US4797696A - Beam splitting apparatus - Google Patents

Beam splitting apparatus Download PDF

Info

Publication number
US4797696A
US4797696A US07/098,565 US9856587A US4797696A US 4797696 A US4797696 A US 4797696A US 9856587 A US9856587 A US 9856587A US 4797696 A US4797696 A US 4797696A
Authority
US
United States
Prior art keywords
beams
reflective layer
mirror
splitting
beam splitting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US07/098,565
Inventor
Paul C. Allen
Paul A. Warkentin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Connecticut National Bank
Original Assignee
Ateq Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ateq Corp filed Critical Ateq Corp
Priority to US07/098,565 priority Critical patent/US4797696A/en
Assigned to ICA TECHNOLOGIES, LTD., A JAPANESE CORPORATION reassignment ICA TECHNOLOGIES, LTD., A JAPANESE CORPORATION LICENSE (SEE DOCUMENT FOR DETAILS). Assignors: ATEQ CORPORATION
Application granted granted Critical
Publication of US4797696A publication Critical patent/US4797696A/en
Assigned to ETEC SYSTEMS JAPAN LTD. reassignment ETEC SYSTEMS JAPAN LTD. SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ATEQ CORPORATION
Assigned to ETEC SYSTEMS, INC., reassignment ETEC SYSTEMS, INC., ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: FIRST INTERSTATE BANK OF OREGON, N.A. A NATIONAL BANKING ASSOCATION
Assigned to ETEC SYSTEMS, INC. A NV CORPORATION reassignment ETEC SYSTEMS, INC. A NV CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: ISHIKAWAJIMA-HARIMA HEAVY INDUSTRIES CO., LTD., A CORP. OF JAPAN
Assigned to ETEC SYSTEMS INC. A NV CORPORATION reassignment ETEC SYSTEMS INC. A NV CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: SILICON VALLEY BANK
Assigned to CONNECTICUT NATIONAL BANK, THE, reassignment CONNECTICUT NATIONAL BANK, THE, SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ETEC SYSTEMS, INC.
Assigned to CONNECTICUT NATIONAL BANK, THE A NATIONAL BANKING ASSOCIATION reassignment CONNECTICUT NATIONAL BANK, THE A NATIONAL BANKING ASSOCIATION ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: ETEC SYSTEMS, INC., A NEVADA CORP.
Assigned to ETEC SYSTEMS, INC. reassignment ETEC SYSTEMS, INC. MERGER (SEE DOCUMENT FOR DETAILS). Assignors: ATEQ CORPORATION A CORPORATION OF OREGON
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ETEC SYSTEMS, INC., A CORPORATION OF NEVADA
Assigned to ETEC SYSTEMS, INC. reassignment ETEC SYSTEMS, INC. SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: FLEET NATIONAL BANK SUCCESSOR-IN-INTEREST TO THE CONNECTICUT NATIONAL BANK
Assigned to ETEC SYSTEMS, INC. reassignment ETEC SYSTEMS, INC. SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: FLEET NATIONAL BANK, SUCCESSOR-IN-INTEREST TO THE CONNECTICUT NATIONAL BANK
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Definitions

  • the invention relates to the field of beam splitting means for use with laser beam apparatus and the like and has particular application in the field of pattern generation using a laser and radiant energy film in photolithography.
  • a number of beam splitting apparatus are known in the art.
  • mirrors are employed as a beam splitting means. It is an object of the beam splitting apparatus of the present invention to reduce the number of mirrors utilized in the prior art and still achieve the same direction and number of beams.
  • the apparatus comprises a plurality of mirrors, each aligned to reflect a beam or plurality of beams from one mirror to the next.
  • the mirror comprises a glass body with a layer of 50% reflective coating and a layer of anti-reflecting coating on one side of the body. A layer of 100% reflective coating is on the other side of the body. A beam is, thus, 50% reflected from the first reflective layer and allowed to 50% pass through the layer. The remainder of the beam is reflected from the 100% reflective layer.
  • FIG. 1 is an optical schematic showing the overall optical path of an apparatus embodying the preferred embodiment of the present invention.
  • FIG. 2 is an elevation view of a laser pattern generation apparatus embodying the preferred embodiment of the present invention.
  • FIG. 3 is a diagram of the beam splitter of the present invention.
  • FIG. 4 is an elevation view of one of the beam splitters used in the beam splitter of the present invention.
  • a beam splitting apparatus is described.
  • the preferred embodiment of the present invention is embodied in a laser pattern generating apparatus which is particularly suitable for selectively exposing photosensitive layers such as photoresist used in the fabrication of integrated circuits.
  • photosensitive layers such as photoresist used in the fabrication of integrated circuits.
  • numerous specific details are set forth such as specific wavelengths, lenses, etc., in order to provide a thorough understanding of the present invention. It will be obvious, however, to one skilled in the art that the present invention may be practiced without these specific details. In other instances, well-known structures, support members, etc., not necessary to the present invention, are not been set forth in detail in order not to unnecessarily obscure the present invention.
  • the pattern generation apparatus uses a laser beam to expose a radiant sensitive film.
  • the laser beam is split into eight beams to create a brush.
  • the brush scans the workpiece through use of a rotating mirror.
  • Each beam of the brush is modulated through acousto-optical modulators.
  • the electrical signals coupled to these modulators determine the specific pattern which is generated.
  • the "rasterizer" system used for providing the electrical signals to the modulators is described in copending application, Ser. No. 784,856, filed Oct. 4, 1985 which is assigned to the assignee of the present invention.
  • the workpiece containing the photosensitive film is mounted on a movable table which moves in one axis during scanning (stripe axis).
  • the table also moves in the scan axis when writing is not occurring.
  • Interferometers detect movement of the workpiece in these axes.
  • a determination of workpiece position relative to beam position is made from reflected light in a telecentric enlarged image plane. This same image plane is used for mirror facet detection, thus permitting data synchronization to the acousto-optical modulators.
  • a continuous wave laser 10 providing 100-200 milliwatts of radiation at a frequency of 363.8 nm is used.
  • the beam from laser 10 is compressed through ordinary beam compressor 12 to prepare the beam for splitting.
  • the multiple beam splitter 13 splits the beam from the laser 10 into eight beams. The specific optical arrangement for providing this splitting is described in conjunction with FIGS. 3 and 4.
  • the eight beams from the splitter 13 (sometimes referred to collectively as the "brush") passes through the relay lenses 14.
  • This three element lens (shown in FIG. 2), in effect, focuses and shrinks the beams from the splitter 13 by approximately a factor of two.
  • AOMs 16 acousto-optical modulators 16 are employed to modulate the light beams.
  • a carrier of 160 MHz is used, that is, the presence of the carrier determines whether the beam will be diffracted through the crystal onto the workpiece; the amplitude of the carrier determines the intensity of the beam. (The zero order beam is not used.)
  • Eight modulated beams may be obtained from a single beam using a single AOM where eight carrier frequencies are used. The deflection from the AOM is a function of frequency and each carrier frequency creates a separate beam.
  • electro-optic modulators may be employed in place of the AOMs. Neither of these are used in the currently preferred embodiment.
  • the eight beams from the AOM are directed through a dove prism 17.
  • This prism is used to rotate the brush of beams, and while not easily demonstrable in the view of FIG. 1, the beams, in effect, are tilted out of the plane of the figure.
  • the ultimate brush formed by the beams comprises overlapping projections of each of the beams without interference between the beams since in addition to the rotation from prism 17, a time delay is used between the activation of each of the beams. If this is not done non-uniform exposure of the photoresist can result.
  • the beams from prism 17 pass through the single relay lens 18 to converge to a spot on the steering mirror 20.
  • this spot is approximately 1.5 mm in diameter.
  • the steering mirror 20 is an electrically controllable mirror which permits the beams' angles to be moved (adjusted) on the facets comprising mirror 24.
  • the beams reflecting from mirror 20 pass through the zoom lens 22 which comprises four elements shown in FIG. 2. This zoom lens permits the beams to be made larger and moved further apart or to be made smaller and closer together on the workpiece. This zoom is electrically controlled and is set for each workpiece.
  • the rotating polygon mirror 24 in the currently preferred embodiment comprises 24 facets each of which deflect the beams from the zoom lens 22 into the F-theta lens 26. It is this mirror which provides the scanning action of the beams. In the currently preferred embodiment, this mirror rotates between 12,000 to 20,000 rpms; thus, the scans occur at a rate between 48 kHz and 80 kHz per second. However, the mirror rotates at a constant rate for a given pattern.
  • the beams from mirror 24 are enlarged in a post-scan, intermediate image plane (10 ⁇ image plane) as shown in FIG. 1.
  • F-theta lens 26 is used to form the plane and at the other end a reduction lens 32 is used to provide the final beams.
  • the final reduced beam scans the plate or workpiece 34.
  • a splitter 28 is disposed in the 10 ⁇ image plane. As will be described later, one of the beams is activated prior to each scan and is used to detect the mirror facets. The beam is reflected from splitter 28 to a facet detect circuit which provides a pulse indicating facet position. This permits the pattern data to the AOM 16 to be synchronized with the mirror rotation. Reflections from the workpiece 34 (or its part holder) are also reflected by the splitter 28 and focused into a photomultiplier tube. These reflections are used for calibration and other purposes as will be described later.
  • a shutter 30 operates in the 10 ⁇ image plane. This shutter prevents light from reaching the workpiece except during scanning or other selected times such as at calibration.
  • FIG. 2 the actual optical path as currently realized is shown.
  • the laser, lenses, rotating mirror, etc. are mounted to a rigid metal frame 45.
  • the frame is supported by metal supports 46 and 47 which are mounted on a single granite member to minimize movement.
  • the workpiece or plate is secured on the part holder and this assembly, as will be described, moves below the reduction lens 32.
  • the designation "L” refers to lenses
  • the designation “F” refers to focal points
  • the designation “AF” refer to afocal points.
  • the beam from the laser passes through lenses L1 and L2 which are the beam compressor 12 shown in FIG. 1.
  • the beam is then focused into the beam splitter 13 which, as mentioned, will be described later with FIGS. 3 and 4.
  • the relay lenses 14 of FIG. 1 are formed by lenses L3, L4 and L5 which include the afocal point AF1 between lenses L4 and L5.
  • the AOM 16 is again shown and receives the eight beams from the lenses 14.
  • the modulated light from the AOM passes through the dove prism 17 and then through the beam folding prism 37, relay lens 18 (L6), beam folding prism 38, and onto the steering mirror 20. From there the beams are reflected from mirror 39, pass through the beam folding prism 40 and are directed to the zoom lens assembly which comprises lenses L7, L8, L9, L10 and the beam folding prism 41.
  • a focal point F3 is located within the prism 41.
  • the beams from the zoom lens assembly then are reflected by mirror 48 onto the rotating mirror (polygon) 24.
  • the post-scan optics are again shown in FIG. 2 which includes the F-theta lens 26, the beam splitter 28, shutter 30 and reduction lens 32.
  • FIG. 4 shows one of the three similar plates 50 used in the beam splitter.
  • the body 55 is an ordinary body such as glass which transmits the beam.
  • the upper surface of the body includes an anti-reflective coating 52. Partially covering this coating is a 50% reflective coating or layer 53.
  • a 100% reflective coating or layer 51 is formed on the lower surface of body 55 .
  • a beam 58 incident on layer 53 is reflected as shown by beam 59.
  • a portion of the beam 58 shown as beam 60 enters the body 55 and is reflected from the coating 51 (beam 61). Note that the beam 61 upon exiting the plate 50 does not strike the layer 53.
  • Plates 50a, 50b and 50c Three plates such as plate 50 of FIG. 4 are shown in FIG. 3 (plates 50a, 50b and 50c) and are used to provide eight beams in the presently preferred embodiment.
  • Plate 50b is twice as thick as plate 50a; plate 50c is twice is thick as plate 50b.
  • the plates are mounted parallel to one another in the currently preferred embodiment.
  • a beam 63 first striking plate 50a provides two beams. (This is also shown in FIG. 4.) The two beams are then incident on the layer 53 of plate 50b. Half of each of these beams is reflected from layer 53. The portions of the beams which pass through layer 53 are reflected by layer 51 to provide two additional beams, thus a total of four beams leave the plate 50b. In a similar fashion, all four beams from plate 50b are partly reflected from the layer 53 of plate 50c and four beams are reflected from layer 51 of plate 50c to provide the eight beams used in the presently preferred embodiment.

Abstract

An apparatus for splitting radiant energy beams produced by a laser or other light source. The apparatus comprises a plurality of mirrors, each aligned to reflect a beam or plurality of beams from one mirror to the next. Each mirror comprises a glass body with a layer of 50% reflective coating and a layer of anti-reflecting coating on one side of the body. A layer of 100% reflective coating is on the other side of the body. A beam is, thus, 50% reflected from the first reflective layer and allowed 50% to pass through the layer. The remainder of the beam is reflected from the 100% reflective layer.

Description

This is a continuation of application Ser. No. 867,205 filed May 27, 1986, abandoned, which is a continuation of application Ser. No. 758,344, filed July 24, 1985, now abandoned.
BACKGROUND OF THE INVENTION
1. Field of the Invention
The invention relates to the field of beam splitting means for use with laser beam apparatus and the like and has particular application in the field of pattern generation using a laser and radiant energy film in photolithography.
2. Prior Art
A number of beam splitting apparatus are known in the art. In a common embodiment, mirrors are employed as a beam splitting means. It is an object of the beam splitting apparatus of the present invention to reduce the number of mirrors utilized in the prior art and still achieve the same direction and number of beams.
SUMMARY OF THE INVENTION
An apparatus for splitting radiant energy beams produced by a laser or other light source is described. The apparatus comprises a plurality of mirrors, each aligned to reflect a beam or plurality of beams from one mirror to the next. The mirror comprises a glass body with a layer of 50% reflective coating and a layer of anti-reflecting coating on one side of the body. A layer of 100% reflective coating is on the other side of the body. A beam is, thus, 50% reflected from the first reflective layer and allowed to 50% pass through the layer. The remainder of the beam is reflected from the 100% reflective layer.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is an optical schematic showing the overall optical path of an apparatus embodying the preferred embodiment of the present invention.
FIG. 2 is an elevation view of a laser pattern generation apparatus embodying the preferred embodiment of the present invention.
FIG. 3 is a diagram of the beam splitter of the present invention.
FIG. 4 is an elevation view of one of the beam splitters used in the beam splitter of the present invention.
DETAILED DESCRIPTION OF THE INVENTION
A beam splitting apparatus is described. The preferred embodiment of the present invention is embodied in a laser pattern generating apparatus which is particularly suitable for selectively exposing photosensitive layers such as photoresist used in the fabrication of integrated circuits. In the following description, numerous specific details are set forth such as specific wavelengths, lenses, etc., in order to provide a thorough understanding of the present invention. It will be obvious, however, to one skilled in the art that the present invention may be practiced without these specific details. In other instances, well-known structures, support members, etc., not necessary to the present invention, are not been set forth in detail in order not to unnecessarily obscure the present invention.
OVERVIEW OF AN APPARATUS EMBODYING THE PRESENT INVENTION
The pattern generation apparatus utilizing the present invention uses a laser beam to expose a radiant sensitive film. The laser beam is split into eight beams to create a brush. The brush scans the workpiece through use of a rotating mirror. Each beam of the brush is modulated through acousto-optical modulators. The electrical signals coupled to these modulators determine the specific pattern which is generated. The "rasterizer" system used for providing the electrical signals to the modulators is described in copending application, Ser. No. 784,856, filed Oct. 4, 1985 which is assigned to the assignee of the present invention.
The workpiece containing the photosensitive film is mounted on a movable table which moves in one axis during scanning (stripe axis). The table also moves in the scan axis when writing is not occurring. Interferometers detect movement of the workpiece in these axes. A determination of workpiece position relative to beam position is made from reflected light in a telecentric enlarged image plane. This same image plane is used for mirror facet detection, thus permitting data synchronization to the acousto-optical modulators.
OPTICAL PATH OF AN APPARATUS EMBODYING THE PRESENT INVENTION
Referring to FIG. 1 in the currently preferred embodiment a continuous wave laser 10 providing 100-200 milliwatts of radiation at a frequency of 363.8 nm is used. The beam from laser 10 is compressed through ordinary beam compressor 12 to prepare the beam for splitting.
The multiple beam splitter 13 splits the beam from the laser 10 into eight beams. The specific optical arrangement for providing this splitting is described in conjunction with FIGS. 3 and 4.
The eight beams from the splitter 13 (sometimes referred to collectively as the "brush") passes through the relay lenses 14. This three element lens (shown in FIG. 2), in effect, focuses and shrinks the beams from the splitter 13 by approximately a factor of two.
Commercially available acousto-optical modulators (AOMs) 16 are employed to modulate the light beams. In the presently preferred embodiment, eight transducers are formed on the surface of a single crystal. A carrier of 160 MHz is used, that is, the presence of the carrier determines whether the beam will be diffracted through the crystal onto the workpiece; the amplitude of the carrier determines the intensity of the beam. (The zero order beam is not used.)
Eight modulated beams may be obtained from a single beam using a single AOM where eight carrier frequencies are used. The deflection from the AOM is a function of frequency and each carrier frequency creates a separate beam. Alternatively, electro-optic modulators may be employed in place of the AOMs. Neither of these are used in the currently preferred embodiment.
The eight beams from the AOM are directed through a dove prism 17. This prism is used to rotate the brush of beams, and while not easily demonstrable in the view of FIG. 1, the beams, in effect, are tilted out of the plane of the figure. The ultimate brush formed by the beams comprises overlapping projections of each of the beams without interference between the beams since in addition to the rotation from prism 17, a time delay is used between the activation of each of the beams. If this is not done non-uniform exposure of the photoresist can result.
The beams from prism 17 pass through the single relay lens 18 to converge to a spot on the steering mirror 20. In the currently preferred embodiment, this spot is approximately 1.5 mm in diameter. The steering mirror 20 is an electrically controllable mirror which permits the beams' angles to be moved (adjusted) on the facets comprising mirror 24. The beams reflecting from mirror 20 pass through the zoom lens 22 which comprises four elements shown in FIG. 2. This zoom lens permits the beams to be made larger and moved further apart or to be made smaller and closer together on the workpiece. This zoom is electrically controlled and is set for each workpiece.
The rotating polygon mirror 24 in the currently preferred embodiment comprises 24 facets each of which deflect the beams from the zoom lens 22 into the F-theta lens 26. It is this mirror which provides the scanning action of the beams. In the currently preferred embodiment, this mirror rotates between 12,000 to 20,000 rpms; thus, the scans occur at a rate between 48 kHz and 80 kHz per second. However, the mirror rotates at a constant rate for a given pattern.
The beams from mirror 24 are enlarged in a post-scan, intermediate image plane (10×image plane) as shown in FIG. 1. At one end of this plane, F-theta lens 26 is used to form the plane and at the other end a reduction lens 32 is used to provide the final beams. The final reduced beam scans the plate or workpiece 34.
A splitter 28 is disposed in the 10× image plane. As will be described later, one of the beams is activated prior to each scan and is used to detect the mirror facets. The beam is reflected from splitter 28 to a facet detect circuit which provides a pulse indicating facet position. This permits the pattern data to the AOM 16 to be synchronized with the mirror rotation. Reflections from the workpiece 34 (or its part holder) are also reflected by the splitter 28 and focused into a photomultiplier tube. These reflections are used for calibration and other purposes as will be described later.
A shutter 30 operates in the 10× image plane. This shutter prevents light from reaching the workpiece except during scanning or other selected times such as at calibration.
In FIG. 2 the actual optical path as currently realized is shown. The laser, lenses, rotating mirror, etc., are mounted to a rigid metal frame 45. The frame is supported by metal supports 46 and 47 which are mounted on a single granite member to minimize movement. The workpiece or plate is secured on the part holder and this assembly, as will be described, moves below the reduction lens 32.
In the optical path of FIG. 2, the designation "L" refers to lenses, the designation "F" refers to focal points, and the designation "AF" refer to afocal points.
The beam from the laser passes through lenses L1 and L2 which are the beam compressor 12 shown in FIG. 1. The beam is then focused into the beam splitter 13 which, as mentioned, will be described later with FIGS. 3 and 4.
The relay lenses 14 of FIG. 1 are formed by lenses L3, L4 and L5 which include the afocal point AF1 between lenses L4 and L5. The AOM 16 is again shown and receives the eight beams from the lenses 14. The modulated light from the AOM passes through the dove prism 17 and then through the beam folding prism 37, relay lens 18 (L6), beam folding prism 38, and onto the steering mirror 20. From there the beams are reflected from mirror 39, pass through the beam folding prism 40 and are directed to the zoom lens assembly which comprises lenses L7, L8, L9, L10 and the beam folding prism 41. A focal point F3 is located within the prism 41. The beams from the zoom lens assembly then are reflected by mirror 48 onto the rotating mirror (polygon) 24.
The post-scan optics are again shown in FIG. 2 which includes the F-theta lens 26, the beam splitter 28, shutter 30 and reduction lens 32.
All the lenses discussed above are commercially obtainable.
BEAM SPLITTER 13 OF FIGS. 1 AND 2
FIG. 4 shows one of the three similar plates 50 used in the beam splitter. The body 55 is an ordinary body such as glass which transmits the beam. The upper surface of the body includes an anti-reflective coating 52. Partially covering this coating is a 50% reflective coating or layer 53. On the lower surface of body 55 a 100% reflective coating or layer 51 is formed.
As is seen, a beam 58 incident on layer 53 is reflected as shown by beam 59. A portion of the beam 58 shown as beam 60 enters the body 55 and is reflected from the coating 51 (beam 61). Note that the beam 61 upon exiting the plate 50 does not strike the layer 53.
Three plates such as plate 50 of FIG. 4 are shown in FIG. 3 (plates 50a, 50b and 50c) and are used to provide eight beams in the presently preferred embodiment. Plate 50b is twice as thick as plate 50a; plate 50c is twice is thick as plate 50b. The plates are mounted parallel to one another in the currently preferred embodiment.
As seen in FIG. 3 a beam 63 first striking plate 50a provides two beams. (This is also shown in FIG. 4.) The two beams are then incident on the layer 53 of plate 50b. Half of each of these beams is reflected from layer 53. The portions of the beams which pass through layer 53 are reflected by layer 51 to provide two additional beams, thus a total of four beams leave the plate 50b. In a similar fashion, all four beams from plate 50b are partly reflected from the layer 53 of plate 50c and four beams are reflected from layer 51 of plate 50c to provide the eight beams used in the presently preferred embodiment.
Thus, a beam splitter apparatus has been described.

Claims (14)

We claim:
1. An apparatus for operating a pattern on a workpiece comprising:
a laser for providing a radiant energy beam;
beam splitting means optically coupled to said laser, comprising a first beam splitting mirror for receiving said beam from said laser, and for splitting said beam into two beams, said first beam splitting mirror comprising a body and a first and second reflective layer;
said first reflective layer covering approximately one half of one side of said body and generally parallel with said second reflective layer;
modulation means for independently modulating each of said plurality of beams, said modulation means being optically coupled to said beam splitting means.
2. An apparatus, as recited by claim 1, wherein said beam splitting means further includes a second beam splitting mirror for receiving said two beams from said from said first mirror and for splitting said two beams into four beams, and a third beam splitting mirror for receiving said four beams from said second mirror and for splitting said four beams into eight beams.
3. An apparatus for generating a pattern on a workpiece, comprising:
a beam generating means for providing a radiant energy beam;
a beam splitting means optically coupled to said beam generation means comprising a first beam splitting mirror for receiving said beam from said laser and for splitting said beam into two beams, said first beam splitting mirror comprising:
a body;
a first reflective layer covering a first portion of a first surface of said body, said body not covered by said first reflective layer on a second portion of said first surface of said body;
a second reflective layer covering at least a second portion of a second surface of said body, said second reflective layer being generally parallel with said first reflective layer.
4. The apparatus, as recited by claim 3 wherein said beam splitting means further comprises a second beam splitting mirror for receiving said two beams from said first mirror and for splitting said two beams into four beams, and a third beam splitting mirror for receiving said four beams from said second mirror and for splitting said four beams into eight beams.
5. The apparatus, as recited by claim 3, wherein said first mirror further comprises:
a second surface of said body being coated with a second reflective layer, said second surface being generally parallel to said first surface.
6. The apparatus, as recited by claim 5, wherein said body is comprised of glass.
7. The apparatus, as recited by claim 5, wherein said first reflective layer is approximately 50% reflective.
8. The apparatus, as recited by claim 5, wherein said second reflective layer is approximately 100% reflective.
9. In an apparatus for splitting a radiant energy beam, said radiant energy beam being generated by a laser or other source, an improvement comprising:
a first beam splitting means for splitting said beam into a plurality of beams, said first beam splitting means comprising:
(1) a transparent body;
(2) a first reflective layer coupled with said body for partially reflecting said beam, said first reflective layer partially covering a first surface of said transparent body;
(3) a second reflective layer for reflecting said beam coupled with said body, said second reflective layer being generally parallel with said first reflective layer;
whereby, a beam entering said first beam splitting means is split into a plurality of beams.
10. The improvement, as recited in claim 9, wherein said first beam splitting means further comprises an anti-reflective layer coupled with said body and said first reflective layer.
11. The improvement, as recited by claim 10, wherein said first reflective layer is approximately 50% reflective.
12. The improvement, as recited by claim 11, wherein said second reflective layer is approximately 100% reflective.
13. The improvement, as recited by claim 12, wherein said body is comprised of glass.
14. The improvement, as recited by claim 13, wherein said beam splitting apparatus further comprises a second and third beam splitting means.
US07/098,565 1985-07-24 1987-09-21 Beam splitting apparatus Expired - Lifetime US4797696A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US07/098,565 US4797696A (en) 1985-07-24 1987-09-21 Beam splitting apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US75834485A 1985-07-24 1985-07-24
US07/098,565 US4797696A (en) 1985-07-24 1987-09-21 Beam splitting apparatus

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
US06867205 Continuation 1986-05-27

Publications (1)

Publication Number Publication Date
US4797696A true US4797696A (en) 1989-01-10

Family

ID=26794867

Family Applications (1)

Application Number Title Priority Date Filing Date
US07/098,565 Expired - Lifetime US4797696A (en) 1985-07-24 1987-09-21 Beam splitting apparatus

Country Status (1)

Country Link
US (1) US4797696A (en)

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4925271A (en) * 1988-05-16 1990-05-15 Think Laboratory Co., Ltd. Optical beam splitter
US5035475A (en) * 1990-03-15 1991-07-30 Aura Systems, Inc. Unique modulation television
US5071225A (en) * 1989-12-29 1991-12-10 Hoya Corporation Beam splitter for producing a plurality of splitted light beams for each of wavelength components of an incident light beam
US5099358A (en) * 1989-01-13 1992-03-24 Dainippon Screen Mfg. Co., Ltd. Apparatus for recording image including an afocal optical system
US5367399A (en) * 1992-02-13 1994-11-22 Holotek Ltd. Rotationally symmetric dual reflection optical beam scanner and system using same
US5386221A (en) * 1992-11-02 1995-01-31 Etec Systems, Inc. Laser pattern generation apparatus
US5541771A (en) * 1994-08-22 1996-07-30 Hewlett-Packard Company Beam splitter for use in a color imaging assembly
WO1996036848A1 (en) * 1995-05-15 1996-11-21 Bio-Rad Laboratories Laser beamsplitter for generating a plurality of parallel beams
WO1997029509A1 (en) * 1996-02-09 1997-08-14 Philips Electronics N.V. Laser separation of semiconductor elements formed in a wafer of semiconductor material
US5844592A (en) * 1993-06-30 1998-12-01 Asahi Kogaku Kogyo Kabushiki Kaisha Optical image forming device having a plurality of drawing beams and a monitoring beam
FR2766281A1 (en) * 1996-06-11 1999-01-22 Us Energy Beam splitter assembly with output insensitive to polarisation changes
US5948291A (en) * 1997-04-29 1999-09-07 General Scanning, Inc. Laser beam distributor and computer program for controlling the same
WO2000072080A1 (en) * 1999-05-20 2000-11-30 Etec Systems, Inc. Method and apparatus for providing rectangular shaped array of light beams
FR2800522A1 (en) * 1999-11-02 2001-05-04 Automa Tech Sa DEVICE FOR PREPARING A PLURALITY OF LASER BEAMS
US6525884B2 (en) * 2000-03-17 2003-02-25 Agilent Technologies, Inc. Optical beam splitter that can be manufactured by micromechanical means
EP1321750A2 (en) * 2001-12-13 2003-06-25 Coretek, Inc. Wavelength locker and optical systems using the same
US20040235208A1 (en) * 2002-02-21 2004-11-25 Applied Materials, Inc. Multi beam scanning with bright/dark field imaging
US20050061981A1 (en) * 2003-09-23 2005-03-24 Allen Paul C. Apparatus for multiple beam deflection and intensity stabilization
US20080030865A1 (en) * 2003-08-14 2008-02-07 Cytonome, Inc. Optical detector for a particle sorting system
US20080068721A1 (en) * 2006-09-14 2008-03-20 3M Innovative Properties Company Beam splitter apparatus and system
CN101746152B (en) * 2008-12-09 2011-04-27 东莞东运机械制造有限公司 Laser roller film engraving machine
US9260693B2 (en) 2004-12-03 2016-02-16 Cytonome/St, Llc Actuation of parallel microfluidic arrays
US9823252B2 (en) 2004-12-03 2017-11-21 Cytonome/St, Llc Unitary cartridge for particle processing
EP2768626B1 (en) 2011-09-23 2019-03-27 Boegli-Gravures S.A. Method and device for producing a structured surface on a steel embossing roller
US11027278B2 (en) 2002-04-17 2021-06-08 Cytonome/St, Llc Methods for controlling fluid flow in a microfluidic system

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3230851A (en) * 1962-06-06 1966-01-25 Soc Optique Mec Haute Prec Device for checking the focus of a scene-shooting objective
US3898639A (en) * 1972-08-24 1975-08-05 Hrand M Muncheryan Security surveillance laser system
EP0112188A2 (en) * 1982-12-21 1984-06-27 Crosfield Electronics Limited Light beam-splitter
US4531054A (en) * 1981-07-31 1985-07-23 Asahi Kogaku Kogyo Kabushiki Kaisha Wavefront light beam splitter
US4541712A (en) * 1981-12-21 1985-09-17 Tre Semiconductor Equipment Corporation Laser pattern generating system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3230851A (en) * 1962-06-06 1966-01-25 Soc Optique Mec Haute Prec Device for checking the focus of a scene-shooting objective
US3898639A (en) * 1972-08-24 1975-08-05 Hrand M Muncheryan Security surveillance laser system
US4531054A (en) * 1981-07-31 1985-07-23 Asahi Kogaku Kogyo Kabushiki Kaisha Wavefront light beam splitter
US4541712A (en) * 1981-12-21 1985-09-17 Tre Semiconductor Equipment Corporation Laser pattern generating system
EP0112188A2 (en) * 1982-12-21 1984-06-27 Crosfield Electronics Limited Light beam-splitter

Cited By (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4925271A (en) * 1988-05-16 1990-05-15 Think Laboratory Co., Ltd. Optical beam splitter
US5099358A (en) * 1989-01-13 1992-03-24 Dainippon Screen Mfg. Co., Ltd. Apparatus for recording image including an afocal optical system
US5071225A (en) * 1989-12-29 1991-12-10 Hoya Corporation Beam splitter for producing a plurality of splitted light beams for each of wavelength components of an incident light beam
US5035475A (en) * 1990-03-15 1991-07-30 Aura Systems, Inc. Unique modulation television
US5367399A (en) * 1992-02-13 1994-11-22 Holotek Ltd. Rotationally symmetric dual reflection optical beam scanner and system using same
US5386221A (en) * 1992-11-02 1995-01-31 Etec Systems, Inc. Laser pattern generation apparatus
US5844592A (en) * 1993-06-30 1998-12-01 Asahi Kogaku Kogyo Kabushiki Kaisha Optical image forming device having a plurality of drawing beams and a monitoring beam
US5541771A (en) * 1994-08-22 1996-07-30 Hewlett-Packard Company Beam splitter for use in a color imaging assembly
US5671047A (en) * 1995-05-15 1997-09-23 Bio-Rad Laboratories Laser beamsplitter for generating a plurality of parallel beams
GB2316766A (en) * 1995-05-15 1998-03-04 Bio Rad Laboratories Laser beamsplitter for generating a plurality of parallel beams
WO1996036848A1 (en) * 1995-05-15 1996-11-21 Bio-Rad Laboratories Laser beamsplitter for generating a plurality of parallel beams
DE19681406C2 (en) * 1995-05-15 2002-09-19 Bio Rad Lab Cambridge Laser beam splitter for generating a plurality of parallel beams
GB2316766B (en) * 1995-05-15 1999-05-12 Bio Rad Laboratories An interferometer and a spectrometer which incorporate a laser beamsplitter
WO1997029509A1 (en) * 1996-02-09 1997-08-14 Philips Electronics N.V. Laser separation of semiconductor elements formed in a wafer of semiconductor material
FR2766281A1 (en) * 1996-06-11 1999-01-22 Us Energy Beam splitter assembly with output insensitive to polarisation changes
US5948291A (en) * 1997-04-29 1999-09-07 General Scanning, Inc. Laser beam distributor and computer program for controlling the same
WO2000072080A1 (en) * 1999-05-20 2000-11-30 Etec Systems, Inc. Method and apparatus for providing rectangular shaped array of light beams
US6243209B1 (en) * 1999-05-20 2001-06-05 Etec Systems, Inc. Method and apparatus for providing rectangular shape array of light beams
FR2800522A1 (en) * 1999-11-02 2001-05-04 Automa Tech Sa DEVICE FOR PREPARING A PLURALITY OF LASER BEAMS
EP1098403A1 (en) * 1999-11-02 2001-05-09 Automa-Tech Device for processing a plurality of laser beams
US6618402B1 (en) * 1999-11-02 2003-09-09 Automa-Tech Device for generating a plurality of laser beams
US6525884B2 (en) * 2000-03-17 2003-02-25 Agilent Technologies, Inc. Optical beam splitter that can be manufactured by micromechanical means
EP1321750A2 (en) * 2001-12-13 2003-06-25 Coretek, Inc. Wavelength locker and optical systems using the same
EP1321750A3 (en) * 2001-12-13 2004-11-10 Coretek, Inc. Wavelength locker and optical systems using the same
US20040235208A1 (en) * 2002-02-21 2004-11-25 Applied Materials, Inc. Multi beam scanning with bright/dark field imaging
US20060028649A1 (en) * 2002-02-21 2006-02-09 Applied Materials, Inc Multi beam scanning with bright/dark field imaging
US7049155B2 (en) 2002-02-21 2006-05-23 Applied Materials, Inc. Multi beam scanning with bright/dark field imaging
US7399647B2 (en) 2002-02-21 2008-07-15 Applied Materials, Inc. Multi beam scanning with bright/dark field imaging
US11027278B2 (en) 2002-04-17 2021-06-08 Cytonome/St, Llc Methods for controlling fluid flow in a microfluidic system
US20110168871A1 (en) * 2003-08-14 2011-07-14 Gilbert John R Optical detector for a particle sorting system
US20080030865A1 (en) * 2003-08-14 2008-02-07 Cytonome, Inc. Optical detector for a particle sorting system
US11002659B2 (en) 2003-08-14 2021-05-11 Cytonome/St, Llc Optical detector for a particle sorting system
US7492522B2 (en) * 2003-08-14 2009-02-17 Cytonome, Inc. Optical detector for a particle sorting system
US10520421B2 (en) 2003-08-14 2019-12-31 Cytonome/St, Llc Optical detector for a particle sorting system
US20090168053A1 (en) * 2003-08-14 2009-07-02 Cytonome, Inc. Optical detector for a particle sorting system
US9752976B2 (en) 2003-08-14 2017-09-05 Cytonome/St, Llc Optical detector for a particle sorting system
US8964184B2 (en) 2003-08-14 2015-02-24 Cytonome/St, Llc Optical detector for a particle sorting system
US7483196B2 (en) 2003-09-23 2009-01-27 Applied Materials, Inc. Apparatus for multiple beam deflection and intensity stabilization
US20050061981A1 (en) * 2003-09-23 2005-03-24 Allen Paul C. Apparatus for multiple beam deflection and intensity stabilization
US10794913B2 (en) 2004-12-03 2020-10-06 Cytonome/St, Llc Unitary cartridge for particle processing
US9260693B2 (en) 2004-12-03 2016-02-16 Cytonome/St, Llc Actuation of parallel microfluidic arrays
US9823252B2 (en) 2004-12-03 2017-11-21 Cytonome/St, Llc Unitary cartridge for particle processing
US10065188B2 (en) 2004-12-03 2018-09-04 Cytonome/St, Llc Actuation of parallel microfluidic arrays
US10222378B2 (en) 2004-12-03 2019-03-05 Cytonome/St, Llc Unitary cartridge for particle processing
US10994273B2 (en) 2004-12-03 2021-05-04 Cytonome/St, Llc Actuation of parallel microfluidic arrays
US20090213466A1 (en) * 2006-09-14 2009-08-27 3M Innovative Properties Company Beam splitter apparatus and system
US7551359B2 (en) 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US8107168B2 (en) 2006-09-14 2012-01-31 3M Innovative Properties Company Beam splitter apparatus and system
US20080068721A1 (en) * 2006-09-14 2008-03-20 3M Innovative Properties Company Beam splitter apparatus and system
CN101746152B (en) * 2008-12-09 2011-04-27 东莞东运机械制造有限公司 Laser roller film engraving machine
EP2768626B1 (en) 2011-09-23 2019-03-27 Boegli-Gravures S.A. Method and device for producing a structured surface on a steel embossing roller

Similar Documents

Publication Publication Date Title
US4797696A (en) Beam splitting apparatus
US4796038A (en) Laser pattern generation apparatus
US4606601A (en) Single facet wobble free scanner
US4475787A (en) Single facet wobble free scanner
US4156124A (en) Image transfer laser engraving
JPH05297318A (en) Light beam divider and pattern preparing device using the divider
KR960038363A (en) Interferometer with micromirror and beam filtering method
JPS6011325B2 (en) scanning device
US4872756A (en) Dual path interferometer with varying difference in path length
EP0288970B1 (en) Optical system for flyingspot scanning system
JP3047240B2 (en) Pattern generator
US4714309A (en) Reflection holograms
JPS561018A (en) Light beam scanner
US4863225A (en) Reflection holograms formed by scanning
GB2124053A (en) Scanner/plotter optical system
US5323259A (en) Light deflecting device
US4641950A (en) Exposure system
JP3219159B2 (en) Scanning device
US6504137B1 (en) Focusing system and method for use in imaging systems
KR100378628B1 (en) Apparatus for the contactless optical scanning of imformation during recording onto and/or playback from a recording medium having recording tracks
US20030085334A1 (en) Focusing system and method for use in imaging systems
US6835921B2 (en) Focusing system for use in imaging systems
GB2151108A (en) Beam deflecting method and device for use in image reproduction
JPS6145215A (en) Laser printer
EP1408360A2 (en) Focusing system and method for use in imaging systems

Legal Events

Date Code Title Description
AS Assignment

Owner name: ICA TECHNOLOGIES, LTD., A JAPANESE CORPORATION

Free format text: LICENSE;ASSIGNOR:ATEQ CORPORATION;REEL/FRAME:004927/0974

Effective date: 19880803

STCF Information on status: patent grant

Free format text: PATENTED CASE

AS Assignment

Owner name: ETEC SYSTEMS JAPAN LTD.

Free format text: SECURITY INTEREST;ASSIGNOR:ATEQ CORPORATION;REEL/FRAME:005872/0534

Effective date: 19911012

FEPP Fee payment procedure

Free format text: PAYOR NUMBER ASSIGNED (ORIGINAL EVENT CODE: ASPN); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

AS Assignment

Owner name: ETEC SYSTEMS, INC.,

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:FIRST INTERSTATE BANK OF OREGON, N.A. A NATIONAL BANKING ASSOCATION;REEL/FRAME:005935/0742

Effective date: 19911108

AS Assignment

Owner name: ETEC SYSTEMS, INC. A NV CORPORATION

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:ISHIKAWAJIMA-HARIMA HEAVY INDUSTRIES CO., LTD., A CORP. OF JAPAN;REEL/FRAME:005951/0856

Effective date: 19911220

Owner name: ETEC SYSTEMS INC. A NV CORPORATION

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:SILICON VALLEY BANK;REEL/FRAME:005951/0849

Effective date: 19911218

Owner name: CONNECTICUT NATIONAL BANK, THE A NATIONAL BANKIN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST.;ASSIGNOR:ETEC SYSTEMS, INC., A NEVADA CORP.;REEL/FRAME:005951/0843

Effective date: 19911220

Owner name: CONNECTICUT NATIONAL BANK, THE,

Free format text: SECURITY INTEREST;ASSIGNOR:ETEC SYSTEMS, INC.;REEL/FRAME:005949/0872

Effective date: 19911220

FPAY Fee payment

Year of fee payment: 4

FPAY Fee payment

Year of fee payment: 8

FPAY Fee payment

Year of fee payment: 12

AS Assignment

Owner name: ETEC SYSTEMS, INC., CALIFORNIA

Free format text: MERGER;ASSIGNOR:ATEQ CORPORATION A CORPORATION OF OREGON;REEL/FRAME:012110/0596

Effective date: 19950825

Owner name: APPLIED MATERIALS, INC., CALIFORNIA

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:ETEC SYSTEMS, INC., A CORPORATION OF NEVADA;REEL/FRAME:012119/0155

Effective date: 20010820

AS Assignment

Owner name: ETEC SYSTEMS, INC., CALIFORNIA

Free format text: SECURITY INTEREST;ASSIGNOR:FLEET NATIONAL BANK, SUCCESSOR-IN-INTEREST TO THE CONNECTICUT NATIONAL BANK;REEL/FRAME:012343/0297

Effective date: 20011030

Owner name: ETEC SYSTEMS, INC., CALIFORNIA

Free format text: SECURITY INTEREST;ASSIGNOR:FLEET NATIONAL BANK SUCCESSOR-IN-INTEREST TO THE CONNECTICUT NATIONAL BANK;REEL/FRAME:012343/0877

Effective date: 20011030