US4714481A - Gas separation membrane - Google Patents
Gas separation membrane Download PDFInfo
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- US4714481A US4714481A US06/530,598 US53059883A US4714481A US 4714481 A US4714481 A US 4714481A US 53059883 A US53059883 A US 53059883A US 4714481 A US4714481 A US 4714481A
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- United States
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- membrane
- polymer
- gas separation
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- 239000012528 membrane Substances 0.000 title claims abstract description 72
- 238000000926 separation method Methods 0.000 title claims abstract description 25
- 239000007789 gas Substances 0.000 claims abstract description 49
- 229920000642 polymer Polymers 0.000 claims abstract description 36
- 239000000463 material Substances 0.000 claims abstract description 20
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims abstract description 3
- 125000003118 aryl group Chemical group 0.000 claims abstract description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims abstract description 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims abstract description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- -1 polypropylene Polymers 0.000 claims description 8
- 239000004793 Polystyrene Substances 0.000 claims description 6
- 229920002223 polystyrene Polymers 0.000 claims description 6
- 239000004417 polycarbonate Substances 0.000 claims description 4
- 229920000515 polycarbonate Polymers 0.000 claims description 4
- 229920005573 silicon-containing polymer Polymers 0.000 claims description 3
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 claims description 2
- 239000004952 Polyamide Substances 0.000 claims description 2
- 239000004695 Polyether sulfone Substances 0.000 claims description 2
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 2
- 239000004743 Polypropylene Substances 0.000 claims description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 claims description 2
- 229920002301 cellulose acetate Polymers 0.000 claims description 2
- 229920006217 cellulose acetate butyrate Polymers 0.000 claims description 2
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 2
- 229920002492 poly(sulfone) Polymers 0.000 claims description 2
- 229920002239 polyacrylonitrile Polymers 0.000 claims description 2
- 229920002647 polyamide Polymers 0.000 claims description 2
- 229920006393 polyether sulfone Polymers 0.000 claims description 2
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 2
- 229920006380 polyphenylene oxide Polymers 0.000 claims description 2
- 229920001155 polypropylene Polymers 0.000 claims description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 claims description 2
- 239000004800 polyvinyl chloride Substances 0.000 claims description 2
- 229920000915 polyvinyl chloride Polymers 0.000 claims description 2
- 101100434170 Oryza sativa subsp. japonica ACR2.1 gene Proteins 0.000 claims 1
- 101100434171 Oryza sativa subsp. japonica ACR2.2 gene Proteins 0.000 claims 1
- 239000004810 polytetrafluoroethylene Substances 0.000 claims 1
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 abstract 1
- 101150035983 str1 gene Proteins 0.000 abstract 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 42
- 239000000047 product Substances 0.000 description 26
- 238000006243 chemical reaction Methods 0.000 description 21
- 238000000034 method Methods 0.000 description 20
- 239000003054 catalyst Substances 0.000 description 19
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- 239000010408 film Substances 0.000 description 15
- 239000001257 hydrogen Substances 0.000 description 13
- 229910052739 hydrogen Inorganic materials 0.000 description 13
- 238000005259 measurement Methods 0.000 description 13
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 12
- 239000000178 monomer Substances 0.000 description 12
- CWMFRHBXRUITQE-UHFFFAOYSA-N trimethylsilylacetylene Chemical compound C[Si](C)(C)C#C CWMFRHBXRUITQE-UHFFFAOYSA-N 0.000 description 12
- 239000002904 solvent Substances 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 10
- 229920001577 copolymer Polymers 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 9
- 238000000576 coating method Methods 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- ZDWYFWIBTZJGOR-UHFFFAOYSA-N bis(trimethylsilyl)acetylene Chemical group C[Si](C)(C)C#C[Si](C)(C)C ZDWYFWIBTZJGOR-UHFFFAOYSA-N 0.000 description 8
- 238000005984 hydrogenation reaction Methods 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 238000005227 gel permeation chromatography Methods 0.000 description 6
