram of textile.
Abstract
A base substrate having a first side and a second side, first and second receiving loops extending from the first and second side of the base substrate, respectively, and first and second stiff loops extending from the first and second side of the base substrate, respectively. The base substrate is a flexible cloth or cloth-like material. The receiving loops are an absorbent material such as the material used in the base substrate. The stiff loops are formed of a yarn having at least one filament with a cross-section having an aspect ratio of greater than about 1.2, a corner edge, and/or at least a concave portion.
Description
- The present invention generally relates to textiles having loops extending outwardly from a base material.
- Loop textiles have many applications. As an example, terry cloth loop textiles have been used for cleaning purposes. However, the terry cloth loops do not always provide a surface sufficient for scrubbing a surface. Therefore, there is a need for loop textiles having different characteristics for engaging another item.
- FIG. 1 is a cross-sectional view of an embodiment of the present invention, illustrated as a loop textile.
- FIG. 2 is a cross-sectional view of another embodiment of the present invention.
- FIG. 3 is a cross-sectional view of yet another embodiment of the present invention.
- FIG. 4A-F are enlarged cross-sectional views of a filament from a loop of the textile in FIGS.1-3.
- FIG. 5 is a block diagram illustrating one embodiment of a method for forming the loop textiles in FIGS.1-3.
- Referring now to the figures, and in particular to FIGS.1-3, there is shown a cross-sectional view of various embodiments of the present invention, illustrated as the
loop textiles 10, 20, and 30. Thetextiles 10, 20 and 30, generally include abase substrate 100 with afirst surface 110 and asecond surface 120, a plurality of first andsecond receiving loops base substrate 100, and a plurality of first and secondstiff loops base substrate 100. - As illustrated in FIGS.1-3, the
base substrate 100 is a knitted cloth formed from a plurality ofsubstrate yarns 101. Although thebase substrate 100 is illustrated in FIGS. 1-3 as a knitted cloth, thebase substrate 100 can be any material that provides a flexible cloth-like base from which theloops base substrate 100 is absorbent. In another embodiment, thebase substrate 100 can receive particles. - The
first receiving loops 210 are a yarn that originate and extend outwardly from thefirst surface 110 of thebase substrate 100, and return into thefirst surface 110 of thebase substrate 100. Thesecond receiving loops 220 are a yarn that originate and extend outwardly from thesecond surface 120 of thebase substrate 100, and return into thesecond surface 120 of thebase substrate 100. In one embodiment, the height (h) of thereceiving loop receiving loop receiving loop receiving loop receiving loop base substrate 100, and is about 1.0 millimeter wide (w) at the widest point. - The
receiving loops second receiving loops substrate yarn 101 forming thebase substrate 100. In another embodiment, the yarn forming the first andsecond receiving loops substrate yarn 101 forming thebase substrate 100. The yarn forming thereceiving loops receiving loops receiving loops receiving loops receiving loops - The first
stiff loops 310 are a yarn that originate and extend outwardly from thefirst surface 110 of thebase substrate 100, and return into thefirst surface 110 of thebase substrate 100. The secondstiff loops 320 are a yarn that originate and extend outwardly from thesecond surface 120 of thebase substrate 100, and return into thesecond surface 120 of thebase substrate 100. Thestiff loops stiff loops textile 10, 20, 30 passes over another surface. In one embodiment, the height (h) of thestiff loop stiff loop stiff loop stiff loop stiff loop base substrate 100, and is about 0.8 millimeter wide (w) at the widest point. - As illustrated in FIGS.1-3, the
stiff loops stiff loops stiff loops stiff loops stiff loops - Referring now to FIG. 4A-F, there are shown enlarged cross-section of various embodiments of filaments that can be used in the yarn of the
stiff loops stiff loops - In one embodiment, the cross-section of the filament(s) forming the
stiff loops stiff loops stiff loops - In an embodiment where the
stiff loops stiff loops stiff loops stiff loops - Referring back now to FIGS.1-3, the yarn forming the
stiff loops base substrate 110. The yarn forming the first and secondstiff loops loops stiff loops loops - The
textile 10, 20, 30 having the two type ofloops textile 10, 20, 30 has an absorbency rate of at least about 2 grams of water per gram of textile. In another embodiment, thetextile 10, 20, 30 has an absorbency rate of at least about 2.5 grams of water per gram of textile. In yet another embodiment, thetextile 10, 20, 30 has an absorbency rate of at least about 3 grams of water per gram of textile. - Referring now to FIG. 1, the first receiving
