USRE45297E1 - Method for enhancing the solderability of a surface - Google Patents

Method for enhancing the solderability of a surface Download PDF

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Publication number
USRE45297E1
USRE45297E1 US13/371,848 US201213371848A USRE45297E US RE45297 E1 USRE45297 E1 US RE45297E1 US 201213371848 A US201213371848 A US 201213371848A US RE45297 E USRE45297 E US RE45297E
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Prior art keywords
silver
immersion
resinous
plating
solderability
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Ronald Redline
David Sawoska
Peter Kukanskis
Donald Ferrier
Eric Yakobson
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Priority claimed from US08/621,098 external-priority patent/US5733599A/en
Priority claimed from US09/251,641 external-priority patent/US6200451B1/en
Priority claimed from US09/821,205 external-priority patent/US6544397B2/en
Priority claimed from US10/456,329 external-priority patent/US7267259B2/en
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Priority to US13/371,848 priority Critical patent/USRE45297E1/en
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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/001Interlayers, transition pieces for metallurgical bonding of workpieces
    • B23K35/007Interlayers, transition pieces for metallurgical bonding of workpieces at least one of the workpieces being of copper or another noble metal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/42Coating with noble metals
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/54Contact plating, i.e. electroless electrochemical plating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/46Electroplating: Baths therefor from solutions of silver
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing the conductive pattern
    • H05K3/244Finish plating of conductors, especially of copper conductors, e.g. for pads or lands

Definitions

  • This invention relates generally to a method of treating a surface which treatment enhances the solderability of the surface.
  • the method is particularly useful in the fabrication and assembly of printed circuit boards.
  • Soldering is generally used for making mechanical, electromechanical, or electronic connections to a variety of articles.
  • the distinction between expected functions of the joints is important because each application has its own specific requirements for surface preparation. Of the three soldering applications, making electronic connections is the most demanding.
  • connections of electronic components to the printed circuits are made by soldering of the leads of the components to the through-holes, surrounding pads, lands and other points of connection (collectively, “Areas of Connection”). Typically the connection occurs by wave soldering techniques.
  • the printed circuit fabricator is required to arrange that the through-holes, pads, lands and other points of connection are receptive to the subsequent soldering processes.
  • these surfaces must be readily wettable by the solder and permit an integral conductive connection with the leads or surfaces of the electronic components. Because of these needs, printed circuit fabricators have devised various methods of preserving and enhancing the solderability of surfaces.
  • solder leveling a process that provides the surfaces with a pre-coating of solder. This is typically performed by a process called hot air solder leveling or through some type of plating process. In printed circuit fabrication, however, this method has several drawbacks. The use of hot air solder leveling may cause unacceptably high rate of defects due to shorts, particularly when dealing with small circuits. If plating is used, since it is not easy to selectively provide these areas with solder, all conductive areas of the board must be solder plated causing severe problems with the subsequent application of solder mask. In addition the foregoing processes are inefficient and relatively expensive.
  • Another means of arranging good solderability of these surfaces is to plate them with a final finish coating of a precious metal such as gold, palladium or rhodium.
  • a precious metal such as gold, palladium or rhodium.
  • U.S. Pat. No. 5,235,139 (Bengston, et. al.), the teachings of which are incorporated herein by reference, proposes a method for achieving this previous metal final finish. Bengston et. al. propose plating the copper areas to be soldered with electroless nickel-boron, followed by a precious metal coating such as gold. See also U.S. Pat. No. 4,940,181 to Juskey, Jr.
  • the method of preserving solderability proposed herein is the coating of copper surfaces to be soldered with an immersion silver plate prior to soldering. It has been found, however, that when the foregoing method is used the immersion silver coating has a tendency to develop outgrowths or filaments via an electromigration mechanism when the circuits are being used (ie. with voltage potentials present) in the presence of moisture.
  • the tendency for electromigration to occur can be measured by a standard technique specified in Bellcore GR-78-CORE (13.2.5, 13.2.7) standard test procedures which are incorporated herein by reference in their entirety.
  • the foregoing Bellcore procedure measures the average insulation resistance between circuit features.
  • Bellcore and IPC standards require, that the average insulation resistance not decrease by more than one decade between the initial value (obtained after a conditioning period of 96 hours at 85° C./85% relative humidity with no bias) and the final value (obtained after an additional 500 hours at 85° C./85% relative humidity with a 10 V dc bias applied).
  • One method which may be used to overcome the electromigration of immersion silver plating is to coat the immersion silver plate with another more noble metal such as gold.
  • the disadvantages of this method are the expense of gold plating as well as the necessity for additional process steps.
  • the current invention proposes the use of an immersion silver coating as an improved solderability preservative for various surfaces, particularly copper surfaces.
