US20050161599A1 - Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object - Google Patents
Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object Download PDFInfo
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- US20050161599A1 US20050161599A1 US11/045,748 US4574805A US2005161599A1 US 20050161599 A1 US20050161599 A1 US 20050161599A1 US 4574805 A US4574805 A US 4574805A US 2005161599 A1 US2005161599 A1 US 2005161599A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20214—Rotation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20221—Translation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/304—Controlling tubes
- H01J2237/30455—Correction during exposure
- H01J2237/30461—Correction during exposure pre-calculated
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3156—Curing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/316—Changing physical properties
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3165—Changing chemical properties
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Abstract
Disclosed are an electron beam irradiation apparatus and an electron beam irradiation method that are capable of easily curing a material that is hard to be cured by irradiation of ultraviolet rays and of reducing the number of electron beam irradiation tubes. The electron beam irradiation apparatus has a motor for rotationally driving an irradiation target object, a shield container for rotatably accommodating the irradiation target object, and an electron beam irradiation unit provided in the shield container so that the surface of the irradiation target object is irradiated with electron beams, wherein the electron beam irradiation unit and the irradiation target object are relatively moved when the electron beam irradiation unit irradiates the surface of the irradiation target object with the electron beams during a rotation of the irradiation target object.
Description
- The present application claims priority under 35 U.S.C. §119 to Japanese Patent Application No. 2004-019681 filed on Jan. 28, 2004. The content of the application is incorporated herein by reference in its entirety.
- 1. Field of the Invention
- The present invention relates to an electron beam irradiation apparatus and electron beam irradiation method for irradiating electron beams and to an apparatus for and a method of manufacturing a disc-shaped object.
- 2. Description of the Prior Art
- Optical discs such as a CD (Compact Disc), a DVD (Digital versatile Disc), and the like have hitherto been utilized as optical information recording mediums. Over the recent years, however, there has been a progress of developing a blue semiconductor laser of which an oscillation wavelength is on the order of 400 nm. The development of a next generation high-density optical disc such as a high-density DVD, and the like capable of recording with a higher density than the general DVD, is conducted by use of this type of blue semiconductor laser.
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FIG. 13 shows an example of a prior art layer structure of this type of next generation high-density optical disc. - This high-density optical disc is structured such that a
recording layer 91 for recording information, a light transmittinglayer 92 that transmits laser beams for recording and reproducing so that the laser beams get incident on therecording layer 91 and aprotection layer 93 taking contact with a member on the side of an optical pickup into consideration, are stacked in this sequence on asubstrate 90 composed of a resin material such as polycarbonate. The light transmittinglayer 92 and theprotection layer 93 are, when formed, irradiated with ultraviolet rays after being coated for curing. When especially the protection layer, etc. is formed of a material such as silicon compound, fluorine compound, etc. that exhibit radial polymerization double-bond, however, there might be a case in which a characteristic as the protection layer, etc. deteriorates unless a reaction initiator is added thereto in such a case, and the protection layer is hard to be cured by the irradiation of the ultraviolet rays, with the result that the protection layer having a sufficient quality can not be formed (refer to Japanese Patent Laid-Open Application Publication No.4-019839, Japanese Patent Laid-Open Application Publication No.11-162015, Japanese Patent Laid-Open Application Publication No.7-292470, Japanese Patent Laid-Open Application Publication No.2000-64042). - For solving the problems inherent in the prior arts given above, the present inventors cooperating with other inventors proposed an electron beam irradiation apparatus and an electron beam irradiation method in Japanese Patent Application No.2002-274120, which are capable of efficiently irradiating electron beams, of which an acceleration voltage is on the order of 20 kV through 100 kV while rotating a disc substrate, exhibiting consequently greater energy than the ultraviolet rays have, and of easily curing the protection layer, etc. such as a lubricating layer, etc. that is hard to be cured by the irradiation of the ultraviolet rays. In this case, a plurality of electron beam irradiation tubes are disposed for irradiating uniformly the whole disc substrate with the electron beams.
- If the electron beam irradiation apparatus involves using the plurality of electron beam irradiation tubes, the apparatus increases both in weight and in size, an equipment cost rises because of the electron beam irradiation tube being comparatively expensive, and a running cost increases with a rise in amounts of consumption of an N2 gas for cooling and of electric power. A manufacturing cost increases due to these factors.
- It is an object of the present invention to provide an electron beam irradiation apparatus and an electron beam irradiation method that are capable of easily curing a material that is hard to be cured by irradiation of ultraviolet rays and of reducing the number of electron beam irradiation tubes to be used.
- It is another object of the present invention to provide an apparatus for and a method of manufacturing a disc-shaped object that are capable of forming a layer having functionability on the disc-shaped object efficiently and at a low cost by use of a material that is hard to be cured by the irradiation of the ultraviolet rays.
- An electron beam irradiation apparatus according to an embodiment comprises a rotary driving unit for rotationally driving an irradiation target object, a shield container for rotatably accommodating the irradiation target object, and an electron beam irradiation unit provided in the shield container so that the surface of the irradiation target object is irradiated with electron beams, wherein the electron beam irradiation unit and the irradiation target object are relatively moved when the electron beam irradiation unit irradiates the surface of the irradiation target object with the electron beams during a rotation of the irradiation target object. Herein, the relative movement described above does not imply a rotation of the irradiation target object.
- According to this electron beam irradiation apparatus, the surface of the non-rotating irradiation target object is irradiated with the electron beams, and it is therefore possible to efficiently irradiate the surface of the irradiation target object with the electron beams having greater energy than ultraviolet rays have. Hence, for example, it is feasible to cure a layer having functionability and using a material that is hard to be cured by the irradiation of the ultraviolet rays, and the electron beam irradiation unit can be constructed of, for instance, fewer electron beam irradiation tubes because of making the relative movements of the electron beam irradiation unit and the irradiation target object when performing such irradiation of the electron beams, thus enabling the number of electron beam irradiation tubes to be reduced. Herein, the term “functionability” implies lubricity, anti-static property, anti-fouling property, hardness, abrasion resistance, and so on. The following discussion will be made by exemplifying the lubricity.
- The electron beam irradiation apparatus can be constructed so that a width of the electron beam irradiation unit in a direction orthogonal to a rotating direction of the irradiation target object within a rotating plane of the irradiation target object, is smaller than a maximum distance from the center of rotation within the rotating plane of the irradiation target object. Namely, when the irradiation target surface of the irradiation target object takes a disc-like shape, even if the width of the electron beam irradiation unit in the direction orthogonal to the rotating direction of the irradiation target object within the rotating plane of the irradiation target object, is smaller than a radius of the irradiation target object, substantially the entire surface of the irradiation target object can be irradiated with the electron beams owing to the relative movements described above. Further, when the irradiation target surface of the irradiation target object takes a non-disc-like shape such as a polygonal shape, etc., even if the width of the electron beam irradiation unit in the aforementioned direction is smaller than a maximum distance (which is a maximum radius of a circle defined by a rotation within the rotating plane) from the center of the rotation within the rotating plane of the irradiation target object, substantially the entire surface of the irradiation target object can be irradiated with the electron beams owing to the aforementioned relative movements.
- Moreover, the electron beam irradiation apparatus can be constructed so that a rotating speed of the irradiation target object is changed corresponding to a position of the irradiation by the electron beam irradiation unit over the irradiation target object. In this case, the rotating speed of the irradiation target object is decreased when the electron beam irradiation unit irradiates an outer periphery side of the irradiation target object with the electron beams and is increased when irradiating an inner periphery side with the electron beams, whereby an electron beam absorbed dose of the irradiation target object can be set fixed irrespective of the position of the irradiation target object. Note that in this case, the electron beam irradiation apparatus can be constructed so as to move the irradiation target object with respect to the electron beam irradiation unit and may also be constructed so as to move the electron beam irradiation unit with respect to the irradiation target object. Furthermore, both of the electron beam irradiation unit and the irradiation target object may be moved relatively.
- Further, the electron beam irradiation apparatus can be constructed so that a moving velocity of the electron beam irradiation unit is changed corresponding to the position of the irradiation by the electron beam irradiation unit over the irradiation target object. For example, in the case of moving the electron beam irradiation unit with respect to the irradiation target object, the moving velocity of the electron beam irradiation unit is decreased when the electron beam irradiation unit irradiates the outer periphery side of the irradiation target object with the electron beams and is increased when irradiating the inner periphery side with the electron beams, whereby the electron beam absorbed dose of the irradiation target object can be set fixed irrespective of the position of the irradiation target object.
- The electron beam irradiation unit can be constructed of an irradiation window of a single electron beam irradiation tube. Note that the irradiation target object preferably takes the disc-like shape and is irradiated with the electron beams in a way that moves an irradiation target area on the irradiation target object sequentially in the radial direction of the irradiation target object through the relative movements of the electron beam irradiation unit and the irradiation target object, whereby an irradiation required area on the irradiation target object can be irradiated with the electron beams.
