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Número de publicaciónUS20050211147 A1
Tipo de publicaciónSolicitud
Número de solicitudUS 11/088,190
Fecha de publicación29 Sep 2005
Fecha de presentación23 Mar 2005
Fecha de prioridad24 Mar 2004
Número de publicación088190, 11088190, US 2005/0211147 A1, US 2005/211147 A1, US 20050211147 A1, US 20050211147A1, US 2005211147 A1, US 2005211147A1, US-A1-20050211147, US-A1-2005211147, US2005/0211147A1, US2005/211147A1, US20050211147 A1, US20050211147A1, US2005211147 A1, US2005211147A1
InventoresLaura Waterfield
Cesionario originalWaterfield Laura M
Exportar citaBiBTeX, EndNote, RefMan
Enlaces externos: USPTO, Cesión de USPTO, Espacenet
Translucent applique cutwork machine embroidery and method
US 20050211147 A1
Resumen
Translucent applique cutwork embroidery designs can be performed by a sewing machine, preferably a computerized machine with digitized design embroidery patterns. The method employs a foundation fabric 11 and a removable stabilizer 12. Once a cutwork section 14 in an applique cutwork embroidery design is defined with a set of concentric underlay stitches 13 that bind said foundation fabric to removable stabilizer, said foundation fabric is removed from said cutwork section. An applique fabric 16 is then stitched in place over the cutwork section with another set of concentric underlay stitches 13 that are sewn in approximately the same location as the first set of concentric underlay stitches. Excess applique fabric 16 is cut away. The applique cutwork seam 18 joining applique fabric to foundation fabric is finished with zigzag stitches 17 that overcast all said concentric underlay stitches. Where appropriate, a machine embroidery design 19 is stitched on top of said applique fabric, cascading onto said foundation fabric. Said applique cutwork seam is concealed with satin stitches, or similar concealing stitches 20. The balance of the embroidery design is stitched onto said foundation fabric. When said removable stabilizer is removed, no further trimming of fabrics or threads is required.
Imágenes(7)
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Reclamaciones(11)
1. A method for producing applique cutwork embroidery using a sewing machine, which simulates hand stitched applique cutwork embroidery, comprising the steps of:
Stitching onto at least one layer of foundation fabric and one layer of removable stabilizer.
Stitching concentric underlay stitches about cutwork sections, binding foundation fabrics to removable stabilizer.
Removing said foundation fabric from within said cutwork sections.
Stitching applique fabric over said cutwork sections using more concentric underlay stitches and bind applique fabric to said foundation fabric and removable stabilizer.
Trim excess applique fabric from outside said cutwork section and concentric underlay stitches.
Zigzag stitch over said concentric underlay stitches to complete applique cutwork seam.
Stitch machine embroidery design to said applique and foundation fabrics.
Satin stitch over said concentric underlay stitches and associated cut fabric edges to conceal same.
Finish stitching balance of applique cutwork embroidery onto foundation fabric.
Remove removable stabilizer.
2. The method of claim 1 further comprises the step of stitching concentric underlay stitches in rows of at least two.
3. The method of claim 2 further comprises the step of stitching each said row of concentric underlay stitches approximately parallel to one another.
4. The method of claim 2 further comprises the step of stitching each set of concentric underlay stitches such that the normal cross sectional distance between outer and inner stitch rows is nearly as long as the desired stitch width of satin stitches used to conceal said concentric underlay and zigzag stitches.
5. The method of claim 1 further comprises the step of stitching an embroidery design, or portion thereof, directly onto applique fabric.
6. The method of claim 5 further comprises the step of stitching an embroidery design, or portion thereof, directly onto the applique fabric and a means to stitch said embroidery design such that said embroidery design appears contiguous with portions of embroidery stitched solely onto foundation fabric.
7. The method of claim 1 further comprises the step of covering concentric underlay stitches with satin stitches, or similar concealing stitches.
8. The method of claim 1 further comprises the step of removing the stabilizer material.
9. The method of claim 8 wherein the stabilizer material is removed by heat.
10. The method of claim 8 wherein the stabilizer material is removed by water.
11. A method of constructing a seam joining two dissimilar fabrics, whereby said seam is sufficient to retain integrity of same under normal, daily use and stress, comprising the steps of:
Stitching concentric underlay stitches in at least two separate rows such that each row of stitches binds applique fabric to foundation fabric along cut fabric edges of each fabric
Stitching said concentric underlay stitches such that each row of stitches is approximately parallel to one other in any one set of concentric underlay stitches.