  • Preferred compositions for depositing the immersion silver coating are also disclosed.
  • the novel immersion silver plating process produces a silver plate which is more resistant to electromigration than conventional immersion silver deposits.
  • the process proposed is a versatile, low cost method for effectively preserving the solderability of surfaces, particularly copper surfaces and areas of connection on printed circuit boards.
  • the current invention proposes a process for preserving and enhancing the solderability of a metal surface, particularly copper surfaces.
  • the proposed process comprises the following steps:
  • the proposed process comprises the following steps:
  • immersion silver deposits provide excellent solderability preservatives, which are particularly useful in the fabrication of printed circuit boards.
  • solderability achievable with a simple immersion silver deposit in printed circuit applications has unexpectedly been found to exceed that achievable with prior art nickel-gold plating processes such as described in U.S. Pat. No. 5,235,139 and unexpectedly exceeds that achievable with other immersion deposits.
  • the processes of the current invention yield surfaces which are very solderable under adverse conditions. In printed circuit applications the surfaces are wire bondable.
  • immersion plating is a process which results from a replacement reaction whereby the surface being plated dissolves into solution and at the same time the metal being plated deposits from the plating solution onto the surface.
  • the immersion plating initiates without prior activation of the surfaces.
  • the metal to be plated is generally more noble than the surface metal.
  • immersion plating is usually significantly easier to control and significantly more cost effective than electroless plating, which requires sophisticated auto catalytic plating solutions and processes for activation of the surfaces prior to plating.
  • the soluble source of silver ions can be derived from a variety of silver compounds.
  • the inventors have found silver nitrate to be most preferable.
  • the concentration of silver in the plating solution can range from 0.1 to 25 grams per liter, but is most preferably present in a concentration of 0.5 to 2 grams per liter.
  • the concentration of acid in the plating solution can range from 1 to 150 grams per liter but is preferably in the range of 5 to 50 grams per liter.
  • the additives may be selected from the group consisting of fatty amines, fatty acids, fatty amides, quaternary salts, amphoteric salts, resinous amines, resinous amides, resinous acids and mixtures of the foregoing.
  • suitable fatty amines are tallowamine and cocoamine.
  • suitable fatty acids are stearic acid, oleic acid, palmitic acid and acids derived from the distillation of tall oil.
  • suitable fatty amides are cocamide and tallowamide.
  • suitable quaternary salts are (stearamidopropyl) dimethyl hydroxyethylammonium dihydrogen phosphate.
  • suitable amphoteric salts are alkyliminodipropionic acid monosodium salts wherein the alkyl portion may be coco, tallow or similar organic alkyl chains.
  • suitable resinous amines are amines derived from tall oil acids.
  • suitable resinous amides are cocoamide, tallow amide and amides derived from tall oil acids.
  • suitable resinous acids are acids derived from the distillation of tall oil such as abetic acid.
  • ethoxylated and/or propoxylated versions of any of the foregoing materials such as ethoxylated or propoxylated fatty amines, ethoxylated or propoxylated fatty acids, ethoxylated or propoxylated quaternary salts, ethoxylated or propoxylated amphoteric salts, ethoxylated or propoxylated resinous amines, ethoxylated or propoxylated resinous amides, and ethoxylated or propoxylated resinous acids.
  • Preferred additives include ethoxylated tallowamine, cyastat LS (quaternary ammonium methylsulfate of a fatty amidoalkyl amine) and ethoxylated cocoamine.
  • concentration of the foregoing additives in the immersion silver plating bath or in the subsequent surface treatment composition may range from 0.1 to 15 grams per liter but is preferably from 1 to 5 grams per liter.
  • imidazole or imidazole derivative of the following formula has a significant positive impact upon the plate produced by immersion plating solutions, particularly immersion silver plating solutions used in the processes of this invention:
  • R 1 , R 2 , R 3 and R 4 are independently selected from the group consisting of substituted or unsubstituted alkyl groups, substituted or unsubstituted aryl groups, halogens, nitro groups and hydrogen.
  • an imidazole as described above brightens the plated deposit and improves the integrity and physical properties of the resultant plated deposit.
  • the imidazole also extends the useful life of the immersion plating solution. The inventors have found that histidine is a particularly preferred imidazole for the purposes of these processes.
  • imidazoles provides significant advantages in immersion plating solutions in general, but is particularly useful and advantageous in immersion silver plating.
  • the inventors have found that immersion silver deposits resulting from plating baths containing imidazoles are brighter, smoother and more cohesive than immersion silver deposits plated from baths which do not have imidazoles.
  • the immersion plating baths with imidazoles have longer effective lives than comparable baths without imidazoles.
  • the plating solution may, optionally, advantageously also contain an oxidant.
  • an oxidant most preferably dinitro compounds, such as 3,5 dinitrohydroxybenzoic acid are preferred in this regard.
