|
| US4687523 | 30 Jul 1986 | 18 Ago 1987 | Mobil Oil Corporation | Method for cleaning a core sample from a subterranean formation of solid contaminant particles |
| US4911001 | 31 Oct 1988 | 27 Mar 1990 | Amoco Corporation | Core surface washer |
| US5067949 | 23 Abr 1990 | 26 Nov 1991 | | Instrument for unsheathing, resheathing and disposing of a medical syringe needle |
| US5377705 | 16 Sep 1993 | 3 Ene 1995 | Autoclave Engineers, Inc. | Precision cleaning system |
| US5469964 | 2 Dic 1994 | 28 Nov 1995 | | Multiple syringe unsheathing and resheathing device |
| US6277753 | 28 Sep 1999 | 21 Ago 2001 | Supercritical Systems Inc. | Removal of CMP residue from semiconductors using supercritical carbon dioxide process |
| US6306564 | 27 May 1998 | 23 Oct 2001 | Tokyo Electron Limited | Removal of resist or residue from semiconductors using supercritical carbon dioxide |
| US6331487 | 27 Feb 2001 | 18 Dic 2001 | Tokyo Electron Limited | Removal of polishing residue from substrate using supercritical fluid process |
| US6422068 | 29 Sep 2000 | 23 Jul 2002 | General Electric Company | Test rig and particulate deposit and cleaning evaluation processes using the same |
| US6500605 | 25 Oct 2000 | 31 Dic 2002 | Tokyo Electron Limited | Removal of photoresist and residue from substrate using supercritical carbon dioxide process |
| US6509141 | 3 Sep 1999 | 21 Ene 2003 | Tokyo Electron Limited | Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process |
| US6537916 | 18 Oct 2001 | 25 Mar 2003 | Tokyo Electron Limited | Removal of CMP residue from semiconductor substrate using supercritical carbon dioxide process |
| US6558475 | 10 Abr 2000 | 6 May 2003 | International Business Machines Corporation | Process for cleaning a workpiece using supercritical carbon dioxide |
| US6736149 | 19 Dic 2002 | 18 May 2004 | Supercritical Systems, Inc. | Method and apparatus for supercritical processing of multiple workpieces |
| US6748960 | 1 Nov 2000 | 15 Jun 2004 | Tokyo Electron Limited | Apparatus for supercritical processing of multiple workpieces |
| US6871656 | 25 Sep 2002 | 29 Mar 2005 | Tokyo Electron Limited | Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process |
| US6890853 | 24 Abr 2001 | 10 May 2005 | Tokyo Electron Limited | Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module |
| US6892741 | 21 Ene 2004 | 17 May 2005 | International Business Machines Corporation | Apparatus and process for supercritical carbon dioxide phase processing |
| US6921456 | 24 Jul 2001 | 26 Jul 2005 | Tokyo Electron Limited | High pressure processing chamber for semiconductor substrate |
| US6924086 | 14 Feb 2003 | 2 Ago 2005 | Tokyo Electron Limited | Developing photoresist with supercritical fluid and developer |
| US6926012 | 19 Dic 2002 | 9 Ago 2005 | Tokyo Electron Limited | Method for supercritical processing of multiple workpieces |
| US6926798 | 6 Mar 2003 | 9 Ago 2005 | Tokyo Electron Limited | Apparatus for supercritical processing of a workpiece |
| US6928746 | 14 Feb 2003 | 16 Ago 2005 | Tokyo Electron Limited | Drying resist with a solvent bath and supercritical CO2 |
| US6953042 | 15 Nov 2002 | 11 Oct 2005 | International Business Machines Corporation | Apparatus and process for supercritical carbon dioxide phase processing |
| US7001468 | 27 Ene 2003 | 21 Feb 2006 | Tokyo Electron Limited | Pressure energized pressure vessel opening and closing device and method of providing therefor |
| US7021635 | 6 Feb 2003 | 4 Abr 2006 | Tokyo Electron Limited | Vacuum chuck utilizing sintered material and method of providing thereof |
| US7044662 | 3 Ago 2004 | 16 May 2006 | Tokyo Electron Limited | Developing photoresist with supercritical fluid and developer |
| US7060422 | 15 Ene 2003 | 13 Jun 2006 | Tokyo Electron Limited | Method of supercritical processing of a workpiece |
| US7064070 | 24 Mar 2003 | 20 Jun 2006 | Tokyo Electron Limited | Removal of CMP and post-CMP residue from semiconductors using supercritical carbon dioxide process |
| US7077917 | 10 Feb 2003 | 18 Jul 2006 | Tokyo Electric Limited | High-pressure processing chamber for a semiconductor wafer |
| US7140393 | 22 Dic 2004 | 28 Nov 2006 | Tokyo Electron Limited | Non-contact shuttle valve for flow diversion in high pressure systems |
| US7163380 | 29 Jul 2003 | 16 Ene 2007 | Tokyo Electron Limited | Control of fluid flow in the processing of an object with a fluid |
| US7169540 | 11 Abr 2003 | 30 Ene 2007 | Tokyo Electron Limited | Method of treatment of porous dielectric films to reduce damage during cleaning |
| US7186093 | 5 Oct 2004 | 6 Mar 2007 | Tokyo Electron Limited | Method and apparatus for cooling motor bearings of a high pressure pump |
| US7208411 | 16 Jun 2004 | 24 Abr 2007 | Tokyo Electron Limited | Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module |
| US7225820 | 6 Oct 2003 | 5 Jun 2007 | Tokyo Electron Limited | High-pressure processing chamber for a semiconductor wafer |
| US7250374 | 30 Jun 2004 | 31 Jul 2007 | Tokyo Electron Limited | System and method for processing a substrate using supercritical carbon dioxide processing |
| US7255772 | 21 Jul 2004 | 14 Ago 2007 | Tokyo Electron Limited | High pressure processing chamber for semiconductor substrate |
| US7270137 | 28 Abr 2003 | 18 Sep 2007 | Tokyo Electron Limited | Apparatus and method of securing a workpiece during high-pressure processing |
| US7270941 | 4 Mar 2003 | 18 Sep 2007 | Tokyo Electron Limited | Method of passivating of low dielectric materials in wafer processing |
| US7291565 | 15 Feb 2005 | 6 Nov 2007 | Tokyo Electron Limited | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid |
| US7307019 | 29 Sep 2004 | 11 Dic 2007 | Tokyo Electron Limited | Method for supercritical carbon dioxide processing of fluoro-carbon films |
| US7307019 | 29 Sep 2004 | 11 Dic 2007 | Tokyo Electron Limited | Method for supercritical carbon dioxide processing of fluoro-carbon films |
| US7380984 | 28 Mar 2005 | 3 Jun 2008 | Tokyo Electron Limited | Process flow thermocouple |
| US7387868 | 28 Mar 2005 | 17 Jun 2008 | Tokyo Electron Limited | Treatment of a dielectric layer using supercritical CO2 |
| US7399708 | 30 Mar 2005 | 15 Jul 2008 | Tokyo Electron Limited | Method of treating a composite spin-on glass/anti-reflective material prior to cleaning |
| US7434590 | 22 Dic 2004 | 14 Oct 2008 | Tokyo Electron Limited | Method and apparatus for clamping a substrate in a high pressure processing system |
| US7435447 | 15 Feb 2005 | 14 Oct 2008 | Tokyo Electron Limited | Method and system for determining flow conditions in a high pressure processing system |
| US7442636 | 30 Mar 2005 | 28 Oct 2008 | Tokyo Electron Limited | Method of inhibiting copper corrosion during supercritical CO2 cleaning |
| US7491036 | 12 Nov 2004 | 17 Feb 2009 | Tokyo Electron Limited | Method and system for cooling a pump |
| US7494107 | 30 Mar 2005 | 24 Feb 2009 | Supercritical Systems, Inc. | Gate valve for plus-atmospheric pressure semiconductor process vessels |
| US7524383 | 25 May 2005 | 28 Abr 2009 | Tokyo Electron Limited | Method and system for passivating a processing chamber |
| US7550075 | 23 Mar 2005 | 23 Jun 2009 | Tokyo Electron Ltd. | Removal of contaminants from a fluid |
| US7767145 | 28 Mar 2005 | 3 Ago 2010 | Toyko Electron Limited | High pressure fourier transform infrared cell |
| US7789971 | 13 May 2005 | 7 Sep 2010 | Tokyo Electron Limited | Treatment of substrate using functionalizing agent in supercritical carbon dioxide |
