US20080249269A1 - Electret materials - Google Patents

Electret materials Download PDF

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US20080249269A1
US20080249269A1 US12/079,605 US7960508A US2008249269A1 US 20080249269 A1 US20080249269 A1 US 20080249269A1 US 7960508 A US7960508 A US 7960508A US 2008249269 A1 US2008249269 A1 US 2008249269A1
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Prior art keywords
alkyl
substituted
unsubstituted
hydroxy
cycloalkyl
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US12/079,605
Inventor
Hui Chin
Andrew J. Leggio
Matthew E. Gande
Anthony D. DeBellis
Sai P. Shum
Per Magnus Kristiansen
Klaus Stoll
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BASF Performance Products LLC
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Ciba Corp
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Priority to US12/079,605 priority Critical patent/US20080249269A1/en
Publication of US20080249269A1 publication Critical patent/US20080249269A1/en
Assigned to CIBA CORP. reassignment CIBA CORP. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KRISTIANSEN, PER MAGNUS, STOLL, KLAUS, CHIN, HUI, DEBELLIS, ANTHONY D., GANDE, MATTHEW E., LEGGIO, ANDREW J., SHUM, SAI P.
Priority to US13/151,732 priority patent/US20110230109A1/en
Priority to US13/431,099 priority patent/US20120184170A1/en
Priority to US13/611,784 priority patent/US8415416B2/en
Abandoned legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G7/00—Capacitors in which the capacitance is varied by non-mechanical means; Processes of their manufacture
    • H01G7/02—Electrets, i.e. having a permanently-polarised dielectric
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES OR LIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
    • H01G7/00—Capacitors in which the capacitance is varied by non-mechanical means; Processes of their manufacture
    • H01G7/02—Electrets, i.e. having a permanently-polarised dielectric
    • H01G7/021—Electrets, i.e. having a permanently-polarised dielectric having an organic dielectric
    • H01G7/023—Electrets, i.e. having a permanently-polarised dielectric having an organic dielectric of macromolecular compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/60—Nonwoven fabric [i.e., nonwoven strand or fiber material]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
    • Y10T442/60—Nonwoven fabric [i.e., nonwoven strand or fiber material]
    • Y10T442/696—Including strand or fiber material which is stated to have specific attributes [e.g., heat or fire resistance, chemical or solvent resistance, high absorption for aqueous compositions, water solubility, heat shrinkability, etc.]

Definitions

  • the present invention is aimed at electret materials having excellent thermal stability and charge stability.
  • the electret materials are for example polyolefin fibers or films and are suitably employed as filter materials, wipes, absorbent materials, filter masks, acoustic materials, printing substrates, measuring devices or contactless switches.
  • U.S. Pat. No. 5,057,710 teaches electret materials comprising hindered amines, nitrogen containing hindered phenols or metal-containing hindered phenols.
  • U.S. Pat. No. 6,969,484 discloses a method of making electret.
  • an electret material with enhanced thermal and charge stability which material has been subjected to an electret treatment, comprising
  • thermoplastic polymer a thermoplastic polymer
  • an effective stabilizing amount of one or more aromatic trisamide compounds incorporated therein, an effective stabilizing amount of one or more aromatic trisamide compounds.
  • the thermoplastic polymer is a non-conductive polymer that has the capability of possessing a non-transitory or long-lived trapped charge.
  • the polymer is for example a polyolefin, a halogenated vinyl polymer (e.g. polyvinyl chloride), polystyrene, polycarbonate, a polyester (e.g. polyethylene terephthalate), a polyamide or a fluoropolymer (e.g. polytetrafluoroethylene).
  • the thermoplastic polymers are for example propylene homopolymers, propylene copolymers and polypropylene blends.
  • Propylene copolymers may contain various proportions up to 90%, preferably up to 50%, of comonomers.
  • Examples of comonomers are: olefins such as 1-olefins, e.g. ethylene, 1-butene, 1-pentene, 1-hexene, 1-heptene or 1-octene, isobutylene, cycloolefins, e.g.
  • cyclopentene cyclohexene, norbornene or ethylidenenorborne
  • dienes such as butadiene, isoprene, 1,4-hexadiene, cyclopentadiene, dicyclopentadiene or norbornadiene; also acrylic acid derivatives and unsaturated carboxylic anhydrides such as maleic anhydride.
  • Polypropylene blends which can be used are mixtures of polypropylene with polyolefins.
  • Examples are blends of polypropylene with polyethylene selected from the group consisting of high density polyethylene (HDPE), high molecular weight high density polyethylene (HMW HDPE), ultra high molecular weight high density polyethylene (UHMW HDPE), medium density polyethylene (MDPE), low density polyethylene (LDPE), linear low density polyethylene (LLDPE), branched low density polyethylene (BLDPE) and ethylene-propylene-diene terpolymers (EPDM) containing small proportions of diene.
  • HDPE high density polyethylene
  • HMW HDPE high molecular weight high density polyethylene
  • UHMW HDPE ultra high molecular weight high density polyethylene
  • MDPE medium density polyethylene
  • LDPE low density polyethylene
  • LLDPE linear low density polyethylene
  • BLDPE branched low density polyethylene
  • EPDM ethylene-propylene-diene terpolymers
  • the polymer is especially a polyolefin, for example polypropylene, poly(4-methyl-1-pentene) or linear low density polyethylene, or blends or copolymers thereof.
  • the polymer may be a blend of a polyolefin and a polymer that contains polar groups, for example a polyester or a polyamide.
  • Polypropylene includes for instance reactor (such as metallocene) and visbroken (e.g. peroxides, hydroxylamine esters, thermally broken, etc.) grades.
  • reactor such as metallocene
  • visbroken e.g. peroxides, hydroxylamine esters, thermally broken, etc.
  • the electret material comprising the thermoplastic material is in the form of a nonwoven web, a film, or a woven fabric.
  • the electret material is in particular a nonwoven fibrous web.
  • the thermoplastic polymer may also be for example polyurethane or a polyester such as polylactic acid.
  • the polyurethane may for example be in the form of a foam.
  • the electret material may be a natural fiber such as cotton.
  • the electret treatment may be any known treatment. Electret treatments are taught for example in U.S. Pat. Nos. 5,057,710, 5,556,618, 6,123,752, 6,743,464, 6,969,484, 6,284,339, 5,256,176 and 6,926,961, the disclosures of which are hereby incorporated by reference.
  • the electret treatment is for example hydro-charging, tribo-electric charging or corona treatment.
  • the electret treatment is especially a corona treatment.
  • An electret material according to this invention is a thermoplastic material that has been subjected to an electret treatment.
  • aromatic trisamides are for instance of formula I
  • C 1 -C 20 alkyl examples are methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, 2-ethylbutyl, n-pentyl, isopentyl, 1-methylpentyl, 1,3-dimethylbutyl, n-hexyl, 1-methyl-hexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1-methylheptyl, 3-methylheptyl, n-octyl, 2-ethylhexyl, 1,1,3-trimethylhexyl, 1,1,3,3-tetramethylpentyl, nonyl, decyl, undecyl, 1-methyl-undecyl, dodecyl, 1,1,3,3,5,5-hexamethylhexyl, tridecyl, tetrade
  • C 2 -C 20 alkyl substituted by C 1 -C 10 alkylamino, di(C 1 -C 10 alkyl)amino, C 1 -C 10 alkyloxy or hydroxy are 3-methylaminopropyl, 2-dimethylaminoethyl, 2-diethylaminoethyl, 3-dimethylaminopropyl, 3-diethylaminopropyl, 2-methoxyethyl, 2-ethoxyethyl, 2-methoxypropyl, 3-methoxypropyl, 2-ethoxypropyl, 3-isopropoxypropyl and hydroxyethyl.
  • Preferred examples are 3-dimethylaminopropyl, 3-methoxypropyl and 2-methoxyethyl.
  • C 3 -C 20 alkenyl examples are allyl, 2-methallyl, butenyl, pentenyl, hexenyl and oleyl.
  • the carbon atom in position 1 is preferably saturated.
  • Preferred examples are allyl and oleyl.
  • C 5 -C 12 cycloalkyl examples are cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl and cyclododecyl. Preferred examples are cyclohexyl, cycloheptyl, cyclooctyl and cyclododecyl.
  • C 5 -C 12 cycloalkyl substituted by 1, 2 or 3 C 1 -C 10 alkyl are 3-methylcyclohexyl and 2,3-dimethylcyclohexyl.
  • cyclohexylmethyl substituted by 1, 2 or 3 C 1 -C 10 alkyl is 1-cyclohexylethyl.
  • C 5 -C 9 cycloalkenyl is cyclohexenyl.
  • C 5 -C 9 cycloalkenyl substituted by 1, 2 or 3 C 1 -C 10 alkyl is methylcyclohexenyl.
  • phenyl substituted by 1, 2 or 3 radicals selected from the group consisting of C 1 -C 10 alkyl, C 1 -C 10 alkyloxy, hydroxy, halogen, trihalogenmethyl, trihalogenmethoxy, benzoyl, phenylamino, acylamino and phenylazo are 4-methylphenyl, 2-ethylphenyl, 4-ethylphenyl, 4-isopropylphenyl, 4-tert-butylphenyl, 4-sec-butylphenyl, 4-isobutylphenyl, 3,5-dimethylphenyl, 3,4-dimethylphenyl, 2,4-dimethylphenyl, 2,6-diethylphenyl, 2-ethyl-6-methylphenyl, 2,6-diisopropylphenyl, 4-methoxyphenyl, 4-ethoxyphenyl, 4-hydroxyphenyl, 4-fluorophenyl, 3,5-difluoropheny
  • C 7 -C 9 phenylalkyl examples are benzyl and 2-phenylethyl. Benzyl is preferred.
  • C 7 -C 9 phenylalkyl which is substituted on the phenyl by 1, 2 or 3 radicals selected from the group consisting of C 1 -C 10 alkyl, C 1 -C 10 alkoxy and hydroxy are methylbenzyl, dimethylbenzyl, trimethylbenzyl, tert-butylbenzyl, methoxybenzyl and 3,5-di-tert-butyl-4-hydroxybenzyl.
  • naphthyl substituted by C 1 -C 10 alkyl is methylnaphthyl.
  • Examples of a 5 to 6 membered heterocyclic group are 2-picolyl, (2-furyl)methyl, (2-tetrahydrofuryl)methyl, 2-pyrimidyl, 6-methyl-2-pyridyl, 1,2,4-triazol-3-yl and 2-(1-piperazinyl)ethyl.
  • aromatic trisamides are for example of formulae IIa, IIb or IIc
  • C 1 -C 20 alkyl e.g. branched C 3 -C 20 alkyl, unsubstituted or substituted by one or more hydroxy, e.g. 1, 2 or 3 hydroxy
  • hydroxy e.g. 1, 2 or 3 hydroxy
  • Branched C 3 -C 10 alkyl is particularly preferred.