  • concentration of such an oxidant in the solution can range from 0.1 to 25 grams per liter, but is preferably from 0.5 to 2 grams per liter.
  • the immersion silver solution can be used in the processes of the current invention at temperatures ranging from room temperature to 200° F. but is preferably used at from 80 to 120° F.
  • the time for immersion in the plating solution can range from 1 to 30 minutes but is preferably from 1 to 5 minutes.
  • the immersion silver solution of the current invention is thus used to plate a thin layer of silver onto the surface to be soldered. It is believed that the resultant silver coating should be from 1 to 100 micro inches thick, preferably from 10 to 60 micro inches thick for effective enhancement and preservation of the solderability of the surface. Although this process is effective in soldering many surfaces, it is particularly useful in soldering copper surfaces, such as Areas of Connection on printed circuit boards.
  • solder mask over bare copper (SMOBC) boards is most useful in the fabrication of printed circuit boards, particularly solder mask over bare copper (SMOBC) boards.
  • SMOBC solder mask over bare copper
  • the solder mask is applied to the surfaces of the board then exposed and developed to reveal the Areas of Connection. These Areas of Connection are then essentially the only exposed areas of copper on the board, with the remainder essentially being covered by solder mask. These exposed Areas of Connection are thus destined to be points of attachment, in most cases by soldering, when the electronic components are later placed on the board later in the fabrication cycle. Therefore, the solderability of these exposed points, generally copper, must be enhanced and preserved.
  • these areas are then preferably cleaned, using an acid cleaner, and subsequently microetched to prepare the surface for acceptable immersion plating.
  • the board is immersed in the immersion silver plating solution, such that a silver deposit of appropriate thickness is achieved.
  • IPC-B 25 test circuit boards were processed with the following steps:
  • IPC-B-25 test circuit boards were treated as noted in Example I except that in this case the immersion silver plating bath also contained 5.0 gr/l of tallow amine ethoxylated with 15 moles of ethylene oxide. The circuit boards were then tested according to the Belcore GR-78-Core (13.2.5, 13.2.7) standard test method and the results are recorded in Table 1.
  • IPC-B-25 test circuit boards were treated as noted in Example I except that in this case the immersion silver plating bath also contained 1.1 g/l of Pamak 25-S which is available from Hercules, Incorporated of Wilmington, Del. and is a blend of fatty and resinous acids. The circuit boards were then tested according to Belcore GR-78-Core (13.2.5, 13.2.7) standard test method and the results are recorded in Table 1.
  • IPC-B-25 test circuit boards were treated as noted in Example I except in this case after step (g) the circuit boards were further processed as follows:
  • IPC-B-25 test circuit boards were treated as noted in Example IV except that in this case the Cyastat LS was placed with 5.0 gr/l Cocoamine ethoxylated with 2 moles of ethylene oxide. The circuit boards were then tested according to Belcore GR-78-Core (13.2.5, 13.2.7) standard test method and the results are recorded in Table 1.

Abstract

A method for enhancing the solderability of a metallic surface is disclosed where the metallic surface is plated with an immersion silver plate prior to soldering, which immersion silver plate is treated with an additive selected from the group consisting of fatty amines, fatty amides, quaternary salts, amphateric salts, resinous amines, resinous amides, fatty acids, resinous acids, ethoxylated derivatives of any of the foregoing, and mixtures of any of the foregoing. The immersion silver deposits created are resistant to electromigration.

Description

RELATED U.S. APPLICATION DATA
Continuation of application Ser. No. 10/341,859, filed on Jan. 14, 2003, now U.S. Pat. No. 6,905,587, which is division of application Ser. No. 09/821,205, filed on Mar. 29, 2001, now U.S. Pat. No. 6,544,397, which is a continuation-in-part of application Ser. No. 09/698,370, filed on Oct. 26, 2000, now U.S. Pat. No. 6,444,109, which is a division of application Ser. No. 09/251,641, filed on Feb. 17, 1999, now U.S. Pat. No. 6,200,451, which is a continuation-in-part of application Ser. No. 08/982,980, now U.S. Pat. No. 5,935,640, which is a division of application Ser. No. 08/621,098, now U.S. Pat. No. 5,733,599.
FIELD OF THE INVENTION
This invention relates generally to a method of treating a surface which treatment enhances the solderability of the surface. The method is particularly useful in the fabrication and assembly of printed circuit boards.
BACKGROUND OF THE INVENTION
Soldering is generally used for making mechanical, electromechanical, or electronic connections to a variety of articles. The distinction between expected functions of the joints is important because each application has its own specific requirements for surface preparation. Of the three soldering applications, making electronic connections is the most demanding.
