US4756971A - Surface treatment agents and polymers comprising substituted phenyl silanes and siloxanes - Google Patents
Surface treatment agents and polymers comprising substituted phenyl silanes and siloxanes Download PDFInfo
- Publication number
- US4756971A US4756971A US06/907,687 US90768786A US4756971A US 4756971 A US4756971 A US 4756971A US 90768786 A US90768786 A US 90768786A US 4756971 A US4756971 A US 4756971A
- Authority
- US
- United States
- Prior art keywords
- group
- substituents
- phenyl
- substrate according
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/281—Sorbents specially adapted for preparative, analytical or investigative chromatography
- B01J20/286—Phases chemically bonded to a substrate, e.g. to silica or to polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
- B01J20/3202—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the carrier, support or substrate used for impregnation or coating
- B01J20/3204—Inorganic carriers, supports or substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
- B01J20/3214—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the method for obtaining this coating or impregnating
- B01J20/3217—Resulting in a chemical bond between the coating or impregnating layer and the carrier, support or substrate, e.g. a covalent bond
- B01J20/3219—Resulting in a chemical bond between the coating or impregnating layer and the carrier, support or substrate, e.g. a covalent bond involving a particular spacer or linking group, e.g. for attaching an active group
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
- B01J20/3231—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the coating or impregnating layer
- B01J20/3242—Layers with a functional group, e.g. an affinity material, a ligand, a reactant or a complexing group
- B01J20/3244—Non-macromolecular compounds
- B01J20/3246—Non-macromolecular compounds having a well defined chemical structure
- B01J20/3257—Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one of the heteroatoms nitrogen, oxygen or sulfur together with at least one silicon atom, these atoms not being part of the carrier as such
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
- B01J20/3231—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the coating or impregnating layer
- B01J20/3242—Layers with a functional group, e.g. an affinity material, a ligand, a reactant or a complexing group
- B01J20/3244—Non-macromolecular compounds
- B01J20/3246—Non-macromolecular compounds having a well defined chemical structure
- B01J20/3257—Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one of the heteroatoms nitrogen, oxygen or sulfur together with at least one silicon atom, these atoms not being part of the carrier as such
- B01J20/3259—Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one of the heteroatoms nitrogen, oxygen or sulfur together with at least one silicon atom, these atoms not being part of the carrier as such comprising at least two different types of heteroatoms selected from nitrogen, oxygen or sulfur with at least one silicon atom
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
- B01J20/3231—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the coating or impregnating layer
- B01J20/3242—Layers with a functional group, e.g. an affinity material, a ligand, a reactant or a complexing group
- B01J20/3244—Non-macromolecular compounds
- B01J20/3246—Non-macromolecular compounds having a well defined chemical structure
- B01J20/3257—Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one of the heteroatoms nitrogen, oxygen or sulfur together with at least one silicon atom, these atoms not being part of the carrier as such
- B01J20/3261—Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one of the heteroatoms nitrogen, oxygen or sulfur together with at least one silicon atom, these atoms not being part of the carrier as such comprising a cyclic structure not containing any of the heteroatoms nitrogen, oxygen or sulfur, e.g. aromatic structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
- B01J20/3231—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the coating or impregnating layer
- B01J20/3242—Layers with a functional group, e.g. an affinity material, a ligand, a reactant or a complexing group
- B01J20/3244—Non-macromolecular compounds
- B01J20/3246—Non-macromolecular compounds having a well defined chemical structure
- B01J20/3257—Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one of the heteroatoms nitrogen, oxygen or sulfur together with at least one silicon atom, these atoms not being part of the carrier as such
- B01J20/3263—Non-macromolecular compounds having a well defined chemical structure the functional group or the linking, spacer or anchoring group as a whole comprising at least one of the heteroatoms nitrogen, oxygen or sulfur together with at least one silicon atom, these atoms not being part of the carrier as such comprising a cyclic structure containing at least one of the heteroatoms nitrogen, oxygen or sulfur, e.g. an heterocyclic or heteroaromatic structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
- B01J20/30—Processes for preparing, regenerating, or reactivating
- B01J20/32—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating
- B01J20/3231—Impregnating or coating ; Solid sorbent compositions obtained from processes involving impregnating or coating characterised by the coating or impregnating layer
- B01J20/3242—Layers with a functional group, e.g. an affinity material, a ligand, a reactant or a complexing group
- B01J20/3268—Macromolecular compounds
- B01J20/3272—Polymers obtained by reactions otherwise than involving only carbon to carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/122—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-C linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
- Y10T428/2995—Silane, siloxane or silicone coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
- Y10T428/2998—Coated including synthetic resin or polymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31—Surface property or characteristic of web, sheet or block
- Y10T428/315—Surface modified glass [e.g., tempered, strengthened, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31609—Particulate metal or metal compound-containing
- Y10T428/31612—As silicone, silane or siloxane
Definitions
- This invention concerns an organosilicon compound for imparting lipophilic properties to a hydrophilic surface, such as that of glass, quartz, oxidized silicon, metal-metal oxide or of a plastic containing OH-and/or NH-groups.
- a hydrophilic surface such as that of glass, quartz, oxidized silicon, metal-metal oxide or of a plastic containing OH-and/or NH-groups.
- the physicochemical characteristics, especially the adsorption characteristics of such a surface may be selectively modified and/or improved.
