US4530750A - Apparatus for coating optical fibers - Google Patents
Apparatus for coating optical fibers Download PDFInfo
- Publication number
- US4530750A US4530750A US06/649,157 US64915784A US4530750A US 4530750 A US4530750 A US 4530750A US 64915784 A US64915784 A US 64915784A US 4530750 A US4530750 A US 4530750A
- Authority
- US
- United States
- Prior art keywords
- fiber
- plasma
- chamber
- zone
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000013307 optical fiber Substances 0.000 title claims abstract description 27
- 238000000576 coating method Methods 0.000 title abstract description 93
- 239000011248 coating agent Substances 0.000 title abstract description 74
- 239000000835 fiber Substances 0.000 claims abstract description 197
- 229910052751 metal Inorganic materials 0.000 claims abstract description 77
- 239000002184 metal Substances 0.000 claims abstract description 77
- 150000002500 ions Chemical class 0.000 claims description 46
- 238000000151 deposition Methods 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 21
- 239000007788 liquid Substances 0.000 claims description 9
- 238000004891 communication Methods 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 abstract description 54
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 42
- 239000010408 film Substances 0.000 abstract description 40
- 238000000034 method Methods 0.000 abstract description 40
- 230000008569 process Effects 0.000 abstract description 27
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 abstract description 24
- 239000007789 gas Substances 0.000 abstract description 23
- 229910052738 indium Inorganic materials 0.000 abstract description 22
- 239000010409 thin film Substances 0.000 abstract description 10
- 238000003801 milling Methods 0.000 abstract description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052782 aluminium Inorganic materials 0.000 abstract description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052718 tin Inorganic materials 0.000 abstract description 5
- 210000002381 plasma Anatomy 0.000 abstract 4
- 229920006240 drawn fiber Polymers 0.000 abstract 2
- 238000010924 continuous production Methods 0.000 abstract 1
- 238000007599 discharging Methods 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 abstract 1
- 239000007791 liquid phase Substances 0.000 abstract 1
- 239000012808 vapor phase Substances 0.000 abstract 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 33
- 229910052786 argon Inorganic materials 0.000 description 17
- 239000003570 air Substances 0.000 description 16
- -1 carbon ions Chemical class 0.000 description 16
- 230000008021 deposition Effects 0.000 description 16
- 239000010410 layer Substances 0.000 description 16
- 239000011521 glass Substances 0.000 description 12
- 239000004215 Carbon black (E152) Substances 0.000 description 10
- 229930195733 hydrocarbon Natural products 0.000 description 10
- 150000002430 hydrocarbons Chemical class 0.000 description 10
- 239000003365 glass fiber Substances 0.000 description 9
- 230000009471 action Effects 0.000 description 8
- 125000004429 atom Chemical group 0.000 description 8
- 239000011261 inert gas Substances 0.000 description 8
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 8
- 230000001965 increasing effect Effects 0.000 description 6
- 230000033001 locomotion Effects 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 5
- 238000000992 sputter etching Methods 0.000 description 5
- 230000008016 vaporization Effects 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000000087 stabilizing effect Effects 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 229910003460 diamond Inorganic materials 0.000 description 3
- 239000010432 diamond Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 229910001449 indium ion Inorganic materials 0.000 description 3
- 229910001338 liquidmetal Inorganic materials 0.000 description 3
- 239000005304 optical glass Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 238000007792 addition Methods 0.000 description 2
- 230000003466 anti-cipated effect Effects 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 150000001721 carbon Chemical class 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000002939 deleterious effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000005672 electromagnetic field Effects 0.000 description 2