Zigzag stitching over said concentric underlay stitches such that said zigzag stitches overcast all said concentric underlay stitches in any one set of concentric underlay stitches.
Descripción
    CROSS REFERENCE TO RELATED APPLICATIONS
  • [0001]
    This application claims the benefit of PPA Ser. No. 60/555,940, filed on 2004 Mar. 24 by the present inventor.
  • BACKGROUND OF THE INVENTION
  • [0002]
    This method relates to embroidery and more particularly to a method for performing applique cutwork embroidery with a sewing machine, which yields applique cutwork embroidery that looks like fine applique cutwork embroidery, performed by hand.
  • [0003]
    Traditional cutwork embroidery is accomplished by removing whole sections of material from a fabric, before, during, or after the application of an embroidery design, leaving a void in said fabric that is integral to an embroidery design. Satin, or similar, stitches applied in tight formation about a section of fabric to be removed, hold in place threads of said fabric after fabric sections are removed.
  • [0004]
    With the expansion of fabric types that include materials such as organza, organdy, netting, and laces, cutwork embroidery has expanded to include a second fabric layer applied over said fabric voids in a cutwork embroidery design. Said second fabric layer is often of a lighter weight and lower thread density than fabric in which cutwork sections are removed.
  • [0005]
    In traditional cutwork, stitch construction about cutwork sections of an embroidery design does not undergo shearing forces when opposing forces are applied along the plane of said fabric. However, applique cutwork involves stitching a second, often lighter weight fabric, to a foundation fabric to cover fabric voids integral to a cutwork embroidery design stitched on said first fabric. The seams binding both layers of fabric are stitched along the edge of each cutwork section and concealed by satin stitches, or similar concealing stitches.
  • [0006]
    Often seams used to join two fabrics in applique cutwork are insufficiently stable to endure shearing forces along the fabrics' plane that would otherwise be considered normal to ever day use. As a result, most garments and other fabric items embellished with applique cutwork as used infrequently to minimize repeated wear and stress on the seam construction of the applique cutwork.
  • [0007]
    Furthermore, applique cutwork applied to garment construction often apply the second fabric layer to the back of a cutwork embroidery design, leaving the second fabric layer intact as an additional layer to the garment. The applique fabric is sized and attached to the garment in manner that allow said applique fabric to undergo shearing forces along the fabrics' plane in greater proportion than said foundation fabric. Such construction techniques waste materials, especially in large scale manufacturing, while producing undesirable effects that can only be applied to a limited number and type of garments.
  • [0008]
    As a consequence, people have tried to develop a method for creating applique cutwork using a sewing machine. Unfortunately, while most methods to date have accurately reproduced applique cutwork embroidery using a sewing machine, with greater uniformity, the need to construct an applique cutwork seam suitably stable and durable for every day use still persists. Additionally, the preferred method of constructing applique cutwork for garments is wasteful in its fabric construction, potentially requiring more labor and a higher skill level to perform.
  • [0009]
    Thus a need exist for a method for performing applique cutwork embroidery, using a sewing machine, that is equal to or better in appearance and durability to hand stitched or machine sewn applique cutwork embroidery and can be performed in a manner suitable for more efficient construction of garments and other fabric articles.
  • BACKGROUND OF THE PRIOR ART
  • [0010]
    In prior art, a method used to perform applique cutwork embroidery using a sewing machine uses partially removable stabilizer. Also said method does not address applique cutwork seam construction suitable for normal, daily wear and stress. In addition, said method does not address embroidery on the applique fabric. Furthermore, said method calls for removal of excess applique fabric after all stitching is complete, limiting the scope of the overall applique cutwork embroidery on the foundation fabric and choice of fabric that may be used for applique.
  • [0011]
    Another method to perform applique cutwork embroidery with a sewing machine applies embroidery to the applique fabric. However, said method does not allow for machine embroidery designs that span both foundation and applique fabric. Furthermore, said method does not address applique cutwork seam construction suitable for normal, daily wear and stress.
  • [0012]
    Another method uses an embroidery sewing machine and removable stabilizer to adapt traditional machine embroidery applique designs to create applique cutwork embroidery. However, the method requires the intermediate introduction of partially removable stabilizer to stabilize the cut fabric edges of a cutwork embroidery design to complete stitching of said embroidery design. This method leaves one side of the embroidery design unsuitable for display. Furthermore, said method does not address applique cutwork seam construction suitable for normal, daily wear and stress.
  • [0013]
    U.S. Pat. No. 2,169,590 to Myers; U.S. Pat. No. 2,215,834 to Magliano; U.S. Pat. No. 4,512,274 to Campbell; and U.S. Pat. No. 1,764,848 to Moffatt are methods for seam finishing by folding under the fabric edges. However, methods do not apply to my invention. U.S. Pat. No. 6,241,081 to Holden; U.S. Pat. No. 6,176,271 to Sayers; U.S. Pat. No. 6,267,068 to Fickers; and U.S. Pat. No. 6,431,221 to Wrigley connect two fabric edges with loops and a pin. However, methods do not apply to my invention. U.S. Pat. No. 4,580,514 to Hanyu and U.S. Pat. No. 2,122,526 to Kattermann use a machine with two needles and a looper. Neither method uses a conventional sewing machine. These methods do not apply to my invention. U.S. Pat. No. 5,141,140 to Moffett-Hall, U.S. Pat. No. 5,531,176 to Johnson, U.S. Pat. No. 4,427,472 to Trager, and U.S. Pat. No. 1,723,729 to Goldberg show methods of creating applique. However, the methods do not include embroidery or cutwork. U.S. Pat. No. 3,226,732 to Zerille is a method of reverse applique using a sewing machine, but is not this invention. U.S. Pat. No. 4,754,719 to Takken is a method to temporarily secure applique fabric in the hoop while being stitched in place, but does not involve cutwork. U.S. Pat. No. 6,364,356 to Keshavaraj is a method for reinforcing a fabric seam capable of enduring large shearing forces, but is not my invention.
  • [0014]
    While some of the aforementioned methods produce applique cutwork embroidery designs with a sewing machine, the durability of the applique cutwork embroidery is such that items manufactured with these methods are relatively fragile products, requiring special handling and minimal use in order to preserve the applique cutwork embroidery design.
  • SUMMARY OF THE INVENTION
  • [0015]
    The primary object of the present invention is to provide a method for producing applique cutwork embroidery using a sewing machine (preferably one that is computerized and has digitizing software) which duplicates the appearance of hand stitched applique cutwork embroidery;
  • [0016]
    Another object is to provide such a method that yields applique cutwork embroidery having an even more enhanced, perfectly stitched appearance than that of hand stitched applique cutwork embroidery;
  • [0017]
    An additional object is to provide such a method, which produces a seam construction suitable for using applique cutwork embroidery in everyday garments and other fabric products in which said products undergo normal, daily wear and stress;
  • [0018]
    An additional object is to provide such a method, which reduces the amount of material required to produce applique cutwork embroidery in garment construction;
  • [0019]
    Still another object is to provide such a method, which increases the types and combinations of foundation and applique fabrics that can be used to produce applique cutwork embroidery;
  • [0020]
    Yet an even further object is to reduce the complexity and skill required to construct applique cutwork embroidery, thereby reducing the labor required to construct applique cutwork embroidery and increasing the commercial viability of same; and
  • [0021]
    Furthermore, another object is to reduce material cost of clothing and other fabric articles produced with applique cutwork embroidery designs by employing a method suitable to improved material conservation.
  • [0022]
    The present invention accomplishes the above and other objects by providing a method of producing machine applique cutwork embroidery, of sufficient durability for normal, everyday use, while greatly expanding the types and combinations of fabrics that can be used to do so. Furthermore, the present invention expands the concept of applique cutwork embroidery to allow for machine embroidery designs that cascade over both foundation and applique fabrics.
  • [0023]
    The method employs a foundation fabric and removable stabilizer, which bind together with concentric underlay stitches about a cutwork section binding said foundation fabric and removable stabilizer together. Examples of removable stabilizer material include, but are not limited to, water-soluble or heat-removable plastic, cloth or paperized fabric.
  • [0024]
    Concentric underlay stitches should be in rows of at least two, in which the rows are approximately parallel to each other. The normal, cross sectional distance between the inner and outer rows of concentric underlay stitches should be nearly as long as the width of the satin stitches, or similar concealing stitches, that will eventually cover said concentric underlay stitches.
  • [0025]
    Once said concentric underlay stitches are sewn and each cutwork section is defined, remove fabric from said cutwork section of said foundation fabric, using the inner most row of concentric underlay stitches as a cutting guide, leaving said removable stabilizer intact.
  • [0026]
    Place applique fabric on top of a cutwork section, covering said cutwork section and all associated concentric underlay stitches with said applique fabric.
  • [0027]
    Bind said applique fabric to said foundation fabric and removable stabilizer with more concentric underlay stitches. The second set of concentric underlay stitches should be stitched in the same manner as the first set, as at least two rows of stitches, approximately parallel to each other, and in approximately the same location as the first set of concentric underlay stitches.
  • [0028]
    Trim excess applique fabric from the applique cutwork embroidery. Use the outer row of concentric underlay stitches as a cut guide for cutting said applique fabric, without cutting any underlay stitches.
  • [0029]
    Apply zigzag stitches on top of concentric underlay stitches, overcasting the inner most and outer most rows of concentric underlay stitches to complete applique cutwork seam construction.
  • [0030]
    Apply, as appropriate, a decorative embroidery design stitched to applique fabric. The embroidery design may cascade over both applique and foundation fabrics, where appropriate, thereby allowing the decorative stitches of the applique cutwork embroidery design to take on a contiguous appearance across both foundation and applique fabrics.
  • [0031]
    Cover said applique cutwork seam with machine satin stitches, or similar concealing stitches.
  • [0032]
    Finish stitching the balance of the embroidery design onto the foundation fabric
  • [0033]
    Upon completely stitching an applique cutwork embroidery design, remove removable stabilizer. When the stabilizer has been removed by the appropriate method, as determined by the type of stabilizer used, the applique cutwork embroidery design is complete. No further trimming of fabric or threads is required.
  • BRIEF DESCRIPTION OF THE DRAWINGS
  • [0034]
    In the following detailed description, reference will be made to the attached drawings in which:
  • [0035]
    FIG. 1 is a top view of an applique cutwork embroidery design obtained by prior art;
  • [0036]
    FIG. 2 is a top view of an applique cutwork embroidery design obtained by my method;
  • [0037]
    FIG. 3 is a top view of a fabric with concentric underlay stitches and representative cut line before fabric is removed;
  • [0038]
    FIG. 4 is a top view of FIG. 3 with a cutwork section of said fabric removed;
  • [0039]
    FIG. 5 is a top view of FIG. 4 with an applique fabric placed on top;
  • [0040]
    FIG. 6 is a top view of FIG. 5 with said applique fabric stitched in place and trimmed about the outer row of concentric underlay stitches;
  • [0041]
    FIG. 7 is a top view of FIG. 6 with zigzag stitches applied on top of concentric underlay stitches;
  • [0042]
    FIG. 8 is a close up view of zigzag stitches overcasting all rows of concentric underlay stitches and associated fabric cut edges;
  • [0043]
    FIG. 9 is a top view of FIG. 7 with machine embroidery design stitched on top of and spanning foundation and applique fabrics;
  • [0044]
    FIG. 10 is a top view of FIG. 9 with satin stitches covering zigzag, concentric underlay stitches, and associated cut fabric edges.
  • DESCRIPTION OF THE PREFERRED EMBODIMENTS
  • [0045]
    For purposes of describing the preferred embodiment, the terminology used in the reference to the numbered components in the drawing is as follows:
      • 11. foundation fabric
      • 12. removable stabilizer
      • 13. concentric underlay stitches
      • 14. cutwork section
      • 15. cut fabric edge
      • 16. applique fabric
      • 17. zigzag stitches
      • 18. applique cutwork seam
      • 19. machine embroidery design
      • 20. satin stitches, or similar concealing stitches
  • [0056]
    Referring now to the drawings, FIG. 1 shows applique cutwork embroidery design performed by prior art.
  • [0057]
    As shown and describe in relation to FIGS. 2-10, the present invention uses at least three layers of material, a layer of foundation fabric 11 a removable stabilizer 12 and an applique fabric 16.
  • [0058]
    FIG. 3 illustrates the application of concentric underlay stitches 13 about a cutwork section 14 of an applique cutwork embroidery design, binding together foundation fabric 11 and removable stabilizer 12.
  • [0059]
    FIG. 4 illustrates removal of foundation fabric 11 from within the inner most row of concentric underlay stitches 13 about a cutwork section 14, leaving removable stabilizer 12 intact.