- the compound according to the invention may be polymerized, optionally using known silicon compounds, to form a silicon polymer, which may be applied by adsorption to a surface which advantageously has been pretreated according to the invention.
- Important fields of use of the compounds of this invention are in chromatography, both gas and liquid chromatography, especially gas chromatography, and in electronics.
- the film is formed by building the desired molecule from smaller molecular moieties, starting from the substrate surface and proceeding therefrom in an outward direction by consecutively adding the required molecular moieties (Journal of American Chemical Society, vol. 102 (1980) no 12, p. 4029 to 4030).
- This object is achieved by selectively choosing such substituents on the phenyl group(s) in the silane, which are able to actively participate in intermolecular forces, such as in the formation of charge-transfer complexes.
- the organo-substituated silane according to the invention is represented by the general formula ##STR4## wherein Z 1 and Z 2 each is independently chlorine, fluorine, bromine, alkoxy with not more than 6 carbon atoms, NH, --NH 2 , --NR 2 ', wherein R' is alkyl with 1 to 3 carbon atoms, --SH, --CN, --N 3 or hydrogen, and R 1 is ##STR5## wherein each of the S-substituents, S 1 , S 2 , S 3 , S 4 and S 5 are independently selected from the group consisting of hydrogen, alkyl with 1 to 4 carbon atoms, methoxy, ethoxy, and cyano, provided that at least one of the S-substituents is other than hydrogen and when there is a methyl or methoxy S-substituent then (i) at least two of the S-substituents are other than hydrogen, (ii) two adjacent S-substituents form with the
- lower in connection with groups or compounds, means from 1 to 7 and, preferably from 1 to 4, carbon atoms.
- R 1 is one of the following groups ##STR7## which groups R 1 are attached directly to the silicon atom or to one of the following spacer groups X ##STR8## wherein i is 1 to 10 and k is 1 to 5.
- the compounds according to the invention are thus silanes containing at least one group Z, which can form a chemical bond with a hydrophilic group of the surface to be treated, and one or two selectively substituted phenyl groups.
- the adsorption characteristics of the surface thus treated may be modified and/or improved. More specifically the surface may be modified in a selective manner by using the specific substituents on the phenyl group as defined above. Surfaces are thus obtained which are well-suited to a variety of purposes, such as for chromatographic purposes, or which have specific electrical properties and are suitable for use in electronic applications, and/or which may be further treated, for example by adsorbing thereon a further layer, e.g., obtained by polymerizing the compounds (I).
- the mutual distances between the oxygen atoms are 2.8 ⁇ , 4.8 ⁇ , and 5.6 ⁇ .
- the one dimethoxy-phenyl isomer is chosen for surface treatment in which the distance between the dimethoxy groups is suitable, i.e., best corresponds to that between the hydrogen atoms, resulting in a strong interaction.
- dipole-dipole interactions may be enhanced by the use of methoxy and cyano groups. As the dipole moments of structural isomers vary considerably, the chromatographic separation of isomers can be facilitated.
- Charge-transfer donor characteristics are enhanced by the use of alkyl or alkoxy groups, especially methyl and methoxy groups.
- charge-transfer acceptor characteristics are enhanced by the use of cyano groups.
- Polycyclic aromatic hydrocarbons being charge-transfer donors form together with cyano substituted aromatic groups charge-transfer complexes. By varying the number and position of the cyano groups, the stability of the complexes may be varied, which fact finds applicability for example in chromatography as well as in electronics.
- the thermal stability of the surface layer is important.
- the bond between an aromatic group and the silicon atom is strong.
- the active group it is occasionally of advantage that the active group not be close to the substrate surface.
- the poly-p-phenylene structure is of importance also in electronic applications, especially in cases where the substrate is a metal-metal oxide as it allows for easy electron transfer between the treated metal surface and a second film adsorbed onto the treated surface.
- a surface optionally treated with a silane according to the invention may be adsorbed a polymerized film of the same or of a similar silane compound containing the active phenyl groups defined in the formula I, the polymerized silane having the formula ##STR11## wherein R 1 and R 2 have the meanings defined above, R 3 to R 6 are independently lower alkyl, lower alkenyl, phenyl or lower alkyl-phenyl and p ⁇ 1, and q and r ⁇ 0.
- the groups R 1 and R 2 may be the same as or different from the corresponding groups used in the surface treatment step.
- the groups R in the polymer are naturally chosen according to the end use of the surface in question.
- the preparation of the polymers is conventional, and known to a person skilled in the art.
- silane compounds with substituents having electron acceptor characteristics for example cyano groups
- a film containing donor groups, for example alkyl or alkoxy groups of the Langmuir-Blodgett type may be applied. Electron transfer between these layers may be initiated with external means, for example using a voltage potential or light.
- the donor groups may naturally be included in the surface treatment agent, whereby on the treated surface a layer exhibiting acceptor characteristics is applied.
- the silane compounds according to the invention are novel and they may be prepared using processes equivalent to processes known in the art.
- a suitable method for preparing these compounds is the Grignard reaction, whereby one mole of a Grignard reagent R 1 --Mg Br, prepared in a known manner, is reacted with one mole of a compound having the formula R 2 Si(Z 1 ) 2 Z 2 , in which formulas the symbols have the above meanings.