- An electron beam irradiation method according to the present embodiment comprises the steps of rotationally driving an irradiation target object accommodated in a shield container that can be said air-tight, and making relative movements of the electron beam irradiation unit and the irradiation target object when the electron beam irradiation unit irradiates the surface of the on-rotating irradiation target object with the electron beams.
- According to this electron beam irradiation method, the surface of the on-rotating irradiation target object is irradiated with the electron beams, and therefore the surface of the irradiation target object can be efficiently irradiated with the electron beams having the greater energy than the ultraviolet rays have. Hence, for example, it is feasible to easily cure a lubricating layer exhibiting, etc. made of a material that is hard to be cured by the irradiation of the ultraviolet rays, and at the same time the electron beam irradiation unit can be constructed of a less number of electron beam irradiation tubes because of making the relative movements of the electron beam irradiation unit and the irradiation target object when performing such irradiation of the electron beams, thus enabling the number of electron beam irradiation tubes to be reduced.
- In the electron beam irradiation method, it is preferable that a rotating speed of the irradiation target object is changed corresponding to a position of the irradiation by the electron beam irradiation unit over the irradiation target object. In this case, the rotating speed of the irradiation target object is decreased when the electron beam irradiation unit irradiates an outer periphery side of the irradiation target object with the electron beams and is increased when irradiating an inner periphery side with the electron beams, whereby an electron beam absorbed dose of the irradiation target object can be set fixed irrespective of the position of the irradiation target object.
- Moreover, it is preferable that a moving velocity of the electron beam irradiation unit is changed corresponding to the position of the irradiation by the electron beam irradiation unit over the irradiation target object. In this case, the moving velocity of the electron beam irradiation unit is decreased when the electron beam irradiation unit irradiates the outer periphery side of the irradiation target object with the electron beams and is increased when irradiating the inner periphery side with the electron beams, whereby the electron beam absorbed dose of the irradiation target object can be set fixed irrespective of the position of the irradiation target object.
- An apparatus for manufacturing a disc-shaped object according to the present embodiment comprises the aforementioned electron beam irradiation apparatus, wherein the disc-shaped object serving as the irradiation target object is formed with a layer having functionability, which is cured by the irradiation of the electron beams.
- According to this disc-shaped object manufacturing apparatus, the on-rotating disc-shaped object is irradiated with the electron beams, and it is therefore possible to efficiently irradiate the disc-shaped object with the electron beams having the greater energy than the ultraviolet rays have. Hence, the lubricating layer, etc. made of the material that is hard to be cured by the irradiation of the ultraviolet rays can be easily cured and efficiently formed on the disc-shaped object. Further, the electron beam irradiation unit can be constructed of a less number of electron beam irradiation tubes because of making the relative movements of the electron beam irradiation unit and the disc-shaped object when performing such irradiation of the electron beams, thus enabling the number of electron beam irradiation tubes to be reduced. Then, the equipment cost and the running cost can be reduced, and the lubricating layer, etc. can be formed at a low cost.
- A method of manufacturing a disc-shaped object according to the present embodiment involves using the aforementioned electron beam irradiation apparatus or the aforementioned electron beam irradiation method, wherein the disc-shaped object serving as the irradiation target object is formed with a layer having functionability, which is cured by the irradiation of the electron beams.
- According to this disc-shaped object manufacturing method, the on-rotating disc-shaped object is irradiated with the electron beams, and it is therefore possible to efficiently irradiate the disc-shaped object with the electron beams having the greater energy than the ultraviolet rays have. Hence, the lubricating layer, etc. made of the material that is hard to be cured by the irradiation of the ultraviolet rays can be easily cured and efficiently formed on the disc-shaped object. Further, the electron beam irradiation unit can be constructed of a less number of electron beam irradiation tubes because of making the relative movements of the electron beam irradiation unit and the disc-shaped object when performing such irradiation of the electron beams, thus enabling the number of electron beam irradiation tubes to be reduced. Then, the equipment cost and the running cost can be reduced, and the lubricating layer, etc. can be formed at a low cost.
- Another apparatus for manufacturing a disc-shaped object according to the present embodiment comprises an electron beam irradiation apparatus including a first rotational unit provided in an openable/closable shield container and accommodating a disc-shaped object rotationally driven, and an electron beam irradiation unit for irradiating the surface of the on-rotating disc-shaped object with electron beams, a chamber including a second rotational unit capable of accommodating the disc-shaped object and an exchange chamber that is air-tight and openable/closable independently of the shield container, and a rotational unit for exchanging the first and second rotational units with each other by rotating the first rotational unit in the shield container and the second rotational unit in the exchange chamber, wherein the electron beam irradiation unit and the disc-shaped object are relatively moved when irradiating the on-rotating disc-shaped object with the electron beams.
- According to this disc-shaped object manufacturing apparatus, the on-rotating disc-shaped object is irradiated with the electron beams, and it is therefore possible to efficiently irradiate the disc-shaped object with the electron beams having the greater energy than the ultraviolet rays have. Hence, for example, the lubricating layer, etc. made of the material that is hard to be cured by the irradiation of the ultraviolet rays can be easily cured. Further, the two pieces of first and second rotational units are exchanged with each other by rotating the first rotational unit and the second rotational unit, thus ejecting the post-irradiation disc-shaped object and simultaneously supplying the pre-irradiation disc-shaped object. The two disc-shaped objects can be efficiently exchanged, thereby improving the productivity. At the same time, the electron beam irradiation unit can be constructed of a less number of electron beam irradiation tubes because of making the relative movements of the electron beam irradiation unit and the disc-shaped object when performing the irradiation of the electron beams, thus enabling the number of electron beam irradiation tubes to be reduced. Then, the equipment cost and the running cost can be reduced, and the lubricating layer, etc. can be formed at a low cost.
- The disc-shaped object manufacturing apparatus can be constructed so that a width of the electron beam irradiation unit in a direction orthogonal to a rotating direction of the irradiation target object within a rotating plane of the disc-shaped object, is smaller than a radius of the disc-shaped object.
- Moreover, in the disc-shaped object manufacturing apparatus, it is preferable that a rotating speed of the disc-shaped object is changed corresponding to a position of the irradiation by the electron beam irradiation unit over the disc-shaped object. In this case, the first rotational unit and the second rotational unit are so constructed as to be capable of revolving, and the first rotational unit irradiates the surface of the on-rotating disc-shaped object with the electron beams from the electron beam irradiation unit, whereby the disc-shaped object can be moved with respect to the electron beam irradiation unit. Moreover, the rotating speed of the disc-shaped object is decreased when the electron beam irradiation unit irradiates an outer periphery side of the disc-shaped object with the electron beams and is increased when irradiating an inner periphery side with the electron beams, whereby the electron beam absorbed dose of the disc-shaped object can be set fixed irrespective of the position of the disc-shaped object.
- Further, it is preferable that a moving velocity of the electron beam irradiation unit is changed corresponding to the position of the irradiation by the electron beam irradiation unit over the disc-shaped object. In this case, the moving velocity of the electron beam irradiation unit is decreased when the electron beam irradiation unit irradiates the outer periphery side of the disc-shaped object with the electron beams and is increased when irradiating the inner periphery side with the electron beams, whereby the electron beam absorbed dose of the disc-shaped object can be set fixed irrespective of the position of the disc-shaped object. Moreover, the electron beam irradiation unit can be constructed of an irradiation window of a single electron beam irradiation tube.
