| Número de publicación | USD572909 S1 |
| Tipo de publicación | Concesión |
| Número de solicitud | 29/292,426 |
| Fecha de publicación | 15 Jul 2008 |
| Fecha de presentación | 11 Oct 2007 |
| Fecha de prioridad | 30 Oct 2006 |
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Substrate with camouflage pattern
US D572909 S1
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The ornamental design for a substrate with camouflage pattern, as shown and described.
The file of this patent contains at least one drawing/photograph executed in color. Copies of this patent with color drawing(s)/photograph(s) will be provided by the Patent and Trademark Office upon request and payment of the necessary fee.
The sole FIGURE is a plan view of a substrate with camouflage pattern showing our new design in color. A repeat unit of the design is enclosed within the broken lines of the drawing.
The broken lines do not form any part of the claimed design.
| Patente citante | Fecha de presentación | Fecha de publicación | Solicitante | Título |
|---|
| US8176569 | 24 Jun 2009 | 15 May 2012 | Mmi-Ipco, Llc | Advanced engineered garment |
| USRE43589 | 15 Jun 2011 | 21 Ago 2012 | Mmi-Ipco, Llc | Advanced engineered garment |