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 229920001558 organosilicon polymer Polymers 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- CRHIAMBJMSSNNM-UHFFFAOYSA-N tetraphenylstannane Chemical compound C1=CC=CC=C1[Sn](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 CRHIAMBJMSSNNM-UHFFFAOYSA-N 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 238000001914 filtration Methods 0.000 description 5
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- 230000000379 polymerizing effect Effects 0.000 description 5
- 239000011148 porous material Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 238000000862 absorption spectrum Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 238000011282 treatment Methods 0.000 description 4
- KPGXUAIFQMJJFB-UHFFFAOYSA-H tungsten hexachloride Chemical compound Cl[W](Cl)(Cl)(Cl)(Cl)Cl KPGXUAIFQMJJFB-UHFFFAOYSA-H 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 150000000475 acetylene derivatives Chemical class 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- 239000001307 helium Substances 0.000 description 3
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- GICWIDZXWJGTCI-UHFFFAOYSA-I molybdenum pentachloride Chemical compound Cl[Mo](Cl)(Cl)(Cl)Cl GICWIDZXWJGTCI-UHFFFAOYSA-I 0.000 description 3
- QCQALVMFTWRCFI-UHFFFAOYSA-N oct-2-yne Chemical compound CCCCCC#CC QCQALVMFTWRCFI-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- NEOUVVKUUZPUIU-UHFFFAOYSA-N tributyl(2-tributylsilylethynyl)silane Chemical group CCCC[Si](CCCC)(CCCC)C#C[Si](CCCC)(CCCC)CCCC NEOUVVKUUZPUIU-UHFFFAOYSA-N 0.000 description 2
- VWEYKBZUWKRXGW-UHFFFAOYSA-N tripropyl(2-tripropylsilylethynyl)silane Chemical group CCC[Si](CCC)(CCC)C#C[Si](CCC)(CCC)CCC VWEYKBZUWKRXGW-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- PDXZQCQMRQVQIT-UHFFFAOYSA-N 2-[dimethyl(phenyl)silyl]ethynyl-dimethyl-phenylsilane Chemical group C=1C=CC=CC=1[Si](C)(C)C#C[Si](C)(C)C1=CC=CC=C1 PDXZQCQMRQVQIT-UHFFFAOYSA-N 0.000 description 1
- MBNGQKZLHWDQTR-UHFFFAOYSA-N 2-cyclohexylethynyl(diphenyl)silane Chemical compound C1(=CC=CC=C1)[SiH](C#CC1CCCCC1)C1=CC=CC=C1 MBNGQKZLHWDQTR-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- RYOLZISWYRDWNP-UHFFFAOYSA-N 4-ethylhex-3-en-1-ynylsilane Chemical compound C(C)C(=CC#C[SiH3])CC RYOLZISWYRDWNP-UHFFFAOYSA-N 0.000 description 1
- BWLMNGKJHDNMNA-UHFFFAOYSA-N 4-methylpent-3-en-1-ynylsilane Chemical compound CC(=CC#C[SiH3])C BWLMNGKJHDNMNA-UHFFFAOYSA-N 0.000 description 1
- 101100177155 Arabidopsis thaliana HAC1 gene Proteins 0.000 description 1
- YENANJKSRAXBCN-UHFFFAOYSA-N C(CC)[SiH](C#CC1=CC=CC=C1)CCC Chemical compound C(CC)[SiH](C#CC1=CC=CC=C1)CCC YENANJKSRAXBCN-UHFFFAOYSA-N 0.000 description 1
- QPIIISXNUDSNMI-UHFFFAOYSA-N C1(=CC=CC=C1)C(C1=CC=CC=C1)[SiH2]C#C[SiH2]C(C1=CC=CC=C1)C1=CC=CC=C1 Chemical group C1(=CC=CC=C1)C(C1=CC=CC=C1)[SiH2]C#C[SiH2]C(C1=CC=CC=C1)C1=CC=CC=C1 QPIIISXNUDSNMI-UHFFFAOYSA-N 0.000 description 1
- OFRPAFUEEVOCTH-UHFFFAOYSA-N C1(=CC=CC=C1)C(C[SiH2]C#C)C1=CC=CC=C1 Chemical compound C1(=CC=CC=C1)C(C[SiH2]C#C)C1=CC=CC=C1 OFRPAFUEEVOCTH-UHFFFAOYSA-N 0.000 description 1
- FCVUCQLSRIJMRC-UHFFFAOYSA-N C[SiH](C)C#CC1CCCCC1 Chemical compound C[SiH](C)C#CC1CCCCC1 FCVUCQLSRIJMRC-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 239000007868 Raney catalyst Substances 0.000 description 1
- 229910000564 Raney nickel Inorganic materials 0.000 description 1
- 101150108015 STR6 gene Proteins 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- YDVIAGHLFGYXMG-UHFFFAOYSA-N benzhydryl(ethynyl)silane Chemical compound C1(=CC=CC=C1)C(C1=CC=CC=C1)[SiH2]C#C YDVIAGHLFGYXMG-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- ATXVIVOBXRRWKJ-UHFFFAOYSA-N diethyl(2-phenylethynyl)silane Chemical compound C(C)[SiH](C#CC1=CC=CC=C1)CC ATXVIVOBXRRWKJ-UHFFFAOYSA-N 0.000 description 1
- PBKHQEABNSFCFU-UHFFFAOYSA-N diethyl-ethynyl-methylsilane Chemical compound CC[Si](C)(CC)C#C PBKHQEABNSFCFU-UHFFFAOYSA-N 0.000 description 1
- JPQVPTPDZWZPQT-UHFFFAOYSA-N dimethyl(2-phenylethynyl)silane Chemical compound C[SiH](C)C#CC1=CC=CC=C1 JPQVPTPDZWZPQT-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- TZULMRNWCQKXCX-UHFFFAOYSA-N ethyl-ethynyl-dimethylsilane Chemical compound CC[Si](C)(C)C#C TZULMRNWCQKXCX-UHFFFAOYSA-N 0.000 description 1
- IFVKNYGVNRPUQS-UHFFFAOYSA-N ethyl-ethynyl-methyl-propylsilane Chemical compound CCC[Si](C)(CC)C#C IFVKNYGVNRPUQS-UHFFFAOYSA-N 0.000 description 1
- YKFJDIAMEYBGAL-UHFFFAOYSA-N ethynyl(trihexyl)silane Chemical compound CCCCCC[Si](CCCCCC)(CCCCCC)C#C YKFJDIAMEYBGAL-UHFFFAOYSA-N 0.000 description 1
- LFMOVGIUNFJMRV-UHFFFAOYSA-N ethynyl(tripropyl)silane Chemical compound CCC[Si](CCC)(CCC)C#C LFMOVGIUNFJMRV-UHFFFAOYSA-N 0.000 description 1