In the manufacture of electronic equipment utilizing printed circuits, connections of electronic components to the printed circuits are made by soldering of the leads of the components to the through-holes, surrounding pads, lands and other points of connection (collectively, “Areas of Connection”). Typically the connection occurs by wave soldering techniques.
To facilitate this soldering operation, the printed circuit fabricator is required to arrange that the through-holes, pads, lands and other points of connection are receptive to the subsequent soldering processes. Thus these surfaces must be readily wettable by the solder and permit an integral conductive connection with the leads or surfaces of the electronic components. Because of these needs, printed circuit fabricators have devised various methods of preserving and enhancing the solderability of surfaces.
One means of arranging good solderability of the surfaces in question is to provide the surfaces with a pre-coating of solder. This is typically performed by a process called hot air solder leveling or through some type of plating process. In printed circuit fabrication, however, this method has several drawbacks. The use of hot air solder leveling may cause unacceptably high rate of defects due to shorts, particularly when dealing with small circuits. If plating is used, since it is not easy to selectively provide these areas with solder, all conductive areas of the board must be solder plated causing severe problems with the subsequent application of solder mask. In addition the foregoing processes are inefficient and relatively expensive.
Another means of arranging good solderability of these surfaces is to plate them with a final finish coating of a precious metal such as gold, palladium or rhodium. U.S. Pat. No. 5,235,139 (Bengston, et. al.), the teachings of which are incorporated herein by reference, proposes a method for achieving this previous metal final finish. Bengston et. al. propose plating the copper areas to be soldered with electroless nickel-boron, followed by a precious metal coating such as gold. See also U.S. Pat. No. 4,940,181 to Juskey, Jr. et al., the teachings of which are incorporated herein by reference for a similar process which teaches the plating of electroless copper, followed by electrolytic copper, followed by nickel followed by gold as a solderable surface. These processes work well but are time consuming and expensive.
Various attempts have been made to selectively apply solder to the necessary areas only. One such method involves use of organic etch resists over the solder plated areas of connection followed by selective stripping of tin-lead from the copper traces before application of the solder mask. See U.S. Pat. No. 4,978,423 to Durnwith et. al. See also U.S. Pat. No. 5,160,579 to Larson, the teachings of which are incorporated herein by reference, for other known selective solder processes.
Soldering directly to copper surfaces has been difficult and inconsistent. These problems are due mainly to the inability of keeping the copper surfaces clean and free of oxidation throughout the soldering operation. Various organic treatments have been developed to preserve copper surfaces in a readily solderable state. For example, see U.S. Pat. No. 5,173,130 (Kinoshita) which teaches the use of certain 2-alkylbenzimidazoles as copper pre-fluxes to preserve the solderability of the copper surfaces. Treatments such as those taught in Kinoshita have proven successful but there is still need to improve the reliability of the process.
The method of preserving solderability proposed herein is the coating of copper surfaces to be soldered with an immersion silver plate prior to soldering. It has been found, however, that when the foregoing method is used the immersion silver coating has a tendency to develop outgrowths or filaments via an electromigration mechanism when the circuits are being used (ie. with voltage potentials present) in the presence of moisture.
The tendency for electromigration to occur can be measured by a standard technique specified in Bellcore GR-78-CORE (13.2.5, 13.2.7) standard test procedures which are incorporated herein by reference in their entirety. The foregoing Bellcore procedure measures the average insulation resistance between circuit features. Bellcore and IPC standards require, that the average insulation resistance not decrease by more than one decade between the initial value (obtained after a conditioning period of 96 hours at 85° C./85% relative humidity with no bias) and the final value (obtained after an additional 500 hours at 85° C./85% relative humidity with a 10 V dc bias applied).
One method which may be used to overcome the electromigration of immersion silver plating is to coat the immersion silver plate with another more noble metal such as gold. The disadvantages of this method are the expense of gold plating as well as the necessity for additional process steps.
It is an object of this invention to propose a method for preserving and enhancing the solderability of copper surfaces by plating said copper surface with a novel immersion silver plate which is more resistant to electromigration than prior art immersion silver deposits.
SUMMARY OF THE INVENTION
The current invention proposes the use of an immersion silver coating as an improved solderability preservative for various surfaces, particularly copper surfaces. Preferred compositions for depositing the immersion silver coating are also disclosed. The novel immersion silver plating process produces a silver plate which is more resistant to electromigration than conventional immersion silver deposits. The process proposed is a versatile, low cost method for effectively preserving the solderability of surfaces, particularly copper surfaces and areas of connection on printed circuit boards.
DETAILED DESCRIPTION OF THE INVENTION
The current invention proposes a process for preserving and enhancing the solderability of a metal surface, particularly copper surfaces. The proposed process comprises the following steps:
    • a). cleaning the metal surface;
    • b). optionally, etching the metal surface;
    • c). treating the metal surface with an immersion silver plating solution, said solution comprising:
      • 1. a soluble source of silver ions;
      • 2. an acid;
      • 3. an additive selected from the group consisting of fatty amines, fatty amides, quaternary salts, amphoteric salts, resinous amines, resinous amides, fatty acids, resinous acids, and mixtures of the foregoing;
      • 4. optionally, an imidazole, benzimidazole, or imidazole derivative; and
      • 5. optionally, an oxidant.
Alternatively, the proposed process comprises the following steps:
    • a). cleaning the metal surfaces;
    • b). optionally, etching the metal surfaces;
    • c). treating the metal surface with an immersion silver plating solution;
    • d). treating the immersion silver plated surface with a solution which comprises an additive selected from the group consisting of fatty amines, fatty amides, quaternary salts, amphoteric salts, resinous amines, resinous amides, fatty acids, resinous acids and mixtures of the foregoing.
It has been discovered that immersion silver deposits provide excellent solderability preservatives, which are particularly useful in the fabrication of printed circuit boards. The solderability achievable with a simple immersion silver deposit in printed circuit applications has unexpectedly been found to exceed that achievable with prior art nickel-gold plating processes such as described in U.S. Pat. No. 5,235,139 and unexpectedly exceeds that achievable with other immersion deposits. As can be seen in the examples to follow, the processes of the current invention yield surfaces which are very solderable under adverse conditions. In printed circuit applications the surfaces are wire bondable. In addition the incorporation of an additive, selected from the group consisting of fatty amines, fatty amides, quaternary salts, amphoteric salts, resinous amines, resinous amides, fatty acids, resinous acids and mixtures of the foregoing, into the immersion silver deposit by incorporation in the plating bath or subsequent treatment of the plated surface greatly reduces the tendency of the silver deposit to electromigrate. Immersion plating is a process which results from a replacement reaction whereby the surface being plated dissolves into solution and at the same time the metal being plated deposits from the plating solution onto the surface. The immersion plating initiates without prior activation of the surfaces. The metal to be plated is generally more noble than the surface metal. Thus immersion plating is usually significantly easier to control and significantly more cost effective than electroless plating, which requires sophisticated auto catalytic plating solutions and processes for activation of the surfaces prior to plating.
The soluble source of silver ions can be derived from a variety of silver compounds. The inventors have found silver nitrate to be most preferable. The concentration of silver in the plating solution can range from 0.1 to 25 grams per liter, but is most preferably present in a concentration of 0.5 to 2 grams per liter.
Although a variety of acids are suitable for use in this formulation, the inventors have found that methane sulfonic acid or nitric acid is most preferred. The concentration of acid in the plating solution can range from 1 to 150 grams per liter but is preferably in the range of 5 to 50 grams per liter.
In order to prevent or significantly reduce the tendency for immersion silver plates to electromigrate in the application proposed, the inventors have found it necessary to incorporate certain additives into the plated deposit, either by incorporation of the additives in the plating bath itself or by subsequent treatment of the plated surface with the additives. Incorporation of the additives into the plating bath itself is the preferred method. The additives may be selected from the group consisting of fatty amines, fatty acids, fatty amides, quaternary salts, amphoteric salts, resinous amines, resinous amides, resinous acids and mixtures of the foregoing. Examples of suitable fatty amines are tallowamine and cocoamine. Examples of suitable fatty acids are stearic acid, oleic acid, palmitic acid and acids derived from the distillation of tall oil. Examples of suitable fatty amides are cocamide and tallowamide. Examples of suitable quaternary salts are (stearamidopropyl) dimethyl hydroxyethylammonium dihydrogen phosphate. Examples of suitable amphoteric salts are alkyliminodipropionic acid monosodium salts wherein the alkyl portion may be coco, tallow or similar organic alkyl chains. Examples of suitable resinous amines are amines derived from tall oil acids. Examples of suitable resinous amides are cocoamide, tallow amide and amides derived from tall oil acids. Examples of suitable resinous acids are acids derived from the distillation of tall oil such as abetic acid. Also suitable are ethoxylated and/or propoxylated versions of any of the foregoing materials such as ethoxylated or propoxylated fatty amines, ethoxylated or propoxylated fatty acids, ethoxylated or propoxylated quaternary salts, ethoxylated or propoxylated amphoteric salts, ethoxylated or propoxylated resinous amines, ethoxylated or propoxylated resinous amides, and ethoxylated or propoxylated resinous acids. Preferred additives include ethoxylated tallowamine, cyastat LS (quaternary ammonium methylsulfate of a fatty amidoalkyl amine) and ethoxylated cocoamine. The concentration of the foregoing additives in the immersion silver plating bath or in the subsequent surface treatment composition may range from 0.1 to 15 grams per liter but is preferably from 1 to 5 grams per liter.
The inventors have discovered that the inclusion of imidazole or imidazole derivative of the following formula has a significant positive impact upon the plate produced by immersion plating solutions, particularly immersion silver plating solutions used in the processes of this invention:
Figure USRE045297-20141223-C00001
Wherein R1, R2, R3 and R4 are independently selected from the group consisting of substituted or unsubstituted alkyl groups, substituted or unsubstituted aryl groups, halogens, nitro groups and hydrogen.
The inclusion of an imidazole as described above brightens the plated deposit and improves the integrity and physical properties of the resultant plated deposit. In addition, the imidazole also extends the useful life of the immersion plating solution. The inventors have found that histidine is a particularly preferred imidazole for the purposes of these processes.
The inclusion of imidazoles provides significant advantages in immersion plating solutions in general, but is particularly useful and advantageous in immersion silver plating. The inventors have found that immersion silver deposits resulting from plating baths containing imidazoles are brighter, smoother and more cohesive than immersion silver deposits plated from baths which do not have imidazoles. In addition the immersion plating baths with imidazoles have longer effective lives than comparable baths without imidazoles. These same advantages are achievable by the inclusion of imidazoles in other immersion plating baths, including copper, palladium, gold, ruthenium and rhodium.
With respect to the immersion silver compositions useful in the present invention, the plating solution may, optionally, advantageously also contain an oxidant. The inventors have found that nitro aromatic compounds most preferably dinitro compounds, such as 3,5 dinitrohydroxybenzoic acid are preferred in this regard. The concentration of such an oxidant in the solution can range from 0.1 to 25 grams per liter, but is preferably from 0.5 to 2 grams per liter.
The immersion silver solution can be used in the processes of the current invention at temperatures ranging from room temperature to 200° F. but is preferably used at from 80 to 120° F. The time for immersion in the plating solution can range from 1 to 30 minutes but is preferably from 1 to 5 minutes.
The immersion silver solution of the current invention is thus used to plate a thin layer of silver onto the surface to be soldered. It is believed that the resultant silver coating should be from 1 to 100 micro inches thick, preferably from 10 to 60 micro inches thick for effective enhancement and preservation of the solderability of the surface. Although this process is effective in soldering many surfaces, it is particularly useful in soldering copper surfaces, such as Areas of Connection on printed circuit boards.
Although this technique may be utilized advantageously over almost any surface, it is most useful in the fabrication of printed circuit boards, particularly solder mask over bare copper (SMOBC) boards. Thus, in fabricating SMOBC boards, the solder mask is applied to the surfaces of the board then exposed and developed to reveal the Areas of Connection. These Areas of Connection are then essentially the only exposed areas of copper on the board, with the remainder essentially being covered by solder mask. These exposed Areas of Connection are thus destined to be points of attachment, in most cases by soldering, when the electronic components are later placed on the board later in the fabrication cycle. Therefore, the solderability of these exposed points, generally copper, must be enhanced and preserved.
Thus according to the current invention these areas are then preferably cleaned, using an acid cleaner, and subsequently microetched to prepare the surface for acceptable immersion plating. Following this preferred preparation, the board is immersed in the immersion silver plating solution, such that a silver deposit of appropriate thickness is achieved.
The invention is further described for illustrative purposes only in the following examples which are in no way limiting of the invention itself. In each of the examples standard IPC-B-25 test circuit boards are utilized in order to provide consistency. IPC-B-25 standard is incorporated herein by reference in its entirety.
EXAMPLE I
IPC-B 25 test circuit boards were processed with the following steps:
    • a). Acid Cleaner, 5 minutes, 120° F.
    • b). Water Rinse
    • c). Sodium persulfate/sulfuric acid microetch, 1 minute, 95° F.
    • d). Water rinse
    • e). Water rinse
    • f). Immersion silver plate using the following composition
hydroxy ethylenediamine tetraacetic acid 10 gr/l
silver nitrate 2.4 gr/l
igepal Co730 5.0 gr/l
imidazole 10 gr/l
nitric acid 32.0 ml/l
    • g). water rinse.
The circuit boards were then tested according to the Bellcore GR-78-Core (13.2.5, 13.2.7) standard test method and the results are recorded in Table 1.
EXAMPLE II
IPC-B-25 test circuit boards were treated as noted in Example I except that in this case the immersion silver plating bath also contained 5.0 gr/l of tallow amine ethoxylated with 15 moles of ethylene oxide. The circuit boards were then tested according to the Belcore GR-78-Core (13.2.5, 13.2.7) standard test method and the results are recorded in Table 1.
EXAMPLE III
IPC-B-25 test circuit boards were treated as noted in Example I except that in this case the immersion silver plating bath also contained 1.1 g/l of Pamak 25-S which is available from Hercules, Incorporated of Wilmington, Del. and is a blend of fatty and resinous acids. The circuit boards were then tested according to Belcore GR-78-Core (13.2.5, 13.2.7) standard test method and the results are recorded in Table 1.
EXAMPLE IV
IPC-B-25 test circuit boards were treated as noted in Example I except in this case after step (g) the circuit boards were further processed as follows:
    • h). treatment with an aqueous solution containing:
      • 5.0 gr./l Cyastat L5 (quaternary ammonium methylsulfate of a fatty amidoalkyl amine)
      • 32 ml/l Nitric Acid (70%)
      • balance—water
    • i). water rinse.
The circuit boards were then tested according to Belcore GR-78-Core (13.2.5, 13.2.7) standard test method and the results are recorded in Table 1.
EXAMPLE V
IPC-B-25 test circuit boards were treated as noted in Example IV except that in this case the Cyastat LS was placed with 5.0 gr/l Cocoamine ethoxylated with 2 moles of ethylene oxide. The circuit boards were then tested according to Belcore GR-78-Core (13.2.5, 13.2.7) standard test method and the results are recorded in Table 1.
TABLE 1
Example Initial Value (ohms) Final Value (ohms)
1 2.0E+09 <1.0E+06 
2 2.6E+09 3.3E+09
3 4.1E+09 7.9E+09
4 3.0E+09 6.8E+08
5 1.9E+09 4.5E+09

Claims (7)

We claim:
1. A process for improving the solderability of a metal surface comprising copper, said process comprising treating the metal surface with an immersion silver plating solution, said solution comprising:
a) a soluble source of silver ions wherein the silver ion concentration in the plating solution is from 0.1 to 25 g/l.;
b) an acid; and
c) an aromatic nitro compound; and subsequently soldering to the surface.
2. A process according to claim 1, wherein the aromatic nitro compound comprises an aromatic dinitro compound.
3. A process according to claim 1, wherein the aromatic nitro compound is 3,5 dinitrohydroxy benzoic acid.
4. A process according to claim 1, wherein the concentration of the aromatic nitro compound is from 0.1 to 25 grams per liter.
5. A An immersion silver plating solution comprising:
a) a soluble source of silver ions wherein the silver ion concentration in the plating solution is from 0.1 to 25 g/l;
b) an acid; and
c) an aromatic dinitro compound.
6. A silver plating solution according to claim 5, wherein the aromatic dinitro compound is 3,5 dinitrohydroxy benzoic acid.
7. A silver plating solution according to claim 5, wherein the concentration of the aromatic dinitro compound is from 0.1. to 25 grams per liter.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10184189B2 (en) 2016-07-18 2019-01-22 ECSI Fibrotools, Inc. Apparatus and method of contact electroplating of isolated structures

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9425031D0 (en) * 1994-12-09 1995-02-08 Alpha Metals Ltd Printed circuit board manufacture
GB9425030D0 (en) 1994-12-09 1995-02-08 Alpha Metals Ltd Silver plating
US6905587B2 (en) 1996-03-22 2005-06-14 Ronald Redline Method for enhancing the solderability of a surface
US6544397B2 (en) 1996-03-22 2003-04-08 Ronald Redline Method for enhancing the solderability of a surface
USRE45842E1 (en) 1999-02-17 2016-01-12 Ronald Redline Method for enhancing the solderability of a surface
US8349393B2 (en) * 2004-07-29 2013-01-08 Enthone Inc. Silver plating in electronics manufacture
US20100143373A1 (en) * 2006-12-06 2010-06-10 Medimmune, Llc Methods of treating systemic lupus erythematosus
US7883738B2 (en) * 2007-04-18 2011-02-08 Enthone Inc. Metallic surface enhancement
US10017863B2 (en) * 2007-06-21 2018-07-10 Joseph A. Abys Corrosion protection of bronzes
TWI453301B (en) * 2007-11-08 2014-09-21 Enthone Self assembled molecules on immersion silver coatings
US7972655B2 (en) 2007-11-21 2011-07-05 Enthone Inc. Anti-tarnish coatings
US8869165B2 (en) * 2008-03-20 2014-10-21 International Business Machines Corporation Integrating flow orchestration and scheduling of jobs and data activities for a batch of workflows over multiple domains subject to constraints
