US2447979A - Copper base alloy for metal evaporation - Google Patents

Copper base alloy for metal evaporation Download PDF

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Publication number
US2447979A
US2447979A US543634A US54363444A US2447979A US 2447979 A US2447979 A US 2447979A US 543634 A US543634 A US 543634A US 54363444 A US54363444 A US 54363444A US 2447979 A US2447979 A US 2447979A
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copper
metal
base alloy
metal evaporation
copper base
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Expired - Lifetime
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US543634A
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Franz R Hensel
Earl I Larsen
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Duracell Inc USA
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PR Mallory and Co Inc
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Priority to US543634A priority Critical patent/US2447979A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/26Vacuum evaporation by resistance or inductive heating of the source
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S29/00Metal working
    • Y10S29/044Vacuum

Definitions

  • An object of the invention is to improve the evaporation of copper and its alloys.
  • Figure 1 is a sectional elevation of a metal evaporation apparatus
  • Figure 2 is a fragmentary cross-section of the tungsten filament coated with the metal to be evaporated.
  • Figure 3 shows a wire loop of the metal.
  • the metal to be evaporated is usually hung on a tungsten filament as small loops of wire. Electric current is then passed through the lament to heat it and the wire loops are melted and the fused metal clings to the filament and evaporates as the heating is continued.
  • One diiiiculty which has been encountered with silver and copper has been the failure of these metals to wet the tungsten sufciently to cling to it during the vaporization process.
  • the metal tends to ball up and drop olf the filament before it can be evaporated. It also sometimes tends to spatter during evaporation, probably due to the accumulation of the liquid metal in large globules.
  • Platinum 5.00 Copper Balance 2 or iron may be present in percentages ranging from .001 to .5%.
  • Figure 1 shows a metal vaporization apparatus comprising a bell jar I0 resting on a pump plate II with a rubber gasket I 2 between them to afford a gas seal.
  • the bell jar is connected to a vacuum pump through pipe I3 and a Pirani gauge I4 may be provided to measure the degree of vacuum obtained.
  • the articles to be coated with a thin film of copper such as glass plates or mirror blanks I5 are mounted on the inside wall of a cylindrical container I6 supported within the bell jar.
  • the tungsten filament I'I is mounted axially within the container and connected to insulated terminals I8 and I9.
  • the copper alloy to be evaporated is hung on the spiral tungsten filament as little wire loops 23 (Fig. 3) so that when the filament heats up the loops will melt and cling to the filament.
  • Figure 2 is a fragmentary cross-section of the tungsten filament II coated with the fused alloy 2 I of copper preparatory to evaporation.
  • An alloy loop for metal evaporation formed of an alloy composed of .001 to 1% lithium, .25 to 20% of a metal selected from the group consisting of platinum and palladium and the balance copper.
  • An alloy wire for metal evaporation composed of about .05% lithium, 5% platinum and the balance copper.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Description

F. R.H ENsE| Erm. 2,447,979
COPPER BASE ALLOY FOR METAL EYAPORATION Aug. 24, 1948.
Filed July e. 1944 .T0 Mrz/UM PUMP P/mq/v/ 60,465
Hrm/P NEY Patented Aug. 24, 1948 COPPER BASE ALLOY FOR METAL EVAPORATION Franz R. Hensel and Earl I. Larsen, Indianapolis, Ind., assignors to P. R. Mallory & Co., Inc., Indianapolis, Ind., a corporation of Delaware Application July 6, 1944, Serial No. 543,634
2V Claims. (Cl. 75-153) This invention relates to improvements in metal evaporation.
An object of the invention is to improve the evaporation of copper and its alloys.
Other objects of the invention will be apparent from the description and claims.
Figure 1 is a sectional elevation of a metal evaporation apparatus;
Figure 2 is a fragmentary cross-section of the tungsten filament coated with the metal to be evaporated; and
Figure 3 shows a wire loop of the metal.
The vaporization process for depositing silver, copper and other metals has been known for some time and used commercially to some extent. The processing as applied to silver is described in considerable detail in the book Silver in Industry edited by Lawrence Addicks (Reinhold 1940), pages 291 to 296.
In carrying out the process the metal to be evaporated is usually hung on a tungsten filament as small loops of wire. Electric current is then passed through the lament to heat it and the wire loops are melted and the fused metal clings to the filament and evaporates as the heating is continued. One diiiiculty which has been encountered with silver and copper has been the failure of these metals to wet the tungsten sufciently to cling to it during the vaporization process. The metal tends to ball up and drop olf the filament before it can be evaporated. It also sometimes tends to spatter during evaporation, probably due to the accumulation of the liquid metal in large globules.
We have now discovered that this difficulty can be overcome in the case of copper and satisfactory wetting of the tungsten filament obtained by adding a small percentage of lithium to copper or its alloys. For example, an alloy of Per cent Lithium .05
Platinum 5.00 Copper Balance 2 or iron may be present in percentages ranging from .001 to .5%.
Referring to the drawing, Figure 1 shows a metal vaporization apparatus comprising a bell jar I0 resting on a pump plate II with a rubber gasket I 2 between them to afford a gas seal. The bell jar is connected to a vacuum pump through pipe I3 and a Pirani gauge I4 may be provided to measure the degree of vacuum obtained.
The articles to be coated with a thin film of copper such as glass plates or mirror blanks I5 are mounted on the inside wall of a cylindrical container I6 supported within the bell jar. The tungsten filament I'I is mounted axially within the container and connected to insulated terminals I8 and I9.
The copper alloy to be evaporated is hung on the spiral tungsten filament as little wire loops 23 (Fig. 3) so that when the filament heats up the loops will melt and cling to the filament.
Figure 2 is a fragmentary cross-section of the tungsten filament II coated with the fused alloy 2 I of copper preparatory to evaporation.
While speciflc embodiments of the invention have been described, it is intended to cover the invention broadly within the spirit and scope of the appended claims.
What is claimed is:
1. An alloy loop for metal evaporation formed of an alloy composed of .001 to 1% lithium, .25 to 20% of a metal selected from the group consisting of platinum and palladium and the balance copper.
2. An alloy wire for metal evaporation composed of about .05% lithium, 5% platinum and the balance copper.
FRANZ R. HENSEL. EARL I. LARSEN.
REFERENCES CITED The following references are of record in the ille of this patent:
UNITED STATES PATENTS Number Name Date 1,291,106 Payne Jan. 14, 1919 1,923,955 Smith Aug. 22, 1933 2,178,233 Klatzow Oct. 31, 1939 2,196,302 Hensel et al. Apr. 9, 1940 2,213,312 Hensel Sept. 3, 1940 2,330,062 Lempert Sept. 21, 1943 2,413,604 Colbert et al Dec. 31, 1946 2,413,606 Colbert et al Dec. 31, 1946
US543634A 1944-07-06 1944-07-06 Copper base alloy for metal evaporation Expired - Lifetime US2447979A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2553289A (en) * 1947-03-12 1951-05-15 Bausch & Lomb Method for depositing thin films
US2589175A (en) * 1948-12-28 1952-03-11 Libbey Owens Ford Glass Co Aluminum base alloy for metal evaporation
US3188735A (en) * 1960-06-27 1965-06-15 Laske Hans Method for producing very thin and bright metal wires and profiles
US3188726A (en) * 1962-05-16 1965-06-15 Laske Hans Device for evaporating coatings from extremely thin metal elements
US4759719A (en) * 1986-09-22 1988-07-26 Levenson Michael K Teaching device for the demonstration of scientific principles
US20100037826A1 (en) * 2006-09-14 2010-02-18 Hiroshi Nagata Vacuum vapor processing apparatus
US20140056579A1 (en) * 2006-04-28 2014-02-27 Semiconductor Energy Laboratory Co., Ltd. Electrode cover and evaporation device

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1291106A (en) * 1917-11-21 1919-01-14 Gen Electric Electrical resistance.
US1923955A (en) * 1931-11-16 1933-08-22 Allied Process Corp Alloy
US2178233A (en) * 1936-06-25 1939-10-31 Emi Ltd Cathode ray tube
US2196302A (en) * 1939-02-21 1940-04-09 Mallory & Co Inc P R Silver copper alloy
US2213312A (en) * 1940-04-08 1940-09-03 Mallory & Co Inc P R Electric contact
US2330062A (en) * 1941-09-24 1943-09-21 Westinghouse Electric & Mfg Co Silver-copper solder alloy
US2413604A (en) * 1944-05-27 1946-12-31 Libbey Owens Ford Glass Co Method or process of evaporating metals
US2413606A (en) * 1944-09-01 1946-12-31 Libbey Owens Ford Glass Co Method of coating by evaporating metals

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1291106A (en) * 1917-11-21 1919-01-14 Gen Electric Electrical resistance.
US1923955A (en) * 1931-11-16 1933-08-22 Allied Process Corp Alloy
US2178233A (en) * 1936-06-25 1939-10-31 Emi Ltd Cathode ray tube
US2196302A (en) * 1939-02-21 1940-04-09 Mallory & Co Inc P R Silver copper alloy
US2213312A (en) * 1940-04-08 1940-09-03 Mallory & Co Inc P R Electric contact
US2330062A (en) * 1941-09-24 1943-09-21 Westinghouse Electric & Mfg Co Silver-copper solder alloy
US2413604A (en) * 1944-05-27 1946-12-31 Libbey Owens Ford Glass Co Method or process of evaporating metals
US2413606A (en) * 1944-09-01 1946-12-31 Libbey Owens Ford Glass Co Method of coating by evaporating metals

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2553289A (en) * 1947-03-12 1951-05-15 Bausch & Lomb Method for depositing thin films
US2589175A (en) * 1948-12-28 1952-03-11 Libbey Owens Ford Glass Co Aluminum base alloy for metal evaporation
US3188735A (en) * 1960-06-27 1965-06-15 Laske Hans Method for producing very thin and bright metal wires and profiles
US3188726A (en) * 1962-05-16 1965-06-15 Laske Hans Device for evaporating coatings from extremely thin metal elements
US4759719A (en) * 1986-09-22 1988-07-26 Levenson Michael K Teaching device for the demonstration of scientific principles
US20140056579A1 (en) * 2006-04-28 2014-02-27 Semiconductor Energy Laboratory Co., Ltd. Electrode cover and evaporation device
US9290842B2 (en) * 2006-04-28 2016-03-22 Semiconductor Energy Laboratory Co., Ltd. Electrode cover and evaporation device
US20100037826A1 (en) * 2006-09-14 2010-02-18 Hiroshi Nagata Vacuum vapor processing apparatus

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