US20130225053A1 - Device for supplying slurry for semiconductor, provided with pipe clogging prevention means - Google Patents
Device for supplying slurry for semiconductor, provided with pipe clogging prevention means Download PDFInfo
- Publication number
- US20130225053A1 US20130225053A1 US13/820,578 US201013820578A US2013225053A1 US 20130225053 A1 US20130225053 A1 US 20130225053A1 US 201013820578 A US201013820578 A US 201013820578A US 2013225053 A1 US2013225053 A1 US 2013225053A1
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- United States
- Prior art keywords
- slurry
- pressure vessels
- semiconductor
- compressed air
- tubular body
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
Definitions
- the present invention relates to a device for supplying slurry for semiconductor provided with pipe clogging prevention means and more particularly, to the device for supplying slurry for semiconductor provided with pipe clogging prevention means by which an orifice region or a pipe of an aspirator of the device for supplying slurry for semiconductor can be prevented from being clogged as slurry liquid is introduced into and stuck to an interior of the aspirator.
- a process technology for manufacturing a semiconductor device requires high integration and high concentration of semiconductor devices. Accordingly, a fine pattern forming technology should be applied.
- Planarization technologies for solving the problem according to the related art include SOG, etch back, boron phosphorus silicate glass (BPSG), a reflow process, and a chemical/mechanical polishing (CMP) process.
- CMP processes are recently frequently used, and such a CMP process corresponds to a single process in which a chemical polishing process and a mechanical polishing process are combined to planarize a surface of a wafer which becomes larger as a diameter of a wafer becomes larger.
- the CMP process is a process of attaching a surface of a wafer having a step on a polishing pad, injecting an abrasive between the wafer and the polishing pad, and planarizing the wafer, and is suitable for a planarization process of a large diameter wafer.
- a solution containing polishing abrasive particles and a chemical additive is used as an abrasive for the CMP process, and is called slurry.
- a chemical/mechanical planarization process is performed on a semiconductor wafer by using liquid slurry. Then, sizes of granules of the suspended solid particles of the slurry liquid applied for mechanical polishing should be sorted in a predetermined range to be supplied to CMP equipment. The reason is that if large particles of a predetermined size or more (for example, generally 1 ⁇ or more in the case of oxide slurry) are used in a CMP process, fine pattern damage may be caused on a semiconductor wafer, resulting in a defect in the semiconductor wafer.
- a separate slurry supply apparatus is provided to sort and supply particles suitable for the process characteristics are provided.
- the slurry supply apparatus supplies a proper amount of mixed solution in which an additive is mixed and diluted to correspond to raw slurry liquid and process characteristics used in the CMP process to the CMP apparatus.
- the slurry is fed to a point of user (POU) while being maintained in a more static state so that a phenomenon of lumping the slurry can be maximally prevented.
- POU point of user
- a pressure vessel an aspirator for suctioning slurry into the pressure vessel, and a N 2 gas supply unit for generating pressure and feeding a N 2 gas.
- Bernoulli theorem is applied when slurry is filled in the pressure vessel.
- the aspirator generates a negative pressure
- a negative pressure vacuum pressure
- slurry is introduced into the pressure vessel and a predetermined amount of slurry is filled in the pressure vessel.
- the slurry filled in the pressure vessel is often suctioned into the aspirator in the form of droplets at an apex of suction.
- This is a phenomenon in which very small droplets of slurry spatter from the pressure vessel to be suctioned into the aspirator, and the slurry liquid suctioned then is accumulated as the process proceeds, and if the slurry liquid is dried in this state, it is stuck in a solid slurry state. Then, the solid slurry clogs an orifice of the aspirator, disturbs generation of a vacuum, and stops an operation of equipment, causing a process loss.
- the slurry liquid when the slurry liquid overflows an exhaustion side of the vacuum generator and is accumulated, it may cause a severe loss to the equipment itself.
- an aspect of the present invention is to provide a device for supplying slurry for semiconductor provided with a pipe clogging prevention means by which an orifice region or a pipe of an aspirator of the device for supplying slurry for semiconductor can be prevented from being clogged as slurry liquid is introduced into and stuck to an interior of the aspirator.
