|
| US3956093 | 16 Dic 1974 | 11 May 1976 | Airco, Inc. | Planar magnetron sputtering method and apparatus |
| US4013532 | 3 Mar 1975 | 22 Mar 1977 | Airco, Inc. | Method for coating a substrate |
| US4025410 | 25 Ago 1975 | 24 May 1977 | Western Electric Company, Inc. | Sputtering apparatus and methods using a magnetic field |
| US4046659 | 10 Ene 1975 | 6 Sep 1977 | Airco, Inc. | Method for coating a substrate |
| US4060470 | 19 Dic 1975 | 29 Nov 1977 | | Sputtering apparatus and method |
| US4116791 | 18 May 1977 | 26 Sep 1978 | Battelle Memorial Institute | Method and apparatus for forming a deposit by means of ion plating using a magnetron cathode target as source of coating material |
| US4116806 | 8 Dic 1977 | 26 Sep 1978 | Battelle Development Corporation | Two-sided planar magnetron sputtering apparatus |
| US4155825 | 2 May 1977 | 22 May 1979 | | Integrated sputtering apparatus and method |
| US4162954 | 21 Ago 1978 | 31 Jul 1979 | Vac-Tec Systems, Inc. | Planar magnetron sputtering device |
| US4166018 | 31 Ene 1974 | 28 Ago 1979 | Airco, Inc. | Sputtering process and apparatus |
| US4175030 | 22 Sep 1978 | 20 Nov 1979 | Battelle Development Corporation | Two-sided planar magnetron sputtering apparatus |
| US4180450 | 27 Sep 1978 | 25 Dic 1979 | Vac-Tec Systems, Inc. | Planar magnetron sputtering device |
| US4183797 | 22 Dic 1978 | 15 Ene 1980 | International Business Machines Corporation | Two-sided bias sputter deposition method and apparatus |
| US4194962 | 20 Dic 1978 | 25 Mar 1980 | Advanced Coating Technology, Inc. | Cathode for sputtering |
| US4204936 | 29 Mar 1979 | 27 May 1980 | The Perkin-Elmer Corporation | Method and apparatus for attaching a target to the cathode of a sputtering system |
| US4219397 | 24 Nov 1978 | 26 Ago 1980 | | Magnetron sputter apparatus |
| US4247383 | 2 Ago 1978 | 27 Ene 1981 | Leybold Heraeus GmbH | Cathodic system with target, for vacuum sputtering apparatus for the application of dielectric or nonmagnetic coatings to substrates |
| US4312731 | 24 Abr 1979 | 26 Ene 1982 | VAC-TEC Systems, Inc. | Magnetically enhanced sputtering device and method |
| US4336119 | 29 Ene 1981 | 22 Jun 1982 | PPG Industries, Inc. | Method of and apparatus for control of reactive sputtering deposition |
| US4361472 | 18 May 1981 | 30 Nov 1982 | Vac-Tec Systems, Inc. | Sputtering method and apparatus utilizing improved ion source |
| US4379040 | 18 Feb 1982 | 5 Abr 1983 | PPG Industries, Inc. | Method of and apparatus for control of reactive sputtering deposition |
| US4385979 | 9 Jul 1982 | 31 May 1983 | Varian Associates, Inc. | Target assemblies of special materials for use in sputter coating apparatus |
| US4394245 | 8 Feb 1982 | 19 Jul 1983 | Hitachi, Ltd. | Sputtering apparatus |
| US4415427 | 30 Sep 1982 | 15 Nov 1983 | GTE Products Corporation | Thin film deposition by sputtering |
| US4428816 | 25 May 1983 | 31 Ene 1984 | Materials Research Corporation | Focusing magnetron sputtering apparatus |
| US4457825 | 16 May 1980 | 3 Jul 1984 | Varian Associates, Inc. | Sputter target for use in a sputter coating source |
| US4466872 | 23 Dic 1982 | 21 Ago 1984 | AT&T Technologies, Inc. | Methods of and apparatus for depositing a continuous film of minimum thickness |
| US4472259 | 29 Oct 1981 | 18 Sep 1984 | Materials Research Corporation | Focusing magnetron sputtering apparatus |
| US4500408 | 27 Dic 1983 | 19 Feb 1985 | Varian Associates, Inc. | Apparatus for and method of controlling sputter coating |
| US4500409 | 27 Dic 1983 | 19 Feb 1985 | Varian Associates, Inc. | Magnetron sputter coating source for both magnetic and non magnetic target materials |
| US4515675 | 27 Jun 1984 | 7 May 1985 | Leybold-Heraeus GmbH | Magnetron cathode for cathodic evaportion apparatus |
| US4517070 | 28 Jun 1984 | 14 May 1985 | General Motors Corporation | Magnetron sputtering cathode assembly and magnet assembly therefor |
| US4521287 | 28 Jun 1984 | 4 Jun 1985 | General Motors Corporation | High rate sputtering of exhaust oxygen sensor electrode |
| US4673480 | 30 Ene 1984 | 16 Jun 1987 | Varian Associates, Inc. | Magnetically enhanced sputter source |
| US4724058 | 13 Ago 1984 | 9 Feb 1988 | Vac-Tec Systems, Inc. | Method and apparatus for arc evaporating large area targets |
| US4766813 | 29 Dic 1986 | 30 Ago 1988 | Olin Corporation | Metal shaped charge liner with isotropic coating |
| US4865708 | 14 Nov 1988 | 12 Sep 1989 | Vac-Tec Systems, Inc. | Magnetron sputtering cathode |
| US4872964 | 26 Ago 1988 | 10 Oct 1989 | Fujitsu Limited | Planar magnetron sputtering apparatus and its magnetic source |
| US4892633 | 11 Abr 1989 | 9 Ene 1990 | Vac-Tec Systems, Inc. | Magnetron sputtering cathode |
| US4933057 | 22 Nov 1988 | 12 Jun 1990 | Societa Italiano Vetro - SIV - S.p.A. | Apparatus and process for the deposition of a thin layer on a transparent substrate |
| US4941915 | 7 Feb 1989 | 17 Jul 1990 | Nippon Telegraph and Telephone Corporation | Thin film forming apparatus and ion source utilizing plasma sputtering |
| US4957605 | 17 Abr 1989 | 18 Sep 1990 | Materials Research Corporation | Method and apparatus for sputter coating stepped wafers |
| US4966677 | 27 Abr 1989 | 30 Oct 1990 | Leybold Aktiengesellschaft | Cathode sputtering apparatus on the magnetron principle with a hollow cathode and a cylindrical target |
| US5073245 | 10 Jul 1990 | 17 Dic 1991 | | Slotted cylindrical hollow cathode/magnetron sputtering device |
| US5178743 | 30 Ene 1991 | 12 Ene 1993 | Microelectronics and Computer Technology Corporation | Cylindrical magnetron sputtering system |
| US5234560 | 16 Abr 1992 | 10 Ago 1993 | Hauzer Holdings BV | Method and device for sputtering of films |
| US5262028 | 1 Jun 1992 | 16 Nov 1993 | Sierra Applied Sciences, Inc. | Planar magnetron sputtering magnet assembly |
| US5262032 | 23 Jul 1992 | 16 Nov 1993 | Leybold Aktiengesellschaft | Sputtering apparatus with rotating target and target cooling |
| US5277779 | 14 Abr 1992 | 11 Ene 1994 | | Rectangular cavity magnetron sputtering vapor source |
| US5298136 | 18 Ago 1987 | 29 Mar 1994 | Regents of the University of Minnesota | Steered arc coating with thick targets |
| US5298137 | 1 Oct 1992 | 29 Mar 1994 | Surface Solutions, Inc. | Method and apparatus for linear magnetron sputtering |
| US5328582 | 4 Dic 1992 | 12 Jul 1994 | Honeywell Inc. | Off-axis magnetron sputter deposition of mirrors |
| US5334302 | 13 Nov 1992 | 2 Ago 1994 | Tokyo Electron Limited | Magnetron sputtering apparatus and sputtering gun for use in the same |
| US5336386 | 28 Oct 1992 | 9 Ago 1994 | Materials Research Corporation | Target for cathode sputtering |
| US5437778 | 15 Nov 1993 | 1 Ago 1995 | Telic Technologies Corporation | Slotted cylindrical hollow cathode/magnetron sputtering device |
| US5441614 | 30 Nov 1994 | 15 Ago 1995 | AT&T Corp. | Method and apparatus for planar magnetron sputtering |
| US5529674 | 24 Abr 1995 | 25 Jun 1996 | Telic Technologies Corporation | Cylindrical hollow cathode/magnetron sputtering system and components thereof |
| US5935397 | 30 Abr 1998 | 10 Ago 1999 | Rockwell Semiconductor Systems, Inc. | Physical vapor deposition chamber |
| US5985115 | 11 Abr 1997 | 16 Nov 1999 | Novellus Systems, Inc. | Internally cooled target assembly for magnetron sputtering |
| US6132566 | 30 Jul 1998 | 17 Oct 2000 | Applied Materials, Inc. | Apparatus and method for sputtering ionized material in a plasma |
| US6152040 | 26 Nov 1997 | 28 Nov 2000 | Ashurst Government Services, Inc. | Shaped charge and explosively formed penetrator liners and process for making same |
| US6217716 | 6 May 1998 | 17 Abr 2001 | Novellus Systems, Inc. | Apparatus and method for improving target erosion in hollow cathode magnetron sputter source |
| US6258217 | 29 Sep 1999 | 10 Jul 2001 | Plasma-Therm, Inc. | Rotating magnet array and sputter source |
| US6345588 | 7 Ago 1997 | 12 Feb 2002 | Applied Materials, Inc. | Use of variable RF generator to control coil voltage distribution |
| US6436252 | 7 Abr 2000 | 20 Ago 2002 | Surface Engineered Products Corp. | Method and apparatus for magnetron sputtering |
| US6444100 | 30 Ene 2001 | 3 Sep 2002 | Seagate Technology LLC | Hollow cathode sputter source |
| US6565717 | 15 Sep 1997 | 20 May 2003 | Applied Materials, Inc. | Apparatus for sputtering ionized material in a medium to high density plasma |
| US6579426 | 16 May 1997 | 17 Jun 2003 | Applied Materials, Inc. | Use of variable impedance to control coil sputter distribution |
| US6689253 | 13 Jun 2002 | 10 Feb 2004 | Seagate Technology LLC | Facing target assembly and sputter deposition apparatus |
| US6758948 | 26 Ago 2002 | 6 Jul 2004 | Tokyo Electron Limited | Method and apparatus for depositing films |
| US6761804 | 11 Feb 2002 | 13 Jul 2004 | Applied Materials, Inc. | Inverted magnetron |
| US7327089 | 19 Sep 2003 | 5 Feb 2008 | Applied Process Technologies, Inc. | Beam plasma source |
| US7411352 | 19 Abr 2006 | 12 Ago 2008 | Applied Process Technologies, Inc. | Dual plasma beam sources and method |
| US7513982 | 7 Jun 2004 | 7 Abr 2009 | Applied Materials, Inc. | Two dimensional magnetron scanning for flat panel sputtering |
| US7588668 | 3 Mar 2006 | 15 Sep 2009 | Applied Materials, Inc. | Thermally conductive dielectric bonding of sputtering targets using diamond powder filler or thermally conductive ceramic fillers |
| US7628899 | 12 Dic 2005 | 8 Dic 2009 | Applied Materials, Inc. | Apparatus and method of positioning a multizone magnetron assembly |
