US20050126682A1 - Monolithic ceramic substrate and method for making the same - Google Patents

Monolithic ceramic substrate and method for making the same Download PDF

Info

Publication number
US20050126682A1
US20050126682A1 US11/050,519 US5051905A US2005126682A1 US 20050126682 A1 US20050126682 A1 US 20050126682A1 US 5051905 A US5051905 A US 5051905A US 2005126682 A1 US2005126682 A1 US 2005126682A1
Authority
US
United States
Prior art keywords
green
conductor
functional ceramic
layers
ceramic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US11/050,519
Inventor
Mitsuyoshi Nishide
Ryoji Nakamura
Norio Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Priority to US11/050,519 priority Critical patent/US20050126682A1/en
Publication of US20050126682A1 publication Critical patent/US20050126682A1/en
Assigned to MURATA MANUFACTURING CO., LTD. reassignment MURATA MANUFACTURING CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SAKAI, NORIO, NAKAMURA, RYOJI, NISHIDE, MITSUYOSHI
Abandoned legal-status Critical Current

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B18/00Layered products essentially comprising ceramics, e.g. refractory products
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4803Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
    • H01L21/481Insulating layers on insulating parts, with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/48Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814Conductive parts
    • H01L21/4846Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/4857Multilayer substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/202Conductive
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/204Di-electric
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/206Insulating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/208Magnetic, paramagnetic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/50Properties of the layers or laminate having particular mechanical properties
    • B32B2307/538Roughness
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2311/00Metals, their alloys or their compounds
    • B32B2311/02Noble metals
    • B32B2311/04Gold
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2311/00Metals, their alloys or their compounds
    • B32B2311/02Noble metals
    • B32B2311/08Silver
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2311/00Metals, their alloys or their compounds
    • B32B2311/12Copper
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3205Alkaline earth oxides or oxide forming salts thereof, e.g. beryllium oxide
    • C04B2235/3215Barium oxides or oxide-forming salts thereof
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3217Aluminum oxide or oxide forming salts thereof, e.g. bauxite, alpha-alumina
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/36Glass starting materials for making ceramics, e.g. silica glass
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/658Atmosphere during thermal treatment
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/40Metallic
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/40Metallic
    • C04B2237/407Copper
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/40Metallic
    • C04B2237/408Noble metals, e.g. palladium, platina or silver
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/56Using constraining layers before or during sintering
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/56Using constraining layers before or during sintering
    • C04B2237/562Using constraining layers before or during sintering made of alumina or aluminates
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/56Using constraining layers before or during sintering
    • C04B2237/565Using constraining layers before or during sintering made of refractory metal oxides, e.g. zirconia
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/70Forming laminates or joined articles comprising layers of a specific, unusual thickness
    • C04B2237/706Forming laminates or joined articles comprising layers of a specific, unusual thickness of one or more of the metallic layers or articles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0183Dielectric layers
    • H05K2201/0195Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0302Properties and characteristics in general
    • H05K2201/0317Thin film conductor layer; Thin film passive component
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0352Differences between the conductors of different layers of a multilayer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49126Assembling bases
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24926Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer

Definitions

  • the present invention relates to a monolithic ceramic substrate manufactured by a process that does not cause shrinkage of the monolithic ceramic substrate and a method for making the monolithic ceramic substrate that does not shrink along the principal plane during sintering.
  • a monolithic ceramic substrate is manufactured by a process which does not cause shrinkage of the monolithic ceramic substrate. More specifically, a laminate including a plurality of ceramic layers made of glass ceramic that sinters at low temperatures is disposed between two inorganic constraining layers that do not sinter at a sintering temperature for the ceramic layers, this composite is sintered, and then the constraining layers are removed.
  • Conductor patterns are disposed at desired interfaces between the ceramic layers and the constraining layers and on outer surfaces of the laminate. These conductor patterns are formed by etching a metal foil that does not shrink at the sintering temperature for the ceramic layers.
  • the thin-film conductor is a dense film.
  • the thin-film conductor does not include interstices for releasing gas generated by decomposition of a binder component in the green ceramic sheets during sintering in a pattern having a large occupancy area, such as a ground electrode pattern.
  • voids and residual carbon which greatly reduce the reliability of the monolithic ceramic substrate, tend to remain in the vicinity of the thin-film conductors.
  • the conductor Since the thin-film conductor has low mechanical strength, the conductor must have an increased thickness. Thus, the thin-film conductor does not shrink during sintering, and as a result, the soft green ceramic sheets are compacted.
  • the soft green ceramic sheets are dense at patterns having large occupancy areas but are not dense at patterns having small occupancy areas, for example, inductor electrodes and signal lines, resulting in a large difference in the density in the green ceramic sheet. As a result, the internal stress in a circuit board including many patterns having large occupancy areas is greatly increased, which causes deformation or cracking.
  • preferred embodiments of the present invention provide a highly reliable monolithic ceramic substrate having a conductor pattern and a method for making the same.
  • a monolithic ceramic substrate includes a plurality of functional ceramic layers including a functional ceramic material, support layers including a ceramic material that does not sinter at a sintering temperature of the functional ceramic material, the support layers being in contact with the respective functional ceramic layers to suppress the shrinkage of the functional ceramic layers, first conductor patterns including at least one thin-film conductor selected from the group consisting of a metal foil, a metal wire, and a conductive thin-film, the first conductor patterns being in contact with the respective functional ceramic layers, and second conductor patterns including a thick-film conductor in contact with the respective functional ceramic layers.
  • the support layers are each disposed between the two adjoining functional ceramic layers.
  • the first conductor patterns and the second conductor patterns are preferably each disposed between one of the functional ceramic layers and one of the support layers.
  • the thin-film conductor defining the first conductor pattern preferably has a thickness of about 100 ⁇ m or less. It is also preferred that the thin-film conductor defining the first conductor pattern has a porosity of about 10% or less before sintering.
  • the thin-film conductor defining the first conductor pattern preferably has a volume resistivity of about 2.5 ⁇ cm or less and a surface roughness of about 5 ⁇ m or less.
  • the area ratio of the thin-film conductor defining the first conductor pattern to the functional ceramic layer is preferably about 90% or less.
  • the second conductor patterns are preferably made of a conductive paste and have a thickness of about 30 ⁇ m or less after sintering of the functional ceramic layers.
  • the first conductor patterns each define at least one of an inductor electrode and a signal line.
  • the area ratio of the thin-film conductor relative to the functional ceramic layer is preferably about 30% or less.
  • the second conductor patterns each define a ground electrode.
  • the area of the second conductor pattern is preferably at least about 50% of the area of the functional ceramic layer.
  • a method for making a monolithic ceramic substrate includes the steps of preparing a green laminate having a plurality of green functional ceramic layers including a functional ceramic material, green support layers including a ceramic material that does not sinter at a sintering temperature for the green functional ceramic material, the green support layers being in contact with the respective green functional ceramic layers to prevent shrinkage of the functional ceramic layers, first conductor patterns including at least one thin-film conductor selected from the group consisting of a metal foil, a metal wire, and a conductive thin-film, the first conductor patterns being in contact with the respective green functional ceramic layers, and second conductor patterns including a thick-film conductor in contact with the respective green functional ceramic layers, and firing the green laminate at the sintering temperature of the green functional ceramic material.
  • the green support layers are each disposed between the two adjoining green functional ceramic layers. It is also preferred that the first conductor patterns and the second conductor patterns are each disposed between one of the green functional ceramic layers and one of the support layers.
  • the thin-film conductor defining the first conductor pattern preferably has a thickness of about 100 ⁇ m or less.
  • the thin-film conductor defining the first conductor pattern has a porosity of about 10% or less before sintering. It is also preferred that the thin-film conductor defining the first conductor pattern has a volume resistivity of about 2.5 ⁇ -cm or less and a surface roughness of about 5 ⁇ m or less.
  • the area ratio of the thin-film conductor defining the first conductor pattern to the functional ceramic layer is about 90% or less.
  • the second conductor patterns is preferably formed of a conductive paste and have a thickness of about 30 ⁇ m or less after sintering of the functional ceramic layers.
  • the first conductor patterns such as inductors and signal lines
  • the second conductive patterns such as grounds and capacitors
  • the conductor patterns are highly precise due to the support layers which suppress shrinkage of the functional ceramic layers.
  • the compositions for the first and second conductor patterns can be appropriately changed depending on the characteristics required for these conductor patterns.
  • the monolithic ceramic substrate according to preferred embodiments of the present invention has excellent radiofrequency characteristics. Furthermore, in the monolithic ceramic substrate, the formation of voids and cracks in the ceramic layers and the conductor patterns is greatly reduced.
  • FIG. 1 is a cross-sectional view of a preferred embodiment of a monolithic ceramic substrate according to the present invention.
  • FIGS. 2A to 2 G are cross-sectional views illustrating steps for making the monolithic ceramic substrate shown in FIG. 1 .
  • a monolithic ceramic substrate 1 includes a plurality of functional ceramic layers 2 including a functional ceramic material.
  • the functional ceramic material has a specific electrical property, for example, dielectricity, insulation, or magnetism. Thus, the material is selected depending upon a property required for the monolithic ceramic substrate 1 .
  • These functional ceramic layers 2 may be composed of the same functional ceramic material or may be composed of different functional ceramic materials.
  • the functional ceramic material sinters at low temperatures to sinter with low-resistance metals such as copper and silver.
  • the functional ceramic material preferably includes crystallized glass or a mixture of glass and ceramic, or other suitable material.
  • the monolithic ceramic substrate 1 includes support layers 3 that prevent shrinkage of the functional ceramic layers 2 .
  • Each support layer 3 is in contact with the corresponding functional ceramic layer 2 .
  • all the functional ceramic layers 2 are in contact with the respective support layers 3 so that each support layer 3 is disposed between two adjoining functional ceramic layers 2 .