- a device for supplying slurry for semiconductor provided with pipe clogging prevention means in a polishing process when the semiconductor is manufactured, the device comprising: a storage tank in which the slurry is stored; a plurality of pressure vessels connected to the storage tank, respectively, for receiving the slurry from the storage tank and discharging the slurry to the outside; an aspiration unit connected to the pressure vessels, for generating a vacuum pressure in the pressure vessels; and a centrifugal separation unit installed in a connection line of the aspiration unit between the pressure vessels and the aspiration unit, for separating foreign substances contained in the introduced compressed air from the compressed air by using a centrifugal force.
- the centrifugal separation unit may correspond to a cylindrical tubular body in which a suction port connected to the pressure vessels is formed on a side surface thereof and an exhaust port is formed perpendicular to the suction port such that the compressed air introduced into the suction port forms vortices in the tubular body to separate heavy slurry from the compressed air by using a centrifugal force.
- the tubular body may be formed such that a diameter thereof becomes smaller downward, and a slurry storage box for storing the centrifugally separated slurry is provided at a lower portion of the tubular body.
- slurry contained in introduced compressed air is centrifugally separated by installing a centrifugal separator in a device for supplying slurry for semiconductor and an aspiration unit so that only pure compressed air can be introduced into the aspiration unit, whereby a clogging phenomenon due to introduction of slurry liquid can be prevented and an equipment loss or a process loss can be prevented in advance.
- FIG. 1 is a schematic diagram showing a device for supplying slurry for semiconductor provided with pipe clogging prevention means according to an embodiment of the present invention
- FIG. 2 is an exemplary view showing an aspirator of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention
- FIG. 3 is a plan view showing a centrifugal separation unit of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention.
- FIG. 4 is a side view showing the centrifugal separation unit of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention.
- FIG. 1 is a schematic diagram showing a device for supplying slurry for semiconductor provided with pipe clogging prevention means according to an embodiment of the present invention.
- FIG. 2 is an exemplary view showing an aspirator of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention.
- the device for supplying slurry for semiconductor provided with pipe clogging prevention means includes a storage tank 10 , pressure vessels 21 and 22 , an aspiration unit 30 , and a centrifugal separation unit 40 .
- a plurality of pressure vessels 21 and 22 may be provided to be connected to the storage tank 10 in parallel to receive slurry and discharge the slurry to a point of user (POU).
- POU point of user
- the slurry is provided to the pressure vessels 21 and 22 by a vacuum pressure (negative pressure) provided from the aspiration unit 30 . That is, the aspiration unit 30 is connected to the pressure vessels 21 and 22 through pipes, respectively to apply a vacuum pressure to the interiors of the pressure vessels 21 and 22 . Accordingly, the slurry in the storage tank 10 connected to the pipes of the pressure vessels 21 and 22 may be introduced into the pressure vessels 21 and 22 by the vacuum pressure. Then, a N 2 gas or a natural gas may be applied as a compressed gas (vacuum pressure forming gas) applied to the aspiration unit 30
- the aspiration unit 30 may be configured such that a nozzle 32 and a diffuser 33 are coupled to opposite sides of a vacuum port 31 . Then, an orifice 36 is formed between the nozzle 32 and the diffuser 33 so that a N 2 gas supplied through a supply passage 35 is exhausted through a discharge passage 34 of the diffuser 33 , and a flow of gas introduced into an entry of the discharge passage 34 (generated due to a difference between pressures of the orifice region and the exit of the discharge passage: a Venturi effect) is generated in the vacuum port 31 by the orifice 36 to generate a negative pressure in the vacuum port 31 . Accordingly, a vacuum pressure may be generated in the pressure vessels 21 and 22 communicated with an inlet passage 37 .
- a centrifugal separation unit 40 is additionally provided in the present invention to prevent slurry particles from being introduced through the vacuum port 31 and stuck to the orifice 36 or the discharge passage 34 .
- FIG. 3 is a plan view showing a centrifugal separation unit of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention.
- FIG. 4 is a side view showing the centrifugal separation unit of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention.
- the centrifugal separation unit 40 may be configured such that a slurry storage box 42 is provided in a cylindrical tubular body 46 . Then, a suction port 43 is formed on a side surface of the tubular body 46 and an exhaust port 44 is formed at an upper portion of the tubular body 46 to be perpendicular to the suction port 43 .