  • One of the preferred meanings of the radicals R 1 , R 2 and R 3 , or Y 1 , Y 2 and Y 3 , or Z 1 , Z 2 and Z 3 is branched C 3 -C 10 alkyl with a quaternary C atom in position 1, in particular —C(CH 3 ) 2 —H or —C(CH 3 ) 2 —(C 1 -C 7 alkyl).
  • Examples of C 2 -C 20 alkenyl unsubstituted or substituted by one or more hydroxy, e.g. 1, 2 or 3 hydroxy, are 9-decenyl, 8-heptadecenyl and 1 1-hydroxy-8-heptadecenyl.
  • C 2 -C 20 alkyl interrupted by oxygen are t-butoxymethyl, t-butoxyethyl, t-butoxypropyl and t-butoxybutyl.
  • C 2 -C 20 alkyl interrupted by sulfur are (H 3 C) 3 C—S—CH 2 —, (H 3 C) 3 C—S—C 2 H 4 —, (H 3 C) 3 C—S—C 3 H 6 — and (H 3 C) 3 C—S—C 4 H 8 —.
  • C 3 -C 12 cycloalkyl unsubstituted or substituted by one or more C 1 -C 20 alkyl e.g. 1, 2, 3 or 4 C 1 -C 4 alkyl
  • C 1 -C 20 alkyl e.g. 1, 2, 3 or 4 C 1 -C 4 alkyl
  • C 1 -C 20 alkyl e.g. 1, 2, 3 or 4 C 1 -C 4 alkyl
  • Examples of (C 3 -C 12 cycloalkyl)-C 1 -C 10 alkyl unsubstituted or substituted by one or more C 1 -C 20 alkyl, e.g. 1, 2 or 3 C 1 -C 4 alkyl, are cyclopentylmethyl, 2-cyclopentylethyl, cyclohexylmethyl, 2-cycohexylethyl, 3-cyclohexylpropyl, 4-cyclohexylbutyl and (4-methylcyclohexyl)methyl.
  • phenyl unsubstituted or substituted by one or more radicals selected from C 1 -C 20 alkyl, C 1 -C 20 alkoxy, C 1 -C 20 alkylamino, di(C 1 -C 20 alkyl)amino, hydroxy and nitro, preferably C 1 -C 4 alkyl, C 1 -C 4 alkoxy, C 1 -C 4 alkylamino, di(C 1 -C 4 alkyl)amino, hydroxy and nitro, are phenyl, 3-methylphenyl, 3-methoxyphenyl, 4-methylphenyl, 4-ethylphenyl, 4-propylphenyl, 4-isopropylphenyl, 4-tert-butylphenyl, 4-isopropoxyphenyl, 2,3-dimethoxyphenyl, 2-nitrophenyl, 3-methyl-6-nitrophenyl, 4-dimethylaminophenyl
  • phenyl-C 1 -C 20 alkyl unsubstituted or substituted by one or more radicals, e.g. 1, 2 or 3 radicals, selected from C 1 -C 20 alkyl, C 3 -C 12 cycloalkyl, phenyl, C 1 -C 20 alkoxy and hydroxy, preferably C 1 -C 4 alkyl, C 3 -C 6 cycloalkyl, phenyl, C 1 -C 4 alkoxy and hydroxy, are benzyl, ⁇ -cyclohexylbenzyl, diphenylmethyl, 1-phenylethyl, ⁇ -hydroxybenzyl, 2-phenylethyl, 2-phenylpropyl, 3-phenylpropyl, 3-methylbenzyl, 3,4-dimethoxybenzyl and 2-(3,4-dimethoxyphenyl)ethyl.
  • radicals e.g. 1, 2 or 3 radicals, selected from C 1 -C 20 alky
  • phenylethenyl unsubstituted or substituted by one or more C 1 -C 20 alkyl e.g. 1, 2 or 3 C 1 -C 4 alkyl
  • 2-(4-methylphenyl)ethenyl is 2-(4-methylphenyl)ethenyl.
  • biphenyl-(C 1 -C 10 alkyl) unsubstituted or substituted by one or more C 1 -C 20 alkyl, e.g. 1, 2 or 3 C 1 -C 4 alkyl, is 4-biphenylmethyl.
  • naphthyl unsubstituted or substituted by one or more C 1 -C 20 alkyl e.g. 1, 2 or 3 C 1 -C 4 alkyl
  • Examples of naphthyl unsubstituted or substituted by one or more C 1 -C 20 alkyl are 1-naphthyl and 2-naphthyl.
  • naphthyl-C 1 -C 20 alkyl unsubstituted or substituted by one or more C 1 -C 20 alkyl e.g. 1, 2 or 3 C 1 -C 4 alkyl
  • Examples of naphthyl-C 1 -C 20 alkyl unsubstituted or substituted by one or more C 1 -C 20 alkyl, e.g. 1, 2 or 3 C 1 -C 4 alkyl are 1-naphthylmethyl and 2-naphthylmethyl.
  • naphthoxymethyl unsubstituted or substituted by one or more C 1 -C 20 alkyl e.g. 1, 2 or 3 C 1 -C 4 alkyl
  • biphenylenyl, flourenyl or anthryl is 2-biphenylenyl, 9-flourenyl, 1-flourenyl or 9-anthryl, respectively.
  • Examples of a 5- to 6-membered heterocyclic radical unsubstituted or substituted by one or more C 1 -C 20 alkyl, e.g. 1, 2 or 3 C 1 -C 4 alkyl, are 3-pyridinyl, 4-pyridinyl, 2-hydroxypyridin-3-yl, 3-quinolinyl, 4-quinolinyl, 2-furyl, 3-furyl and 1-methyl-2-pyrryl.
  • Examples of a C 1 -C 20 hydrocarbon radical containing one or more halogen, e.g. 1, 2, 3, 4, 5, or 6 —F, —Cl or -J, are 1-bromo-2-methylpropyl, dichloromethyl, pentafluoroethyl, 3,5-bis[trifluoromethyl]phenyl, 2,3,5,6-tetrafluoro-p-tolyl, 2,3-dichlorophenyl, 3,4-dichlorophenyl and 2,4-bis[trifluoromethyl]phenyl.
  • thermoplastic polymer The addition of the aromatic trisamides to the thermoplastic polymer can be carried out in all customary mixing machines in which the polymer is melted and mixed with the additives.
  • Suitable machines are known to those skilled in the art. They are predominantly mixers, kneaders and extruders.
  • the process is preferably carried out in an extruder by introducing the additives during processing.
  • processing machines are single-screw extruders, contrarotating and corotating twin-screw extruders, planetary-gear extruders, ring extruders or cokneaders. It is also possible to use processing machines provided with at least one gas removal compartment to which a vacuum can be applied.
  • Suitable extruders and kneaders are described, for example, in Handbuch der Kunststoffextrusion, Vol. 1 Unen, Editors F. Hensen, W Knappe, H. Potente, 1989, pp. 3-7, ISBN: 3-446-14339-4 (Vol. 2 Extrusionsanlagen 1986, ISBN 3-446-14329-7).
  • the screw length is 1-60 screw diameters, preferably 35-48 screw diameters.
  • the rotational speed of the screw is preferably 10-600 rotations per minute (rpm), very particularly preferably 25-300 rpm.
  • the maximum throughput is dependent on the screw diameter, the rotational speed and the driving force.
  • the process of the present invention can also be carried out at a level lower than maximum throughput by varying the parameters mentioned or employing weighing machines delivering dosage amounts.
  • the polymers need to be subjected to an elevated temperature for a sufficient period of time during incorporation of additives.
  • the temperature is generally above the softening point of the polymers.
  • a temperature range lower than 280° C., particularly from about 160° C. to 280° C. is employed.
  • the temperature range from about 200° C. to 270° C. is employed.
  • the above-described aromatic trisamide compounds are present in concentrations, based on the amount of the polymer, of from about 0.001 to about 1.0% by weight.
  • the trisamides are present from about 0.005 to 0.5% by weight, from about 0.01 to about 0.1% by weight, from about 0.01 to about 0.09% by weight, based on the weight of the polymer.
  • the aromatic trisamides can be added as individual compounds or as mixtures to the polymer.
  • Incorporation of additives into the polymers can be carried out, for example, by mixing the above-described aromatic trisamides or mixtures thereof and, if desired, further additives into the polymers using the methods customary in process technology.
  • the aromatic trisamides can also be added to the polymers in the form of a masterbatch in which these compounds are present, for example, in a concentration of from about 1 to 25% by weight.
  • the present invention therefore further provides a concentrate in which the compounds of the invention are present in a concentration of 1-25% by weight and which can be added to the thermoplastic polymer.
  • the present trisamides may be topically applied to the electret material.
  • the present trisamides may be topically applied.
  • Another aspect of this invention is the co-use of certain other additives along with the present aromatic trisamides. These certain other additives are incorporated in the same manner as the trisamides.
  • the class of stabilizers of the hindered amine light stabilizers are advantageously also employed in the present compositions and processes.
  • the present sterically hindered amine stabilizers contain at least one moiety of formula
  • G 1 , G 2 , G 3 and G 4 are independently alkyl of 1 to 8 carbon atoms or G 1 and G 2 or G 3 and G 4 together are pentamethylene and G 5 is hydrogen or alkyl of 1 to 8 carbon atoms.
  • the hindered amines are disclosed for example in U.S. Pat. Nos. 5,004,770, 5,204,473, 5,096,950, 5,300,544, 5,112,890, 5,124,378, 5,145,893, 5,216,156, 5,844,026, 5,980,783, 6,046,304, 6,117,995, 6,271,377, 6,297,299, 6,392,041, 6,376,584, 6,472,456, and 7,030,196.
  • the relevant disclosures of these patents are hereby incorporated by reference.
  • Suitable hindered amines include for example:
  • N—H sterically hindered N—H, N-methyl, N-methoxy, N-propoxy, N-octyloxy, N-cyclohexyloxy, N-(2-hydroxy-2-methylpropoxy) and N-acyl analogues of any of the above mentioned compounds.
  • N—H hindered amine replacing an N—H hindered amine with an N-methyl hindered amine would be employing the N-methyl analogue in place of the N—H.
  • the class of additives known as the hydroxyphenylalkylphosphonic esters or monoesters are also advantegously employed in the processes and compositions of this invention.
  • the hydroxyphenylalkylphosphonic esters or monoesters are disclosed for example in U.S. published app. No. 2004/0106767, the disclosure of which is hereby incorporated by reference.
  • the hydroxyphenylalkylphosphonic esters or monoesters are of the formula
  • the present hydroxyphenylalkylphosphonic ester or monoester is a compound of the formula P1 or P2
  • the further additives of the hindered amine light stabilizers and the hydroxyphenylalkylphosphonic esters or monoesters are employed at levels, based on the weight of the polymer, of from about 0.001 to 5.0% by weight, in particular from 0.01 to 2.0% by weight and particularly preferably from 0.02 to 1.0% by weight.
  • Polypropylene with MFI index of 1,100 is tumble mixed to contain 5.0% total weight of a sterically hindered amine (HALS), 2.0% total weight of a sterically hindered hydroxyphenylalkylphosphonic monoester (HPPME), 0.25% total weight aromatic trisamide (TA1)-(TA14).
