US20070217253A1 - Non-volatile phase-change memory device and associated program-suspend-read operation - Google Patents
Non-volatile phase-change memory device and associated program-suspend-read operation Download PDFInfo
- Publication number
- US20070217253A1 US20070217253A1 US11/486,100 US48610006A US2007217253A1 US 20070217253 A1 US20070217253 A1 US 20070217253A1 US 48610006 A US48610006 A US 48610006A US 2007217253 A1 US2007217253 A1 US 2007217253A1
- Authority
- US
- United States
- Prior art keywords
- program
- write
- signal
- phase
- response
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
- A47L13/00—Implements for cleaning floors, carpets, furniture, walls, or wall coverings
- A47L13/10—Scrubbing; Scouring; Cleaning; Polishing
- A47L13/20—Mops
- A47L13/24—Frames for mops; Mop heads
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C8/00—Arrangements for selecting an address in a digital store
- G11C8/12—Group selection circuits, e.g. for memory block selection, chip selection, array selection
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
- G11C11/5678—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using amorphous/crystalline phase transition storage elements
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0004—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0061—Timing circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
- G11C2013/0078—Write using current through the cell
Definitions
- Embodiments of the invention relate generally to non-volatile semiconductor memory devices. More particularly, embodiments of the invention relate to non-volatile semiconductor memory devices including phase-change memory cells.
- Non-volatile memories can be found in a wide variety of consumer and industrial electronic devices such as cellular phones, personal computers, cameras, and personal digital assistants, to name but a few.
- An important property of non-volatile memories is their ability to retain stored data when disconnected from a power source. This property allows the non-volatile memories to conserve power, and it also reduces the risk of data loss in the event of unanticipated power failure.
- Flash memory is a popular choice for auxiliary memories of portable electronic devices for a variety of reasons, including its non-volatile properties, speed, high degree of integration, and high tolerance to physical shock.
- flash memory Compared with other forms of memory such as dynamic random access memory (DRAM), flash memory has similar read times, but significantly slower write times. For example, a typical read time for a flash memory cell varies between 20 and 120 ns, while a typical read time for a DRAM cell is about 50 ns. On the other hand, a typical write time for a flash memory cell is greater than 1 ⁇ s, while a typical write time for a DRAM cell is about 50 ns.
- DRAM dynamic random access memory
- flash memory Another difference between flash memory and other forms of memory is its endurance. On average, a flash memory cell can only be erased or rewritten on the order of 10 5 times before the cell fails. In contrast, DRAM cells can be erased or rewritten on the order of 10 15 times without failure.
- FeRAM ferroelectric random access memory
- MRAM magnetoresistive random access memory
- PRAM Phase-Change Random Access Memory
- a PRAM also known as an Ovonic Unified Memory (OUM)
- OUM Ovonic Unified Memory
- a phase-change material such as a chalcogenide alloy which is responsive to energy (e.g., thermal energy) so as to be stably transformed between crystalline and amorphous states.
- energy e.g., thermal energy
- the phase-change material of the PRAM exhibits a relatively low resistance in its crystalline state, and a relatively high resistance in its amorphous state.
- the low-resistance crystalline state is referred to as a ‘set’ state and is designated logic “0”
- the high-resistance amorphous state is referred to as a ‘reset’ state and is designated logic “1”.
- phase-change memory cell crystalline
- amorphous a phase-change material of the cell has a more well-ordered crystalline structure when compared to its amorphous state.
- a phase-change memory cell in its crystalline state need not be fully crystalline, and a phase-change memory cell in its amorphous state need not be fully amorphous.
- the phase-change material of a PRAM is reset to an amorphous state by joule heating of the material in excess of its melting point temperature for a relatively short period of time.
- the phase-change material is set to a crystalline state by heating the material below its melting point temperature for a longer period of time. In each case, the material is allowed to cool to its original temperature after the heat treatment. Generally, however, the cooling occurs much more rapidly when the phase-change material is reset to its amorphous state.
- phase-change material The speed and stability of the phase-change characteristics of the phase-change material are critical to the performance characteristics of the PRAM.
- chalcogenide alloys have been found to have suitable phase-change characteristics, and in particular, a compound including germanium (Ge), antimony (Sb) and tellurium (Te) (e.g., Ge 2 Sb 2 Te 5 or GST) exhibits a stable and high speed transformation between amorphous and crystalline states.
- FIGS. 1 A and 1 B illustrate a memory cell 10 in a ‘set’ state and in a ‘reset’ state, respectively.
- the memory cell 10 includes a phase-change resistive element 11 and a transistor 19 connected in series between a bit line BL and a reference potential (e.g., ground), with the transistor 19 being gated to a word line WL.
- a more simplified diagram of memory cell 10 is shown for example, in FIG. 2 .
- FIGS. 1A, 1B , and 2 are general schematic views only, that the configuration of phase-change resistive element 11 is presented as an example only, and that other configurations and connections with respect to phase-change resistive element 11 are possible.
- phase-change resistive element 11 may instead be connected in series with a diode 32 between bit line BL and word line WL, as shown in FIG. 3 .
- the memory cell shown in FIG. 2 is generally referred to as a metal oxide semiconductor (MOS) type PRAM cell
- the memory cell shown in FIG. 3 is generally referred to as a diode-type PRAM cell.
- Differences between the MOS type PRAM cell and the diode type PRAM cell include, for example, the cell size and required driving current.
- the diode type PRAM cell is generally smaller, and requires a higher driving current than the MOS type PRAM cell.
- phase-change resistive element 11 includes a top electrode 12 formed on a phase-change material 14 .
- top electrode 12 is electrically connected to a bit line BL of a PRAM memory array (not shown).
- a conductive bottom electrode contact (BEC) 16 is formed between phase-change material 14 and a conductive bottom electrode 18 .
- Access transistor 19 is electrically connected between bottom electrode 18 and the reference potential. As already suggested, the gate of access transistor 19 is electrically connected to word line WL of the PRAM cell array (not shown).
- phase-change material 14 is illustrated as being in its crystalline state. As described previously, this means that memory cell 10 is in a low-resistance ‘set’ state or logic ‘0’ state.
- FIG. 1B a portion of phase-change material 14 is illustrated as being amorphous. Again, this means that memory cell 10 is in a high-resistance ‘reset’ state or logic ‘1’ state.
- phase-change resistive element 11 is activated (or accessed) by operation of access transistor 19 which is responsive to a voltage of word line WL.
- access transistor 19 which is responsive to a voltage of word line WL.
- memory cell 10 is programmed according to the voltage of bit line BL.
- the voltage of bit line BL is controlled to establish a programming current ICELL which causes BEC 16 to act as a resistive heater which selectively programs phase-change material 14 in its ‘set’ and ‘reset’ states.
- FIG. 4 illustrates an example of temperature pulse characteristics of phase-change material as the phase-change material is programmed in the ‘set’ and ‘reset’ states.
- reference number 41 denotes the temperature pulse of the phase-change material programmed to its ‘reset’ state
- reference number 42 denotes the temperature pulse of the phase-change material programmed to its ‘set’ state.
- the phase-change material when the phase-change material is programmed to its ‘reset’ state, the temperature of the material is increased above its melting temperature Tm (e.g., 610° C.) for a relatively short period of time, and then allowed to rapidly cool.
- Tm melting temperature
- Tx crystallizing temperature
- the temperature of the material is increased to below its melting point Tm and above its crystallizing temperature Tx (e.g., 450° C.) for a longer period of time, and then allowed to cool more slowly.
- the fast and slow cooling of the ‘reset’ and ‘set’ programming operations are referred to in the art as fast “quenching” and slow “quenching”, respectively.
- the temperature range between the melting temperature Tm and the crystallizing temperature Tx is referred to as the “set window.”
- FIG. 5 is a graph illustrating the resistive characteristic (current versus voltage) of a phase-change material for each of its ‘set’ and ‘reset’ states.
- line 51 is representative of the resistive characteristic of a phase-change material in its ‘set’ state
- line 52 is representative of the same in its ‘reset’ state.
- the set and reset resistances differ substantially below a threshold voltage (e.g., 1 v), but become substantially equal to one another above the threshold voltage.
- a clamping transistor inserted in bit line BL may be used for this purpose.
- FIG. 6 is a simplified circuit diagram for explaining write and read operations of the phase-change memory cell.
- a bit line BL is coupled to a write driver 63 and a read circuit 64 .
- phase-change memory cell 10 Also connected to bit line BL are phase-change memory cell 10 , a pre-charge transistor 61 , and a select transistor 62 .
- phase-change memory cell 10 includes a phase-change element and transistor connected in series between the bit line BL and a reference potential (e.g., ground), where the transistor is gated to a word line WL.
- phase-change memory cell 10 may instead include a phase-change memory element and diode connected between bit line BL and word line WL.
- precharge transistor 61 (gated to a precharge control signal PREBL) is used to precharge bit line BL in a read and/or write operation, while select transistor 62 (gated to a y-address signal YSEL) is used to activate bit line BL.
- Write driver 63 typically includes a current mirror 65 for applying either a reset current RESET or a set current SET as a write current i write to bit line BL during a write operation. Reset current RESET and set current SET were discussed previously in connection with FIG. 4 .
- Read circuit 64 is functional in a read operation to apply a read current tread from a current source READ to bit line BL.
- a clamping transistor 66 which is gated to a clamp control signal V CLAMP , restricts bit line BL voltage to a region below the voltage threshold discussed above in connection with FIG. 5 .
- a sense-amplifier S/A compares the voltage of bit line BL with a reference voltage V REF , and outputs the comparison result as output data OUT.
- RWW memory comprises a memory array divided into one or more banks, where each bank has its own set of sense amplifiers and functions like an independent chip. For example, data can be read from one bank while data is being written to another bank.
- FIG. 7 shows an exemplary RWW memory comprising a memory array 70 divided into four banks BANK 0 through BANK 3 .
- the simultaneous read-while-write capability of the RWW memory can be advantageously used, for example, by storing frequently read data such as program code in one bank while reserving space in another memory bank for temporary data storage.
- No I/O interfaces for memory array 70 are shown in FIG. 7 ; however, RWW memories generally have the same pinout as a conventional NOR flash memory.
- each bank comprises a plurality of blocks, where each block comprises a plurality of memory cells.
- data is read or programmed in units of multiple memory cells.
- RWW NOR flash memory data is read or programmed in units of bytes or words, and erased an entire block at a time.
- RWW memories allow data to be read from one bank while data is written to another bank, simultaneous read and write operations cannot be performed on the same bank.
- this creates a serious performance problem because the time it takes to write data to a flash memory cell tends to be significantly larger than the time it takes read data from a flash memory cell.
- a read operation for one address in a bank may be substantially delayed while waiting for a write operation to another address in the same bank to finish.
- FIG. 8 is a waveform timing diagram illustrating one way to perform a write-suspend-read operation in a flash memory cell.
- a program signal PGM indicates a time t PGM required to program a flash memory cell.
- program signal PGM could be a program voltage applied to the flash memory cell while it is being programmed.
- the program operation is performed in one continuous interval, as indicated by the waveform labeled “normal write timing” in FIG. 8 .
- a suspend signal PGM_SUSPEND is asserted, causing the program operation to be temporarily suspended after a time t PGM — PRE .
- the read operation is then executed, and then following the read operation, a resume signal PGM_RESUME is asserted, causing the program operation to continue for a time t PGM -t PGM — PRE
- the timing for program signal PGM when there is an intervening read operation is shown by a waveform labeled “Write suspend/resume timing” in FIG. 8 .
- the flash cell is programmed according to the cumulative time that program signal PGM is asserted before and after the read operation.
- phase-change memory cells can generally be read much faster than they can be programmed (i.e., “set” or “reset”). Accordingly, it may be advantageous to interrupt a program operation to one address in a bank of a phase-change memory cell in order to perform a read operation from another address in the same bank.
- programming of a phase-change memory cell must start over from the beginning after an interruption occurs. In other words, the time that a phase-change material is heated, as illustrated by the temperature pulse characteristics of FIG. 4 , does not accumulate across interruptions.
- phase-change memory cells generally cannot be programmed or erased at the same time. Simultaneously programming or erasing an entire block of phase-change memory cells requires an untenably large drive current. Accordingly, a block of phase-change memory cells is typically programmed sequentially by applying a series of program pulses to the respective cells.
- phase-change memory cells have different programming requirements than conventional flash memory cells, the techniques commonly used to operate-flash memory devices are simply not applicable to operation of a PRAM device.
- embodiments of the invention provide efficient methods for performing a program-suspend-read operation on a PRAM device without significantly affecting the endurance or the power consumption of the device.
- PRAM operating method comprises programming a write data block comprising N unit program blocks in response to a program operation request, and suspending the program operation after programming M unit program blocks, where M is less than N, in response to a read operation request.
- the method further comprises executing the requested read operation, and resuming the programming of the write data block and programming (N ⁇ M) remaining unit program blocks.
- a method of executing a program operation in PRAM comprises programming phase-change memory cells on a unit program block by unit program block basis in response to a sequence of program pulses gated by a counter signal.
- the counter signal is suspended by a read operation request and resumed upon completion of the requested read operation.
- a PRAM comprises a memory cell array comprising a plurality of phase-change memory cells programmed by a write current.
- the PRAM further comprises a write driver circuit adapted to generate the write current and apply the write current to selected ones of the plurality of phase-change memory cells in response to a sequence of program pulses, and a program pulse generator adapted to generate the sequence of program pulses in response to a counter signal.
- the PRAM still further comprises a counter adapted to provide the counter signal during a program operation, suspend provision of the counter signal during a read operation interrupting the program operation, and resume provision of the counter signal upon completion of the interrupting read operation.
- a system including a PRAM device comprising a microprocessor receiving input data from an I/O circuit and storing the input data in a non-volatile memory system.
- the memory system comprises a memory cell array comprising a plurality of phase-change memory cells programmed by a write current, a write driver circuit adapted to generate the write current and apply the write current to selected ones of the plurality of phase-change memory cells in response to a sequence of program pulses, a program pulse generator adapted to generate the sequence of program pulses in response to a counter signal, and a counter adapted to provide the counter signal during a program operation, suspend provision of the counter signal during a read operation interrupting the program operation, and resume provision of the counter signal upon completion of the interrupting read operation.
- FIGS. 1A and 1B are schematic views of a phase-change memory cell in a set state and a reset state, respectively;
- FIG. 2 is a circuit diagram of a MOS-type phase-change memory cell
- FIG. 3 is a circuit diagram of a diode-type phase-change memory cell
- FIG. 4 is a graph showing temperature characteristics during programming of a phase-change memory cell
- FIG. 5 is a graph showing resistive characteristics of a phase-change memory cell
- FIG. 6 is a circuit diagram of write and read circuits of a phase-change memory cell
- FIG. 7 is a schematic diagram of a memory cell array in a RWW memory device
- FIG. 8 is a waveform timing diagram illustrating a program-suspend-read operation for a flash memory cell
- FIG. 9 is a waveform timing diagram illustrating a program-suspend-read operation for a phase-change memory cell according to an embodiment of the present invention.
- FIG. 10 is a block level diagram of a PRAM device according to an embodiment of the present invention.
- FIGS. 11A and 11B are waveform timing diagrams illustrating a program-suspend-read operation of the PRAM device shown in FIG. 10 ;
- FIG. 12 is a circuit diagram of a memory block, a bitline selection circuit, and a write driver circuit included in the PRAM device of FIG. 10 ;
- FIG. 13 is a circuit diagram of a write driver included in the PRAM device of FIG. 10 ;
- FIG. 14 is a circuit diagram of a sense amplifier circuit included in the PRAM device of FIG. 10 ;
- FIG. 15 is a waveform timing diagram for use in explaining the operation of the sense amplifier of FIG. 14 ;
- FIG. 16 is a block diagram of a system including a PRAM device according to embodiments of the present invention.
- embodiments of the invention relate to PRAM devices and associated methods of operation. More particularly, several embodiments of the invention provide PRAM devices and associated methods for performing a program-suspend-read operation.
- write data block refers to one or more phase-change memory cells where data is stored by a write or program operation.
- a write data block is generally divided into a plurality of “unit program blocks,” where each one of the unit program blocks includes the same number of memory cells, or in other words, has the same “unit program block size.”
- a write data block comprising a row of sixteen (16) phase-change memory cells may include four (4) unit program blocks, each comprising four (4) memory cells.
- the write data block including sixteen phase-change memory cells could comprise eight (8) unit program blocks, each comprising two (2) memory cells.
- a unit program block is programmed during an uninterrupted time interval denoted a “unit program block write period.”
- the phase-change memory cells of the corresponding unit program block are programmed in response to a sequence of program pulses generated in response to a counter signal.
- the counter signal is suspended by a read operation request and resumed upon completion of the requested read operation. Accordingly, the sequence of program pulses is also suspended during the requested read operation and resumed upon completion of the requested read operation.
- program pulse denotes an electrical current pulse causing a phase-change memory cell to become programmed, i.e., to assume the “set” or “reset” state.
- reset pulse denotes a program pulse causing a phase-change memory cell to assume the reset state
- set pulse denotes a program pulse causing a phase-change memory cell to assume the set state.
- duration and magnitude of the reset and set pulses are related to the duration and magnitude of corresponding temperature pulse characteristics of an associated phase-change memory cell such as those illustrated in FIG. 4 .
- a program pulse is typically applied either directly to a phase-change memory cell, or to a write driver circuit generating a write current to program the memory cell.
- phase-change memory cells are generally not programmed at the same time due to the large write current required, more than one phase-memory cell within a write data block can be usually be programmed at the same time. For example, two (2) or four (4) memory cells are often programmed within a common time interval.
- FIG. 9 is a waveform timing diagram illustrating the operation of a PRAM device according to one embodiment of the present invention.
- a pair of waveforms labeled “normal write timing” illustrate an uninterrupted write operation of a write data block in the PRAM device.
- a remaining set of four waveforms, labeled “Write suspend/resume timing,” illustrate a write-suspend-read operation of the write data block.
- a square waveform labeled “Write_Pulse” represents the timing of a sequence of program pulses applied to the PRAM device to program the write data block.
- the write data block is divided into first through fourth unit program blocks, wherein each unit program block comprises four (4) phase-change memory cells, or bits.
- the first through fourth unit program blocks are programmed in respective first through fourth unit program block write periods delimited by vertical lines in the waveforms labeled “Write_Pulse.”
- the first through fourth unit program block write periods are respectively labeled with corresponding values “00, ” “01,” “10,” and “11” of a counter signal.
- Each square pulse is illustrative of a time interval when one or more program pulses are generated to program selected phase-change memory cells of the write data block.
- the time interval represented by a square pulse will be referred to as a “program pulse interval” in this written description.
- Memory cells that are programmed during the same program pulse interval are considered to be programmed “simultaneously” for purposes of this written description, even though the precise timing of their programming may vary, e.g., where one phase-change memory cell is programmed in response to a “set pulse” while the other memory cell is programmed in response to a “reset pulse.”
- the memory cells programmed during the same program pulse interval are considered to be programmed simultaneously because there will be some overlap in the period in which respective set and/or reset pulses are applied to the programmed memory cells.
- each square pulse is labeled “x 2 ” to indicate that two (2) phase-change memory cells are programmed during each program pulse interval. Alternatively, there could be more or less than two (2) phase-change memory cells programmed during each program pulse interval.
- FIG. 9 illustrates a write data block divided into four (4) unit program blocks of four (4) memory cells each, wherein two (2) phase-change memory cells are programmed during each program pulse interval, the number of unit program blocks per write data block, the number of program pulse intervals per unit program block write period, and the number of memory cells programmed during each program pulse interval can be changed by a system designer as desired.
- the PRAM device To program the phase-change memory cells of the write data block described in relation to FIG. 9 , the PRAM device first receives a plurality of data input signals corresponding to the phase-change memory cells. If the data input signal corresponding to a particular memory cell has a logic level ‘1,’ the PRAM generates a reset pulse to place the memory cell in the reset state. Otherwise, if the data input signal corresponding to the memory cell has a logic level ‘0,’ the PRAM generates a set pulse to place the memory cell in the set state.
- a program signal PGM is used to represent periods in which the phase-change memory cells of the PRAM are programmed. Where program signal PGM is high, the memory cells are programmed, and where program signal PGM is low, the memory cells are not programmed.
- the first through fourth unit program blocks are programmed in an uninterrupted sequence, as evidenced by program signal PGM, which is high throughout the first through fourth unit program block write periods.
- program signal PGM which is high throughout the first through fourth unit program block write periods.
- the first unit program block is programmed, followed by a read operation, and then the second through fourth unit program blocks are programmed after the read operation finishes.
- the counter signal is incremented with each successive unit program block write period.
- a suspend signal PGM_SUSPEND is briefly asserted while the first unit program block is being programmed.
- PGM_SUSPEND programming of the write data block is suspended after the first unit program block is programmed.
- the read operation is then performed once programming of the write data block is suspended.
- a resume signal PGM_RESUME is asserted, allowing programming of the second through fourth unit program blocks to proceed to completion.
- the counter signal is suspended during the read operation, and it resumes upon completion of the read operation.
- FIG. 10 is a block level diagram of a PRAM device 100 adapted to perform a program-suspend-read operation according to one embodiment of the present invention.
- PRAM device 100 comprises a memory cell array 110 , which includes a plurality of memory blocks 111 through 11 n. Each of memory blocks 111 through 11 n comprises a plurality of phase-change memory cells.
- Memory cell array 110 is operatively connected to an address decoder 120 and a bitline selection circuit 130 within PRAM device 100 .
- PRAM device 100 further comprises a write driver circuit 140 and a sense amplifier circuit 150 operatively connected to bitline selection circuit 130 , a data I/O buffer 160 , a program pulse control circuit 170 comprising a counter 171 and a program pulse generator 172 and operatively connected to write driver circuit 140 , and a control unit 180 operatively connected to program pulse control circuit 170 .
- address decoder 120 decodes an address ADDR of the write data block to generate a wordline voltage and a plurality of bitline selection signals Y i .
- the write data block is selected by applying the wordline voltage to the write data block through a wordline bus WL, applying bitline selection signals Y i to bitline selection circuit 130 to select bitlines BL connected to the write data block.
- a plurality of input data signals DI representing data to be written to the write data block are applied to write driver circuit 140 from data I/O buffer 160 .
- the values of the input data signals DI are determined by data received in data I/O buffer 160 through an 10 bus DQ.
- Program pulse generator 172 applies program pulses to write driver circuit 140 in response to counter 171 , and write driver circuit 140 generates write currents to program selected memory cells in memory cell array 110 based on the program pulses and the values of input data signals DI.
- An exemplary operation and configuration of write driver circuit 140 is described below in relation to FIG. 13 .
- other examples of a write driver circuit compatible with the PRAM device are disclosed in related and commonly assigned U.S. patent application Ser. No. 10/829,807.
- the write currents generated by write driver circuit 140 are provided to bitline selection circuit 130 via a data line DL, and the write currents are respectively applied to selected bitlines BL through bitline selection circuit 130 .
- Write driver 140 preferably generates the write currents according to a timing sequence such as that illustrated in FIG. 9 .
- the bitlines are preferably driven in such a way unit program blocks in the write data block are programmed in a sequence.
- control unit 180 applies a start signal START to counter 171 to initialize a counter signal CNT output by counter 171 .
- start signal START to initialize a counter signal CNT output by counter 171 .
- counter signal CNT is represented by two bits and is initialized to “00.”
- Program pulse generator 172 receives counter signal CNT and sends program pulses to write driver circuit 140 based on the value of counter signal CNT. For instance, where counter signal CNT has the value “00,” program pulse generator 172 generates program pulses for programming a first unit program block; where the value of counter signal CNT is “01,” program pulse generator 172 generates program pulses for programming a second unit program block, and so on.
- control unit 180 To suspend the program operation in order to perform a read operation, control unit 180 generates a suspend signal SSPD to suspend counter 171 . As a result, program pulse generator 172 stops generating program pulses while the read operation is executed. Once the read operation is completed, control unit 180 generates a resume signal RESM to cause counter signal CNT to continue counting, and consequently to cause program pulse generator 172 to continue generating program pulses.
- control unit 180 generates a finish signal FNSH, which causes counter 171 to stop counting and program pulse generator 172 to stop generating program pulses.
- address decoder 120 decodes an address ADDR of the read data block to generate a wordline voltage and bitline selection signals Y i for selecting the memory cells of the read data block. Then, data values stored in the selected memory cells are transferred to sense amplifier circuit 150 via data line DL. The data values pass from data line DL through a clamping transistor 135 , and then to a sensing node NSA connected to sense amplifier 150 . Clamping transistor 135 is connected between data line DL and sensing node NSA and functions to clamp the bit line voltage at or below a threshold voltage suitable for reading the phase-change memory cells in memory cell array 110 .
- Sense amplifier 150 reads the data values by comparing the voltage of sense node NSA with a reference voltage Vref under the control of control signals nPSA and PMUX. Sense amplifier 150 then outputs the result of the comparison as an output signal D 0 .
- An exemplary configuration and operation of sense amplifier 150 is described below in relation to FIGS. 14 and 15 . Still other examples of sense amplifiers are described, for example, in related and commonly assigned U.S. patent application Ser. No. 11/316,017, the disclosure of which is hereby incorporated by reference.
- Output signal D 0 of sense amplifier 150 is applied to data I/O buffer 160 , which outputs corresponding output data on I/O bus DQ.
- data I/O buffer 160 The operation and internal circuit configuration of data I/O buffer 160 are well understood by those of ordinary skill, and therefore a detailed description of output buffer 160 is omitted here.
- FIGS. 11A and 11B are waveform timing diagrams illustrating program-suspend-read operations of PRAM device 100 shown in FIG. 10 .
- FIG. 11A shows a program-suspend-read operation wherein a program operation is suspended after a first unit program block is executed. While the program operation is suspended, a read operation is executed. Then, the program operation resumes and second, third, and fourth program operations are executed.
- FIG. 11B shows a program-suspend-read operation wherein a program operation is suspended after first and second unit program blocks are executed. While the program operation is suspended, a read operation is executed. Then, the program operation resumes and third and fourth program operations are executed.
- diagrams labeled “(a)” identify the operations performed by PRAM device 100 during particular time intervals; waveforms labeled “(b)” illustrate control signals output by control unit 180 ; waveforms labeled “(c)” illustrate counter signals output by counter 171 ; and, waveforms labeled “(d)” illustrate pulse signals generated by program pulse generator 172 .
- start signal STRT is briefly asserted to initiate a program operation.
- counter signal CNT is initialized to “00,” and a first pair of program pulses are asserted during a first program pulse interval of a first unit program block write period.
- the fact that a pair of program pulses are asserted during each program pulse interval is denoted by the labels “x 2 ” in FIGS. 11A and 11B .
- four program pulses are asserted to program four phase-change memory cells during each program pulse interval. Such a configuration could be indicated, for example, by labeling each program pulse interval with labels “x 4 .”
- Each unit program block write period in FIGS. 11A and 11B includes two (2) program pulse intervals and is delimited by vertical dashed lines.
- Set and reset pulses in FIGS. 11A and 11B are labeled P_SETn, and P_RSTn, respectively, where “n” ranges from 1 to 8.
- a second pair of program pulses are briefly asserted in the first unit program block write period after the first program pulse pair is asserted; however, before the second pair of program pulses finishes being asserted, program suspend signal SSPD is asserted. Suspend signal SSPD causes the program operation to be suspended as soon as the first unit program block write period finishes so that a read operation can be executed.
- FIG. 11B is similar to FIG. 11A , except that program suspend signal PGM_Suspend is asserted during the second unit program block write period and the read operation is executed between the second and third unit program block write periods. Accordingly, the first and second unit program block write periods follow immediately after each other, and the third and fourth unit program block write periods also follow immediately after each other.
- FIG. 12 is a circuit diagram showing an exemplary embodiment of memory block 111 , bitline selection circuit 130 , and write driver circuit 140 included in PRAM device 100 of FIG. 10 .
- memory block 111 comprises a plurality of diode-type phase-change memory cells MC 1 through MC 16 connected to a wordline WL and respectively connected to a plurality of bitlines BL 1 through BL 16 .
- Bitline selection circuit 130 comprises a plurality of bitline selection transistors T 1 through T 16 respectively connected between bitlines BL 1 through BL 16 and a plurality of data lines DL 1 through DL 16 .
- Bitline selection transistors T 1 through T 16 are respectively gated by bitline selection signals Y i through Y 16 to supply respective write currents from write driver 140 to memory block 111 .
- Write driver circuit 140 comprises a plurality of write drivers WD 1 through WD 16 respectively connected to data lines DL 1 through DL 16 and adapted to supply respective write currents to data lines DL 1 through DL 16 in response to respective data input signals DI 1 through DI 16 .
- FIG. 13 is a circuit diagram of an exemplary embodiment of a write driver WD 1 shown in FIG. 12 .
- write driver WD 1 comprises a pulse selection circuit 210 , a current control circuit 220 , and a current drive circuit 230 .
- Pulse selection circuit 210 outputs either a reset pulse P_RST 1 or a set pulse P_SET 1 in response to a logic level of data input signal DI 1 . Pulse selection circuit 210 functions to selectively apply reset pulse P_RST 1 or set pulse P_SET 1 to current control circuit 220 to write a logical ‘0’ or a logical ‘1’ to a corresponding selected phase-change memory cell.
- Current control circuit 220 receives a bias voltage DC_BIAS, and outputs a control signal CTRLS during a program pulse interval when reset pulse P_RST 1 or set pulse P_SET 1 is asserted. Where data input signal DI 1 has logic level ‘1,’ control signal CTRLS is output with a first voltage level while reset pulse P_RST is asserted. Where data input signal DI 1 has logic level ‘0,’ control signal CTRLS is output with a second voltage level while reset pulse P_RST is asserted.
- Current control circuit 220 functions to control the level of a current supplied to current drive circuit 230 during the program pulse interval when reset pulse P_RST 1 or set pulse P_SET 1 is asserted.
- reset pulse P_RST 1 When reset pulse P_RST 1 is asserted, the level of the current supplied to current drive circuit 230 is larger than when set pulse P_SET 1 is asserted.
- Current drive circuit 230 outputs a write current for programming the corresponding phase-change memory cell through a data line DL 1 .
- the write current is output in response to control signal CTRLS.
- Pulse selection circuit 210 comprises first and second transmission gates TG 1 and TG 2 , and first through third inverters INV 1 , INV 2 , and INV 3 .
- First transmission gate TG 1 outputs reset pulse P_RST 1 when data input signal DI 1 has logic level ‘1,’ and second transmission gate TG 2 outputs set pulse P_SET 1 when data input signal DI 1 has logic level ‘0.’
- Data input signal DI 1 passes through second and third inverters INV 2 and INV 3 before being output from pulse selection circuit 210 to current control circuit 220 .
- the second and third inverters INV 2 and INV 3 collectively act as a buffer for data input signal DI 1 .
- First inverter INV 1 inverts the output of the first or second transmission gate TG 1 or TG 2 and outputs the inverted output to the current drive circuit 230 .
- Current control circuit 220 comprises a first level transistor LTR 6 , a first level controller LVLC 1 , a second level controller LVLC 2 , a first control transistor TR 5 , and a second control transistor TR 7 .
- First level transistor LTR 6 comprises a positive metal-oxide semiconductor (PMOS) transistor with a source connected to a power source voltage VDD, and a gate and a drain connected to each other.
- First level controller LVLC 1 is turned on in response to bias voltage DC_BIAS and controls the level of control signal CTRLS.
- First level controller LVLC 1 comprises a first level transistor LTR 6 and a second level transistor LTR 2 that are connected in series between a drain of first level transistor LTR 6 and a drain of first control transistor TR 5 .
- Bias voltage DC_BIAS is applied to gates of first level transistor LTR 6 and second level transistor LTR 2 .
- Second level controller LVLC 2 controls control signal CTRLS to be generated at a first voltage level or a second voltage level based on the logic level of data input signal DI 1 output from pulse selection circuit 210 .
- Second level controller LVLC 2 includes a third level transistor LTR 3 and a fourth level transistor LTR 4 that are connected in series between the drain of first level transistor LTR 6 and the drain of first control transistor TR 5 .
- Input data signal DI 1 is applied to gates of third level transistor LTR 3 and fourth level transistor LTR 4 .
- First through fourth level transistors LTR 6 , LTR 2 , LTR 3 , and LTR 4 each comprise an NMOS transistor.
- First control transistor TR 5 controls the operation of current control circuit 220 in response to reset pulse P_RST 1 or set pulse P_SET.
- First control transistor TR 5 has a drain commonly connected to sources of second level transistor LTR 2 and fourth level transistor LTR 4 , a source connected to ground VSS, and a gate to which reset pulse P_RST 1 or set pulse P_SET 1 is applied.
- First control transistor TR 5 each comprise an NMOS transistor.
- Second control transistor-TR 7 turns off first level transistor LTR 6 whenever neither of reset pulse P_RST 1 or set pulse P_SET 1 is asserted, and outputs control signal CTRLS with a third voltage level.
- Second control transistor TR 7 has a source connected to power source voltage VDD, a drain connected to the drain of first level transistor LTR 6 , and a gate to which reset pulse P_RST 1 or set pulse P_SET 1 is applied.
- Second control transistor TR 7 comprises a PMOS transistor.
- Current drive circuit 230 includes a pull up transistor PUTR and a pull down transistor PDTR.
- Pull up transistor PUTR has a source connected to power source voltage VDD, a drain connected to a first node N 1 , and a gate to which control signal CTRLS is applied.
- Pull down transistor PDTR has a drain connected to first node N 1 , a source connected to ground VSS, and a gate to which inverted reset pulse P_RST 1 or set pulse P_SET 1 is applied.
- Pull down transistor PDTR is turned off and the pull up transistor PUTR is turned on during the program pulse interval when reset pulse P_RST 1 or set pulse P_SET is asserted.
- the degree to which pull up transistor PUTR is turned on is controlled according to the voltage level of control signal CTRLS, and accordingly, the amount of write current applied to the phase-change memory array through data line DL depends on the voltage level of control signal CTRLS.
- Pull up transistor PUTR is turned off and pull down transistor PDTR is turned on whenever neither of reset pulse P_RST 1 or set pulse P_SET is asserted.
- first node N 1 is connected to ground VSS and discharged.
- First level controller LVLC 1 is turned on in response to bias voltage DC_BIAS.
- set pulse P_SET 1 is applied to first control transistor TR 5 and second control transistor TR 7 of current control circuit 220 . While set pulse P_SET is asserted, first control transistor TR 5 is turned on, second control transistor TR 7 is turned off, and first level transistor LTR 6 is turned on.
- Third and fourth level transistors LTR 3 and LTR 4 are turned off when input data signal DI 1 has logic level ‘0.’
- control signal CTRLS is generated with the first voltage level (e.g, a “low” voltage level) to turn on pull up transistor PUTR.
- set pulse P_SET is asserted
- pull up transistor PUTR is turned on and pull down transistor PDTR is turned off.
- set pulse P_SET 1 is not asserted
- second control transistor TR 7 is turned on and control signal CTRLS is generated with the second voltage level, e.g., a “high” voltage level.
- pull up transistor PUTR is turned off and pull down transistor PDTR is turned on, thereby discharging the first node N 1 to ground VSS.
- input data signal DI 1 has logic level ‘1,’ reset pulse P_RST 1 is asserted and applied to first control transistor TR 5 and second control transistor TR 7 of current control circuit 220 . While reset pulse P_RST 1 is asserted, first control transistor TR 5 is turned on, second control transistor TR 7 is turned off, and first level transistor LTR 6 is turned on.
- Third and fourth level transistors LTR 3 and LTR 4 of second level controller LVLC 2 are turned on when input data signal DI 1 has logic level ‘1.’ Where first control transistor CRT 1 , and first through fourth level transistors LTR 6 , LTR 2 , LTR 3 , and LTR 4 are all turned on, control signal CTRLS is generated with the second voltage level to turn on pull up transistor PUTR. The second voltage level is even lower than the first voltage level generated when set signal P_SET 1 is asserted.
- control signal CTRLS assumes the second voltage level.
- the level of control signal CTRLS decreases further and pull up transistor PUTR is turned on more than when only first and second level transistors LTR 6 and LTR 2 are turned on.
- the level of the write current is higher when reset pulse P_RST 1 is asserted than when set pulse P_SET 1 is asserted.
- reset pulse P_RST 1 is applied to current control circuit 220 and the level of the write current through data line DL 1 is higher than when set pulse P_SET 1 is applied to current control circuit 220 when input data signal DI 1 has logic level ‘0.’
- second control transistor TR 7 is turned on and control signal CTRLS is generated with the third voltage level, which is a “high” level that turns off pull up transistor PUTR.
- first node N 1 is discharged to ground VSS through pull down transistor PDTR.
- FIG. 14 is a circuit diagram of sense amplifier 150 shown in FIG. 10 .
- Sense amplifier 150 of FIG. 14 includes a sensing portion 310 , a latch portion 320 , and a dummy latch portion 330 .
- at least sensing portion 310 of sense amplifier 150 is driven by a boosted voltage VSA, which is greater than an internal power supply voltage VCC.
- Sensing portion 310 includes a sensing circuit 311 and an equalizer circuit 312 .
- Sensing portion 310 of this example includes p-type transistors P 1 through P 3 and n-type transistor N 1 through N 5 all connected as shown in FIG. 5 between the boosted voltage VSA and ground.
- Sensing node NSA is connected to the gate of transistor N 1
- a read threshold voltage Vref is connected to the gate of transistor N 2 .
- Equalizer circuit 312 is connected across sensing circuit nodes Na and Nb as shown; and control signal nPSA is applied to the gates of transistors P 3 , N 3 , N 4 and N 5 .
- Latch portion 320 of this example includes an inverter circuit 321 and a latch circuit 322 .
- inverter circuit 321 is connected to sensing circuit node Na of sensing portion 310 , and includes p-type transistors P 6 and P 7 , n-type transistors N 6 and N 7 , and inverter IN 1 .
- Latch circuit 322 includes inverters IN 2 through IN 4 .
- latch portion 320 is driven by internal power supply voltage VCC.
- control signal PMUX is applied to the input of inverter IN 1 and to the gate of transistor N 7 .
- Dummy latch portion 330 of this example is driven by VCC and includes an n-type transistor N 8 and a p-type transistor P 8 , each having gates connected to the sensing circuit node Nb. As will be appreciated by those skilled in the art, dummy latch portion 330 is provided to match the load of latch portion 320 across sensing portion 310 .
- sensing amplifier 150 shown in FIG. 14 is described below in relation to FIG. 15 .
- the voltage of control signal nPSA is boosted voltage VSA. Accordingly, sensing circuit 311 is disabled, and equalizing circuit 312 is enabled to bring sensing circuit nodes Na and Nb to ground (0 v). Further, control signal PMUX is low (0 v), thus disabling inverter circuit 321 .
- the output D 0 of sense amplifier 150 thus remains unchanged.
- the voltage of sense node NSA either remains at VSA or drops to about 1V, depending on whether a read memory cell is in its ‘reset’ or ‘set” state.
- Sensing circuit node Na goes to VSA in the case of the ‘set’ state where sense node NSA voltage (about 1 v) is less than reference voltage Vref, and sensing circuit node Na goes to 0v in the case of the ‘reset’ state where the NSA voltage (VSA) is greater than reference voltage Vref.
- control signal PMUX is brought to VCC to enable inverter circuit 321 .
- Inverter circuit 321 inverts either voltage VSA (high) or 0 v (low) of internal sensing circuit node Na, and drives latch circuit 322 accordingly to either flip or maintain the output data D 0 .
- FIG. 16 is a simplified block diagram of a system containing PRAM device 100 described above.
- PRAM device 100 can function as random access memory of the system, or as a mass storage device of the system, or both.
- PRAM device 100 is connected to a microprocessor 500 via one or more data buses L 3 .
- Microprocessor 500 exchanges data over one or more data buses L 2 with an I/O interface 600 , and the I/O interface 600 transmits and receives data over input/output data lines L 1 .
- the input/output data lines L 1 may be operatively coupled to a computer peripheral bus, a high speed digital communication transmission line, or an antenna system.
- a power distribution system L 4 supplies power from a power supply 400 to PRAM device 100 , microprocessor 500 and I/O interface 600 .
- the system of FIG. 16 may be utilized in both portable and non-portable appliances.
- power supply 400 will typical contain one or more battery cells.
- Phase-change memory devices such as PRAM devices, are particularly suited to battery-powered applications in view of their non-volatile memory characteristics.
- portable appliances include notebook computers, digital cameras, a personal digital assistants (PDA's), and mobile communication devices, such as mobile telephones, mobile email devices, and mobile gaming devices.
- PDA's personal digital assistants
- mobile communication devices such as mobile telephones, mobile email devices, and mobile gaming devices.
- Non-limiting examples of non-portable appliances include desk-top computers, network servers, and other computing devices typically driven by fixed commercial or residential power systems (such as AC power systems).
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Semiconductor Memories (AREA)
- Read Only Memory (AREA)
Abstract
Description
- 1. Field of the Invention
- Embodiments of the invention relate generally to non-volatile semiconductor memory devices. More particularly, embodiments of the invention relate to non-volatile semiconductor memory devices including phase-change memory cells.
- This application claims priority to Korean Patent Application No. 10-2006-0024328, filed on Mar. 16, 2006, the subject matter of which is hereby incorporated by reference in its entirety.
- 2. Description of the Related Art
- Non-volatile memories can be found in a wide variety of consumer and industrial electronic devices such as cellular phones, personal computers, cameras, and personal digital assistants, to name but a few. An important property of non-volatile memories is their ability to retain stored data when disconnected from a power source. This property allows the non-volatile memories to conserve power, and it also reduces the risk of data loss in the event of unanticipated power failure.
- Perhaps the most common form of non-volatile memory currently is flash memory. Flash memory is a popular choice for auxiliary memories of portable electronic devices for a variety of reasons, including its non-volatile properties, speed, high degree of integration, and high tolerance to physical shock.
- Compared with other forms of memory such as dynamic random access memory (DRAM), flash memory has similar read times, but significantly slower write times. For example, a typical read time for a flash memory cell varies between 20 and 120 ns, while a typical read time for a DRAM cell is about 50 ns. On the other hand, a typical write time for a flash memory cell is greater than 1 μs, while a typical write time for a DRAM cell is about 50 ns.
- Another difference between flash memory and other forms of memory is its endurance. On average, a flash memory cell can only be erased or rewritten on the order of 105 times before the cell fails. In contrast, DRAM cells can be erased or rewritten on the order of 1015 times without failure.
- Because of flash memory's relatively long write times and low endurance, researchers have looked to alternative technologies for next generation non-volatile memories. Among the more promising alternatives, there are ferroelectric random access memory (FeRAM), magnetoresistive random access memory (MRAM), and Phase-Change Random Access Memory (PRAM). Each of these alternatives tends to have read and write times less than 100 ns and endurance on the order of 1013 or greater. In addition, each of the above alternatives tends to have a lower operating current than flash memory.
- A PRAM, also known as an Ovonic Unified Memory (OUM), includes a phase-change material such as a chalcogenide alloy which is responsive to energy (e.g., thermal energy) so as to be stably transformed between crystalline and amorphous states. Such a PRAM is disclosed, for example, in U.S. Pat. Nos. 6,487,113 and 6,480,438.
- The phase-change material of the PRAM exhibits a relatively low resistance in its crystalline state, and a relatively high resistance in its amorphous state. In conventional nomenclature, the low-resistance crystalline state is referred to as a ‘set’ state and is designated logic “0”, while the high-resistance amorphous state is referred to as a ‘reset’ state and is designated logic “1”.
- The terms “crystalline” and “amorphous” are relative terms in the context of phase-change materials. That is, when a phase-change memory cell is said to be in its crystalline state, one skilled in the art will understand that the phase-change material of the cell has a more well-ordered crystalline structure when compared to its amorphous state. A phase-change memory cell in its crystalline state need not be fully crystalline, and a phase-change memory cell in its amorphous state need not be fully amorphous.
- Generally, the phase-change material of a PRAM is reset to an amorphous state by joule heating of the material in excess of its melting point temperature for a relatively short period of time. On the other hand, the phase-change material is set to a crystalline state by heating the material below its melting point temperature for a longer period of time. In each case, the material is allowed to cool to its original temperature after the heat treatment. Generally, however, the cooling occurs much more rapidly when the phase-change material is reset to its amorphous state.
- The speed and stability of the phase-change characteristics of the phase-change material are critical to the performance characteristics of the PRAM. As suggested above, chalcogenide alloys have been found to have suitable phase-change characteristics, and in particular, a compound including germanium (Ge), antimony (Sb) and tellurium (Te) (e.g., Ge2Sb2Te5 or GST) exhibits a stable and high speed transformation between amorphous and crystalline states.
- Figures (FIGS.). 1A and 1B illustrate a
memory cell 10 in a ‘set’ state and in a ‘reset’ state, respectively. In this example, thememory cell 10 includes a phase-changeresistive element 11 and atransistor 19 connected in series between a bit line BL and a reference potential (e.g., ground), with thetransistor 19 being gated to a word line WL. A more simplified diagram ofmemory cell 10 is shown for example, inFIG. 2 . It should be noted thatFIGS. 1A, 1B , and 2 are general schematic views only, that the configuration of phase-changeresistive element 11 is presented as an example only, and that other configurations and connections with respect to phase-changeresistive element 11 are possible. For example, phase-changeresistive element 11 may instead be connected in series with a diode 32 between bit line BL and word line WL, as shown inFIG. 3 . - The memory cell shown in
FIG. 2 is generally referred to as a metal oxide semiconductor (MOS) type PRAM cell, and the memory cell shown inFIG. 3 is generally referred to as a diode-type PRAM cell. Differences between the MOS type PRAM cell and the diode type PRAM cell include, for example, the cell size and required driving current. The diode type PRAM cell is generally smaller, and requires a higher driving current than the MOS type PRAM cell. - In each of
FIGS. 1A and 1B , phase-changeresistive element 11 includes atop electrode 12 formed on a phase-change material 14. In this example,top electrode 12 is electrically connected to a bit line BL of a PRAM memory array (not shown). A conductive bottom electrode contact (BEC) 16 is formed between phase-change material 14 and aconductive bottom electrode 18.Access transistor 19 is electrically connected betweenbottom electrode 18 and the reference potential. As already suggested, the gate ofaccess transistor 19 is electrically connected to word line WL of the PRAM cell array (not shown). - In
FIG. 1A , phase-change material 14 is illustrated as being in its crystalline state. As described previously, this means thatmemory cell 10 is in a low-resistance ‘set’ state or logic ‘0’ state. InFIG. 1B , a portion of phase-change material 14 is illustrated as being amorphous. Again, this means thatmemory cell 10 is in a high-resistance ‘reset’ state or logic ‘1’ state. - The set and reset states of
memory cell 10 ofFIGS. 1A and 1B are established by controlling the magnitude and duration of current flow throughBEC 16. That is, phase-changeresistive element 11 is activated (or accessed) by operation ofaccess transistor 19 which is responsive to a voltage of word line WL. When activated,memory cell 10 is programmed according to the voltage of bit line BL. The voltage of bit line BL is controlled to establish a programming current ICELL which causesBEC 16 to act as a resistive heater which selectively programs phase-change material 14 in its ‘set’ and ‘reset’ states. -
FIG. 4 illustrates an example of temperature pulse characteristics of phase-change material as the phase-change material is programmed in the ‘set’ and ‘reset’ states. In particular,reference number 41 denotes the temperature pulse of the phase-change material programmed to its ‘reset’ state, andreference number 42 denotes the temperature pulse of the phase-change material programmed to its ‘set’ state. - As shown in
FIG. 4 , when the phase-change material is programmed to its ‘reset’ state, the temperature of the material is increased above its melting temperature Tm (e.g., 610° C.) for a relatively short period of time, and then allowed to rapidly cool. In contrast, when the phase-change material is programmed to its ‘set’ state, the temperature of the material is increased to below its melting point Tm and above its crystallizing temperature Tx (e.g., 450° C.) for a longer period of time, and then allowed to cool more slowly. The fast and slow cooling of the ‘reset’ and ‘set’ programming operations are referred to in the art as fast “quenching” and slow “quenching”, respectively. The temperature range between the melting temperature Tm and the crystallizing temperature Tx is referred to as the “set window.” -
FIG. 5 is a graph illustrating the resistive characteristic (current versus voltage) of a phase-change material for each of its ‘set’ and ‘reset’ states. In particular,line 51 is representative of the resistive characteristic of a phase-change material in its ‘set’ state, andline 52 is representative of the same in its ‘reset’ state. As shown, the set and reset resistances differ substantially below a threshold voltage (e.g., 1 v), but become substantially equal to one another above the threshold voltage. In order to maintain the necessary sensing margin during reading operations, it is necessary to restrict the voltage of bit line BL to a region below the voltage threshold. As explained below with reference toFIG. 6 , a clamping transistor inserted in bit line BL may be used for this purpose. -
FIG. 6 is a simplified circuit diagram for explaining write and read operations of the phase-change memory cell. As shown, a bit line BL is coupled to awrite driver 63 and aread circuit 64. Also connected to bit line BL are phase-change memory cell 10, apre-charge transistor 61, and aselect transistor 62. - In this example, phase-
change memory cell 10 includes a phase-change element and transistor connected in series between the bit line BL and a reference potential (e.g., ground), where the transistor is gated to a word line WL. As suggested previously, other configurations of the phase-change memory cell 10 are possible. For example, phase-change memory cell 10 may instead include a phase-change memory element and diode connected between bit line BL and word line WL. - As those skilled in the art will appreciate, precharge transistor 61 (gated to a precharge control signal PREBL) is used to precharge bit line BL in a read and/or write operation, while select transistor 62 (gated to a y-address signal YSEL) is used to activate bit line BL.
- Write
driver 63 typically includes acurrent mirror 65 for applying either a reset current RESET or a set current SET as a write current iwrite to bit line BL during a write operation. Reset current RESET and set current SET were discussed previously in connection withFIG. 4 . - Read
circuit 64 is functional in a read operation to apply a read current tread from a current source READ to bit line BL. A clampingtransistor 66, which is gated to a clamp control signal VCLAMP, restricts bit line BL voltage to a region below the voltage threshold discussed above in connection withFIG. 5 . A sense-amplifier S/A compares the voltage of bit line BL with a reference voltage VREF, and outputs the comparison result as output data OUT. - As with other types of non-volatile memory devices, there are a variety of ways to organize and operate phase-change memory cells and associated circuitry within a PRAM memory architecture to improve overall system performance. One technique, which is commonly used in NOR flash memories, is known as a read-while-write (RWW) memory. A RWW memory comprises a memory array divided into one or more banks, where each bank has its own set of sense amplifiers and functions like an independent chip. For example, data can be read from one bank while data is being written to another bank.
-
FIG. 7 shows an exemplary RWW memory comprising amemory array 70 divided into four banks BANK0 through BANK3. The simultaneous read-while-write capability of the RWW memory can be advantageously used, for example, by storing frequently read data such as program code in one bank while reserving space in another memory bank for temporary data storage. No I/O interfaces formemory array 70 are shown inFIG. 7 ; however, RWW memories generally have the same pinout as a conventional NOR flash memory. - As shown in
FIG. 7 , each bank comprises a plurality of blocks, where each block comprises a plurality of memory cells. In a typical RWW memory, data is read or programmed in units of multiple memory cells. For example, in a RWW NOR flash memory, data is read or programmed in units of bytes or words, and erased an entire block at a time. - Although RWW memories allow data to be read from one bank while data is written to another bank, simultaneous read and write operations cannot be performed on the same bank. In flash memory devices, this creates a serious performance problem because the time it takes to write data to a flash memory cell tends to be significantly larger than the time it takes read data from a flash memory cell. As a result, a read operation for one address in a bank may be substantially delayed while waiting for a write operation to another address in the same bank to finish.
- To address this problem, researchers have developed a technique for temporarily suspending a write operation in a flash memory to allow a read operation to proceed without substantial delay. This technique is referred to as a write-suspend-read, or program-suspend-read operation.
FIG. 8 is a waveform timing diagram illustrating one way to perform a write-suspend-read operation in a flash memory cell. - Referring to
FIG. 8 , a program signal PGM indicates a time tPGM required to program a flash memory cell. For instance, program signal PGM could be a program voltage applied to the flash memory cell while it is being programmed. In the absence of an intervening read operation, the program operation is performed in one continuous interval, as indicated by the waveform labeled “normal write timing” inFIG. 8 . However, where there is an intervening read operation for another address in the same bank as the flash memory cell being programmed, a suspend signal PGM_SUSPEND is asserted, causing the program operation to be temporarily suspended after a time tPGM— PRE. The read operation is then executed, and then following the read operation, a resume signal PGM_RESUME is asserted, causing the program operation to continue for a time tPGM-tPGM— PRE The timing for program signal PGM when there is an intervening read operation is shown by a waveform labeled “Write suspend/resume timing” inFIG. 8 . - Even when the program operation is interrupted as illustrated in
FIG. 8 the total time required to perform the program operation does not change. In other words, the flash cell is programmed according to the cumulative time that program signal PGM is asserted before and after the read operation. - Various flash memory cells allowing a read operation to interrupt a program interruption are disclosed, for example, in U.S. Pat. No. 5,287,469 to Tsuboi, U.S. Pat. No. 5,822,244 to Hansen et al., and U.S. Pat. No. 6,930,925 to Guo et al.
- Like flash memory cells, phase-change memory cells can generally be read much faster than they can be programmed (i.e., “set” or “reset”). Accordingly, it may be advantageous to interrupt a program operation to one address in a bank of a phase-change memory cell in order to perform a read operation from another address in the same bank. However, unlike flash memory cells, programming of a phase-change memory cell must start over from the beginning after an interruption occurs. In other words, the time that a phase-change material is heated, as illustrated by the temperature pulse characteristics of
FIG. 4 , does not accumulate across interruptions. - Also unlike flash memory cells, an entire block of phase-change memory cells generally cannot be programmed or erased at the same time. Simultaneously programming or erasing an entire block of phase-change memory cells requires an untenably large drive current. Accordingly, a block of phase-change memory cells is typically programmed sequentially by applying a series of program pulses to the respective cells.
- Because phase-change memory cells have different programming requirements than conventional flash memory cells, the techniques commonly used to operate-flash memory devices are simply not applicable to operation of a PRAM device.
- In recognition of several unique aspects of PRAM devices, embodiments of the invention provide efficient methods for performing a program-suspend-read operation on a PRAM device without significantly affecting the endurance or the power consumption of the device.
- According to one embodiment of the invention, PRAM operating method is provided. The method comprises programming a write data block comprising N unit program blocks in response to a program operation request, and suspending the program operation after programming M unit program blocks, where M is less than N, in response to a read operation request. The method further comprises executing the requested read operation, and resuming the programming of the write data block and programming (N−M) remaining unit program blocks.
- According to another embodiment of the invention, a method of executing a program operation in PRAM is provided. The method comprises programming phase-change memory cells on a unit program block by unit program block basis in response to a sequence of program pulses gated by a counter signal. The counter signal is suspended by a read operation request and resumed upon completion of the requested read operation.
- According to yet another embodiment of the invention, a PRAM is provided. The PRAM comprises a memory cell array comprising a plurality of phase-change memory cells programmed by a write current. The PRAM further comprises a write driver circuit adapted to generate the write current and apply the write current to selected ones of the plurality of phase-change memory cells in response to a sequence of program pulses, and a program pulse generator adapted to generate the sequence of program pulses in response to a counter signal. The PRAM still further comprises a counter adapted to provide the counter signal during a program operation, suspend provision of the counter signal during a read operation interrupting the program operation, and resume provision of the counter signal upon completion of the interrupting read operation.
- According to still another embodiment of the invention, a system including a PRAM device is provided. The system comprises a microprocessor receiving input data from an I/O circuit and storing the input data in a non-volatile memory system. The memory system comprises a memory cell array comprising a plurality of phase-change memory cells programmed by a write current, a write driver circuit adapted to generate the write current and apply the write current to selected ones of the plurality of phase-change memory cells in response to a sequence of program pulses, a program pulse generator adapted to generate the sequence of program pulses in response to a counter signal, and a counter adapted to provide the counter signal during a program operation, suspend provision of the counter signal during a read operation interrupting the program operation, and resume provision of the counter signal upon completion of the interrupting read operation.
- The invention is described below in relation to several embodiments illustrated in the accompanying drawings. Throughout the drawings like reference numbers indicate like exemplary elements, components, or steps. In the drawings:
-
FIGS. 1A and 1B are schematic views of a phase-change memory cell in a set state and a reset state, respectively; -
FIG. 2 is a circuit diagram of a MOS-type phase-change memory cell; -
FIG. 3 is a circuit diagram of a diode-type phase-change memory cell; -
FIG. 4 is a graph showing temperature characteristics during programming of a phase-change memory cell; -
FIG. 5 is a graph showing resistive characteristics of a phase-change memory cell; -
FIG. 6 is a circuit diagram of write and read circuits of a phase-change memory cell; -
FIG. 7 is a schematic diagram of a memory cell array in a RWW memory device; -
FIG. 8 is a waveform timing diagram illustrating a program-suspend-read operation for a flash memory cell; -
FIG. 9 is a waveform timing diagram illustrating a program-suspend-read operation for a phase-change memory cell according to an embodiment of the present invention; -
FIG. 10 is a block level diagram of a PRAM device according to an embodiment of the present invention; -
FIGS. 11A and 11B are waveform timing diagrams illustrating a program-suspend-read operation of the PRAM device shown inFIG. 10 ; -
FIG. 12 is a circuit diagram of a memory block, a bitline selection circuit, and a write driver circuit included in the PRAM device ofFIG. 10 ; -
FIG. 13 is a circuit diagram of a write driver included in the PRAM device ofFIG. 10 ; -
FIG. 14 is a circuit diagram of a sense amplifier circuit included in the PRAM device ofFIG. 10 ; -
FIG. 15 is a waveform timing diagram for use in explaining the operation of the sense amplifier ofFIG. 14 ; and, -
FIG. 16 is a block diagram of a system including a PRAM device according to embodiments of the present invention. - Exemplary embodiments of the invention are described below with reference to the corresponding drawings. These embodiments are presented as teaching examples. The actual scope of the invention is defined by the claims that follow.
- In general, embodiments of the invention relate to PRAM devices and associated methods of operation. More particularly, several embodiments of the invention provide PRAM devices and associated methods for performing a program-suspend-read operation.
- The terms “write” and “program” are used interchangeably in this written description to denote operations for storing data in one or more phase-change memory cells of a PRAM device. The term “write data block” refers to one or more phase-change memory cells where data is stored by a write or program operation. A write data block is generally divided into a plurality of “unit program blocks,” where each one of the unit program blocks includes the same number of memory cells, or in other words, has the same “unit program block size.” For example, a write data block comprising a row of sixteen (16) phase-change memory cells may include four (4) unit program blocks, each comprising four (4) memory cells. Alternatively, the write data block including sixteen phase-change memory cells could comprise eight (8) unit program blocks, each comprising two (2) memory cells.
- A unit program block is programmed during an uninterrupted time interval denoted a “unit program block write period.” Within each unit program block write period, the phase-change memory cells of the corresponding unit program block are programmed in response to a sequence of program pulses generated in response to a counter signal. The counter signal is suspended by a read operation request and resumed upon completion of the requested read operation. Accordingly, the sequence of program pulses is also suspended during the requested read operation and resumed upon completion of the requested read operation.
- The term “program pulse” denotes an electrical current pulse causing a phase-change memory cell to become programmed, i.e., to assume the “set” or “reset” state. In particular, the term “reset pulse” denotes a program pulse causing a phase-change memory cell to assume the reset state, and the term “set pulse” denotes a program pulse causing a phase-change memory cell to assume the set state. In general, the duration and magnitude of the reset and set pulses are related to the duration and magnitude of corresponding temperature pulse characteristics of an associated phase-change memory cell such as those illustrated in
FIG. 4 . - A program pulse is typically applied either directly to a phase-change memory cell, or to a write driver circuit generating a write current to program the memory cell.
- Although an entire write data block of phase-change memory cells are generally not programmed at the same time due to the large write current required, more than one phase-memory cell within a write data block can be usually be programmed at the same time. For example, two (2) or four (4) memory cells are often programmed within a common time interval.
-
FIG. 9 is a waveform timing diagram illustrating the operation of a PRAM device according to one embodiment of the present invention. InFIG. 9 , a pair of waveforms labeled “normal write timing” illustrate an uninterrupted write operation of a write data block in the PRAM device. A remaining set of four waveforms, labeled “Write suspend/resume timing,” illustrate a write-suspend-read operation of the write data block. In both the uninterrupted write operation and the write-suspend-read operation ofFIG. 9 , a square waveform labeled “Write_Pulse” represents the timing of a sequence of program pulses applied to the PRAM device to program the write data block. - The write data block is divided into first through fourth unit program blocks, wherein each unit program block comprises four (4) phase-change memory cells, or bits. The first through fourth unit program blocks are programmed in respective first through fourth unit program block write periods delimited by vertical lines in the waveforms labeled “Write_Pulse.” The first through fourth unit program block write periods are respectively labeled with corresponding values “00, ” “01,” “10,” and “11” of a counter signal.
- Within each unit program block write period, there are two (2) square pulses. Each square pulse is illustrative of a time interval when one or more program pulses are generated to program selected phase-change memory cells of the write data block. The time interval represented by a square pulse will be referred to as a “program pulse interval” in this written description.
- Memory cells that are programmed during the same program pulse interval are considered to be programmed “simultaneously” for purposes of this written description, even though the precise timing of their programming may vary, e.g., where one phase-change memory cell is programmed in response to a “set pulse” while the other memory cell is programmed in response to a “reset pulse.” The memory cells programmed during the same program pulse interval are considered to be programmed simultaneously because there will be some overlap in the period in which respective set and/or reset pulses are applied to the programmed memory cells.
- In
FIG. 9 , each square pulse is labeled “x2” to indicate that two (2) phase-change memory cells are programmed during each program pulse interval. Alternatively, there could be more or less than two (2) phase-change memory cells programmed during each program pulse interval. - Although
FIG. 9 illustrates a write data block divided into four (4) unit program blocks of four (4) memory cells each, wherein two (2) phase-change memory cells are programmed during each program pulse interval, the number of unit program blocks per write data block, the number of program pulse intervals per unit program block write period, and the number of memory cells programmed during each program pulse interval can be changed by a system designer as desired. - To program the phase-change memory cells of the write data block described in relation to
FIG. 9 , the PRAM device first receives a plurality of data input signals corresponding to the phase-change memory cells. If the data input signal corresponding to a particular memory cell has a logic level ‘1,’ the PRAM generates a reset pulse to place the memory cell in the reset state. Otherwise, if the data input signal corresponding to the memory cell has a logic level ‘0,’ the PRAM generates a set pulse to place the memory cell in the set state. - In
FIG. 9 , a program signal PGM is used to represent periods in which the phase-change memory cells of the PRAM are programmed. Where program signal PGM is high, the memory cells are programmed, and where program signal PGM is low, the memory cells are not programmed. - In the uninterrupted write operation, the first through fourth unit program blocks are programmed in an uninterrupted sequence, as evidenced by program signal PGM, which is high throughout the first through fourth unit program block write periods. In contrast, in the write-suspend-read operation, the first unit program block is programmed, followed by a read operation, and then the second through fourth unit program blocks are programmed after the read operation finishes. In the uninterrupted write operation, the counter signal is incremented with each successive unit program block write period.
- In the write-suspend-read operation, a suspend signal PGM_SUSPEND is briefly asserted while the first unit program block is being programmed. In response to suspend signal PGM_SUSPEND, programming of the write data block is suspended after the first unit program block is programmed. The read operation is then performed once programming of the write data block is suspended. Then, as soon as the read operation finishes, a resume signal PGM_RESUME is asserted, allowing programming of the second through fourth unit program blocks to proceed to completion. In the write-suspend-read operation, the counter signal is suspended during the read operation, and it resumes upon completion of the read operation.
-
FIG. 10 is a block level diagram of aPRAM device 100 adapted to perform a program-suspend-read operation according to one embodiment of the present invention. Referring toFIG. 10 ,PRAM device 100 comprises amemory cell array 110, which includes a plurality of memory blocks 111 through 11 n. Each of memory blocks 111 through 11 n comprises a plurality of phase-change memory cells.Memory cell array 110 is operatively connected to anaddress decoder 120 and abitline selection circuit 130 withinPRAM device 100. -
PRAM device 100 further comprises awrite driver circuit 140 and asense amplifier circuit 150 operatively connected tobitline selection circuit 130, a data I/O buffer 160, a programpulse control circuit 170 comprising acounter 171 and aprogram pulse generator 172 and operatively connected to writedriver circuit 140, and acontrol unit 180 operatively connected to programpulse control circuit 170. - To program a memory block (i.e., a write data block) in
memory cell array 110,address decoder 120 decodes an address ADDR of the write data block to generate a wordline voltage and a plurality of bitline selection signals Yi. The write data block is selected by applying the wordline voltage to the write data block through a wordline bus WL, applying bitline selection signals Yi tobitline selection circuit 130 to select bitlines BL connected to the write data block. - A plurality of input data signals DI representing data to be written to the write data block are applied to write
driver circuit 140 from data I/O buffer 160. The values of the input data signals DI are determined by data received in data I/O buffer 160 through an 10 bus DQ. -
Program pulse generator 172 applies program pulses to writedriver circuit 140 in response to counter 171, and writedriver circuit 140 generates write currents to program selected memory cells inmemory cell array 110 based on the program pulses and the values of input data signals DI. An exemplary operation and configuration ofwrite driver circuit 140 is described below in relation toFIG. 13 . In addition, other examples of a write driver circuit compatible with the PRAM device are disclosed in related and commonly assigned U.S. patent application Ser. No. 10/829,807. - The write currents generated by
write driver circuit 140 are provided tobitline selection circuit 130 via a data line DL, and the write currents are respectively applied to selected bitlines BL throughbitline selection circuit 130. Writedriver 140 preferably generates the write currents according to a timing sequence such as that illustrated inFIG. 9 . In other words, the bitlines are preferably driven in such a way unit program blocks in the write data block are programmed in a sequence. - The timing and sequence in which the memory cells of the write data block are programmed is controlled by program
pulse control circuit 170, which in turn is controlled bycontrol unit 180. At the beginning of a program operation of a write data block,control unit 180 applies a start signal START to counter 171 to initialize a counter signal CNT output bycounter 171. For explanation purposes, it will be assumed that the write data block comprises four unit program blocks as described above in relation toFIG. 9 . Accordingly, counter signal CNT is represented by two bits and is initialized to “00.” -
Program pulse generator 172 receives counter signal CNT and sends program pulses to writedriver circuit 140 based on the value of counter signal CNT. For instance, where counter signal CNT has the value “00,”program pulse generator 172 generates program pulses for programming a first unit program block; where the value of counter signal CNT is “01,”program pulse generator 172 generates program pulses for programming a second unit program block, and so on. - To suspend the program operation in order to perform a read operation,
control unit 180 generates a suspend signal SSPD to suspendcounter 171. As a result,program pulse generator 172 stops generating program pulses while the read operation is executed. Once the read operation is completed,control unit 180 generates a resume signal RESM to cause counter signal CNT to continue counting, and consequently to causeprogram pulse generator 172 to continue generating program pulses. - Finally, once the program operation finishes,
control unit 180 generates a finish signal FNSH, which causes counter 171 to stop counting andprogram pulse generator 172 to stop generating program pulses. - To read a memory block (i.e., a read data block) in
memory cell array 110,address decoder 120 decodes an address ADDR of the read data block to generate a wordline voltage and bitline selection signals Yi for selecting the memory cells of the read data block. Then, data values stored in the selected memory cells are transferred tosense amplifier circuit 150 via data line DL. The data values pass from data line DL through a clampingtransistor 135, and then to a sensing node NSA connected to senseamplifier 150. Clampingtransistor 135 is connected between data line DL and sensing node NSA and functions to clamp the bit line voltage at or below a threshold voltage suitable for reading the phase-change memory cells inmemory cell array 110. -
Sense amplifier 150 reads the data values by comparing the voltage of sense node NSA with a reference voltage Vref under the control of control signals nPSA and PMUX.Sense amplifier 150 then outputs the result of the comparison as an output signal D0. An exemplary configuration and operation ofsense amplifier 150 is described below in relation toFIGS. 14 and 15 . Still other examples of sense amplifiers are described, for example, in related and commonly assigned U.S. patent application Ser. No. 11/316,017, the disclosure of which is hereby incorporated by reference. - Output signal D0 of
sense amplifier 150 is applied to data I/O buffer 160, which outputs corresponding output data on I/O bus DQ. The operation and internal circuit configuration of data I/O buffer 160 are well understood by those of ordinary skill, and therefore a detailed description ofoutput buffer 160 is omitted here. -
FIGS. 11A and 11B are waveform timing diagrams illustrating program-suspend-read operations ofPRAM device 100 shown inFIG. 10 . In particular,FIG. 11A shows a program-suspend-read operation wherein a program operation is suspended after a first unit program block is executed. While the program operation is suspended, a read operation is executed. Then, the program operation resumes and second, third, and fourth program operations are executed.FIG. 11B shows a program-suspend-read operation wherein a program operation is suspended after first and second unit program blocks are executed. While the program operation is suspended, a read operation is executed. Then, the program operation resumes and third and fourth program operations are executed. - In
FIGS. 11A and 11B , diagrams labeled “(a)” identify the operations performed byPRAM device 100 during particular time intervals; waveforms labeled “(b)” illustrate control signals output bycontrol unit 180; waveforms labeled “(c)” illustrate counter signals output bycounter 171; and, waveforms labeled “(d)” illustrate pulse signals generated byprogram pulse generator 172. - Referring to
FIG. 11A , start signal STRT is briefly asserted to initiate a program operation. Upon initiation of the program operation, counter signal CNT is initialized to “00,” and a first pair of program pulses are asserted during a first program pulse interval of a first unit program block write period. The fact that a pair of program pulses are asserted during each program pulse interval is denoted by the labels “x2” inFIGS. 11A and 11B . In another preferred embodiment of the invention, four program pulses are asserted to program four phase-change memory cells during each program pulse interval. Such a configuration could be indicated, for example, by labeling each program pulse interval with labels “x4.” - Each unit program block write period in
FIGS. 11A and 11B includes two (2) program pulse intervals and is delimited by vertical dashed lines. Set and reset pulses inFIGS. 11A and 11B are labeled P_SETn, and P_RSTn, respectively, where “n” ranges from 1 to 8. - A second pair of program pulses are briefly asserted in the first unit program block write period after the first program pulse pair is asserted; however, before the second pair of program pulses finishes being asserted, program suspend signal SSPD is asserted. Suspend signal SSPD causes the program operation to be suspended as soon as the first unit program block write period finishes so that a read operation can be executed.
- While the program operation is suspended, the value of counter signal CNT remains the same. Once the read operation finishes, resume signal RESM is asserted to resume the program operation. Upon resuming the program operation, the value of counter signal CNT increments, and third and fourth program pulse pairs are asserted during the second unit program block.
- Next, in a third unit program block write period, fifth and sixth program pulse pairs are asserted and counter signal CNT is again incremented. Then, in a fourth unit program block write period, seventh and eighth program pulse pairs are asserted and counter signal CNT is yet again incremented. Finally, after the fourth unit program block write period, a program finish signal PGM_FINISH is asserted to finish the program operation.
-
FIG. 11B is similar toFIG. 11A , except that program suspend signal PGM_Suspend is asserted during the second unit program block write period and the read operation is executed between the second and third unit program block write periods. Accordingly, the first and second unit program block write periods follow immediately after each other, and the third and fourth unit program block write periods also follow immediately after each other. -
FIG. 12 is a circuit diagram showing an exemplary embodiment ofmemory block 111,bitline selection circuit 130, and writedriver circuit 140 included inPRAM device 100 ofFIG. 10 . - Referring to
FIG. 12 ,memory block 111 comprises a plurality of diode-type phase-change memory cells MC1 through MC16 connected to a wordline WL and respectively connected to a plurality of bitlines BL1 through BL16. -
Bitline selection circuit 130 comprises a plurality of bitline selection transistors T1 through T16 respectively connected between bitlines BL1 through BL16 and a plurality of data lines DL1 through DL16. Bitline selection transistors T1 through T16 are respectively gated by bitline selection signals Yi through Y16 to supply respective write currents fromwrite driver 140 tomemory block 111. - Write
driver circuit 140 comprises a plurality of write drivers WD1 through WD16 respectively connected to data lines DL1 through DL16 and adapted to supply respective write currents to data lines DL1 through DL16 in response to respective data input signals DI1 through DI16. -
FIG. 13 is a circuit diagram of an exemplary embodiment of a write driver WD1 shown inFIG. 12 . Referring toFIG. 13 , write driver WD1 comprises apulse selection circuit 210, acurrent control circuit 220, and acurrent drive circuit 230. -
Pulse selection circuit 210 outputs either a reset pulse P_RST1 or a set pulse P_SET1 in response to a logic level of data input signal DI1.Pulse selection circuit 210 functions to selectively apply reset pulse P_RST1 or set pulse P_SET1 tocurrent control circuit 220 to write a logical ‘0’ or a logical ‘1’ to a corresponding selected phase-change memory cell. -
Current control circuit 220 receives a bias voltage DC_BIAS, and outputs a control signal CTRLS during a program pulse interval when reset pulse P_RST1 or set pulse P_SET1 is asserted. Where data input signal DI1 has logic level ‘1,’ control signal CTRLS is output with a first voltage level while reset pulse P_RST is asserted. Where data input signal DI1 has logic level ‘0,’ control signal CTRLS is output with a second voltage level while reset pulse P_RST is asserted. -
Current control circuit 220 functions to control the level of a current supplied tocurrent drive circuit 230 during the program pulse interval when reset pulse P_RST1 or set pulse P_SET1 is asserted. When reset pulse P_RST1 is asserted, the level of the current supplied tocurrent drive circuit 230 is larger than when set pulse P_SET1 is asserted. -
Current drive circuit 230 outputs a write current for programming the corresponding phase-change memory cell through a data line DL1. The write current is output in response to control signal CTRLS. -
Pulse selection circuit 210 comprises first and second transmission gates TG1 and TG2, and first through third inverters INV1, INV2, and INV3. First transmission gate TG1 outputs reset pulse P_RST1 when data input signal DI1 has logic level ‘1,’ and second transmission gate TG2 outputs set pulse P_SET1 when data input signal DI1 has logic level ‘0.’ - Data input signal DI1 passes through second and third inverters INV2 and INV3 before being output from
pulse selection circuit 210 tocurrent control circuit 220. The second and third inverters INV2 and INV3 collectively act as a buffer for data input signal DI1. First inverter INV1 inverts the output of the first or second transmission gate TG1 or TG2 and outputs the inverted output to thecurrent drive circuit 230. -
Current control circuit 220 comprises a first level transistor LTR6, a first level controller LVLC1, a second level controller LVLC2, a first control transistor TR5, and a second control transistor TR7. - First level transistor LTR6 comprises a positive metal-oxide semiconductor (PMOS) transistor with a source connected to a power source voltage VDD, and a gate and a drain connected to each other. First level controller LVLC1 is turned on in response to bias voltage DC_BIAS and controls the level of control signal CTRLS.
- First level controller LVLC1 comprises a first level transistor LTR6 and a second level transistor LTR2 that are connected in series between a drain of first level transistor LTR6 and a drain of first control transistor TR5. Bias voltage DC_BIAS is applied to gates of first level transistor LTR6 and second level transistor LTR2.
- Second level controller LVLC2 controls control signal CTRLS to be generated at a first voltage level or a second voltage level based on the logic level of data input signal DI1 output from
pulse selection circuit 210. Second level controller LVLC2 includes a third level transistor LTR3 and a fourth level transistor LTR4 that are connected in series between the drain of first level transistor LTR6 and the drain of first control transistor TR5. Input data signal DI1 is applied to gates of third level transistor LTR3 and fourth level transistor LTR4. First through fourth level transistors LTR6, LTR2, LTR3, and LTR4 each comprise an NMOS transistor. - First control transistor TR5 controls the operation of
current control circuit 220 in response to reset pulse P_RST1 or set pulse P_SET. First control transistor TR5 has a drain commonly connected to sources of second level transistor LTR2 and fourth level transistor LTR4, a source connected to ground VSS, and a gate to which reset pulse P_RST1 or set pulse P_SET1 is applied. First control transistor TR5 each comprise an NMOS transistor. - Second control transistor-TR7 turns off first level transistor LTR6 whenever neither of reset pulse P_RST1 or set pulse P_SET1 is asserted, and outputs control signal CTRLS with a third voltage level. Second control transistor TR7 has a source connected to power source voltage VDD, a drain connected to the drain of first level transistor LTR6, and a gate to which reset pulse P_RST1 or set pulse P_SET1 is applied. Second control transistor TR7 comprises a PMOS transistor.
-
Current drive circuit 230 includes a pull up transistor PUTR and a pull down transistor PDTR. Pull up transistor PUTR has a source connected to power source voltage VDD, a drain connected to a first node N1, and a gate to which control signal CTRLS is applied. - Pull down transistor PDTR has a drain connected to first node N1, a source connected to ground VSS, and a gate to which inverted reset pulse P_RST1 or set pulse P_SET1 is applied.
- Pull down transistor PDTR is turned off and the pull up transistor PUTR is turned on during the program pulse interval when reset pulse P_RST1 or set pulse P_SET is asserted. The degree to which pull up transistor PUTR is turned on is controlled according to the voltage level of control signal CTRLS, and accordingly, the amount of write current applied to the phase-change memory array through data line DL depends on the voltage level of control signal CTRLS.
- Pull up transistor PUTR is turned off and pull down transistor PDTR is turned on whenever neither of reset pulse P_RST1 or set pulse P_SET is asserted. As a result, first node N1 is connected to ground VSS and discharged.
- First level controller LVLC1 is turned on in response to bias voltage DC_BIAS. When input data signal DI1 has logic level ‘0’, set pulse P_SET1 is applied to first control transistor TR5 and second control transistor TR7 of
current control circuit 220. While set pulse P_SET is asserted, first control transistor TR5 is turned on, second control transistor TR7 is turned off, and first level transistor LTR6 is turned on. - Third and fourth level transistors LTR3 and LTR4 are turned off when input data signal DI1 has logic level ‘0.’ When first control transistor TR5, first level transistor LTR3, and second level transistor LTR4 are turned on, control signal CTRLS is generated with the first voltage level (e.g, a “low” voltage level) to turn on pull up transistor PUTR.
- Where set pulse P_SET is asserted, pull up transistor PUTR is turned on and pull down transistor PDTR is turned off. Where set pulse P_SET1 is not asserted second control transistor TR7 is turned on and control signal CTRLS is generated with the second voltage level, e.g., a “high” voltage level. As a result, pull up transistor PUTR is turned off and pull down transistor PDTR is turned on, thereby discharging the first node N1 to ground VSS. Where input data signal DI1 has logic level ‘1,’ reset pulse P_RST1 is asserted and applied to first control transistor TR5 and second control transistor TR7 of
current control circuit 220. While reset pulse P_RST1 is asserted, first control transistor TR5 is turned on, second control transistor TR7 is turned off, and first level transistor LTR6 is turned on. - Third and fourth level transistors LTR3 and LTR4 of second level controller LVLC2 are turned on when input data signal DI1 has logic level ‘1.’ Where first control transistor CRT1, and first through fourth level transistors LTR6, LTR2, LTR3, and LTR4 are all turned on, control signal CTRLS is generated with the second voltage level to turn on pull up transistor PUTR. The second voltage level is even lower than the first voltage level generated when set signal P_SET1 is asserted.
- Accordingly, where input data signal DI1 has logic level ‘1,’ control signal CTRLS assumes the second voltage level. As a consequence, the level of control signal CTRLS decreases further and pull up transistor PUTR is turned on more than when only first and second level transistors LTR6 and LTR2 are turned on. As a result, the level of the write current is higher when reset pulse P_RST1 is asserted than when set pulse P_SET1 is asserted.
- Thus, where input data signal DI1 has logic level ‘1,’ reset pulse P_RST1 is applied to
current control circuit 220 and the level of the write current through data line DL1 is higher than when set pulse P_SET1 is applied tocurrent control circuit 220 when input data signal DI1 has logic level ‘0.’ - Where neither set pulse P_SET1 nor reset pulse P_RST1 is asserted, second control transistor TR7 is turned on and control signal CTRLS is generated with the third voltage level, which is a “high” level that turns off pull up transistor PUTR. As a result, first node N1 is discharged to ground VSS through pull down transistor PDTR.
-
FIG. 14 is a circuit diagram ofsense amplifier 150 shown inFIG. 10 .Sense amplifier 150 ofFIG. 14 includes asensing portion 310, alatch portion 320, and adummy latch portion 330. Preferably, at least sensingportion 310 ofsense amplifier 150 is driven by a boosted voltage VSA, which is greater than an internal power supply voltage VCC. -
Sensing portion 310 includes asensing circuit 311 and anequalizer circuit 312.Sensing portion 310 of this example includes p-type transistors P1 through P3 and n-type transistor N1 through N5 all connected as shown inFIG. 5 between the boosted voltage VSA and ground. Sensing node NSA is connected to the gate of transistor N1, and a read threshold voltage Vref is connected to the gate of transistor N2.Equalizer circuit 312 is connected across sensing circuit nodes Na and Nb as shown; and control signal nPSA is applied to the gates of transistors P3, N3, N4 and N5. -
Latch portion 320 of this example includes aninverter circuit 321 and alatch circuit 322. As shown inFIG. 14 ,inverter circuit 321 is connected to sensing circuit node Na of sensingportion 310, and includes p-type transistors P6 and P7, n-type transistors N6 and N7, and inverter IN1.Latch circuit 322 includes inverters IN2 through IN4. In this example,latch portion 320 is driven by internal power supply voltage VCC. Also, ininverter circuit 321, control signal PMUX is applied to the input of inverter IN1 and to the gate of transistor N7. -
Dummy latch portion 330 of this example is driven by VCC and includes an n-type transistor N8 and a p-type transistor P8, each having gates connected to the sensing circuit node Nb. As will be appreciated by those skilled in the art,dummy latch portion 330 is provided to match the load oflatch portion 320 across sensingportion 310. - The operation of
sensing amplifier 150 shown inFIG. 14 is described below in relation toFIG. 15 . Referring collectively toFIGS. 14 and 15 , during time interval T1, the voltage of control signal nPSA is boosted voltage VSA. Accordingly,sensing circuit 311 is disabled, and equalizingcircuit 312 is enabled to bring sensing circuit nodes Na and Nb to ground (0 v). Further, control signal PMUX is low (0 v), thus disablinginverter circuit 321. The output D0 ofsense amplifier 150 thus remains unchanged. - Next, in a time interval T2(a), the voltage of sense node NSA either remains at VSA or drops to about 1V, depending on whether a read memory cell is in its ‘reset’ or ‘set” state.
- Next, in a time interval T2(b), the voltage of control signal nPSA goes to 0 v, thus enabling
sensing circuit 311 and disabling equalizingcircuit 312. Sensing circuit node Na goes to VSA in the case of the ‘set’ state where sense node NSA voltage (about 1 v) is less than reference voltage Vref, and sensing circuit node Na goes to 0v in the case of the ‘reset’ state where the NSA voltage (VSA) is greater than reference voltage Vref. - Then, in an interval T2(c), control signal PMUX is brought to VCC to enable
inverter circuit 321.Inverter circuit 321 inverts either voltage VSA (high) or 0 v (low) of internal sensing circuit node Na, and driveslatch circuit 322 accordingly to either flip or maintain the output data D0. - Finally, in a time interval T3, the voltage of nPSA is returned to boosted voltage VSA to disable
sensing circuit 311 and enable equalizingcircuit 312, and control signal PMUX is return to low (0 v), thus disablinginverter circuit 321. - The PRAM device of the present invention may be utilized, for example, as the non-volatile memory of multiple types of microprocessor driven appliances.
FIG. 16 is a simplified block diagram of a system containingPRAM device 100 described above.PRAM device 100 can function as random access memory of the system, or as a mass storage device of the system, or both. As illustrated,PRAM device 100 is connected to amicroprocessor 500 via one or more data buses L3.Microprocessor 500 exchanges data over one or more data buses L2 with an I/O interface 600, and the I/O interface 600 transmits and receives data over input/output data lines L1. As examples, the input/output data lines L1 may be operatively coupled to a computer peripheral bus, a high speed digital communication transmission line, or an antenna system. A power distribution system L4 supplies power from apower supply 400 toPRAM device 100,microprocessor 500 and I/O interface 600. - The system of
FIG. 16 may be utilized in both portable and non-portable appliances. In the case of portable appliances,power supply 400 will typical contain one or more battery cells. Phase-change memory devices, such as PRAM devices, are particularly suited to battery-powered applications in view of their non-volatile memory characteristics. Non-limiting examples of portable appliances include notebook computers, digital cameras, a personal digital assistants (PDA's), and mobile communication devices, such as mobile telephones, mobile email devices, and mobile gaming devices. Non-limiting examples of non-portable appliances include desk-top computers, network servers, and other computing devices typically driven by fixed commercial or residential power systems (such as AC power systems). - The foregoing preferred embodiments are teaching examples. Those of ordinary skill in the art will understand that various changes in form and details may be made to the exemplary embodiments without departing from the scope of the present invention as defined by the claims that follow.
Claims (42)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20070002418 EP1835508B1 (en) | 2006-03-16 | 2007-02-05 | Pram and associated operation method and system |
JP2007065720A JP2007250171A (en) | 2006-03-16 | 2007-03-14 | Phase-change memory device and its program-suspend-read method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060024328A KR100816748B1 (en) | 2006-03-16 | 2006-03-16 | Phase change memory device supporting program suspend/resume mode and program method thereof |
KR10-2006-0024328 | 2006-03-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
US20070217253A1 true US20070217253A1 (en) | 2007-09-20 |
US7349245B2 US7349245B2 (en) | 2008-03-25 |
Family
ID=38517651
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/486,100 Active US7349245B2 (en) | 2006-03-16 | 2006-07-14 | Non-volatile phase-change memory device and associated program-suspend-read operation |
Country Status (3)
Country | Link |
---|---|
US (1) | US7349245B2 (en) |
KR (1) | KR100816748B1 (en) |
CN (1) | CN101038789A (en) |
Cited By (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090052253A1 (en) * | 2007-08-23 | 2009-02-26 | Samsung Electronics Co., Ltd. | Memory device and method reducing fluctuation of read voltage generated during read while write operation |
US20090091988A1 (en) * | 2007-10-03 | 2009-04-09 | Ferdinando Bedeschi | Writing bit alterable memories |
US20090106478A1 (en) * | 2007-10-19 | 2009-04-23 | Virident Systems Inc. | Managing Memory Systems Containing Components with Asymmetric Characteristics |
US20090154221A1 (en) * | 2007-12-14 | 2009-06-18 | Samsung Electronics Co., Ltd. | Non-Volatile memory device using variable resistance element with an improved write performance |
US20090168504A1 (en) * | 2007-12-28 | 2009-07-02 | Korea Institute Of Science And Technology | Phase change memory apparatus having an improved cycling endurance and programing method therefor |
US20090201721A1 (en) * | 2008-02-11 | 2009-08-13 | Dae-Won Ha | Phase change memory device and write method thereof |
US7701759B2 (en) * | 2007-02-05 | 2010-04-20 | Macronix International Co., Ltd. | Memory cell device and programming methods |
US20100149861A1 (en) * | 2008-12-12 | 2010-06-17 | Kyoung-Wook Park | Phase change memory device |
US20100214831A1 (en) * | 2009-02-26 | 2010-08-26 | Ho-Jung Kim | Memory device, memory system having the same, and programming method of a memory cell |
US20100246246A1 (en) * | 2009-03-26 | 2010-09-30 | Ho-Jung Kim | Memory device, memory system having the same, and programming method of a memory cell |
US20110096611A1 (en) * | 2008-06-05 | 2011-04-28 | Kwang Jin Lee | Semiconductor device and semiconductor system having the same |
US20120224437A1 (en) * | 2007-12-14 | 2012-09-06 | Kim Hye-Jin | Non-volatile memory device using variable resistance element with an improved write performance |
US8427861B2 (en) | 2008-07-30 | 2013-04-23 | Kabushiki Kaisha Toshiba | Semiconductor memory device |
US20130124792A1 (en) * | 2011-02-03 | 2013-05-16 | Stec, Inc. | Erase-suspend system and method |
US20140122814A1 (en) * | 2012-10-26 | 2014-05-01 | Micron Technology, Inc. | Apparatuses and methods for memory operations having variable latencies |
US20140122822A1 (en) * | 2012-10-26 | 2014-05-01 | Micron Technology, Inc. | Apparatuses and methods for memory operations having variable latencies |
US20140281182A1 (en) * | 2013-03-15 | 2014-09-18 | Micron Technology, Inc. | Apparatuses and methods for variable latency memory operations |
US8982602B2 (en) * | 2012-08-30 | 2015-03-17 | Adesto Technologies Corporation | Memory devices, circuits and, methods that apply different electrical conditions in access operations |
US9159412B1 (en) | 2014-07-15 | 2015-10-13 | Macronix International Co., Ltd. | Staggered write and verify for phase change memory |
CN105931664A (en) * | 2015-01-22 | 2016-09-07 | 南泰若股份有限公司 | Methods for reading and programming 1-R resistive change element arrays |
US9710192B2 (en) | 2013-08-14 | 2017-07-18 | Micron Technology, Inc. | Apparatuses and methods for providing data from a buffer |
US9721637B2 (en) | 2011-12-15 | 2017-08-01 | Everspin Technologies, Inc. | Method of writing to a spin torque magnetic random access memory |
US9727493B2 (en) | 2013-08-14 | 2017-08-08 | Micron Technology, Inc. | Apparatuses and methods for providing data to a configurable storage area |
US9799405B1 (en) | 2015-07-29 | 2017-10-24 | Ip Gem Group, Llc | Nonvolatile memory system with read circuit for performing reads using threshold voltage shift read instruction |
US9813080B1 (en) | 2013-03-05 | 2017-11-07 | Microsemi Solutions (U.S.), Inc. | Layer specific LDPC decoder |
US9886214B2 (en) | 2015-12-11 | 2018-02-06 | Ip Gem Group, Llc | Nonvolatile memory system with erase suspend circuit and method for erase suspend management |
US9892794B2 (en) | 2016-01-04 | 2018-02-13 | Ip Gem Group, Llc | Method and apparatus with program suspend using test mode |
US9899092B2 (en) | 2016-01-27 | 2018-02-20 | Ip Gem Group, Llc | Nonvolatile memory system with program step manager and method for program step management |
US10157677B2 (en) | 2016-07-28 | 2018-12-18 | Ip Gem Group, Llc | Background reference positioning and local reference positioning using threshold voltage shift read |
US10230396B1 (en) | 2013-03-05 | 2019-03-12 | Microsemi Solutions (Us), Inc. | Method and apparatus for layer-specific LDPC decoding |
US10236915B2 (en) | 2016-07-29 | 2019-03-19 | Microsemi Solutions (U.S.), Inc. | Variable T BCH encoding |
US10291263B2 (en) | 2016-07-28 | 2019-05-14 | Ip Gem Group, Llc | Auto-learning log likelihood ratio |
US10332613B1 (en) | 2015-05-18 | 2019-06-25 | Microsemi Solutions (Us), Inc. | Nonvolatile memory system with retention monitor |
US10365835B2 (en) | 2014-05-28 | 2019-07-30 | Micron Technology, Inc. | Apparatuses and methods for performing write count threshold wear leveling operations |
US10430236B2 (en) | 2016-03-18 | 2019-10-01 | Samsung Electronics Co., Ltd. | Electronic device and method for resuming process thereof |
US10453508B2 (en) * | 2016-09-22 | 2019-10-22 | SK Hynix Inc. | Semiconductor memory apparatus with a write voltage level detection |
CN110390990A (en) * | 2018-04-18 | 2019-10-29 | 力旺电子股份有限公司 | Memory circuit and the method for operating memory circuit |
CN112015367A (en) * | 2020-08-26 | 2020-12-01 | 上海新氦类脑智能科技有限公司 | Nonvolatile Boolean logic operation unit, method and device |
US10971227B2 (en) * | 2008-07-31 | 2021-04-06 | Unity Semiconductor Corporation | Preservation circuit and methods to maintain values representing data in one or more layers of memory |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101051703B1 (en) | 2004-08-09 | 2011-07-25 | 삼성전자주식회사 | Integrated circuit card and integrated circuit card system with suspend / reset function |
EP1835508B1 (en) | 2006-03-16 | 2012-01-18 | Samsung Electronics Co., Ltd. | Pram and associated operation method and system |
KR100834738B1 (en) | 2006-08-31 | 2008-06-05 | 삼성전자주식회사 | Operating method of phase change random access memory device and phase change random access memory device using the same |
US7505330B2 (en) * | 2006-08-31 | 2009-03-17 | Micron Technology, Inc. | Phase-change random access memory employing read before write for resistance stabilization |
WO2008032394A1 (en) | 2006-09-15 | 2008-03-20 | Renesas Technology Corp. | Semiconductor device |
US7433226B2 (en) * | 2007-01-09 | 2008-10-07 | Macronix International Co., Ltd. | Method, apparatus and computer program product for read before programming process on multiple programmable resistive memory cell |
US20080270811A1 (en) * | 2007-04-26 | 2008-10-30 | Super Talent Electronics Inc. | Fast Suspend-Resume of Computer Motherboard Using Phase-Change Memory |
US20090103354A1 (en) * | 2007-10-17 | 2009-04-23 | Qualcomm Incorporated | Ground Level Precharge Bit Line Scheme for Read Operation in Spin Transfer Torque Magnetoresistive Random Access Memory |
KR101437397B1 (en) * | 2007-10-31 | 2014-09-05 | 삼성전자주식회사 | Data management method and mapping table update method in nonvolatile memory device |
US7882455B2 (en) * | 2008-05-09 | 2011-02-01 | International Business Machines Corporation | Circuit and method using distributed phase change elements for across-chip temperature profiling |
KR100953045B1 (en) | 2008-05-23 | 2010-04-14 | 주식회사 하이닉스반도체 | Programming method of non volatile memory device |
US8107280B2 (en) * | 2008-11-05 | 2012-01-31 | Qualcomm Incorporated | Word line voltage control in STT-MRAM |
KR101001147B1 (en) * | 2008-12-12 | 2010-12-17 | 주식회사 하이닉스반도체 | Phase change memory device |
KR101517597B1 (en) * | 2009-03-25 | 2015-05-07 | 삼성전자주식회사 | Nonvolatile memory devie and generating program voltage thereof |
US8004884B2 (en) * | 2009-07-31 | 2011-08-23 | International Business Machines Corporation | Iterative write pausing techniques to improve read latency of memory systems |
US8470635B2 (en) * | 2009-11-30 | 2013-06-25 | Micron Technology, Inc. | Keyhole-free sloped heater for phase change memory |
KR20110064041A (en) * | 2009-12-07 | 2011-06-15 | 삼성전자주식회사 | Semiconductors including sense amplifier connected to wordline |
JP2011138569A (en) * | 2009-12-25 | 2011-07-14 | Toshiba Corp | Nonvolatile semiconductor memory |
JP2012014769A (en) * | 2010-06-30 | 2012-01-19 | Elpida Memory Inc | Semiconductor device and test method thereof |
WO2012021379A2 (en) | 2010-08-10 | 2012-02-16 | Rambus Inc. | Verify before program resume for memory devices |
KR20120082292A (en) * | 2011-01-13 | 2012-07-23 | 에스케이하이닉스 주식회사 | Semiconductor memory device and method of driving the same |
US8374040B2 (en) | 2011-02-25 | 2013-02-12 | International Business Machines Corporation | Write bandwidth in a memory characterized by a variable write time |
KR20130058533A (en) * | 2011-11-25 | 2013-06-04 | 에스케이하이닉스 주식회사 | Phase change memory device and data storage device including the same |
KR20130058534A (en) * | 2011-11-25 | 2013-06-04 | 에스케이하이닉스 주식회사 | Semiconductor memory apparatus, control circuit for set program and program method therefor |
US9053784B2 (en) | 2012-04-12 | 2015-06-09 | Micron Technology, Inc. | Apparatuses and methods for providing set and reset voltages at the same time |
KR102083490B1 (en) * | 2012-08-08 | 2020-03-03 | 삼성전자 주식회사 | Nonvolatile memory device, memory system including the same and method of controlling command execution of the nonvolatile memory device |
US9324450B2 (en) * | 2013-03-13 | 2016-04-26 | Winbond Electronics Corporation | NAND flash memory |
JP2014186787A (en) * | 2013-03-25 | 2014-10-02 | Toshiba Corp | Nonvolatile semiconductor memory device, memory controller, and memory system |
KR20140142759A (en) * | 2013-05-31 | 2014-12-15 | 에스케이하이닉스 주식회사 | Nonvolatile memory device and operation method for the same and system including nonvolatile memory device |
CN104425014B (en) * | 2013-09-02 | 2018-02-27 | 华邦电子股份有限公司 | List type NAND-type flash memory, flash memory device and its operating method |
US9911492B2 (en) | 2014-01-17 | 2018-03-06 | International Business Machines Corporation | Writing multiple levels in a phase change memory using a write reference voltage that incrementally ramps over a write period |
US9812200B2 (en) * | 2014-07-08 | 2017-11-07 | Adesto Technologies Corporation | Concurrent read and write operations in a serial flash device |
CN106067321B (en) * | 2015-04-21 | 2020-09-15 | 爱思开海力士有限公司 | Controller suitable for memory programming pause-resume |
CN105810242A (en) * | 2016-03-02 | 2016-07-27 | 中国科学院上海微系统与信息技术研究所 | Phase change memory and operation method for improving fatigue life of same |
KR102554416B1 (en) * | 2016-08-16 | 2023-07-11 | 삼성전자주식회사 | Internal status output device of memory device and memory system adopting the same |
JP2018045741A (en) * | 2016-09-12 | 2018-03-22 | 東芝メモリ株式会社 | Semiconductor storage device and memory system |
KR102549620B1 (en) * | 2017-01-10 | 2023-06-28 | 삼성전자주식회사 | Nonvolatile memory device and opperating method of the same |
US10658046B2 (en) | 2017-05-26 | 2020-05-19 | Macronix International Co., Ltd. | Memory device and method for operating the same |
JP2019029045A (en) * | 2017-07-26 | 2019-02-21 | 東芝メモリ株式会社 | Semiconductor storage device |
KR102631353B1 (en) * | 2017-08-17 | 2024-01-31 | 삼성전자주식회사 | Nonvolatile memory device and operating method of the same |
KR20190047451A (en) * | 2017-10-27 | 2019-05-08 | 에스케이하이닉스 주식회사 | Semiconductor Memory System With Resistive Variable Memory Device and Method of Driving the Same |
KR102386198B1 (en) * | 2017-11-28 | 2022-04-14 | 에스케이하이닉스 주식회사 | Memory system with resistive memory device and method of operating the same |
CN110543442B (en) * | 2018-05-29 | 2022-02-01 | 杭州海康机器人技术有限公司 | Data transmission cut-off recovery method, device and system |
KR20210061171A (en) * | 2019-11-19 | 2021-05-27 | 에스케이하이닉스 주식회사 | Memory system and operating method thereof |
CN113345491B (en) * | 2021-05-26 | 2022-05-17 | 华中科技大学 | Read-write circuit of three-dimensional phase change memory |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5034922A (en) * | 1987-12-21 | 1991-07-23 | Motorola, Inc. | Intelligent electrically erasable, programmable read-only memory with improved read latency |
US5287469A (en) * | 1988-12-27 | 1994-02-15 | Nec Corporation | Electrically erasable and programmable non-volatile memory (EEPROM), wherein write pulses can be interrupted by subsequently received read requests |
US5822244A (en) * | 1997-09-24 | 1998-10-13 | Motorola, Inc. | Method and apparatus for suspending a program/erase operation in a flash memory |
US6016270A (en) * | 1998-03-06 | 2000-01-18 | Alliance Semiconductor Corporation | Flash memory architecture that utilizes a time-shared address bus scheme and separate memory cell access paths for simultaneous read/write operations |
US6134180A (en) * | 1998-08-04 | 2000-10-17 | Samsung Electronics, Co., Ltd. | Synchronous burst semiconductor memory device |
US6707712B2 (en) * | 2001-08-02 | 2004-03-16 | Intel Corporation | Method for reading a structural phase-change memory |
US6754107B2 (en) * | 2001-12-27 | 2004-06-22 | Stmicroelectronics S.R.L. | Single supply voltage, nonvolatile phase change memory device with cascoded column selection and simultaneous word read/write operations |
US20040246808A1 (en) * | 2003-06-03 | 2004-12-09 | Samsung Electronics Co., Ltd. | Writing driver circuit of phase-change memory |
US20050024922A1 (en) * | 2003-07-31 | 2005-02-03 | Bae Systems Information And Electronic Systems Integration, Inc. | Read/write circuit for accessing chalcogenide non-volatile memory cells |
US6930925B2 (en) * | 2003-10-14 | 2005-08-16 | Atmel Corporation | Suspend-resume programming method for flash memory |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100290474B1 (en) * | 1998-06-11 | 2001-06-01 | 박종섭 | Multi-level pulse generator circuit and method of erasing flash memory cell using same |
KR100587702B1 (en) * | 2004-07-09 | 2006-06-08 | 삼성전자주식회사 | Phase change memory device having characteristic of peak current decrease and data writing method therefor |
-
2006
- 2006-03-16 KR KR1020060024328A patent/KR100816748B1/en active IP Right Grant
- 2006-07-14 US US11/486,100 patent/US7349245B2/en active Active
-
2007
- 2007-03-16 CN CNA2007100885556A patent/CN101038789A/en active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5034922A (en) * | 1987-12-21 | 1991-07-23 | Motorola, Inc. | Intelligent electrically erasable, programmable read-only memory with improved read latency |
US5287469A (en) * | 1988-12-27 | 1994-02-15 | Nec Corporation | Electrically erasable and programmable non-volatile memory (EEPROM), wherein write pulses can be interrupted by subsequently received read requests |
US5822244A (en) * | 1997-09-24 | 1998-10-13 | Motorola, Inc. | Method and apparatus for suspending a program/erase operation in a flash memory |
US6016270A (en) * | 1998-03-06 | 2000-01-18 | Alliance Semiconductor Corporation | Flash memory architecture that utilizes a time-shared address bus scheme and separate memory cell access paths for simultaneous read/write operations |
US6134180A (en) * | 1998-08-04 | 2000-10-17 | Samsung Electronics, Co., Ltd. | Synchronous burst semiconductor memory device |
US6707712B2 (en) * | 2001-08-02 | 2004-03-16 | Intel Corporation | Method for reading a structural phase-change memory |
US6754107B2 (en) * | 2001-12-27 | 2004-06-22 | Stmicroelectronics S.R.L. | Single supply voltage, nonvolatile phase change memory device with cascoded column selection and simultaneous word read/write operations |
US20040246808A1 (en) * | 2003-06-03 | 2004-12-09 | Samsung Electronics Co., Ltd. | Writing driver circuit of phase-change memory |
US20050024922A1 (en) * | 2003-07-31 | 2005-02-03 | Bae Systems Information And Electronic Systems Integration, Inc. | Read/write circuit for accessing chalcogenide non-volatile memory cells |
US6930925B2 (en) * | 2003-10-14 | 2005-08-16 | Atmel Corporation | Suspend-resume programming method for flash memory |
Cited By (74)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7920415B2 (en) | 2007-02-05 | 2011-04-05 | Macronix International Co., Ltd. | Memory cell device and programming methods |
US7701759B2 (en) * | 2007-02-05 | 2010-04-20 | Macronix International Co., Ltd. | Memory cell device and programming methods |
US8125839B2 (en) * | 2007-08-23 | 2012-02-28 | Samsung Electronics Co., Ltd. | Memory device and method reducing fluctuation of read voltage generated during read while write operation |
US20090052253A1 (en) * | 2007-08-23 | 2009-02-26 | Samsung Electronics Co., Ltd. | Memory device and method reducing fluctuation of read voltage generated during read while write operation |
US20090091988A1 (en) * | 2007-10-03 | 2009-04-09 | Ferdinando Bedeschi | Writing bit alterable memories |
US8760938B2 (en) * | 2007-10-03 | 2014-06-24 | Intel Corporation | Writing bit alterable memories |
US20090106479A1 (en) * | 2007-10-19 | 2009-04-23 | Virident Systems Inc. | Managing memory systems containing components with asymmetric characteristics |
US8156299B2 (en) * | 2007-10-19 | 2012-04-10 | Virident Systems Inc. | Managing memory systems containing components with asymmetric characteristics |
US8200932B2 (en) * | 2007-10-19 | 2012-06-12 | Virident Systems Inc. | Managing memory systems containing components with asymmetric characteristics |
US8639901B2 (en) | 2007-10-19 | 2014-01-28 | Virident Systems Inc. | Managing memory systems containing components with asymmetric characteristics |
US9514038B2 (en) | 2007-10-19 | 2016-12-06 | Virident Systems Inc. | Managing memory systems containing components with asymmetric characteristics |
US20090106478A1 (en) * | 2007-10-19 | 2009-04-23 | Virident Systems Inc. | Managing Memory Systems Containing Components with Asymmetric Characteristics |
US8407439B2 (en) | 2007-10-19 | 2013-03-26 | Virident Systems Inc. | Managing memory systems containing components with asymmetric characteristics |
US8964488B2 (en) * | 2007-12-14 | 2015-02-24 | Samsung Electronics Co., Ltd. | Non-volatile memory device using variable resistance element with an improved write performance |
US8194447B2 (en) * | 2007-12-14 | 2012-06-05 | Samsung Electronics Co., Ltd. | Non-volatile memory device using variable resistance element with an improved write performance |
US20120224437A1 (en) * | 2007-12-14 | 2012-09-06 | Kim Hye-Jin | Non-volatile memory device using variable resistance element with an improved write performance |
US20090154221A1 (en) * | 2007-12-14 | 2009-06-18 | Samsung Electronics Co., Ltd. | Non-Volatile memory device using variable resistance element with an improved write performance |
KR101071705B1 (en) | 2007-12-28 | 2011-10-11 | 한국과학기술연구원 | Phase change memory apparatus having an improved cycling endurance and programming method therefor |
US7679954B2 (en) | 2007-12-28 | 2010-03-16 | Korea Institute Of Science And Technology | Phase change memory apparatus having an improved cycling endurance and programming method therefor |
WO2009084748A1 (en) * | 2007-12-28 | 2009-07-09 | Korea Institute Of Science And Technology | Phase change memory apparatus having an improved cycling endurance and programming method therefor |
US20090168504A1 (en) * | 2007-12-28 | 2009-07-02 | Korea Institute Of Science And Technology | Phase change memory apparatus having an improved cycling endurance and programing method therefor |
US8050083B2 (en) * | 2008-02-11 | 2011-11-01 | Samsung Electronics Co., Ltd. | Phase change memory device and write method thereof |
US20090201721A1 (en) * | 2008-02-11 | 2009-08-13 | Dae-Won Ha | Phase change memory device and write method thereof |
US20110096611A1 (en) * | 2008-06-05 | 2011-04-28 | Kwang Jin Lee | Semiconductor device and semiconductor system having the same |
US8189422B2 (en) * | 2008-06-05 | 2012-05-29 | Samsung Electronics Co., Ltd. | Semiconductor device and semiconductor system having the same |
US8625332B2 (en) | 2008-07-30 | 2014-01-07 | Kabushiki Kaisha Toshiba | Semiconductor memory device |
US8427861B2 (en) | 2008-07-30 | 2013-04-23 | Kabushiki Kaisha Toshiba | Semiconductor memory device |
US10971227B2 (en) * | 2008-07-31 | 2021-04-06 | Unity Semiconductor Corporation | Preservation circuit and methods to maintain values representing data in one or more layers of memory |
US8325514B2 (en) * | 2008-12-12 | 2012-12-04 | Hynix Semiconductor, Inc. | Phase change memory device |
US20100149861A1 (en) * | 2008-12-12 | 2010-06-17 | Kyoung-Wook Park | Phase change memory device |
US20100214831A1 (en) * | 2009-02-26 | 2010-08-26 | Ho-Jung Kim | Memory device, memory system having the same, and programming method of a memory cell |
US8111563B2 (en) | 2009-03-26 | 2012-02-07 | Samsung Electronics Co., Ltd. | Multi-level nonvolatile memory device with fast execution of program speed and programming method of the same |
US20100246246A1 (en) * | 2009-03-26 | 2010-09-30 | Ho-Jung Kim | Memory device, memory system having the same, and programming method of a memory cell |
US20130124792A1 (en) * | 2011-02-03 | 2013-05-16 | Stec, Inc. | Erase-suspend system and method |
US9721637B2 (en) | 2011-12-15 | 2017-08-01 | Everspin Technologies, Inc. | Method of writing to a spin torque magnetic random access memory |
US8982602B2 (en) * | 2012-08-30 | 2015-03-17 | Adesto Technologies Corporation | Memory devices, circuits and, methods that apply different electrical conditions in access operations |
US10915321B2 (en) | 2012-10-26 | 2021-02-09 | Micron Technology, Inc. | Apparatuses and methods for memory operations having variable latencies |
US10163472B2 (en) | 2012-10-26 | 2018-12-25 | Micron Technology, Inc. | Apparatuses and methods for memory operations having variable latencies |
US10067764B2 (en) | 2012-10-26 | 2018-09-04 | Micron Technology, Inc. | Apparatuses and methods for memory operations having variable latencies |
US20140122822A1 (en) * | 2012-10-26 | 2014-05-01 | Micron Technology, Inc. | Apparatuses and methods for memory operations having variable latencies |
US10885957B2 (en) | 2012-10-26 | 2021-01-05 | Micron Technology, Inc. | Apparatuses and methods for memory operations having variable latencies |
US9740485B2 (en) * | 2012-10-26 | 2017-08-22 | Micron Technology, Inc. | Apparatuses and methods for memory operations having variable latencies |
US9754648B2 (en) * | 2012-10-26 | 2017-09-05 | Micron Technology, Inc. | Apparatuses and methods for memory operations having variable latencies |
US20140122814A1 (en) * | 2012-10-26 | 2014-05-01 | Micron Technology, Inc. | Apparatuses and methods for memory operations having variable latencies |
US9813080B1 (en) | 2013-03-05 | 2017-11-07 | Microsemi Solutions (U.S.), Inc. | Layer specific LDPC decoder |
US10230396B1 (en) | 2013-03-05 | 2019-03-12 | Microsemi Solutions (Us), Inc. | Method and apparatus for layer-specific LDPC decoding |
US9734097B2 (en) * | 2013-03-15 | 2017-08-15 | Micron Technology, Inc. | Apparatuses and methods for variable latency memory operations |
US10067890B2 (en) | 2013-03-15 | 2018-09-04 | Micron Technology, Inc. | Apparatuses and methods for variable latency memory operations |
US10740263B2 (en) | 2013-03-15 | 2020-08-11 | Micron Technology, Inc. | Apparatuses and methods for variable latency memory operations |
US20140281182A1 (en) * | 2013-03-15 | 2014-09-18 | Micron Technology, Inc. | Apparatuses and methods for variable latency memory operations |
US9727493B2 (en) | 2013-08-14 | 2017-08-08 | Micron Technology, Inc. | Apparatuses and methods for providing data to a configurable storage area |
US10860482B2 (en) | 2013-08-14 | 2020-12-08 | Micron Technology, Inc. | Apparatuses and methods for providing data to a configurable storage area |
US9928171B2 (en) | 2013-08-14 | 2018-03-27 | Micron Technology, Inc. | Apparatuses and methods for providing data to a configurable storage area |
US9710192B2 (en) | 2013-08-14 | 2017-07-18 | Micron Technology, Inc. | Apparatuses and methods for providing data from a buffer |
US10223263B2 (en) | 2013-08-14 | 2019-03-05 | Micron Technology, Inc. | Apparatuses and methods for providing data to a configurable storage area |
US11347402B2 (en) | 2014-05-28 | 2022-05-31 | Micron Technology, Inc. | Performing wear leveling operations in a memory based on block cycles and use of spare blocks |
US10365835B2 (en) | 2014-05-28 | 2019-07-30 | Micron Technology, Inc. | Apparatuses and methods for performing write count threshold wear leveling operations |
US9159412B1 (en) | 2014-07-15 | 2015-10-13 | Macronix International Co., Ltd. | Staggered write and verify for phase change memory |
CN105931664A (en) * | 2015-01-22 | 2016-09-07 | 南泰若股份有限公司 | Methods for reading and programming 1-R resistive change element arrays |
US10332613B1 (en) | 2015-05-18 | 2019-06-25 | Microsemi Solutions (Us), Inc. | Nonvolatile memory system with retention monitor |
US9799405B1 (en) | 2015-07-29 | 2017-10-24 | Ip Gem Group, Llc | Nonvolatile memory system with read circuit for performing reads using threshold voltage shift read instruction |
US9886214B2 (en) | 2015-12-11 | 2018-02-06 | Ip Gem Group, Llc | Nonvolatile memory system with erase suspend circuit and method for erase suspend management |
US10152273B2 (en) | 2015-12-11 | 2018-12-11 | Ip Gem Group, Llc | Nonvolatile memory controller and method for erase suspend management that increments the number of program and erase cycles after erase suspend |
US9892794B2 (en) | 2016-01-04 | 2018-02-13 | Ip Gem Group, Llc | Method and apparatus with program suspend using test mode |
US9899092B2 (en) | 2016-01-27 | 2018-02-20 | Ip Gem Group, Llc | Nonvolatile memory system with program step manager and method for program step management |
US10430236B2 (en) | 2016-03-18 | 2019-10-01 | Samsung Electronics Co., Ltd. | Electronic device and method for resuming process thereof |
US10157677B2 (en) | 2016-07-28 | 2018-12-18 | Ip Gem Group, Llc | Background reference positioning and local reference positioning using threshold voltage shift read |
US10291263B2 (en) | 2016-07-28 | 2019-05-14 | Ip Gem Group, Llc | Auto-learning log likelihood ratio |
US10283215B2 (en) | 2016-07-28 | 2019-05-07 | Ip Gem Group, Llc | Nonvolatile memory system with background reference positioning and local reference positioning |
US10236915B2 (en) | 2016-07-29 | 2019-03-19 | Microsemi Solutions (U.S.), Inc. | Variable T BCH encoding |
US10453508B2 (en) * | 2016-09-22 | 2019-10-22 | SK Hynix Inc. | Semiconductor memory apparatus with a write voltage level detection |
US11120853B2 (en) | 2016-09-22 | 2021-09-14 | SK Hynix Inc. | Semiconductor memory apparatus with a write voltage level detection |
CN110390990A (en) * | 2018-04-18 | 2019-10-29 | 力旺电子股份有限公司 | Memory circuit and the method for operating memory circuit |
CN112015367A (en) * | 2020-08-26 | 2020-12-01 | 上海新氦类脑智能科技有限公司 | Nonvolatile Boolean logic operation unit, method and device |
Also Published As
Publication number | Publication date |
---|---|
CN101038789A (en) | 2007-09-19 |
KR20070094104A (en) | 2007-09-20 |
US7349245B2 (en) | 2008-03-25 |
KR100816748B1 (en) | 2008-03-27 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7349245B2 (en) | Non-volatile phase-change memory device and associated program-suspend-read operation | |
EP1835508B1 (en) | Pram and associated operation method and system | |
US7885098B2 (en) | Non-volatile phase-change memory device and method of reading the same | |
US8014190B2 (en) | Resistance variable memory device and method of writing data | |
US7457152B2 (en) | Non-volatile memory devices and systems including phase-change one-time-programmable (OTP) memory cells and related methods | |
US7940552B2 (en) | Multiple level cell phase-change memory device having pre-reading operation resistance drift recovery, memory systems employing such devices and methods of reading memory devices | |
US7471553B2 (en) | Phase change memory device and program method thereof | |
CN101101791B (en) | Non-volatile memory and control method thereof | |
US8199603B2 (en) | Nonvolatile memory devices having variable-resistance memory cells and methods of programming the same | |
US7436693B2 (en) | Phase-change semiconductor memory device and method of programming the same | |
US7778079B2 (en) | Multiple level cell phase-change memory devices having post-programming operation resistance drift saturation, memory systems employing such devices and methods of reading memory devices | |
US7511993B2 (en) | Phase change memory device and related programming method | |
US7463511B2 (en) | Phase change memory device using multiprogramming method | |
US20060256612A1 (en) | Phase change memory device and method of driving word line thereof | |
US9899081B2 (en) | Resistive memory device and a memory system including the same | |
US20110063904A1 (en) | Phase change memory device, memory system, and programming method | |
US8077507B2 (en) | Phase-change memory device | |
US7352616B2 (en) | Phase change random access memory, boosting charge pump and method of generating write driving voltage | |
US7957180B2 (en) | Phase change memory device having decentralized driving units | |
US8665655B2 (en) | Non-volatile memory device and sensing method thereof | |
US7317655B2 (en) | Memory cell array biasing method and a semiconductor memory device | |
CN113380295A (en) | Variable resistive memory device and method of operating the same |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: SAMSUNG ELECTRONICS CO., LTD., KOREA, REPUBLIC OF Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:KIM, HYE-JIN;LEE, KWANG-JIN;KANG, SANG-BEOM;AND OTHERS;REEL/FRAME:018063/0912 Effective date: 20060522 |
|
FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
|
FPAY | Fee payment |
Year of fee payment: 4 |
|
FPAY | Fee payment |
Year of fee payment: 8 |
|
MAFP | Maintenance fee payment |
Free format text: PAYMENT OF MAINTENANCE FEE, 12TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1553); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY Year of fee payment: 12 |