- An alternative mode of preparing the compounds of the invention wherein X is a p-phenylene containing spacer group, comprises forming in a first step in a manner described above the corresponding p-Br-substituted silane compound, Br-X-(R 2 )SiZ 1 Z 2 wherein the Z-substituents have the above meanings, but may not be halogen, and thereafter forming its zinc derivative Br-Zn-X-(R 2 )SiZ 1 Z 2 which in the presence of a suitable Pt-catalyst together with the compound ##STR12## gives the desired compound.
- the n-hexane extract was concentrated and the product isolated by vacuum distillation.
- the extract was concentrated and thereto was added 390 g (3.7 moles) of trimethylortoformate. After about a week the mixture was distilled under reduced pressure. The crude product was distilled under vacuum.
- the extract was concentrated and the product isolated by vacuum distillation.
- the crude product was purified by means of vacuum distillation.
- a silicon polymer containing 10% of 3,5-dimethylphenyl groups was prepared in the following manner.
- the polymerization was carried out by evaporating the ethylether and to the residue 0.1% of tetra-methylammoniumhydroxide was added. The mixture was stirred under nitrogen gas at 100°-120° C. and the viscous product for a further 20 minutes at 140° C. to destroy the catalyst. The silanol groups in the product were capped by treatment with hexamethyldisilazane for 8 hours at 80° to 100° C.
- the low molecular compounds were removed by dissolving the product in ethylether and precipitating the polymer by the addition of methanol or a water-methanol mixture. The steps of dissolution and precipitation were repeated several times. The solvent residues were removed in a nitrogen stream at 120° C.
- silica capillary column was prepared, using as a substrate a commercial fused silica capillary, onto the inside surface of which after treatment according to the invention, a film of the polymerized silicon compound was adsorbed.
- the characteristics of the column were tested using a Grob-test mixture.
- a silicon polymer containing 25% of 3,4-dimethoxyphenyl groups was prepared in the following manner.
- the product was polymerized and tested as in Example IV.
- the product was polymerized and tested as in Example IV.
Abstract
Description
TABLE __________________________________________________________________________ Retention times (RT) and relative retention time (RRT) in __________________________________________________________________________ minutes SE-54 Ex. IV Ex. V Ex. VI Test compound RT RRT RT RRT RT RRT RT RRT __________________________________________________________________________ D═2,3-butanediol 2.35 1.00 3.32 1.41 5.50 2.34 4.30 1.83 C.sub.10 ═n-decane 5.25 1.00 6.25 1.19 4.35 0.83 4.75 0.90 C.sub.11 ═n-undecane 6.82 1.00 7.90 1.16 5.82 0.85 6.26 0.92 ol═1-octanol 6.35 1.00 7.65 1.20 8.20 1.29 7.60 1.20 al═nonanal 6.90 1.00 8.30 1.20 8.10 1.17 7.80 1.13 P═2,6-dimethyl phenol 7.10 1.00 8.65 1.22 10.53 1.48 9.35 1.32 A═2,6-dimethyl aniline 7.96 1.00 9.73 1.22 10.80 1.36 9.72 1.22 S═2-ethyl hexanoic acid 7.20 1.00 8.45 1.17 10.83 1.50 -- -- am═dicyclohexyl amine 11.75 1.00 13.26 1.13 12.06 1.03 1.90 1.01 E.sub.10 ═methyl decanoate 10.28 1.00 11.62 1.13 10.95 1.07 10.60 1.03 E.sub.11 ═methyl undecanoate 11.68 1.00 13.06 1.12 12.34 1.06 12.00 1.03 E.sub.12 ═methyl dodecanoate 13.05 1.00 14.45 1.10 13.63 1.04 13.30 1.02 __________________________________________________________________________ Stationary phase composition Phase layer Column I.D. Length __________________________________________________________________________ SE-54 phenyl 5%, vinyl 1% 0.25 μm 0.20 mm 25 m Ex. IV 3,5-dimethyl phenyl 10% 0.25 μm 0.20 mm 25 m Ex. V 3,4-dimethoxy phenyl 25%, vinyl 2% 0.20 μm 0.20 mm 25 m Ex. VI 3,5-dimethyl-4-cyanophenyl 5.5% 0.20 μm 0.20 mm 25 m __________________________________________________________________________
Claims (11)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI845161 | 1984-12-28 | ||
FI845161A FI845161A0 (en) | 1984-12-28 | 1984-12-28 | YTBEHANDLINGSMEDEL. |
Publications (1)
Publication Number | Publication Date |
---|---|
US4756971A true US4756971A (en) | 1988-07-12 |
Family
ID=8520118
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US06/907,687 Expired - Fee Related US4756971A (en) | 1984-12-28 | 1985-12-20 | Surface treatment agents and polymers comprising substituted phenyl silanes and siloxanes |
Country Status (9)
Country | Link |
---|---|
US (1) | US4756971A (en) |
EP (2) | EP0310904A1 (en) |
JP (1) | JPS62501557A (en) |
AU (1) | AU5315786A (en) |
DK (1) | DK407486A (en) |
FI (2) | FI845161A0 (en) |
HU (1) | HUT42494A (en) |
NO (1) | NO863433L (en) |