- the suction port 43 is connected to the pressure vessels 21 and 22 , respectively, and the exhaust port 44 is connected to the aspiration unit 30 .
- the tubular body 46 may become narrower toward a lower end 41 thereof so that an inclined surface 45 is formed on an inner peripheral surface thereof. Accordingly, as a width of the tubular body 46 becomes narrower downward, rotational acceleration of vortices can be increased along the inclined surface 45 when the vortices are generated.
- the tubular body 46 may be formed to have a cylindrical shape whose diameters are the same at upper and lower sides thereof
- the slurry storage box 42 is connected to a lower end 41 of the tubular body 46 , so that as the slurry separated by the centrifugal force is lowered due to gravity and stored finally. Then, the slurry storage box 42 may be attached to and detached from the tubular body 46 to conveniently process the stored slurry.
- the slurry is rotated along the inclined surface 45 of the tubular body 46 , and is further rotated and lowered to the lower end 41 of the tubular body 46 due to its weight and is finally stored in the slurry storage box 42 .
- the pure compressed air (the compressed air by which the slurry is separated) is concentrated to a center of the tubular body 46 and is introduced into the aspiration unit 30 through the exhaust port 44 . Then, since the compressed air exhausted through the exhaust port 44 is pure compressed air which does not have sludge, the slurry is prevented from being introduced into and stuck to the aspiration unit 30 , causing a clogging phenomenon.
Abstract
Description
- The present invention relates to a device for supplying slurry for semiconductor provided with pipe clogging prevention means and more particularly, to the device for supplying slurry for semiconductor provided with pipe clogging prevention means by which an orifice region or a pipe of an aspirator of the device for supplying slurry for semiconductor can be prevented from being clogged as slurry liquid is introduced into and stuck to an interior of the aspirator.
- In general, a process technology for manufacturing a semiconductor device requires high integration and high concentration of semiconductor devices. Accordingly, a fine pattern forming technology should be applied.
- Meanwhile, as a multilayered structure for wires is required, a surface structure of a semiconductor device is becoming complex and steps of interlayer films are becoming more severe. However, the steps of the interlayer films generated in this way cause a process defect, which should be removed.
- Planarization technologies for solving the problem according to the related art include SOG, etch back, boron phosphorus silicate glass (BPSG), a reflow process, and a chemical/mechanical polishing (CMP) process. Among them, CMP processes are recently frequently used, and such a CMP process corresponds to a single process in which a chemical polishing process and a mechanical polishing process are combined to planarize a surface of a wafer which becomes larger as a diameter of a wafer becomes larger. The CMP process is a process of attaching a surface of a wafer having a step on a polishing pad, injecting an abrasive between the wafer and the polishing pad, and planarizing the wafer, and is suitable for a planarization process of a large diameter wafer.
- A solution containing polishing abrasive particles and a chemical additive is used as an abrasive for the CMP process, and is called slurry. A chemical/mechanical planarization process is performed on a semiconductor wafer by using liquid slurry. Then, sizes of granules of the suspended solid particles of the slurry liquid applied for mechanical polishing should be sorted in a predetermined range to be supplied to CMP equipment. The reason is that if large particles of a predetermined size or more (for example, generally 1μ or more in the case of oxide slurry) are used in a CMP process, fine pattern damage may be caused on a semiconductor wafer, resulting in a defect in the semiconductor wafer.
- Further, in order to use slurry in CMP process equipment, a separate slurry supply apparatus is provided to sort and supply particles suitable for the process characteristics are provided. The slurry supply apparatus supplies a proper amount of mixed solution in which an additive is mixed and diluted to correspond to raw slurry liquid and process characteristics used in the CMP process to the CMP apparatus.
- Generally, in this case, the slurry is fed to a point of user (POU) while being maintained in a more static state so that a phenomenon of lumping the slurry can be maximally prevented.
- To this end, a pressure vessel, an aspirator for suctioning slurry into the pressure vessel, and a N2 gas supply unit for generating pressure and feeding a N2 gas. Here, Bernoulli theorem is applied when slurry is filled in the pressure vessel. In detail, if the aspirator generates a negative pressure, a negative pressure (vacuum pressure) is generated in the pressure vessel through a negative pressure of the aspirator, and slurry is introduced into the pressure vessel and a predetermined amount of slurry is filled in the pressure vessel.
- Then, the slurry filled in the pressure vessel is often suctioned into the aspirator in the form of droplets at an apex of suction. This is a phenomenon in which very small droplets of slurry spatter from the pressure vessel to be suctioned into the aspirator, and the slurry liquid suctioned then is accumulated as the process proceeds, and if the slurry liquid is dried in this state, it is stuck in a solid slurry state. Then, the solid slurry clogs an orifice of the aspirator, disturbs generation of a vacuum, and stops an operation of equipment, causing a process loss.
- Further, when the slurry liquid overflows an exhaustion side of the vacuum generator and is accumulated, it may cause a severe loss to the equipment itself.
- Therefore, the present invention has been made in view of the above-mentioned problems, and an aspect of the present invention is to provide a device for supplying slurry for semiconductor provided with a pipe clogging prevention means by which an orifice region or a pipe of an aspirator of the device for supplying slurry for semiconductor can be prevented from being clogged as slurry liquid is introduced into and stuck to an interior of the aspirator.
- In accordance with an aspect of the present invention, there is a device for supplying slurry for semiconductor provided with pipe clogging prevention means in a polishing process when the semiconductor is manufactured, the device comprising: a storage tank in which the slurry is stored; a plurality of pressure vessels connected to the storage tank, respectively, for receiving the slurry from the storage tank and discharging the slurry to the outside; an aspiration unit connected to the pressure vessels, for generating a vacuum pressure in the pressure vessels; and a centrifugal separation unit installed in a connection line of the aspiration unit between the pressure vessels and the aspiration unit, for separating foreign substances contained in the introduced compressed air from the compressed air by using a centrifugal force.
- The centrifugal separation unit may correspond to a cylindrical tubular body in which a suction port connected to the pressure vessels is formed on a side surface thereof and an exhaust port is formed perpendicular to the suction port such that the compressed air introduced into the suction port forms vortices in the tubular body to separate heavy slurry from the compressed air by using a centrifugal force.
- The tubular body may be formed such that a diameter thereof becomes smaller downward, and a slurry storage box for storing the centrifugally separated slurry is provided at a lower portion of the tubular body.
- According to the present invention, slurry contained in introduced compressed air is centrifugally separated by installing a centrifugal separator in a device for supplying slurry for semiconductor and an aspiration unit so that only pure compressed air can be introduced into the aspiration unit, whereby a clogging phenomenon due to introduction of slurry liquid can be prevented and an equipment loss or a process loss can be prevented in advance.
-
FIG. 1 is a schematic diagram showing a device for supplying slurry for semiconductor provided with pipe clogging prevention means according to an embodiment of the present invention; -
FIG. 2 is an exemplary view showing an aspirator of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention; -
FIG. 3 is a plan view showing a centrifugal separation unit of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention; and -
FIG. 4 is a side view showing the centrifugal separation unit of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention. - Hereinafter, an exemplary embodiment of the present invention will be described in detail with reference to the accompanying drawings.
-
FIG. 1 is a schematic diagram showing a device for supplying slurry for semiconductor provided with pipe clogging prevention means according to an embodiment of the present invention.FIG. 2 is an exemplary view showing an aspirator of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention. - As shown in
FIG. 1 , the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the present invention includes astorage tank 10,pressure vessels aspiration unit 30, and acentrifugal separation unit 40. - A plurality of
pressure vessels storage tank 10 in parallel to receive slurry and discharge the slurry to a point of user (POU). - Then, the slurry is provided to the
pressure vessels aspiration unit 30. That is, theaspiration unit 30 is connected to thepressure vessels pressure vessels storage tank 10 connected to the pipes of thepressure vessels pressure vessels aspiration unit 30 - As shown in
FIG. 2 , theaspiration unit 30 may be configured such that anozzle 32 and adiffuser 33 are coupled to opposite sides of avacuum port 31. Then, anorifice 36 is formed between thenozzle 32 and thediffuser 33 so that a N2 gas supplied through a supply passage 35 is exhausted through adischarge passage 34 of thediffuser 33, and a flow of gas introduced into an entry of the discharge passage 34 (generated due to a difference between pressures of the orifice region and the exit of the discharge passage: a Venturi effect) is generated in thevacuum port 31 by theorifice 36 to generate a negative pressure in thevacuum port 31. Accordingly, a vacuum pressure may be generated in thepressure vessels inlet passage 37. - Meanwhile, if a vacuum pressure is generated in the
pressure vessels vacuum port 31 in the process of supplying slurry into thepressure vessels centrifugal separation unit 40 is additionally provided in the present invention to prevent slurry particles from being introduced through thevacuum port 31 and stuck to theorifice 36 or thedischarge passage 34. -
FIG. 3 is a plan view showing a centrifugal separation unit of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention.FIG. 4 is a side view showing the centrifugal separation unit of the device for supplying slurry for semiconductor provided with pipe clogging prevention means according to the embodiment of the present invention. - As shown in
FIGS. 3 and 4 , thecentrifugal separation unit 40 may be configured such that aslurry storage box 42 is provided in a cylindricaltubular body 46. Then, asuction port 43 is formed on a side surface of thetubular body 46 and anexhaust port 44 is formed at an upper portion of thetubular body 46 to be perpendicular to thesuction port 43. Thesuction port 43 is connected to thepressure vessels exhaust port 44 is connected to theaspiration unit 30. - The
tubular body 46 may become narrower toward alower end 41 thereof so that an inclined surface 45 is formed on an inner peripheral surface thereof. Accordingly, as a width of thetubular body 46 becomes narrower downward, rotational acceleration of vortices can be increased along the inclined surface 45 when the vortices are generated. Of course, thetubular body 46 may be formed to have a cylindrical shape whose diameters are the same at upper and lower sides thereof - The
slurry storage box 42 is connected to alower end 41 of thetubular body 46, so that as the slurry separated by the centrifugal force is lowered due to gravity and stored finally. Then, theslurry storage box 42 may be attached to and detached from thetubular body 46 to conveniently process the stored slurry. - In a description of an operation of the above-configured
centrifugal separation unit 40, first, if slurry is introduced through thesuction port 43 together with compressed air, vortices (having a cyclone shape) are generated along an inner peripheral surface of thetubular body 46 and the compressed air is withdrawn through theexhaust port 44. As shown inFIG. 3 , as thesuction port 43 is installed at a periphery of a side surface of thetubular body 46 and thesuction port 43 and theexhaust port 44 are disposed perpendicular to each other, the compressed air suctioned into the cylindricaltubular body 46 is accelerated along an inner peripheral surface of thetubular body 46 and is exhausted through theexhaust port 44 while generating vortices. - If the compressed air introduced into the
tubular body 46 is swirled, the relatively heavy slurry is pushed to the outside by a centrifugal force. Then, the slurry is rotated along the inclined surface 45 of thetubular body 46, and is further rotated and lowered to thelower end 41 of thetubular body 46 due to its weight and is finally stored in theslurry storage box 42. - Meanwhile, the pure compressed air (the compressed air by which the slurry is separated) is concentrated to a center of the
tubular body 46 and is introduced into theaspiration unit 30 through theexhaust port 44. Then, since the compressed air exhausted through theexhaust port 44 is pure compressed air which does not have sludge, the slurry is prevented from being introduced into and stuck to theaspiration unit 30, causing a clogging phenomenon. - While the invention has been described in connection with various aspects, it will be understood that the invention is capable of further modifications. This application is intended to cover any variations, uses or adaptation of the invention following, in general, the principles of the invention, and including such departures from the present disclosure as come within the known and customary practice within the art to which the invention pertains.
Claims (3)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2010-0086113 | 2010-09-02 | ||
KR1020100086113A KR101138403B1 (en) | 2010-09-02 | 2010-09-02 | Apparatus for supplying slurry for semiconductor having means for preventing clogging pipe |
PCT/KR2010/005992 WO2012030005A1 (en) | 2010-09-02 | 2010-09-03 | Device for supplying slurry for semiconductor, provided with pipe clogging prevention means |
Publications (1)
Publication Number | Publication Date |
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US20130225053A1 true US20130225053A1 (en) | 2013-08-29 |
Family
ID=45773065
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US13/820,578 Abandoned US20130225053A1 (en) | 2010-09-02 | 2010-09-03 | Device for supplying slurry for semiconductor, provided with pipe clogging prevention means |
Country Status (4)
Country | Link |
---|---|
US (1) | US20130225053A1 (en) |
JP (1) | JP2013536995A (en) |
KR (1) | KR101138403B1 (en) |
WO (1) | WO2012030005A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130005225A1 (en) * | 2011-07-01 | 2013-01-03 | Salvatore Russo | Automatic abrasive sand delivery machine especially for water-jet cutting machines |
CN107042471A (en) * | 2017-05-18 | 2017-08-15 | 合肥彩虹蓝光科技有限公司 | One kind is used for copper polishing fluid supply arrangement in LED chip thinning process |
Citations (3)
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US20030047881A1 (en) * | 2001-09-13 | 2003-03-13 | Worm Steven Lee | Sealing system and pressure chamber assembly including the same |
US20060196884A1 (en) * | 2005-03-04 | 2006-09-07 | David Gerken | Control of fluid conditions in bulk fluid delivery systems |
US20080006954A1 (en) * | 2004-09-07 | 2008-01-10 | Kazuhiro Yubuta | Process and Apparatus for Producing Fine Particles |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH02257627A (en) * | 1989-03-30 | 1990-10-18 | Kyushu Electron Metal Co Ltd | Method and apparatus for polishing of semiconductor wafer |
JP3969137B2 (en) * | 2002-03-20 | 2007-09-05 | アイシン精機株式会社 | Powder release agent coating apparatus and casting apparatus |
KR100485311B1 (en) * | 2003-06-24 | 2005-04-27 | 한성완 | Wastewater treatment apparatus |
JP2005163619A (en) * | 2003-12-02 | 2005-06-23 | Smc Corp | Vacuum generation unit |
JP4453904B2 (en) * | 2004-08-02 | 2010-04-21 | 東京都 | In-pipe cleaning system |
JP4486870B2 (en) * | 2004-11-05 | 2010-06-23 | アプリシアテクノロジー株式会社 | Slurry supply apparatus and slurry supply method |
KR100636021B1 (en) | 2005-02-04 | 2006-10-18 | 삼성전자주식회사 | Cyclone, apparatus for separating slurry, system and method of supplying slurry using the apparatus |
US7290931B2 (en) * | 2005-07-15 | 2007-11-06 | Asml Holding N.V. | Vacuum pre-loaded pneumatic bearing with onboard vacuum generator |
JPWO2008020507A1 (en) * | 2006-08-16 | 2010-01-07 | 旭硝子株式会社 | Abrasive recovery method and apparatus from abrasive slurry waste liquid |
KR100985861B1 (en) * | 2008-09-24 | 2010-10-08 | 씨앤지하이테크 주식회사 | Apparatus for supplying slurry for semiconductor and method thereof |
-
2010
- 2010-09-02 KR KR1020100086113A patent/KR101138403B1/en active IP Right Grant
- 2010-09-03 JP JP2013526980A patent/JP2013536995A/en active Pending
- 2010-09-03 US US13/820,578 patent/US20130225053A1/en not_active Abandoned
- 2010-09-03 WO PCT/KR2010/005992 patent/WO2012030005A1/en active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030047881A1 (en) * | 2001-09-13 | 2003-03-13 | Worm Steven Lee | Sealing system and pressure chamber assembly including the same |
US20080006954A1 (en) * | 2004-09-07 | 2008-01-10 | Kazuhiro Yubuta | Process and Apparatus for Producing Fine Particles |
US20060196884A1 (en) * | 2005-03-04 | 2006-09-07 | David Gerken | Control of fluid conditions in bulk fluid delivery systems |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130005225A1 (en) * | 2011-07-01 | 2013-01-03 | Salvatore Russo | Automatic abrasive sand delivery machine especially for water-jet cutting machines |
CN107042471A (en) * | 2017-05-18 | 2017-08-15 | 合肥彩虹蓝光科技有限公司 | One kind is used for copper polishing fluid supply arrangement in LED chip thinning process |
Also Published As
Publication number | Publication date |
---|---|
KR20120022492A (en) | 2012-03-12 |
KR101138403B1 (en) | 2012-04-26 |
JP2013536995A (en) | 2013-09-26 |
WO2012030005A1 (en) | 2012-03-08 |
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