loops 210 and the firststiff loops 310 originate at about the same location in thefirst side 110 of thebase substrate 100, and return to thefirst side 110 of thebase substrate 100 at about the same location as each other. Similarly, thesecond receiving loops 220 and the secondstiff loops 320 originate at about the same location in thesecond side 120 of thebase substrate 100, and return at about the same location in thesecond side 120 of thebase substrate 100 as each other. Although the loop textile 10 has been illustrated in FIG. 1 with receivingloops stiff loops sides base substrate 100, it is contemplated that the present invention may have only receivingloops 210 andstiff loops 310 on thefirst side 110, receivingloops 210 andstiff loops 310 on thefirst side 110 with only receivingloops 220 on thesecond side 120, receivingloops 210 andstiff loops 310 on thefirst side 110 with onlystiff loops 320 on thesecond side 120, or only receivingloops 210 on thefirst side 110 with onlystiff loops 320 on thesecond side 120. - Referring now to FIG. 2, the first receiving
loops 210 and the firststiff loops 310 originate in thefirst side 110 of thebase substrate 100 and return into thefirst side 110 of thebase substrate 100. Thefirst receiving loops 210 can originate and return adjacent to each other, or adjacent to firststiff loops 310. Similarly, the firststiff loops 310 can originate and return adjacent to each other, or adjacent to first receivingloops 210. Thesecond receiving loops 220 and the secondstiff loops 320 originate in thesecond side 120 of thebase substrate 100 and return to thesecond side 120 of thebase substrate 100. Thesecond receiving loops 220 can originate and return adjacent to each other, or adjacent to secondstiff loops 320. Similarly, the secondstiff loops 320 can originate and return adjacent to each other, or adjacent to second receivingloops 220. Although the loop textile 20 has been illustrated in FIG. 2 with receivingloops stiff loops sides base substrate 100, it is contemplated that the present invention may have only receivingloops 210 andstiff loops 310 on thefirst side 110, receivingloops 210 andstiff loops 310 on thefirst side 110 with only receivingloops 220 on thesecond side 120, receivingloops 210 andstiff loops 310 on thefirst side 110 with onlystiff loops 320 on thesecond side 120, or only receivingloops 210 on thefirst side 110 with onlystiff loops 320 on thesecond side 120. - Referring now to FIG. 3, the first receiving
loops 210 and the firststiff loops 310 originate in thefirst side 110 of thebase substrate 100 and return into thefirst side 110 of thebase substrate 100. Thefirst receiving loops 210 can originate and return adjacent to each other, or adjacent to firststiff loops 310. Similarly, the firststiff loops 310 can originate and return adjacent to each other, or adjacent to first receivingloops 210. However, thesecond receiving loops 220 and the secondstiff loops 320 originate at about the same location in thesecond side 120 of thebase substrate 100, and return at about the same location in thesecond side 120 of thebase substrate 100 as each other. Although theloop textile 30 has been illustrated in FIG. 3 with receivingloops stiff loops sides base substrate 100, it is contemplated that the present invention may have only receivingloops 210 andstiff loops 310 on thefirst side 110, receivingloops 210 andstiff loops 310 on thefirst side 110 with only receivingloops 220 on thesecond side 120, receivingloops 210 andstiff loops 310 on thefirst side 110 with onlystiff loops 320 on thesecond side 120, or only receivingloops 210 on thefirst side 110 with onlystiff loops 320 on thesecond side 120. - Additionally, it is anticipated that the present invention can be a textile that has sections according to the textile10 in FIG. 1 and sections according to the textile 20 in FIG. 2 on either side, or both sides, of the textile. Also, it is anticipated that the receiving
loops stiff loops - Referring now to FIG. 5, there is shown a block diagram of a
method 500 of forming one embodiment of the textile according to any one of FIGS. 1-3. Themethod 500 illustrated in FIG. 5 generally includes the steps of acquiring a sheet ofpolymer material 510, slitting the sheet of polymer material intostrips 520, acquiring a receivingyarn 530, and forming a base substrate and attaching the strips of polymer to the base substrate as stiff loops extending from the base substrate and attaching the receiving yarn to the base substrate as receiving loops extending from thebase substrate 540. - In
step 510, the acquired sheet of polymer material can be a polymer that is extruded, cast, blown, or that is formed in any other manner that produces a sheet of polymer. The polymer can be polyethylene, polyester, polypropylene, or the like. The thickness of the sheet can be from about 0.0005 inches to about 0.005 inches. In one embodiment, the film is about 0.0015 inches thick. - In