WO (1) | WO1986004063A1 (en) |
Cited By (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5013585A (en) * | 1989-06-13 | 1991-05-07 | Shin-Etsu Chemical Co., Ltd. | Method for the preparation of surface-modified silica particles |
US5457564A (en) * | 1990-02-26 | 1995-10-10 | Molecular Displays, Inc. | Complementary surface confined polymer electrochromic materials, systems, and methods of fabrication therefor |
WO1996009885A1 (en) * | 1994-09-27 | 1996-04-04 | Syracuse University | Chemically active ceramic compositions with a pyrogallol moiety |
US5599445A (en) * | 1994-02-04 | 1997-02-04 | Supelco, Inc. | Nucleophilic bodies bonded to siloxane and use thereof for separations from sample matrices |
US5612275A (en) * | 1994-09-27 | 1997-03-18 | Syracuse University | Chemically active ceramic compositions with a phospho-acid moiety |
US5616533A (en) * | 1994-09-27 | 1997-04-01 | Syracuse University | Chemically active ceramic compositions with a thiol and/or amine moiety |
US5668079A (en) * | 1994-09-27 | 1997-09-16 | Syracuse University | Chemically active ceramic compositions with an hydroxyquinoline moiety |
US5818636A (en) * | 1990-02-26 | 1998-10-06 | Molecular Displays, Inc. | Complementary surface confined polmer electrochromic materials, systems, and methods of fabrication therefor |
US6030581A (en) * | 1997-02-28 | 2000-02-29 | Burstein Laboratories | Laboratory in a disk |
US6312901B2 (en) | 1996-07-08 | 2001-11-06 | Burstein Technologies, Inc. | Spatially addressable, cleavable reflective signal elements, assay device and method |
US6331275B1 (en) | 1996-07-08 | 2001-12-18 | Burstein Technologies, Inc. | Spatially addressable, cleavable reflective signal elements, assay device and method |
US6342349B1 (en) | 1996-07-08 | 2002-01-29 | Burstein Technologies, Inc. | Optical disk-based assay devices and methods |
US20020106661A1 (en) * | 1996-07-08 | 2002-08-08 | Burstein Laboratories, Inc. | Optical disk-based assay devices and methods |
WO2002094410A1 (en) * | 2001-05-18 | 2002-11-28 | University Of South Florida | Sol-gel dendron separation and extraction capillary column |
KR100427258B1 (en) * | 2001-08-11 | 2004-04-14 | 광주과학기술원 | Siloxane monomer containing fluorine, and process for preparing them |
US20050106068A1 (en) * | 2003-11-18 | 2005-05-19 | Abdul Malik | Sol-gel dendron separation and extraction capillary column |
US20050214827A1 (en) * | 1996-07-08 | 2005-09-29 | Burstein Technologies, Inc. | Assay device and method |
US20050242038A1 (en) * | 2004-04-30 | 2005-11-03 | Wu Chen | Novel stationary phases for use in high-performance liquid chromatography |
US20070084404A1 (en) * | 2003-05-09 | 2007-04-19 | Mohith Verghese | Reactor surface passivation through chemical deactivation |
US7314505B1 (en) * | 2005-06-20 | 2008-01-01 | Sandia Corporation | Stationary phase deposition based on onium salts |
US7914847B2 (en) | 2003-05-09 | 2011-03-29 | Asm America, Inc. | Reactor surface passivation through chemical deactivation |
US20110198736A1 (en) * | 2010-02-17 | 2011-08-18 | Asm America, Inc. | Reactive site deactivation against vapor deposition |
US9223203B2 (en) | 2011-07-08 | 2015-12-29 | Asm International N.V. | Microcontact printed films as an activation layer for selective atomic layer deposition |
WO2016061289A1 (en) | 2014-10-15 | 2016-04-21 | Rogers Corporation | Magneto-dielectric substrate, circuit material, and assembly having the same |
US20180079761A1 (en) * | 2015-03-20 | 2018-03-22 | Inkron Oy | High-RI siloxane monomers, their polymerization and use |
CN109715635A (en) * | 2016-07-14 | 2019-05-03 | 英克伦股份有限公司 | Siloxanyl monomers, its polymerization and purposes |
WO2019094238A1 (en) | 2017-11-07 | 2019-05-16 | Rogers Corporation | Dielectric layer with improved thermally conductivity |
WO2019183192A1 (en) | 2018-03-22 | 2019-09-26 | Rogers Corporation | Melt processable thermoplastic composite comprising a multimodal dielectric filler |
WO2021101958A1 (en) | 2019-11-22 | 2021-05-27 | Rogers Corporation | Shaped dielectric component cross-linked via irradiation and method of making thereof |
US11028231B2 (en) * | 2017-06-01 | 2021-06-08 | Dow Silicone Corporation | Polysiloxane comprising substituents having multiple aryl groups |
WO2023239594A1 (en) | 2022-06-08 | 2023-12-14 | Rogers Corporation | Y-type hexaferrite, method of manufacture, and uses thereof |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW546301B (en) | 1997-02-28 | 2003-08-11 | Sumitomo Chemical Co | Silicon-containing compound and organic electroluminescence device using the same |
JP5833492B2 (en) * | 2012-04-23 | 2015-12-16 | 信越化学工業株式会社 | Silicon compound, polysiloxane compound, composition for forming resist underlayer film containing the same, and pattern forming method |
Citations (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2546330A (en) * | 1948-12-11 | 1951-03-27 | Dow Chemical Co | Synthesis of aromatic silane |
US2556462A (en) * | 1948-01-05 | 1951-06-12 | Dow Chemical Co | Preparation of halosilanes |
DE834002C (en) * | 1950-09-19 | 1952-03-13 | Dow Corning | Process for surface treatment of glass and the like like |
US2626270A (en) * | 1949-02-01 | 1953-01-20 | Dow Corning | t-butylsilanes |
DE1114492B (en) * | 1958-11-17 | 1961-10-05 | Union Carbide Corp | Process for the preparation of cyanophenylalkoxysilanes |
US3312727A (en) * | 1965-02-03 | 1967-04-04 | Dow Corning | Organosilicon compounds |
DE2132569A1 (en) * | 1970-07-04 | 1972-02-10 | Andrejew Wladimir Iwanowitsch | Process for the production of organochlorosilanes |
US3651117A (en) * | 1970-09-08 | 1972-03-21 | Union Carbide Corp | Esterification of halosilanes |
US3722181A (en) * | 1970-05-22 | 1973-03-27 | Du Pont | Chromatographic packing with chemically bonded organic stationary phases |
DE2420389A1 (en) * | 1973-05-07 | 1974-11-21 | Xerox Corp | NEW POLYSILOXANES |
US3853726A (en) * | 1970-07-04 | 1974-12-10 | B Vainshiein | Method of producing organochlorosilanes |
US4099981A (en) * | 1974-12-24 | 1978-07-11 | Union Carbide Corporation | Sulfur containing silane coupling agents |
US4164509A (en) * | 1970-11-24 | 1979-08-14 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler | Process for preparing finely divided hydrophobic oxide particles |
US4242227A (en) * | 1979-07-31 | 1980-12-30 | The Dow Chemical Company | Chromatographic column packing having a bonded organosiloxane coating |
DE2930516A1 (en) * | 1979-07-27 | 1981-02-12 | Merck Patent Gmbh | RELEASE MATERIAL FOR CHROMATOGRAPHY WITH ORGANICALLY MODIFIED SURFACE, METHOD FOR THE PRODUCTION OF SUCH RELEASE MATERIALS AND THEIR USE |
EP0028665A1 (en) * | 1979-11-02 | 1981-05-20 | Chisso Corporation | Process for the production of diaralkyldichlorosilanes and their use in manufacture of polysiloxane |
US4363925A (en) * | 1981-02-07 | 1982-12-14 | Basf Aktiengesellschaft | Preparation of aromatic silanes |
SU1078324A1 (en) * | 1982-12-30 | 1984-03-07 | Государственный научно-исследовательский институт химии и технологии элементоорганических соединений | Method of separating oragic and silicon-organic compounds |
US4539061A (en) * | 1983-09-07 | 1985-09-03 | Yeda Research And Development Co., Ltd. | Process for the production of built-up films by the stepwise adsorption of individual monolayers |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3795313A (en) * | 1970-05-22 | 1974-03-05 | Du Pont | Chromatographic packing with chemically bonded organic stationary phases |
US4276061A (en) * | 1979-07-31 | 1981-06-30 | The Dow Chemical Company | Chromatographic column packing having a bonded organosiloxane coating |
-
1984
- 1984-12-28 FI FI845161A patent/FI845161A0/en not_active Application Discontinuation
-
1985
- 1985-12-20 EP EP88115789A patent/EP0310904A1/en not_active Withdrawn
- 1985-12-20 EP EP86900671A patent/EP0207977A1/en not_active Ceased
- 1985-12-20 JP JP86500609A patent/JPS62501557A/en active Pending
- 1985-12-20 HU HU86761A patent/HUT42494A/en unknown
- 1985-12-20 US US06/907,687 patent/US4756971A/en not_active Expired - Fee Related
- 1985-12-20 WO PCT/FI1985/000102 patent/WO1986004063A1/en not_active Application Discontinuation
- 1985-12-20 AU AU53157/86A patent/AU5315786A/en not_active Abandoned
-
1986
- 1986-08-22 FI FI863399A patent/FI863399A/en not_active Application Discontinuation
- 1986-08-27 DK DK407486A patent/DK407486A/en not_active Application Discontinuation
- 1986-08-27 NO NO863433A patent/NO863433L/en unknown
Patent Citations (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2556462A (en) * | 1948-01-05 | 1951-06-12 | Dow Chemical Co | Preparation of halosilanes |
US2546330A (en) * | 1948-12-11 | 1951-03-27 | Dow Chemical Co | Synthesis of aromatic silane |
US2626270A (en) * | 1949-02-01 | 1953-01-20 | Dow Corning | t-butylsilanes |
DE834002C (en) * | 1950-09-19 | 1952-03-13 | Dow Corning | Process for surface treatment of glass and the like like |
DE1114492B (en) * | 1958-11-17 | 1961-10-05 | Union Carbide Corp | Process for the preparation of cyanophenylalkoxysilanes |
US3312727A (en) * | 1965-02-03 | 1967-04-04 | Dow Corning | Organosilicon compounds |
US3722181A (en) * | 1970-05-22 | 1973-03-27 | Du Pont | Chromatographic packing with chemically bonded organic stationary phases |
GB1354357A (en) * | 1970-05-22 | 1974-06-05 | Du Pont | Chromatographic packing with chemically bonded organic stationary phases |
DE2132569A1 (en) * | 1970-07-04 | 1972-02-10 | Andrejew Wladimir Iwanowitsch | Process for the production of organochlorosilanes |
US3853726A (en) * | 1970-07-04 | 1974-12-10 | B Vainshiein | Method of producing organochlorosilanes |
US3651117A (en) * | 1970-09-08 | 1972-03-21 | Union Carbide Corp | Esterification of halosilanes |
US4164509A (en) * | 1970-11-24 | 1979-08-14 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler | Process for preparing finely divided hydrophobic oxide particles |
DE2420389A1 (en) * | 1973-05-07 | 1974-11-21 | Xerox Corp | NEW POLYSILOXANES |
US3899328A (en) * | 1973-05-07 | 1975-08-12 | Xerox Corp | Active matrix and intrinsic photoconductive polymer of a linear polysiloxane |
US4099981A (en) * | 1974-12-24 | 1978-07-11 | Union Carbide Corporation | Sulfur containing silane coupling agents |
DE2930516A1 (en) * | 1979-07-27 | 1981-02-12 | Merck Patent Gmbh | RELEASE MATERIAL FOR CHROMATOGRAPHY WITH ORGANICALLY MODIFIED SURFACE, METHOD FOR THE PRODUCTION OF SUCH RELEASE MATERIALS AND THEIR USE |
US4242227A (en) * | 1979-07-31 | 1980-12-30 | The Dow Chemical Company | Chromatographic column packing having a bonded organosiloxane coating |
EP0028665A1 (en) * | 1979-11-02 | 1981-05-20 | Chisso Corporation | Process for the production of diaralkyldichlorosilanes and their use in manufacture of polysiloxane |
US4363925A (en) * | 1981-02-07 | 1982-12-14 | Basf Aktiengesellschaft | Preparation of aromatic silanes |
SU1078324A1 (en) * | 1982-12-30 | 1984-03-07 | Государственный научно-исследовательский институт химии и технологии элементоорганических соединений | Method of separating oragic and silicon-organic compounds |
US4539061A (en) * | 1983-09-07 | 1985-09-03 | Yeda Research And Development Co., Ltd. | Process for the production of built-up films by the stepwise adsorption of individual monolayers |
Non-Patent Citations (6)
Title |
---|
"Covalent Attachment of Arenes to SNO2 -Semiconductor Electrodes," Marye Anne Fox, Frederick J. Nobs, and Tamara A. Voynick, Journal of the American Chemical Society, Jun. 4, 1980, pp. 4029-4036. |
"Steric Hindrance in Highly-Substituted Organosilicon Compounds, I, the Reaction of Aryllithium Compounds with Some Chlorosilanes, Ethoxysilanes, and Related Compounds," Henry Gilman and G. N. Russell Smart, Journal of Organic Chemistry, vol. 15, 1950, pp. 720-740. |
"The Wettability of Ethyl- and Vinyltriethoxysilane Films Formed at Organic Liquid Silica Interfaces," Willard D. Bascom, Advances in Chemistry Series, vol. 87, 1968, pp. 38-41. |
Covalent Attachment of Arenes to SNO 2 Semiconductor Electrodes, Marye Anne Fox, Frederick J. Nobs, and Tamara A. Voynick, Journal of the American Chemical Society, Jun. 4, 1980, pp. 4029 4036. * |
Steric Hindrance in Highly Substituted Organosilicon Compounds, I, the Reaction of Aryllithium Compounds with Some Chlorosilanes, Ethoxysilanes, and Related Compounds, Henry Gilman and G. N. Russell Smart, Journal of Organic Chemistry, vol. 15, 1950, pp. 720 740. * |
The Wettability of Ethyl and Vinyltriethoxysilane Films Formed at Organic Liquid Silica Interfaces, Willard D. Bascom, Advances in Chemistry Series, vol. 87, 1968, pp. 38 41. * |
Cited By (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5013585A (en) * | 1989-06-13 | 1991-05-07 | Shin-Etsu Chemical Co., Ltd. | Method for the preparation of surface-modified silica particles |
US5457564A (en) * | 1990-02-26 | 1995-10-10 | Molecular Displays, Inc. | Complementary surface confined polymer electrochromic materials, systems, and methods of fabrication therefor |
US5818636A (en) * | 1990-02-26 | 1998-10-06 | Molecular Displays, Inc. | Complementary surface confined polmer electrochromic materials, systems, and methods of fabrication therefor |
US5630937A (en) * | 1994-02-04 | 1997-05-20 | Supelco, Inc. | Nucleophilic bodies bonded to siloxane and use thereof for separations from sample matrices |
US5599445A (en) * | 1994-02-04 | 1997-02-04 | Supelco, Inc. | Nucleophilic bodies bonded to siloxane and use thereof for separations from sample matrices |
US5607580A (en) * | 1994-02-04 | 1997-03-04 | Supelco, Inc. | Nucleophilic bodies bonded to siloxane and use thereof for separations from sample matrices |
US5609756A (en) * | 1994-02-04 | 1997-03-11 | Supelco, Inc. | Nucleophilic bodies bonded to siloxane and use thereof for separations from sample matrices |
US5653875A (en) * | 1994-02-04 | 1997-08-05 | Supelco, Inc. | Nucleophilic bodies bonded to siloxane and use thereof for separations from sample matrices |
US5620603A (en) * | 1994-02-04 | 1997-04-15 | Supelco, Inc. | Nucleophilic bodies bonded to siloxane and use thereof for separations from sample matrices |
