US7692971B2 - Non-volatile multilevel memory cell programming - Google Patents

Non-volatile multilevel memory cell programming Download PDF

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US7692971B2
US7692971B2 US12/038,445 US3844508A US7692971B2 US 7692971 B2 US7692971 B2 US 7692971B2 US 3844508 A US3844508 A US 3844508A US 7692971 B2 US7692971 B2 US 7692971B2
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voltage
programming
pvfy
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Violante Moschiano
Giovanni Santin
Tommaso Vali
Massimo Rossini
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Micron Technology Inc
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Priority to CN2008800099166A priority Critical patent/CN101652815B/en
Priority to PCT/US2008/004114 priority patent/WO2008121351A1/en
Priority to KR1020097020150A priority patent/KR101117413B1/en
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5628Programming or writing circuits; Data input circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0483Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells having several storage transistors connected in series
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/10Programming or data input circuits
    • G11C16/12Programming voltage switching circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/30Power supply circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3404Convergence or correction of memory cell threshold voltages; Repair or recovery of overerased or overprogrammed cells
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/06Auxiliary circuits, e.g. for writing into memory
    • G11C16/34Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
    • G11C16/3436Arrangements for verifying correct programming or erasure
    • G11C16/3468Prevention of overerasure or overprogramming, e.g. by verifying whilst erasing or writing
    • G11C16/3486Circuits or methods to prevent overprogramming of nonvolatile memory cells, e.g. by detecting onset or cessation of current flow in cells and using the detector output to terminate programming
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2211/00Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C2211/56Indexing scheme relating to G11C11/56 and sub-groups for features not covered by these groups
    • G11C2211/562Multilevel memory programming aspects
    • G11C2211/5621Multilevel programming verification
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2211/00Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C2211/56Indexing scheme relating to G11C11/56 and sub-groups for features not covered by these groups
    • G11C2211/562Multilevel memory programming aspects
    • G11C2211/5625Self-converging multilevel programming

Definitions

  • the present disclosure relates generally to semiconductor devices and, more particularly, to memory devices having non-volatile memory cells.
  • RAM random-access memory
  • ROM read only memory
  • DRAM dynamic random access memory
  • SDRAM synchronous dynamic random access memory
  • flash memory among others.
  • Flash memory devices are utilized as non-volatile memory for a wide range of electronic applications. Flash memory devices typically use a one-transistor memory cell that allows for high memory densities, high reliability, and low power consumption.
  • Flash memory examples include memory for personal computers, personal digital assistants (PDAs), digital cameras, and cellular telephones.
  • Program code and system data such as a basic input/output system (BIOS) are typically stored in flash memory devices. This information can be used in personal computer systems, among others.
  • BIOS basic input/output system
  • NAND flash memory array architecture
  • NOR NOR
  • a NAND array architecture arranges its array of floating gate memory cells in a matrix such that the gates of each floating gate memory cell of the array are coupled by rows to word select lines. However each memory cell is not directly coupled to a column bit line by its drain. Instead, the memory cells of the array are coupled together in series, source to drain, between a source line and a column bit line.
  • Memory cells in a NAND array architecture can be configured, e.g., programmed, to a desired state. That is, electric charge can be placed on or removed from the floating gate of a memory cell to put the cell into a number of stored states.
  • a single level cell SLC
  • Flash memory cells can also store more than two binary states, e.g., 1111, 0111, 0011, 1011, 1001, 0001, 0101, 1101, 1100, 0100, 0000, 1000, 1010, 0010, 0110, and 1110.
  • Such cells may be referred to as multi state memory cells, multibit cells, or multilevel cells (MLCs).
  • MLCs can allow the manufacture of higher density memories without increasing the number of memory cells since each cell can represent more than one bit.
  • MLCs can have more than one programmed state, e.g., a cell capable of representing four bits can have fifteen programmed states and an erased state.
  • the state of a memory cell is determined by the threshold voltage (Vt).
  • Vt threshold voltage
  • a Vt of 0.5V can indicate a programmed cell while a Vt of ⁇ 0.5V might indicate an erased cell.
  • a MLC includes multiple Vt windows that can each indicate a different state.
  • Vt distributions be sufficiently spaced apart so as to reduce the possibility of a higher voltage of one distribution overlapping a lower Vt of the next distribution.
  • the overlap can occur due to factors such as noise, floating gate coupling, or temperature variations of the integrated circuit, among various other factors.
  • One way to create larger gaps between the various Vt distributions is to make the distributions themselves narrower. This can be difficult because memory cells program at different rates, e.g., Vts increase at varying rates, due to factors such as manufacturing process variations and/or repeated programming and erasing, among other factors.
  • a fast cell can have a higher threshold voltage than a slow cell, for a given programming period. Therefore, faster memory cells may be programmed before the slower cells since the faster cells can require fewer programming pulses. This can result in the Vt distribution for the faster cells being different than the Vt distribution for slower cells and/or closer to other Vt distributions due to the wider Vt distributions that can be created by faster cells.
  • Tanaka et al. disclose a two-step programming method that uses first and second step verify voltages. Once a Vt for a memory cell being programmed reaches the first step verify voltage, a write control voltage is changed for all cells being programmed. This method can slow down the programming of all the memory cells, which can reduce programming throughput. That is, reducing the programming speed of all of the cells being programmed increases the time it takes to program all of the cells, whether the cells are fast cells or slow cells.
  • Another method that may be used to create narrower Vt distributions is to adjust the programming pulse step voltage as the cell Vt approaches a programmed state.
  • this also can reduce programming throughput by requiring more programming pulses, e.g., due to a smaller incremented pulse step, which can slow the programming for all of the cells.
  • FIG. 1 is a schematic of a portion of a non-volatile memory array that can be programmed according to embodiments of the present disclosure.
  • FIG. 2 illustrates a diagram of Vt distributions each having an associated verify voltage and a number of pre-verify voltages according to an embodiment of the present disclosure.
  • FIG. 3 illustrates a flowchart of a programming method according to an embodiment of the present disclosure.
  • FIG. 4A illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with a prior programming method.
  • FIG. 4B illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with the programming embodiment of FIG. 3 .
  • FIG. 5A illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with a selective slow programming convergence method.
  • FIG. 5B illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with the programming embodiment of FIG. 3 .
  • FIG. 6 is a functional block diagram of an electronic memory system having at least one memory device in accordance with an embodiment of the present disclosure.
  • FIG. 7 is a functional block diagram of a memory module having at least one memory device in accordance with an embodiment of the present disclosure.
  • Embodiments of the present disclosure provide methods, devices, modules, and systems for programming multilevel non-volatile multilevel memory cells.
  • One method includes increasing a threshold voltage (Vt) for each of a number of memory cells until the Vt reaches a verify voltage (VFY) corresponding to a program state among a number of program states.
  • the method includes determining whether the Vt of each of the cells has reached a pre-verify voltage (PVFY) associated with the program state, selectively biasing bit lines coupled to those cells whose Vt has reached the PVFY, adjusting the PVFY to a different level, and selectively biasing bit lines coupled to cells whose Vt has reached the adjusted PVFY, wherein the PVFY and the adjusted PVFY are less than the VFY.
  • Vt threshold voltage
  • VFY verify voltage
  • PVFY pre-verify voltage
  • bit lines coupled to cells whose Vt has reached the PVFY or the adjusted PVFY are selectively biased with a voltage greater than a programming bit line voltage and less than an inhibit voltage.
  • selectively biasing the bit lines slows the programming rate, e.g., the cell Vt shift per programming pulse, of cells coupled to the bit lines until the cell reaches the VFY corresponding to a particular program state.
  • the PVFY is incremented on a pulse by pulse basis until a particular threshold PVFY is reached. Adjusting the PVFY on a pulse by pulse basis in this manner can result in narrow Vt distributions by slowing the programming rate of fast cells more efficiently than prior programming methods, while improving programming throughput.
  • a number of programming pulses are incremented by a step voltage from a first programming voltage to a threshold programming voltage.
  • the threshold programming voltage can be an uppermost programming voltage.
  • the bit line voltage to be selectively applied to bit lines coupled to the cells in response to their Vt reaching the threshold PVFY can be modulated, e.g., decreased.
  • the bit line voltage is decremented after each of a number of programming pulses, subsequent to the first number of programming pulses, until the bit line voltage to be selectively applied to bit lines coupled to cells in response to their Vt reaching the threshold PVFY reaches the programming bit line voltage.
  • the bit line voltage to be selectively applied to bit lines coupled to cells in response to the Vt of the cells reaching the PVFY can be referred to as a selective slow programming convergence (SSPC) voltage.
  • the SSPC voltage is modulated only after the programming pulses have reached the uppermost programming pulse voltage. Modulating the SSPC voltage after a number of programming pulses at the uppermost voltage level can increase programming throughput by reducing and/or eliminating the effect of the SSPC voltage on slow cells, which reduces the number of subsequent programming pulses, e.g., reduces the time, for the slower cells to reach the VFY level once they have reached the PVFY level.
  • FIG. 1 is a schematic of a portion of a non-volatile memory array 100 that can be programmed according to embodiments of the present disclosure.
  • the embodiment shown in FIG. 1 illustrates a NAND architecture non-volatile memory.
  • the memory array 100 includes word lines 105 - 1 , . . . , 105 -N and intersecting bit lines 107 - 1 , . . . , 107 -M.
  • the number of word lines 105 - 1 , . . . , 105 -N and the number of bit lines 107 - 1 , . . . , 107 -M are each some power of two, e.g., 256 word lines by 4,096 bit lines.
  • Memory array 100 includes NAND strings 109 - 1 , . . . , 109 -M.
  • Each NAND string includes non-volatile memory cells 111 - 1 , . . . , 111 -N, each located at an intersection of a word line 105 - 1 , . . . , 105 -N and a local bit line 107 - 1 , . . . , 107 -M.
  • Source select gate 113 is located at the intersection of a local bit line 107 - 1 and a source select line 117 while drain select gate 119 is located at the intersection of a local bit line 107 - 1 and a drain select line 115 .
  • a source of source select gate 113 is connected to a common source line 123 .
  • the drain of source select gate 113 is connected to the source of the memory cell 111 - 1 of the corresponding NAND string 109 - 1 .
  • the drain of drain select gate 119 is connected to the local bit line 107 - 1 for the corresponding NAND string 109 - 1 at drain contact 121 - 1 .
  • the source of drain select gate 119 is connected to the drain of the last memory cell 111 -N, e.g., floating-gate transistor, of the corresponding NAND string 109 - 1 .
  • construction of non-volatile memory cells, 111 - 1 , . . . , 111 -N includes a source, a drain, a floating gate or charge storage layer, and a control gate.
  • Non-volatile memory cells, 111 - 1 , . . . , 111 -N have their control gates coupled to a word line, 105 - 1 , . . . , 105 -N, respectively.
  • a column of the non-volatile memory cells, 111 - 1 , . . . , 111 -N make up the NAND strings, e.g., 109 - 1 , . . .
  • Embodiments of the present disclosure are not limited to a particular type of array architecture. For example, embodiments may also operate properly in NOR and/or AND architecture array. An AND array architecture would be similarly laid out except that the string of memory cells would be coupled in parallel between the select gates.
  • the word lines 105 - 1 , . . . , 105 -N select the individual floating gate memory cells 111 - 1 , . . . , 111 -N in the strings 109 - 1 , . . . , 109 -M to be written to or read from and operate the remaining, e.g., unselected, floating gate memory cells 111 - 1 , . . . , 111 -N in each string 109 - 1 , . . . , 109 -M in a pass through mode.
  • the selected word line for the memory cell to be programmed is biased with a series of incrementing voltage programming pulses that start at an initial voltage that is greater than a predetermined programming voltage, e.g., approximately 16V.
  • a verification operation with a word line voltage of 0V is performed to determine if the Vt of the cell has increased to the desired program level, e.g., 0.5V, 1.0V, 2.0V, among various other Vt levels that can correspond to a particular programmed state.
  • the unselected word lines for the remaining cells are typically biased at a voltage, e.g., a pass through voltage, that is less than the programming voltage, e.g., approximately 10V, during the program operation.
  • the unselected word line voltage is not limited to a particular pass through voltage.
  • the programming of the other memory cells occurs in a similar manner.
  • FIG. 2 illustrates a diagram of Vt distributions each having an associated verify voltage and a number of pre-verify voltages according to an embodiment of the present disclosure.
  • FIG. 2 shows a number of Vt distributions 210 , 220 , 230 , and 240 .
  • the distribution 210 is at a negative Vt level and corresponds to an erased state “11. ”
  • Vt distributions 220 , 230 , and 240 correspond to respective program states “10,” “00, ” and “01, ” in the example shown in FIG. 2 .
  • Each program distribution 220 , 230 , and 240 has an associated verify voltage (VFY) 225 , 235 , and 245 .
  • the VFY 225 indicates the Vt level above which a memory cell is considered to be programmed to the “10” state.
  • the VFY 235 indicates the Vt level above which a memory cell is considered to be programmed to the “00” state.
  • the VFY 245 indicates the Vt level above which a memory cell is considered to be programmed to the “01” state.
  • VFY 225 can be 0.4V
  • VFY 235 can be 1.2V
  • VFY 245 can be 2.2V.
  • each program state “10,” “00, ” and “01” has a number of associated pre-verify voltage (PVFY) levels. That is, program state “10” has associated PVFY levels 222 - 1 , 222 - 2 , . . . , 222 -N, program state “00” has associated PVFY levels 232 - 1 , 232 - 2 , . . . , 232 -N, and program state “01” has associated PVFY levels 242 - 1 , 242 - 2 , . . . , 242 -N.
  • PVFY pre-verify voltage
  • each of the PVFY levels associated with a particular program state is less than the VFY level for that state, e.g., each of PVFY levels 222 - 1 , 222 - 2 , . . . , 222 -N is less than VFY 225 .
  • the uppermost PVFY level e.g., 222 -N, 232 -N, 242 -N, are about 0.1V to 0.3V below the respective VFY level, e.g., 225 , 235 , 245 .
  • the rate at which the Vt of a cell being programmed increases can be slowed in response to the Vt reaching a PVFY level. That is, the bit line coupled to the cell can be biased with a voltage such that the Vt shift of the cell due to a subsequent programming pulse is reduced.
  • the PVFY level can be adjusted, e.g., modulated, on a pulse by pulse basis after each of a number of programming pulses applied to a cell being programmed to a particular state, e.g., to a Vt level within one of distributions 220 , 230 , and 240 .
  • each of the PVFY levels e.g., 222 - 1 , 222 - 2 , . . . , 222 -N, is increased after each of a number of programming pulses to an uppermost PVFY level, e.g., 222 -N.
  • 222 - 1 (PVFYp 1 ) is associated with a first programming pulse
  • 222 - 2 (PVFYp 2 ) is associated with a second programming pulse subsequent to the first
  • 222 -N (PVFYpN) is associated with a programming pulse subsequent to the first and second pulses.
  • the PVFYp 1 222 - 1 , 232 - 1 , 242 - 1 may be about 0.4V to 0.7V below the respective VFY 225 , 235 , 245 .
  • the PVFYp 2 222 - 2 , 232 - 2 , 242 - 2 may be about 0.3V to 0.6V below the respective VFY 225 , 235 , 245 .
  • the PVFY levels associated with each program state can be uniformly incremented on a pulse by pulse basis, e.g., the PVFY can be increased in 0.05V or 0.1V increments until the uppermost PVFY, e.g., PVFYpN, associated with the program state is reached.
  • the PVFY can be increased in 0.05V or 0.1V increments until the uppermost PVFY, e.g., PVFYpN, associated with the program state is reached.
  • Embodiments are not so limited.
  • PVFY levels associated with subsequent programming pulses are increased by a smaller step size than PVFY levels associated with prior programming pulses, e.g., PVFYp 2 can be 0.2V greater than PVFYp 1 , PVFYp 3 can be 0.1V greater than PVFYp 2 , and PFVYp 4 can be 0.05V greater than PVFYp 3 , etc.
  • adjusting the PVFY level associated with a particular program state e.g., “10,” “00, ” and “01, ” on a pulse by pulse basis can reduce and/or prevent fast cells, e.g., cells whose Vt shift between programming pulses is larger than a step voltage of the pulses, from being overprogrammed, e.g., from reaching a Vt level greater than the desired particular program state.
  • Cells programmed to Vt levels greater than the desired state result in a wider Vt distribution for the state and/or can result in data read errors.
  • Embodiments are not limited to the example shown in the diagram of FIG. 2 .
  • various programming methods of the present disclosure may be used to program memory cells having more than the quantity of states, e.g., Vt distributions, shown.
  • embodiments are not related to the particular binary coding of a Vt distribution but generally to the transition from a generic Vt distribution to a different distribution having a higher Vt.
  • the MLCs can have more than two bits thus necessitating additional distributions.
  • each state may be mapped to a different location. For example, state “10” may be mapped to the higher Vt distribution, e.g., 240 , and state “01” mapped to the lower Vt distribution, e.g., 220 .
  • FIG. 3 illustrates a flowchart of a programming method according to an embodiment of the present disclosure.
  • the programming method is a modulated selective slow programming convergence method.
  • An example of a selective slow programming convergence method is described in copending, commonly assigned U.S. patent application Ser. No. 11/414,982, entitled “Selective Slow Programming Convergence in a Flash Memory Device,” filed on May 1, 2006, which is incorporated herein by reference.
  • a command is received to write data to, e.g., to program, one or more memory cells.
  • the data may be a single bit or multiple bits.
  • a programming pulse is generated and applied to the selected word line.
  • a program verify operation is then performed 305 to determine if the cell has been properly programmed 307 , e.g., to determine if the Vt of the cell has reached the corresponding VFY for the state.
  • the verify operation is simply a read of the cell to determine its contents and a comparison of the read data with the desired data.
  • the bit line voltage (VBL) is increased from a programming bit line voltage, e.g., 0V, used during programming to a supply voltage such as Vcc, e.g., 1V, 2V, or 3V, among various other bit line voltages that inhibit cells coupled thereto from being further programmed. That is, the VBL can be increased to various voltages that prevent the Vt of a memory cell coupled thereto from shifting further upward in response to subsequent programming pulses applied to the selected word line.
  • Vcc e.g. 1V, 2V, or 3V
  • the Vt for the cell is checked 309 to determine if it has reached a first PVFY level, e.g., PVFYp 1 222 - 1 , 232 - 1 , 242 - 2 as shown in FIG. 2 , for that particular state.
  • a first PVFY level e.g., PVFYp 1 222 - 1 , 232 - 1 , 242 - 2 as shown in FIG. 2
  • each state can have number of associated PVFY levels, e.g., 222 - 1 to 222 -N, 232 - 1 to 232 -N, and 242 - 1 to 242 -N shown in FIG. 2 .
  • each state can have number of associated PVFY levels, e.g., 222 - 1 to 222 -N, 232 - 1 to 232 -N, and 242 - 1 to 242 -N shown in FIG. 2 .
  • the PVFY is a modulated PVFY that is adjusted on a pulse by pulse basis. That is, the PVFY level to which the memory cell's Vt is compared, varies over a number of programming pulses.
  • the particular PVFY to which the cell's Vt is compared changes, e.g., increases, after each pulse until the uppermost PVFY, e.g., 222 -N, 232 -N, 242 -N, is reached.
  • the PVFY level is a voltage less than the associated VFY level for each particular program state, e.g., each PVFY level 222 - 1 to 222 -N, 232 - 2 to 232 -N, and 242 - 2 to 242 -N is less than the respective VFY level 225 , 235 , and 245 as shown in FIG. 2 .
  • the PVFY level is the voltage at which programming of a particular cell is slowed down in response to the Vt for that particular cell reaching that PVFY level. That is, the bit line is biased with a voltage less than the inhibit voltage and greater than the programming bit line voltage such that the Vt of the particular cell increases at a slower rate for a number of subsequent programming pulses.
  • the biasing voltage to which bit lines are adjusted in response to a cell coupled thereto reaching the PVFY level can be referred to as a selective slow programming convergence (SSPC) voltage.
  • the bit line voltage VBL is adjusted to the SSPC level for cells that reach the PVFY level 309 .
  • various values for the SSPC voltage can be used, e.g., 0.3V, 0.5V, 0.9V, among various other voltage levels and/or ranges of levels that can be applied to a bit line to slow the programming rate of a memory cell.
  • the biasing of the bit line reduces the voltage drop across the memory cell transistor, thus reducing the effective programming voltage applied to the cell.
  • the SSPC voltage can be a modulated SSPC voltage which may be decreased over a number of programming pulses.
  • various method embodiments of the present disclosure selectively slow the programming of each cell that has passed a modulated pre-verify threshold voltage for the particular state being programmed into the cell.
  • Other cells being programmed are unaffected by SSPC bit line biasing and are allowed to be programmed at their normal programming speed. Therefore, the modulated selective slow programming method described in the embodiment of FIG. 2 can have the effect of narrowing the Vt distributions associated with particular program states without reducing the programming throughput.
  • using a modulated PVFY in various modulated selective slow programming method embodiments can prevent fast cells, e.g., cells having Vts which increase by larger voltage step than the programming pulse step voltage, from becoming overprogrammed and/or widening a Vt distribution.
  • modulating, e.g., decreasing, the SSPC voltage when an uppermost programming pulse voltage is reached can improve throughput by reducing the number of pulses necessary to shift the Vts of slower cells to the VFY level once the slower cells have reached the PVFY level.
  • the programming process repeats by generating another programming pulse 303 .
  • subsequent programming pulses are incrementally larger than the previous pulse up to an uppermost programming pulse voltage level (Vmax).
  • the uppermost programming voltage level can be about 20V-22V, however, embodiments are not limited to a particular Vmax.
  • the programming pulses are increased by a 0.2V step voltage. This step voltage is for purposes of illustration only as embodiments of the present invention can use various step voltages to increase the programming pulse levels, e.g., 0.1V, 0.3V, 0.5V, among other step voltages.
  • the voltage drop across the memory cell transistor is reduced due to the VBL increase 311 . Therefore, the increased programming pulse voltage 312 will have a reduced effect on programming the cell. That is, the Vt shift of the cell due to the pulse is less than the Vt shift would have been in the absence of the SSPC voltage applied to the bit line, e.g., the cell's programming rate is slowed.
  • the programming of the particular cell to the particular state continues until the cell is programmed, e.g., until the cell's Vt reaches the VFY level for the particular state, at which point the VBL is increased to the inhibit voltage 315 to prevent any further Vt increase of the cell due to subsequent programming pulses.
  • the programming pulse generated at 303 does not result in the Vt of the cell reaching the pre-verify voltage level, e.g., PVFYp 1 in this case, then the process continues at blocks 313 , 316 , and 317 .
  • the programming pulse voltage is increased 313 by the step voltage if the Vmax has not been reached. This subsequent programming pulse is applied to the selected cell's word line.
  • the PVFY level is also adjusted, e.g., increased from PVFYp 1 to PVFYp 2 in this case.
  • the PVFY level is only increased if an uppermost PVFY, e.g., PVFYpN 222 -N, 232 -N, 242 -N as shown in FIG. 2 , has not been reached. That is, in various embodiments, the PVFY level remains at the uppermost PVFY level until a subsequent pulse causes the Vt of the cell to reach the uppermost PVFY level.
  • an uppermost PVFY e.g., PVFYpN 222 -N, 232 -N, 242 -N as shown in FIG. 2 .
  • the SSPC level is adjusted, e.g., modulated, if a threshold programming pulse level has been reached.
  • the threshold programming pulse level is the uppermost programming pulse voltage level, e.g., Vmax.
  • modulating, e.g., decreasing, the SSPC level can improve programming throughput of selective slow programming convergence for slower cells.
  • the modulated selective slow programming convergence process illustrated in FIG. 3 repeats until the pre-verify voltage level is reached 309 and the cell is eventually programmed 307 such that the bit line voltage VBL is increased to the inhibit voltage 315 .
  • the method illustrated in FIG. 3 can be performed on each cell, e.g., each bit, in a selective manner. For example, in various embodiments, instead of biasing the bit line of all cells when a cell's Vt has reached a pre-verify voltage, only as each cell's Vt reaches the pre-verify voltage is its particular bit line voltage increased, e.g., to the SSPC voltage, to slow the programming speed.
  • the bits may be located in the same page address or in multiple page addresses.
  • both bits can be changed at the same time.
  • a same page address programming process can go directly from the erased state of “11, ” e.g., distribution 210 shown in FIG. 2 , to a programmed state of “00, ” e.g., distribution 230 shown in FIG. 2 .
  • the multiple bits are in different page addresses, only one bit at a time is changed. For example, to go from the erased state of “11” to the programmed state of “00,” it is typically necessary to go through either state “10” or state “01, ” depending upon where these states are mapped.
  • the modulated selective slow programming convergence method embodiments of the present invention can operate to program bits located in the same page address or in multiple addresses.
  • FIG. 4A illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with a prior programming method.
  • FIG. 4B illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with the programming embodiment of FIG. 3 .
  • the plot of FIG. 4B shows the memory cell Vt levels and bit line voltages illustrated in FIG. 4A as modified by the programming embodiment described in FIG. 3 .
  • the lower plot illustrated in FIGS. 4A and 4B shows a number of programming pulses 415 with the voltage level of each pulse increasing by a step voltage, e.g., Vstep, along the bottom axis.
  • Vstep a step voltage
  • the illustrated embodiment uses a Vstep of 200 mV.
  • embodiments of the present disclosure are not limited to particular step voltage.
  • the plots shown in FIGS. 4A and 4B include memory cells that program at different rates, e.g., cells whose Vts shift differently in response to programming pulses 415 .
  • Cell 402 represents a “slower cell” having a Vt that generally shifts by an amount equal to or less than the programming pulse step Vstep, e.g., 200 mV in this example.
  • Cell 404 represents a “faster cell” having a Vt that generally shifts by an amount equal to or slightly greater than Vstep.
  • Cell 406 represents a cell (shown as Faster Cell+) that has a Vt that shifts by an amount greater than Vstep in response to programming pulses 415 .
  • the upward movement of the cells 402 , 404 , and 406 represents an increasing Vt.
  • the slower cell 402 is increasing by an amount DVt less than 200 mV
  • the faster cell 404 is increasing by an amount DVt about equal to 200 mV
  • the cell 406 is increasing by an amount DVt greater than 200 mV.
  • the Vt of cell 406 reaches the PVFY level before cell 404 , which reaches the PVFY level before cell 402 .
  • a bit line voltage e.g., a SSPC voltage
  • the slowed programming can produce a relatively narrow Vt distribution by preventing the Vt of cells from reaching levels substantially over the VFY level 425 .
  • the slowed programming rate of a cell is represented by a reduction in DVt, e.g., a reduction in the amount of a cell's Vt shift. For instance, in FIG.
  • the programming of the “Faster Cell+” 406 is not slowed because the Vt of the cell 406 shifts from a voltage level below PVFY 422 to a voltage level above VFY 425 after a next subsequent programming pulse 415 .
  • This can occur for cells such as cell 406 whose Vt shifts by an amount greater than the Vstep, e.g., a rate faster than 200 mV per pulse in this example.
  • cell 406 has been programmed such that its Vt is substantially above VFY 425 , which can result in overprogrammed cells and/or a wider than desirable Vt distribution for the particular program state.
  • an inhibit voltage e.g., Vcc
  • Vt increases
  • FIG. 4B illustrates the cells 402 , 404 , and 406 of FIG. 4A , after being programmed in accordance with a modulated selective slow programming convergence (MSSPC) method such as that described in connection with FIG. 3 .
  • the VFY 425 has a number of associated pre-verify levels PVFYp 1 , PVFYp 2 , . . . , PVFYpN such as described in connection with FIG. 2 .
  • VFY 425 can be the VFY associated with any number of states, e.g., one of VFY 225 , 235 , or 245 shown in FIG. 2 .
  • PVFYp 1 , PVFYp 2 , . . . , PVFYpN can be respective PVFY levels 222 - 1 to 222 -N, 232 - 1 to 232 -N, and 242 - 1 to 242 -N as shown in FIG. 2 .
  • PVFYp 1 is the PVFY level to which the cell's Vt is compared after a first pulse, e.g., P 1
  • PVFYp 2 is the PVFY level to which the cell's Vt is compared after a second pulse, e.g., P 2
  • PVFYpN is the PVFY level to which the cell's Vt is compared after an Nth pulse.
  • the uppermost PVFY level PVFYpN is used after the third pulse, e.g., P 3 , embodiments are not so limited.
  • embodiments of the present disclosure can narrow Vt distributions and/or can prevent overprogramming caused by fast cells, e.g., 406 .
  • FIG. 4B illustrates that an adjusted PVFY level, e.g., a modulated PVFY level, can efficiently slow down the programming of fast cells such as cell 406 .
  • FIG. 4B shows the Vt of cell 406 having reached a PVFY level, e.g., PVFYp 1 , after pulse P 1 .
  • the Vt of cell 406 does not reach the unmodulated PVFY level 422 shown in FIG. 4A after pulse P 1 .
  • the bit line voltage VBL is changed from the programming bit line voltage, e.g., 0V, to the SSPC voltage.
  • the Vt shift of cell 406 is reduced from greater than Vstep, e.g., greater than 200 mV, to less than Vstep, e.g., less than 200 mV, such that the Vt shift of cell 406 is lowered for a number of subsequent pulses, e.g., P 2 , P 3 , P 4 , etc., until the Vt reaches the VFY level 425 .
  • the Vt shift of cell 406 remains greater than Vstep after pulse P 1 and becomes overprogrammed, e.g., greater than VFY level 425 , after pulse P 2 .
  • FIG. 5A illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with a prior selective slow programming convergence method.
  • the middle plot shown in FIGS. 5A and 5B illustrates a number of programming pulses including a number of programming pulses at an uppermost programming pulse voltage level, e.g., Vmax.
  • Vmax can be a voltage of about 20V-22V, but embodiments are not limited to a particular Vmax level.
  • the upper plot shown in FIG. 5A shows the Vt for a slow cell 502 after each of the number of programming pulses.
  • the Vt of slow cells e.g., cell 502
  • the Vt shift of the slow cells may be substantially less than the programming pulse step level.
  • the Vt shift for slow cells when the programming pulse voltage level reaches Vmax can be 50 mV or less.
  • the reduced Vt shift of such slow cells can reduce programming throughput since more pulses can be required for the Vt to reach the VFY level, e.g., a programmed level such as VFY 225 , 235 , and 245 shown in FIG. 2 .
  • the lower plot in FIG. 5A shows an SSPC voltage to be applied to bit lines coupled to memory cells whose Vt has reached the PVFY level.
  • the PVFY level shown in FIGS. 5A and 5B can be an uppermost PVFY level, e.g., PVFYpN, of a modulated PVFY such as that described above.
  • the PVFY shown in FIGS. 5A and 5B can be PVFYpN 222 -N, 232 -N, or 242 -N.
  • the Vt of slow cells can shift more slowly as a number of programming pulses having the Vmax level are applied thereto.
  • the slowed Vt shift can result in lower throughput as an increased number of pulses are required for the Vt of such cells to reach the proper VFY.
  • applying the SSPC voltage to bit lines coupled to slow cells in response to their Vt reaching the PVFY level can further reduce programming throughput as the Vt shift becomes even further reduced.
  • the above described effect can be seen in FIG. 5A as the Vt of slow cell 502 increases at a slower rate after its Vt reaches the PVFY level.
  • FIG. 5B illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with a modulated selective slow programming convergence method such as that illustrated in FIG. 3 .
  • FIG. 5B shows the Vt of the slow cells 502 of FIG. 5A after being programmed according to the modulated selective slow programming convergence method of FIG. 3 .
  • the SSPC voltage can be a modulated SSPC voltage, e.g., MSSPC as shown in FIG. 5B .
  • the modulated SSPC voltage is decreased from an uppermost SSPC voltage to a lowermost SSPC voltage over a number of programming pulses.
  • the uppermost SSPC voltage voltage can be various voltage levels below the inhibit voltage, e.g., Vcc, and above the programming bit line voltage, e.g., 0V.
  • the lowermost SSPC voltage can be various voltage levels below the uppermost voltage level.
  • the modulated SSPC voltage can be decremented from about 0.6V to 0V over a number of programming pulses.
  • a PVFY level is not used for verification operations after the modulated SSPC voltage has been decremented to the programming bit line voltage, e.g., 0V in this example.
  • the Vt of those cells whose Vt has not reached the PVFY level is no longer compared to a PVFY level. No longer comparing the cell Vt to a PVFY level, e.g., removing the PVFY from verification operations, can improve throughput since the cell's Vt is compared only to the VFY level if the PVFY is removed.
  • the SSPC voltage is maintained as an unmodulated voltage until the uppermost programming pulse voltage, e.g., Vmax, is reached. That is, the bias voltage applied to bit lines in response to the Vt of cells coupled thereto reaching the PVFY level, can remain at a voltage, e.g., 0.6V, until the programming pulse voltage has reached Vmax. Maintaining the SSPC voltage as an unmodulated voltage for a number of programming pulses, e.g., a number of initial incremented pulses, can create narrow Vt distributions by slowing the Vt increase rate of fast cells that reach a PVFY level and can improve throughput by reducing and/or eliminating the effect of the SSPC voltage for slow cells.
  • Vmax the uppermost programming pulse voltage
  • the modulated selective slow programming convergence method used in programming slow cell 502 in FIG. 5B causes the slow cell 502 to reach the VFY level faster than the method used to program slow cell 502 in FIG. 5A .
  • FIG. 6 is a functional block diagram of an electronic memory system 600 having at least one memory device 620 in accordance with an embodiment of the present disclosure.
  • Memory system 600 includes a processor 610 coupled to a non-volatile memory device 620 that includes a memory array 630 of non-volatile cells.
  • the memory system 600 can include separate integrated circuits or both the processor 610 and the memory device 620 can be on the same integrated circuit.
  • the processor 610 can be a microprocessor or some other type of controlling circuitry such as an application-specific integrated circuit (ASIC).
  • ASIC application-specific integrated circuit
  • the memory device 620 includes an array of non-volatile memory cells 630 , which can be floating gate flash memory cells with a NAND architecture.
  • the control gates of each row of memory cells are coupled with a word line, while the drain regions of the memory cells are coupled to bit lines.
  • the source regions of the memory cells are coupled to source lines, as the same has been illustrated in FIG. 1 .
  • the manner of connection of the memory cells to the bit lines and source lines depends on whether the array is a NAND architecture, a NOR architecture, and AND architecture, or some other memory array architecture.
  • FIG. 6 includes address circuitry 640 to latch address signals provided over I/O connections 662 through I/O circuitry 660 . Address signals are received and decoded by a row decoder 644 and a column decoder 646 to access the memory array 630 .
  • Address signals are received and decoded by a row decoder 644 and a column decoder 646 to access the memory array 630 .
  • the number of address input connections depends on the density and architecture of the memory array 630 and that the number of addresses increases with both increased numbers of memory cells and increased numbers of memory blocks and arrays.
  • the memory array 630 of non-volatile cells can include non-volatile multilevel memory cells programmed according to embodiments described herein.
  • the memory device 620 reads data in the memory array 630 by sensing voltage and/or current changes in the memory array columns using sense/buffer circuitry that in this embodiment can be read/latch circuitry 650 .
  • the read/latch circuitry 650 can be coupled to read and latch a row of data from the memory array 630 .
  • I/O circuitry 660 is included for hi-directional data communication over the I/O connections 662 with the processor 610 .
  • Write circuitry 655 is included to write data to the memory array 630 .
  • Control circuitry 670 decodes signals provided by control connections 672 from the processor 610 . These signals can include chip signals, write enable signals, and address latch signals that are used to control the operations on the memory array 630 , including data read, data write, and data erase operations. In various embodiments, the control circuitry 670 is responsible for executing instructions from the processor 610 to perform the operating and programming embodiments of the present disclosure.
  • the control circuitry 670 can be a state machine, a sequencer, or some other type of controller. It will be appreciated by those skilled in the art that additional circuitry and control signals can be provided, and that the memory device detail of FIG. 6 has been reduced to facilitate ease of illustration.
  • FIG. 7 is a functional block diagram of a memory module 700 having at least one memory device 710 in accordance with an embodiment of the present disclosure.
  • Memory module 700 is illustrated as a memory card, although the concepts discussed with reference to memory module 700 are applicable to other types of removable or portable memory (e.g., USB flash drives) and are intended to be within the scope of “memory module” as used herein.
  • memory module e.g., USB flash drives
  • FIG. 7 is a functional block diagram of a memory module 700 having at least one memory device 710 in accordance with an embodiment of the present disclosure.
  • Memory module 700 is illustrated as a memory card, although the concepts discussed with reference to memory module 700 are applicable to other types of removable or portable memory (e.g., USB flash drives) and are intended to be within the scope of “memory module” as used herein.
  • FIG. 7 although one example form factor is depicted in FIG. 7 , these concepts are applicable to other form factors as well.
  • memory module 700 will include a housing 705 (as depicted) to enclose one or more memory devices 710 , though such a housing is not essential to all devices or device applications. At least one memory device 710 includes an array of non-volatile multilevel memory cells programmed according to embodiments described herein. Where present, the housing 705 includes one or more contacts 715 for communication with a host device. Examples of host devices include digital cameras, digital recording and playback devices, PDAs, personal computers, memory card readers, interface hubs and the like. For some embodiments, the contacts 715 are in the form of a standardized interface. For example, with a USB flash drive, the contacts 715 might be in the form of a USB Type-A male connector.
  • the contacts 715 are in the form of a semi-proprietary interface, such as might be found on CompactFlashTM memory cards licensed by SanDisk Corporation, Memory StickTM memory cards licensed by Sony Corporation, SD Secure DigitalTM memory cards licensed by Toshiba Corporation and the like. In general, however, contacts 715 provide an interface for passing control, address and/or data signals between the memory module 700 and a host having compatible receptors for the contacts 715 .
  • the memory module 700 may optionally include additional circuitry 720 , which may be one or more integrated circuits and/or discrete components.
  • the additional circuitry 720 may include a memory controller for controlling access across multiple memory devices 710 and/or for providing a translation layer between an external host and a memory device 710 .
  • a memory controller could selectively couple an I/O connection (not shown in FIG. 7 ) of a memory device 710 to receive the appropriate signal at the appropriate I/O connection at the appropriate time or to provide the appropriate signal at the appropriate contact 715 at the appropriate time.
  • the communication protocol between a host and the memory module 700 may be different than what is required for access of a memory device 710 .
  • a memory controller could then translate the command sequences received from a host into the appropriate command sequences to achieve the desired access to the memory device 710 .
  • Such translation may further include changes in signal voltage levels in addition to command sequences.
  • the additional circuitry 720 may further include functionality unrelated to control of a memory device 710 such as logic functions as might be performed by an ASIC. Also, the additional circuitry 720 may include circuitry to restrict read or write access to the memory module 700 , such as password protection, biometrics or the like. The additional circuitry 720 may include circuitry to indicate a status of the memory module 700 . For example, the additional circuitry 720 may include functionality to determine whether power is being supplied to the memory module 700 and whether the memory module 700 is currently being accessed, and to display an indication of its status, such as a solid light while powered and a flashing light while being accessed. The additional circuitry 720 may further include passive devices, such as decoupling capacitors to help regulate power requirements within the memory module 700 .
  • Embodiments for programming non-volatile multilevel memory cells have been described.
  • Various embodiments for improved widths of Vt distributions while maintaining or improving programming throughput One embodiment accomplishes this by determining whether the Vt of each of the cells has reached a pre-verify voltage (PVFY) associated with the program state, selectively biasing bit lines coupled to those cells whose Vt has reached the PVFY, adjusting the PVFY to a different level, and selectively biasing bit lines coupled to cells whose Vt has reached the adjusted PVFY, wherein the PVFY and the adjusted PVFY are less than the VFY.
  • PVFY pre-verify voltage