step 520, the sheet of polymer material is slit into individual filaments. In one embodiment, a long sheet of polymer material is unrolled and engages a row of knives that slit the sheet of polymer from its original width to many strips of the polymer material, the number of strips determined by the number of knives. The width of the filaments can be from about 0.002 inches to about 0.25 inches. In one embodiment, the individual filaments are strips of polymer that are about 0.0145 inches wide. - In
step 540, the forming a base substrate and attaching the strips of polymer and receiving yarn can be performed by double knitting the base substrate, tucking the strips of polymer and receiving yarn into the base substrate, and knitting the polymer strips and receiving yarn into the base substrate as loops. In one embodiment, the polymer strips and receiving yarn are attached as loops to the base substrate by attaching a first section of the strip of polymer and the receiving yarn to thebase substrate 541, bringing the strip of polymer and receiving yarn around sacrificial yarn, attaching a second section of the strip of polymer and receiving yarn to the base substrate on the opposite side of the sacrificial yarn from the first section of the strip of polymer and receivingyarn 542, and removing the sacrificial yarn from between the base substrate and the strip of polymer and receiving yarn to form a stiff loop of the strip of polymer and a receiving loop of the receiving yarn 543. In a further embodiment, the step of removing the sacrificial yarn is performed by dissolving the sacrificial yarn. - The present invention can also be better understood by reference to the following example. A polymer sheet was acquired of a polyester film being about 0.0015 inches thick. The polymer sheet was slit into filament strips of about 0.0145 inches wide. A base substrate was formed from a substrate yarn of textured filament polyester yarn, having 34 filaments per yarn at a yarn denier of 150 (such as Dacron 56T by DuPont). The filament polymer strips were attached to the base substrate as stiff loops by tucking the filament polymer strips into a first side of the base substrate as it was being formed, and knitting the filament polymer strips into the base substrate around a one ply, 40 denier per filament, 12 filament sacrificial water-soluble poly(vinyl alcohol) yarn (such as Solvron by Nitivy) on the first side of the base substrate. A soft yarn of splittable of Nylon/PET, 150 denier per yarn, 48 filament (splittable into 48×11=528 filaments) (such as Wramp by Kuraray), was attached to the base substrate as receiving loops by tucking the soft yarn into a second side of the base substrate as it was being formed, and knitting the soft yarn into the base substrate around a one ply, 40 denier per filament, 12 filament sacrificial water-soluble poly(vinyl alcohol) yarn (such as Solvron by Nitivy) on the second side of the base substrate. The sacrificial yarn was removed by immersing the textile into a hot water scour of 160 F. After formation of the loops by dissolving the sacrificial yarn, the textile was dyed, slit to proper width, dried, and cut to the appropriate size. The textile according to this first example had an absorbency of about 3 grams of water per gram of textile.
- In a second example, the first example was formed with an additional soft yarn being attached and knitted into the base substrate as receiving loops on the same side of the base substrate as the stiff loops. The textile according to this second example had an absorbency of about 4 grams of water per gram of textile.
Claims (8)
1. An article comprising:
a base substrate;
a plurality of receiving loops extending from said base substrate, said receiving loops including at least one receiving filament;
a plurality of stiff loops extending from said base substrate, said stiff loops including at least one stiff filament having a denier per filament of at least about 10 denier per filament greater than the receiving filament of said receiving loops.
2. The article according to claim 1 , wherein said base substrate includes a first side and a second side, and wherein said receiving loops and said stiff loops extend from the first side of said base substrate.
3. The article according to claim 2 , wherein said receiving loops are adjacent to the stiff loops.
4. The article according to claim 2 , wherein said receiving loops coincide with the stiff loops.
5. The article according to claim 1 , wherein said base substrate includes a first side and a second side, wherein said receiving loops are disposed on the first side of said base substrate, and wherein said stiff loops are disposed on the second side of said base substrate.
6. An article comprising:
a base substrate;
a plurality of receiving loops extending from said base substrate, said receiving loops including at least one receiving filament with a denier per filament of less than about 5;
a plurality of stiff loops extending from said base substrate, said stiff loops including at least one stiff filament with a denier per filament of greater than about 10.
