US7985530B2 - Etch-enhanced technique for lift-off patterning - Google Patents
Etch-enhanced technique for lift-off patterning Download PDFInfo
- Publication number
- US7985530B2 US7985530B2 US11/856,862 US85686207A US7985530B2 US 7985530 B2 US7985530 B2 US 7985530B2 US 85686207 A US85686207 A US 85686207A US 7985530 B2 US7985530 B2 US 7985530B2
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- resist
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0272—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers for lift-off processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/856,862 US7985530B2 (en) | 2006-09-19 | 2007-09-18 | Etch-enhanced technique for lift-off patterning |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US82612406P | 2006-09-19 | 2006-09-19 | |
US82676206P | 2006-09-25 | 2006-09-25 | |
US11/856,862 US7985530B2 (en) | 2006-09-19 | 2007-09-18 | Etch-enhanced technique for lift-off patterning |
Publications (2)
Publication Number | Publication Date |
---|---|
US20100266965A1 US20100266965A1 (en) | 2010-10-21 |
US7985530B2 true US7985530B2 (en) | 2011-07-26 |
Family
ID=39682248
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/856,862 Active 2030-05-25 US7985530B2 (en) | 2006-09-19 | 2007-09-18 | Etch-enhanced technique for lift-off patterning |
Country Status (4)
Country | Link |
---|---|
US (1) | US7985530B2 (en) |
JP (1) | JP2010503993A (en) |
TW (1) | TW200823968A (en) |
WO (1) | WO2008097278A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120273457A1 (en) * | 2011-04-28 | 2012-11-01 | Canon Kabushiki Kaisha | Thin film patterning method |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7906274B2 (en) | 2007-11-21 | 2011-03-15 | Molecular Imprints, Inc. | Method of creating a template employing a lift-off process |
US7977129B2 (en) * | 2009-02-02 | 2011-07-12 | Sumitomo Electric Industries, Ltd. | Method for manufacturing semiconductor optical device |
CN101931485B (en) | 2009-06-19 | 2014-02-12 | 北京三星通信技术研究有限公司 | Method and device for generating dedicated reference signal (DRS) |
KR101408181B1 (en) | 2012-11-21 | 2014-06-16 | 한국기계연구원 | Method for manufacturing substrate formed a nano pattern |
TW201841221A (en) * | 2017-02-22 | 2018-11-16 | 日商東京威力科創股份有限公司 | Method for reducing lithography defects and pattern transfer |
US11131919B2 (en) * | 2018-06-22 | 2021-09-28 | International Business Machines Corporation | Extreme ultraviolet (EUV) mask stack processing |
WO2020003207A1 (en) * | 2018-06-28 | 2020-01-02 | 3M Innovative Properties Company | Methods of making metal patterns on flexible substrate |
CN113777880A (en) * | 2021-09-13 | 2021-12-10 | Tcl华星光电技术有限公司 | Micro LED device and preparation method thereof |
Citations (35)
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---|---|---|---|---|
US5773200A (en) * | 1994-06-23 | 1998-06-30 | Shin-Etsu Chemical Co., Ltd. | Positive resist composition suitable for lift-off technique and pattern forming method |
JPH1187676A (en) * | 1997-09-08 | 1999-03-30 | Sanyo Electric Co Ltd | Manufacture of color filter |
US6207570B1 (en) | 1999-08-20 | 2001-03-27 | Lucent Technologies, Inc. | Method of manufacturing integrated circuit devices |
US6274393B1 (en) | 1998-04-20 | 2001-08-14 | International Business Machines Corporation | Method for measuring submicron images |
US6284653B1 (en) | 2000-10-30 | 2001-09-04 | Vanguard International Semiconductor Corp. | Method of selectively forming a barrier layer from a directionally deposited metal layer |
US20030232252A1 (en) | 2002-06-18 | 2003-12-18 | Mancini David P. | Multi-tiered lithographic template and method of formation and use |
US6696220B2 (en) | 2000-10-12 | 2004-02-24 | Board Of Regents, The University Of Texas System | Template for room temperature, low pressure micro-and nano-imprint lithography |
US6713237B2 (en) * | 2000-07-27 | 2004-03-30 | Seagate Technology Llc | Single layer lift-off method for making an electronic device |
US20040065976A1 (en) | 2002-10-04 | 2004-04-08 | Sreenivasan Sidlgata V. | Method and a mold to arrange features on a substrate to replicate features having minimal dimensional variability |
US20040065252A1 (en) | 2002-10-04 | 2004-04-08 | Sreenivasan Sidlgata V. | Method of forming a layer on a substrate to facilitate fabrication of metrology standards |
US20050064344A1 (en) | 2003-09-18 | 2005-03-24 | University Of Texas System Board Of Regents | Imprint lithography templates having alignment marks |
US20050061773A1 (en) | 2003-08-21 | 2005-03-24 | Byung-Jin Choi | Capillary imprinting technique |
US20050084804A1 (en) | 2003-10-16 | 2005-04-21 | Molecular Imprints, Inc. | Low surface energy templates |
US6900881B2 (en) | 2002-07-11 | 2005-05-31 | Molecular Imprints, Inc. | Step and repeat imprint lithography systems |
US6916584B2 (en) | 2002-08-01 | 2005-07-12 | Molecular Imprints, Inc. | Alignment methods for imprint lithography |
US6919152B2 (en) | 2000-07-16 | 2005-07-19 | Board Of Regents, The University Of Texas System | High resolution overlay alignment systems for imprint lithography |
US20050158419A1 (en) | 2004-01-15 | 2005-07-21 | Watts Michael P. | Thermal processing system for imprint lithography |
US20050158900A1 (en) | 2004-01-16 | 2005-07-21 | Shih-Wei Lee | Fabrication method for liquid crystal display |
US6926929B2 (en) | 2002-07-09 | 2005-08-09 | Molecular Imprints, Inc. | System and method for dispensing liquids |
US20050189676A1 (en) | 2004-02-27 | 2005-09-01 | Molecular Imprints, Inc. | Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography |
US20050230882A1 (en) | 2004-04-19 | 2005-10-20 | Molecular Imprints, Inc. | Method of forming a deep-featured template employed in imprint lithography |
US20060019183A1 (en) | 2004-07-20 | 2006-01-26 | Molecular Imprints, Inc. | Imprint alignment method, system, and template |
US20060035029A1 (en) | 2004-08-16 | 2006-02-16 | Molecular Imprints, Inc. | Method to provide a layer with uniform etch characteristics |
US20060063112A1 (en) | 2004-09-21 | 2006-03-23 | Molecular Imprints, Inc. | Pattern reversal employing thick residual layers |
US20060067650A1 (en) | 2004-09-27 | 2006-03-30 | Clarence Chui | Method of making a reflective display device using thin film transistor production techniques |
US7027156B2 (en) | 2002-08-01 | 2006-04-11 | Molecular Imprints, Inc. | Scatterometry alignment for imprint lithography |
US7037639B2 (en) | 2002-05-01 | 2006-05-02 | Molecular Imprints, Inc. | Methods of manufacturing a lithography template |
US20060113697A1 (en) | 2004-12-01 | 2006-06-01 | Molecular Imprints, Inc. | Eliminating printability of sub-resolution defects in imprint lithography |
US7070405B2 (en) | 2002-08-01 | 2006-07-04 | Molecular Imprints, Inc. | Alignment systems for imprint lithography |
US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
US7136150B2 (en) | 2003-09-25 | 2006-11-14 | Molecular Imprints, Inc. | Imprint lithography template having opaque alignment marks |
US20070026324A1 (en) | 2005-07-28 | 2007-02-01 | Mitsubishi Electric Corporation | Substrate with light-shielding film, color filter substrate, method of manufacture of both, and display device having substrate with light-shielding film |
US20070122942A1 (en) | 2002-07-08 | 2007-05-31 | Molecular Imprints, Inc. | Conforming Template for Patterning Liquids Disposed on Substrates |
US20070287081A1 (en) | 2004-06-03 | 2007-12-13 | Molecular Imprints, Inc. | Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques |
US7309225B2 (en) | 2004-08-13 | 2007-12-18 | Molecular Imprints, Inc. | Moat system for an imprint lithography template |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2973874B2 (en) * | 1994-06-23 | 1999-11-08 | 信越化学工業株式会社 | Pattern formation method |
US7922474B2 (en) * | 2005-02-17 | 2011-04-12 | Asml Netherlands B.V. | Imprint lithography |
-
2007
- 2007-09-18 US US11/856,862 patent/US7985530B2/en active Active
- 2007-09-18 WO PCT/US2007/020234 patent/WO2008097278A2/en active Application Filing
- 2007-09-18 JP JP2009528345A patent/JP2010503993A/en active Pending
- 2007-09-19 TW TW096134890A patent/TW200823968A/en unknown
Patent Citations (41)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5773200A (en) * | 1994-06-23 | 1998-06-30 | Shin-Etsu Chemical Co., Ltd. | Positive resist composition suitable for lift-off technique and pattern forming method |
JPH1187676A (en) * | 1997-09-08 | 1999-03-30 | Sanyo Electric Co Ltd | Manufacture of color filter |
US6274393B1 (en) | 1998-04-20 | 2001-08-14 | International Business Machines Corporation | Method for measuring submicron images |
US6207570B1 (en) | 1999-08-20 | 2001-03-27 | Lucent Technologies, Inc. | Method of manufacturing integrated circuit devices |
US6919152B2 (en) | 2000-07-16 | 2005-07-19 | Board Of Regents, The University Of Texas System | High resolution overlay alignment systems for imprint lithography |
US6986975B2 (en) | 2000-07-16 | 2006-01-17 | Board Of Regents, The University Of Texas System | Method of aligning a template with a substrate employing moire patterns |
US6713237B2 (en) * | 2000-07-27 | 2004-03-30 | Seagate Technology Llc | Single layer lift-off method for making an electronic device |
US6696220B2 (en) | 2000-10-12 | 2004-02-24 | Board Of Regents, The University Of Texas System | Template for room temperature, low pressure micro-and nano-imprint lithography |
US20080095878A1 (en) | 2000-10-12 | 2008-04-24 | Board Of Regents, University Of Texas System | Imprint Lithography Template Having a Feature Size Under 250 nm |
US7229273B2 (en) | 2000-10-12 | 2007-06-12 | Board Of Regents, The University Of Texas System | Imprint lithography template having a feature size under 250 nm |
US6284653B1 (en) | 2000-10-30 | 2001-09-04 | Vanguard International Semiconductor Corp. | Method of selectively forming a barrier layer from a directionally deposited metal layer |
US7037639B2 (en) | 2002-05-01 | 2006-05-02 | Molecular Imprints, Inc. | Methods of manufacturing a lithography template |
US20030232252A1 (en) | 2002-06-18 | 2003-12-18 | Mancini David P. | Multi-tiered lithographic template and method of formation and use |
US6852454B2 (en) | 2002-06-18 | 2005-02-08 | Freescale Semiconductor, Inc. | Multi-tiered lithographic template and method of formation and use |
US20070122942A1 (en) | 2002-07-08 | 2007-05-31 | Molecular Imprints, Inc. | Conforming Template for Patterning Liquids Disposed on Substrates |
US6926929B2 (en) | 2002-07-09 | 2005-08-09 | Molecular Imprints, Inc. | System and method for dispensing liquids |
US6900881B2 (en) | 2002-07-11 | 2005-05-31 | Molecular Imprints, Inc. | Step and repeat imprint lithography systems |
US7077992B2 (en) | 2002-07-11 | 2006-07-18 | Molecular Imprints, Inc. | Step and repeat imprint lithography processes |
US20080174046A1 (en) | 2002-07-11 | 2008-07-24 | Molecular Imprints Inc. | Capillary Imprinting Technique |
US7070405B2 (en) | 2002-08-01 | 2006-07-04 | Molecular Imprints, Inc. | Alignment systems for imprint lithography |
US7027156B2 (en) | 2002-08-01 | 2006-04-11 | Molecular Imprints, Inc. | Scatterometry alignment for imprint lithography |
US7281921B2 (en) | 2002-08-01 | 2007-10-16 | Molecular Imprints, Inc. | Scatterometry alignment for imprint lithography |
US6916584B2 (en) | 2002-08-01 | 2005-07-12 | Molecular Imprints, Inc. | Alignment methods for imprint lithography |
US20040065976A1 (en) | 2002-10-04 | 2004-04-08 | Sreenivasan Sidlgata V. | Method and a mold to arrange features on a substrate to replicate features having minimal dimensional variability |
US20040065252A1 (en) | 2002-10-04 | 2004-04-08 | Sreenivasan Sidlgata V. | Method of forming a layer on a substrate to facilitate fabrication of metrology standards |
US20050061773A1 (en) | 2003-08-21 | 2005-03-24 | Byung-Jin Choi | Capillary imprinting technique |
US20050064344A1 (en) | 2003-09-18 | 2005-03-24 | University Of Texas System Board Of Regents | Imprint lithography templates having alignment marks |
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US20050158419A1 (en) | 2004-01-15 | 2005-07-21 | Watts Michael P. | Thermal processing system for imprint lithography |
US20050158900A1 (en) | 2004-01-16 | 2005-07-21 | Shih-Wei Lee | Fabrication method for liquid crystal display |
US20050189676A1 (en) | 2004-02-27 | 2005-09-01 | Molecular Imprints, Inc. | Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography |
US20050230882A1 (en) | 2004-04-19 | 2005-10-20 | Molecular Imprints, Inc. | Method of forming a deep-featured template employed in imprint lithography |
US20070287081A1 (en) | 2004-06-03 | 2007-12-13 | Molecular Imprints, Inc. | Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques |
US20060019183A1 (en) | 2004-07-20 | 2006-01-26 | Molecular Imprints, Inc. | Imprint alignment method, system, and template |
US7309225B2 (en) | 2004-08-13 | 2007-12-18 | Molecular Imprints, Inc. | Moat system for an imprint lithography template |
US20060035029A1 (en) | 2004-08-16 | 2006-02-16 | Molecular Imprints, Inc. | Method to provide a layer with uniform etch characteristics |
US20060063112A1 (en) | 2004-09-21 | 2006-03-23 | Molecular Imprints, Inc. | Pattern reversal employing thick residual layers |
US20060067650A1 (en) | 2004-09-27 | 2006-03-30 | Clarence Chui | Method of making a reflective display device using thin film transistor production techniques |
US20060113697A1 (en) | 2004-12-01 | 2006-06-01 | Molecular Imprints, Inc. | Eliminating printability of sub-resolution defects in imprint lithography |
US20070026324A1 (en) | 2005-07-28 | 2007-02-01 | Mitsubishi Electric Corporation | Substrate with light-shielding film, color filter substrate, method of manufacture of both, and display device having substrate with light-shielding film |
Non-Patent Citations (1)
Title |
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PCT/US07/20234 International Search Report, Sep. 12, 2008. |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120273457A1 (en) * | 2011-04-28 | 2012-11-01 | Canon Kabushiki Kaisha | Thin film patterning method |
Also Published As
Publication number | Publication date |
---|---|
WO2008097278A2 (en) | 2008-08-14 |
JP2010503993A (en) | 2010-02-04 |
WO2008097278A3 (en) | 2008-11-20 |
US20100266965A1 (en) | 2010-10-21 |
TW200823968A (en) | 2008-06-01 |
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