  • HALS sterically hindered amine
  • HPPME sterically hindered hydroxyphenylalkylphosphonic monoester
  • TA1-(TA14) 0.25% total weight aromatic trisamide
  • the same polypropylene is tumble mixed with the appropriate amounts of masterbatch for each of the evaluations.
  • the tumble mixing is via a Marion Mixer SPS 1224 which is a paddle type slow RPM mixer. These are considered the final mixes.
  • the polypropylene webs are then treated by corona discharge.
  • the samples are tested using TSI Filter Tester (Model 8130) which employs challenges of sodium chloride aerosol at 32 liters per minute using a test area of 100 cm 2 .
  • the present aromatic trisamides provide polypropylene with excellent thermal and charge stability.
  • the trisamides are present at very low levels.

Abstract

Disclosed are electret materials with outstanding thermal and charge stability. The electret materials comprise a melt blend of a thermoplastic polymer and one or more compounds selected from the aromatic trisamides. The aromatic trisamides are for example of the formula
Figure US20080249269A1-20081009-C00001
The melt blends are subjected to an electret treatment, for example a corona treatment. The electret materials are for example nonwoven polyolefin webs and are employed as filter materials, wipes, absorbent materials, filter masks, acoustic materials, printing substrates, measuring devices or contactless switches. The present electret materials may also comprise a further additive selected from the hindered amine light stabilizers and the hydroxyphenylalkylphosphonic esters or monoesters.

Description

  • This application claims benefit of U.S. provisional application No. 60/928,610, filed May 10, 2007 and 60/922,024, filed Apr. 5, 2007, the contents of which are incorporated herein by reference.
  • The present invention is aimed at electret materials having excellent thermal stability and charge stability. The electret materials are for example polyolefin fibers or films and are suitably employed as filter materials, wipes, absorbent materials, filter masks, acoustic materials, printing substrates, measuring devices or contactless switches.
    • BACKGROUND
  • U.S. Pat. No. 5,057,710 teaches electret materials comprising hindered amines, nitrogen containing hindered phenols or metal-containing hindered phenols.
  • U.S. Pat. No. 5,556,618 discloses antibacterial electret materials.
  • U.S. Pat. No. 6,123,752 teaches high efficiency filter medium containing a performance enhancing additive.
  • U.S. Pat. No. 6,743,464 teaches a method of making electrets through vapor condensation.
  • U.S. Pat. No. 6,969,484 discloses a method of making electret.
  • U.S. patent app. No. 60/791,047, filed Apr. 11, 2006, teaches electret materials comprising certain additives.
  • U.S. published app. No. 2005/0203226 and WO 2004/072168 teach trisamide nucleating agents.
  • Mohmeyer, et al., in Polymer, 48(2007), 1612-1619, discusses electret materials.
    • SUMMARY
  • Disclosed is an electret material with enhanced thermal and charge stability, which material has been subjected to an electret treatment, comprising
  • a thermoplastic polymer and
  • incorporated therein, an effective stabilizing amount of one or more aromatic trisamide compounds.
  • Also disclosed is a method for preparing an electret material with enhanced thermal and charge stability, which method comprises
  • melt blending a thermoplastic polymer with an effective stabilizing amount of one or more aromatic trisamide compounds and
  • subjecting the blend to an electret treatment.
    • DETAILED DISCLOSURE
  • The thermoplastic polymer is a non-conductive polymer that has the capability of possessing a non-transitory or long-lived trapped charge. The polymer is for example a polyolefin, a halogenated vinyl polymer (e.g. polyvinyl chloride), polystyrene, polycarbonate, a polyester (e.g. polyethylene terephthalate), a polyamide or a fluoropolymer (e.g. polytetrafluoroethylene).
  • The thermoplastic polymers are for example propylene homopolymers, propylene copolymers and polypropylene blends. Propylene copolymers may contain various proportions up to 90%, preferably up to 50%, of comonomers. Examples of comonomers are: olefins such as 1-olefins, e.g. ethylene, 1-butene, 1-pentene, 1-hexene, 1-heptene or 1-octene, isobutylene, cycloolefins, e.g. cyclopentene, cyclohexene, norbornene or ethylidenenorborne, dienes such as butadiene, isoprene, 1,4-hexadiene, cyclopentadiene, dicyclopentadiene or norbornadiene; also acrylic acid derivatives and unsaturated carboxylic anhydrides such as maleic anhydride.
  • Polypropylene blends which can be used are mixtures of polypropylene with polyolefins. Examples are blends of polypropylene with polyethylene selected from the group consisting of high density polyethylene (HDPE), high molecular weight high density polyethylene (HMW HDPE), ultra high molecular weight high density polyethylene (UHMW HDPE), medium density polyethylene (MDPE), low density polyethylene (LDPE), linear low density polyethylene (LLDPE), branched low density polyethylene (BLDPE) and ethylene-propylene-diene terpolymers (EPDM) containing small proportions of diene.
  • The polymer is especially a polyolefin, for example polypropylene, poly(4-methyl-1-pentene) or linear low density polyethylene, or blends or copolymers thereof. The polymer may be a blend of a polyolefin and a polymer that contains polar groups, for example a polyester or a polyamide.
  • Polypropylene includes for instance reactor (such as metallocene) and visbroken (e.g. peroxides, hydroxylamine esters, thermally broken, etc.) grades.
  • The electret material comprising the thermoplastic material is in the form of a nonwoven web, a film, or a woven fabric. The electret material is in particular a nonwoven fibrous web.
  • The thermoplastic polymer may also be for example polyurethane or a polyester such as polylactic acid. The polyurethane may for example be in the form of a foam.
  • In addition to thermoplastic fibers, the electret material may be a natural fiber such as cotton.
  • The electret treatment may be any known treatment. Electret treatments are taught for example in U.S. Pat. Nos. 5,057,710, 5,556,618, 6,123,752, 6,743,464, 6,969,484, 6,284,339, 5,256,176 and 6,926,961, the disclosures of which are hereby incorporated by reference. The electret treatment is for example hydro-charging, tribo-electric charging or corona treatment. The electret treatment is especially a corona treatment.
  • An electret material according to this invention is a thermoplastic material that has been subjected to an electret treatment.
  • The aromatic trisamide compounds are taught for example in U.S. published app. No. 2005/0203226 and U.S. application Ser. No.10/544,508, published as WO 2004/072168, the contents of which are hereby incorporated by reference.
  • The aromatic trisamides are for instance of formula I
  • Figure US20080249269A1-20081009-C00002
  • wherein
    • R1, R2, R3, R4, R5 and R6, independently of one another, are hydrogen,
    • C1-C20alkyl,
    • C2-C20alkyl substituted by C1-C10alkylamino, di(C1-C10alkyl)amino, C1-C10alkyloxy or hydroxy;
    • C3-C20alkenyl,
    • C5-C12cycloalkyl,
    • C5-C12cycloalkyl substituted by 1, 2 or 3 C1-C10alkyl; cyclohexylmethyl;
    • cyclohexylmethyl substituted by 1, 2 or 3 C1-C10alkyl;
    • C5-C9cycloalkenyl,
    • C5-C9cycloalkenyl substituted by 1, 2 or 3 C1-C10alkyl;
    • phenyl substituted by 1, 2 or 3 radicals selected from the group consisting of C1-C10alkyl,
    • C1-C10alkyloxy, hydroxy, halogen, trihalogenmethyl, trihalogenmethoxy, benzoyl, phenylamino, acylamino and phenylazo;
    • C7-C9phenylalkyl,
    • C7-C9phenylalkyl which is substituted on the phenyl by 1, 2 or 3 radicals selected from the group consisting of C1-C10alkyl, C1-C10alkoxy and hydroxy;
    • naphthyl,
    • naphthyl substituted by C1-C10alkyl;
    • adamantyl, or
    • a 5 to 6 membered heterocyclic group.
  • Examples of C1-C20alkyl are methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, 2-ethylbutyl, n-pentyl, isopentyl, 1-methylpentyl, 1,3-dimethylbutyl, n-hexyl, 1-methyl-hexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1-methylheptyl, 3-methylheptyl, n-octyl, 2-ethylhexyl, 1,1,3-trimethylhexyl, 1,1,3,3-tetramethylpentyl, nonyl, decyl, undecyl, 1-methyl-undecyl, dodecyl, 1,1,3,3,5,5-hexamethylhexyl, tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl and eicosyl. Preferred examples are butyl, octyl and octadecyl.
  • Examples of C2-C20alkyl substituted by C1-C10alkylamino, di(C1-C10alkyl)amino, C1-C10alkyloxy or hydroxy are 3-methylaminopropyl, 2-dimethylaminoethyl, 2-diethylaminoethyl, 3-dimethylaminopropyl, 3-diethylaminopropyl, 2-methoxyethyl, 2-ethoxyethyl, 2-methoxypropyl, 3-methoxypropyl, 2-ethoxypropyl, 3-isopropoxypropyl and hydroxyethyl. Preferred examples are 3-dimethylaminopropyl, 3-methoxypropyl and 2-methoxyethyl.
  • Examples of C3-C20alkenyl are allyl, 2-methallyl, butenyl, pentenyl, hexenyl and oleyl. The carbon atom in position 1 is preferably saturated. Preferred examples are allyl and oleyl.
  • Examples of C5-C12cycloalkyl are cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl and cyclododecyl. Preferred examples are cyclohexyl, cycloheptyl, cyclooctyl and cyclododecyl.
  • Preferred examples of C5-C12cycloalkyl substituted by 1, 2 or 3 C1-C10alkyl are 3-methylcyclohexyl and 2,3-dimethylcyclohexyl.
  • An example of cyclohexylmethyl substituted by 1, 2 or 3 C1-C10alkyl is 1-cyclohexylethyl.
  • An example of C5-C9cycloalkenyl is cyclohexenyl.
  • An example of C5-C9cycloalkenyl substituted by 1, 2 or 3 C1-C10alkyl is methylcyclohexenyl.
  • Examples of phenyl substituted by 1, 2 or 3 radicals selected from the group consisting of C1-C10alkyl, C1-C10alkyloxy, hydroxy, halogen, trihalogenmethyl, trihalogenmethoxy, benzoyl, phenylamino, acylamino and phenylazo are 4-methylphenyl, 2-ethylphenyl, 4-ethylphenyl, 4-isopropylphenyl, 4-tert-butylphenyl, 4-sec-butylphenyl, 4-isobutylphenyl, 3,5-dimethylphenyl, 3,4-dimethylphenyl, 2,4-dimethylphenyl, 2,6-diethylphenyl, 2-ethyl-6-methylphenyl, 2,6-diisopropylphenyl, 4-methoxyphenyl, 4-ethoxyphenyl, 4-hydroxyphenyl, 4-fluorophenyl, 3,5-difluorophenyl, 2-chlorophenyl, 3-chlorophenyl, 3-chloro-6-methylphenyl, 3,5-di(trifluoromethyl)phenyl, 4-trifluoromethoxyphenyl, 2-benzoylphenyl, 4-phenylaminophenyl, 4-acetamidophenyl and 4-(phenylazo)phenyl. A preferred example is 3,4-dimethylphenyl.