- IAZXENWLLQZKPO-UHFFFAOYSA-N ethynyl-dimethyl-propylsilane Chemical compound CCC[Si](C)(C)C#C IAZXENWLLQZKPO-UHFFFAOYSA-N 0.000 description 1
- LGCSBSWBVNYSGO-UHFFFAOYSA-N ethynyl-diphenyl-propylsilane Chemical compound C=1C=CC=CC=1[Si](C#C)(CCC)C1=CC=CC=C1 LGCSBSWBVNYSGO-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000003345 natural gas Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920001308 poly(aminoacid) Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- ZEZSXIPJXDYNDO-UHFFFAOYSA-N tribenzyl(2-tribenzylsilylethynyl)silane Chemical group C=1C=CC=CC=1C[Si](C#C[Si](CC=1C=CC=CC=1)(CC=1C=CC=CC=1)CC=1C=CC=CC=1)(CC=1C=CC=CC=1)CC1=CC=CC=C1 ZEZSXIPJXDYNDO-UHFFFAOYSA-N 0.000 description 1
- GBKBPLCEWHILJP-UHFFFAOYSA-N tributyl(ethynyl)silane Chemical compound CCCC[Si](CCCC)(CCCC)C#C GBKBPLCEWHILJP-UHFFFAOYSA-N 0.000 description 1
- MSIBCJGJFJICFD-UHFFFAOYSA-N tricyclohexyl(2-tricyclohexylsilylethynyl)silane Chemical group C1CCCCC1[Si](C1CCCCC1)(C1CCCCC1)C#C[Si](C1CCCCC1)(C1CCCCC1)C1CCCCC1 MSIBCJGJFJICFD-UHFFFAOYSA-N 0.000 description 1
- GQSZUQQPXIVHHU-UHFFFAOYSA-N triethyl(2-triethylsilylethynyl)silane Chemical group CC[Si](CC)(CC)C#C[Si](CC)(CC)CC GQSZUQQPXIVHHU-UHFFFAOYSA-N 0.000 description 1
- FWSPXZXVNVQHIF-UHFFFAOYSA-N triethyl(ethynyl)silane Chemical compound CC[Si](CC)(CC)C#C FWSPXZXVNVQHIF-UHFFFAOYSA-N 0.000 description 1
- LMFGRWGBGANJPI-UHFFFAOYSA-N triphenyl(2-triphenylsilylethynyl)silane Chemical group C1=CC=CC=C1[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C#C[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 LMFGRWGBGANJPI-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/06—Organic material
- B01D71/44—Polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, not provided for in a single one of groups B01D71/26-B01D71/42
Definitions
- This invention concerns a gas separation membrane using an organic silicon polymer as the material for the membrane.
- a high separation factor and a high permeation rate to gases are required for a gas separation membrane.
- a structure may be considered in which a membrane layer substantially contributing to the separating function is provided at a thickness as thin as possible and supported on a porous layer.
- a method of overlaying thin films on a porous layer which are prepared separately to each other a method of forming an anisotropic membrane at once in which a surface layer and a porous layer are present together and a method of forming a thin film by carrying out in situ polymerization, on a porous layer, from a monomer by way of various processes or a method of forming a thin film by coating a solution of polymer and then evaporating a solvent.
- Silicon-containing polymers are generally known as the material having the highest gas permeability coefficient (value represented by the volume of a gas in cm 3 which permeates through a film of 1 cm thickness, at the film area 1 cm 2 for one second with the pressure difference of 1 cmHg), and polysiloxane, block copolymers of polysiloxane with polycarbonate, styrene, phenolic resin or the like, and polyvinyltrimethylsilane have, for example, been employed as the material for the gas separation membrane.
- gas permeability coefficient value represented by the volume of a gas in cm 3 which permeates through a film of 1 cm thickness, at the film area 1 cm 2 for one second with the pressure difference of 1 cmHg
- polysiloxane is the material having the highest permeability coefficient
- its possible thickness when formed into a thin film is restricted due to the low strength thereof.
- Materials improved with the defect in a strength include, for example, polysiloxane-polycarbonate copolymer, polysiloxane-styrene copolymer and polysiloxane-phenolic resin copolymer and they are formed into a thin film and overlayed with a porous film prepared separately for use.
- polyvinyltrimethylsilane can be formed into an anisotropic membrane of a thin film thickness and a dense structure and used, as the gas separation membrane.
- the membrane material of a polymer having the main repeating unit of the formula ##STR3## and/or formula ##STR4## is a polymer having carbon-carbon bonds in the main chain and silicon atoms on the side chain of the polymer in the same manner as in polyvinyltrimethylsilane having the repeating unit of the formula ##STR5## and the similar separating function has been anticipated. As the result of the study, we have however found that a characteristically excellent separating function can be obtained as compared with polyvinyltrimethylsilane and have accomplished the present invention.