  • the support layers 3 include a ceramic material that does not sinter at a sintering temperature for the functional ceramic material in the functional ceramic layers 2 .
  • the preferred ceramic materials include alumina and zirconia, or other suitable material.
  • the functional ceramic layers 2 Materials included in the functional ceramic layers 2 , for example, glass, partially migrate into the support layers 3 during firing, and bond the ceramic materials included in the support layers 3 after the firing. In other words, the ceramic materials in the support layers 3 are bonded by glass that migrates from the functional ceramic layers.
  • the functional ceramic layers provide a sufficient amount of ceramic materials to the support layers 3 .
  • the thickness of the functional ceramic layers is preferably at least about two times and more preferably at least about three times the thickness of the support layers 3 .
  • the monolithic ceramic substrate 1 also includes first conductor patterns 4 and second conductor patterns 5 .
  • the first conductor patterns 4 and the second conductor patterns 5 are each in contact with a desired functional ceramic layer 2 .
  • the first conductor patterns 4 are defined by at least one of a conductive thin-film, a metal foil, and a metal wire, which are preferably made of copper, silver, or gold, or other suitable material.
  • the second conductor patterns 5 are preferably defined by a thick-film conductor formed of a conductive paste containing a powdered conductive component, such as powdered copper, silver, and gold, and an organic vehicle composed of an organic binder and a solvent, or other suitable materials.
  • a powdered conductive component such as powdered copper, silver, and gold
  • an organic vehicle composed of an organic binder and a solvent, or other suitable materials.
  • the area ratio of the first conductor pattern relative to the functional ceramic layer is preferably about 30% or less and more preferably about 20% or less.
  • the area ratio of the second conductor pattern relative to the functional ceramic layer is preferably at least about 50% and more preferably at least about 70%.
  • the first conductor pattern and the second conductor pattern are provided on different layers, although these patterns may be provided on the same layer.
  • a plurality of green functional ceramic sheets 6 including a functional ceramic material is provided.
  • the functional ceramic material in this preferred embodiment is an insulating BaO—Al 2 O 3 —SiO 2 ceramic powder that sinters at low temperatures.
  • the green functional ceramic sheets 6 are illustrated as one sheet.
  • one functional ceramic layer 2 includes a laminate of the plurality of green functional ceramic sheets 6 so as to have a required thickness.
  • an unshrinkable green ceramic sheet 7 for suppressing shrinkage is provided on the green functional ceramic sheet 6 to define a green ceramic sheet composite 8 .
  • the unshrinkable green ceramic sheet 7 includes a ceramic material that does not sinter at a sintering temperature of the functional ceramic material included in the functional ceramic layer 2 and functions as the support layer 3 for preventing the shrinkage of the functional ceramic layer 2 .
  • An exemplary ceramic material that does not sinter at the sintering temperature for the functional ceramic material is powdered alumina.
  • the unshrinkable green ceramic sheet 7 may include a plurality of green ceramic layers.
  • the green ceramic sheet composite 8 is defined by providing a green functional ceramic sheet 6 on an unshrinkable green ceramic sheet 7 .
  • a support layer for suppressing the shrinkage may be provided on a green functional ceramic sheet via a thick-film printing process, or a green functional ceramic sheet may be provided on a support layer for preventing shrinkage via a thick-film printing process.
  • a copper thin-film conductor 10 is provided on a substrate film 9 defined by polyester or other suitable substrate film by a plating process.
  • the thin-film conductor 10 is etched by a dry or wet etching process to form a first conductor pattern 4 for an inductor electrode or a signal line.
  • the substrate film 9 is overlaid on the green ceramic sheet composite 8 such that the unshrinkable green ceramic sheet 7 is in contact with the first conductor pattern 4 .
  • the substrate film 9 is removed to transfer the first conductor pattern 4 from the substrate film 9 to a main surface of the green ceramic sheet composite 8 .
  • a pattern of conductive paste including powdered copper and an organic vehicle is formed on the unshrinkable green ceramic sheet 7 of the green ceramic sheet composite 8 by printing and is dried to form a second conductor pattern 5 that functions as a ground electrode on the unshrinkable green ceramic sheet 7 of the green ceramic sheet composite 8 .
  • the second conductor pattern 5 may be formed on the other main surface, namely, on the green functional ceramic sheet 6 of the green ceramic sheet composite 8 .
  • a desired number of the green ceramic sheet composites 8 are stacked to define a green laminate.
  • unshrinkable green ceramic sheets 7 are each provided with the first or second conductor pattern 4 or 5 on the main surface thereof, as shown in FIGS. 2F and 2G .
  • the green laminate is fired at about 950° C. in an N 2 —H 2 O atmosphere to form the monolithic ceramic substrate 1 shown in FIG. 1 .
  • the atmosphere and sintering temperature is determined depending on the functional ceramic material and the conductor.
  • the green functional ceramic sheets 6 and the second conductor patterns 5 are sintered, whereas the green unshrinkable ceramic sheets 7 are not substantially sintered due to the fact that the ceramic material that does not sinter at the sintering temperature for the functional ceramic material in the green ceramic sheet composites 8 .
  • the unsintered ceramic sheets 7 prevent the shrinkage along the main plane of the green functional ceramic sheets 6 .
  • the first and second conductor patterns 4 and 5 also do not shrink during the firing process and thus are highly precise.
  • the thickness of the thin-film conductor exceeds about 100 ⁇ m voids and cracks occur during the lamination process; hence, the thickness is preferably in the range of about 5 to about 35 ⁇ m.
  • the volume resistivity of the metal conductor exceeds about 2.5 ⁇ cm, the conductive loss increases. If the surface roughness exceeds about 5 ⁇ m, the surface propagation loss of high-frequency waves increases.
  • the stacking order of the functional ceramic layers 2 and the support layers 3 can be appropriately changed. Two or more functional ceramic layers 2 may be stacked. In FIG. 1 , an additional support layer may be provided under the lowermost functional ceramic layer 2 of the monolithic ceramic substrate 1 .
  • the locations of the first conductor patterns 4 and the second conductor patterns 5 can also be changed appropriately.
  • the first conductor patterns 4 and the second conductor patterns 5 are disposed between the functional ceramic layers 2 and the support layers 3 .
  • a first conductor pattern 4 or second conductor pattern 5 may be disposed in the interface between these functional ceramic layers 2 .
  • a first conductor pattern 4 or second conductor pattern 5 may be arranged on one outer surface of the monolithic ceramic substrate 1 .
  • the first conductor pattern 4 is a thin-film conductor obtained by etching of a metal foil.
  • the first conductor pattern 4 may be formed by laser processing or mechanical punching of a metal foil.
  • the first conductor pattern 4 may be formed by bending a metal wire into a desired circuit pattern.
  • the first conductor pattern 4 may be a thin-film conductor formed by an additive plating process or vapor evaporation process.
  • a first or second conductor pattern may be formed on one main surface of each of green functional ceramic sheets, before these green functional ceramic sheets are stacked.
  • the first and second conductor patterns are provided, and then the green functional ceramic sheets and the support layers are stacked to form the green sheet composite.
  • each support layer may be arranged on both main surfaces, i.e., on the main surface provided with the first or second conductive pattern and on the other main surface not provided with the conductive pattern.
  • a plurality of the green sheet composites is stacked to form a green laminate.
  • two green ceramic sheets that function as the support layers are preferably provided only above the uppermost layer and below the lowermost layer such that these support layers are removed after sintering.