  • Examples of C7-C9phenylalkyl are benzyl and 2-phenylethyl. Benzyl is preferred.
  • Examples of C7-C9phenylalkyl which is substituted on the phenyl by 1, 2 or 3 radicals selected from the group consisting of C1-C10alkyl, C1-C10alkoxy and hydroxy are methylbenzyl, dimethylbenzyl, trimethylbenzyl, tert-butylbenzyl, methoxybenzyl and 3,5-di-tert-butyl-4-hydroxybenzyl.
  • An example of naphthyl substituted by C1-C10alkyl is methylnaphthyl.
  • Examples of a 5 to 6 membered heterocyclic group are 2-picolyl, (2-furyl)methyl, (2-tetrahydrofuryl)methyl, 2-pyrimidyl, 6-methyl-2-pyridyl, 1,2,4-triazol-3-yl and 2-(1-piperazinyl)ethyl.
  • The aromatic trisamides are for example of formulae IIa, IIb or IIc
  • Figure US20080249269A1-20081009-C00003
  • wherein
    • R1, R2 and R3, or Y1, Y2 and Y3, or Z1, Z2 and Z3 independently of one another are
    • C1-C20alkyl unsubstituted or substituted by one or more hydroxy;
    • C2-C20alkenyl unsubstituted or substituted by one or more hydroxy;
    • C2-C20alkyl interrupted by oxygen or sulfur;
    • C3-C12cycloalkyl unsubstituted or substituted by one or more C1-C20alkyl;
    • (C3-C12cycloalkyl)-C1-C10alkyl unsubstituted or substituted by one or more C1-C20alkyl;
    • bis[C3-C12cycloalkyl]-C1-C10alkyl unsubstituted or substituted by one or more C1-C20alkyl;
    • a bicyclic or tricyclic hydrocarbon radical with 5 to 20 carbon atoms unsubstituted or substituted by one or more C1-C20alkyl;
    • phenyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C1-C20alkoxy, C1-C20alkylamino, di(C1-C20alkyl)amino, hydroxy and nitro;
    • phenyl-C1-C20alkyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C3-C12cycloalkyl, phenyl, C1-C20alkoxy and hydroxy;
    • phenylethenyl unsubstituted or substituted by one or more C1-C20alkyl;
    • biphenyl-(C1-C10alkyl) unsubstituted or substituted by one or more C1-C20alkyl;
    • naphthyl unsubstituted or substituted by one or more C1-C20alkyl;
    • naphthyl-C1-C20alkyl unsubstituted or substituted by one or more C1-C20alkyl;
    • naphthoxymethyl unsubstituted or substituted by one or more C1-C20alkyl;
    • biphenylenyl, flourenyl, anthryl;
    • a 5- to 6-membered heterocyclic radical unsubstituted or substituted by one or more C1-C20alkyl;
    • a C1-C20hydrocarbon radical containing one or more halogen; or
    • tri(C1-C10alkyl)silyl(C1-C10alkyl);
    • with the proviso that at least one of the radicals R1, R2 and R3, or Y1, Y2 and Y3, or Z1, Z2 and Z3 is branched C3-C20alkyl unsubstituted or substituted by one or more hydroxy;
    • C2-C20alkyl interrupted by oxygen or sulfur;
    • C3-C12cycloalkyl unsubstituted or substituted by one or more C1-C20alkyl;
    • (C3-C12cycloalkyl)-C1-C10alkyl unsubstituted or substituted by one or more C1-C20alkyl;
    • a bicyclic or tricyclic hydrocarbon radical with 5 to 20 carbon atoms unsubstituted or substituted by one or more C1-C20alkyl;
    • phenyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C1-C20alkoxy, C1-C20alkylamino, di(C1-C20alkyl)amino, hydroxy and nitro;
    • phenyl-C1-C20alkyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C3-C12cycloalkyl, phenyl, C1-C20alkoxy and hydroxy;
    • biphenyl-(C1-C10alkyl) unsubstituted or substituted by one or more C1-C20alkyl;
    • naphthyl-C1-C20alkyl unsubstituted or substituted by one or more C1-C20alkyl; or
    • tri(C1-C10alkyl)silyl(C1-C10alkyl).
  • According to a preferred embodiment,
    • at least one of the radicals R1, R2 and R3, or Y1, Y2 and Y3, or Z1, Z2 and Z3 is branched C3-C20alkyl, or
    • C3-C12cycloalkyl unsubstituted or substituted by one or more C1-C20alkyl.
  • According to a particular preferred embodiment,
    • at least one of the radicals R1, R2 and R3, or Y1, Y2 and Y3, or Z1, Z2 and Z3 is branched C3-C10alkyl.
  • Examples of C1-C20alkyl, e.g. branched C3-C20alkyl, unsubstituted or substituted by one or more hydroxy, e.g. 1, 2 or 3 hydroxy, are ethyl, n-propyl, 1-methylethyl, n-butyl, 2-methylpropyl, 1-methylpropyl, tert-butyl, pentyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 1,1-dimethylpropyl, 1-ethylpropyl, tert-butylmethyl, hexyl, 1-methylpentyl, heptyl, isoheptyl, 1-ethylhexyl, 2-ethylpentyl, 1-propylbutyl, octyl, nonyl, isononyl, neononyl, 2,4,4-trimethylpentyl, undecyl, tridecyl, pentadecyl, heptadecyl, hydroxymethyl and 1-hydroxyethyl. Branched C3-C10alkyl is particularly preferred. One of the preferred meanings of the radicals R1, R2 and R3, or Y1, Y2 and Y3, or Z1, Z2 and Z3 is branched C3-C10alkyl with a quaternary C atom in position 1, in particular —C(CH3)2—H or —C(CH3)2—(C1-C7alkyl).
  • Examples of C2-C20alkenyl unsubstituted or substituted by one or more hydroxy, e.g. 1, 2 or 3 hydroxy, are 9-decenyl, 8-heptadecenyl and 1 1-hydroxy-8-heptadecenyl.
  • Examples of C2-C20alkyl interrupted by oxygen are t-butoxymethyl, t-butoxyethyl, t-butoxypropyl and t-butoxybutyl.
  • Examples of C2-C20alkyl interrupted by sulfur are (H3C)3C—S—CH2—, (H3C)3C—S—C2H4—, (H3C)3C—S—C3H6— and (H3C)3C—S—C4H8—.
  • Examples of C3-C12cycloalkyl unsubstituted or substituted by one or more C1-C20alkyl, e.g. 1, 2, 3 or 4 C1-C4alkyl, are cyclopropyl, 3-methylcyclopropyl, 2,2,3,3-tetramethylcyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, 1-methylcyclohexyl, 2-methylcyclohexyl, 3-methylcyclohexyl, 4-methylcyclohexyl, 4-tert-butylcyclohexyl and cycloheptyl.
  • Examples of (C3-C12cycloalkyl)-C1-C10alkyl unsubstituted or substituted by one or more C1-C20alkyl, e.g. 1, 2 or 3 C1-C4alkyl, are cyclopentylmethyl, 2-cyclopentylethyl, cyclohexylmethyl, 2-cycohexylethyl, 3-cyclohexylpropyl, 4-cyclohexylbutyl and (4-methylcyclohexyl)methyl.
  • An example of bis[C3-C12cycloalkyl]-C1-C10alkyl unsubstituted or substituted by one or more C1-C20alkyl, e.g. 1, 2 or 3 C1-C4alkyl, is dicyclohexylmethyl.
  • Examples of a bicyclic or tricyclic hydrocarbon radical with 5 to 20 carbon atoms unsubstituted or substituted by one or more C1-C20alkyl, e.g. 1, 2 or 3 C1-C4alkyl, are
  • Figure US20080249269A1-20081009-C00004
  • Examples of phenyl unsubstituted or substituted by one or more radicals, e.g. 1, 2 or 3 radicals, selected from C1-C20alkyl, C1-C20alkoxy, C1-C20alkylamino, di(C1-C20alkyl)amino, hydroxy and nitro, preferably C1-C4alkyl, C1-C4alkoxy, C1-C4alkylamino, di(C1-C4alkyl)amino, hydroxy and nitro, are phenyl, 3-methylphenyl, 3-methoxyphenyl, 4-methylphenyl, 4-ethylphenyl, 4-propylphenyl, 4-isopropylphenyl, 4-tert-butylphenyl, 4-isopropoxyphenyl, 2,3-dimethoxyphenyl, 2-nitrophenyl, 3-methyl-6-nitrophenyl, 4-dimethylaminophenyl, 2,3-dimethylphenyl, 2,6-dimethylphenyl, 2,4-dimethylphenyl, 3,4-dimethylphenyl, 3,5-dimethylphenyl, 3,5-di-tert-butylphenyl, 2,4,6-trimethylphenyl and 3,5-di-tert-butyl-4-hydroxyphenyl.
  • Examples of phenyl-C1-C20alkyl unsubstituted or substituted by one or more radicals, e.g. 1, 2 or 3 radicals, selected from C1-C20alkyl, C3-C12cycloalkyl, phenyl, C1-C20alkoxy and hydroxy, preferably C1-C4alkyl, C3-C6cycloalkyl, phenyl, C1-C4alkoxy and hydroxy, are benzyl, α-cyclohexylbenzyl, diphenylmethyl, 1-phenylethyl, α-hydroxybenzyl, 2-phenylethyl, 2-phenylpropyl, 3-phenylpropyl, 3-methylbenzyl, 3,4-dimethoxybenzyl and 2-(3,4-dimethoxyphenyl)ethyl.
  • An example of phenylethenyl unsubstituted or substituted by one or more C1-C20alkyl, e.g. 1, 2 or 3 C1-C4alkyl, is 2-(4-methylphenyl)ethenyl.
  • An example of biphenyl-(C1-C10alkyl) unsubstituted or substituted by one or more C1-C20alkyl, e.g. 1, 2 or 3 C1-C4alkyl, is 4-biphenylmethyl.
  • Examples of naphthyl unsubstituted or substituted by one or more C1-C20alkyl, e.g. 1, 2 or 3 C1-C4alkyl, are 1-naphthyl and 2-naphthyl.
  • Examples of naphthyl-C1-C20alkyl unsubstituted or substituted by one or more C1-C20alkyl, e.g. 1, 2 or 3 C1-C4alkyl, are 1-naphthylmethyl and 2-naphthylmethyl.
  • An example of naphthoxymethyl unsubstituted or substituted by one or more C1-C20alkyl, e.g. 1, 2 or 3 C1-C4alkyl, is 1-naphthoxymethyl.
  • An examples of biphenylenyl, flourenyl or anthryl is 2-biphenylenyl, 9-flourenyl, 1-flourenyl or 9-anthryl, respectively.
  • Examples of a 5- to 6-membered heterocyclic radical unsubstituted or substituted by one or more C1-C20alkyl, e.g. 1, 2 or 3 C1-C4alkyl, are 3-pyridinyl, 4-pyridinyl, 2-hydroxypyridin-3-yl, 3-quinolinyl, 4-quinolinyl, 2-furyl, 3-furyl and 1-methyl-2-pyrryl.
  • Examples of a C1-C20hydrocarbon radical containing one or more halogen, e.g. 1, 2, 3, 4, 5, or 6 —F, —Cl or -J, are 1-bromo-2-methylpropyl, dichloromethyl, pentafluoroethyl, 3,5-bis[trifluoromethyl]phenyl, 2,3,5,6-tetrafluoro-p-tolyl, 2,3-dichlorophenyl, 3,4-dichlorophenyl and 2,4-bis[trifluoromethyl]phenyl.
  • Examples of compounds of formula (IIa) are:
    • 1,3,5-tris[cyclohexylcarbonylamino]benzene,
    • 1,3,5-tris[2,2-dimethylpropionylamino]benzene,
    • 1,3,5-tris[4-methylbenzoylamino]benzene,
    • 1,3,5-tris[3,4-dimethylbenzoylamino]benzene,
    • 1,3,5-tris[3,5-dimethylbenzoylamino]benzene,
    • 1,3,5-tris[cyclopentanecarbonylamino]benzene,
    • 1,3,5-tris[1-adamantanecarbonylamino]benzene,
    • 1,3,5-tris[2-methylpropionylamino]benzene,
    • 1,3,5-tris[3,3-dimethylbutyrylamino]benzene,
    • 1,3,5-tris[2-ethylbutyrylamino]benzene,
    • 1,3,5-tris[2,2-dimethylbutyrylamino]benzene,
    • 1,3,5-tris[2-cyclohexyl-acetylamino]benzene,
    • 1,3,5-tris[3-cyclohexyl-propionylamino]benzene,
    • 1,3,5-tris[4-cyclohexyl-butyrylamino]benzene,
    • 1,3,5-tris[5-cyclohexyl-valeroylamino]benzene,
    • 1-isobutyrylamino-3,5-bis[pivaloylamino]benzene,
    • 2,2-dimethylbutyrylamino-3,5-bisipivaloylamino]benzene,
    • 3,3-dimethylbutyrylamino-3,5-bis[pivaloylamino]benzene,
    • 1,3-bis[isobutyrylamino]-5-pivaloylaminobenzene,
    • 1,3-bis[isobutyrylamino]-5-(2,2-dimethyl-butyryl)aminobenzene,
    • 1,3-bis[isobutyrylamino]-5-(3,3-dimethyl-butyryl)aminobenzene,
    • 1,3-bis[2,2-dimethylbutyrylamino]-5-pivaloylaminobenzene,
    • 1,3-bis[2,2-dimethylbutyrylamino]-5-isobutyrylaminobenzene,
    • 1,3-bis[2,2-dimethylbutyrylamino]-5-(3,3-dimethylbutyryl)-aminobenzene,
    • 1,3-bis[3,3-dimethylbutyrylamino]-5-pivaloylamino-benzene,
    • 1,3-bis[3,3-dimethylbutyrylamino]-5-isobutyryl-aminobenzene,
    • 1,3-bis[3,3-dimethylbutyrylamino)-5-(2,2-dimethyl-butyrylamino)aminobenzene, and
    • 1,3,5-tris[3-(trimethylsilyl)propionylamino]benzene.
  • Further examples of compounds of formula (IIa) are:
    • 1,3,5-tris[2,2-dimethylvaleroylamino]benzene,
    • 1,3,5-tris[3,3-dimethylvaleroylamino]benzene,
    • 1,3, 5-tris[2,4-dimethylvaleroylamino]benzene,
    • 1,3,5-tris[4,4-dimethylvaleroylamino]benzene,
    • 1,3,5-tris[4-methylvaleroylamino]benzene,
    • 1,3,5-tris[2-methylbutyrylamino]benzene,
    • 1,3,5-tris[2-methylvaleroylamino]benzene,
    • 1,3,5-tris[3-methylvaleroylamino]benzene,
    • 1,3,5-tris[2,2,3,3-tetramethyl-cyclopropanecarbonylamino]benzene,
    • 1,3,5-tris[cyclopentylacetylamino]benzene,
    • 1,3,5-tris[3-cyclopentylpropionylamino]benzene,
    • 1,3,5-tris[2-norbornyl-acetylamino]benzene,
    • 1,3,5-tris[4-t-butylcyclohexane-1-carbonylamino]benzene,
    • 1,3,5-tris[2-(t-butoxy)-acetylamino]benzene,
    • 1,3,5-tris[3-(t-butoxy)-propionylamino]benzene,
    • 1,3,5-tris[4-(t-butoxy)-butyrylamino]benzene,
    • 1,3,5-tris[5-t-butoxy-valeroylamino]benzene,
    • 1,3,5-tris[cyclopropanecarbonylamino]benzene,
    • 1,3,5-tris[2-methylcyclopropane-1-carbonylamino]benzene,
    • 1,3,5-tris[3-noradamantane-1-carbonylamino]benzene,
    • 1,3,5-tris[biphenyl4-acetylamino]benzene,
    • 1,3,5-tris[2-naphthyl-acetylamino]benzene,
    • 1,3,5-tris[3-methylphenyl-acetylamino]benzene,
    • 1,3,5-tris[(3,4-dimethoxyphenyl)-acetylamino]benzene,
    • 1,3,5-tris[(3-trimethylsilyl-propionylamino]benzene, and
    • 1,3,5-tris[(4-trimethylsilyl-butyrylamino]benzene.
  • Examples of compounds of formula (IIb) are:
    • N-t-butyl-3,5-bis-(3-methylbutyrylamino)-benzamide,
    • N-t-butyl-3,5-bis-(pivaloylamino)-benzamide,
    • N-t-octyl-3,5-bis-(pivaloylamino)-benzamide,
    • N-(1,1-dimethyl-propyl)-3,5-bis-(pivaloylamino)-benzamide,
    • N-(t-octyl)-3,5-bis-(isobutyrylamino)-benzamide,
    • N-(t-butyl)-3,5-bis-(pivaloylamino)-benzamide,
    • N-(2,3-dimethyl-cyclohexyl)-3,5-bis-(pivaloylamino)-benzamide,
    • N-t-butyl-3,5-bis-(cyclopentanecarbonylamino)-benzamide,
    • N-(3-methylbutyl)-3,5-bis-(3-methylbutyrylamino)-benzamide,
    • N-(3-methylbutyl)-3,5-bis-(pivaloylamino)-benzamide,
    • N-(3-methylbutyl)-3,5-bis-(4-methylpentanoylamino)-benzamide,
    • N-(3-methylbutyl)-3,5-bis-(cyclopentanecarbonylamino)-benzamide,
    • N-(3-methylbutyl)-3,5-bis-(cyclohexanecarbonylamino)-benzamide,
    • N-cyclopentyl-3,5-bis-(3-methylbutyrylamino)-benzamide,
    • N-cyclopentyl-3,5-bis-(pivaloylamino)-benzamide,
    • N-cyclopentyl-3,5-bis-(4-methylpentanoylamino)-benzamide,
    • N-cyclopentyl-3,5-bis-(cyclopentanecarbonylamino)-benzamide,
    • N-cyclopentyl-3,5-bis-(cyclohexanecarbonylamino)-benzamide,
    • N-cyclohexyl-3,5-bis-(3-methylbutyrylamino)-benzamide,
    • N-cyclohexyl-3,5-bis-(pivaloylamino)-benzamide,
    • N-cyclohexyl-3,5-bis-(4-methylpentanoylamino)-benzamide,
    • N-cyclohexyl-3,5-bis-(cyclopentanecarbonylamino)-benzamide,
    • N-cyclohexyl-3,5-bis-(cyclohexanecarbonylamino)-benzamide,
    • N-isopropyl-3,5-bis-(pivaloylamino)-benzamide,
    • N-isopropyl-3,5-bis-(isobutyrylamino)-benzamide,
    • N-t-butyl-3,5-bis-(2,2-dimethylbutyrylamino)-benzamide, and
    • N-t-octyl-3,5-bis-(2,2-dimethylbutyrylamino)-benzamide.
  • Examples of compounds of formula (IIc) are:
    • 5-pivaloylamino-isophthalic acid N,N′-di-t-butyldiamide,
    • 5-pivaloylamino-isophthalic acid N,N′-di-t-octyldiamide,
    • 5-(2,2-dimethylbutyrylamino)-isophthalic acid N,N′-di-t-butyldiamide,
    • 5-(2,2-dimethylbutyrylamino)-isophthalic acid N,N′-di-t-octyldiamide,
    • 5-(3-methylbutyrylamino)-isophthalic acid N,N′-di-cyclohexyldiamide,
    • 5-(pivaloylamino)-isophthalic acid N,N′-di-cyclohexyldiamide,
    • 5-(cyclopentanecarbonylamino)-isophthalic acid N,N′-di-cyclohexyldiamide,
    • 5-(cyclohexylcarbonylamino)-isophthalic acid N,N′-di-cyclohexyldiamide,
    • 5-(cyclopentanecarbonylamino)-isophthalic acid N,N′-bis-(2-methylcyclohexyl)diamide, 5-(cyclohexanecarbonylamino)-isophthalic acid N,N′-bis-(2-methylcyclohexyl)diamide,
    • 5-((1-methylcyclohexanecarbonyl)amino)-isophthalic acid N,N′-bis-(2-methylcyclohexyl)diamide, and
    • 5-((2-methylcyclohexanecarbonyl)amino)-isophthalic acid N,N′-bis-(2-methylcyclohexyl)diamide.
  • The addition of the aromatic trisamides to the thermoplastic polymer can be carried out in all customary mixing machines in which the polymer is melted and mixed with the additives.
  • Suitable machines are known to those skilled in the art. They are predominantly mixers, kneaders and extruders.
  • The process is preferably carried out in an extruder by introducing the additives during processing.
  • Particularly preferred processing machines are single-screw extruders, contrarotating and corotating twin-screw extruders, planetary-gear extruders, ring extruders or cokneaders. It is also possible to use processing machines provided with at least one gas removal compartment to which a vacuum can be applied.
  • Suitable extruders and kneaders are described, for example, in Handbuch der Kunststoffextrusion, Vol. 1 Grundlagen, Editors F. Hensen, W Knappe, H. Potente, 1989, pp. 3-7, ISBN: 3-446-14339-4 (Vol. 2 Extrusionsanlagen 1986, ISBN 3-446-14329-7). For example, the screw length is 1-60 screw diameters, preferably 35-48 screw diameters. The rotational speed of the screw is preferably 10-600 rotations per minute (rpm), very particularly preferably 25-300 rpm.
  • The maximum throughput is dependent on the screw diameter, the rotational speed and the driving force. The process of the present invention can also be carried out at a level lower than maximum throughput by varying the parameters mentioned or employing weighing machines delivering dosage amounts.
  • If a plurality of components are added, these can be premixed or added individually.