- the gist of the present invention concerns a gas separation membrane using, as the membrane material, a polymer having the main repeating unit of the formula ##STR6## and/or the formula ##STR7## (wherein R represents alkyl group, vinyl group, allyl group, cycloalkyl group, aryl group, benzyl group or hydrogen atom, each R being possibly identical or different to each other) and having a number average molecular weight of between 1,000-1,000,000 and preferably 2,000-100,000, or a partially or wholly hydrogenated product of the polymer with respect to the unsaturated bonds therein.
- the polymer mainly comprising the repeating unit of the formula ##STR8## and/or the formula ##STR9## can be obtained by polymerizing a triorganoethynylsilane of the formula ##STR10## and/or a bistriorganosilylacetylene of the formula ##STR11## as the main starting material.
- the polymer and hydrogenated product thereof excepting polytriorganosilane are novel silicone polymers and we have found that they are best suited as the material for the gas separation membrane having excellent gas permeating function and excellent separating function between gases and have attained the present invention.
- FIGS. 1 and 2 are infrared absorption spectrum charts for one example of the polymer used as the membrane material in the present invention.
- the polymer used as the material for the gas separation membrane according to the present invention can be produced by polymerizing or copolymerizing a triorganoethynylsilane having the formula ##STR12## and/or a bistriorganosilylacetylene of the formula ##STR13## (wherein R has the same meanings as R in the previous formula).
- Examples of monomers represented by the formula ##STR14## include, for example, trimethylethynylsilane, triethylethynylsilane, tri-n-propylethynylsilane, tri-i-propylethynylsilane, tri-n-butylethynylsilane, tri-i-butylethynylsilane, dimethylethylethynylsilane, methyldiethylethynylsilane, dimethyl-n-propylethynylsilane, methylethyl-n-propylethynylsilane, tri-n-hexylethynylsilane, dimethylvinylethynylsilane, dimethylallylethynylsilane, diethylvinylethynylsilane, diethylallylethynylsilane, methyldial
- examples of monomers represented by the formula ##STR15## include, for example, bis(trimethylsilyl)acetylene, bis(triethylsilyl)acetylene, bis(tri-n-propylsilyl)acetylene, bis(tri-n-butylsilyl)acetylene, bis(tri-i-propylsilyl)acetylene, bis(tri-i-butylsilyl)acetylene, bis(triphenylsilyl)acetylene, bis(tricyclohexylsilyl)acetylene, bis(tribenzylsilyl)acetylene, bis(dimethylphenylsilyl)acetylene and bis(diphenylmethylsilyl) acetylene.
- R in the above mentioned formula is an alkyl group or a phenyl group are particularly preferred.
- Polymerization for these monomers, triorganoethynylsilane and bistriorganosilylacetylene are carried out according to the polymerizing process for various acetylene derivatives as described in Japanese Patent Publication Nos. 37312/1976, 20511/1977, 30722/1980, 43037/1979 and 23565/1980.
- tungsten hexachloride or molybdenum pentachloride is used as a main catalyst and a tin compound such as tetraphenyltin, alcohols, ketones and ethers are used together as a second ingredient.
- the ratio of the main catalyst and the second ingredient is preferably between 0.01-10 in the molar ratio of the second ingredient/main catalyst.
- the ratio of the monomer to the main catalyst is in a range of less than 1,000.
- the solvent usable in the reaction includes aromatic hydrocarbon such as benzene and toluene and halogenated hydrocarbon such as ethylenedichloride and carbon tetrachloride.
- the reaction temperature for the polymerization is preferably between -10°-50° C.
- the reaction time although different depending on the reaction conditions, is usually selected between 0.1-100 hours. After the completion of the polymerizing reaction, the reaction product can be collected, for example, by pouring it into methanol and depositing the resultant polymer.
- the polymerizing process has been examplified as above, it is not restricted to these processes. Copolymerization with other acetylene derivatives not containing silicon is also possible.
- hydrogenated product of the polymer obtained through the polymerization or copolymerization can also be used as the material for the gas separation membrane according to this invention.
- a portion or substantially the whole portion that is, a ratio of from 0 to 100%, preferably, from 0 to 80% of the unsaturated bonds present in the polymer can be reacted and all of these hydrogenated products can be used as the material for the gas separation membrane according to this invention.
- nickel catalyst for instance, Raney nickel
- cobalt platinum, palladium, ruthenium, rhodium catalyst, a mixture thereof or an alloy catalyst
- These catalyst can be used solely, as solid or uniform soluble complex, or in the form supported on carbon, silica, alumina or diatomaceous earth.
- hydrogenation may also be conducted by using a metal complex obtained by reducing a compound containing nickel, titanium, cobalt or the like with an organic metal compound (for example, trialkylaluminum and alkyllithium).
- Hydrogen usable herein is usually molecular hydrogen but hydrogen-containing gases can also be used so long as they do not contain substances acting as a catalyst poison.
- the hydrogen pressure may be that of an ambient pressure flow or of a pressurized system.
- the temperature is from room temperature to 200° C. and, preferably, of less than 180° C.
- the organic silicon polymer obtained in this way is then formed into a film, in which film forming method has no particular restriction.
- Preferred film forming methods include a method of applying a coating on a porous film prepared separately, and a method of forming an anisotropic film comprising a dense surface layer and a porous layer.
- the organic silicon polymer is dissolved in an organic solvent, a porous membrane composed of a different material formed separately into a film is immersed in the solution and, thereafter, the organic solvent is dried.
- the organic solvent used for dissolving the polymer into a film-forming solution has no particular restriction so long as it is a solvent capable of dissolving the polymer, having a low boiling point thus being removed with relatively ease and not dissolving the porous membrane as the support.
- benzene, toluene, pentane, hexane, heptane and tetrahydrofuran can be mentioned while depending on the kind of material for the porous membrane.
- the porous membrane for use in the present invention involves such a membrane as having a sponge-like structure and including pores opened to both surfaces thereof, or such a membrane having a dense layer on one surface of the membrane and opened pores at the other surface, or a membrane having ultrafine micro-pores in the molecular point of view, with the permeation rate for the nitrogen gas of more than 1 ⁇ 10 -4 cm 3 /cm 2 .sec.cmHg in the permeation volume per unit membrane area (1 cm 2 ) for unit time (1 sec) with unit pressure difference (1 cmHg).
- Such a membrane can be prepared by various methods for example, by adding an organic solvent or an additive to the material for the porous membrane to form a film and, thereafter, leaching out the organic solvent or the additive.
- the kind of the materials for the porous membrane has no particular restriction and it includes, for example, polypropylene, polyvinyl chloride, polystyrene, polyvinyl alcohol, polymethyl methacrylate, polyacrylonitrile, polycarbonate, polyphenyleneoxide, polyamide, polysulfone, polyethersulfone, polysulfoneamide, polypiperazine, cellulose acetate, cellulose acetate butyrate, polytetrafluoroethylene (Teflon), vinylidene fluoride, polyvinyltrimethylsilane and those polymers containing polyaminoacid structure.
- polypropylene polypropylene
- polyvinyl chloride polystyrene
- polyvinyl alcohol polymethyl methacrylate
- polyacrylonitrile polycarbonate
- polyphenyleneoxide polyamide
- polysulfone polyethersulfone
- polysulfoneamide polypiperazine
- cellulose acetate cellulose acetate but
- inorganic materials such as glass can also be used.
- the concentration of the solution in the case of dissolving the organic silicon polymer into the organic solvent for covering on the porous membrane is between 0.1-50% by weight and, preferably, between 1-10% by weight, while different depending on the molecular weight of the polymer, molecular weight distribution and the kind of the solvent.
- the concentration is lower than 0.1% by weight, the thickness of the coating film becomes thinner as well, whereby no sufficient separating function can be obtained although the gas permeation rate is higher.
- the concentration is higher than 50% by weight, the thickness of the coating membrane is increased to decrease the gas permeation rate although the separating performance can be achieved.
- the coating amount of the polymer is usually selected within such a range as providing 0.01-10 mg per 1 cm 2 area of the porous membrane.
- the thickness of the porous membrane is preferably, between 10 ⁇ -100 ⁇ although it is not particularly restricted.
- the method of coating the organic silicon polymer on the porous membrane has no particular restriction and it can be carried out by the method of immersing the porous membrane into the polymer solution or by a method of casting the polymer solution on the surface of the porous membrane.
- the membrane can be used in any of the configurations such as fiberous form, tubular form, spiral form and plateous form (the configuration of the porous membrane may be selected in the case of applying the coating on the porous membrane),
- the coating layer is further laminated by way of plasma polymerization, etc on the surface of the membrane according to the present invention.
- the permeation velocity can be improved by mixing or bonding a polymer having polysiloxane couplings to the organic silicon polymer as the material for the membrane.
- GPC gel permeation chromatography
- the GPC measurement was carried out under the conditions: at 5000H, 4000H, 3000H, 2000H of an RI-8 type detector column TSK-G, manufactured by Toyo Soda, using tetrahydrofuran as the solvent, flowing rate of 1 ml/min, at 45° C., and with a monodispersed polystyrene manufactured from Pressure Chemical (USA), and all of the values were converted as polystyrene.
- the number average molecular weight and the weight average molecular weight converted as polystyrene were 5,000 and 21,600 respectively, with Mw/Mn being 4.33.
- the product is a polymer having repeating unit of the formula ##STR18##
- Example 2 The same reaction and after-treatments as in Example 1 were carried out excepting the use of molybdenum pentachloride and tetraphenyltin as the catalyst to obtain 1.2 g of product.
- the number average molecular weight (Mn) and the weight average molecular weight (Mw) converted as styrene were 3,700 and 6,200 respectively, with Mw/Mn being 1.7.
- Example 2 The same reaction and after-treatments as in Example 1 were carried out excepting the use of 2 mmol of tungsten hexachloride and tetraphenyltin as the catalyst, 50 ml of toluene as the solvent, 5.0 g of trimethylethynylsilane and 5.0 g of bis(trimethylsilyl)acetylene as the monomer to obtain 1.81 g of solid polymer.
- Example 5 The same reaction and after-treatments as in Example 5 were carried out excepting the use of 7.5 g of trimethylethynylsilane and 2.5 g of bis(trimethylsilyl) acetylene as the monomer to obtain 3.84 g of solid polymer.
- Example 2 To a 200 ml of autoclave, were charged 1.6 g of polytrimethylethynylsilane obtained in Example 1, 0.8 g of ruthenium catalyst supported on carbon, 66.2 g of normal heptane and 3.8 g of isopropanol, and they were reacted at 150° C. and under a hydrogen pressure of 35 kg/cm 2 G for one hour. After the reaction was over, the catalyst was eliminated by filtration and the solvent was removed from the filtrate through evaporation to obtain a hydrogenation product. In the infrared absorption spectrum for the product, decrease in the absorption for the double-bond was observed near 1,570 cm -1 (refer to FIG. 1.
- Example 8 The same reaction as in Example 8 was carried out excepting the use of toluene instead of normal hexane as the solvent to obtain a product with 40% hydrogenating rate calculated due to the decrease in the absorption of double bond near 1,570 cm -1 in the infrared spectrum.
- Example 1 Polytrimethylethynylsilane obatained in Example 1 was dissolved into toluene to prepare a 5% by weight solution.
- VSWP average pore size of 0.025 ⁇
- the membrane was installed in a permeation test device for measuring the permeation rate for various type of gases.
- the surface area of the membrane was 12.56 cm 2 , each of high purity gases was taken out from a gas bomb and brought to contact with the high pressure side of the membrane under a control pressure of 2 atm., the permeated gas was collected on the opposite side of the membrane under the atmospheric pressure and a permeation amount was measured in a gas burette with elapse of time.
- the temperature of the gas and the device was 23°-25° C.
- the permeation velocity for each type of the gases was represented by converting the volume (cc) of each gas permeating per unit area (1 cm 2 ), per unit pressure difference (1 cmHg) and per unit time (1 sec) into the normal state.
- the separating factor was represented by the ratio of the permeation rate between each type of gases.
- Membrane was prepared in the same manner as in Example 10 excepting by dissolving the copolymer of trimethylethynylsilane and bis(trimethylsilyl)acetylene obtained in Example 5 into about 2% toluene solution and the permeation rate was measured for each kind of gases. Further, separating factor was represented by the ratio thereof.
- Hydrogenated product of polytrimethylethynylsilane obtained in Example 7 was dissolved in toluene to prepare a 5% by weight of solution.
- VSWP average pore size of 0.025 ⁇
- the membrane was installed in a permeation test device and permeation rate for each kind of gases was measured in the same manner as in Example 10.
- the separating factor of polyvinyltrimethylsilane described in the Examples 3 and 4 of Japanese Patent Laid-Open No. 2093/1971 when calculated based on the permeation rate thereof is as below:
- Example 6 The same film formation and the measurement for the permeation velocity as in Example 6 were carried out excepting that immersion was conducted for one min in a 5% toluene solution of polytrimethylethynylsilane obtained in Example 4.
- Example 13 The same film formatiom was carryed out as in Example 13 excepting that 0.25 g of the hydrogenated product of polytrimethylethynylsilane obtained in Example 8 were dissolved in 5 g of toluene, and the permeation rate for various kind of gases was measured.
- the separating factor was represented by the ratio thereof.
- Example 4 The same reaction as in Example 4 was carried out excepting the use of 131 g of trimethylethynylsilane as the monomer and 17.4 g of 2-octyne as other acetylene compound to obtain 70 g of product.
- Membrane formation was carried out in the same manner as in Example 10 excepting that 0.16 g of the hydrogenation product of the copolymer of polytrimethylethynylsilane and 2-octyne obtained in Example 16 were dissolved in 5 g of toluene and the permeation rate for each kind of gases was measured.
- the separating factor was represented as the ratio thereof.
- the membrane according to the present invention can be employed for separating a gas mixture, particularly, containing at least one of the gases of oxygen, nitrogen, gaseous carbon dioxide, carbon monoxide, hydrogen, helium, methane and argon from each other.
- it can be applied to the separation between nitrogen and oxygen in the production of oxygen-enriched air, separation between methane and helium in the recovery of helium from natural gases, separation between argon and hydrogen, methane and hydrogen and nitrogen and hydrogen in the recovery of hydrogen from hydrogenating reaction exhaust gases, separation between carbon monooxide and hydrogen in the recovery of hydrogen from cracking gases, separation between carbon dioxide and nitrogen in the recover of carbon dioxide from combustion gases.
Abstract
Description
______________________________________ Permeation rate N.sub.2 2.64 × 10.sup.-7 CC(STP)/cm.sup.2 · sec · cmHg O.sub.2 1.06 × 10.sup.-6 CC(STP)/cm.sup.2 · sec · cmHg CO.sub.2 2.80 × 10.sup.-6 CC(STP)/cm.sup.2 · sec · cmHg H.sub.2 9.24 × 10.sup.-6 CC(STP)/cm.sup.2 · sec · cmHg Separating factor (ratio between the permeation rate) O.sub.2 /N.sub.2 4.0 CO.sub.2 /N.sub.2 10.6 H.sub.2 /N.sub.2 35.0 CO.sub.2 /O.sub.2 2.6 H.sub.2 /O.sub.2 8.7 H.sub.2 /CO.sub.2 3.3 ______________________________________
______________________________________ Permeation rate N.sub.2 7.6 × 10.sup.-7 CC(STP)/cm.sup.2 · sec · cmHg O.sub.2 2.7 × 10.sup.-6 CC(STP)/cm.sup.2 · sec · cmHg CO.sub.2 1.0 × 10.sup.-5 CC(STP)/cm.sup.2 · sec · cmHg H.sub.2 1.7 × 10.sup.-5 CC(STP)/cm.sup.2 · sec · cmHg separating factor (ratio between the permeation rate) O.sub.2 /N.sub.2 3.6 CO.sub.2 /N.sub.2 13.2 H.sub.2 /N.sub.2 22.4 CO.sub.2 /O.sub.2 3.7 H.sub.2 /O.sub.2 6.3 H.sub.2 /CO.sub.2 1.7 ______________________________________
______________________________________ Permeation rate N.sub.2 6.49 × 10.sup.-7 CC(STP)/cm.sup.2 · sec · cmHg O.sub.2 2.72 × 10.sup.-6 CC(STP)/cm.sup.2 · sec · cmHg CO.sub.2 1.21 × 10.sup.-5 CC(STP)/cm.sup.2 · sec · cmHg H.sub.2 1.93 × 10.sup.-5 CC(STP)/cm.sup.2 · sec · cmHg Separating factor (ratio between the permeation rate) O.sub.2 /N.sub.2 4.2 CO.sub.2 /N.sub.2 18.6 H.sub.2 /N.sub.2 29.7 CO.sub.2 /O.sub.2 4.4 H.sub.2 /O.sub.2 7.1 H.sub.2 /CO.sub.2 1.6 ______________________________________
______________________________________ Separating factor (ratio between the permeation rate) ______________________________________ O.sub.2 /N.sub.2 3.8 CO.sub.2 /N.sub.2 6.7 H.sub.2 /N.sub.2 19.1 CO.sub.2 /O.sub.2 2.1 H.sub.2 /O.sub.2 5.0 ______________________________________
______________________________________ Permeation rate N.sub.2 1.01 × 10.sup.-6 CC(STP)/cm.sup.2 · sec · cmHg O.sub.2 4.02 × 10.sup.-6 CC(STP)/cm.sup.2 · sec · cmHg CO.sub.2 1.21 × 10.sup.-5 CC(STP)/cm.sup.2 · sec · cmHg H.sub.2 2.42 × 10.sup.-5 CC(STP)/cm.sup.2 · sec · cmHg Separating factor (ratio between the permeation rate) O.sub.2 /N.sub.2 4.0 CO.sub.2 /N.sub.2 12.0 H.sub.2 /N.sub.2 24.0 CO.sub.2 /O.sub.2 3.0 H.sub.2 /O.sub.2 6.0 H.sub.2 /CO.sub.2 2.0 ______________________________________
______________________________________ Permeation rate N.sub.2 4.7 × 10.sup.-7 CC(STP)/cm.sup.2 · sec · cmHg O.sub.2 2.1 × 10.sup.-6 CC(STP)/cm.sup.2 · sec · cmHg CO.sub.2 6.9 × 10.sup.-6 CC(STP)/cm.sup.2 · sec · cmHg H.sub.2 1.2 × 10.sup.-5 CC(STP)/cm.sup.2 · sec · cmHg Separating factor (ratio between the permeation rate) O.sub.2 /N.sub.2 4.4 CO.sub.2 /N.sub.2 14.7 H.sub.2 /N.sub.2 25.5 CO.sub.2 /O.sub.2 3.3 H.sub.2 /O.sub.2 5.7 H.sub.2 /CO.sub.2 1.7 ______________________________________
______________________________________ Permeation rate N.sub.2 2.5 × 10.sup.-6 CC(STP)/cm.sup.2 · sec · cmHg O.sub.2 1.0 × 10.sup.-5 CC(STP)/cm.sup.2 · sec · cmHg CO.sub.2 3.6 × 10.sup.-5 CC(STP)/cm.sup.2 · sec · cmHg H.sub.2 6.6 × 10.sup.-5 CC(STP)/cm.sup.2 · sec · cmHg Separating factor (ratio between the permeation rate) O.sub.2 /N.sub.2 4.0 CO.sub.2 /N.sub.2 14.4 H.sub.2 /N.sub.2 26.4 CO.sub.2 /O.sub.2 3.6 H.sub.2 /O.sub.2 6.6 H.sub.2 /CO.sub.2 1.8 ______________________________________
Claims (6)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP56192373A JPS5895541A (en) | 1981-11-30 | 1981-11-30 | Gas separating membrane |
JP56-192373 | 1981-11-30 |
Publications (1)
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US4714481A true US4714481A (en) | 1987-12-22 |
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US06/530,598 Expired - Fee Related US4714481A (en) | 1981-11-30 | 1982-11-30 | Gas separation membrane |
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JP (1) | JPS5895541A (en) |
WO (1) | WO1983001905A1 (en) |
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US6187077B1 (en) | 1998-04-17 | 2001-02-13 | American Air Liquide Inc. | Separation of CF4 and C2F6 from a perfluorocompound mixture |
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JPS6121718A (en) * | 1984-07-10 | 1986-01-30 | Agency Of Ind Science & Technol | Hydrogen permselective composite membrane and preparation thereof |
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US4866147A (en) * | 1985-07-30 | 1989-09-12 | The United States Of America As Represented By The United States Department Of Energy | Soluble silylated polyacetylene derivatives and their use as percursors to novel polyacetylene-type polymers |
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US4239793A (en) * | 1977-10-14 | 1980-12-16 | Mitsubishi Chemical Industries Ltd. | Gas separation membrane |
US4410338A (en) * | 1979-06-25 | 1983-10-18 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Gas separating members and a method of making the same |