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005201 scrubbing Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- 241000220450 Cajanus cajan Species 0.000 description 1
- 229910000669 Chrome steel Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
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- 239000012141 concentrate Substances 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000009661 fatigue test Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000013101 initial test Methods 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000001455 metallic ions Chemical class 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000006223 plastic coating Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000002893 slag Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000000638 stimulation Effects 0.000 description 1
- 238000005482 strain hardening Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/104—Coating to obtain optical fibres
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
Abstract
Description
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/649,157 US4530750A (en) | 1981-03-20 | 1984-09-10 | Apparatus for coating optical fibers |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/245,937 US4402993A (en) | 1981-03-20 | 1981-03-20 | Process for coating optical fibers |
US06/649,157 US4530750A (en) | 1981-03-20 | 1984-09-10 | Apparatus for coating optical fibers |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US06501144 Continuation | 1983-06-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
US4530750A true US4530750A (en) | 1985-07-23 |
Family
ID=26937579
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US06/649,157 Expired - Fee Related US4530750A (en) | 1981-03-20 | 1984-09-10 | Apparatus for coating optical fibers |
Country Status (1)
Country | Link |
---|---|
US (1) | US4530750A (en) |
Cited By (67)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4784877A (en) * | 1986-11-05 | 1988-11-15 | Northern Telecom Limited | Two layer coating of an optical waveguide |
US4812150A (en) * | 1983-12-06 | 1989-03-14 | Standard Telephones And Cables, Plc | Metallic-glass coated optical fibres |
US4842704A (en) * | 1987-07-29 | 1989-06-27 | Collins George J | Magnetron deposition of ceramic oxide-superconductor thin films |
US4863576A (en) * | 1986-09-04 | 1989-09-05 | Collins George J | Method and apparatus for hermetic coating of optical fibers |
US4899347A (en) * | 1989-05-11 | 1990-02-06 | General Electric Company | Solid state laser gain medium with diamond coating |
US4913789A (en) * | 1988-04-18 | 1990-04-03 | Aung David K | Sputter etching and coating process |
US4927515A (en) * | 1989-01-09 | 1990-05-22 | The Board Of Trustees Of The Leland Stanford Junior University | Circular magnetron sputtering device |
US5057199A (en) * | 1986-10-31 | 1991-10-15 | N. V. Bekaert S. A. | Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates |
US5093880A (en) * | 1989-08-30 | 1992-03-03 | Furukawa Electric Co., Ltd. | Optical fiber cable coated with conductive metal coating and process therefor |
US5147432A (en) * | 1989-10-19 | 1992-09-15 | At&T Bell Laboratories | Methods of and apparatus for coating optical fibers |
US5155795A (en) * | 1991-09-23 | 1992-10-13 | G&H Technology, Inc. | Hermetic optical fiber feedthrough arrangement |
US5196399A (en) * | 1987-04-06 | 1993-03-23 | Fujikura Ltd. | Apparatus for producing oxide superconductor cable |
US5199993A (en) * | 1989-10-19 | 1993-04-06 | At&T Bell Laboratories | Methods of and apparatus for coating optical fibers |
US5211824A (en) * | 1991-10-31 | 1993-05-18 | Siemens Solar Industries L.P. | Method and apparatus for sputtering of a liquid |
US5219668A (en) * | 1986-10-31 | 1993-06-15 | N.V. Bekaert S.A. | Process and apparatus for the treatment of coated, elongated substrate, as well as substrates thus treated and articles of polymeric material reinforced with these substrates |
US5228963A (en) * | 1991-07-01 | 1993-07-20 | Himont Incorporated | Hollow-cathode magnetron and method of making thin films |
US5242477A (en) * | 1989-10-19 | 1993-09-07 | At&T Bell Laboratories | Apparatus for coating optical fibers |
US5372622A (en) * | 1993-04-30 | 1994-12-13 | At&T Corp. | Large aperture device for controlling thickness of conductive coatings on optical fibers |
US5431968A (en) * | 1993-12-07 | 1995-07-11 | Miller; Paul A. | Method for simultaneously coating a plurality of filaments |