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FIG. 1 is a side view schematically showing an electron beam irradiation apparatus in a first embodiment; -
FIG. 2 is a plan view of the principal portions of the electron beam irradiation apparatus inFIG. 1 ; -
FIG. 3 is a block diagram showing a control system of the electron beam irradiation apparatus inFIG. 1 ; -
FIG. 4 is a flowchart showing an operation of the electron beam irradiation apparatus inFIGS. 1 through 3 ; -
FIG. 5 is a graph schematically showing a relation between a radius-directional position of an electronbeam irradiation tube 11 a and a moving velocity of an electronbeam irradiation tube 11 a of the electron beam irradiation apparatus inFIGS. 1 through 3 ; -
FIG. 6 is an explanatory side sectional view schematically showing an apparatus for manufacturing a disc-shaped medium according to a second embodiment, and showing a process just after the irradiation of the electron beams; -
FIG. 7 is an explanatory side sectional view showing the irradiation of the electron beams on the disc-shaped medium, and showing a process of exchanging the disc-shaped medium with an external disc-shaped medium; -
FIG. 8 is an explanatory side sectional view showing the irradiation of the electron beams on the disc-shaped medium, and showing the process of exchanging the disc-shaped medium with the external disc-shaped medium; -
FIG. 9 is an explanatory side sectional view showing preparatory processes in an internal exchange process of the disc-shaped medium; -
FIG. 10 is an explanatory side sectional view showing the internal exchange process of the disc-shaped medium; -
FIG. 11 is an enlarged sectional view showing a shield member 5 in the manufacturing apparatus inFIGS. 5 through 9 ; -
FIG. 12 is a flowchart showing respective steps of irradiating the disc-shaped medium with the electron beams and respective steps of ejecting and supplying the disc-shaped medium in the manufacturing apparatus inFIGS. 5 through 9 ; -
FIG. 13 is a view showing an example of a layer structure of an optical disc that can be manufactured by the manufacturing apparatus inFIGS. 6 through 10 ; -
FIG. 14 a side view, showing a process similar to that inFIG. 6 , of the manufacturing apparatus for forming the lubricating layer, etc. on the disc-shaped medium in a third embodiment; -
FIG. 15 is a plan view of the principal portions of the manufacturing apparatus inFIG. 14 ; -
FIG. 16 is a diagram schematically showing a relation between a radius-directional position of the electronbeam irradiation tube 11 with respect to the disc-shaped medium and a rotating speed of the disc-shaped medium inFIGS. 14 and 15 ; and -
FIG. 17 is a plan view showing a positional relation in plane between an on-rotating disc-shaped irradiation target object and the electron beam irradiation tube in the electron beam irradiation apparatus inFIGS. 1 and 2 . - A best mode for carrying out the present invention will hereinafter be described with reference to the drawings. Namely, an electron beam irradiation apparatus according to a first embodiment, and an apparatus for manufacturing a disc-shaped medium according to a second embodiment and a third embodiment will be explained with reference to the drawings.
- The electron beam irradiation apparatus in the first embodiment is constructed to irradiate a disc-shaped irradiation target object with electron beams while moving a single electron beam irradiation tube.
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FIG. 1 is a side view schematically showing the electron beam irradiation apparatus in the first embodiment.FIG. 2 is a plan view of the principal portions of the electron beam irradiation apparatus inFIG. 1 .FIG. 3 is a block diagram showing a control system of the electron beam irradiation apparatus inFIG. 1 .FIG. 4 is a flowchart showing an operation of the electron beam irradiation apparatus inFIGS. 1 through 3 .FIG. 5 is a graph schematically showing a relation between a radius-directional position of an electronbeam irradiation tube 11 a and a moving velocity of the electronbeam irradiation tube 11 a of the electron beam irradiation apparatus inFIGS. 1 through 3 .FIG. 17 is a plan view showing a positional relation in plane between the on-rotating disc-shaped irradiation target object and the electron beam irradiation tube in the electron beam irradiation apparatus inFIGS. 1 and 2 . - As illustrated in
FIG. 1 , an electronbeam irradiation apparatus 1 includes ashield container 10 that accommodates a disc-shapedirradiation target object 2 rotatably and is composed of stainless steel in order to shield the electron beams (to confine the electron beams to the inside), amotor 17 for rotationally driving theirradiation target object 2 held by engaging a central hole of theirradiation target object 2 with an engagingmember 4 through arotary shaft 3, the electronbeam irradiation tube 11 a that emits the electron beams under a low-acceleration voltage, an electronbeam irradiating portion 11 c, constructed of an irradiation window of the electronbeam irradiation tube 11 a, from which to irradiate theirradiation target object 2 with the electron beams, apower source 12 for applying a voltage to the electronbeam irradiation tube 11 a, and atemperature measuring device 13 for measuring an ambient temperature to the electronbeam irradiation tube 11 a by use of atemperature sensor 24 disposed in the vicinity of the electronbeam irradiation tube 11 a. - The electron
beam irradiation apparatus 1 further includes anoxygen concentration meter 16 for measuring an oxygen concentration of oxygen in an airtight closed space within theshield container 10, avacuumizing device 18 for evacuating and thus depressurizing an interior of theshield container 10 via avalve 19, anitrogen gas source 14 that supplies a nitrogen gas for replacing the interior of theshield container 10 with a nitrogen gas atmosphere, and a gas flowrate control valve 15 capable of controlling a gas flow rate of the nitrogen gas in a such a flow that the nitrogen gas is supplied from thenitrogen gas source 14, introduced via agas introduction port 25, passes through in the vicinity of theirradiation window 11 c and is discharged from agas discharge port 26. Further, thegas discharge port 26 is provided with a valve (unillustrated). - As shown in
FIGS. 1 and 2 , the electronbeam irradiation apparatus 1 is equipped with a movingmechanism 20 for moving the electronbeam irradiation tube 11 a in a radial direction R of theirradiation target object 2, and with anirradiation tube container 11 b disposed in a upper part of theshield container 10 and accommodating the electronbeam irradiation tube 11 a inwardly. The electronbeam irradiation tube 11 a irradiates the electron beams of which an acceleration voltage is on the order of 20 kV through 100 kV from the elongated irradiation window (i.e., the electronbeam irradiating portion 11 c) disposed along the radial direction R of theirradiation target object 2 inFIGS. 1, 2 and 17. The irradiation window (the electron beam irradiating portion) 11 c of the electronbeam irradiation tube 11 a has a width d along the radial direction R that is smaller than a radius r (a distance from arotational center 2 a up to an outer periphery) of the disc-shapedirradiation target object 2 inFIG. 17 . - As shown in
FIG. 2 , an upper surface of theshield container 10 within theirradiation tube container 11 b is formed with anelongated aperture 23 in and along which the electronbeam irradiation tube 11 a is disposed and movable. Theirradiation tube container 11 b is, as in the case of theshield container 10, composed of the stainless steel so that the electron beams do not leak out of theaperture 23, thus shielding the electron beams. - The moving
mechanism 20 includes aservo motor 21 disposed on the upper surface of theshield container 10 outwardly of theirradiation tube container 11 b, and aball slide shaft 22 connected to the electronbeam irradiation tube 11 a within theirradiation tube container 11 b and rotationally driven by theservo motor 21. Theservo motor 21 can rectilinearly move the electronbeam irradiation tube 11 a along theaperture 23 by rotationally driving theball slide shaft 22, and can adjust the moving velocity of the electronbeam irradiation tube 11 a by controlling the number of revolutions of theservo motor 21. The movingmechanism 20 moves the electronbeam irradiation tube 11 a in the radial direction R, thereby enabling the irradiation of the electron beams over substantially the entire surface of theirradiation target object 2 by use of the electronbeam irradiation tube 11 a having theirradiation window 11 c of which the width d is smaller than the radius r of theirradiation target object 2 inFIG. 17 . - The electron
beam irradiation tube 11 a, when the voltage is applied to thistube 11 a from thepower source 12, irradiates part of an area of the on-rotatingirradiation target object 2 with the electron beams of which the acceleration voltage is on the order of 20 kV through 100 kV via theirradiation window 11 c. In this case, however, acontrol unit 30 inFIG. 3 keeps constant the rotating speed of theirradiation target object 2, and controls theservo motor 21 of the movingmechanism 20, as shown inFIG. 5 , so as to decrease the moving velocity of the electronbeam irradiation tube 11 a when the electronbeam irradiation tube 11 a irradiates an outer peripheral side of theirradiation target object 2 with the electron beams and so as to increase the moving velocity of the electronbeam irradiation tube 11 a when irradiating an inner peripheral side with the electron beams. With this control thus effected, an electron beam absorbed dose of theirradiation target object 2 can be fixed irrespective of the radius-directional position of theirradiation target object 2. - The thus-constructed electron
beam irradiation apparatus 1 inFIGS. 1 and 2 , irradiates the electron beams in a way that controls the whole as shown inFIG. 3 by thecontrol unit 30. Respective steps S01 through S11 of the operation of the electronbeam irradiation apparatus 1 will be described with reference toFIG. 4 . - Under the control of the
control unit 30, to begin with, after closing the valve at thegas discharge port 26, thevacuumizing device 18 operates to depressurize the interior of the shield container 10 (S01), then thevalve 19 is closed, and the nitrogen gas is introduced into theshield container 10 via a gas flowrate control valve 15 from the nitrogen gas source 14 (S02). The interior of theshield container 10 can be thereby easily replaced with a nitrogen atmosphere. - Then, the