Abstract

A monolithic ceramic substrate includes a green laminate having a plurality of green functional ceramic layers including a functional ceramic material, green support layers including a ceramic material that does not sinter at a sintering temperature for the green functional ceramic material to prevent shrinkage of the functional ceramic layers, first conductor patterns including a thin-film conductor, and second conductor patterns including a thick-film conductor. The green laminate is fired at the sintering temperature for the green functional ceramic material.

Description

    BACKGROUND OF THE INVENTION
  • 1. Field of the Invention
  • The present invention relates to a monolithic ceramic substrate manufactured by a process that does not cause shrinkage of the monolithic ceramic substrate and a method for making the monolithic ceramic substrate that does not shrink along the principal plane during sintering.
  • 2. Description of the Related Art
  • As disclosed in Japanese Unexamined Patent Application Publication No. 7-86743, a monolithic ceramic substrate is manufactured by a process which does not cause shrinkage of the monolithic ceramic substrate. More specifically, a laminate including a plurality of ceramic layers made of glass ceramic that sinters at low temperatures is disposed between two inorganic constraining layers that do not sinter at a sintering temperature for the ceramic layers, this composite is sintered, and then the constraining layers are removed.
  • Conductor patterns are disposed at desired interfaces between the ceramic layers and the constraining layers and on outer surfaces of the laminate. These conductor patterns are formed by etching a metal foil that does not shrink at the sintering temperature for the ceramic layers.
  • This method, however, has the following problems. The thin-film conductor is a dense film. Thus, the thin-film conductor does not include interstices for releasing gas generated by decomposition of a binder component in the green ceramic sheets during sintering in a pattern having a large occupancy area, such as a ground electrode pattern. As a result, voids and residual carbon, which greatly reduce the reliability of the monolithic ceramic substrate, tend to remain in the vicinity of the thin-film conductors.
  • Since the thin-film conductor has low mechanical strength, the conductor must have an increased thickness. Thus, the thin-film conductor does not shrink during sintering, and as a result, the soft green ceramic sheets are compacted. The soft green ceramic sheets are dense at patterns having large occupancy areas but are not dense at patterns having small occupancy areas, for example, inductor electrodes and signal lines, resulting in a large difference in the density in the green ceramic sheet. As a result, the internal stress in a circuit board including many patterns having large occupancy areas is greatly increased, which causes deformation or cracking.
  • SUMMARY OF THE INVENTION
  • In order to overcome the above-described problems, preferred embodiments of the present invention provide a highly reliable monolithic ceramic substrate having a conductor pattern and a method for making the same.
  • According to a preferred embodiment of the present invention, a monolithic ceramic substrate includes a plurality of functional ceramic layers including a functional ceramic material, support layers including a ceramic material that does not sinter at a sintering temperature of the functional ceramic material, the support layers being in contact with the respective functional ceramic layers to suppress the shrinkage of the functional ceramic layers, first conductor patterns including at least one thin-film conductor selected from the group consisting of a metal foil, a metal wire, and a conductive thin-film, the first conductor patterns being in contact with the respective functional ceramic layers, and second conductor patterns including a thick-film conductor in contact with the respective functional ceramic layers.
  • Preferably, the support layers are each disposed between the two adjoining functional ceramic layers. In addition, the first conductor patterns and the second conductor patterns are preferably each disposed between one of the functional ceramic layers and one of the support layers.
  • The thin-film conductor defining the first conductor pattern preferably has a thickness of about 100 μm or less. It is also preferred that the thin-film conductor defining the first conductor pattern has a porosity of about 10% or less before sintering. The thin-film conductor defining the first conductor pattern preferably has a volume resistivity of about 2.5 Ω·cm or less and a surface roughness of about 5 μm or less. The area ratio of the thin-film conductor defining the first conductor pattern to the functional ceramic layer is preferably about 90% or less.
  • The second conductor patterns are preferably made of a conductive paste and have a thickness of about 30 μm or less after sintering of the functional ceramic layers.
  • It is also preferred that the first conductor patterns each define at least one of an inductor electrode and a signal line. In such a case, the area ratio of the thin-film conductor relative to the functional ceramic layer is preferably about 30% or less.
  • Preferably, the second conductor patterns each define a ground electrode. In such a case, the area of the second conductor pattern is preferably at least about 50% of the area of the functional ceramic layer.
  • According to another preferred embodiment of the present invention, a method for making a monolithic ceramic substrate includes the steps of preparing a green laminate having a plurality of green functional ceramic layers including a functional ceramic material, green support layers including a ceramic material that does not sinter at a sintering temperature for the green functional ceramic material, the green support layers being in contact with the respective green functional ceramic layers to prevent shrinkage of the functional ceramic layers, first conductor patterns including at least one thin-film conductor selected from the group consisting of a metal foil, a metal wire, and a conductive thin-film, the first conductor patterns being in contact with the respective green functional ceramic layers, and second conductor patterns including a thick-film conductor in contact with the respective green functional ceramic layers, and firing the green laminate at the sintering temperature of the green functional ceramic material.
  • Preferably, the green support layers are each disposed between the two adjoining green functional ceramic layers. It is also preferred that the first conductor patterns and the second conductor patterns are each disposed between one of the green functional ceramic layers and one of the support layers.
  • The thin-film conductor defining the first conductor pattern preferably has a thickness of about 100 μm or less. Preferably, the thin-film conductor defining the first conductor pattern has a porosity of about 10% or less before sintering. It is also preferred that the thin-film conductor defining the first conductor pattern has a volume resistivity of about 2.5 Ω-cm or less and a surface roughness of about 5 μm or less. Preferably, the area ratio of the thin-film conductor defining the first conductor pattern to the functional ceramic layer is about 90% or less. In addition, the second conductor patterns is preferably formed of a conductive paste and have a thickness of about 30 μm or less after sintering of the functional ceramic layers.
  • In the monolithic ceramic substrate and the method for making this substrate according to preferred embodiments of the present invention, different compositions are used for the first conductor patterns, such as inductors and signal lines, having small occupancy areas and the second conductive patterns, such as grounds and capacitors, having large occupancy areas. In a monolithic ceramic substrate including conductor patterns, the conductor patterns are highly precise due to the support layers which suppress shrinkage of the functional ceramic layers. Furthermore, the compositions for the first and second conductor patterns can be appropriately changed depending on the characteristics required for these conductor patterns. In particular, the monolithic ceramic substrate according to preferred embodiments of the present invention has excellent radiofrequency characteristics. Furthermore, in the monolithic ceramic substrate, the formation of voids and cracks in the ceramic layers and the conductor patterns is greatly reduced.
  • Other features, elements, characteristics and advantages of the present invention will become more apparent from the following detailed description of preferred embodiments thereof with reference to the attached drawings.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • FIG. 1 is a cross-sectional view of a preferred embodiment of a monolithic ceramic substrate according to the present invention.
  • FIGS. 2A to 2G are cross-sectional views illustrating steps for making the monolithic ceramic substrate shown in FIG. 1.
  • DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS
  • Preferred embodiments of the present invention will now be described with reference to the attached drawings.
  • Referring to FIG. 1, a monolithic ceramic substrate 1 includes a plurality of functional ceramic layers 2 including a functional ceramic material. The functional ceramic material has a specific electrical property, for example, dielectricity, insulation, or magnetism. Thus, the material is selected depending upon a property required for the monolithic ceramic substrate 1. These functional ceramic layers 2 may be composed of the same functional ceramic material or may be composed of different functional ceramic materials. Preferably, the functional ceramic material sinters at low temperatures to sinter with low-resistance metals such as copper and silver. Thus, the functional ceramic material preferably includes crystallized glass or a mixture of glass and ceramic, or other suitable material.
  • The monolithic ceramic substrate 1 includes support layers 3 that prevent shrinkage of the functional ceramic layers 2. Each support layer 3 is in contact with the corresponding functional ceramic layer 2. In FIG. 1, all the functional ceramic layers 2 are in contact with the respective support layers 3 so that each support layer 3 is disposed between two adjoining functional ceramic layers 2.
  • The support layers 3 include a ceramic material that does not sinter at a sintering temperature for the functional ceramic material in the functional ceramic layers 2. Examples of the preferred ceramic materials include alumina and zirconia, or other suitable material.
  • Materials included in the functional ceramic layers 2, for example, glass, partially migrate into the support layers 3 during firing, and bond the ceramic materials included in the support layers 3 after the firing. In other words, the ceramic materials in the support layers 3 are bonded by glass that migrates from the functional ceramic layers. Thus, the functional ceramic layers provide a sufficient amount of ceramic materials to the support layers 3. Thus, the thickness of the functional ceramic layers is preferably at least about two times and more preferably at least about three times the thickness of the support layers 3.
  • The monolithic ceramic substrate 1 also includes first conductor patterns 4 and second conductor patterns 5. The first conductor patterns 4 and the second conductor patterns 5 are each in contact with a desired functional ceramic layer 2.
  • For conductor patterns having small occupancy areas with respect to the functional ceramic layer, for example, inductor electrodes or signal lines, the first conductor patterns 4 are defined by at least one of a conductive thin-film, a metal foil, and a metal wire, which are preferably made of copper, silver, or gold, or other suitable material.
  • For conductor patterns having large occupancy areas such as ground electrodes, the second conductor patterns 5 are preferably defined by a thick-film conductor formed of a conductive paste containing a powdered conductive component, such as powdered copper, silver, and gold, and an organic vehicle composed of an organic binder and a solvent, or other suitable materials.
  • When the first conductor pattern defines an inductor electrode or a signal line, the area ratio of the first conductor pattern relative to the functional ceramic layer is preferably about 30% or less and more preferably about 20% or less. When the second conductor pattern defines a ground electrode, the area ratio of the second conductor pattern relative to the functional ceramic layer is preferably at least about 50% and more preferably at least about 70%. Preferably, the first conductor pattern and the second conductor pattern are provided on different layers, although these patterns may be provided on the same layer.
  • A method for making the monolithic ceramic substrate 1 and the results of an evaluation of the monolithic ceramic substrate produced by the method will now be described.
  • Referring to FIG. 2A, a plurality of green functional ceramic sheets 6 including a functional ceramic material is provided. The functional ceramic material in this preferred embodiment is an insulating BaO—Al2O3—SiO2 ceramic powder that sinters at low temperatures. In FIG. 2A, the green functional ceramic sheets 6 are illustrated as one sheet. In general, one functional ceramic layer 2 includes a laminate of the plurality of green functional ceramic sheets 6 so as to have a required thickness.
  • Referring to FIG. 2B, an unshrinkable green ceramic sheet 7 for suppressing shrinkage is provided on the green functional ceramic sheet 6 to define a green ceramic sheet composite 8. The unshrinkable green ceramic sheet 7 includes a ceramic material that does not sinter at a sintering temperature of the functional ceramic material included in the functional ceramic layer 2 and functions as the support layer 3 for preventing the shrinkage of the functional ceramic layer 2. An exemplary ceramic material that does not sinter at the sintering temperature for the functional ceramic material is powdered alumina.
  • The unshrinkable green ceramic sheet 7 may include a plurality of green ceramic layers. The green ceramic sheet composite 8 is defined by providing a green functional ceramic sheet 6 on an unshrinkable green ceramic sheet 7. Alternatively, in order to prepare a green ceramic sheet, a support layer for suppressing the shrinkage may be provided on a green functional ceramic sheet via a thick-film printing process, or a green functional ceramic sheet may be provided on a support layer for preventing shrinkage via a thick-film printing process.
  • Referring to FIG. 2C, a copper thin-film conductor 10 is provided on a substrate film 9 defined by polyester or other suitable substrate film by a plating process.
  • Referring to FIG. 2D, the thin-film conductor 10 is etched by a dry or wet etching process to form a first conductor pattern 4 for an inductor electrode or a signal line.
  • Referring to FIG. 2E, the substrate film 9 is overlaid on the green ceramic sheet composite 8 such that the unshrinkable green ceramic sheet 7 is in contact with the first conductor pattern 4. Referring to FIG. 2F, the substrate film 9 is removed to transfer the first conductor pattern 4 from the substrate film 9 to a main surface of the green ceramic sheet composite 8.
  • Referring to FIG. 2G, a pattern of conductive paste including powdered copper and an organic vehicle is formed on the unshrinkable green ceramic sheet 7 of the green ceramic sheet composite 8 by printing and is dried to form a second conductor pattern 5 that functions as a ground electrode on the unshrinkable green ceramic sheet 7 of the green ceramic sheet composite 8. The second conductor pattern 5 may be formed on the other main surface, namely, on the green functional ceramic sheet 6 of the green ceramic sheet composite 8.
  • A desired number of the green ceramic sheet composites 8 are stacked to define a green laminate. In the green laminate, unshrinkable green ceramic sheets 7 are each provided with the first or second conductor pattern 4 or 5 on the main surface thereof, as shown in FIGS. 2F and 2G.
  • The green laminate is fired at about 950° C. in an N2—H2O atmosphere to form the monolithic ceramic substrate 1 shown in FIG. 1. The atmosphere and sintering temperature is determined depending on the functional ceramic material and the conductor.
  • In this firing step, the green functional ceramic sheets 6 and the second conductor patterns 5 are sintered, whereas the green unshrinkable ceramic sheets 7 are not substantially sintered due to the fact that the ceramic material that does not sinter at the sintering temperature for the functional ceramic material in the green ceramic sheet composites 8. The unsintered ceramic sheets 7 prevent the shrinkage along the main plane of the green functional ceramic sheets 6. The first and second conductor patterns 4 and 5 also do not shrink during the firing process and thus are highly precise.
  • Monolithic ceramic substrates were prepared according to the above method and properties thereof were measured. Table 1 shows the results.
    Porosity of Cracking of Area Ratio of Thickness of Sintered Delamination
    Thin-Film Thin-Film Thin-Film Cracking of Thick-Film Conductor of Thick-Film
    Sample Conductor (%) Conductor Conductor (%) Substrate (μm) Conductor
    1 20 Observed 50 Not observed 15 Not observed
    2 15 Observed 50 Not observed 15 Not observed
    3 10 Not observed 50 Not observed 15 Not observed
    4 2 Not observed 50 Not observed 15 Not observed
    5 5 Not observed 75 Not observed 15 Not observed
    6 5 Not observed 90 Not observed 15 Not observed
    7 5 Not observed 95 Observed 15 Not observed
    8 5 Not observed 95 Observed 15 Not observed
    9 5 Not observed 70 Not observed 0.3 Observed
    10 3 Not observed 70 Not observed 0.5 Not observed
    11 3 Not observed 70 Not observed 15 Not observed
    12 1 Not observed 70 Not observed 30 Not observed
    13 5 Not observed 70 Not observed 35 Observed
  • Table 1 leads to the following conclusions:
    • (1) When the porosity of the first conductor pattern, i.e. thin-film conductor exceeds about 10%, cracking occurs in the fired thin-film conductor.
    • (2) When the area ratio of the thin-film conductor to the functional ceramic layer along the plane exceeds about 90%, cracking occurs in the fired monolithic ceramic substrate.
    • (3) When the thickness of the conductive paste for forming the second conductor pattern, i.e., the thick-film conductor exceeds about 30 μm, delamination of the thick-film conductor occurs due to a difference in density in the green laminate. The thickness of the thick-film conductor is preferably in the range of about 0.5 μm to about 20 μm.
  • In Samples 3 to 6 and 10 to 12, no cracking was observed in the thin-film conductor and the substrate and no delamination of the thick-film conductor was observed.
  • When the thickness of the thin-film conductor exceeds about 100 μm voids and cracks occur during the lamination process; hence, the thickness is preferably in the range of about 5 to about 35 μm.
  • If the volume resistivity of the metal conductor exceeds about 2.5 Ω·cm, the conductive loss increases. If the surface roughness exceeds about 5 μm, the surface propagation loss of high-frequency waves increases.
  • In addition to the preferred embodiments described above, variations may be made without departing from the spirit and the scope of the present invention.
  • For example, in the monolithic ceramic substrate 1 shown in FIG. 1, the stacking order of the functional ceramic layers 2 and the support layers 3 can be appropriately changed. Two or more functional ceramic layers 2 may be stacked. In FIG. 1, an additional support layer may be provided under the lowermost functional ceramic layer 2 of the monolithic ceramic substrate 1.
  • When the stacking order of the functional ceramic layers 2 and the support layers 3 is changed, the locations of the first conductor patterns 4 and the second conductor patterns 5 can also be changed appropriately. In FIG. 1, the first conductor patterns 4 and the second conductor patterns 5 are disposed between the functional ceramic layers 2 and the support layers 3. When at least two functional ceramic layers 2 are provided, a first conductor pattern 4 or second conductor pattern 5 may be disposed in the interface between these functional ceramic layers 2. Alternatively, a first conductor pattern 4 or second conductor pattern 5 may be arranged on one outer surface of the monolithic ceramic substrate 1.
  • In the preferred embodiments described above, the first conductor pattern 4 is a thin-film conductor obtained by etching of a metal foil. Alternatively, the first conductor pattern 4 may be formed by laser processing or mechanical punching of a metal foil. Alternatively, the first conductor pattern 4 may be formed by bending a metal wire into a desired circuit pattern. Alternatively, the first conductor pattern 4 may be a thin-film conductor formed by an additive plating process or vapor evaporation process.
  • When manufacturing the monolithic ceramic substrate, a first or second conductor pattern may be formed on one main surface of each of green functional ceramic sheets, before these green functional ceramic sheets are stacked. In such a case, the first and second conductor patterns are provided, and then the green functional ceramic sheets and the support layers are stacked to form the green sheet composite. In this process, each support layer may be arranged on both main surfaces, i.e., on the main surface provided with the first or second conductive pattern and on the other main surface not provided with the conductive pattern. In this modification, a plurality of the green sheet composites is stacked to form a green laminate.
  • In the green laminate, two green ceramic sheets that function as the support layers are preferably provided only above the uppermost layer and below the lowermost layer such that these support layers are removed after sintering.
  • While preferred embodiments of the invention have been described above, it is to be understood that variations and modifications will be apparent to those skilled in the art without departing the scope and spirit of the invention. The scope of the invention, therefore, is to be determined solely by the following claims.

Claims (9)

1-12. (canceled)
13. A method for making a monolithic ceramic substrate comprising the steps of:
preparing a green laminate including a plurality of green functional ceramic layers that include a functional ceramic material, at least one green support layer including a ceramic material that does not sinter at a sintering temperature for the green functional ceramic material, the at least one green support layer being in contact with at least one of the plurality of green functional ceramic layers to prevent shrinkage of the plurality of functional ceramic layers, a first conductor pattern including at least one thin-film conductor selected from the group consisting of a metal foil, a metal wire, and a conductive thin-film, the first conductor pattern being in contact with at least one of the plurality of green functional ceramic layers, and a second conductor pattern including a thick-film conductor in contact with at least one of the plurality of green functional ceramic layers; and
firing the green laminate at the sintering temperature for the green functional ceramic material.
14. The method for making a monolithic ceramic substrate according to claim 13, wherein the green support layer is formed between two adjacent green functional ceramic layers.
15. The method for making a monolithic ceramic substrate according to claim 13, wherein the first conductor pattern and the second conductor pattern are each formed between one of the plurality of green functional ceramic layers and the at least one support layer.
16. The method for making a monolithic ceramic substrate according to claim 13, wherein the thin-film conductor of the first conductor pattern has a thickness of about 100 μm or less.
17. The method for making a monolithic ceramic substrate according to claim 13, wherein the thin-film conductor of the first conductor pattern has a porosity of about 10% or less before sintering of the plurality of functional ceramic layers.
18. The method for making a monolithic ceramic substrate according to claim 13, wherein the thin-film conductor of the first conductor pattern has a volume resistivity of about 2.5 Ω·cm or less and a surface roughness of about 5 μm or less.
19. The method for making a monolithic ceramic substrate according to claim 13, wherein the area ratio of the thin-film conductor of the first conductor pattern to the plurality of functional ceramic layers is about 90% or less.
20. The method for making a monolithic ceramic substrate according to claim 13, wherein the second conductor pattern is made of a conductive paste and has a thickness of about 30 μm or less after sintering of the plurality of functional ceramic layers.
US11/050,519 2001-04-04 2005-02-03 Monolithic ceramic substrate and method for making the same Abandoned US20050126682A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US11/050,519 US20050126682A1 (en) 2001-04-04 2005-02-03 Monolithic ceramic substrate and method for making the same

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2001-106253 2001-04-04
JP2001106253 2001-04-04
JP2002002577A JP2002368422A (en) 2001-04-04 2002-01-09 Multilayer ceramic board and its manufacturing method
JP2002-002577 2002-01-09
US10/116,646 US6891109B2 (en) 2001-04-04 2002-04-04 Monolithic ceramic substrate and method for making the same
US11/050,519 US20050126682A1 (en) 2001-04-04 2005-02-03 Monolithic ceramic substrate and method for making the same

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US10/116,646 Division US6891109B2 (en) 2001-04-04 2002-04-04 Monolithic ceramic substrate and method for making the same

Publications (1)

Publication Number Publication Date
US20050126682A1 true US20050126682A1 (en) 2005-06-16

Family

ID=26613086

Family Applications (2)

Application Number Title Priority Date Filing Date
US10/116,646 Expired - Lifetime US6891109B2 (en) 2001-04-04 2002-04-04 Monolithic ceramic substrate and method for making the same
US11/050,519 Abandoned US20050126682A1 (en) 2001-04-04 2005-02-03 Monolithic ceramic substrate and method for making the same

Family Applications Before (1)

Application Number Title Priority Date Filing Date
US10/116,646 Expired - Lifetime US6891109B2 (en) 2001-04-04 2002-04-04 Monolithic ceramic substrate and method for making the same