  • The polymers need to be subjected to an elevated temperature for a sufficient period of time during incorporation of additives. The temperature is generally above the softening point of the polymers.
  • In a preferred embodiment of the processes of the present invention, a temperature range lower than 280° C., particularly from about 160° C. to 280° C. is employed. In a particularly preferred process variant, the temperature range from about 200° C. to 270° C. is employed.
  • In the processes and compositions of the present invention the above-described aromatic trisamide compounds are present in concentrations, based on the amount of the polymer, of from about 0.001 to about 1.0% by weight. For instance, the trisamides are present from about 0.005 to 0.5% by weight, from about 0.01 to about 0.1% by weight, from about 0.01 to about 0.09% by weight, based on the weight of the polymer. The aromatic trisamides can be added as individual compounds or as mixtures to the polymer.
  • Incorporation of additives into the polymers can be carried out, for example, by mixing the above-described aromatic trisamides or mixtures thereof and, if desired, further additives into the polymers using the methods customary in process technology.
  • The aromatic trisamides can also be added to the polymers in the form of a masterbatch in which these compounds are present, for example, in a concentration of from about 1 to 25% by weight. The present invention therefore further provides a concentrate in which the compounds of the invention are present in a concentration of 1-25% by weight and which can be added to the thermoplastic polymer.
  • Another aspect of this invention is that instead of melt blending, the present trisamides may be topically applied to the electret material.
  • For example in the case where the electret material is cotton the present trisamides may be topically applied.
  • Another aspect of this invention is the co-use of certain other additives along with the present aromatic trisamides. These certain other additives are incorporated in the same manner as the trisamides.
  • When employed without certain co-additives, the trisamides
  • Figure US20080249269A1-20081009-C00005
  • are excluded from the present invention.
  • For instance, the class of stabilizers of the hindered amine light stabilizers (HALS) are advantageously also employed in the present compositions and processes.
  • The present sterically hindered amine stabilizers contain at least one moiety of formula
  • Figure US20080249269A1-20081009-C00006
  • where G1, G2, G3 and G4 are independently alkyl of 1 to 8 carbon atoms or G1 and G2 or G3 and G4 together are pentamethylene and G5 is hydrogen or alkyl of 1 to 8 carbon atoms.
  • The hindered amines are disclosed for example in U.S. Pat. Nos. 5,004,770, 5,204,473, 5,096,950, 5,300,544, 5,112,890, 5,124,378, 5,145,893, 5,216,156, 5,844,026, 5,980,783, 6,046,304, 6,117,995, 6,271,377, 6,297,299, 6,392,041, 6,376,584, 6,472,456, and 7,030,196. The relevant disclosures of these patents are hereby incorporated by reference.
  • U.S. Pat. Nos. 6,271,377, 6,392,041 and 6,376,584, cited above disclose hindered hydroxyalkoxyamine stabilizers.
  • Suitable hindered amines include for example:
      • 1) 1-cyclohexyloxy-2,2,6,6-tetramethyl-4-octadecylaminopiperidine,
      • 2) bis(2,2,6,6-tetramethylpiperidin-4-yl) sebacate,
      • 3) bis(1-acetoxy-2,2,6,6-tetramethylpiperidin-4-yl) sebacate,
      • 4) bis(1,2,2,6,6-pentamethyl-4-yl) sebacate,
      • 5) bis(1-cyclohexyloxy-2,2,6,6-tetramethylpiperidin-4-yl) sebacate,
      • 6) bis(1-octyloxy-2,2,6,6-tetramethylpiperidin-4-yl) sebacate;
      • 7) bis(1-acyl-2,2,6,6-tetramethylpiperidin-4-yl) sebacate,
      • 8) bis(1,2,2,6,6-pentamethyl-4-piperidyl) n-butyl-3,5-di-tert-butyl-4-hydroxybenzylmalonate
      • 9) 2,4-bis[(1-cyclohexyloxy-2,2,6,6-tetramethylpiperidin-4-yl)butylamino]-6-(2-hydroxy-ethylamino-s-triazine,
      • 10) bis(1-cyclohexyloxy-2,2,6,6-tetramethylpiperidin-4-yl) adipate,
      • 11) 2,4-bis[(1-cyclohexyloxy-2,2,6,6-pipeddin-4-yl)butylamino]-6-chloro-s-triazine,
      • 12) 1-(2-hydroxy-2-methylpropoxy)-4-hydroxy-2,2,6,6-tetramethylpiperidine,
      • 13) 1-(2-hydroxy-2-methylpropoxy)-4-oxo-2,2,6,6-tetramethylpiperidine,
      • 14) 1-(2-hydroxy-2-methylpropoxy)-4-octadecanoyloxy-2,2,6,6-tetramethylpiperidine,
      • 15) bis(1-(2-hydroxy-2-methylpropoxy)-2,2,6,6-tetramethylpiperidin-4-yl) sebacate,
      • 16) bis(1-(2-hydroxy-2-methylpropoxy)-2,2,6,6-tetramethylpiperidin-4-yl) adipate,
      • 17) 2,4-bis{N-[1-(2-hydroxy-2-methylpropoxy)-2,2,6,6-tetramethylpiperidin-4-yl]-N-butyl-amino}-6-(2-hydroxyethylamino)-s-triazine,
      • 18) 4-benzoyl-2,2,6,6-tetramethylpiperidine,
      • 19) di-(1,2,2,6,6-pentamethylpiperidin-4-yl) p-methoxybenzylidenemalonate,
      • 20) 4-stearyloxy-2,2,6,6-tetramethylpiperidine,
      • 21) bis(1-octyloxy-2,2,6,6-tetramethylpiperidyl)succinate,
      • 22) 1,2,2,6,6-pentamethyl-4-aminopiperidine,
      • 23) 2-undecyl-7,7,9,9-tetramethyl-1-oxa-3,8-diaza-4-oxo-spiro[4,5]decane,
      • 24) tris(2,2,6,6-tetramethyl-4-piperidyl)nitrilotriacetate,
      • 25) tris(2-hydroxy-3-(amino-(2,2,6,6-tetramethylpiperidin-4-yl)propyl) nitrilotriacetate,
      • 26) tetrakis(2,2,6,6-tetramethyl-4-piperidyl)-1,2,3,4-butane-tetracarboxylate,
      • 27) tetrakis(1,2,2,6,6-pentamethyl-4-piperidyl)-1,2,3,4-butane-tetracarboxylate,
      • 28) 1,1′-(1,2-ethanediyl)-bis(3,3,5,5-tetramethylpiperazinone),
      • 29) 3-n-octyl-7,7,9,9-tetramethyl-1,3,8-triazaspiro[4.5]decan-2,4-dione,
      • 30) 8-acetyl-3-dodecyl-7,7,9,9-tetramethyl-1,3,8-triazaspiro[4.5]decane-2,4-dione,
      • 31) 3-dodecyl-1-(2,2,6,6-tetramethyl-4-piperidyl)pyrrolidin-2,5-dione,
      • 32) 3-dodecyl-1-(1,2,2,6,6-pentamethyl-4-piperidyl)pyrrolidine-2,5-dione,
      • 33) N,N′-bis-formyl-N,N′-bis(2,2,6,6-tetramethyl-4-piperidyl)hexamethylenediamine,
      • 34) the reaction product of 2,4-bis[(1-cyclohexyloxy-2,2,6,6-piperidin-4-yl)butylamino]-6-chloro-s-triazine with N,N′-bis(3-aminopropyl)ethylenediamine),
      • 35) the condensate of 1-(2-hydroxyethyl)-2,2,6,6-tetramethyl-4-hydroxypiperidine and succinic acid,
      • 36) linear or cyclic condensates of N,N′-bis(2,2,6,6-tetramethyl-4-piperidyl)-hexamethylenediamine and 4-tert-octylamino-2,6-dichloro-1,3,5-triazine,
      • 37) linear or cyclic condensates of N,N′-bis(2,2,6,6-tetramethyl-4-piperidyl)-hexamethylenediamine and 4-cyclohexylamino-2,6-dichloro-1,3,5-triazine,
      • 38) linear or cyclic condensates of N,N′-bis-(2,2,6,6-tetramethyl-4-piperidyl)-hexamethylenediamine and 4-morpholino-2,6-dichloro-1,3,5-triazine,
      • 39) linear or cyclic condensates of N,N′-bis-(1,2,2,6,6-pentamethyl-4-piperidyl)-hexamethylenediamine and 4-morpholino-2,6-dichloro-1,3,5-triazine,
      • 40) the condensate of 2-chloro4,6-bis(4-n-butylamino-2,2,6,6-tetramethylpiperidyl)-1,3,5-triazine and 1,2-bis(3-aminopropylamino)ethane,
      • 41) the condensate of 2-chloro-4,6-di-(4-n-butylamino-1,2,2,6,6-pentamethylpiperidyl)-1,3,5-triazine and 1,2-bis-(3-aminopropylamino)ethane,
      • 42) a reaction product of 7,7,9,9-tetramethyl-2-cycloundecyl-1-oxa-3,8-diaza-4-oxospiro [4,5]decane and epichlorohydrin,
      • 43) poly[methyl,(3-oxy-(2,2,6,6-tetramethylpiperidin-4-yl)propyl)]siloxane, CAS#182635-99-0,
      • 44) reaction product of maleic acid anhydride-C18-C22-α-olefin-copolymer with 2,2,6,6-tetramethyl-4-aminopiperidine,
      • 45) the oligomeric compound which is the condensation product of 4,4′-hexamethylene-bis(amino-2,2,6,6-tetramethylpiperidine) and 2,4-dichloro-6-[(2,2,6,6-tetramethylpiperidin-4-yl)butylamino]-s-triazine end-capped with 2-chloro-4,6-bis(dibutylamino)-s-triazine,
      • 46) the oligomeric compound which is the condensation product of 4,4′-hexamethylene-bis(amino-1,2,2,6,6-pentaamethylpiperidine) and 2,4-dichloro-6-[(1,2,2,6,6-pentaamethyl-piperidin-4-yl)butylamino]-s-triazine end-capped with 2-chloro-4,6-bis(dibutylamino)-s-triazine,
      • 47) the oligomeric compound which is the condensation product of 4,4′-hexamethylene-bis(amino-1-propoxy-2,2,6,6-tetramethylpiperidine) and 2,4-dichloro-6-[(1-propoxy-2,2,6,6-tetra-methylpiperidin-4-yl)butylamino]-s-triazine end-capped with 2-chloro-4,6-bis(dibutylamino)-s-triazine,
      • 48) the oligomeric compound which is the condensation product of 4,4′-hexamethylene-bis(amino-1-acyloxy-2,2,6,6-tetramethylpiperidine) and 2,4-dichloro-6-[(1-acyloxy-2,2,6,6-tetra-methylpiperidin-4-yl)butylamino]-s-triazine end-capped with 2-chloro-4,6-bis(dibutylamino)-s-triazine and
      • 49) product obtained by reacting a product, obtained by reacting 1,2-bis(3-amino-propylamino)ethane with cyanuric chloride, with (2,2,6,6-tetramethylpiperidin-4-yl)butylamine.