oxygen concentration meter 16 detects a decrease down to a predetermined oxygen concentration in the interior of the shield container 10 (S03), and theirradiation target object 2 is rotated at a predetermined rotating speed by driving the motor 17 (S04). On the other hand, the voltage is applied to the electronbeam irradiation tube 11 a from the power source 12 (S05), thereby generating the electron beams (S06). At this time, the electronbeam irradiation tube 11 a is positioned by far more outwards than the outermost periphery of theirradiation target object 2 as depicted by the solid lines inFIGS. 1 and 2 . - Next, the
ball slide shaft 22 is rotated by driving theservo motor 21, whereby the electronbeam irradiation tube 11 a is moved towards the inner periphery side in the radial direction R up to a position indicated by a broken line inFIGS. 1 and 2 from the position depicted by the solid lines inFIGS. 1 and 2 (S07). In the meantime, the surface of the on-rotatingirradiation target object 2 is irradiated with the electron beams emitted from theirradiation window 11 c of the electronbeam irradiation tube 11 a (S08). During the thus-effected irradiation of the electron beams, the electronbeam irradiation tube 11 a is moved towards the innermost periphery side from the outer periphery side of theirradiation target object 2, and the moving velocity thereof in the radial direction R is so controlled as to change from a low velocity to a high velocity as shown inFIG. 5 . Therefore, the electron beam absorbed dose of the on-rotatingirradiation target object 2 can be fixed regardless of the radius-directional position of theirradiation target object 2. - Then, when the electron
beam irradiation tube 11 a is moved to the vicinity of the rotational center of theirradiation target object 2 in alignment with the position of anedge portion 11 d extending so as to provide an eaved-cover above the engagingmember 4 from theirradiation tube container 11 b, the electronbeam irradiation tube 11 a stops moving, and simultaneously the irradiation of the electron beams from the electronbeam irradiation tube 11 a is stopped (S09). - Further, during the emission of the electron beams from the electron
beam irradiation tube 11 a, the nitrogen gas from thenitrogen gas source 14 flows through the vicinity of theirradiation window 11 c via thegas introduction portion 25 and further flows into the gas discharge portion 26 (S10), thereby making it possible to cool off theirradiation window 11 c that rises in its temperature when emitting the electron beams. Moreover, a temperature ambient to theirradiation window 11 c is measured by atemperature sensor 24 and by atemperature measuring device 13, and a flow rate of the nitrogen gas is controlled based on this measured temperature by the gas flow rate control valve 15 (S11). The temperature ambient to theirradiation window 11 c can be controlled to be equal to or lower than a fixed temperature. - As described above, according to the electron beam irradiation apparatus in
FIGS. 1 through 4 , the surface of the on-rotatingirradiation target object 2 is irradiated with the electron beams, thereby enabling highly efficient irradiation of the electron beams exhibiting greater energy than the ultraviolet rays have. It is therefore feasible to facilitate curing of a lubricating layer, etc. made of a material that is hard to be cured by the irradiation of, for example, the ultraviolet rays. - When irradiating the electron beams, the electron
beam irradiation tube 11 a is moved along above the on-rotatingirradiation target object 2, and hence the single electronbeam irradiation tube 11 a can irradiate substantially the entire surface of theirradiation target object 2 with the electron beams. The apparatus can be constructed of a less number of electronbeam irradiation tubes 11 a than by the prior art, whereby the number of electronbeam irradiation tubes 11 a can be reduced. Accordingly, there suffices one single electronbeam irradiation tube 11 a that is expensive, and therefore the equipment cost can be restrained by increasing neither a weight nor a size of the apparatus. At the same time, the running cost can be restrained without increasing amounts of consumption of N2 gas for cooling and of the electric power. - Further, the surface of the
irradiation target object 2 is irradiated with the electron beams of which the acceleration voltage is as low as 20 kV through 100 kV, whereby the electron beam energy can be highly efficiently applied across the object surface over a thin range, e.g., over the lubricating layer. It is therefore possible to prevent deterioration of a substrate, etc. without exerting influence of the electron beams upon the substrate, etc. existing thereunder. - Moreover, the irradiation of the electron beams is conducted after reducing the oxygen concentration in the interior of the
shield container 10 down to the predetermined level, so that an inhibition of radical reaction caused by oxygen in the vicinity of the surface of theirradiation target object 2 irradiated with the electron beams is hard to occur, thereby making it possible to ensure preferable hardening reaction in the lubricating layer, etc. - Note that in the discussion given above, the electron
beam irradiation tube 11 a is moved toward the inner periphery from the outer periphery of theirradiation target object 2 and may also be moved toward the outer periphery from the inner periphery of theirradiation target object 2. Moreover, the electronbeam irradiation tube 11 a may also be reciprocated such as the outer periphery→the inner periphery the output periphery of theirradiation target object 2 or the inner periphery→the outer periphery→the inner periphery thereof. - Next, an apparatus for manufacturing the disc-shaped medium according to a second embodiment will be described.
FIGS. 6 through 10 are side views of the manufacturing apparatus, explaining respective processes for forming a layer (a lubricating layer) exhibiting lubricity on the disc-shaped medium according to the second embodiment. - As shown in
FIGS. 6 through 10 , a disc-shaped medium manufacturing apparatus (which will hereinafter be simply termed a [manufacturing apparatus]) 50 has an airtightclosable chamber 51 accommodating the electronbeam irradiation apparatus 1 that emits the electron beams of which the acceleration voltage is as low as 20 kV through 100 kV and irradiates the surface of a disc-shapedmedium 49 with the electron beams, anexchange chamber 52 for loading the pre-irradiation disc-shapedmedium 49 into the electronbeam irradiation apparatus 1 and receiving a post-irradiation disc-shaped medium 49 a from the electronbeam irradiation apparatus 1, and a rotational (turn)unit 54 that rotates about arotary shaft 53 in order to exchange the pre-irradiation disc-shaped medium with the post-irradiation disc-shaped medium. - As shown in
FIGS. 6 through 10 , themanufacturing apparatus 50 further includes adisc carrying device 60 for carrying the disc-shaped medium in a way that loads the pre-irradiation disc-shaped medium into theexchange chamber 52 and ejects the post-irradiation disc-shaped medium. - The
electron irradiation apparatus 1 is constructed substantially in the same way as inFIGS. 1 through 3 , and hence a different point from the configuration inFIGS. 1 through 3 will be explained. To be specific,FIG. 6 shows a variation of theshield container 10 inFIG. 1 , wherein thisshield container 10 is divided into a rotational (turn)tray unit 10 a, provided on a lower side as viewed inFIG. 6 , that is configured in a tray-like shape so as to rotatably accommodate the disc-shapedmedium 49, and an upper-side fixedunit 10 b provided with anirradiation tube container 11 b, a movingmechanism 20, etc. Therotational tray unit 10 a serving as a first rotational unit is movable to the side f theexchange chamber 52 in a way that moves up and down and turns with the aid of therotational unit 54 with respect to the fixedunit 10 b. - As illustrated in
FIG. 6 , an abuttingface 10 c of therotational tray unit 10 a and an abuttingface 10 c′ of the fixedunit 10 b are provided withshield members 55 for shielding the electron beams so that the electron beams do not leak out.FIG. 11 is an enlarged sectional view showing theshield member 55. As shown inFIG. 11 , the abuttingface 10 c of therotational tray unit 10 a has a protrudedportion 55 a formed along the entire periphery thereof, and the abuttingface 10 c′ of the fixedunit 10 b has a recessedportion 55 b formed along the entire periphery thereof, wherein the protrudedportion 55 a can be fitted in the recessedportion 55 b. - Further, a bottom of the recessed
portion 55 b configuring theshield member 55 is further formed with acavity 55 c, and an O-ring 56 a is accommodated in thecavity 55 c, thus forming an airtightclosed portion 56. When the abuttingface 10 c and the abuttingface 10 c′ abut on each other, the protrudedportion 55 a slightly enters thecavity 55 c from through the recessedportion 55 b and presses the O-ring 56 a in thecavity 55 c in the airtightclosed portion 56. Thus, therotational tray unit 10 a abuts on the fixedunit 10 b, thereby making it possible to enhance airtightness in an airtight closed space 10 d formed inside owing to the airtightclosed portion 56 and to provide preferable shield property of the electron beams. Note that therotational tray unit 10 a (52 a) is, when moved downward for exchanging as shown inFIG. 10 , descended down to a position inFIG. 11 so as not to butt against the fixedunit 10 b. - Further, in the
shield portion 55 inFIG. 11 , the O-ring 56 a in the airtightclosed portion 56 is positioned much closer to the bottom within thecavity 55 c from the recessedportion 55 b and is not therefore irradiated with the electron beams directly, whereby the O-ring 56 a can be prevented from being deteriorated. - As illustrated in
FIG. 6 , theexchange chamber 52 includes arotational tray unit 52 a serving as a second rotational unit that is moved up and down and rotated by therotational unit 54 and is thus moved to the side of the electronbeam irradiation apparatus 1, wherein thisrotational tray unit 52 a is exchangeable with therotational tray unit 10 a and configured in the tray shape. Theexchange chamber 52 further includes a carryrotational tray unit 52 b that receives the pre-irradiation disc-shaped medium and ejects the post-irradiation disc-shaped medium to the outside by use of thedisc carrying device 60. - The