US5668079A (en) * | 1994-09-27 | 1997-09-16 | Syracuse University | Chemically active ceramic compositions with an hydroxyquinoline moiety |
US5817239A (en) * | 1994-09-27 | 1998-10-06 | Syracuse University | Method of removing heavy metal ions from a liquid with chemically active ceramic compositions with an hydroxyquinoline moiety |
US5616533A (en) * | 1994-09-27 | 1997-04-01 | Syracuse University | Chemically active ceramic compositions with a thiol and/or amine moiety |
WO1996009885A1 (en) * | 1994-09-27 | 1996-04-04 | Syracuse University | Chemically active ceramic compositions with a pyrogallol moiety |
US5690832A (en) * | 1994-09-27 | 1997-11-25 | Syracuse University | Chemically active ceramic compositions with a phospho-acid moiety |
US5779906A (en) * | 1994-09-27 | 1998-07-14 | Syracuse University | Method of removing heavy metal ions from a liquid with chemically active ceramic compositions with a pyrogallol moiety |
US5814226A (en) * | 1994-09-27 | 1998-09-29 | Syracuse University | Method of removing heavy metal ions from a liquid with chemically active ceramic compositions with a thiol and/or amine moiety |
US5624881A (en) * | 1994-09-27 | 1997-04-29 | Syracuse University | Chemically active ceramic compositions with a pyrogallol moiety |
US5612275A (en) * | 1994-09-27 | 1997-03-18 | Syracuse University | Chemically active ceramic compositions with a phospho-acid moiety |
US6312901B2 (en) | 1996-07-08 | 2001-11-06 | Burstein Technologies, Inc. | Spatially addressable, cleavable reflective signal elements, assay device and method |
US6331275B1 (en) | 1996-07-08 | 2001-12-18 | Burstein Technologies, Inc. | Spatially addressable, cleavable reflective signal elements, assay device and method |
US6342349B1 (en) | 1996-07-08 | 2002-01-29 | Burstein Technologies, Inc. | Optical disk-based assay devices and methods |
US20020106661A1 (en) * | 1996-07-08 | 2002-08-08 | Burstein Laboratories, Inc. | Optical disk-based assay devices and methods |
US20050214827A1 (en) * | 1996-07-08 | 2005-09-29 | Burstein Technologies, Inc. | Assay device and method |
US6030581A (en) * | 1997-02-28 | 2000-02-29 | Burstein Laboratories | Laboratory in a disk |
WO2002094410A1 (en) * | 2001-05-18 | 2002-11-28 | University Of South Florida | Sol-gel dendron separation and extraction capillary column |
KR100427258B1 (en) * | 2001-08-11 | 2004-04-14 | 광주과학기술원 | Siloxane monomer containing fluorine, and process for preparing them |
US20070084404A1 (en) * | 2003-05-09 | 2007-04-19 | Mohith Verghese | Reactor surface passivation through chemical deactivation |
US7799135B2 (en) * | 2003-05-09 | 2010-09-21 | Asm America, Inc. | Reactor surface passivation through chemical deactivation |
US7914847B2 (en) | 2003-05-09 | 2011-03-29 | Asm America, Inc. | Reactor surface passivation through chemical deactivation |
US20050106068A1 (en) * | 2003-11-18 | 2005-05-19 | Abdul Malik | Sol-gel dendron separation and extraction capillary column |
US20050242038A1 (en) * | 2004-04-30 | 2005-11-03 | Wu Chen | Novel stationary phases for use in high-performance liquid chromatography |
US7314505B1 (en) * | 2005-06-20 | 2008-01-01 | Sandia Corporation | Stationary phase deposition based on onium salts |
US20110198736A1 (en) * | 2010-02-17 | 2011-08-18 | Asm America, Inc. | Reactive site deactivation against vapor deposition |
US8293658B2 (en) | 2010-02-17 | 2012-10-23 | Asm America, Inc. | Reactive site deactivation against vapor deposition |
US9223203B2 (en) | 2011-07-08 | 2015-12-29 | Asm International N.V. | Microcontact printed films as an activation layer for selective atomic layer deposition |
WO2016061289A1 (en) | 2014-10-15 | 2016-04-21 | Rogers Corporation | Magneto-dielectric substrate, circuit material, and assembly having the same |
US20180079761A1 (en) * | 2015-03-20 | 2018-03-22 | Inkron Oy | High-RI siloxane monomers, their polymerization and use |
CN107873033A (en) * | 2015-03-20 | 2018-04-03 | 英克伦股份有限公司 | High RI siloxanyl monomers, its polymerization and application |
US10435420B2 (en) * | 2015-03-20 | 2019-10-08 | Inkron Oy | High-RI siloxane monomers, their polymerization and use |
EP3271366B1 (en) * | 2015-03-20 | 2020-10-14 | Inkron OY | High-ri siloxane monomers, their polymerization and use |
CN107873033B (en) * | 2015-03-20 | 2021-04-06 | 英克伦股份有限公司 | High RI siloxane monomers, polymerization and use thereof |
CN109715635A (en) * | 2016-07-14 | 2019-05-03 | 英克伦股份有限公司 | Siloxanyl monomers, its polymerization and purposes |
CN109715635B (en) * | 2016-07-14 | 2022-04-26 | 英克伦股份有限公司 | Siloxane monomers, polymerization and use thereof |
US11028231B2 (en) * | 2017-06-01 | 2021-06-08 | Dow Silicone Corporation | Polysiloxane comprising substituents having multiple aryl groups |
WO2019094238A1 (en) | 2017-11-07 | 2019-05-16 | Rogers Corporation | Dielectric layer with improved thermally conductivity |
WO2019183192A1 (en) | 2018-03-22 | 2019-09-26 | Rogers Corporation | Melt processable thermoplastic composite comprising a multimodal dielectric filler |
WO2021101958A1 (en) | 2019-11-22 | 2021-05-27 | Rogers Corporation | Shaped dielectric component cross-linked via irradiation and method of making thereof |
DE112020005743T5 (en) | 2019-11-22 | 2022-09-15 | Rogers Corporation | Shaped dielectric component crosslinked by irradiation and method of making same |
WO2023239594A1 (en) | 2022-06-08 | 2023-12-14 | Rogers Corporation | Y-type hexaferrite, method of manufacture, and uses thereof |
Also Published As
Publication number | Publication date |
---|---|
FI845161A0 (en) | 1984-12-28 |
FI863399A0 (en) | 1986-08-22 |
FI863399A (en) | 1986-08-22 |
NO863433D0 (en) | 1986-08-27 |
WO1986004063A1 (en) | 1986-07-17 |
AU5315786A (en) | 1986-07-29 |
DK407486A (en) | 1986-10-27 |
EP0207977A1 (en) | 1987-01-14 |
JPS62501557A (en) | 1987-06-25 |
DK407486D0 (en) | 1986-08-27 |
NO863433L (en) | 1986-10-21 |
EP0310904A1 (en) | 1989-04-12 |
HUT42494A (en) | 1987-07-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4756971A (en) | Surface treatment agents and polymers comprising substituted phenyl silanes and siloxanes | |
US4615962A (en) | Diacetylenes having liquid crystal phases | |
US7635741B2 (en) | Multifunctional monomers and their use in making cross-linked polymers and porous films | |
US4584393A (en) | Bis(aminoalkyl)disiloxanes and method and intermediates for their preparation | |
Yoshino et al. | Syntheses and reactions of metal organics. XVII. Synthesis of silane coupling agent having fluorocarbon chain and surface modification of glass plate | |
JP2889768B2 (en) | 3-thienyl group-containing silicon compound and method for producing the same | |
US5286890A (en) | Aromatic amine terminated silicone monomers, oligomers, and polymers therefrom | |
JP3459985B2 (en) | Method for producing thin film of borazine-containing silicon polymer and borazine-containing silicon polymer | |
US5679818A (en) | Inorganic arylacetylenic monomers | |
EP0176085A2 (en) | 4-Substituted-1,2,3,6-tetrahydrophthalic acid anhydride and production process thereof | |
JP3458157B2 (en) | Borazine-containing silicon-based copolymer and method for producing thin film thereof | |
US5081260A (en) | 3-(2-oxo-1-pyrrolidinyl)-propylsilanes and method for preparing the silane compounds | |
US5329036A (en) | (alpha, omega)phenylethynyl siloxane monomers, oligomers, and polymers thereof | |
JP2669702B2 (en) | Preparation of cyclic disilanilene-acetylene. | |
EP0622396B1 (en) | Polysilanes and method for producing the same | |
JPH036232A (en) | New polymer and its use | |
JP3338444B2 (en) | Silane-type coupling agent, method for producing the same, and method of use for forming conductive coating on glass | |
JP4308334B2 (en) | Surface modifier and surface modification method | |
JP3321604B2 (en) | Diphenylamine compound fused with siloxane, polymer having the compound as a main chain skeleton, and organic thin film element | |
Attanayake | Study of different routes to develop asymmetric double decker silsesquioxane (DDSQ) | |
JP2686454B2 (en) | Conjugated diacetylene bond-containing silicon compound and method for producing the same | |
US5081201A (en) | Aromatic polyimide silanol compounds, precursors and polymers thereof | |
EP0588237A1 (en) | 1-Pyrrolyl silicon compounds, chemically adsorbed ultrathin film formed therefrom and method of manufacturing the same | |
US4996341A (en) | Condensed bicyclic disilanylene-acetylene compound and method for preparing the same | |
JPS63250389A (en) | Fluorine-containing organosilicon compound and production thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: KSV - CHEMICALS OY, VALIMOTIE 7, HELSINKI, FINLAND Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNORS:VIRTANEN, JORMA A.;KINNUNEN, PAAVO K. J.;KULO, ARVO E.;REEL/FRAME:004660/0809 Effective date: 19870106 Owner name: KSV - CHEMICALS OY, A FINLAND CORP., FINLAND Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:VIRTANEN, JORMA A.;KINNUNEN, PAAVO K. J.;KULO, ARVO E.;REEL/FRAME:004660/0809 Effective date: 19870106 |
|
FEPP | Fee payment procedure |
Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: SMALL ENTITY |
|
REMI | Maintenance fee reminder mailed | ||
LAPS | Lapse for failure to pay maintenance fees | ||
FP | Lapsed due to failure to pay maintenance fee |
Effective date: 19920712 |
|
STCH | Information on status: patent discontinuation |
Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |