US4824693A - Method for depositing a solderable metal layer by an electroless method - Google Patents
Method for depositing a solderable metal layer by an electroless method Download PDFInfo
- Publication number
- US4824693A US4824693A US07/157,933 US15793388A US4824693A US 4824693 A US4824693 A US 4824693A US 15793388 A US15793388 A US 15793388A US 4824693 A US4824693 A US 4824693A
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- United States
- Prior art keywords
- conductive paths
- metal layer
- substrate
- bath
- depositing
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 20
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 10
- 239000002184 metal Substances 0.000 title claims abstract description 10
- 238000000151 deposition Methods 0.000 title claims description 10
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 230000008021 deposition Effects 0.000 claims abstract description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 12
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 5
- 230000004913 activation Effects 0.000 claims description 4
- 150000003606 tin compounds Chemical class 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 230000003750 conditioning effect Effects 0.000 claims description 3
- -1 fluoride ions Chemical class 0.000 claims description 3
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 claims description 3
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 claims description 2
- 230000009849 deactivation Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 238000001465 metallisation Methods 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910017917 NH4 Cl Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229910002666 PdCl2 Inorganic materials 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1345—Conductors connecting electrodes to cell terminals
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/032—Materials
- H05K2201/0326—Inorganic, non-metallic conductor, e.g. indium-tin oxide [ITO]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0347—Overplating, e.g. for reinforcing conductors or bumps; Plating over filled vias
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/07—Electric details
- H05K2201/0753—Insulation
- H05K2201/0761—Insulation resistance, e.g. of the surface of the PCB between the conductors
Definitions
- the present invention pertains to a method of depositing a solderable metal layer by an electroless method on transparent conductive paths of indium tin oxide on substrates as set forth in the preamble of claim 1.
- German Patent No. 28 07 350 discloses a liquid-crystal display device which has a glass substrate as a support for the display device and for an integrated circuit (IC chip).
- the substrate supports transparent conductive paths of indium oxide.
- the solderable metal layer of these conductive paths in the invisible part of the display device is effected by depositing two chromium-containing intermediate layers prior to the application of a gold layer.
- Five layers of chromium, copper, gold, copper and lead tin, respectively, are provided on the IC chip as a bonding layer.
- the metallization of the conductive paths i.e., the deposition of the layers, is effected by an evaporation or sputtering process. These methods involve a great amount of energy and are technically complex.
- DE-AS No. 23 02 194 describes the manufacture of thin-film circuits by a photoetching technique in which a thin intermediate or adhesion-improving layer and an upper noble-metal layer are deposited on a substrate.
- the layers can be deposited by evaporation, sputtering or chemical deposition.
- DE-AS No. 25 09 912 discloses an electronic thin-film circuit with a substrate plate made of insulating material.
- the method of making the thin-film circuit includes the steps of depositing a nickel layer on a copper layer and a gold layer on the nickel layer by electroless techniques.
- FIG. 1 is a top plan view of a display device
- FIG. 2 shows the partial immersion of the display device in a bath.
- the display device 1 shown in FIG. 1 has a display portion 2 and a portion 3 which will be invisible in the later built-up condition of the display device.
- the display portion has, e.g., a liquid-crystal display (not shown) which is supported on a substrate such as glass. This is also the material of the portion 3, where it supports conductive paths 4 leading to components 5, such as integrated circuits, and to connections 8 of the display device 1.
- the connections of the components 5 are connected to the conductive paths 4 by solder or by a conductive adhesive. It is important for this connection of the components 5 with the conductive paths 4 that the conductive paths have a suitable metal layer.
- the electrodes present in the display portion 2 of the display device 1 have a transparent, conductive layer of indium tin oxide.
- the conductive paths 4 in the portion 3 are made of the same material, since the electrodes in the display portion 2 and the conductive paths 4 in the portion 3 can then be produced simultaneously. However, since conductive paths of indium tin oxide do not have a solderable surface, they must be metallized.
- the display portion 2 of the display device 1 is manufactured and checked. In this condition, the manufactured and tested display devices do not yet have components 5 attached in the portion 3.
- the display device is mounted in a working station in which the non-metallic surfaces of the conductive paths 4 are activated, so that a chemical metallization bath can be used. Activation is effected by immersing the portion 3 in a bath which contains, for example, PdCl 2 /SnCl 2 .
- a bath is commercially available from Schlotter under the trade name of "Dynaplate Aktivator".
- FIG. 2 schematically shows the immersion of the display device 1 in a bath 6.
- the display device is immersed only until the bath surface 7 coincides with the separating line between the display portion 2 and the portion 3.
- the entire display device, or the portion 3 is immersed in a conditioning bath, which is commercially available, for example, from Schlotter under the trade name of "Dynaplate Conditioner".
- the glass surface of the substrate in the portion 3 is also activated to a minor extent.
- it is immersed in a bath which contains fluoride ions.
- the surface layer on the glass is etched away.
- a 0.1 to 5 weight percent solution of hydrofluoric acid in water is used since this does not corrode the conductive paths 4.
- a 0.8 to 1.2 weight percent solution of hydrofluoric acid in water is particularly suitable.
- the metallization step is performed with the help of a chemical metallization bath, for example the bath which is commercially available from Schering under the trade name of "Novotect", by which, for example, a nickel layer is deposited on the conductive paths 4.
- the display device 1 is immersed in the metallization bath in a similar working station as the one shown in FIG. 2.
- the nickel layer thus deposited has a thickness of about 0.2 to 1 ⁇ m.
- the components 5 are mounted on the portion 3 and their connections are connected to the conductive paths 4 by solder or adhesive, so as to give a display device which forms a unit together with the components.
Abstract
To deposit a solderable metal layer on conductive paths (4) of ITO on substrates of display devices (1) by an electroless method, the conductive paths are activated, prior to the deposition, and the areas not covered by the conductive paths are subsequently inactivated. The activated paths are then metallized with a solderable metal layer so that integrated circuits can be soldered to the metallized conductive paths.
Description
The present invention pertains to a method of depositing a solderable metal layer by an electroless method on transparent conductive paths of indium tin oxide on substrates as set forth in the preamble of claim 1.
German Patent No. 28 07 350 discloses a liquid-crystal display device which has a glass substrate as a support for the display device and for an integrated circuit (IC chip). The substrate supports transparent conductive paths of indium oxide. The solderable metal layer of these conductive paths in the invisible part of the display device is effected by depositing two chromium-containing intermediate layers prior to the application of a gold layer. Five layers of chromium, copper, gold, copper and lead tin, respectively, are provided on the IC chip as a bonding layer. The metallization of the conductive paths, i.e., the deposition of the layers, is effected by an evaporation or sputtering process. These methods involve a great amount of energy and are technically complex.
DE-AS No. 23 02 194 describes the manufacture of thin-film circuits by a photoetching technique in which a thin intermediate or adhesion-improving layer and an upper noble-metal layer are deposited on a substrate. The layers can be deposited by evaporation, sputtering or chemical deposition.
DE-AS No. 25 09 912 discloses an electronic thin-film circuit with a substrate plate made of insulating material. The method of making the thin-film circuit includes the steps of depositing a nickel layer on a copper layer and a gold layer on the nickel layer by electroless techniques.
It is the object of the invention to provide a simpler method of depositing a solderable metal layer by an electroless method on transparent conductive paths of indium tin oxide on substrates of the kind mentioned above.
This object is achieved by activating the surface of the conductive paths by immersing the substrate in a bath of palladium chloride and tin chloride, then deactivating the areas not covered by the conductive paths by immersing the substrate in hydrofluoric acid, and by finally depositing the metal layer by an electroless method. Further advantageous features of the invention are set forth in subclaims 2 to 6.
The invention will now be described with the help of the accompanying drawings, in which:
FIG. 1 is a top plan view of a display device, and
FIG. 2 shows the partial immersion of the display device in a bath.
The display device 1 shown in FIG. 1 has a display portion 2 and a portion 3 which will be invisible in the later built-up condition of the display device. The display portion has, e.g., a liquid-crystal display (not shown) which is supported on a substrate such as glass. This is also the material of the portion 3, where it supports conductive paths 4 leading to components 5, such as integrated circuits, and to connections 8 of the display device 1. The connections of the components 5 are connected to the conductive paths 4 by solder or by a conductive adhesive. It is important for this connection of the components 5 with the conductive paths 4 that the conductive paths have a suitable metal layer.
The electrodes present in the display portion 2 of the display device 1 have a transparent, conductive layer of indium tin oxide. The conductive paths 4 in the portion 3 are made of the same material, since the electrodes in the display portion 2 and the conductive paths 4 in the portion 3 can then be produced simultaneously. However, since conductive paths of indium tin oxide do not have a solderable surface, they must be metallized.
The display portion 2 of the display device 1 is manufactured and checked. In this condition, the manufactured and tested display devices do not yet have components 5 attached in the portion 3. In order for the conductive paths 4 to be metallized, the display device is mounted in a working station in which the non-metallic surfaces of the conductive paths 4 are activated, so that a chemical metallization bath can be used. Activation is effected by immersing the portion 3 in a bath which contains, for example, PdCl2 /SnCl2. Such a bath is commercially available from Schlotter under the trade name of "Dynaplate Aktivator".
FIG. 2 schematically shows the immersion of the display device 1 in a bath 6. The display device is immersed only until the bath surface 7 coincides with the separating line between the display portion 2 and the portion 3.
Subsequently, it will be necessary to remove excess palladium compounds and tin compounds in a conditioning step. To this end, the entire display device, or the portion 3, is immersed in a conditioning bath, which is commercially available, for example, from Schlotter under the trade name of "Dynaplate Conditioner".
During activation of the conductive paths 4, the glass surface of the substrate in the portion 3 is also activated to a minor extent. To deactivate the glass surface in the portion 3 again, it is immersed in a bath which contains fluoride ions. In the process, the surface layer on the glass is etched away. Preferably, a 0.1 to 5 weight percent solution of hydrofluoric acid in water is used since this does not corrode the conductive paths 4. A 0.8 to 1.2 weight percent solution of hydrofluoric acid in water is particularly suitable.
Following this pretreatment, the metallization step is performed with the help of a chemical metallization bath, for example the bath which is commercially available from Schering under the trade name of "Novotect", by which, for example, a nickel layer is deposited on the conductive paths 4. The display device 1 is immersed in the metallization bath in a similar working station as the one shown in FIG. 2. The nickel layer thus deposited has a thickness of about 0.2 to 1 μm.
The following is a typical bath composition for the deposition of nickel:
30 g/l of NiCl2 ×6 H2 O
10 g/l of NaH2 PO2
100 g/l of sodium citrate
50 g/l of NH4 Cl
pH: 8-10.
After metallization of the portion 3 as described above, the components 5 are mounted on the portion 3 and their connections are connected to the conductive paths 4 by solder or adhesive, so as to give a display device which forms a unit together with the components.
Claims (6)
1. Method of depositing a solderable metal layer by an electroless method on transparent conductive paths of indium tin oxide disposed over that portion of a substrate which is invisible in finished display devices, characterized in that the surface of the conductive paths (4) is activated by immersing the substrate in a bath of palladium chloride and tin chloride, that the areas not covered by the conductive paths (4) are then deactivated by immersing the substrate in a bath containing fluoride ions, and that the metal layer is finally formed by electroless deposition.
2. A method as claimed in claim 1, characterized in that during the activation of the conductive paths tin compounds are formed and after the activation of the conductive paths, said tin compounds which have not been reduced are removed.
3. A method as claimed in claim 2, characterized in that the tin compounds are removed by immersing the substrate in a conditioning bath.
4. A method as claimed in claim 1, characterized in that the bath containing fluoride ions used for the deactivation contains hydrofluoric acid.
5. A method as claimed in claim 4, characterized in that a 0.1 to 5 weight percent solution of hydrofluoric acid in water is used.
6. A method as claimed in claim 5, characterized in that a 0.8 to 1.2 weight percent solution of hydrofluoric acid in water is used.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3705251 | 1987-02-19 | ||
| DE19873705251 DE3705251A1 (en) | 1987-02-19 | 1987-02-19 | METHOD FOR PRODUCING A CURRENTLY DEPOSITABLE, SOLBABLE METAL LAYER |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| US4824693A true US4824693A (en) | 1989-04-25 |
Family
ID=6321303
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US07/157,933 Expired - Fee Related US4824693A (en) | 1987-02-19 | 1988-02-19 | Method for depositing a solderable metal layer by an electroless method |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4824693A (en) |
| EP (1) | EP0279432B1 (en) |
| JP (1) | JPS6456876A (en) |
| DE (2) | DE3705251A1 (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5384154A (en) * | 1991-06-12 | 1995-01-24 | U.S. Philips Corporation | Method of selectively providing a pattern of a material other than glass on a glass substrate by electroless metallization |
| US5515604A (en) * | 1992-10-07 | 1996-05-14 | Fujitsu Limited | Methods for making high-density/long-via laminated connectors |
| US6238749B1 (en) * | 1993-10-11 | 2001-05-29 | U.S. Philips Corporation | Method of providing a metal pattern on an electrically insulating substrate in an electroless process |
| US6335626B1 (en) * | 1997-08-21 | 2002-01-01 | Pac Tech - Packaging Technologies Gmbh | Method and device for determining a parameter for a metallization bath |
| US6355301B1 (en) * | 2000-11-02 | 2002-03-12 | 3M Innovative Properties Company | Selective fiber metallization |
| US20050118436A1 (en) * | 2002-04-23 | 2005-06-02 | Bhangale Sunil M. | Method for electroless deposition of a metal layer on selected portions of a substrate |
| WO2015138274A2 (en) | 2014-03-11 | 2015-09-17 | Macdermid Acumen, Inc. | Electroplating of metals on conductive oxide substrates |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4035362A1 (en) * | 1990-11-07 | 1992-05-14 | Licentia Gmbh | LCD support panel with improved electrode structure - uses internal electrodes of indium, tin and palladium oxide(s) and an external array strengthened by additional metal deposition |
| DE4035360A1 (en) * | 1990-11-07 | 1992-05-14 | Licentia Gmbh | Liquid crystal display cell - has precious metal layer overlying conductor path pattern carried by projecting part of larger surface area plate |
| DE4220621A1 (en) * | 1992-06-24 | 1994-01-05 | Daimler Benz Ag | Electroless chemical prodn. of metal layer on substrate - comprises forming palladium@ layer before metallising and producing tin oxide on substrate |
| JP3361717B2 (en) * | 1997-04-17 | 2003-01-07 | 株式会社日立製作所 | Method for forming electrode of semiconductor device |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3041198A (en) * | 1960-10-14 | 1962-06-26 | Philco Corp | Electroless plating process |
| GB1042816A (en) * | 1964-06-15 | 1966-09-14 | Ibm | Improvements in or relating to the production of metallic coatings upon the surfacesof other materials |
| US4321283A (en) * | 1979-10-26 | 1982-03-23 | Mobil Tyco Solar Energy Corporation | Nickel plating method |
| US4478690A (en) * | 1981-12-31 | 1984-10-23 | U.S. Philips Corporation | Method of partially metallizing electrically conductive non-metallic patterns |
| US4666078A (en) * | 1982-04-20 | 1987-05-19 | Seiko Epson Kabushiki Kaisha | Electroless plated terminals of display panel |
| US4726965A (en) * | 1985-10-16 | 1988-02-23 | Standard Elektrik Lorenz Ag | Metallizing transparent conductive paths |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE627914A (en) * | ||||
| DE2807350C2 (en) * | 1977-03-02 | 1983-01-13 | Sharp K.K., Osaka | Liquid crystal display device in a package with an integrated circuit |
| HU184308B (en) * | 1980-07-04 | 1984-08-28 | Bacsmegyei Allami Epitoeipari | Process for coating glas threads with metal-glas |
| DE3326253A1 (en) * | 1983-07-21 | 1985-01-31 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | METHOD FOR METALLIZING A SOLID BODY |
-
1987
- 1987-02-19 DE DE19873705251 patent/DE3705251A1/en not_active Withdrawn
-
1988
- 1988-02-18 EP EP88102319A patent/EP0279432B1/en not_active Expired - Lifetime
- 1988-02-18 JP JP63036440A patent/JPS6456876A/en active Granted
- 1988-02-18 DE DE8888102319T patent/DE3870911D1/en not_active Expired - Lifetime
- 1988-02-19 US US07/157,933 patent/US4824693A/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3041198A (en) * | 1960-10-14 | 1962-06-26 | Philco Corp | Electroless plating process |
| GB1042816A (en) * | 1964-06-15 | 1966-09-14 | Ibm | Improvements in or relating to the production of metallic coatings upon the surfacesof other materials |
| US4321283A (en) * | 1979-10-26 | 1982-03-23 | Mobil Tyco Solar Energy Corporation | Nickel plating method |
| US4478690A (en) * | 1981-12-31 | 1984-10-23 | U.S. Philips Corporation | Method of partially metallizing electrically conductive non-metallic patterns |
| US4666078A (en) * | 1982-04-20 | 1987-05-19 | Seiko Epson Kabushiki Kaisha | Electroless plated terminals of display panel |
| US4726965A (en) * | 1985-10-16 | 1988-02-23 | Standard Elektrik Lorenz Ag | Metallizing transparent conductive paths |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5384154A (en) * | 1991-06-12 | 1995-01-24 | U.S. Philips Corporation | Method of selectively providing a pattern of a material other than glass on a glass substrate by electroless metallization |
| US5515604A (en) * | 1992-10-07 | 1996-05-14 | Fujitsu Limited | Methods for making high-density/long-via laminated connectors |
| US6238749B1 (en) * | 1993-10-11 | 2001-05-29 | U.S. Philips Corporation | Method of providing a metal pattern on an electrically insulating substrate in an electroless process |
| US6335626B1 (en) * | 1997-08-21 | 2002-01-01 | Pac Tech - Packaging Technologies Gmbh | Method and device for determining a parameter for a metallization bath |
| US6355301B1 (en) * | 2000-11-02 | 2002-03-12 | 3M Innovative Properties Company | Selective fiber metallization |
| WO2002036852A2 (en) * | 2000-11-02 | 2002-05-10 | 3M Innovative Properties Company | Selective fiber metallization |
| WO2002036852A3 (en) * | 2000-11-02 | 2003-02-20 | 3M Innovative Properties Co | Selective fiber metallization |
| US20050118436A1 (en) * | 2002-04-23 | 2005-06-02 | Bhangale Sunil M. | Method for electroless deposition of a metal layer on selected portions of a substrate |
| CN100359045C (en) * | 2002-04-23 | 2008-01-02 | 新加坡科技研究局 | Method for electroless deposition of a metal layer on selected portions of a substrate |
| WO2015138274A2 (en) | 2014-03-11 | 2015-09-17 | Macdermid Acumen, Inc. | Electroplating of metals on conductive oxide substrates |
| US9783901B2 (en) | 2014-03-11 | 2017-10-10 | Macdermid Acumen, Inc. | Electroplating of metals on conductive oxide substrates |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0279432A2 (en) | 1988-08-24 |
| JPH022948B2 (en) | 1990-01-19 |
| DE3870911D1 (en) | 1992-06-17 |
| JPS6456876A (en) | 1989-03-03 |
| DE3705251A1 (en) | 1988-09-01 |
| EP0279432B1 (en) | 1992-05-13 |
| EP0279432A3 (en) | 1990-05-09 |
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