chamber 51 has anedge portion 51 a and a connectingportion 51 b that configure part of theexchange chamber 52. Theedge portion 51 a and the connectingportion 51 b are interposed serving as abutting faces between therotational tray unit 52 a and the carryrotational tray unit 52 b of theexchange chamber 52, whereby an airtightclosed space 52 c is formed within theexchange chamber 52 and at the same time the carryrotational tray unit 52 b configures part of thechamber 51. - Moreover, airtight
closed portions 57 each using an O-ring are provided on an abutting face between theedge portion 51 a and the carryrotational tray unit 52 b and on an abutting face between the connectingportion 51 b and the carryrotational tray unit 52 b. Further, thesame shield portions 55 and the same airtightclosed portions 56 as those inFIG. 10 are respectively provided on the abutting face between theedge portion 51 a and therotational tray unit 52 a and on the abutting face between the connectingportion 51 b and therotational tray unit 52 a. - The
chamber 51 connects to the fixedunit 10 b on the side of the edge portion of the electronbeam irradiation apparatus 1, the connectingportion 51 b connects to the fixedunit 10 b in the vicinity of a central portion, and the carryrotational tray unit 52 b is air-tightly closed by theedge portion 51 a and by the connectingportion 51 b, thereby becoming air-tightly closable on the whole. Moreover, thechamber 51, the carryrotational tray unit 52 b (62), therotational tray unit 10 a, the fixed unit lob, etc., are made of iron and steel, stainless steel and so on, thereby shielding the electron beams to prevent the electron beams from leaking to the outside. - The nitrogen gas can be introduced into the
chamber 51 via a nitrogengas introduction port 58, and the airtightclosed space 52 c within theexchange chamber 52 can be depressurized by avacuumizing device 59. As shown inFIG. 10 , in a state where thewhole chamber 51 is air-tightly closed, therotational unit 54 moves together with therotational tray units 10 a, 50 a downward as viewed inFIG. 10 , and the airtightclosed spaces 10 d, 52 c are opened. This case indicates a state in which the interior of exchange chamber is replaced with the nitrogen gas, and hence the interior of thechamber 51 does not affect the nitrogen gas atmosphere in the airtight closed space 10 d of the electronbeam irradiation apparatus 1. - Moreover, the nitrogen gas can be introduced into the
exchange chamber 52 via a nitrogengas introduction port 59 b. Further, the nitrogen gas in thechamber 51 can be discharged from agas discharge port 58 a. - As shown in
FIG. 6 , thedisc carrying device 60 includes another carryrotational tray unit 62 exchangeable with the carryrotational tray unit 52 b configuring theexchange chamber 52, and a rotational unit (rotational plate) 64 that rotates the carryrotational tray units rotary shaft 63. Each of the carryrotational tray units member 61 for vacuum-adsorbing the disc-shapedmedium 49 in the vicinity of the periphery of a central hole of the disc-shapedmedium 49. Therotational unit 64 makes the up-and-down and rotational movements and thus carries the disc-shaped medium between theexchange chamber 52 and an external disc transferring/receivingunit 70. - The disc-shaped
medium 49 supplied from the disc transferring/receivingunit 70 to theexchange chamber 52 is formed on its surface with a light transmitting layer containing a resinous material and a lubricating layer composed of a lubricant thereon by use of an external spin coat device. - A material for forming this type of light transmitting layer is not particularly limited on condition that it is an active energy ray curing compound. It is, however, preferable that this material contains at least one reactive group selected from within a (meta) acryloyl group, a vinyl group and a mercapto group. For others, the aforementioned material may contain a known photo-polymerization initiator.
- Further, for example, a silicon compound and a fluorine compound each exhibiting radical polymerization property are given as materials for forming the lubricating layer. The materials are not, however, limited to those aforementioned. Those lubricating layer forming materials are generally hard to be cured by ultraviolet rays in the case of containing no photo-polymerization initiator but can be instantaneously cured by the electron beams.
- Next, an operation of the
manufacturing apparatus 50 described above will be explained with reference to flowcharts inFIGS. 6 through 10 and 12 in a way that divides the operation into the irradiation of the electron beams upon the disc-shaped medium and the ejecting/supplying of the disc-shaped medium. - As shown in
FIG. 12 , to begin with, thewhole chamber 51 is air-tightly closed as illustrated inFIG. 10 , and therotary shaft 53 and therotational unit 54 moves downward as viewed inFIG. 10 together with therotational tray units closed spaces 10 d, 52 c have been opened, the nitrogen gas is introduced into thechamber 51 via the nitrogengas introduction port 58, thereby replacing the interior thereof with the nitrogen gas atmosphere (S21). At this time, the replacement with the nitrogen gas can be performed while measuring a concentration of oxygen in thechamber 51 by theoxygen concentration meter 16. - Next, when the
rotary shaft 53 and therotational unit 54 move upward as viewed in the Figure together with therotational tray units FIG. 6 , the airtightclosed spaces 10 d, 52 c are formed. Then, in the electronbeam irradiation apparatus 1, the disc-shapedmedium 49 is rotated by themotor 17 within the airtight closed space 10 d (S22), the electronbeam irradiation tube 11 a is controlled to emit a predetermined amount of electron beams (S23), and the nitrogen gas flows through the vicinity of theirradiation window 11 c toward thegas discharge port 26 from thegas introduction port 25. - Next, the electron
beam irradiation tube 11 a starts moving by operating the movingmechanism 20 and is moved toward the inner periphery from the outer periphery of the disc-shaped medium 49 (S24), and simultaneously the surface, formed with the lubricating layer on the light transmitting layer, of the on-rotating disc-shapedmedium 49 is irradiated with the electron beams (S25). - At this time, the electron
beam irradiation tube 11 a is moved in a way that changes the moving velocity of the movement in the radial direction R (FIGS. 2 and 17 ) to a high velocity from a low velocity as the electronbeam irradiation tube 11 a moves from the outermost periphery to the innermost periphery of the disc-shapedmedium 49 as shown inFIG. 5 , then substantially the entire surface of the disc-shapedmedium 49 is irradiated with the electron beams, and thereafter the movement and the irradiation of the electronbeam irradiation tube 11 a are stopped (S26). This enables acquisition of the disc-shaped medium 49 a including the lubricating layer fixed onto the surface of the light transmitting layer of the disc-shapedmedium 49. This is considered such that the vicinity of the surface of the light transmitting layer is cured, and at the same time the reactive group of the lubricant is bound (cured) with reactive groups of the surface of the light transmitting layer and of other lubricant. - In a state where the airtight
closed space 52 c is formed within theexchange chamber 52 as shown inFIG. 6 , the airtightclosed space 52 c in theexchange chamber 52 accommodating the post-irradiation disc-shaped medium 49 a inside is opened to the atmospheric air through anopening valve 59 c and anopening port 59 d as shown inFIG. 7 (S30). - Then, the
disc carrying device 60 moves the adsorbingmember 61 provided on the side of the carryrotational tray unit 52 b downward as viewed inFIG. 7 by lowering therotary shaft 63 and an adsorbingarm 64 a of therotational unit 64, whereby the adsorbingmember 61 adsorbs the disc-shaped medium 49 a (S31). Almost simultaneously with this, the adsorbingmember 61 on the side of another carryrotational tray unit 62 adsorbs the pre-irradiation disc-shapedmedium 49 formed with the lubricating layer on its surface, which is accommodated in the external disc transferring/receiving unit 70 (S32). - Next, as illustrated in
FIG. 8 , thedisc carrying device 60 raises the disc-shaped medium 49 a by lifting up the adsorbingarm 64 a, and simultaneously moves therotary shaft 63 and therotational unit 64 upward as viewed inFIG. 8 . Then, therotational unit 64 rotates about therotary shaft 63, whereby the carryrotational tray units - Next, as shown in
FIG. 9 , thedisc carrying device 60 moves therotary shaft 63 and therotational unit 64 downward as viewed inFIG. 8 , thereby setting the disc-shaped medium 49 a into therotational tray unit 52 a of the exchange chamber 52 (S34). On the other hand, the disc-shaped medium 49 a is transferred to the disc transferring/receiving unit 70 (S35), and therespective adsorbing members 61 stop adsorbing the disc-shapedmediums FIG. 9 . The disc-shaped medium 49 a is ejected to the outside from the disc transferring/receiving unit 70 (S36). - Then, the airtight
closed space 52 c, which is formed again in the manner described above, within theexchange chamber 52 is depressurized by thevacuumizing device 59, and the nitrogen gas is introduced via the nitrogengas introduction port 59 b, wherein the replacement of the nitrogen gas is conducted beforehand (S37). - In the way described above, the disc-shaped medium 49 a after being irradiated with the electron beams can be carried up to the disc transferring/receiving
unit 70 from theexchange chamber 52, and the same time the disc-shapedmedium 49 before being irradiated with the electron beams can be carried up to theexchange chamber 52 from the disc transferring/receivingunit 70. Thus, the disc-shapedmediums rotary shaft 63 and therotational unit 64. - Further, the exchange between the disc-shaped
mediums beam irradiation apparatus 1 because of the airtightclosed spaces 10 d, 52 c being independent of each other as shown inFIGS. 7 and 8 . - Next, an exchanging operation of the disc-shaped medium between the
exchange chamber 52 and the electronbeam irradiation apparatus 1 will be explained. To be specific, as illustrated inFIG. 9 , therotational tray unit 52 a of theexchange chamber 52 accommodates the pre-irradiation disc-shapedmedium 49. In the electronbeam irradiation apparatus 1, the rotation by themotor 17 is stopped (S38), the disc-shaped medium 49 a that has finished being irradiated with the electron beams is housed in therotational tray unit 10 a, and, in this state, therotary shaft 53 and therotational unit 54 move downward as viewed inFIG. 9 , whereby therotational tray units closed spaces 52 c, 10 d. Note that the interior of the airtightclosed space 52 c has been replaced with the nitrogen gas atmosphere at that time, and hence there is no influence on other portions within thechamber 51. - Next, as shown in
FIG. 10 , therotational unit 54 rotates about therotary shaft 53 within thechamber 51, thereby exchanging therotational tray units medium 49 housed in therotational tray unit 52 a is moved into the electron beam irradiation apparatus 1 (S40), and, almost simultaneously with this, the disc-shaped medium 49 a housed in therotational tray unit 10 a is moved into the exchange chamber 52 (S41). - In the way explained above, the disc-shaped
mediums exchange chamber 52 and the electronbeam irradiation apparatus 1 by performing one rotational operation of each of therotary shaft 53 and therotational unit 54. Then, therotary shaft 53 and therotational unit 54 move upward as viewed in the Figure in order to move upward therotational tray units closed spaces 52 c, 10 d are again formed as shown inFIG. 6 . Then, in the electronbeam irradiation apparatus 1 the operation returns to step S22 described above, and in theexchange chamber 52 the operation goes back to step S30, thus enabling the same operations to be repeated. Note that therotary shaft 3 of themotor 17 is contrived to, when therotary shaft 53 and therotational unit 54 rotate, retreat downward from therotational unit 54 and from therotational tray unit 10 a, thus permitting therotational unit 54 to rotate. - As explained above, according to the
manufacturing apparatus 50 inFIGS. 5 through 9 , the disc-shapedmedium 49 of which the surface is formed with the lubricating layer, etc. is rotated, and the on-rotating disc-shaped medium is irradiated with the electron beams whose acceleration voltage is as low as 20 kV through 100 kV. It is therefore possible to irradiate instantaneously the disc-shaped medium at a high efficiency with the electron beams exhibiting the greater energy than the ultraviolet rays have. This enables both of facilitation of curing and fixing the lubricating layer, etc. that is hard to be cured by the irradiation of the ultraviolet rays and the instantaneous formation of the lubricating layer, etc. As a result of improving the productivity for forming the lubricating layer, etc., this improvement can contribute to enhance the productivity of the disc-shaped medium. - Moreover, the single electron
beam irradiation tube 11 a is capable of irradiating the electron beams substantially over the entire surface of the disc-shapedmedium 49, and consequently the number of electron beam irradiation tubes can be reduced. There suffices one single electron beam irradiation tube that is expensive, and therefore the equipment cost can be restrained by increasing neither the weight nor the size of the apparatus. At the same time, the running cost can be restrained without increasing amounts of consumption of N2 gas for cooling and of the electric power, and the cost for manufacturing the disc-shapedmedium 49 can be decreased. - Further, the electron
beam irradiation tube 11 a is moved in a way that changes the moving velocity thereof to the high velocity from the low velocity as the electronbeam irradiation tube 11 a moves from the outermost periphery to the innermost periphery of the disc-shapedmedium 49, thereby irradiating substantially the entire surface of the disc-shapedmedium 49 with the electron beams. It is therefore feasible to keep constant the electron beam absorbed dose of the disc-shapedmedium 49 irrespective of the radius-directional position of the disc-shapedmedium 49 and also to easily uniformly cure the lubricating layer, etc. - Still further, in the interior of the
chamber 51 and in thedisc carrying device 60, the two pieces of rotational tray units are exchanged with each other by the single rotational operation of each rotational tray unit in synchronization between one rotational tray unit and the other rotational tray unit, thereby ejecting the post-irradiation disc-shaped medium 49 a and supplying the pre-irradiation disc-shapedmedium 49. The disc-shapedmediums - Yet further, because of using the electron beams of which the acceleration voltage is as low as 20 Kv through 100 kV, the electron beam energy is efficiently applied to the lubricating layer, etc. existing over the thin range from the surface, and the electron beams do not affect the substrate existing thereunder.
- For example, the electron
beam irradiation tube 11 a, configuring the electronbeam irradiation unit 11 of the electronbeam irradiation apparatus 1, for irradiating the electron beams having the low acceleration voltage, is available on the market as offered by Ushio Electric Co., Ltd. The electronbeam irradiation tube 11 a is capable of efficiently applying the electron beam energy to the lubricating layer/resin layer, etc. within a depthwise range that is on the order of 10 μm through 20 μm from the surface under the condition that the acceleration voltage is 50 kV, and a tube current is 0.6 mA per piece, and is capable of efficiently curing the layer instantaneously in less than 1 sec. For instance, the electronbeam irradiation tube 11 a can simultaneously cure not only alubricating layer 93 on the optical disc as shown inFIG. 13 but also even a portion, contiguous to thelubricating layer 93, of alight transmitting layer 92. Besides, for example, since the electron beams do not reach asubstrate 90 existing under thelubricating layer 93 on the optical disc as illustrated inFIG. 13 , and hence no damage is exerted on thesubstrate 90 composed of a resin material such as polycarbonate, etc., and there occurs none of adverse influence such as discoloration, deformation, deterioration and so forth. - Note that a silicon thin film having a thickness of approximately 3 μm is preferable for a window material that composes the
irradiation window 11 c of the electronbeam irradiation tube 11 a, wherein the electron beams accelerated by a voltage equal to or lower than 100 kV, which can not be captured (taken out) by the conventional irradiation window, can be captured by theirradiation window 11 c. - The disc-shaped medium manufacturing apparatus will be described by way of a third embodiment. The disc-shaped medium manufacturing apparatus in
FIGS. 6 through 11 according to the second embodiment discussed above is constructed to irradiate the electron beams while moving the single electron beam irradiation tube with respect to the disc-shaped medium. A construction in the third embodiment is, however, such that the disc-shaped medium is moved close to and away from the single electron beam irradiation tube. The discussion is therefore concentrated on different portions from the second embodiment, wherein the same components as those in the second embodiment are marked with the same numerals and symbols, and their explanations are omitted. -
FIG. 14 is a side view showing the same processes, as those inFIG. 6 , of the manufacturing apparatus, for forming the lubricating layer, etc. on the disc-shaped medium in the third embodiment.FIG. 15 is a plan view of principal portions of the manufacturing apparatus inFIG. 14 .FIG. 16 is a diagram schematically showing a relation between a radius-directional position of the electronbeam irradiation tube 11 a inFIGS. 11 and 15 with respect to the disc-shaped medium and a rotating speed of the disc-shaped medium. - As shown in
FIG. 14 , in the manufacturing apparatus according to the third embodiment, the electronbeam irradiation unit 11 includes the electronbeam irradiation tube 11 a fixedly disposed in an upper position in the vicinity of the center of the disc-shapedmedium 49 within theirradiation tube container 11 b. - Further, the
rotational tray unit 52 a and therotational tray unit 10 b are independently rotationally controlled in order to exchange therotational tray units chamber 51. Therotational tray unit 52 a is rotated (auto-rotation) by amotor 17 a different from themotor 17 for therotational tray unit 10 a. - Moreover, the
rotational tray unit 10 a is revolved through arotary shaft 53 a by amotor 81. Therotational tray unit 52 a is revolved by amotor 82 through arotary shaft 53 b disposed concentrically with therotary shaft 53 a. - As shown in
FIGS. 14 and 15 , therotational tray unit 10 a is, when the disc-shapedmedium 49 is irradiated with the electron beams from the electronbeam irradiation tube 11 a, controlled so that the disc-shapedmedium 49 is, while being rotated by themotor 17, moved by themotor 81 from an electron beam irradiation startposition 91 up to an electron beamirradiation end position 92 along a revolution trajectory S (indicated by a one-dotted chain line inFIG. 15 ) taking a circular shape in a revolving direction k about therotary shaft 53 a at a fixed revolution speed. - Further, the
rotational tray unit 52 a located in anexchange position 93 inFIG. 15 is likewise so controlled as to be moved in the revolving direction k along the revolution trajectory S in order to be exchanged with therotational tray unit 10 a, and then moved to the electron beam irradiation startposition 91 inFIG. 15 , wherein next other disc-shaped medium held by therotational tray unit 52 a is to be irradiated with the electron beams. - As shown in
FIG. 16 , when the electronbeam irradiation tube 11 a irradiates the electron beams over the inner peripheral side of the disc-shapedmedium 49 in the electron beam irradiation startposition 91 inFIG. 15 , the rotating speed of the disc-shapedmedium 49 by themotor 17 is increased, the disc-shapedmedium 49 is moved while revolving toward the electron beamirradiation end position 92 inFIG. 15 , and the electronbeam irradiation tube 11 a irradiates the electron beams over the outer peripheral side of the medium 49. At this time, the electron beam absorbed dose of the disc-shapedmedium 49 can be set fixed irrespective of the radius-directional position of the disc-shapedmedium 49 by controlling the rotating speed of themotor 17 so that the rotating speed of the disc-shapedmedium 49 gradually decreases. - As discussed above, in the case of performing a relative movement between the electron
beam irradiation tube 11 a and the disc-shapedmedium 49 by making the revolving movement of the disc-shapedmedium 49, a rotating speed (speed of rotation) t of the disc-shapedmedium 49 and a radius-directional position r of the electronbeam irradiation tube 11 a from the rotational center, are so controlled as to establish the following relational formula (1).