Country Status (2)

Country Link
US (2) US6891109B2 (en)
JP (1) JP2002368422A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10383220B2 (en) * 2016-03-25 2019-08-13 Hitachi Metals, Ltd. Ceramic substrate and method for production thereof

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3656484B2 (en) * 1999-03-03 2005-06-08 株式会社村田製作所 Manufacturing method of ceramic multilayer substrate
JP3633435B2 (en) * 2000-04-10 2005-03-30 株式会社村田製作所 Multilayer ceramic substrate, manufacturing method and designing method thereof, and electronic device
JP2002368422A (en) * 2001-04-04 2002-12-20 Murata Mfg Co Ltd Multilayer ceramic board and its manufacturing method
CA2452156A1 (en) * 2002-03-14 2003-09-18 Matsushita Electric Industrial Co., Ltd. Method for manufacturing polymer electrolyte type fuel cell
JP2004186665A (en) * 2002-10-09 2004-07-02 Murata Mfg Co Ltd Multilayer structured component and its manufacturing method
JP2005268692A (en) * 2004-03-22 2005-09-29 Mitsubishi Electric Corp Method for manufacturing multilayer substrate
US20060162844A1 (en) * 2005-01-26 2006-07-27 Needes Christopher R Multi-component LTCC substrate with a core of high dielectric constant ceramic material and processes for the development thereof
CN101371352B (en) * 2006-02-14 2010-11-10 株式会社村田制作所 Multilayer ceramic electronic component, multilayer ceramic substrate, and method for manufacturing multilayer ceramic electronic component
JP2009064909A (en) * 2007-09-05 2009-03-26 Alps Electric Co Ltd Multilayer ceramic wiring board, and method of manufacturing the same
WO2009092583A1 (en) * 2008-01-23 2009-07-30 Epcos Ag Piezoelectric multilayer component
WO2009092584A1 (en) * 2008-01-23 2009-07-30 Epcos Ag Piezoelectric multilayer component
EP2245679B1 (en) * 2008-01-23 2015-07-29 Epcos AG Piezoelectric multilayer component
JP5648682B2 (en) * 2010-03-30 2015-01-07 株式会社村田製作所 Metal base substrate
US8552311B2 (en) 2010-07-15 2013-10-08 Advanced Bionics Electrical feedthrough assembly
US8386047B2 (en) 2010-07-15 2013-02-26 Advanced Bionics Implantable hermetic feedthrough
CN115610041A (en) * 2013-08-29 2023-01-17 阿尔发装配解决方案有限公司 Composite and multilayer silver films for connecting electrical and mechanical components
CN108763608B (en) * 2018-03-23 2022-05-13 江苏理工学院 Method for evaluating reliability of composite material laminated plate based on occurrence function method

Citations (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4783358A (en) * 1986-02-14 1988-11-08 Nec Corporation Ceramic wiring substrate
US4871608A (en) * 1986-12-10 1989-10-03 Ngk Spark Plug Co., Ltd. High-density wiring multilayered substrate
US5085720A (en) * 1990-01-18 1992-02-04 E. I. Du Pont De Nemours And Company Method for reducing shrinkage during firing of green ceramic bodies
US5102720A (en) * 1989-09-22 1992-04-07 Cornell Research Foundation, Inc. Co-fired multilayer ceramic tapes that exhibit constrained sintering
US5281151A (en) * 1991-07-05 1994-01-25 Hitachi, Ltd. Semiconductor chip carrier, module having same chip carrier mounted therein, and electronic device incorporating same module
US5300163A (en) * 1989-10-05 1994-04-05 Asahi Glass Company Ltd. Process for fabricating a multilayer ceramic circuit board
US5324370A (en) * 1992-02-27 1994-06-28 Fujitsu Limited Method of manufacturing a multi-layered ceramic circuit board containing layers of reduced dielectric constant
US5382757A (en) * 1990-10-17 1995-01-17 Nec Corporation Multilayer printed wiring board and process for manufacturing the same
US5474741A (en) * 1990-10-04 1995-12-12 E. I. Du Pont De Nemours And Company Method for reducing shrinkage during firing of ceramic bodies
US5500280A (en) * 1994-08-12 1996-03-19 Shin-Etsu Polymer Co., Ltd. Elastomer-based connector sheet
US5601672A (en) * 1994-11-01 1997-02-11 International Business Machines Corporation Method for making ceramic substrates from thin and thick ceramic greensheets
US5676781A (en) * 1992-07-22 1997-10-14 Fujitsu Limited Method of producing a multi-layered ceramic circuit board
US5858145A (en) * 1996-10-15 1999-01-12 Sarnoff Corporation Method to control cavity dimensions of fired multilayer circuit boards on a support
US6139666A (en) * 1999-05-26 2000-10-31 International Business Machines Corporation Method for producing ceramic surfaces with easily removable contact sheets
US6241838B1 (en) * 1997-09-08 2001-06-05 Murata Manufacturing Co., Ltd. Method of producing a multi-layer ceramic substrate
US6306511B1 (en) * 1999-07-27 2001-10-23 Murata Manufacturing Co., Ltd. Hybrid laminate and manufacturing method therefor
US6337123B1 (en) * 1999-10-21 2002-01-08 Murata Manufacturing Co., Ltd. Multilayered ceramic substrate and method of producing the same
US6392164B1 (en) * 1998-10-16 2002-05-21 Matsushita Electric Industrial Co., Ltd. Multi-level circuit substrate, method for manufacturing same and method for adjusting a characteristic impedance therefor
US6432239B1 (en) * 1999-03-03 2002-08-13 Murata Manufacturing Co., Ltd. Method of producing ceramic multilayer substrate
US6468640B2 (en) * 2000-04-10 2002-10-22 Murata Manufacturing Co., Ltd. Monolithic ceramic substrate, manufacturing and designing methods therefor, and electronic device
US6517924B1 (en) * 1998-04-28 2003-02-11 Murata Manufacturing Co. Ltd Laminated body and method for producing the same
US6579392B1 (en) * 1999-10-28 2003-06-17 Murata Manufacturing Co. Ltd Composite laminate and method for manufacturing the same
US6743534B2 (en) * 2001-10-01 2004-06-01 Heraeus Incorporated Self-constrained low temperature glass-ceramic unfired tape for microelectronics and methods for making and using the same
US6891109B2 (en) * 2001-04-04 2005-05-10 Murata Manufacturing Co., Ltd. Monolithic ceramic substrate and method for making the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3351043B2 (en) 1993-09-10 2002-11-25 松下電器産業株式会社 Method for manufacturing multilayer ceramic substrate
JPH08204314A (en) 1995-01-20 1996-08-09 Sumitomo Metal Mining Co Ltd Glass ceramic substrate