JPS565121A (en) * | 1979-06-27 | 1981-01-20 | Sumitomo Electric Ind Ltd | Heat resistant separating membrane for mixed gas |
JPS5624019A (en) * | 1979-08-01 | 1981-03-07 | Matsushita Electric Ind Co Ltd | Selective gas parmeable membrane |
US4393113A (en) * | 1980-06-05 | 1983-07-12 | Teitin Limited | Novel silicon-containing copolymer, ultrathin solid membrane composed of said copolymer, use of said solid membrane for concentrating a specified gas in a gaseous mixture, and process for producing said solid membrane |
JPS5719004A (en) * | 1980-07-03 | 1982-02-01 | Nitto Electric Ind Co Ltd | Composite type selective separation membrane module |
JPS57122906A (en) * | 1981-01-22 | 1982-07-31 | Toray Ind Inc | Selective permeable film |
JPS57122907A (en) * | 1981-01-26 | 1982-07-31 | Nitto Electric Ind Co Ltd | Gas separation membrane |
JPS57130505A (en) * | 1981-02-03 | 1982-08-13 | Toray Ind Inc | Selective permeable membrane |
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US5009824A (en) * | 1981-12-17 | 1991-04-23 | Hoechst Aktiengesellschaft | Process for preparing an asymmetrical macroporous membrane polymer |
US5176724A (en) * | 1987-11-10 | 1993-01-05 | Matsushita Electric Industrial Co., Ltd. | Permselective composite membrane having improved gas permeability and selectivity |
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US5085676A (en) * | 1990-12-04 | 1992-02-04 | E. I. Du Pont De Nemours And Company | Novel multicomponent fluid separation membranes |
US5318706A (en) * | 1991-03-06 | 1994-06-07 | Hashimoto Chemical Co., Ltd. | Method of supplying dilute hydrofluoric acid and apparatus for use in this method for supplying the acid |
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US5156656A (en) * | 1991-09-13 | 1992-10-20 | The Dow Chemical Company | Semi-permeable membranes derived from reactive oligomers |
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US5858065A (en) * | 1995-07-17 | 1999-01-12 | American Air Liquide | Process and system for separation and recovery of perfluorocompound gases |
US5785741A (en) * | 1995-07-17 | 1998-07-28 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges, Claude | Process and system for separation and recovery of perfluorocompound gases |
US6605133B1 (en) | 1995-07-17 | 2003-08-12 | L'air Liquide - Societe Anonyme A' Directoire Et Conseil De Surveillance Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process and system for separation and recovery of perfluorocompound gases |
US6224677B1 (en) | 1995-07-17 | 2001-05-01 | Teisan Kabushiki Kaisha | Gas recovery unit utilizing dual use of gas |
US5919285A (en) * | 1995-07-17 | 1999-07-06 | American Air Liquide, Inc. | Process and system for separation and recovery of perfluorocompound gases |
US6444011B2 (en) | 1995-07-17 | 2002-09-03 | American Air Liqide, Inc. | Process and system for separation and recovery of perfluorocompound gases |
US6312502B1 (en) * | 1995-07-17 | 2001-11-06 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process and system for separation and recovery of perfluorocompound gases |
US6254666B1 (en) | 1995-07-17 | 2001-07-03 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process and system for separation and recovery of perfluorocompound gases |
US6214089B1 (en) * | 1995-07-17 | 2001-04-10 | American Air Liquide, Inc. | Process and system for separation and recovery of perfluorocompound gases |
US5759237A (en) * | 1996-06-14 | 1998-06-02 | L'air Liquide Societe Anonyme Pour L'etude Et, L'exploitation Des Procedes Georges Claude | Process and system for selective abatement of reactive gases and recovery of perfluorocompound gases |
US5707423A (en) * | 1996-06-14 | 1998-01-13 | Membrane Technology And Research, Inc. | Substituted polyacetylene separation membrane |
US5814127A (en) * | 1996-12-23 | 1998-09-29 | American Air Liquide Inc. | Process for recovering CF4 and C2 F6 from a gas |
US5968334A (en) * | 1996-12-23 | 1999-10-19 | American Air Liquide Inc. | Process for recovering CF4 and C2 F6 from vent gases of an aluminum production cell |
US6096114A (en) * | 1997-05-15 | 2000-08-01 | American Air Liquide, Inc. | Process for recovering SF6 from a gas |
US5855647A (en) * | 1997-05-15 | 1999-01-05 | American Air Liquide, Inc. | Process for recovering SF6 from a gas |
US6187077B1 (en) | 1998-04-17 | 2001-02-13 | American Air Liquide Inc. | Separation of CF4 and C2F6 from a perfluorocompound mixture |
US20040194513A1 (en) * | 2003-04-04 | 2004-10-07 | Giacobbe Frederick W | Fiber coolant system including improved gas seals |
Also Published As
Publication number | Publication date |
---|---|
JPH0147210B2 (en) | 1989-10-12 |
WO1983001905A1 (en) | 1983-06-09 |
JPS5895541A (en) | 1983-06-07 |
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