7. An article comprising:
a base substrate;
a plurality of receiving filaments extending from said base substrate, said receiving filaments having a denier per filament of less than about 5;
a plurality of stiff filaments extending from said base substrate, said stiff loops including at least one stiff filament with a denier per filament of greater than about 10;
wherein said base substrate with said receiving filaments and said stiff loops thereon have an absorbency of at least about 2 grams of water per total gram weight.
8. The article according to claim 7 , wherein said receiving filaments extend from said base substrate in receiving loops, and wherein said stiff filaments extend from said base substrate in stiff loops.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/751,998 US20030021944A1 (en) | 2000-12-29 | 2000-12-29 | Combination loop textile |
PCT/US2001/043936 WO2002053362A1 (en) | 2000-12-29 | 2001-11-06 | Combination loop textile |
US10/714,994 US7273648B2 (en) | 2000-12-29 | 2003-11-17 | Combination loop textile |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/751,998 US20030021944A1 (en) | 2000-12-29 | 2000-12-29 | Combination loop textile |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/714,994 Continuation US7273648B2 (en) | 2000-12-29 | 2003-11-17 | Combination loop textile |
Publications (1)
Publication Number | Publication Date |
---|---|
US20030021944A1 true US20030021944A1 (en) | 2003-01-30 |
Family
ID=25024410
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/751,998 Abandoned US20030021944A1 (en) | 2000-12-29 | 2000-12-29 | Combination loop textile |
US10/714,994 Expired - Fee Related US7273648B2 (en) | 2000-12-29 | 2003-11-17 | Combination loop textile |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/714,994 Expired - Fee Related US7273648B2 (en) | 2000-12-29 | 2003-11-17 | Combination loop textile |
Country Status (2)
Country | Link |
---|---|
US (2) | US20030021944A1 (en) |
WO (1) | WO2002053362A1 (en) |
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US20040102119A1 (en) * | 2000-12-29 | 2004-05-27 | Morin Brian G. | Combination loop textile |
WO2005110182A1 (en) * | 2004-04-30 | 2005-11-24 | 3M Innovative Properties Company | Applicator pad and related methods |
US20160015235A1 (en) * | 2014-07-15 | 2016-01-21 | Decitex | Maintenance item and a cleaning device including such a maintenance item |
WO2017162183A1 (en) * | 2016-03-24 | 2017-09-28 | 东丽纤维研究所(中国)有限公司 | Double-sided knitted fabric |
CN108193402A (en) * | 2018-03-23 | 2018-06-22 | 苍南县亨利棉纺制品有限公司 | A kind of cleaning blanket |
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DE202004014703U1 (en) * | 2004-09-17 | 2004-12-02 | Kohlruss, Gregor | Cleaning textile with staple fiber loops |
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JP2007151803A (en) * | 2005-12-05 | 2007-06-21 | Three M Innovative Properties Co | Wiping member |
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US8060973B2 (en) * | 2007-05-07 | 2011-11-22 | Tietex International, Ltd. | Cleaning and personal care articles |
DE202009016066U1 (en) * | 2009-11-26 | 2010-07-22 | Mattes & Ammann Gmbh & Co. Kg | Textile fabric with foil tapes |
WO2013113906A1 (en) | 2012-02-01 | 2013-08-08 | Birgit Riesinger | Wound care article comprising at least one surface having abrasive properties |
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US9850599B2 (en) * | 2015-09-24 | 2017-12-26 | Standard Textile Co., Inc. | Woven terry fabric with controlled weight distribution and articles made therefrom |
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CN107475880B (en) * | 2016-06-08 | 2020-11-10 | 东丽纤维研究所(中国)有限公司 | Heat-preservation water-absorption quick-drying fabric |
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US20040102119A1 (en) * | 2000-12-29 | 2004-05-27 | Morin Brian G. | Combination loop textile |
US7273648B2 (en) * | 2000-12-29 | 2007-09-25 | Milliken & Company | Combination loop textile |
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CN108193402A (en) * | 2018-03-23 | 2018-06-22 | 苍南县亨利棉纺制品有限公司 | A kind of cleaning blanket |
Also Published As
Publication number | Publication date |
---|---|
US20040102119A1 (en) | 2004-05-27 |
US7273648B2 (en) | 2007-09-25 |
WO2002053362A1 (en) | 2002-07-11 |
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Owner name: MILLIKEN & COMPANY, SOUTH CAROLINA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:MORIN, BRIAN G.;SASSER, MICHAEL P.;HAYES, HEATHER J.;REEL/FRAME:011845/0613 Effective date: 20010511 |
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STCB | Information on status: application discontinuation |
Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION |