US4201152A - Transfer and temperature monitoring apparatus - Google Patents
Transfer and temperature monitoring apparatus Download PDFInfo
- Publication number
- US4201152A US4201152A US05/881,340 US88134078A US4201152A US 4201152 A US4201152 A US 4201152A US 88134078 A US88134078 A US 88134078A US 4201152 A US4201152 A US 4201152A
- Authority
- US
- United States
- Prior art keywords
- holder
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- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000012546 transfer Methods 0.000 title claims description 33
- 238000012544 monitoring process Methods 0.000 title claims description 8
- 239000000758 substrate Substances 0.000 claims abstract description 58
- 229910052751 metal Inorganic materials 0.000 claims abstract description 18
- 239000002184 metal Substances 0.000 claims abstract description 18
- 230000033001 locomotion Effects 0.000 claims abstract description 13
- 238000011065 in-situ storage Methods 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims 8
- 230000008021 deposition Effects 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 2
- 238000005137 deposition process Methods 0.000 abstract 1
- 230000007246 mechanism Effects 0.000 description 9
- 238000000151 deposition Methods 0.000 description 6
- 239000011324 bead Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 108010083687 Ion Pumps Proteins 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000002035 prolonged effect Effects 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K7/00—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements
- G01K7/02—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using thermoelectric elements, e.g. thermocouples
- G01K7/08—Measuring temperature based on the use of electric or magnetic elements directly sensitive to heat ; Power supply therefor, e.g. using thermoelectric elements using thermoelectric elements, e.g. thermocouples the object to be measured forming one of the thermoelectric materials, e.g. pointed type
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K1/00—Details of thermometers not specially adapted for particular types of thermometer
- G01K1/14—Supports; Fastening devices; Arrangements for mounting thermometers in particular locations
- G01K1/146—Supports; Fastening devices; Arrangements for mounting thermometers in particular locations arrangements for moving thermometers to or from a measuring position
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K13/00—Thermometers specially adapted for specific purposes
Abstract
Description
Claims (19)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/881,340 US4201152A (en) | 1978-02-27 | 1978-02-27 | Transfer and temperature monitoring apparatus |
DE19792907221 DE2907221A1 (en) | 1978-02-27 | 1979-02-23 | TRANSFER AND TEMPERATURE MONITORING DEVICE FOR VACUUM TREATMENT SYSTEMS |
JP2150179A JPS54126580A (en) | 1978-02-27 | 1979-02-27 | Movement and temperature monitor |
IT20557/79A IT1111825B (en) | 1978-02-27 | 1979-02-27 | EQUIPMENT FOR THE TEMPERATURE CONTROL OF A BODY IN A TREATMENT STATION AND FOR THE TRANSFER OF THE BODY ITSELF |
JP61225084A JPS6276515A (en) | 1978-02-27 | 1986-09-25 | Object moving device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/881,340 US4201152A (en) | 1978-02-27 | 1978-02-27 | Transfer and temperature monitoring apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
US4201152A true US4201152A (en) | 1980-05-06 |
Family
ID=25378271
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US05/881,340 Expired - Lifetime US4201152A (en) | 1978-02-27 | 1978-02-27 | Transfer and temperature monitoring apparatus |
Country Status (4)
Country | Link |
---|---|
US (1) | US4201152A (en) |
JP (2) | JPS54126580A (en) |
DE (1) | DE2907221A1 (en) |
IT (1) | IT1111825B (en) |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4471003A (en) * | 1980-11-25 | 1984-09-11 | Cann Gordon L | Magnetoplasmadynamic apparatus and process for the separation and deposition of materials |
US4487162A (en) * | 1980-11-25 | 1984-12-11 | Cann Gordon L | Magnetoplasmadynamic apparatus for the separation and deposition of materials |
US4508590A (en) * | 1983-09-16 | 1985-04-02 | Raphael Kaplan | Method for the deposition of high-quality crystal epitaxial films of iron |
US4534314A (en) * | 1984-05-10 | 1985-08-13 | Varian Associates, Inc. | Load lock pumping mechanism |
US4542712A (en) * | 1983-06-24 | 1985-09-24 | Hitachi, Ltd. | Apparatus for molecular beam epitaxy |
DE3421538A1 (en) * | 1984-06-08 | 1985-12-12 | ATOMIKA Technische Physik GmbH, 8000 München | VACUUM EVAPORATION DEVICE |
US4580522A (en) * | 1984-02-27 | 1986-04-08 | Hitachi, Ltd. | Rotary substrate holder of molecular beam epitaxy apparatus |
US4592306A (en) * | 1983-12-05 | 1986-06-03 | Pilkington Brothers P.L.C. | Apparatus for the deposition of multi-layer coatings |
US4592308A (en) * | 1983-11-10 | 1986-06-03 | Texas Instruments Incorporated | Solderless MBE system |
US4605469A (en) * | 1983-11-10 | 1986-08-12 | Texas Instruments Incorporated | MBE system with in-situ mounting |
US4640223A (en) * | 1984-07-24 | 1987-02-03 | Dozier Alfred R | Chemical vapor deposition reactor |
US4664063A (en) * | 1985-06-06 | 1987-05-12 | Kabushiki Kaisha Toshiba | Molecular beam epitaxial growth apparatus |
US4664062A (en) * | 1984-10-31 | 1987-05-12 | Hitachi, Ltd. | Apparatus for manufacturing semiconductors |
US4681773A (en) * | 1981-03-27 | 1987-07-21 | American Telephone And Telegraph Company At&T Bell Laboratories | Apparatus for simultaneous molecular beam deposition on a plurality of substrates |
US5855677A (en) * | 1994-09-30 | 1999-01-05 | Applied Materials, Inc. | Method and apparatus for controlling the temperature of reaction chamber walls |
US6666924B1 (en) | 2000-03-28 | 2003-12-23 | Asm America | Reaction chamber with decreased wall deposition |
WO2017032000A1 (en) * | 2015-08-26 | 2017-03-02 | 广州特种承压设备检测研究院 | Apparatus and method for detecting hot-melt welder temperature of polyethylene pressure pipe |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3675563A (en) * | 1970-01-15 | 1972-07-11 | Ibm | Semiconductor processing apparatus |
US3915765A (en) * | 1973-06-25 | 1975-10-28 | Bell Telephone Labor Inc | MBE technique for fabricating semiconductor devices having low series resistance |
US4137865A (en) * | 1976-12-30 | 1979-02-06 | Bell Telephone Laboratories, Incorporated | Molecular beam apparatus for processing a plurality of substrates |
-
1978
- 1978-02-27 US US05/881,340 patent/US4201152A/en not_active Expired - Lifetime
-
1979
- 1979-02-23 DE DE19792907221 patent/DE2907221A1/en not_active Withdrawn
- 1979-02-27 IT IT20557/79A patent/IT1111825B/en active
- 1979-02-27 JP JP2150179A patent/JPS54126580A/en active Granted
-
1986
- 1986-09-25 JP JP61225084A patent/JPS6276515A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3675563A (en) * | 1970-01-15 | 1972-07-11 | Ibm | Semiconductor processing apparatus |
US3915765A (en) * | 1973-06-25 | 1975-10-28 | Bell Telephone Labor Inc | MBE technique for fabricating semiconductor devices having low series resistance |
US4137865A (en) * | 1976-12-30 | 1979-02-06 | Bell Telephone Laboratories, Incorporated | Molecular beam apparatus for processing a plurality of substrates |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4471003A (en) * | 1980-11-25 | 1984-09-11 | Cann Gordon L | Magnetoplasmadynamic apparatus and process for the separation and deposition of materials |
US4487162A (en) * | 1980-11-25 | 1984-12-11 | Cann Gordon L | Magnetoplasmadynamic apparatus for the separation and deposition of materials |
US4681773A (en) * | 1981-03-27 | 1987-07-21 | American Telephone And Telegraph Company At&T Bell Laboratories | Apparatus for simultaneous molecular beam deposition on a plurality of substrates |
US4542712A (en) * | 1983-06-24 | 1985-09-24 | Hitachi, Ltd. | Apparatus for molecular beam epitaxy |
US4508590A (en) * | 1983-09-16 | 1985-04-02 | Raphael Kaplan | Method for the deposition of high-quality crystal epitaxial films of iron |
US4592308A (en) * | 1983-11-10 | 1986-06-03 | Texas Instruments Incorporated | Solderless MBE system |
US4605469A (en) * | 1983-11-10 | 1986-08-12 | Texas Instruments Incorporated | MBE system with in-situ mounting |
US4592306A (en) * | 1983-12-05 | 1986-06-03 | Pilkington Brothers P.L.C. | Apparatus for the deposition of multi-layer coatings |
US4580522A (en) * | 1984-02-27 | 1986-04-08 | Hitachi, Ltd. | Rotary substrate holder of molecular beam epitaxy apparatus |
US4534314A (en) * | 1984-05-10 | 1985-08-13 | Varian Associates, Inc. | Load lock pumping mechanism |
DE3421538A1 (en) * | 1984-06-08 | 1985-12-12 | ATOMIKA Technische Physik GmbH, 8000 München | VACUUM EVAPORATION DEVICE |
US4690098A (en) * | 1984-06-08 | 1987-09-01 | Atomika Technische Physik Gmbh | Vacuum vapor-deposition system |
US4640223A (en) * | 1984-07-24 | 1987-02-03 | Dozier Alfred R | Chemical vapor deposition reactor |
US4664062A (en) * | 1984-10-31 | 1987-05-12 | Hitachi, Ltd. | Apparatus for manufacturing semiconductors |
US4664063A (en) * | 1985-06-06 | 1987-05-12 | Kabushiki Kaisha Toshiba | Molecular beam epitaxial growth apparatus |
US5855677A (en) * | 1994-09-30 | 1999-01-05 | Applied Materials, Inc. | Method and apparatus for controlling the temperature of reaction chamber walls |
US6083323A (en) * | 1994-09-30 | 2000-07-04 | Applied Materials, Inc. | Method for controlling the temperature of the walls of a reaction chamber during processing |
US6666924B1 (en) | 2000-03-28 | 2003-12-23 | Asm America | Reaction chamber with decreased wall deposition |
WO2017032000A1 (en) * | 2015-08-26 | 2017-03-02 | 广州特种承压设备检测研究院 | Apparatus and method for detecting hot-melt welder temperature of polyethylene pressure pipe |
Also Published As
Publication number | Publication date |
---|---|
JPS54126580A (en) | 1979-10-01 |
DE2907221A1 (en) | 1979-08-30 |
JPS6231290B2 (en) | 1987-07-07 |
JPS6276515A (en) | 1987-04-08 |
JPS6348173B2 (en) | 1988-09-28 |
IT7920557A0 (en) | 1979-02-27 |
IT1111825B (en) | 1986-01-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: INTEVAC, INC. Free format text: CHANGE OF NAME;ASSIGNOR:DKP ELECTRONICS, A CORPORATION OF CA;REEL/FRAME:005805/0265 Effective date: 19910219 Owner name: DKP, A CORPORATION OF CA, CALIFORNIA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST, EFFECTIVE 2/15/1991.;ASSIGNOR:VARIAN ASSOCIATES INC., A CORPORATION OF DE;REEL/FRAME:005805/0259 Effective date: 19910331 |
|
AS | Assignment |
Owner name: SILICON VALLEY BANK, CALIFORNIA Free format text: SECURITY INTEREST;ASSIGNOR:INTEVAC, INC.;REEL/FRAME:006747/0087 Effective date: 19930708 |
|
AS | Assignment |
Owner name: IMBE, INC., CALIFORNIA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:INTEVAC, INC.;REEL/FRAME:007265/0340 Effective date: 19931101 Owner name: CHORUS CORPORATION, MINNESOTA Free format text: MERGER;ASSIGNOR:IMBE, INC.;REEL/FRAME:007265/0209 Effective date: 19931221 |
|
AS | Assignment |
Owner name: VEECO COMPOUND SEMICONDUCTOR INC., MINNESOTA Free format text: CHANGE OF NAME;ASSIGNOR:CHORUS CORPORATION;REEL/FRAME:017776/0441 Effective date: 20050706 |