USB392242I5 - - Google Patents

Info

Publication number
USB392242I5
USB392242I5 US39224273A USB392242I5 US B392242 I5 USB392242 I5 US B392242I5 US 39224273 A US39224273 A US 39224273A US B392242 I5 USB392242 I5 US B392242I5
Authority
US
United States
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of USB392242I5 publication Critical patent/USB392242I5/en
Application granted granted Critical
Publication of US3926636A publication Critical patent/US3926636A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
    • C08G18/6283—Polymers of nitrogen containing compounds having carbon-to-carbon double bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
    • C08G18/46—Polycondensates having carboxylic or carbonic ester groups in the main chain having heteroatoms other than oxygen
    • C08G18/4615—Polycondensates having carboxylic or carbonic ester groups in the main chain having heteroatoms other than oxygen containing nitrogen
    • C08G18/463—Polycondensates having carboxylic or carbonic ester groups in the main chain having heteroatoms other than oxygen containing nitrogen containing nitro groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/68—Polyesters containing atoms other than carbon, hydrogen and oxygen
    • C08G63/685—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen
    • C08G63/6854—Polyesters containing atoms other than carbon, hydrogen and oxygen containing nitrogen derived from polycarboxylic acids and polyhydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/91—Polymers modified by chemical after-treatment
    • C08G63/914—Polymers modified by chemical after-treatment derived from polycarboxylic acids and polyhydroxy compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
  • Polyurethanes Or Polyureas (AREA)
US392242A 1972-08-29 1973-08-28 Photocurable compositions Expired - Lifetime US3926636A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2242394A DE2242394A1 (en) 1972-08-29 1972-08-29 MIXTURES OF SUBSTANCE HARDLED UNDER THE EFFECT OF LIGHT

Publications (2)

Publication Number Publication Date
USB392242I5 true USB392242I5 (en) 1975-01-28
US3926636A US3926636A (en) 1975-12-16

Family

ID=5854848

Family Applications (1)

Application Number Title Priority Date Filing Date
US392242A Expired - Lifetime US3926636A (en) 1972-08-29 1973-08-28 Photocurable compositions

Country Status (5)

Country Link
US (1) US3926636A (en)
JP (1) JPS4953933A (en)
DE (1) DE2242394A1 (en)
FR (1) FR2197914B3 (en)
GB (1) GB1442827A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2389158A1 (en) * 1977-04-27 1978-11-24 Du Pont COMPOSITION FOR BONDING A PHOTOGRAPHIC EMULSION TO A POLYESTER DANDRUFF SUPPORT

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4035189A (en) * 1972-02-25 1977-07-12 Hitachi Chemical Company, Ltd. Image forming curable resin compositions
US4321317A (en) * 1980-04-28 1982-03-23 General Motors Corporation High resolution lithography system for microelectronic fabrication
US4467022A (en) * 1980-08-11 1984-08-21 Minnesota Mining And Manufacturing Company Imaging process and article employing photolabile, blocked surfactant
US4599273A (en) * 1980-08-11 1986-07-08 Minnesota Mining And Manufacturing Co. Photolabile blocked surfactants and compositions containing the same
US4369244A (en) * 1980-08-11 1983-01-18 Minnesota Mining And Manufacturing Company Imaging process and article employing photolabile, blocked surfactant
US4478967A (en) * 1980-08-11 1984-10-23 Minnesota Mining And Manufacturing Company Photolabile blocked surfactants and compositions containing the same
US4551416A (en) * 1981-05-22 1985-11-05 At&T Bell Laboratories Process for preparing semiconductors using photosensitive bodies
US4410611A (en) * 1981-08-31 1983-10-18 General Motors Corporation Hard and adherent layers from organic resin coatings
DE3231145A1 (en) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen NEGATIVE WORKING METHOD FOR THE PRODUCTION OF RELIEF IMAGES OR RESIST PATTERNS
DE3231147A1 (en) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen POSITIVELY WORKING METHOD FOR PRODUCING RELIEF IMAGES OR RESIST PATTERNS
DE3231144A1 (en) * 1982-08-21 1984-02-23 Basf Ag, 6700 Ludwigshafen METHOD FOR PRODUCING PRINTING FORMS WITH PLASTIC PRINT LAYERS
DE3331691A1 (en) * 1983-09-02 1985-03-21 Basf Ag, 6700 Ludwigshafen LIGHT-SENSITIVE, CURABLE MIXTURE SUITABLE FOR POSITIVE RECORDING MATERIAL
US4540636A (en) * 1983-12-27 1985-09-10 General Motors Corporation Metal bearing element with a score-resistant coating
US4740600A (en) * 1984-05-10 1988-04-26 Minnesota Mining And Manufacturing Company Photolabile blocked surfactants and compositions containing the same
DE3701569A1 (en) * 1987-01-21 1988-08-04 Basf Ag COPOLYMERISATE WITH O-NITROCARBINOLESTER GROUPINGS, THE USE THEREOF AND METHOD FOR THE PRODUCTION OF SEMICONDUCTOR COMPONENTS
DE3702035A1 (en) * 1987-01-24 1988-08-04 Basf Ag COPOLYMERISATE WITH O-NITROCARBINOLESTER GROUPS AND METHOD FOR THE PRODUCTION OF TWO-LAYER RESISTORS AND SEMICONDUCTOR COMPONENTS
US6309822B1 (en) 1989-06-07 2001-10-30 Affymetrix, Inc. Method for comparing copy number of nucleic acid sequences
US5424186A (en) 1989-06-07 1995-06-13 Affymax Technologies N.V. Very large scale immobilized polymer synthesis
US6551784B2 (en) 1989-06-07 2003-04-22 Affymetrix Inc Method of comparing nucleic acid sequences
US6406844B1 (en) 1989-06-07 2002-06-18 Affymetrix, Inc. Very large scale immobilized polymer synthesis
US5143854A (en) 1989-06-07 1992-09-01 Affymax Technologies N.V. Large scale photolithographic solid phase synthesis of polypeptides and receptor binding screening thereof
US5744101A (en) 1989-06-07 1998-04-28 Affymax Technologies N.V. Photolabile nucleoside protecting groups
US6416952B1 (en) 1989-06-07 2002-07-09 Affymetrix, Inc. Photolithographic and other means for manufacturing arrays
US5800992A (en) 1989-06-07 1998-09-01 Fodor; Stephen P.A. Method of detecting nucleic acids
US5547839A (en) 1989-06-07 1996-08-20 Affymax Technologies N.V. Sequencing of surface immobilized polymers utilizing microflourescence detection
US6346413B1 (en) 1989-06-07 2002-02-12 Affymetrix, Inc. Polymer arrays
US6506558B1 (en) 1990-03-07 2003-01-14 Affymetrix Inc. Very large scale immobilized polymer synthesis
DE69132843T2 (en) 1990-12-06 2002-09-12 Affymetrix Inc N D Ges D Staat Identification of nucleic acids in samples
US6468740B1 (en) 1992-11-05 2002-10-22 Affymetrix, Inc. Cyclic and substituted immobilized molecular synthesis
DE19535161A1 (en) * 1995-09-22 1997-03-27 Basf Ag Radiation-curable compositions containing surface-active, blocked amino compounds
DE10129787A1 (en) * 2001-06-20 2003-01-09 Coronis Gmbh Optical component, in particular eye implant
DE10326893A1 (en) * 2003-06-14 2004-12-30 Degussa Ag Resins based on ketones and aldehydes with improved solubility properties and low color numbers
EP2380925A1 (en) 2010-04-22 2011-10-26 3M Innovative Properties Company Radiation curable composition, process of production and use thereof
ES2353293B1 (en) * 2010-11-09 2012-01-19 Primus Rain, S. L. COMPOSITION FOR THE SECTOR OF GRAPHIC ARTS, PROCEDURE AND USE OF THE SAME.
US10751262B2 (en) 2014-12-16 2020-08-25 3M Innovative Properties Company Cationically curing dental composition containing polymeric particles and use thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615629A (en) * 1967-03-10 1971-10-26 Basf Ag Photosensitive compositions for production of relief-bearing plates sheets or films

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3615629A (en) * 1967-03-10 1971-10-26 Basf Ag Photosensitive compositions for production of relief-bearing plates sheets or films

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Patchornik, J.A. et al., J. Amer. Chem. Soc., 92, 6333, 1970 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2389158A1 (en) * 1977-04-27 1978-11-24 Du Pont COMPOSITION FOR BONDING A PHOTOGRAPHIC EMULSION TO A POLYESTER DANDRUFF SUPPORT

Also Published As

Publication number Publication date
US3926636A (en) 1975-12-16
FR2197914A1 (en) 1974-03-29
DE2242394A1 (en) 1974-03-14
JPS4953933A (en) 1974-05-25
GB1442827A (en) 1976-07-14
FR2197914B3 (en) 1976-07-30

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