  • [0060]
    FIG. 5 illustrates application of applique fabric 16 to a cutwork section 14. Applique fabric covers said cutwork section and all associated concentric underlay stitches 13, before being stitched in place with concentric underlay stitches 13. Said concentric underlay stitches are stitched as at least two rows of stitches, approximately parallel to each other, and in approximately the same location as concentric underlay stitches shown in FIG. 3
  • [0061]
    FIG. 6 illustrates removal of applique fabric 16, about the outside of the concentric underlay stitches 13 using the outer row of said concentric stitches as a cut line guide.
  • [0062]
    FIG. 7 illustrates stitching of zigzag stitches 17 on top of and overcasting concentric underlay stitches.
  • [0063]
    FIG. 8 provides a close up view illustrating zigzag stitches 18 overcasting all concentric underlay stitches 13 and associated cut fabric edges 15, completing construction of applique cutwork seam 18.
  • [0064]
    FIG. 9 illustrates stitching machine embroidery design 19 onto both foundation fabric 11 and applique fabric 16.
  • [0065]
    FIG. 10 illustrates application of satin stitches 20 concealing applique cutwork seam 18 and associated cut fabric edges.
  • DESCRIPTION OF ALTERNATIVE EMBODIMENTS
  • [0066]
    With FIG. 9, a machine embroidery design is stitched onto both foundation fabric 11 and applique fabric 16, following completion of applique cutwork seam 18. Completion of zigzag stitches 17 before stitching a machine embroidery design 19 is not imperative. Zigzag stitches 17 may be sewn before, during, or after stitching machine embroidery design 19 onto applique fabric 16.
  • [0067]
    Furthermore, while stitching a machine embroidery design 17 onto applique and foundation fabrics 16, as an integral part of this method is a significant improvement over prior art, said embroidery design can be omitted in order to create a more traditional applique cutwork embroidery design.
  • [0068]
    Additionally, due to my method of constructing an applique cutwork seam 18 using a sewing machine, the choice of foundation and applique fabrics 11, 16, and combinations there of, can be expanded beyond the traditional use a lighter weight applique fabric with respect to a foundation fabric.
  • [0069]
    Still further, while stitches of an applique cutwork embroidery applied solely to said foundation fabric are sewn at the end of my method, said stitches may be applied before, during, or after the sequence of my invention, as outlined in the preferred embodiment, with minimal impact to the final result.
  • [0070]
    While only a few embodiments of the present invention have been described in detail hereinabove, all improvements and modifications to this invention within the scope of equivalents of the claim are covered by this invention. Some improvements include but are not limited to:
  • [0071]
    Using the same thread in the top and bobbin of sewing machine to produce a finished look on both sides of an applique cutwork embroidery design.
Citas de patentes
Patente citada Fecha de presentación Fecha de publicación Solicitante Título
US1723729 *9 Feb 19296 Ago 1929Max GoldbergApplique fabric
US1764848 *21 Dic 192517 Jun 1930Union Special Machine CoHem for sewed articles and method of making the same
US2122526 *8 Dic 19375 Jul 1938Swiss Knitting CompanyConnection between two edges of textile material
US2169590 *17 Mar 193815 Ago 1939Singer Mfg CoFinishing seam and method
US2215834 *5 Ago 193824 Sep 1940Magliano Louis MGarment pocket
US2323507 *4 Mar 19416 Jul 1943Singer Mfg CoReinforced seam
US3226732 *29 Abr 19644 Ene 1966Zerilli Ninfa JApplique article and method of manufacture
US4427472 *29 Sep 198224 Ene 1984Rosemary TragerApplique method
US4512274 *1 Sep 198223 Abr 1985Campbell Jr Richard JSeam for tube of cloth, fabric or flexible material
US4580514 *5 Mar 19848 Abr 1986Janome Sewing Machine Industry Co., Ltd.Multiple hem stitches and apparatus for forming the same
US4593418 *29 May 198410 Jun 1986Kimberly-Clark CorporationMethod and seam construction to significantly reduce seam leakage