Patent Citations (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4783358A (en) * 1986-02-14 1988-11-08 Nec Corporation Ceramic wiring substrate
US4871608A (en) * 1986-12-10 1989-10-03 Ngk Spark Plug Co., Ltd. High-density wiring multilayered substrate
US5102720A (en) * 1989-09-22 1992-04-07 Cornell Research Foundation, Inc. Co-fired multilayer ceramic tapes that exhibit constrained sintering
US5300163A (en) * 1989-10-05 1994-04-05 Asahi Glass Company Ltd. Process for fabricating a multilayer ceramic circuit board
US5085720A (en) * 1990-01-18 1992-02-04 E. I. Du Pont De Nemours And Company Method for reducing shrinkage during firing of green ceramic bodies
US5474741A (en) * 1990-10-04 1995-12-12 E. I. Du Pont De Nemours And Company Method for reducing shrinkage during firing of ceramic bodies
US5382757A (en) * 1990-10-17 1995-01-17 Nec Corporation Multilayer printed wiring board and process for manufacturing the same
US5281151A (en) * 1991-07-05 1994-01-25 Hitachi, Ltd. Semiconductor chip carrier, module having same chip carrier mounted therein, and electronic device incorporating same module
US5324370A (en) * 1992-02-27 1994-06-28 Fujitsu Limited Method of manufacturing a multi-layered ceramic circuit board containing layers of reduced dielectric constant
US5676781A (en) * 1992-07-22 1997-10-14 Fujitsu Limited Method of producing a multi-layered ceramic circuit board
US5500280A (en) * 1994-08-12 1996-03-19 Shin-Etsu Polymer Co., Ltd. Elastomer-based connector sheet
US5601672A (en) * 1994-11-01 1997-02-11 International Business Machines Corporation Method for making ceramic substrates from thin and thick ceramic greensheets
US5858145A (en) * 1996-10-15 1999-01-12 Sarnoff Corporation Method to control cavity dimensions of fired multilayer circuit boards on a support
US6241838B1 (en) * 1997-09-08 2001-06-05 Murata Manufacturing Co., Ltd. Method of producing a multi-layer ceramic substrate
US6517924B1 (en) * 1998-04-28 2003-02-11 Murata Manufacturing Co. Ltd Laminated body and method for producing the same
US6392164B1 (en) * 1998-10-16 2002-05-21 Matsushita Electric Industrial Co., Ltd. Multi-level circuit substrate, method for manufacturing same and method for adjusting a characteristic impedance therefor
US6432239B1 (en) * 1999-03-03 2002-08-13 Murata Manufacturing Co., Ltd. Method of producing ceramic multilayer substrate
US6139666A (en) * 1999-05-26 2000-10-31 International Business Machines Corporation Method for producing ceramic surfaces with easily removable contact sheets
US6306511B1 (en) * 1999-07-27 2001-10-23 Murata Manufacturing Co., Ltd. Hybrid laminate and manufacturing method therefor
US6337123B1 (en) * 1999-10-21 2002-01-08 Murata Manufacturing Co., Ltd. Multilayered ceramic substrate and method of producing the same
US6579392B1 (en) * 1999-10-28 2003-06-17 Murata Manufacturing Co. Ltd Composite laminate and method for manufacturing the same
US6468640B2 (en) * 2000-04-10 2002-10-22 Murata Manufacturing Co., Ltd. Monolithic ceramic substrate, manufacturing and designing methods therefor, and electronic device
US6891109B2 (en) * 2001-04-04 2005-05-10 Murata Manufacturing Co., Ltd. Monolithic ceramic substrate and method for making the same
US6743534B2 (en) * 2001-10-01 2004-06-01 Heraeus Incorporated Self-constrained low temperature glass-ceramic unfired tape for microelectronics and methods for making and using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10383220B2 (en) * 2016-03-25 2019-08-13 Hitachi Metals, Ltd. Ceramic substrate and method for production thereof

Also Published As

Publication number Publication date
JP2002368422A (en) 2002-12-20
US20020166694A1 (en) 2002-11-14
US6891109B2 (en) 2005-05-10

Similar Documents

Publication Publication Date Title
US20050126682A1 (en) Monolithic ceramic substrate and method for making the same
KR100352780B1 (en) Multi-layer ceramic substrate and method for producing the same
US6337123B1 (en) Multilayered ceramic substrate and method of producing the same
KR100356678B1 (en) Method of producing a multi-layer ceramic substrate
KR100383378B1 (en) Monolithic ceramic substrate, manufacturing and designing methods therefor, and electronic device
US5814366A (en) Method of manufacturing multilayered ceramic substrate
JP3716832B2 (en) Method for producing ceramic multilayer substrate and unfired composite laminate
JP2001060767A (en) Method for manufacturing ceramic board and unfired ceramic board
JP3593964B2 (en) Multilayer ceramic substrate and method of manufacturing the same
WO2003072325A1 (en) Ceramic multilayer substrate manufacturing method and unfired composite multilayer body
JPH10135073A (en) Composite ceramic electronic part and its manufacture
JP3467873B2 (en) Method for manufacturing multilayer ceramic substrate
JPH10308584A (en) Ceramic multilayered board and its manufacture
JP2955442B2 (en) Manufacturing method of ceramic circuit board
JP3327214B2 (en) Method for manufacturing multilayer ceramic substrate
JP3669404B2 (en) Manufacturing method of multilayer ceramic substrate
JPH11354924A (en) Manufacture of multilayer ceramic substrate
JPH11330705A (en) Substrate containing capacitor and manufacture thereof
JPH0521635A (en) Multilayered substrate
JP3162539B2 (en) Method of manufacturing ceramic wiring board having conductor formed by conductor paste
JP2004095767A (en) Ceramic multilayer substrate and its manufacturing method
JP4387150B2 (en) Multilayer ceramic electronic component and manufacturing method thereof
JP4084696B2 (en) Low temperature fired multilayer ceramic wiring board manufacturing method
KR100724228B1 (en) Multi-layer ceramic substrate and method for manufacture thereof
JPH0795630B2 (en) Composite monolithic ceramic parts

Legal Events

Date Code Title Description
AS Assignment

Owner name: MURATA MANUFACTURING CO., LTD., JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:NISHIDE, MITSUYOSHI;NAKAMURA, RYOJI;SAKAI, NORIO;REEL/FRAME:016705/0947;SIGNING DATES FROM 20020408 TO 20020409

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION