|
| US6348126 | 11 Ago 2000 | 19 Feb 2002 | Applied Materials, Inc. | Externally excited torroidal plasma source |
| US6410449 | 11 Ago 2000 | 25 Jun 2002 | Applied Materials, Inc. | Method of processing a workpiece using an externally excited torroidal plasma source |
| US6418874 | 25 May 2000 | 16 Jul 2002 | Applied Materials, Inc. | Toroidal plasma source for plasma processing |
| US6453842 | 11 Ago 2000 | 24 Sep 2002 | Applied Materials Inc. | Externally excited torroidal plasma source using a gas distribution plate |
| US6468388 | 11 Ago 2000 | 22 Oct 2002 | Applied Materials, Inc. | Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate |
| US6494986 | 11 Ago 2000 | 17 Dic 2002 | Applied Materials, Inc. | Externally excited multiple torroidal plasma source |
| US6551446 | 11 Ago 2000 | 22 Abr 2003 | Applied Materials Inc. | Externally excited torroidal plasma source with a gas distribution plate |
| US6634313 | 13 Feb 2001 | 21 Oct 2003 | Applied Materials, Inc. | High-frequency electrostatically shielded toroidal plasma and radical source |
| US6679981 | 11 May 2000 | 20 Ene 2004 | Applied Materials, Inc. | Inductive plasma loop enhancing magnetron sputtering |
| US6712020 | 12 Jun 2002 | 30 Mar 2004 | Applied Materials Inc. | Toroidal plasma source for plasma processing |
| US6893907 | 24 Feb 2004 | 17 May 2005 | Applied Materials, Inc. | Fabrication of silicon-on-insulator structure using plasma immersion ion implantation |
| US6939434 | 5 Jun 2002 | 6 Sep 2005 | Applied Materials, Inc. | Externally excited torroidal plasma source with magnetic control of ion distribution |
| US7037813 | 22 Ago 2003 | 2 May 2006 | Applied Materials, Inc. | Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage |
| US7094316 | 11 Ago 2000 | 22 Ago 2006 | Applied Materials, Inc. | Externally excited torroidal plasma source |
| US7094670 | 28 Ene 2005 | 22 Ago 2006 | Applied Materials, Inc. | Plasma immersion ion implantation process |
| US7109098 | 17 May 2005 | 19 Sep 2006 | Applied Materials, Inc. | Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing |
| US7137354 | 22 Ago 2003 | 21 Nov 2006 | Applied Materials, Inc. | Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage |
| US7166524 | 1 Dic 2004 | 23 Ene 2007 | Applied Materials, Inc. | Method for ion implanting insulator material to reduce dielectric constant |
| US7183177 | 16 Nov 2004 | 27 Feb 2007 | Applied Materials, Inc. | Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement |
| US7223676 | 3 May 2004 | 29 May 2007 | Applied Materials, Inc. | Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer |
| US7244474 | 22 Jun 2004 | 17 Jul 2007 | Applied Materials, Inc. | Chemical vapor deposition plasma process using an ion shower grid |
| US7288491 | 28 Ene 2005 | 30 Oct 2007 | Applied Materials, Inc. | Plasma immersion ion implantation process |
| US7291360 | 22 Jun 2004 | 6 Nov 2007 | Applied Materials, Inc. | Chemical vapor deposition plasma process using plural ion shower grids |
| US7291545 | 21 Nov 2005 | 6 Nov 2007 | Applied Materials, Inc. | Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage |
| US7294563 | 1 Dic 2004 | 13 Nov 2007 | Applied Materials, Inc. | Semiconductor on insulator vertical transistor fabrication and doping process |
| US7303982 | 22 Ago 2003 | 4 Dic 2007 | Applied Materials, Inc. | Plasma immersion ion implantation process using an inductively coupled plasma source having low dissociation and low minimum plasma voltage |
| US7312148 | 8 Ago 2005 | 25 Dic 2007 | Applied Materials, Inc. | Copper barrier reflow process employing high speed optical annealing |
| US7312162 | 17 May 2005 | 25 Dic 2007 | Applied Materials, Inc. | Low temperature plasma deposition process for carbon layer deposition |
| US7320734 | 22 Ago 2003 | 22 Ene 2008 | Applied Materials, Inc. | Plasma immersion ion implantation system including a plasma source having low dissociation and low minimum plasma voltage |
| US7323401 | 8 Ago 2005 | 29 Ene 2008 | Applied Materials, Inc. | Semiconductor substrate process using a low temperature deposited carbon-containing hard mask |
| US7335611 | 8 Ago 2005 | 26 Feb 2008 | Applied Materials, Inc. | Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer |
| US7358192 | 8 Abr 2004 | 15 Abr 2008 | Applied Materials, Inc. | Method and apparatus for in-situ film stack processing |
| US7393765 | 19 Abr 2007 | 1 Jul 2008 | Applied Materials, Inc. | Low temperature CVD process with selected stress of the CVD layer on CMOS devices |
| US7422775 | 17 May 2005 | 9 Sep 2008 | Applied Materials, Inc. | Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing |
| US7428915 | 26 Abr 2005 | 30 Sep 2008 | Applied Materials, Inc. | O-ringless tandem throttle valve for a plasma reactor chamber |
| US7429532 | 8 Ago 2005 | 30 Sep 2008 | Applied Materials, Inc. | Semiconductor substrate process using an optically writable carbon-containing mask |
| US7430984 | 30 Oct 2002 | 7 Oct 2008 | Applied Materials, Inc. | Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements |
| US7465478 | 28 Ene 2005 | 16 Dic 2008 | Applied Materials, Inc. | Plasma immersion ion implantation process |
| US7479456 | 26 Ago 2004 | 20 Ene 2009 | Applied Materials, Inc. | Gasless high voltage high contact force wafer contact-cooling electrostatic chuck |
| US7666464 | 23 Oct 2004 | 23 Feb 2010 | Applied Materials, Inc. | RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor |
| US7695590 | 22 Jun 2004 | 13 Abr 2010 | Applied Materials, Inc. | Chemical vapor deposition plasma reactor having plural ion shower grids |
| US7700465 | 22 Ago 2003 | 20 Abr 2010 | Applied Materials, Inc. | Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage |
| US7767561 | 20 Jul 2004 | 3 Ago 2010 | Applied Materials, Inc. | Plasma immersion ion implantation reactor having an ion shower grid |
| US8058156 | 20 Jul 2004 | 15 Nov 2011 | Applied Materials, Inc. | Plasma immersion ion implantation reactor having multiple ion shower grids |
