|
| US3961962 | 29 Nov 1974 | 8 Jun 1976 | Fuji Photo Film Co., Ltd. | Photomask material and method for producing same |
| US4078935 | 30 Abr 1975 | 14 Mar 1978 | Fuji Photo Film Co., Ltd. | Support member |
| US4242438 | 8 Sep 1975 | 30 Dic 1980 | Fuji Photo Film Co., Ltd. | Photomask material |
| US4394441 | 15 Ene 1982 | 19 Jul 1983 | Fuji Photo Film Co., Ltd. | Photographic sensitive materials |
| US4418141 | 22 Dic 1981 | 29 Nov 1983 | Fuji Photo Film Co., Ltd. | Photographic light-sensitive materials |
| US4495276 | 13 Abr 1981 | 22 Ene 1985 | Fuji Photo Film Co., Ltd. | Photosensitive materials having improved antistatic property |
| US5213887 | 3 Sep 1991 | 25 May 1993 | Minnesota Mining and Manufacturing Company | Antistatic coatings |
| US5254448 | 23 Dic 1991 | 19 Oct 1993 | Konica Corporation | Light-sensitive silver halide photographic material |
| US5348799 | 3 Sep 1991 | 20 Sep 1994 | Minnesota Mining and Manufacturing Company | Antistatic coatings comprising chitosan acid salt and metal oxide particles |
| US5395677 | 25 Jun 1993 | 7 Mar 1995 | Fuji Xerox Co., Ltd. | Transparent electrophotographic film |
| US5457015 | 17 May 1994 | 10 Oct 1995 | Minnesota Mining and Manufacturing Company | Silver halide coated organic polymeric films utilizing chitosan acid salt antistatic protection layers |
| US5496690 | 28 Abr 1994 | 5 Mar 1996 | Toyo Ink Manufacturing Co., Ltd. | Base film having dimensional stability and high transparency, and photographic light-sensitive material comprising same |
| US6030708 | 28 Oct 1996 | 29 Feb 2000 | Nissha Printing Co., Ltd. | Transparent shielding material for electromagnetic interference |