US4754719 *18 Ago 19865 Jul 1988H. H. Cutler CompanyMeans of attaching appliques
US5003902 *13 Oct 19892 Abr 1991Superior Surgical Manufacturing Co. Inc.Seam having liquid proof threads stichably securing first and second liquid proof materials foldably enclosing a meltable adhesive polymer film and method of manufacture of same
US5141140 *9 Abr 199125 Ago 1992Moffett Hall Deborah JApparatus for the creation of fabric appliques and method of using same
US5241919 *27 Abr 19927 Sep 1993Chenille Concepts, Inc.Applique including chenille, backing, polymer film, and stitching
US5531176 *16 Jun 19942 Jul 1996Johnson; Adrienne M.Method of making an applique
US5537939 *14 May 199323 Jul 1996Cadcam Technology LimitedCutting and embroidery process
US5571039 *28 Oct 19945 Nov 1996Ford; Donna M.Abdominal support
US5974997 *23 Feb 19982 Nov 1999Amburgey; Terry GeneClothing article having a trimmed applique and method for making the same
US6155189 *29 Oct 19985 Dic 2000Beautiful Publications LlcStitching guide
US6176271 *1 Jun 199923 Ene 2001Scapa Group PlcFabric seams
US6241081 *18 Feb 19985 Jun 2001Voith Fabrics Heidenheim Gmbh & Co. KgModified spiral seam arrangement
US6267068 *15 Mar 199731 Jul 2001Astenjohnson, Inc.Reinforced stitched seam for high-tensile woven fabrics
US6364356 *24 Sep 19992 Abr 2002Milliken & CompanyAirbag cushion comprising sewn reinforcement seams
US6431221 *9 Abr 199913 Ago 2002Voith Fabrics Heidenheim Gmbh & Co. KgFabric and seam construction
US6718895 *30 Ago 200213 Abr 2004Terrence M. FortunaMethod for producing a raised applique on a substrate and articles made therefrom
US6883449 *9 Jun 200326 Abr 2005Fabtex Graphics Inc.Process and components for applying appliques
US20040244663 *9 Jun 20039 Dic 2004Burrell Scott R.Process and components for applying appliques
Citada por
Patente citante Fecha de presentación Fecha de publicación Solicitante Título
US8354154 *17 May 201015 Ene 2013Mason Patricia AHeat sealed appliqué having adhesive coated perimeter
US9309614 *5 Mar 201212 Abr 2016Data Stitch, Inc.Stitch pattern and method of embroidering
US20100291336 *17 May 201018 Nov 2010Patricia A MasonHeat sealed applique having adhesive coated perimeter
US20120222605 *5 Mar 20126 Sep 2012Data Stitch, Inc.Stitch Pattern and Method of Embroidering
US20130042797 *16 Ago 201121 Feb 2013Karl Christian Mattias BONDESSONMethod and System for Automatic Appliqué Design
CN102182025A *3 May 201114 Sep 2011惠州神田精密机械有限公司Counterpoint method of applique embroidery surface mounting
CN102182025B3 May 201117 Abr 2013惠州神田精密机械有限公司Counterpoint method of applique embroidery surface mounting
CN102517814A *27 Dic 201127 Jun 2012龙倡(广州)花边有限公司Thermal-cutting cloth-lifting embroidery lace and manufacturing method thereof
CN102926145A *29 Nov 201213 Feb 2013文登市芸祥绣品有限公司Cutting and embroidery combined technology
CN104074003A *2 Jul 20141 Oct 2014苏州市叶绣工艺厂Compound embroidery
CN104389123A *21 Oct 20144 Mar 2015邓昊Embroidery technique
CN104404723A *21 Oct 201411 Mar 2015邓昊Printed type embroidery process
CN104499218A *6 Ene 20158 Abr 2015南丹绣玉工艺品有限公司Embroidering method of Zhuang-nationality applique
CN104499220A *6 Ene 20158 Abr 2015南丹绣玉工艺品有限公司Embroidering method of Zhuang-nationality plain embroidery
CN104894769A *8 May 20159 Sep 2015广西艺术学院Brocade manufacturing method
CN105133222A *24 Oct 20159 Dic 2015贵州榜香郁苗绣服饰开发有限公司Broken thread embroidery method of Miao nationality costume embroidered piece
CN105155154A *9 Sep 201516 Dic 2015深圳思瑞普科技有限公司Embroidery machine alignment method based on belt image projection
CN105297306A *11 Sep 20153 Feb 2016王永刚Production method of laminated handcraft embroidery product
CN105544110A *19 Feb 20164 May 2016太仓市鑫泰针织有限公司Comprehensive embroidery method for chrysanthemum
CN105544111A *19 Feb 20164 May 2016太仓市鑫泰针织有限公司Double-sided different color and different shape embroidery stitching method
CN105648676A *4 Feb 20168 Jun 2016陈庆菊Southern Hunan affixed embroidered cloth manufacturing method
Clasificaciones
Clasificación de EE.UU.112/475.18
Clasificación internacionalD05B3/00, D05C17/00
Clasificación cooperativaD05C17/00
Clasificación europeaD05C17/00