  • Also included are the sterically hindered N—H, N-methyl, N-methoxy, N-propoxy, N-octyloxy, N-cyclohexyloxy, N-(2-hydroxy-2-methylpropoxy) and N-acyl analogues of any of the above mentioned compounds. For example, replacing an N—H hindered amine with an N-methyl hindered amine would be employing the N-methyl analogue in place of the N—H.
  • The class of additives known as the hydroxyphenylalkylphosphonic esters or monoesters are also advantegously employed in the processes and compositions of this invention. The hydroxyphenylalkylphosphonic esters or monoesters are disclosed for example in U.S. published app. No. 2004/0106767, the disclosure of which is hereby incorporated by reference. The hydroxyphenylalkylphosphonic esters or monoesters are of the formula
  • Figure US20080249269A1-20081009-C00007
  • wherein
    • R6 is isopropyl, tert-butyl, cyclohexyl or cyclohexyl which is substituted by 1-3 C1-C4alkyl groups,
    • R7 is hydrogen, C1-C4alkyl, cyclohexyl or cyclohexyl which is substituted by 1-3 C1-C4alkyl groups,
    • R8 is C1-C20alkyl, unsubstituted or C1-C4alkyl-substituted phenyl or naphthyl,
      • R9 is hydrogen, C1-C20alkyl, unsubstituted or C1-C4alkyl-substituted phenyl or naphthyl; or is

  • Mr+/r;
    • Mr+ is an r-valent metal cation,
    • p is 1, 2, 3, 4, 5 or 6, and
    • r is 1, 2 or 3.
  • For example, the present hydroxyphenylalkylphosphonic ester or monoester is a compound of the formula P1 or P2
  • Figure US20080249269A1-20081009-C00008
  • The further additives of the hindered amine light stabilizers and the hydroxyphenylalkylphosphonic esters or monoesters are employed at levels, based on the weight of the polymer, of from about 0.001 to 5.0% by weight, in particular from 0.01 to 2.0% by weight and particularly preferably from 0.02 to 1.0% by weight.
  • The following Examples further illustrate the invention. All percentages are in weight percent unless otherwise indicated.
    • EXAMPLE 1
  • Polypropylene with MFI index of 1,100 is tumble mixed to contain 5.0% total weight of a sterically hindered amine (HALS), 2.0% total weight of a sterically hindered hydroxyphenylalkylphosphonic monoester (HPPME), 0.25% total weight aromatic trisamide (TA1)-(TA14).
  • These mixes are individually compounded using a Leistritz 27 mm twin screw extruder. The melt is cooled in a water trough and the strand is converted into pellets via a Conair-Jetro Model 304 pelletizer. The pellets collected are considered the masterbatches.
  • The same polypropylene is tumble mixed with the appropriate amounts of masterbatch for each of the evaluations. The tumble mixing is via a Marion Mixer SPS 1224 which is a paddle type slow RPM mixer. These are considered the final mixes.
  • Final mixes at 45 Kg each are converted into melt blown non woven textiles using a 500 mm Reifenhatuser Meltblowing Pilot Line. Also a 1,500 g portion of each final mix is processed on a 6-inch Meltblowing Pilot Line.
  • The polypropylene webs are then treated by corona discharge. The samples are tested using TSI Filter Tester (Model 8130) which employs challenges of sodium chloride aerosol at 32 liters per minute using a test area of 100 cm2.
  • Results are in the tables below.
  • TABLE 1
    6-inch Meltblowing Pilot Line
    Filtration Efficiency (%) Filtration
    Basis Weight Before After Charged & Efficiency
    Formulation (g/m2) charging charging aged (70° C./24 hrs) Loss (%)
    Polypropylene 30.6 23.2 88.0 72.4 17.7
    (control)
    0.5% HALS 30.5 16.8 91.5 82.1 10.2
    0.5% HPPME 30.6 18.7 93.3 90.6 2.9
    0.05% TA1 30.4 18.0 93.4 93.3 0.1
    0.02% TA2 30.5 18.3 92.2 91.3 0.9
  • TABLE 2
    6-inch Meltblowing Pilot Line
    Filtration Efficiency (%) Filtration
    Basis Weight Before After Charged & Efficiency
    Formulation (g/m2) charging charging aged (70° C./24 hrs) Loss (%)
    Polypropylene 58.3 34.6 96.9 90.6 6.4
    (control)
    0.5% HALS 60.4 32.8 99.0 97.0 2.0
    0.5% HPPME 59.2 31.4 98.9 97.7 1.2
    0.05% TA1 58.0 31.9 99.0 98.5 0.5
    0.02% TA2 60.9 44.5 98.4 97.4 1.0
  • TABLE 3
    500 mm Reifenhauser Meltblowing Pilot Line
    Filtration Efficiency (%) Filtration
    Basis Weight Before After Charged & Efficiency
    Formulation (g/m2) charging charging aged (70° C./24 hrs) Loss (%)
    Polypropylene 30.6 17.0 81.4 65.6 19.4
    (control)
    0.5% HALS 30.5 15.8 90.0 85.4 5.1
    0.5% HPPME 30.6 16.8 90.4 86.8 4.0
    0.05% TA1 30.4 16.2 92.1 90.8 1.4
    0.02% TA2 30.5 13.8 90.4 88.0 2.8
  • TABLE 4
    500 mm Reifenhauser Meltblowing Pilot Line
    Filtration Efficiency (%) Filtration
    Basis Weight Before After Charged & Efficiency
    Formulation (g/m2) charging charging aged (70° C./24 hrs) Loss (%)
    Polypropylene 58.3 28.0 94.7 78.4 17.2
    (control)
    0.5% HALS 60.4 29.4 96.6 90.2 6.6
    0.5% HPPME 59.2 27.4 94.8 92.6 2.2
    0.05% TA1 58.0 28.4 95.8 94.8 1.0
    0.02% TA2 60.9 26.6 93.4 91.8 1.7
  • TABLE 5
    PP 6-inch Meltblowing Pilot Line
    Filtration Efficiency (%) Filtration
    Basis Weight Before After Charged & Efficiency
    Formulation (g/m2) charging charging aged (70° C./24 hrs) Loss (%)
    Polypropylene 30.9 22.2 85.6 67.7 20.9
    (control)
    0.5% HALS 30.5 24.4 91.2 78.9 13.5
    0.025% TA3 29.4 32.7 92.8 80.7 13.1
    0.025% TA4 27.8 22.8 92.7 86.0 7.2
    0.025% TA5 27.5 24.0 90.5 79.5 12.2
    0.025% TA6 29.3 31.2 93.3 81.4 12.7
  • TABLE 6
    PP 6-inch Meltblowing Pilot Line
    Filtration Efficiency (%) Filtration
    Basis Weight Before After Charged & Efficiency
    Formulation (g/m2) charging charging aged (70° C./24 hrs) Loss (%)
    Polypropylene 30.1 17.0 86.7 60.9 29.8
    (control)
    0.5% HALS 29.1 15.2 88.7 68.3 23.0
    0.0125% TA7 29.5 11.6 80.5 63.4 21.3
    0.0125% TA4 29.0 11.7 81.2 68.0 16.3
  • TABLE 7
    6-inch Meltblowing Pilot Line
    Filtration Efficiency (%) Filtration
    Basis Weight Before After Charged & Efficiency
    Formulation (g/m2) charging charging aged (70° C./24 hrs) Loss (%)
    Polypropylene 29.6 20.5 76.1 54.9 27.9
    (control)
    0.5% HALS 29.2 17.9 84.0 66.6 20.7
    0.02% TA8 27.2 21.6 90.9 84.7 6.9
    0.02% TA9 28.6 22.8 91.2 83.0 9.0
    0.02% TA10 28.2 23.1 88.4 70.6 20.1
    0.02% TA11 29.3 20.7 88.9 74.5 16.2
    0.02% TA12 29.1 21.5 89.8 78.7 12.4
    0.02% TA13 27.7 21.9 89.9 77.0 14.4
  • TABLE 8
    6-inch Meltblowing Pilot Line
    Filtration Efficiency (%) Filtration
    Basis Weight Before After Charged & Efficiency
    Formulation (g/m2) charging charging aged (70° C./24 hrs) Loss (%)
    Polypropylene 29.6 20.5 76.1 54.9 27.9
    (control)
    0.5% HALS 29.2 17.9 84.0 66.6 20.7
    0.5% HPPME 30.6 21.4 88.7 74.6 15.9
    0.02% TA8 27.2 19.9 87.2 83.4 4.4
    0.02% TA10 27.5 16.1 82.4 77.3 6.2
  • It can be seen that the present aromatic trisamides provide polypropylene with excellent thermal and charge stability. The trisamides are present at very low levels.
    • sterically hindered hydroxyphenylalkylphosphonic monoester (HPPME)
  • Figure US20080249269A1-20081009-C00009
    • sterically hindered amine (HALS)
  • Figure US20080249269A1-20081009-C00010
    • aromatic trisamide (TA1)
  • Figure US20080249269A1-20081009-C00011
    • aromatic trisamide (TA2)
  • Figure US20080249269A1-20081009-C00012
    • aromatic trisamide (TA3)
  • Figure US20080249269A1-20081009-C00013
    • aromatic trisamide (TA4)
  • Figure US20080249269A1-20081009-C00014
    • aromatic trisamide (TA5)
  • Figure US20080249269A1-20081009-C00015
    • aromatic trisamide (TA6)
  • Figure US20080249269A1-20081009-C00016
    • aromatic trisamide (TA7)
  • Figure US20080249269A1-20081009-C00017
    • aromatic trisamide (TA8)
  • Figure US20080249269A1-20081009-C00018
    • aromatic trisamide (TA9)
  • Figure US20080249269A1-20081009-C00019
    • aromatic trisamide (TA10)
  • Figure US20080249269A1-20081009-C00020
    • aromatic trisamide (TA11)
  • Figure US20080249269A1-20081009-C00021
    • aromatic trisamide (TA12)
  • Figure US20080249269A1-20081009-C00022
    • aromatic trisamide (TA13)
  • Figure US20080249269A1-20081009-C00023
    • aromatic trisamide (TA14)
  • Figure US20080249269A1-20081009-C00024

Claims (20)

1. An electret material with enhanced thermal and charge stability, which material has been subjected to an electret treatment, comprising
a thermoplastic polymer and
incorporated therein,
an effective stabilizing amount of one or more aromatic trisamide compounds of formula I
Figure US20080249269A1-20081009-C00025
wherein
R1, R2, R3, R4, R5 and R6, independently of one another, are hydrogen,
C1-C20alkyl,
C2-C20alkyl substituted by C1-C10alkylamino, di(C1-C10alkyl)amino, C1-C10alkyloxy or hydroxy;
C3-C20alkenyl,
C5-C12cycloalkyl,
C5-C12cycloalkyl substituted by 1, 2 or 3 C1-C10alkyl;
cyclohexylmethyl;
cyclohexylmethyl substituted by 1, 2 or 3 C1-C10alkyl;
C5-C9cycloalkenyl,
C5-C9cycloalkenyl substituted by 1, 2 or 3 C1-C10alkyl;
phenyl substituted by 1, 2 or 3 radicals selected from the group consisting of C1-C10alkyl, C1-C10alkyloxy, hydroxy, halogen, trihalogenmethyl, trihalogenmethoxy, benzoyl, phenylamino, acylamino and phenylazo;
C7-C9phenylalkyl,
C7-C9phenylalkyl which is substituted on the phenyl by 1, 2 or 3 radicals selected from the group consisting of C1-C10alkyl, C1-C10alkoxy and hydroxy;
naphthyl,
naphthyl substituted by C1-C10alkyl;
adamantyl, or
a 5 to 6 membered heterocyclic group;
or an effective stabilizing amount of one or more aromatic trisamide compounds of the formula IIa, IIb or IIc
Figure US20080249269A1-20081009-C00026
wherein
R1, R2 and R3, or Y1, Y2 and Y3, or Z1, Z2 and Z3 independently of one another are C1-C20alkyl unsubstituted or substituted by one or more hydroxy;
C2-C20alkenyl unsubstituted or substituted by one or more hydroxy;
C2-C20alkyl interrupted by oxygen or sulfur;
C3-C12cycloalkyl unsubstituted or substituted by one or more C1-C20alkyl;
(C3-C12cycloalkyl)-C1-C10alkyl unsubstituted or substituted by one or more C1-C20alkyl;
bis[C3-C12cycloalkyl]-C1-C10alkyl unsubstituted or substituted by one or more C1-C20alkyl;
a bicyclic or tricyclic hydrocarbon radical with 5 to 20 carbon atoms unsubstituted or substituted by one or more C1-C20alkyl;
phenyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C1-C20alkoxy, C1-C20alkylamino, di(C1-C20alkyl)amino, hydroxy and nitro;
phenyl-C1-C20alkyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C3-C12cycloalkyl, phenyl, C1-C20alkoxy and hydroxy;
phenylethenyl unsubstituted or substituted by one or more C1-C20alkyl;
biphenyl-(C1-C10alkyl) unsubstituted or substituted by one or more C1-C20alkyl;
naphthyl unsubstituted or substituted by one or more C1-C20alkyl;
naphthyl-C1-C20alkyl unsubstituted or substituted by one or more C1-C20alkyl;
naphthoxymethyl unsubstituted or substituted by one or more C1-C20alkyl;
biphenylenyl, flourenyl, anthryl;
a 5- to 6-membered heterocyclic radical unsubstituted or substituted by one or more C1-C20alkyl;
a C1-C20hydrocarbon radical containing one or more halogen; or
tri(C1-C10alkyl)silyl(C1-C10alkyl);
with the proviso that at least one of the radicals R1, R2 and R3, or Y1, Y2 and Y3, or Z1, Z2 and Z3 is
branched C3-C20alkyl unsubstituted or substituted by one or more hydroxy;
C2-C20alkyl interrupted by oxygen or sulfur;
C3-C12cycloalkyl unsubstituted or substituted by one or more C1-C20alkyl;
(C3-C12cycloalkyl)-C1-C10alkyl unsubstituted or substituted by one or more C1-C20alkyl;
a bicyclic or tricyclic hydrocarbon radical with 5 to 20 carbon atoms unsubstituted or substituted by one or more C1-C20alkyl;
phenyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C1-C20alkoxy, C1-C20alkylamino, di(C1-C20alkyl)amino, hydroxy and nitro;
phenyl-C1-C20alkyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C3-C12cycloalkyl, phenyl, C1-C20alkoxy and hydroxy;
biphenyl-(C1-C10alkyl) unsubstituted or substituted by one or more C1-C20alkyl;
naphthyl-C1-C20alkyl unsubstituted or substituted by one or more C1-C20alkyl; or
tri(C1-C10alkyl)silyl(C1-C10alkyl).
2. An electret material according to claim 1 comprising one or more trisamide compounds of formula I.
3. An electret material according to claim 1 comprising one or more trisamide compounds of formula IIa, IIb or IIc.
4. An electret material according to claim 1 in which the thermoplastic polymer is polypropylene.
5. An electret material according to claim 1 in which the thermoplastic polymer is a nonwoven polypropylene web.
6. An electret material according to claim 1 where in the compounds of formula IIa, IIb and IIc, that
at least one of the radicals R1, R2 and R3, or Y1, Y2 and Y3, or Z1, Z2 and Z3 is branched C3-C20alkyl, or is C3-C12cycloalkyl unsubstituted or substituted by one or more C1-C20alkyl.
7. An electret material according to claim 1 where the electret treatment is a corona treatment.
8. An electret material according to claim 1 wherein the thermoplastic polymer further has incorporated therein an additive selected from the group consisting of the hindered amine light stabilizers.
9. An electret material according to claim 1 wherein the thermoplastic polymer further has incorporated therein an additive selected from the group consisting of the hydroxyphenylalkylphosphonic esters or monoesters.
10. An electret material according to claim 1 wherein the aromatic trisamide compounds are present from about 0.005 to 0.5% by weight, based on the weight of the thermoplastic polymer.
11. A method for preparing an electret material with enhanced thermal and charge stability, which method comprises
melt blending a thermoplastic polymer with an effective stabilizing amount of one or more aromatic trisamide compounds of formula I
Figure US20080249269A1-20081009-C00027
wherein
R1, R2 and R3, independently of one another, are C1-C20alkyl,
C2-C20alkyl substituted by C1-C10alkylamino, di(C1-C10alkyl)amino, C1-C10alkyloxy or hydroxy;
C3-C20alkenyl,
C5-C12cycloalkyl,
C5-C12cycloalkyl substituted by 1, 2 or 3 C1-C10alkyl;
cyclohexylmethyl;
cyclohexylmethyl substituted by 1, 2 or 3 C1-C10alkyl;
C5-C9cycloalkenyl,
C5-C9cycloalkenyl substituted by 1, 2 or 3 C1-C10alkyl;
phenyl substituted by 1, 2 or 3 radicals selected from the group consisting of C1-C10alkyl, C1-C10alkyloxy, hydroxy, halogen, trihalogenmethyl, trihalogenmethoxy, benzoyl, phenylamino, acylamino and phenylazo;
C7-C9phenylalkyl,
C7-C9phenylalkyl which is substituted on the phenyl by 1, 2 or 3 radicals selected from the group consisting of C1-C10alkyl, C1-C10alkoxy and hydroxy;
naphthyl,
naphthyl substituted by C1-C10alkyl;
adamantyl, or
a 5 to 6 membered heterocyclic group;
or an effective stabilizing amount of one or more aromatic trisamide compounds of formula IIa, IIb or IIc
Figure US20080249269A1-20081009-C00028
wherein
R1, R2 and R3, or Y1, Y2 and Y3, or Z1, Z2 and Z3 independently of one another are C1-C20alkyl unsubstituted or substituted by one or more hydroxy;
C2-C20alkenyl unsubstituted or substituted by one or more hydroxy;
C2-C20alkyl interrupted by oxygen or sulfur;
C3-C12cycloalkyl unsubstituted or substituted by one or more C1-C20alkyl;
(C3-C12cycloalkyl)-C1-C10alkyl unsubstituted or substituted by one or more C1-C20alkyl;
bis[C3-C12cycloalkyl]-C1-C10alkyl unsubstituted or substituted by one or more C1-C20alkyl;
a bicyclic or tricyclic hydrocarbon radical with 5 to 20 carbon atoms unsubstituted or substituted by one or more C1-C20alkyl; phenyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C1-C20alkoxy, C1-C20alkylamino, di(C1-C20alkyl)amino, hydroxy and nitro;
phenyl-C1-C20alkyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C3-C12cycloalkyl, phenyl, C1-C20alkoxy and hydroxy;
phenylethenyl unsubstituted or substituted by one or more C1-C20alkyl;
biphenyl-(C1-C10alkyl) unsubstituted or substituted by one or more C1-C20alkyl;
naphthyl unsubstituted or substituted by one or more C1-C20alkyl;
naphthyl-C1-C20alkyl unsubstituted or substituted by one or more C1-C20alkyl;
naphthoxymethyl unsubstituted or substituted by one or more C1-C20alkyl;
biphenylenyl, flourenyl, anthryl;
a 5- to 6-membered heterocyclic radical unsubstituted or substituted by one or more C1-C20alkyl;
a C1-C20hydrocarbon radical containing one or more halogen; or
tri(C1-C10alkyl)silyl(C1-C10alkyl);
with the proviso that at least one of the radicals R1, R2 and R3, or Y1, Y2 and Y3, or Z1, Z2 and Z3 is branched C3-C20alkyl unsubstituted or substituted by one or more hydroxy;
C2-C20alkyl interrupted by oxygen or sulfur;
C3-C12cycloalkyl unsubstituted or substituted by one or more C1-C20alkyl;
(C3-C12cycloalkyl)-C1-C10alkyl unsubstituted or substituted by one or more C1-C20alkyl;
a bicyclic or tricyclic hydrocarbon radical with 5 to 20 carbon atoms unsubstituted or substituted by one or more C1-C20alkyl;
phenyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C1-C20alkoxy, C1-C20alkylamino, di(C1-C20alkyl)amino, hydroxy and nitro;
phenyl-C1-C20alkyl unsubstituted or substituted by one or more radicals selected from C1-C20alkyl, C3-C12cycloalkyl, phenyl, C1-C20alkoxy and hydroxy;
biphenyl-(C1-C10alkyl) unsubstituted or substituted by one or more C1-C20alkyl;
naphthyl-C1-C20alkyl unsubstituted or substituted by one or more C1-C20alkyl; or
tri(C1-C10alkyl)silyl(C1-C10alkyl) and
subjecting the blend to an electret treatment.
12. A method according to claim 11 comprising melt blending the thermoplastic polymer with one or more trisamide compounds of formula I.
13. A method according to claim 11 comprising melt blending the thermoplastic polymer with one or more trisamide compounds of formula IIa, IIb or IIc.
14. A method according to claim 11 in which the thermoplastic polymer is polypropylene.
15. A method according to claim 11 in which the blend is a nonwoven polypropylene web.
16. A method according to claim 11 where in the compounds of formula IIa, IIb and IIc, at least one of the radicals R1, R2 and R3, or Y1, Y2 and Y3, or Z1, Z2 and Z3 is branched C3-C20alkyl, or is C3-C12cycloalkyl unsubstituted or substituted by one or more C1-C20alkyl.
17. A method according to claim 11 where the electret treatment is a corona treatment.
18. A method according to claim 11 which comprises melt blending the thermoplastic polymer with a further additive selected from the group consisting of the hindered amine light stabilizers.
19. A method according to claim 11 which comprises melt blending the thermoplastic polymer with a further additive selected from the group consisting of the hydroxyphenylalkylphosphonic esters or monoesters.
20. A method according to claim 11 where the aromatic trisamides are present from about 0.005 to 0.5% by weight, based on the weight of the thermoplastic polymer.
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