US5437778A (en) * | 1990-07-10 | 1995-08-01 | Telic Technologies Corporation | Slotted cylindrical hollow cathode/magnetron sputtering device |
US5547512A (en) * | 1989-07-21 | 1996-08-20 | Minnesota Mining And Manufacturing Company | Continuous atomspheric pressure CVD coating of fibers |
US5548213A (en) * | 1990-05-30 | 1996-08-20 | The Furukawa Electric Co., Ltd. | Method and system for forming and inspecting an electroconductive film on optical fibers and substrates using eddy current to measure electrical resistance |
US5753089A (en) * | 1995-06-28 | 1998-05-19 | Balzers Aktiengesellschaft | Sputter coating station |
US6176667B1 (en) * | 1996-04-30 | 2001-01-23 | Applied Materials, Inc. | Multideck wafer processing system |
WO2002097157A2 (en) * | 2001-05-29 | 2002-12-05 | Saxonia Umformtechnik Gmbh | Modified diamond-like carbon (dlc) layer structure |
US20030059526A1 (en) * | 2001-09-12 | 2003-03-27 | Benson Martin H. | Apparatus and method for the design and manufacture of patterned multilayer thin films and devices on fibrous or ribbon-like substrates |
US20030064292A1 (en) * | 2001-09-12 | 2003-04-03 | Neudecker Bernd J. | Thin-film electrochemical devices on fibrous or ribbon-like substrates and method for their manufacture and design |
US20030068559A1 (en) * | 2001-09-12 | 2003-04-10 | Armstrong Joseph H. | Apparatus and method for the design and manufacture of multifunctional composite materials with power integration |
US20030089913A1 (en) * | 2001-06-18 | 2003-05-15 | Semiconductor Energy Laboratory Co., Ltd. | Light emitting device and method of fabricating the same |
US6584335B1 (en) * | 1997-08-09 | 2003-06-24 | Roche Diagnostics Gmbh | Analytical device for in vivo analysis in the body of a patient |
US20030115911A1 (en) * | 2001-12-20 | 2003-06-26 | Carpenter James B. | Apparatus for selective photosensitization of optical fiber |
US6689492B1 (en) | 1999-06-04 | 2004-02-10 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and electronic device |
US20040065902A1 (en) * | 1999-06-04 | 2004-04-08 | Semiconductor Energy Laboratory., Ltd. | Electro-optical device and electronic device |
US6763686B2 (en) * | 1996-10-23 | 2004-07-20 | 3M Innovative Properties Company | Method for selective photosensitization of optical fiber |
US6830494B1 (en) | 1999-10-12 | 2004-12-14 | Semiconductor Energy Laboratory Co., Ltd. | Electro-optical device and manufacturing method thereof |
US20050197031A1 (en) * | 1999-06-04 | 2005-09-08 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing an electro-optical device |
US20070271957A1 (en) * | 2004-12-27 | 2007-11-29 | The Furukawa Electric Co., Ltd. | Process for Producing Glass Strip, Glass Strip and Glass Substrate |
US7447406B2 (en) * | 2002-03-28 | 2008-11-04 | Prysmian Cables & Systems Limited | Coated optical fibre unit and methods of manufacturing coated optical fibre units |
US20100260998A1 (en) * | 2009-04-10 | 2010-10-14 | Lockheed Martin Corporation | Fiber sizing comprising nanoparticles |
WO2011149816A1 (en) * | 2010-05-27 | 2011-12-01 | Corning Incorporated | Method for producing optical fiber using linear non-contact fiber centering |
US8158217B2 (en) | 2007-01-03 | 2012-04-17 | Applied Nanostructured Solutions, Llc | CNT-infused fiber and method therefor |
US8168291B2 (en) | 2009-11-23 | 2012-05-01 | Applied Nanostructured Solutions, Llc | Ceramic composite materials containing carbon nanotube-infused fiber materials and methods for production thereof |
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US8545963B2 (en) | 2009-12-14 | 2013-10-01 | Applied Nanostructured Solutions, Llc | Flame-resistant composite materials and articles containing carbon nanotube-infused fiber materials |
US8580342B2 (en) | 2009-02-27 | 2013-11-12 | Applied Nanostructured Solutions, Llc | Low temperature CNT growth using gas-preheat method |
US8585934B2 (en) | 2009-02-17 | 2013-11-19 | Applied Nanostructured Solutions, Llc | Composites comprising carbon nanotubes on fiber |
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US8664573B2 (en) | 2009-04-27 | 2014-03-04 | Applied Nanostructured Solutions, Llc | CNT-based resistive heating for deicing composite structures |
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US8780526B2 (en) | 2010-06-15 | 2014-07-15 | Applied Nanostructured Solutions, Llc | Electrical devices containing carbon nanotube-infused fibers and methods for production thereof |
US8787001B2 (en) | 2010-03-02 | 2014-07-22 | Applied Nanostructured Solutions, Llc | Electrical devices containing carbon nanotube-infused fibers and methods for production thereof |
US8784937B2 (en) | 2010-09-14 | 2014-07-22 | Applied Nanostructured Solutions, Llc | Glass substrates having carbon nanotubes grown thereon and methods for production thereof |
US8815341B2 (en) | 2010-09-22 | 2014-08-26 | Applied Nanostructured Solutions, Llc | Carbon fiber substrates having carbon nanotubes grown thereon and processes for production thereof |
US8951632B2 (en) | 2007-01-03 | 2015-02-10 | Applied Nanostructured Solutions, Llc | CNT-infused carbon fiber materials and process therefor |
US8951631B2 (en) | 2007-01-03 | 2015-02-10 | Applied Nanostructured Solutions, Llc | CNT-infused metal fiber materials and process therefor |
US8969225B2 (en) | 2009-08-03 | 2015-03-03 | Applied Nano Structured Soultions, LLC | Incorporation of nanoparticles in composite fibers |
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US9005755B2 (en) | 2007-01-03 | 2015-04-14 | Applied Nanostructured Solutions, Llc | CNS-infused carbon nanomaterials and process therefor |
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US9167736B2 (en) | 2010-01-15 | 2015-10-20 | Applied Nanostructured Solutions, Llc | CNT-infused fiber as a self shielding wire for enhanced power transmission line |
US10138128B2 (en) | 2009-03-03 | 2018-11-27 | Applied Nanostructured Solutions, Llc | System and method for surface treatment and barrier coating of fibers for in situ CNT growth |
US10809481B2 (en) * | 2018-10-15 | 2020-10-20 | Futong Group (Jiashan) Communication Technology Co., Ltd. | Method for continuously producing optical fiber cable and system thereof |
US11414344B2 (en) | 2019-07-23 | 2022-08-16 | Corning Incorporated | Apparatus and methods for accurate high-speed marking of optical fibers |
US11661375B2 (en) | 2020-05-20 | 2023-05-30 | Lawrence Livermore National Security, Llc | Applying protective coatings to optical fibers |
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US1710747A (en) * | 1925-12-07 | 1929-04-30 | American Mach & Foundry | Method of and apparatus for coating metal |
US3326177A (en) * | 1963-09-12 | 1967-06-20 | Pennsalt Chemicals Corp | Metal vapor coating apparatus |
US3366090A (en) * | 1966-04-07 | 1968-01-30 | Air Force Usa | Glow discharge vapor deposition apparatus |
US3367304A (en) * | 1967-03-13 | 1968-02-06 | Dow Corning | Deposition chamber for manufacture of refractory coated filaments |
US3669065A (en) * | 1971-03-15 | 1972-06-13 | United Aircraft Corp | Reactor seal |
US3728246A (en) * | 1970-01-22 | 1973-04-17 | E Barkhudarov | Device for applying thin films to articles |
US3904505A (en) * | 1970-03-20 | 1975-09-09 | Space Sciences Inc | Apparatus for film deposition |
US3931589A (en) * | 1974-03-21 | 1976-01-06 | The United States Of America As Represented By The Secretary Of The Navy | Perforated wall hollow-cathode ion laser |
US3961103A (en) * | 1972-07-12 | 1976-06-01 | Space Sciences, Inc. | Film deposition |
US4392451A (en) * | 1980-12-31 | 1983-07-12 | The Boeing Company | Apparatus for forming thin-film heterojunction solar cells employing materials selected from the class of I-III-VI2 chalcopyrite compounds |
US4444812A (en) * | 1980-07-28 | 1984-04-24 | Monsanto Company | Combination gas curtains for continuous chemical vapor deposition production of silicon bodies |
-
1984
- 1984-09-10 US US06/649,157 patent/US4530750A/en not_active Expired - Fee Related
Patent Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1710747A (en) * | 1925-12-07 | 1929-04-30 | American Mach & Foundry | Method of and apparatus for coating metal |
US3326177A (en) * | 1963-09-12 | 1967-06-20 | Pennsalt Chemicals Corp | Metal vapor coating apparatus |
US3366090A (en) * | 1966-04-07 | 1968-01-30 | Air Force Usa | Glow discharge vapor deposition apparatus |
US3367304A (en) * | 1967-03-13 | 1968-02-06 | Dow Corning | Deposition chamber for manufacture of refractory coated filaments |
US3728246A (en) * | 1970-01-22 | 1973-04-17 | E Barkhudarov | Device for applying thin films to articles |
US3904505A (en) * | 1970-03-20 | 1975-09-09 | Space Sciences Inc | Apparatus for film deposition |
US3669065A (en) * | 1971-03-15 | 1972-06-13 | United Aircraft Corp | Reactor seal |
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