Abstract

Embodiments of the present disclosure provide methods, devices, modules, and systems for programming multilevel non-volatile multilevel memory cells. One method includes increasing a threshold voltage (Vt) for each of a number of memory cells until the Vt reaches a verify voltage (VFY) corresponding to a program state among a number of program states. The method includes determining whether the Vt of each of the cells has reached a pre-verify voltage (PVFY) associated with the program state, selectively biasing bit lines coupled to those cells whose Vt has reached the PVFY, adjusting the PVFY to a different level, and selectively biasing bit lines coupled to cells whose Vt has reached the adjusted PVFY, wherein the PVFY and the adjusted PVFY are less than the VFY.

Description

TECHNICAL FIELD
The present disclosure relates generally to semiconductor devices and, more particularly, to memory devices having non-volatile memory cells.
BACKGROUND
Memory devices are typically provided as internal, semiconductor, integrated circuits in computers or other electronic devices. There are many different types of memory including random-access memory (RAM), read only memory (ROM), dynamic random access memory (DRAM), synchronous dynamic random access memory (SDRAM), and flash memory, among others.
Flash memory devices are utilized as non-volatile memory for a wide range of electronic applications. Flash memory devices typically use a one-transistor memory cell that allows for high memory densities, high reliability, and low power consumption.
Uses for flash memory include memory for personal computers, personal digital assistants (PDAs), digital cameras, and cellular telephones. Program code and system data, such as a basic input/output system (BIOS), are typically stored in flash memory devices. This information can be used in personal computer systems, among others.
Two common types of flash memory array architectures are the “NAND” and “NOR” architectures, so called for the logical form in which the basic memory cell configuration of each is arranged
A NAND array architecture arranges its array of floating gate memory cells in a matrix such that the gates of each floating gate memory cell of the array are coupled by rows to word select lines. However each memory cell is not directly coupled to a column bit line by its drain. Instead, the memory cells of the array are coupled together in series, source to drain, between a source line and a column bit line.
Memory cells in a NAND array architecture can be configured, e.g., programmed, to a desired state. That is, electric charge can be placed on or removed from the floating gate of a memory cell to put the cell into a number of stored states. For example, a single level cell (SLC) can represent two binary states, e.g., 1 or 0. Flash memory cells can also store more than two binary states, e.g., 1111, 0111, 0011, 1011, 1001, 0001, 0101, 1101, 1100, 0100, 0000, 1000, 1010, 0010, 0110, and 1110. Such cells may be referred to as multi state memory cells, multibit cells, or multilevel cells (MLCs). MLCs can allow the manufacture of higher density memories without increasing the number of memory cells since each cell can represent more than one bit. MLCs can have more than one programmed state, e.g., a cell capable of representing four bits can have fifteen programmed states and an erased state.
The state of a memory cell, e.g., the data stored in the cell, is determined by the threshold voltage (Vt). As an example, in a SLC, a Vt of 0.5V can indicate a programmed cell while a Vt of −0.5V might indicate an erased cell. A MLC includes multiple Vt windows that can each indicate a different state.
In MLCs, it is important that the Vt distributions be sufficiently spaced apart so as to reduce the possibility of a higher voltage of one distribution overlapping a lower Vt of the next distribution. The overlap can occur due to factors such as noise, floating gate coupling, or temperature variations of the integrated circuit, among various other factors. One way to create larger gaps between the various Vt distributions is to make the distributions themselves narrower. This can be difficult because memory cells program at different rates, e.g., Vts increase at varying rates, due to factors such as manufacturing process variations and/or repeated programming and erasing, among other factors.
A fast cell can have a higher threshold voltage than a slow cell, for a given programming period. Therefore, faster memory cells may be programmed before the slower cells since the faster cells can require fewer programming pulses. This can result in the Vt distribution for the faster cells being different than the Vt distribution for slower cells and/or closer to other Vt distributions due to the wider Vt distributions that can be created by faster cells.
One method to improve the above problems caused varying Vt rates of fast and slow memory cells is illustrated in U.S. Pat. No. 6,643,188 to Tanaka et al. and assigned to Toshiba and SanDisk Corporation. Tanaka et al. disclose a two-step programming method that uses first and second step verify voltages. Once a Vt for a memory cell being programmed reaches the first step verify voltage, a write control voltage is changed for all cells being programmed. This method can slow down the programming of all the memory cells, which can reduce programming throughput. That is, reducing the programming speed of all of the cells being programmed increases the time it takes to program all of the cells, whether the cells are fast cells or slow cells.
Another method that may be used to create narrower Vt distributions is to adjust the programming pulse step voltage as the cell Vt approaches a programmed state. However, this also can reduce programming throughput by requiring more programming pulses, e.g., due to a smaller incremented pulse step, which can slow the programming for all of the cells.
For the reasons stated above, and for other reasons stated below, which will become apparent to those skilled in the art upon reading and understanding the present disclosure, it can be beneficial to generate narrow memory cell Vt distributions while maintaining adequate programming throughput of a memory device.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a schematic of a portion of a non-volatile memory array that can be programmed according to embodiments of the present disclosure.
FIG. 2 illustrates a diagram of Vt distributions each having an associated verify voltage and a number of pre-verify voltages according to an embodiment of the present disclosure.
FIG. 3 illustrates a flowchart of a programming method according to an embodiment of the present disclosure.
FIG. 4A illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with a prior programming method.
FIG. 4B illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with the programming embodiment of FIG. 3.
FIG. 5A illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with a selective slow programming convergence method.
FIG. 5B illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with the programming embodiment of FIG. 3.
FIG. 6 is a functional block diagram of an electronic memory system having at least one memory device in accordance with an embodiment of the present disclosure.
FIG. 7 is a functional block diagram of a memory module having at least one memory device in accordance with an embodiment of the present disclosure.
DETAILED DESCRIPTION
Embodiments of the present disclosure provide methods, devices, modules, and systems for programming multilevel non-volatile multilevel memory cells. One method includes increasing a threshold voltage (Vt) for each of a number of memory cells until the Vt reaches a verify voltage (VFY) corresponding to a program state among a number of program states. The method includes determining whether the Vt of each of the cells has reached a pre-verify voltage (PVFY) associated with the program state, selectively biasing bit lines coupled to those cells whose Vt has reached the PVFY, adjusting the PVFY to a different level, and selectively biasing bit lines coupled to cells whose Vt has reached the adjusted PVFY, wherein the PVFY and the adjusted PVFY are less than the VFY.
In various embodiments, bit lines coupled to cells whose Vt has reached the PVFY or the adjusted PVFY are selectively biased with a voltage greater than a programming bit line voltage and less than an inhibit voltage. In such embodiments, selectively biasing the bit lines slows the programming rate, e.g., the cell Vt shift per programming pulse, of cells coupled to the bit lines until the cell reaches the VFY corresponding to a particular program state.
In various embodiments, the PVFY is incremented on a pulse by pulse basis until a particular threshold PVFY is reached. Adjusting the PVFY on a pulse by pulse basis in this manner can result in narrow Vt distributions by slowing the programming rate of fast cells more efficiently than prior programming methods, while improving programming throughput.
In various embodiments, a number of programming pulses are incremented by a step voltage from a first programming voltage to a threshold programming voltage. The threshold programming voltage can be an uppermost programming voltage. For those memory cells whose Vt has not reached the threshold PVFY prior to the programming voltage reaching the threshold programming voltage, the bit line voltage to be selectively applied to bit lines coupled to the cells in response to their Vt reaching the threshold PVFY can be modulated, e.g., decreased. In some embodiments, the bit line voltage is decremented after each of a number of programming pulses, subsequent to the first number of programming pulses, until the bit line voltage to be selectively applied to bit lines coupled to cells in response to their Vt reaching the threshold PVFY reaches the programming bit line voltage.
The bit line voltage to be selectively applied to bit lines coupled to cells in response to the Vt of the cells reaching the PVFY can be referred to as a selective slow programming convergence (SSPC) voltage. In various embodiments, the SSPC voltage is modulated only after the programming pulses have reached the uppermost programming pulse voltage. Modulating the SSPC voltage after a number of programming pulses at the uppermost voltage level can increase programming throughput by reducing and/or eliminating the effect of the SSPC voltage on slow cells, which reduces the number of subsequent programming pulses, e.g., reduces the time, for the slower cells to reach the VFY level once they have reached the PVFY level.
In the following detailed description of the present disclosure, reference is made to the accompanying drawings that form a part hereof, and in which is shown by way of illustration how various embodiments of the disclosure may be practiced. These embodiments are described in sufficient detail to enable those of ordinary skill in the art to practice the embodiments of this disclosure, and it is to be understood that other embodiments may be utilized and that process, electrical, or mechanical changes may be made without departing from the scope of the present disclosure.
FIG. 1 is a schematic of a portion of a non-volatile memory array 100 that can be programmed according to embodiments of the present disclosure. The embodiment shown in FIG. 1 illustrates a NAND architecture non-volatile memory. However, embodiments described herein are not limited to this example. As shown in FIG. 1, the memory array 100 includes word lines 105-1, . . . , 105-N and intersecting bit lines 107-1, . . . , 107-M. For ease of addressing in the digital environment, the number of word lines 105-1, . . . , 105-N and the number of bit lines 107-1, . . . , 107-M are each some power of two, e.g., 256 word lines by 4,096 bit lines.
Memory array 100 includes NAND strings 109-1, . . . , 109-M. Each NAND string includes non-volatile memory cells 111-1, . . . , 111-N, each located at an intersection of a word line 105-1, . . . , 105-N and a local bit line 107-1, . . . , 107-M. The non-volatile memory cells 111-1, . . . , 111-N of each NAND string 109-1, . . . , 109-M are connected in series source to drain between a source select gate (SGS), e.g., a field-effect transistor (FET) 113, and a drain select gate (SGD), e.g., FET 119. Source select gate 113 is located at the intersection of a local bit line 107-1 and a source select line 117 while drain select gate 119 is located at the intersection of a local bit line 107-1 and a drain select line 115.
As shown in the embodiment illustrated in FIG. 1, a source of source select gate 113 is connected to a common source line 123. The drain of source select gate 113 is connected to the source of the memory cell 111-1 of the corresponding NAND string 109-1. The drain of drain select gate 119 is connected to the local bit line 107-1 for the corresponding NAND string 109-1 at drain contact 121-1. The source of drain select gate 119 is connected to the drain of the last memory cell 111-N, e.g., floating-gate transistor, of the corresponding NAND string 109-1.
In various embodiments, construction of non-volatile memory cells, 111-1, . . . , 111-N, includes a source, a drain, a floating gate or charge storage layer, and a control gate. Non-volatile memory cells, 111-1, . . . , 111-N, have their control gates coupled to a word line, 105-1, . . . , 105-N, respectively. A column of the non-volatile memory cells, 111-1, . . . , 111-N, make up the NAND strings, e.g., 109-1, . . . , 109-M, coupled to a given local bit line, e.g., 107-1, . . . , 107-M, respectively. A row of the non-volatile memory cells are commonly coupled to a given word line, e.g., 105-1, . . . , 105-N. Embodiments of the present disclosure are not limited to a particular type of array architecture. For example, embodiments may also operate properly in NOR and/or AND architecture array. An AND array architecture would be similarly laid out except that the string of memory cells would be coupled in parallel between the select gates.
In operation, the word lines 105-1, . . . , 105-N select the individual floating gate memory cells 111-1, . . . , 111-N in the strings 109-1, . . . , 109-M to be written to or read from and operate the remaining, e.g., unselected, floating gate memory cells 111-1, . . . , 111-N in each string 109-1, . . . , 109-M in a pass through mode. During a prior art programming operation, the selected word line for the memory cell to be programmed is biased with a series of incrementing voltage programming pulses that start at an initial voltage that is greater than a predetermined programming voltage, e.g., approximately 16V. After each programming pulse, a verification operation with a word line voltage of 0V is performed to determine if the Vt of the cell has increased to the desired program level, e.g., 0.5V, 1.0V, 2.0V, among various other Vt levels that can correspond to a particular programmed state.
The unselected word lines for the remaining cells are typically biased at a voltage, e.g., a pass through voltage, that is less than the programming voltage, e.g., approximately 10V, during the program operation. The unselected word line voltage is not limited to a particular pass through voltage. The programming of the other memory cells occurs in a similar manner.
FIG. 2 illustrates a diagram of Vt distributions each having an associated verify voltage and a number of pre-verify voltages according to an embodiment of the present disclosure. FIG. 2 shows a number of Vt distributions 210, 220, 230, and 240. In this embodiment, the distribution 210 is at a negative Vt level and corresponds to an erased state “11. ” Vt distributions 220, 230, and 240 correspond to respective program states “10,” “00, ” and “01, ” in the example shown in FIG. 2.
Each program distribution 220, 230, and 240 has an associated verify voltage (VFY) 225, 235, and 245. The VFY 225 indicates the Vt level above which a memory cell is considered to be programmed to the “10” state. The VFY 235 indicates the Vt level above which a memory cell is considered to be programmed to the “00” state. The VFY 245 indicates the Vt level above which a memory cell is considered to be programmed to the “01” state. As an example, VFY 225 can be 0.4V, VFY 235 can be 1.2V, and VFY 245 can be 2.2V.
In various embodiments of the present disclosure, and as shown in FIG. 2, each program state “10,” “00, ” and “01” has a number of associated pre-verify voltage (PVFY) levels. That is, program state “10” has associated PVFY levels 222-1, 222-2, . . . , 222-N, program state “00” has associated PVFY levels 232-1, 232-2, . . . , 232-N, and program state “01” has associated PVFY levels 242-1, 242-2, . . . , 242-N.
In the embodiment shown in FIG. 2, each of the PVFY levels associated with a particular program state is less than the VFY level for that state, e.g., each of PVFY levels 222-1, 222-2, . . . , 222-N is less than VFY 225. In various embodiments, the uppermost PVFY level, e.g., 222-N, 232-N, 242-N, are about 0.1V to 0.3V below the respective VFY level, e.g., 225, 235, 245.
As described further below in connection with FIGS. 3 to 5, the rate at which the Vt of a cell being programmed increases can be slowed in response to the Vt reaching a PVFY level. That is, the bit line coupled to the cell can be biased with a voltage such that the Vt shift of the cell due to a subsequent programming pulse is reduced.
In various embodiments, and as described further below, the PVFY level can be adjusted, e.g., modulated, on a pulse by pulse basis after each of a number of programming pulses applied to a cell being programmed to a particular state, e.g., to a Vt level within one of distributions 220, 230, and 240. For instance, as shown in FIG. 2, each of the PVFY levels, e.g., 222-1, 222-2, . . . , 222-N, is increased after each of a number of programming pulses to an uppermost PVFY level, e.g., 222-N. That is, 222-1 (PVFYp1) is associated with a first programming pulse, 222-2 (PVFYp2) is associated with a second programming pulse subsequent to the first, and 222-N (PVFYpN) is associated with a programming pulse subsequent to the first and second pulses.
As one example, the PVFYp1 222-1, 232-1, 242-1 may be about 0.4V to 0.7V below the respective VFY 225, 235, 245. In this example, the PVFYp2 222-2, 232-2, 242-2 may be about 0.3V to 0.6V below the respective VFY 225, 235, 245. In some embodiments, the PVFY levels associated with each program state can be uniformly incremented on a pulse by pulse basis, e.g., the PVFY can be increased in 0.05V or 0.1V increments until the uppermost PVFY, e.g., PVFYpN, associated with the program state is reached. Embodiments are not so limited. For instance, in some embodiments, PVFY levels associated with subsequent programming pulses are increased by a smaller step size than PVFY levels associated with prior programming pulses, e.g., PVFYp2 can be 0.2V greater than PVFYp1, PVFYp3 can be 0.1V greater than PVFYp2, and PFVYp4 can be 0.05V greater than PVFYp3, etc.
As shown in FIG. 4B, adjusting the PVFY level associated with a particular program state, e.g., “10,” “00, ” and “01, ” on a pulse by pulse basis can reduce and/or prevent fast cells, e.g., cells whose Vt shift between programming pulses is larger than a step voltage of the pulses, from being overprogrammed, e.g., from reaching a Vt level greater than the desired particular program state. Cells programmed to Vt levels greater than the desired state result in a wider Vt distribution for the state and/or can result in data read errors.
Embodiments are not limited to the example shown in the diagram of FIG. 2. For instance, various programming methods of the present disclosure may be used to program memory cells having more than the quantity of states, e.g., Vt distributions, shown. Also, embodiments are not related to the particular binary coding of a Vt distribution but generally to the transition from a generic Vt distribution to a different distribution having a higher Vt. For example, in some embodiments, the MLCs can have more than two bits thus necessitating additional distributions. Moreover, in some embodiments, each state may be mapped to a different location. For example, state “10” may be mapped to the higher Vt distribution, e.g., 240, and state “01” mapped to the lower Vt distribution, e.g., 220.
FIG. 3 illustrates a flowchart of a programming method according to an embodiment of the present disclosure. In the embodiment illustrated in FIG. 3, the programming method is a modulated selective slow programming convergence method. An example of a selective slow programming convergence method is described in copending, commonly assigned U.S. patent application Ser. No. 11/414,982, entitled “Selective Slow Programming Convergence in a Flash Memory Device,” filed on May 1, 2006, which is incorporated herein by reference.
At block 301, a command is received to write data to, e.g., to program, one or more memory cells. The data may be a single bit or multiple bits. At block 303, a programming pulse is generated and applied to the selected word line. A program verify operation is then performed 305 to determine if the cell has been properly programmed 307, e.g., to determine if the Vt of the cell has reached the corresponding VFY for the state. The verify operation is simply a read of the cell to determine its contents and a comparison of the read data with the desired data.
If the cell has been programmed to the proper state, e.g., the cell's Vt has reached the verify voltage associated with the proper state, its drain connection, i.e., the bit line to which the cell is connected, is biased at a program inhibit voltage 315. In various embodiments, the bit line voltage (VBL) is increased from a programming bit line voltage, e.g., 0V, used during programming to a supply voltage such as Vcc, e.g., 1V, 2V, or 3V, among various other bit line voltages that inhibit cells coupled thereto from being further programmed. That is, the VBL can be increased to various voltages that prevent the Vt of a memory cell coupled thereto from shifting further upward in response to subsequent programming pulses applied to the selected word line.
If the verify operation 305 determines that the cell is not yet programmed with the desired data 307, the Vt for the cell is checked 309 to determine if it has reached a first PVFY level, e.g., PVFYp1 222-1, 232-1, 242-2 as shown in FIG. 2, for that particular state. As described above in connection with FIG. 2, in various embodiments, each state can have number of associated PVFY levels, e.g., 222-1 to 222-N, 232-1 to 232-N, and 242-1 to 242-N shown in FIG. 2. In such embodiments, and as described in detail in connection with FIG. 4B, the PVFY is a modulated PVFY that is adjusted on a pulse by pulse basis. That is, the PVFY level to which the memory cell's Vt is compared, varies over a number of programming pulses. In other words, although the cell's Vt is compared against a particular PVFY, e.g., 222-1 to 222-N, 232-1 to 232-N, 242-1 to 242-N, after each programming pulse, the particular PVFY to which the cell's Vt is compared changes, e.g., increases, after each pulse until the uppermost PVFY, e.g., 222-N, 232-N, 242-N, is reached.
The PVFY level is a voltage less than the associated VFY level for each particular program state, e.g., each PVFY level 222-1 to 222-N, 232-2 to 232-N, and 242-2 to 242-N is less than the respective VFY level 225, 235, and 245 as shown in FIG. 2. In various embodiments, the PVFY level is the voltage at which programming of a particular cell is slowed down in response to the Vt for that particular cell reaching that PVFY level. That is, the bit line is biased with a voltage less than the inhibit voltage and greater than the programming bit line voltage such that the Vt of the particular cell increases at a slower rate for a number of subsequent programming pulses.
The biasing voltage to which bit lines are adjusted in response to a cell coupled thereto reaching the PVFY level, can be referred to as a selective slow programming convergence (SSPC) voltage. As shown at block 311 in the embodiment of FIG. 3, the bit line voltage VBL is adjusted to the SSPC level for cells that reach the PVFY level 309. As described further herein below, various values for the SSPC voltage can be used, e.g., 0.3V, 0.5V, 0.9V, among various other voltage levels and/or ranges of levels that can be applied to a bit line to slow the programming rate of a memory cell. The biasing of the bit line reduces the voltage drop across the memory cell transistor, thus reducing the effective programming voltage applied to the cell. The lower the effective programming voltage, the slower the movement of the Vt for that cell. In various embodiments, and as described in connection with FIGS. 5A-5B, the SSPC voltage can be a modulated SSPC voltage which may be decreased over a number of programming pulses.
Unlike some prior programming methods, various method embodiments of the present disclosure selectively slow the programming of each cell that has passed a modulated pre-verify threshold voltage for the particular state being programmed into the cell. Other cells being programmed are unaffected by SSPC bit line biasing and are allowed to be programmed at their normal programming speed. Therefore, the modulated selective slow programming method described in the embodiment of FIG. 2 can have the effect of narrowing the Vt distributions associated with particular program states without reducing the programming throughput.
Also, using a modulated PVFY in various modulated selective slow programming method embodiments can prevent fast cells, e.g., cells having Vts which increase by larger voltage step than the programming pulse step voltage, from becoming overprogrammed and/or widening a Vt distribution. As shown in FIGS. 5A-5B, modulating, e.g., decreasing, the SSPC voltage when an uppermost programming pulse voltage is reached, can improve throughput by reducing the number of pulses necessary to shift the Vts of slower cells to the VFY level once the slower cells have reached the PVFY level.
After the bit line voltage VBL has been increased, e.g., adjusted to the SSPC level 311, the programming process repeats by generating another programming pulse 303. In various embodiments and as shown at block 312, subsequent programming pulses are incrementally larger than the previous pulse up to an uppermost programming pulse voltage level (Vmax). The uppermost programming voltage level can be about 20V-22V, however, embodiments are not limited to a particular Vmax. In one embodiment, the programming pulses are increased by a 0.2V step voltage. This step voltage is for purposes of illustration only as embodiments of the present invention can use various step voltages to increase the programming pulse levels, e.g., 0.1V, 0.3V, 0.5V, among other step voltages.
The voltage drop across the memory cell transistor is reduced due to the VBL increase 311. Therefore, the increased programming pulse voltage 312 will have a reduced effect on programming the cell. That is, the Vt shift of the cell due to the pulse is less than the Vt shift would have been in the absence of the SSPC voltage applied to the bit line, e.g., the cell's programming rate is slowed. The programming of the particular cell to the particular state continues until the cell is programmed, e.g., until the cell's Vt reaches the VFY level for the particular state, at which point the VBL is increased to the inhibit voltage 315 to prevent any further Vt increase of the cell due to subsequent programming pulses.
If the programming pulse generated at 303 does not result in the Vt of the cell reaching the pre-verify voltage level, e.g., PVFYp1 in this case, then the process continues at blocks 313, 316, and 317. The programming pulse voltage is increased 313 by the step voltage if the Vmax has not been reached. This subsequent programming pulse is applied to the selected cell's word line. As shown at block 316, the PVFY level is also adjusted, e.g., increased from PVFYp1 to PVFYp2 in this case. In various embodiments, the PVFY level is only increased if an uppermost PVFY, e.g., PVFYpN 222-N, 232-N, 242-N as shown in FIG. 2, has not been reached. That is, in various embodiments, the PVFY level remains at the uppermost PVFY level until a subsequent pulse causes the Vt of the cell to reach the uppermost PVFY level.
As shown at block 317, in various embodiments, the SSPC level is adjusted, e.g., modulated, if a threshold programming pulse level has been reached. In various embodiments, the threshold programming pulse level is the uppermost programming pulse voltage level, e.g., Vmax. As described further in connection with FIGS. 5A-5B, modulating, e.g., decreasing, the SSPC level can improve programming throughput of selective slow programming convergence for slower cells.
The modulated selective slow programming convergence process illustrated in FIG. 3 repeats until the pre-verify voltage level is reached 309 and the cell is eventually programmed 307 such that the bit line voltage VBL is increased to the inhibit voltage 315. The method illustrated in FIG. 3 can be performed on each cell, e.g., each bit, in a selective manner. For example, in various embodiments, instead of biasing the bit line of all cells when a cell's Vt has reached a pre-verify voltage, only as each cell's Vt reaches the pre-verify voltage is its particular bit line voltage increased, e.g., to the SSPC voltage, to slow the programming speed.
In a memory device using multi-level cells, the bits may be located in the same page address or in multiple page addresses. When the bits are in the same page address, both bits can be changed at the same time. In other words, a same page address programming process can go directly from the erased state of “11, ” e.g., distribution 210 shown in FIG. 2, to a programmed state of “00, ” e.g., distribution 230 shown in FIG. 2. If one or more of the multiple bits are in different page addresses, only one bit at a time is changed. For example, to go from the erased state of “11” to the programmed state of “00,” it is typically necessary to go through either state “10” or state “01, ” depending upon where these states are mapped. The modulated selective slow programming convergence method embodiments of the present invention can operate to program bits located in the same page address or in multiple addresses.
FIG. 4A illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with a prior programming method. FIG. 4B illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with the programming embodiment of FIG. 3. The plot of FIG. 4B shows the memory cell Vt levels and bit line voltages illustrated in FIG. 4A as modified by the programming embodiment described in FIG. 3.
The lower plot illustrated in FIGS. 4A and 4B shows a number of programming pulses 415 with the voltage level of each pulse increasing by a step voltage, e.g., Vstep, along the bottom axis. The illustrated embodiment uses a Vstep of 200 mV. However, as described above, embodiments of the present disclosure are not limited to particular step voltage.
The plots shown in FIGS. 4A and 4B, include memory cells that program at different rates, e.g., cells whose Vts shift differently in response to programming pulses 415. Cell 402 represents a “slower cell” having a Vt that generally shifts by an amount equal to or less than the programming pulse step Vstep, e.g., 200 mV in this example. Cell 404 represents a “faster cell” having a Vt that generally shifts by an amount equal to or slightly greater than Vstep. Cell 406 represents a cell (shown as Faster Cell+) that has a Vt that shifts by an amount greater than Vstep in response to programming pulses 415. The upward movement of the cells 402, 404, and 406 represents an increasing Vt.
In FIGS. 4A and 4B, prior to the Vt reaching a PVFY level, the slower cell 402 is increasing by an amount DVt less than 200 mV, the faster cell 404 is increasing by an amount DVt about equal to 200 mV, and the cell 406 is increasing by an amount DVt greater than 200 mV. As a result, the Vt of cell 406 reaches the PVFY level before cell 404, which reaches the PVFY level before cell 402.
In various embodiments, and as shown in FIGS. 4A and 4B, when a cell reaches a PVFY level, a bit line voltage, e.g., a SSPC voltage, is applied to the bit line in order to slow programming of the cell until its Vt reaches the VFY level 425. The slowed programming can produce a relatively narrow Vt distribution by preventing the Vt of cells from reaching levels substantially over the VFY level 425. The slowed programming rate of a cell is represented by a reduction in DVt, e.g., a reduction in the amount of a cell's Vt shift. For instance, in FIG. 4A, the slowed programming of cell 404 is represented by “DVt=200*K with 0<K<1. ” That is, the Vt of cell 404 is increasing by less than it did prior to its Vt reaching the PVFY level, e.g., less than the Vstep voltage of 200 mV, in this example.
In FIG. 4A, the programming of the “Faster Cell+” 406 is not slowed because the Vt of the cell 406 shifts from a voltage level below PVFY 422 to a voltage level above VFY 425 after a next subsequent programming pulse 415. This can occur for cells such as cell 406 whose Vt shifts by an amount greater than the Vstep, e.g., a rate faster than 200 mV per pulse in this example. This rate can be represented by “DVt=200K with K>1” as shown in FIG. 4A. As shown in FIG. 4A, cell 406 has been programmed such that its Vt is substantially above VFY 425, which can result in overprogrammed cells and/or a wider than desirable Vt distribution for the particular program state.
As shown in FIGS. 4A and 4B, and as described above, once cells 402, 404, and 406 reach the VFY 425, an inhibit voltage, e.g., Vcc, is applied to the bit line to prevent further programming, e.g., Vt increases, of the cell. Thus, as shown in the middle graphs of FIGS. 4A and 4B, the increase of the Vt of each cell stops due to the end of the programming operation on that cell.
FIG. 4B illustrates the cells 402, 404, and 406 of FIG. 4A, after being programmed in accordance with a modulated selective slow programming convergence (MSSPC) method such as that described in connection with FIG. 3. As illustrated in FIG. 4B, the VFY 425 has a number of associated pre-verify levels PVFYp1, PVFYp2, . . . , PVFYpN such as described in connection with FIG. 2. VFY 425 can be the VFY associated with any number of states, e.g., one of VFY 225, 235, or 245 shown in FIG. 2. Similarly, PVFYp1, PVFYp2, . . . , PVFYpN can be respective PVFY levels 222-1 to 222-N, 232-1 to 232-N, and 242-1 to 242-N as shown in FIG. 2.
In FIG. 4B, the PVFY is increased on a pulse by pulse basis up to the uppermost PVFY. That is, PVFYp1 is the PVFY level to which the cell's Vt is compared after a first pulse, e.g., P1, PVFYp2 is the PVFY level to which the cell's Vt is compared after a second pulse, e.g., P2, PVFYpN is the PVFY level to which the cell's Vt is compared after an Nth pulse. In FIG. 4B, although the uppermost PVFY level PVFYpN is used after the third pulse, e.g., P3, embodiments are not so limited.
As illustrated in FIG. 4B, embodiments of the present disclosure can narrow Vt distributions and/or can prevent overprogramming caused by fast cells, e.g., 406. For instance, FIG. 4B illustrates that an adjusted PVFY level, e.g., a modulated PVFY level, can efficiently slow down the programming of fast cells such as cell 406.
FIG. 4B shows the Vt of cell 406 having reached a PVFY level, e.g., PVFYp1, after pulse P1. In contrast, the Vt of cell 406 does not reach the unmodulated PVFY level 422 shown in FIG. 4A after pulse P1. In response to the Vt of cell 406 reaching PVFYp1 after pulse P1, the bit line voltage VBL is changed from the programming bit line voltage, e.g., 0V, to the SSPC voltage. The programming rate change of cell 406 when its Vt reaches PVFYp1 can be represented by “DVt=200*K with 0<K<1” as shown in FIG. 4B. That is, in FIG. 4B, the Vt shift rate DVt for cell 406 changes from rate 409-1 (DVt=200*K with K>1) prior to the Vt reaching PVFYp1 to rate 409-2 (DVt=200*K with 0<K<1) in response to the Vt reaching PVFYp1. In other words, after the first pulse P1, the Vt shift of cell 406 is reduced from greater than Vstep, e.g., greater than 200 mV, to less than Vstep, e.g., less than 200 mV, such that the Vt shift of cell 406 is lowered for a number of subsequent pulses, e.g., P2, P3, P4, etc., until the Vt reaches the VFY level 425. In contrast, in FIG. 4A, the Vt shift of cell 406 remains greater than Vstep after pulse P1 and becomes overprogrammed, e.g., greater than VFY level 425, after pulse P2.
FIG. 5A illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with a prior selective slow programming convergence method. The middle plot shown in FIGS. 5A and 5B illustrates a number of programming pulses including a number of programming pulses at an uppermost programming pulse voltage level, e.g., Vmax. Vmax can be a voltage of about 20V-22V, but embodiments are not limited to a particular Vmax level.
The upper plot shown in FIG. 5A shows the Vt for a slow cell 502 after each of the number of programming pulses. When the programming pulse voltage level approaches and/or has reached the uppermost level Vmax, the Vt of slow cells, e.g., cell 502, may tend to shift more slowly. For instance, the Vt shift of the slow cells, e.g., cell 502, may be substantially less than the programming pulse step level. As an example, if the programming pulse step level is 200 mV, the Vt shift for slow cells when the programming pulse voltage level reaches Vmax can be 50 mV or less. The reduced Vt shift of such slow cells can reduce programming throughput since more pulses can be required for the Vt to reach the VFY level, e.g., a programmed level such as VFY 225, 235, and 245 shown in FIG. 2.
The lower plot in FIG. 5A shows an SSPC voltage to be applied to bit lines coupled to memory cells whose Vt has reached the PVFY level. The PVFY level shown in FIGS. 5A and 5B can be an uppermost PVFY level, e.g., PVFYpN, of a modulated PVFY such as that described above. For instance, depending on the state to which the cell 502 is being programmed, the PVFY shown in FIGS. 5A and 5B can be PVFYpN 222-N, 232-N, or 242-N.
As noted above, the Vt of slow cells can shift more slowly as a number of programming pulses having the Vmax level are applied thereto. The slowed Vt shift can result in lower throughput as an increased number of pulses are required for the Vt of such cells to reach the proper VFY. In such cases, applying the SSPC voltage to bit lines coupled to slow cells in response to their Vt reaching the PVFY level can further reduce programming throughput as the Vt shift becomes even further reduced. The above described effect can be seen in FIG. 5A as the Vt of slow cell 502 increases at a slower rate after its Vt reaches the PVFY level.
FIG. 5B illustrates a plot of programming pulses, memory cell Vt levels, and bit line voltages in accordance with a modulated selective slow programming convergence method such as that illustrated in FIG. 3. FIG. 5B shows the Vt of the slow cells 502 of FIG. 5A after being programmed according to the modulated selective slow programming convergence method of FIG. 3. As described above in connection with FIG. 3, in various embodiments of the present disclosure, the SSPC voltage can be a modulated SSPC voltage, e.g., MSSPC as shown in FIG. 5B.
In various embodiments, and as shown in FIG. 5B, the modulated SSPC voltage is decreased from an uppermost SSPC voltage to a lowermost SSPC voltage over a number of programming pulses. The uppermost SSPC voltage voltage can be various voltage levels below the inhibit voltage, e.g., Vcc, and above the programming bit line voltage, e.g., 0V. The lowermost SSPC voltage can be various voltage levels below the uppermost voltage level. As an example, the modulated SSPC voltage can be decremented from about 0.6V to 0V over a number of programming pulses. In some embodiments, a PVFY level is not used for verification operations after the modulated SSPC voltage has been decremented to the programming bit line voltage, e.g., 0V in this example. In such embodiments, the Vt of those cells whose Vt has not reached the PVFY level is no longer compared to a PVFY level. No longer comparing the cell Vt to a PVFY level, e.g., removing the PVFY from verification operations, can improve throughput since the cell's Vt is compared only to the VFY level if the PVFY is removed.
In various embodiments, the SSPC voltage is maintained as an unmodulated voltage until the uppermost programming pulse voltage, e.g., Vmax, is reached. That is, the bias voltage applied to bit lines in response to the Vt of cells coupled thereto reaching the PVFY level, can remain at a voltage, e.g., 0.6V, until the programming pulse voltage has reached Vmax. Maintaining the SSPC voltage as an unmodulated voltage for a number of programming pulses, e.g., a number of initial incremented pulses, can create narrow Vt distributions by slowing the Vt increase rate of fast cells that reach a PVFY level and can improve throughput by reducing and/or eliminating the effect of the SSPC voltage for slow cells.
For instance, in comparing the slow cell 502 of FIGS. 5A and 5B, it is observed that the modulated selective slow programming convergence method used in programming slow cell 502 in FIG. 5B causes the slow cell 502 to reach the VFY level faster than the method used to program slow cell 502 in FIG. 5A.
FIG. 6 is a functional block diagram of an electronic memory system 600 having at least one memory device 620 in accordance with an embodiment of the present disclosure. Memory system 600 includes a processor 610 coupled to a non-volatile memory device 620 that includes a memory array 630 of non-volatile cells. The memory system 600 can include separate integrated circuits or both the processor 610 and the memory device 620 can be on the same integrated circuit. The processor 610 can be a microprocessor or some other type of controlling circuitry such as an application-specific integrated circuit (ASIC).
For clarity, the electronic memory system 600 has been simplified to focus on features with particular relevance to the present disclosure. The memory device 620 includes an array of non-volatile memory cells 630, which can be floating gate flash memory cells with a NAND architecture. The control gates of each row of memory cells are coupled with a word line, while the drain regions of the memory cells are coupled to bit lines. The source regions of the memory cells are coupled to source lines, as the same has been illustrated in FIG. 1. As will be appreciated by those of ordinary skill in the art, the manner of connection of the memory cells to the bit lines and source lines depends on whether the array is a NAND architecture, a NOR architecture, and AND architecture, or some other memory array architecture.
The embodiment of FIG. 6 includes address circuitry 640 to latch address signals provided over I/O connections 662 through I/O circuitry 660. Address signals are received and decoded by a row decoder 644 and a column decoder 646 to access the memory array 630. In light of the present disclosure, it will be appreciated by those skilled in the art that the number of address input connections depends on the density and architecture of the memory array 630 and that the number of addresses increases with both increased numbers of memory cells and increased numbers of memory blocks and arrays.
The memory array 630 of non-volatile cells can include non-volatile multilevel memory cells programmed according to embodiments described herein. The memory device 620 reads data in the memory array 630 by sensing voltage and/or current changes in the memory array columns using sense/buffer circuitry that in this embodiment can be read/latch circuitry 650. The read/latch circuitry 650 can be coupled to read and latch a row of data from the memory array 630. I/O circuitry 660 is included for hi-directional data communication over the I/O connections 662 with the processor 610. Write circuitry 655 is included to write data to the memory array 630.
Control circuitry 670 decodes signals provided by control connections 672 from the processor 610. These signals can include chip signals, write enable signals, and address latch signals that are used to control the operations on the memory array 630, including data read, data write, and data erase operations. In various embodiments, the control circuitry 670 is responsible for executing instructions from the processor 610 to perform the operating and programming embodiments of the present disclosure. The control circuitry 670 can be a state machine, a sequencer, or some other type of controller. It will be appreciated by those skilled in the art that additional circuitry and control signals can be provided, and that the memory device detail of FIG. 6 has been reduced to facilitate ease of illustration.
FIG. 7 is a functional block diagram of a memory module 700 having at least one memory device 710 in accordance with an embodiment of the present disclosure. Memory module 700 is illustrated as a memory card, although the concepts discussed with reference to memory module 700 are applicable to other types of removable or portable memory (e.g., USB flash drives) and are intended to be within the scope of “memory module” as used herein. In addition, although one example form factor is depicted in FIG. 7, these concepts are applicable to other form factors as well.
In some embodiments, memory module 700 will include a housing 705 (as depicted) to enclose one or more memory devices 710, though such a housing is not essential to all devices or device applications. At least one memory device 710 includes an array of non-volatile multilevel memory cells programmed according to embodiments described herein. Where present, the housing 705 includes one or more contacts 715 for communication with a host device. Examples of host devices include digital cameras, digital recording and playback devices, PDAs, personal computers, memory card readers, interface hubs and the like. For some embodiments, the contacts 715 are in the form of a standardized interface. For example, with a USB flash drive, the contacts 715 might be in the form of a USB Type-A male connector. For some embodiments, the contacts 715 are in the form of a semi-proprietary interface, such as might be found on CompactFlash™ memory cards licensed by SanDisk Corporation, Memory Stick™ memory cards licensed by Sony Corporation, SD Secure Digital™ memory cards licensed by Toshiba Corporation and the like. In general, however, contacts 715 provide an interface for passing control, address and/or data signals between the memory module 700 and a host having compatible receptors for the contacts 715.
The memory module 700 may optionally include additional circuitry 720, which may be one or more integrated circuits and/or discrete components. For some embodiments, the additional circuitry 720 may include a memory controller for controlling access across multiple memory devices 710 and/or for providing a translation layer between an external host and a memory device 710. For example, there may not be a one-to-one correspondence between the number of contacts 715 and a number of 710 connections to the one or more memory devices 710. Thus, a memory controller could selectively couple an I/O connection (not shown in FIG. 7) of a memory device 710 to receive the appropriate signal at the appropriate I/O connection at the appropriate time or to provide the appropriate signal at the appropriate contact 715 at the appropriate time. Similarly, the communication protocol between a host and the memory module 700 may be different than what is required for access of a memory device 710. A memory controller could then translate the command sequences received from a host into the appropriate command sequences to achieve the desired access to the memory device 710. Such translation may further include changes in signal voltage levels in addition to command sequences.
The additional circuitry 720 may further include functionality unrelated to control of a memory device 710 such as logic functions as might be performed by an ASIC. Also, the additional circuitry 720 may include circuitry to restrict read or write access to the memory module 700, such as password protection, biometrics or the like. The additional circuitry 720 may include circuitry to indicate a status of the memory module 700. For example, the additional circuitry 720 may include functionality to determine whether power is being supplied to the memory module 700 and whether the memory module 700 is currently being accessed, and to display an indication of its status, such as a solid light while powered and a flashing light while being accessed. The additional circuitry 720 may further include passive devices, such as decoupling capacitors to help regulate power requirements within the memory module 700.
CONCLUSION
Embodiments for programming non-volatile multilevel memory cells have been described. Various embodiments for improved widths of Vt distributions while maintaining or improving programming throughput. One embodiment accomplishes this by determining whether the Vt of each of the cells has reached a pre-verify voltage (PVFY) associated with the program state, selectively biasing bit lines coupled to those cells whose Vt has reached the PVFY, adjusting the PVFY to a different level, and selectively biasing bit lines coupled to cells whose Vt has reached the adjusted PVFY, wherein the PVFY and the adjusted PVFY are less than the VFY.
Although specific embodiments have been illustrated and described herein, those of ordinary skill in the art will appreciate that an arrangement calculated to achieve the same results can be substituted for the specific embodiments shown. This disclosure is intended to cover adaptations or variations of various embodiments of the present disclosure. It is to be understood that the above description has been made in an illustrative fashion, and not a restrictive one. Combination of the above embodiments, and other embodiments not specifically described herein will be apparent to those of skill in the art upon reviewing the above description. The scope of the various embodiments of the present disclosure includes other applications in which the above structures and methods are used. Therefore, the scope of various embodiments of the present disclosure should be determined with reference to the appended claims, along with the full range of equivalents to which such claims are entitled.
In the foregoing Detailed Description, various features are grouped together in a single embodiment for the purpose of streamlining the disclosure. This method of disclosure is not to be interpreted as reflecting an intention that the disclosed embodiments of the present disclosure have to use more features than are expressly recited in each claim. Rather, as the following claims reflect, inventive subject matter lies in less than all features of a single disclosed embodiment. Thus, the following claims are hereby incorporated into the Detailed Description, with each claim standing on its own as a separate embodiment.

Claims (28)

1. A method for programming multilevel non-volatile memory cells in an array having rows coupled by word lines and columns coupled by bit lines, comprising:
increasing a threshold voltage (Vt) for each of a number of memory cells until the Vt reaches a verify voltage (VFY) corresponding to a program state among a number of program states;
determining whether the Vt of each of the cells has reached a pre-verify voltage (PVFY) associated with the program state;
selectively biasing bit lines coupled to those cells whose Vt has reached the PVFY;
adjusting the PVFY to a different level; and
selectively biasing bit lines coupled to cells whose Vt has reached the adjusted PVFY, wherein the PVFY and the adjusted PVFY are less than the VFY.
2. The method of claim 1, wherein the method includes selectively biasing only bit lines coupled to cells whose Vt has reached the PVFY, including the adjusted PVFY.
3. The method of claim 2, wherein the method includes:
selectively biasing bit lines coupled to cells whose Vt has reached the PVFY with a voltage greater than a programming bit line voltage and less than an inhibit voltage; and
selectively biasing bit lines coupled to cells whose Vt has reached the adjusted PVFY with a voltage greater than the programming bit line voltage and less than the inhibit voltage.
4. The method of claim 2, wherein selectively biasing only bit lines coupled to cells whose Vt has reached one of the PVFY and the adjusted PVFY includes providing a selective slow programming convergence (SSPC) voltage to the bit lines, the SSPC voltage being greater than a programming bit line voltage and less than an inhibit voltage.
5. The method of claim 1, wherein increasing the Vt for each of the cells includes:
applying a number of programming pulses to each of the number of memory cells, the programming pulses being incremented by a step voltage;
maintaining bit lines coupled to cells whose Vt has not reached the PVFY after a first programming pulse at a programming bit line voltage; and
selectively biasing bit lines coupled to cells whose Vt has reached the adjusted PVFY after a subsequent programming pulse at a voltage different from the programming bit line voltage.
6. The method of claim 5, wherein adjusting the PVFY includes incrementing the PVFY after each of the number of programming pulses until a particular threshold PVFY is reached.
7. The method of claim 6, wherein the method includes:
applying the number of programming pulses from a first programming voltage to a threshold programming voltage; and
for those memory cells whose Vt has not reached the threshold PVFY prior to the programming voltage reaching the threshold programming voltage, decrementing a bit line voltage to be selectively applied to bit lines coupled to the memory cells when their Vt reaches the threshold PVFY.
8. The method of claim 7, wherein the threshold programming voltage is an uppermost programming voltage, and wherein the method includes:
applying, to those memory cells whose Vt has not reached the threshold PVFY prior to the programming voltage reaching the uppermost programming voltage, a number of programming pulses at the uppermost voltage; and
decrementing, after each of the number of programming pulses at the uppermost programming voltage, the bit line voltage to be applied to bit lines coupled to the memory cells when their Vt reaches the threshold PVFY, until the bit line voltage to be applied reaches the programming bit line voltage.
9. A method for programming a multilevel non-volatile memory cell, comprising:
applying programming pulses to a word line associated with a multilevel memory cell to increase a threshold voltage (Vt) of the cell to a verify voltage (VFY) level corresponding to a particular program state among a number of program states, and applying an inhibit voltage to a bit line coupled to the cell in response to the Vt reaching the VFY level;
changing a bias voltage applied to the bit line from a first value to a second value in response to the Vt reaching a pre-verify voltage (PVFY) level of a number of PVFY levels within a first number of programming pulses, wherein the PVFY levels are less than the VFY level, and wherein the first and second values are less than the inhibit voltage;
adjusting the PVFY level from a first PVFY level associated with a first programming pulse to an uppermost PVFY level associated with a subsequent programming pulse over the first number of programming pulses; and
if the Vt is less than the uppermost PVFY after the first number of programming pulses, changing the bias voltage applied to the bit line from the first value to a third value in response to the Vt reaching the uppermost PVFY level within a second number of programming pulses subsequent to the first number of programming pulses.
10. The method of claim 9 wherein the method includes:
using the first PVFY level to perform a program verify operation after the first programming pulse; and
using the uppermost PVFY level to perform a program verify operation after a last of the first number of programming pulses.
11. The method of claim 10, wherein the method includes increasing the PVFY level used to perform a program verify operation after each of the first number of programming pulses.
12. The method of claim 9, wherein the method decreasing the third value over the second number of programming pulses, the third value being less than the second value.
13. The method of claim 12, wherein the method includes:
decreasing the third value in a step manner over the second number of programming pulses such that the bias voltage applied to the bit line is the first value after the second number of programming pulses; and
maintaining the bit line value at the first value until the Vt reaches the VFY level.
14. The method of claim 12, wherein method includes:
applying the programming pulses incrementally from a first pulse voltage level to an uppermost pulse voltage level; and
decrementing the third value after a number of programming pulses at the uppermost pulse voltage level.
15. A method for programming multilevel non-volatile memory cells in an array having rows coupled by word lines and columns coupled by bit lines, comprising:
applying programming pulses to each of a number of memory cells until a threshold voltage (Vt) of each of the memory cells reaches a verify voltage (VFY) which corresponds to a particular program state, wherein a first number of programming pulses increase by a step voltage from a first program pulse voltage to an uppermost program pulse voltage;
in response to Vts of memory cells reaching a modulated pre-verify voltage (PVFY), selectively changing a bias voltage applied to bit lines coupled only to those memory cells from a programming bit line voltage to a selective slow programming convergence (SSPC) voltage, wherein the modulated PVFY is less than the VFY and is increased from a lowermost PVFY to an uppermost PVFY on a pulse by pulse basis for at least two of the first number of programming pulses;
modulating the SSPC voltage from an uppermost SSPC voltage to a lowermost SSPC voltage over a second number of programming pulses subsequent to the first number of programming pulses, the SSPC voltage being greater than the programming bit line voltage and less than an inhibit voltage.
16. The method of claim 15, wherein the method includes performing a program verify operation to determine the Vts of the number of memory cells after each program pulse including:
performing the program verify operation using the lowermost PVFY after a first of the at least two first number of programming pulses; and
performing the program verify operation using the uppermost PVFY after a number of programming pulses subsequent to the at least two first number of programming pulses.
17. The method of claim 15, wherein the method includes maintaining the SSPC voltage as an unmodulated voltage until the uppermost program pulse voltage is reached.
18. The method of claim 15, wherein the method includes modulating the SSPC voltage on a pulse by pulse basis over a number of pulses at the uppermost program voltage.
19. The method of claim 18, wherein the method includes:
decrementing the SSPC voltage on a pulse by pulse basis until the SSPC voltage reaches the programming bit line voltage; and
performing each program verify operation subsequent to the SSPC voltage reaching the programming bit line voltage without using the modified PVFY.
20. A memory device, comprising:
an array of multilevel memory cells arranged in rows and columns such that the rows are coupled by word lines and the columns are coupled by bit lines, each memory cell having a threshold voltage (Vt); and
control circuitry that controls programming of the array, the control circuitry configured to:
control generation of programming pulses to increase the Vt of a number of memory cells until the memory cells are programmed to a particular state; and
selectively control application of a selective slow programming convergence (SSPC) voltage to bit lines in response to the Vt of a memory cell coupled thereto reaching a modulated pre-verify voltage (PVFY) level, the modulated PVFY level being less than a verify voltage (VFY) level at which the number of memory cells are considered to be programmed;
control application of an inhibit voltage to bit lines in response to the Vt of memory cells coupled thereto reaching the VFY level; and
control modulation of the SSPC voltage.
21. The device of claim 20, wherein the modulated PVFY level is increased after each of a first number of programming pulses that increase by a step voltage to an uppermost pulse voltage, and wherein the modulated PVFY increases from an initial PVFY level to an uppermost PVFY level.
22. The device of claim 21, wherein the control circuitry is configured to control application of a programming bit line voltage to bit lines coupled to memory cells whose Vt remains less than the modulated PVFY level after the first number of programming pulses, the programming bit line voltage is less than the modulated PVFY level.
23. The device of claim 22, wherein the SSPC voltage is greater than the programming bit line voltage and less than the inhibit voltage for the first number of programming pulses.
24. The device of claim 23, wherein the programming bit line voltage is 0V and the inhibit voltage is Vcc.
25. The device of claim 23, wherein the control circuitry is configured to:
apply a number of programming pulses having the uppermost pulse voltage subsequent to the first number of programming pulses to further increase the Vt of the number of memory cells that have Vts below the VFY level; and
modulate the SSPC voltage by decreasing the SSPC voltage only after the programming pulses have reached the uppermost pulse voltage.
26. The device of claim 20, wherein the control circuitry is configured to:
apply 0V to bit lines coupled to memory cells having a Vt that has not yet reached the modulated PVFY voltage after the first number of pulses; and
modulate the SSPC voltage by decrementing the SSPC voltage from a voltage less than the inhibit voltage to 0V over a second number of programming pulses subsequent to the first number of programming pulses.
27. The device of claim 26, wherein the second number of programming pulses includes a number of programming pulses having an uppermost pulse voltage.
28. A flash memory device, comprising:
a NAND array of multilevel memory cells arranged in rows and columns such that the rows are coupled by word lines and the columns are coupled by bit lines, each memory cell having a threshold voltage (Vt); and
control circuitry that controls programming of the NAND array, the control circuitry configured to:
control generation of programming pulses to increase the Vt of a number of memory cells until each of the number of memory cells are programmed to a particular state; and
selectively control application of a selective slow programming convergence (SSPC) voltage to bit lines in response to the Vt of a memory cell coupled thereto reaching a modulated pre-verify voltage (PVFY), the modulated PVFY being less than a verify voltage (VFY) at which the number of memory cells are considered to be programmed;
control application of an inhibit voltage to bit lines in response to the Vt of memory cells coupled thereto reaching the VFY; and
control modulation of the SSPC voltage, including
maintaining the SSPC voltage at a first value over a number of incrementally stepped programming pulses; and
decreasing the SSPC voltage on a pulse by pulse basis over a number of subsequent programming pulses at an uppermost programming pulse voltage.
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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110216600A1 (en) * 2010-03-02 2011-09-08 Akira Goda Drain select gate voltage management
US20110286280A1 (en) * 2009-03-24 2011-11-24 Rambus Inc. Pulse Control For NonVolatile Memory
US8385132B2 (en) 2010-12-22 2013-02-26 Sandisk Technologies Inc. Alternate bit line bias during programming to reduce channel to floating gate coupling in memory
US8917553B2 (en) 2011-03-25 2014-12-23 Micron Technology, Inc. Non-volatile memory programming
US9251907B2 (en) 2012-04-03 2016-02-02 Micron Technology, Inc. Memory devices and methods of operating memory devices including applying a potential to a source and a select gate between the source and a string of memory cells while performing a program operation on a memory cell in the string
US9396791B2 (en) 2014-07-18 2016-07-19 Micron Technology, Inc. Programming memories with multi-level pass signal
US9633719B2 (en) 2015-05-29 2017-04-25 Micron Technology, Inc. Programming memory cells to be programmed to different levels to an intermediate level from a lowest level
US10217515B2 (en) 2017-04-01 2019-02-26 Intel Corporation Programming memory devices
US10741252B2 (en) 2018-12-18 2020-08-11 Micron Technology, Inc. Apparatus and methods for programming memory cells using multi-step programming pulses

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4640658B2 (en) * 2008-02-15 2011-03-02 マイクロン テクノロジー, インク. Multi-level suppression scheme
US7729176B2 (en) * 2008-06-30 2010-06-01 Intel Corporation Program acceleration of a memory device
KR101554727B1 (en) 2009-07-13 2015-09-23 삼성전자주식회사 Nonvolitile memory device and program method thereof
US8482975B2 (en) 2009-09-14 2013-07-09 Micron Technology, Inc. Memory kink checking
KR101616097B1 (en) * 2009-11-11 2016-04-28 삼성전자주식회사 Programing method of nonvolatile memory device
US8243521B2 (en) * 2009-12-04 2012-08-14 Micron Technology, Inc. Method for kink compensation in a memory
US8139419B2 (en) * 2009-12-08 2012-03-20 Micron Technology, Inc. Programming methods and memories
US8305820B2 (en) * 2010-04-29 2012-11-06 Taiwan Semiconductor Manufacturing Co., Ltd. Switched capacitor based negative bitline voltage generation scheme
US8472256B2 (en) * 2010-05-12 2013-06-25 Micron Technology, Inc. Non-volatile memory programming
KR101656384B1 (en) * 2010-06-10 2016-09-12 삼성전자주식회사 Method of writing data in a non-volatile memory device
US8385123B2 (en) * 2010-08-18 2013-02-26 Micron Technology, Inc. Programming to mitigate memory cell performance differences
KR101184830B1 (en) * 2010-10-27 2012-09-20 에스케이하이닉스 주식회사 Semiconductor memory device and method of operating the same
US8760932B2 (en) 2011-10-18 2014-06-24 Seagate Technology Llc Determination of memory read reference and programming voltages
US8737133B2 (en) 2011-10-18 2014-05-27 Seagate Technology Llc Shifting cell voltage based on grouping of solid-state, non-volatile memory cells
US8711619B2 (en) 2011-10-18 2014-04-29 Seagate Technology Llc Categorizing bit errors of solid-state, non-volatile memory
US8693257B2 (en) 2011-10-18 2014-04-08 Seagate Technology Llc Determining optimal read reference and programming voltages for non-volatile memory using mutual information
US8842477B2 (en) 2012-06-01 2014-09-23 Spansion Llc Method, apparatus, and manufacture for flash memory adaptive algorithm
KR101942863B1 (en) 2012-06-19 2019-01-28 삼성전자주식회사 Non-volatile memory device and program method thereof
US9082510B2 (en) * 2012-09-14 2015-07-14 Freescale Semiconductor, Inc. Non-volatile memory (NVM) with adaptive write operations
US9135109B2 (en) 2013-03-11 2015-09-15 Seagate Technology Llc Determination of optimum threshold voltage to read data values in memory cells
US9123414B2 (en) 2013-11-22 2015-09-01 Micron Technology, Inc. Memory systems and memory programming methods
US9336875B2 (en) 2013-12-16 2016-05-10 Micron Technology, Inc. Memory systems and memory programming methods
KR20160052277A (en) * 2014-11-04 2016-05-12 에스케이하이닉스 주식회사 Semiconductor device and operating method thereof
US10090309B1 (en) * 2017-04-27 2018-10-02 Ememory Technology Inc. Nonvolatile memory cell capable of improving program performance
US10255978B2 (en) 2017-05-08 2019-04-09 Sandisk Technologies Llc Loop control strobe skew
US10354738B2 (en) * 2017-09-27 2019-07-16 Micron Technology, Inc. One check fail byte (CFBYTE) scheme
CN110910940B (en) * 2018-09-18 2021-10-29 北京兆易创新科技股份有限公司 Programming method and device of memory, storage equipment and storage medium
US10539973B1 (en) * 2018-12-17 2020-01-21 Micron Technology, Inc. Low-voltage bias generator based on high-voltage supply
KR20210110376A (en) * 2019-03-26 2021-09-07 양쯔 메모리 테크놀로지스 씨오., 엘티디. How to Program in a Non-Volatile Memory Device by Applying Multiple Bitline Bias Voltages
KR20220048375A (en) * 2020-10-12 2022-04-19 에스케이하이닉스 주식회사 Semiconductor memory device and method for operating thereof
US11600345B2 (en) 2020-12-30 2023-03-07 Micron Technology, Inc. Memory devices with dynamic program verify levels
US11688474B2 (en) * 2021-04-19 2023-06-27 Micron Technology, Inc. Dual verify for quick charge loss reduction in memory cells
KR20220159844A (en) * 2021-05-26 2022-12-05 에스케이하이닉스 주식회사 Semiconductor memory device and operating method thereof

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020154545A1 (en) 2001-04-19 2002-10-24 Hitachi, Ltd. Non-volatile memory device with plurality of threshold voltage distributions
EP1324343A2 (en) 2001-12-27 2003-07-02 Kabushiki Kaisha Toshiba Non-volatile semiconductor memory device adapted to store a multi-valued data in a single memory cell
US6671207B1 (en) 2001-02-08 2003-12-30 Advanced Micro Devices, Inc. Piggyback programming with staircase verify for multi-level cell flash memory designs
US6888758B1 (en) 2004-01-21 2005-05-03 Sandisk Corporation Programming non-volatile memory
US20050162916A1 (en) 2004-01-27 2005-07-28 Guterman Daniel C. Efficient verification for coarse/fine programming of non-volatile memory
US6937518B1 (en) 2003-07-10 2005-08-30 Advanced Micro Devices, Inc. Programming of a flash memory cell
US7031214B2 (en) * 1999-01-14 2006-04-18 Silicon Storage Technology, Inc. Digital multilevel memory system having multistage autozero sensing
US20060285392A1 (en) * 2005-06-15 2006-12-21 Micron Technology, Inc. Selective slow programming convergence in a flash memory device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7136304B2 (en) * 2002-10-29 2006-11-14 Saifun Semiconductor Ltd Method, system and circuit for programming a non-volatile memory array
US6778442B1 (en) * 2003-04-24 2004-08-17 Advanced Micro Devices, Inc. Method of dual cell memory device operation for improved end-of-life read margin
US7042766B1 (en) * 2004-07-22 2006-05-09 Spansion, Llc Method of programming a flash memory device using multilevel charge storage

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7031214B2 (en) * 1999-01-14 2006-04-18 Silicon Storage Technology, Inc. Digital multilevel memory system having multistage autozero sensing
US6671207B1 (en) 2001-02-08 2003-12-30 Advanced Micro Devices, Inc. Piggyback programming with staircase verify for multi-level cell flash memory designs
US20020154545A1 (en) 2001-04-19 2002-10-24 Hitachi, Ltd. Non-volatile memory device with plurality of threshold voltage distributions
EP1324343A2 (en) 2001-12-27 2003-07-02 Kabushiki Kaisha Toshiba Non-volatile semiconductor memory device adapted to store a multi-valued data in a single memory cell
US6643188B2 (en) 2001-12-27 2003-11-04 Kabushiki Kaisha Toshiba Non-volatile semiconductor memory device adapted to store a multi-valued data in a single memory cell
US6937518B1 (en) 2003-07-10 2005-08-30 Advanced Micro Devices, Inc. Programming of a flash memory cell
US6888758B1 (en) 2004-01-21 2005-05-03 Sandisk Corporation Programming non-volatile memory
US7035146B2 (en) 2004-01-21 2006-04-25 Sandisk Corporation Programming non-volatile memory
US20050162916A1 (en) 2004-01-27 2005-07-28 Guterman Daniel C. Efficient verification for coarse/fine programming of non-volatile memory
US20060285392A1 (en) * 2005-06-15 2006-12-21 Micron Technology, Inc. Selective slow programming convergence in a flash memory device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
International Search Report (6 pgs.).

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9177655B2 (en) 2009-03-24 2015-11-03 Rambus Inc. Pulse control for nonvolatile memory
US20110286280A1 (en) * 2009-03-24 2011-11-24 Rambus Inc. Pulse Control For NonVolatile Memory
US9564225B2 (en) 2009-03-24 2017-02-07 Rambus Inc. Pulse control for non-volatile memory
US8644078B2 (en) * 2009-03-24 2014-02-04 Rambus Inc. Pulse control for nonvolatile memory
US9230666B2 (en) 2010-03-02 2016-01-05 Micron Technology, Inc. Drain select gate voltage management
US8767487B2 (en) 2010-03-02 2014-07-01 Micron Technology, Inc. Drain select gate voltage management
US20110216600A1 (en) * 2010-03-02 2011-09-08 Akira Goda Drain select gate voltage management
US8385132B2 (en) 2010-12-22 2013-02-26 Sandisk Technologies Inc. Alternate bit line bias during programming to reduce channel to floating gate coupling in memory
US9202586B2 (en) 2011-03-25 2015-12-01 Micron Technology, Inc. Non-volatile memory programming
US8917553B2 (en) 2011-03-25 2014-12-23 Micron Technology, Inc. Non-volatile memory programming
US10438672B2 (en) 2012-04-03 2019-10-08 Micron Technology, Inc. Memory devices and apparatus configured to apply positive voltage levels to data lines for memory cells selected for and inhibited from programming
US9251907B2 (en) 2012-04-03 2016-02-02 Micron Technology, Inc. Memory devices and methods of operating memory devices including applying a potential to a source and a select gate between the source and a string of memory cells while performing a program operation on a memory cell in the string
US9646702B2 (en) 2012-04-03 2017-05-09 Micron Technology, Inc. Operating memory devices to apply a programming potential to a memory cell in a string coupled to a source and data line concurrently with biasing the data line to a greater potential than the source
US10847233B2 (en) 2012-04-03 2020-11-24 Micron Technology, Inc. Memory devices and apparatus configured to apply positive voltage levels to data lines for memory cells selected for and inhibited from programming
US10049756B2 (en) 2012-04-03 2018-08-14 Micron Technology, Inc. Memory devices that apply a programming potential to a memory cell in a string coupled to a source and data line concurrently with biasing the data line to a greater potential than the source
US9396791B2 (en) 2014-07-18 2016-07-19 Micron Technology, Inc. Programming memories with multi-level pass signal
US9922704B2 (en) 2014-07-18 2018-03-20 Micron Technology, Inc. Programming memories with multi-level pass signal
US10043574B2 (en) 2014-07-18 2018-08-07 Micron Technology, Inc. Programming memories with multi-level pass signal
US9633719B2 (en) 2015-05-29 2017-04-25 Micron Technology, Inc. Programming memory cells to be programmed to different levels to an intermediate level from a lowest level
US10147494B2 (en) 2015-05-29 2018-12-04 Micron Technology, Inc. Apparatus configured to program memory cells using an intermediate level for multiple data states
US10504600B2 (en) 2015-05-29 2019-12-10 Micron Technology, Inc. Apparatus configured to program memory cells using an intermediate level for multiple data states
US9953718B2 (en) 2015-05-29 2018-04-24 Micron Technology, Inc. Programming memory cells to be programmed to different levels to an intermediate level from a lowest level
US10217515B2 (en) 2017-04-01 2019-02-26 Intel Corporation Programming memory devices
US10741252B2 (en) 2018-12-18 2020-08-11 Micron Technology, Inc. Apparatus and methods for programming memory cells using multi-step programming pulses
US11238937B2 (en) 2018-12-18 2022-02-01 Micron Technology, Inc. Apparatus for programming memory cells using multi-step programming pulses

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US7944757B2 (en) 2011-05-17
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