t∝1/r (1)
According to the manufacturing apparatus inFIGS. 14 through 16 , the disc-shapedmedium 49 formed with the lubricating layer, etc. on its surface is rotated, this on-rotating disc-shaped medium is irradiated with the electron beams of which the acceleration voltage is as low as 20 kV through 100 kV. It is therefore possible to irradiate instantaneously the disc-shaped medium at the high efficiency with the electron beams exhibiting the greater energy than the ultraviolet rays have. This enables both of facilitation of curing and fixing the lubricating layer, etc. that is hard to be cured by the irradiation of the ultraviolet rays and the instantaneous formation of the lubricating layer, etc. As a result of improving the productivity for forming the lubricating layer, etc., this improvement can contribute to enhance the productivity of the disc-shaped medium. - Moreover, the single electron
beam irradiation tube 11 a is capable of irradiating the electron beams substantially over the entire surface of the disc-shapedmedium 49, and consequently the number of electron beam irradiation tubes can be reduced. There suffices one single electron beam irradiation tube that is expensive, and therefore the equipment cost can be restrained by increasing neither the weight nor the size of the apparatus. At the same time, the running cost can be restrained without increasing amounts of consumption of N2 gas for cooling and of the electric power, and the cost for manufacturing the disc-shapedmedium 49 can be decreased. - Further, when the irradiating position of the electron
beam irradiation tube 11 a shifts from the innermost periphery to the outermost periphery of the disc-shapedmedium 49 while the disc-shapedmedium 49 revolves as illustrated inFIG. 15 , the disc-shaped medium is rotated (auto-rotation) in a way that changes the speed thereof to the low speed from the high speed toward the outermost periphery from the innermost periphery of the disc-shapedmedium 49, thereby irradiating substantially the entire surface of the disc-shapedmedium 49 with the electron beams. It is therefore feasible to keep constant the electron beam absorbed dose of the disc-shapedmedium 49 irrespective of the radius-directional position of the disc-shapedmedium 49 and also to easily uniformly cure the lubricating layer, etc. - Still further, similarly in
FIGS. 6 through 10 , in the interior of thechamber 51 and in thedisc carrying device 60, the two pieces of rotational tray units are exchanged with each other by the single rotational operation of each rotational tray unit in synchronization between one rotational tray unit and the other rotational tray unit, thereby enabling the ejection of the post-irradiation disc-shapedmedium 49 and the supply of the pre-irradiation disc-shapedmedium 49. The disc-shapedmediums 49 can be thus efficiently exchanged with each other, and hence the productivity is improved. - It should be noted that throughout the present specification, the term “rotational” implies not a simple consecutive rotation of the irradiation target object, i.e., the disc-shaped medium in one direction (or in the direction opposite thereto) as in the rotation but a turn in a way that changes its position so as to turn by a predetermined amount in one direction or in the opposite direction and then stop. Further, the term “radial direction” of the disc-shaped medium connotes the directions extending radially from the rotational center of the irradiation target object, i.e., the disc-shaped medium, and includes the directions extending to the outer periphery of the irradiation target object, i.e., the disc-shaped medium from points eccentric from the rotational center of the irradiation target object, i.e., the disc-shaped medium.
- As discussed above, the present invention has been described by way of the embodiments but is not limited to those embodiments, and a variety of modifications can be made within the range of the technical ideas of the present invention. For example, in the apparatus for manufacturing the disc-shaped medium according to the present embodiment, the exemplification is that the light transmitting layer and the lubricating layer that are composed of the aforementioned materials are formed by curing in the vicinity of the surface of the disc-shaped medium such as an optical disc, etc., however, the present invention is not limited to this construction and may also be, as a matter of course, applied to the curing of a resin layer, etc. other than the lubricating layer. For instance, the present invention may be applied to forming, in
FIG. 13 , only thelight transmitting layer 92 under thelubricating layer 93, wherein the layer can be instantaneously cured. This is efficient and can contribute to the improvement of the productivity. - Moreover, a variety of disc shapes may be taken for the irradiation target object that can be irradiated with the electron beams by the electron
beam irradiation apparatus 1. Further, the disc-shaped medium such as the optical disc, etc. has been exemplified as the disc-shaped object that can be manufactured by the manufacturing apparatus inFIGS. 6 and 14 , however, the present invention can be, as a matter of course, applied to a case of forming a variety of resin layers on the disc-shaped object other than the medium. - Still further, the moving velocity of the electron
beam irradiation tube 11 a by the movingmechanism 20 inFIGS. 1, 2 and 6 through 10 is set fixed, and the rotating speed of themotor 17 is controlled to decrease the rotating speed of theirradiation target object 2 by use of themotor 17 when the electronbeam irradiation tube 11 a irradiates the electron beams over the outer periphery side of theirradiation target object 2 and to increase the rotating speed of theirradiation target object 2 when irradiating the electron beams over the inner periphery side thereof. Namely, the number of revolutions of themotor 17 is so controlled for establishing the aforementioned relational formula (1) as to gradually decrease from the outermost periphery toward the innermost periphery in accordance with the radius-direction position of the electronbeam irradiation tube 11 a along theball side shaft 22, whereby the electron beam absorbed dose of theirradiation target object 2 can be set fixed regardless of the radius-directional position of theirradiation target object 2. Further, both of the moving velocity of the electronbeam irradiation tube 11 a and the rotating speed of theirradiation target object 2 may also be controlled. - Moreover, in
FIGS. 14 and 15 , the revolution speed in the revolving direction k along the revolution trajectory S of the disc-shapedmedium 49 is set fixed and may also be so controlled as to increase when the irradiation position of the electronbeam irradiation tube 11 a is on the side of the innermost periphery and to decrease when on the side of the outermost periphery. At this time, the rotating (auto-rotation) speed of the disc-shapedmedium 49 can be set fixed and may also be set variable. Through these control operations, the electron beam absorbed dose of theirradiation target object 2 can be set fixed irrespective of the radius-directional position of theirradiation target object 2. - Moreover, in the electron beam irradiation apparatus in
FIG. 1 and in the manufacturing apparatus inFIGS. 6 and 14 , it is preferable that the tube voltage, etc. of the electron beam irradiation tube be determined in consideration of the layer thickness on the electron beam irradiation target surface. Furthermore, there may be provided a plurality of electron beam irradiation tubes corresponding to sizes and dimensions of theirradiation target object 2 and of the irradiation target surface of the disc-shapedmedium 49. - Furthermore, the gas to be replaced with the atmospheres within the chamber and within the electron beam irradiation apparatus is not limited to the nitrogen gas, wherein an inert gas such as an argon gas, a helium gas, etc. is available, and a mixture gas of these two or more types of gases is also available.
Claims (22)
1. An electron beam irradiation apparatus comprising:
a rotary driving unit for rotationally driving an irradiation target object;
a shield container for rotatably accommodating said irradiation target object; and
an electron beam irradiation unit provided in said shield container so that the surface of said irradiation target object is irradiated with electron beams,
wherein said electron beam irradiation unit and said irradiation target object are relatively moved when said electron beam irradiation unit irradiates the surface of said irradiation target object with the electron beams during a rotation of said irradiation target object.
2. An electron beam irradiation apparatus according to claim 1 , wherein a width of said electron beam irradiation unit in a direction orthogonal to a rotating direction of said irradiation target object within a rotating plane of said irradiation target object, is smaller than a maximum distance from the center of rotation within the rotating plane of said irradiation target object.
3. An electron beam irradiation apparatus according to claim 1 , wherein a rotating speed of said irradiation target object is changed corresponding to a position of the irradiation by said electron beam irradiation unit over said irradiation target object.
4. An electron beam irradiation apparatus according to claim 3 , wherein the rotating speed of said irradiation target object is decreased when said electron beam irradiation unit irradiates an outer periphery side of said irradiation target object with the electron beams and is increased when irradiating an inner periphery side with the electron beams.
5. An electron beam irradiation apparatus according to claim 1 , wherein a moving velocity of said electron beam irradiation unit is changed corresponding to the position of the irradiation by said electron beam irradiation unit over said irradiation target object.
6. An electron beam irradiation apparatus according to claim 5 , wherein the moving velocity of said electron beam irradiation unit is decreased when said electron beam irradiation unit irradiates the outer periphery side of said irradiation target object with the electron beams and is increased when irradiating the inner periphery side with the electron beams.
7. An electron beam irradiation apparatus according to claim 1 , wherein said electron beam irradiation unit comprises an irradiation window of a single electron beam irradiation tube.
8. An electron beam irradiation method comprising the steps of:
rotationally driving an irradiation target object accommodated in a shield container that can be air-tightly closed; and
making relative movements of said electron beam irradiation unit and said irradiation target object when said electron beam irradiation unit irradiates the surface of said on-rotating irradiation target object with the electron beams.
9. An electron beam irradiation method according to claim 8 , further comprising the steps of changing a rotating speed of said irradiation target object corresponding to a position of the irradiation by said electron beam irradiation unit over said irradiation target object.
10. An electron beam irradiation method according to claim 9 , further comprising the steps of decreasing the rotating speed of said irradiation target object when said electron beam irradiation unit irradiates an outer periphery side of said irradiation target object with the electron beams; and
increasing the rotating speed when irradiating an inner periphery side with the electron beams.
11. An electron beam irradiation method according to claim 8 , further comprising the steps of changing a moving velocity of said electron beam irradiation unit corresponding to the position of the irradiation by said electron beam irradiation unit over said irradiation target object.
12. An electron beam irradiation method according to claim 11 , further comprising the steps of decreasing the moving velocity of said electron beam irradiation unit when said electron beam irradiation unit irradiates the outer periphery side of said irradiation target object with the electron beams; and
increasing the moving velocity when irradiating the inner periphery side with the electron beams.
13. An apparatus for manufacturing a disc-shaped object, comprising:
a rotary driving unit for rotationally driving said disc-shaped object;
a shield container for rotatably accommodating said disc-shaped object; and
an electron beam irradiation unit provided in said shield container so that the surface of said disc-shaped object is irradiated with electron beams,
wherein said electron beam irradiation unit and said disc-shaped object are relatively moved when said electron beam irradiation unit irradiates the surface of said irradiation target object with the electron beams during a rotation of said irradiation target object, thereby curing a layer having functionability that is formed on said disc-shaped object.
14. A method of manufacturing a disc-shaped object, comprising the steps of:
rotationally driving said disc-shaped object accommodated in a shield container that can be air-tightly closed;
making relative movements of said electron beam irradiation unit and said irradiation target object when said electron beam irradiation unit irradiates the surface of said on-rotating irradiation target object with the electron beams; and
curing a layer having functionability that is formed on said disc-shaped object by irradiating the layer with the electron beams.
15. An apparatus for manufacturing a disc-shaped object, comprising:
an electron beam irradiation apparatus including a first rotational unit provided in an openable/closable shield container and accommodating a disc-shaped object rotationally driven, and an electron beam irradiation unit for irradiating the surface of said on-rotating disc-shaped object with electron beams;
a chamber including a second rotational unit capable of accommodating said disc-shaped object and an exchange chamber that is air-tightly closable and openable/closable independently of said shield container; and
a rotational unit for exchanging said first and second rotational units with each other by rotating said first rotational unit in said shield container and said second rotational unit in said exchange chamber,
wherein said electron beam irradiation unit and said disc-shaped object are relatively moved when irradiating said on-rotating disc-shaped object with the electron beams.
16. An apparatus for manufacturing a disc-shaped object according to claim 15 , wherein a width of said electron beam irradiation unit in a direction orthogonal to a rotating direction of said irradiation target object within a rotating plane of said disc-shaped object, is smaller than a radius of said disc-shaped object.
17. An apparatus for manufacturing a disc-shaped object according to claim 15 , wherein a rotating speed of said disc-shaped object is changed corresponding to a position of the irradiation by said electron beam irradiation unit over said disc-shaped object.
18. An apparatus for manufacturing a disc-shaped object according to claim 17 , wherein said first rotational unit and said second rotational unit are so constructed as to be capable of revolving, and said first rotational unit irradiates the surface of said on-rotating disc-shaped object with the electron beams from said electron beam irradiation unit.
19. An apparatus for manufacturing a disc-shaped object according to claim 17 , wherein the rotating speed of said disc-shaped object is decreased when said electron beam irradiation unit irradiates an outer periphery side of said disc-shaped object with the electron beams and is increased when irradiating an inner periphery side with the electron beams.
20. An apparatus for manufacturing a disc-shaped object according to claim 15 , wherein a moving velocity of said electron beam irradiation unit is changed corresponding to the position of the irradiation by said electron beam irradiation unit over said disc-shaped object.
21. An apparatus for manufacturing a disc-shaped object according to claim 20 , wherein the moving velocity of said electron beam irradiation unit is decreased when said electron beam irradiation unit irradiates the outer periphery side of said disc-shaped object with the electron beams and is increased when irradiating the inner periphery side with the electron beams.
22. An apparatus for manufacturing a disc-shaped object according to claim 15 , wherein said electron beam irradiation unit comprises an irradiation window of a single electron beam irradiation tube.
Priority Applications (1)
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US11/335,950 US7205558B2 (en) | 2004-01-28 | 2006-01-20 | Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object |
Applications Claiming Priority (2)
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JP2004019681A JP2005214709A (en) | 2004-01-28 | 2004-01-28 | Electron beam irradiation device, electron beam irradiation method, manufacturing device of disk-shaped object, and manufacturing method of disk-shaped object |
JP2004-019681 | 2004-01-28 |
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US11/335,950 Division US7205558B2 (en) | 2004-01-28 | 2006-01-20 | Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object |
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US20050161599A1 true US20050161599A1 (en) | 2005-07-28 |
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US11/045,748 Abandoned US20050161599A1 (en) | 2004-01-28 | 2005-01-28 | Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object |
US11/335,950 Expired - Fee Related US7205558B2 (en) | 2004-01-28 | 2006-01-20 | Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object |
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US11/335,950 Expired - Fee Related US7205558B2 (en) | 2004-01-28 | 2006-01-20 | Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object |
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Cited By (3)
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US20110061691A1 (en) * | 2005-07-20 | 2011-03-17 | Disco Corporation | Semiconductor wafer treating apparatus |
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US11373883B2 (en) * | 2018-06-29 | 2022-06-28 | Tokyo Electron Limited | Substrate processing apparatus, substrate processing system and substrate processing method |
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- 2005-01-28 US US11/045,748 patent/US20050161599A1/en not_active Abandoned
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US4492718A (en) * | 1982-12-17 | 1985-01-08 | Burroughs Corporation | Rotation coating of disk substrate with acrylate prepolymer |
US5032461A (en) * | 1983-12-19 | 1991-07-16 | Spectrum Control, Inc. | Method of making a multi-layered article |
US6686597B2 (en) * | 2000-09-04 | 2004-02-03 | Pioneer Corporation | Substrate rotating device, and manufacturing method and apparatus of recording medium master |
US7026098B2 (en) * | 2002-11-06 | 2006-04-11 | Fuji Photo Film Co., Ltd. | Electron beam lithography method |
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US20110061691A1 (en) * | 2005-07-20 | 2011-03-17 | Disco Corporation | Semiconductor wafer treating apparatus |
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US11373883B2 (en) * | 2018-06-29 | 2022-06-28 | Tokyo Electron Limited | Substrate processing apparatus, substrate processing system and substrate processing method |
CN108917967A (en) * | 2018-07-12 | 2018-11-30 | 辽宁工程技术大学 | A kind of goaf bound polyamine device and installation method |
Also Published As
Publication number | Publication date |
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US7205558B2 (en) | 2007-04-17 |
US20060124869A1 (en) | 2006-06-15 |
JP2005214709A (en) | 2005-08-11 |
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