US8341628B2 (en) * 2009-12-23 2012-12-25 International Business Machines Corporation Controlling depth and latency of exit of a virtual processor's idle state in a power management environment

Citations (93)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB592443A (en) 1944-09-14 1947-09-18 Westinghouse Electric Int Co Improvements in or relating to electro-plating
GB602591A (en) 1945-02-12 1948-05-31 Du Pont Improvements in or relating to the electro-deposition of metals
US2555375A (en) 1948-11-13 1951-06-05 Battelle Development Corp Process of plating bright silver alloy
US2757104A (en) 1953-04-15 1956-07-31 Metalholm Engineering Corp Process of forming precision resistor
US2777810A (en) 1956-10-03 1957-01-15 Elechem Corp Bath for electroplating silver
US2883288A (en) 1955-08-17 1959-04-21 Lewco Inc Silver plating bath
US3130072A (en) 1961-09-22 1964-04-21 Sel Rex Corp Silver-palladium immersion plating composition and process
US3162512A (en) 1961-03-21 1964-12-22 Engelhard Ind Inc Immersion plating with noble metals and the product thereof
US3202488A (en) 1964-03-04 1965-08-24 Chomerics Inc Silver-plated copper powder
US3230098A (en) 1962-10-09 1966-01-18 Engelhard Ind Inc Immersion plating with noble metals
US3285754A (en) 1962-07-05 1966-11-15 Johnson Matthey Co Ltd Deposition of palladium
US3294578A (en) 1963-10-22 1966-12-27 Gen Aniline & Film Corp Deposition of a metallic coat on metal surfaces
US3330672A (en) 1964-06-29 1967-07-11 Hunt Chem Corp Philip A Silver antitarnish compositions
GB1120583A (en) 1965-05-19 1968-07-17 British Aircraft Corp Ltd Improvements relating to printed circuits
US3460953A (en) 1966-05-27 1969-08-12 Pennsalt Chemicals Corp Process for depositing brasslike coatings and composition therefor
US3468804A (en) 1964-03-13 1969-09-23 Winfield Brooks Co Inc Silver cleaning composition
US3531315A (en) 1967-07-17 1970-09-29 Minnesota Mining & Mfg Mechanical plating
US3576662A (en) 1965-07-16 1971-04-27 Basf Ag Metallizing plastics surfaces
AU5019272A (en) 1971-12-20 1974-06-20 Ici Australia Limited Composition and process
JPS5127819A (en) 1974-09-02 1976-03-09 Mitsubishi Gas Chemical Co Do oyobi dogokinyokagakushorieki
US3978271A (en) 1975-04-15 1976-08-31 Ppg Industries, Inc. Thin metallic nickel-silver films by chemical replacement
US3993845A (en) 1973-07-30 1976-11-23 Ppg Industries, Inc. Thin films containing metallic copper and silver by replacement without subsequent accelerated oxidation
US4024031A (en) 1975-10-28 1977-05-17 Amp Incorporated Silver plating
US4067784A (en) 1976-06-09 1978-01-10 Oxy Metal Industries Corporation Non-cyanide acidic silver electroplating bath and additive therefore
US4088549A (en) 1976-04-13 1978-05-09 Oxy Metal Industries Corporation Bright low karat silver gold electroplating
US4091172A (en) 1976-12-14 1978-05-23 Ppg Industries, Inc. Uniform gold films
JPS53134759A (en) 1977-04-28 1978-11-24 Fujikura Kasei Kk Production of copmosite metal powder
US4187198A (en) 1972-08-07 1980-02-05 Kollmorgen Technologies Corp. Novel precious metal sensitizing solutions
US4189510A (en) 1978-09-05 1980-02-19 The Dow Chemical Company Replacement plating procedure for silver on nickel
US4246077A (en) 1975-03-12 1981-01-20 Technic, Inc. Non-cyanide bright silver electroplating bath therefor, silver compounds and method of making silver compounds
US4255214A (en) 1977-11-21 1981-03-10 Falconer Plate Glass Corporation Methods of manufacturing and protecting mirrors
US4265715A (en) 1979-07-13 1981-05-05 Oxy Metal Industries Corporation Silver electrodeposition process
SU829727A1 (en) 1979-04-17 1981-05-15 Предприятие П/Я Г-4598 Silver-plating electrolyte
US4304846A (en) * 1979-02-09 1981-12-08 Ciba-Geigy Ag Method for processing silver dye-bleach materials
US4368223A (en) 1981-06-01 1983-01-11 Asahi Glass Company, Ltd. Process for preparing nickel layer
US4389431A (en) 1980-05-12 1983-06-21 Minnesota Mining And Manufacturing Company Process for mechanically depositing heavy metallic coatings
US4440805A (en) 1975-10-23 1984-04-03 Nathan Feldstein Stabilized dispersion for electroless plating catalysts using corrosion inhibitors as stabilizers
US4478691A (en) 1981-10-13 1984-10-23 At&T Bell Laboratories Silver plating procedure
JPS60100679A (en) 1983-11-04 1985-06-04 C Uyemura & Co Ltd Method for coating silver to metallic material
US4568570A (en) 1983-10-18 1986-02-04 Bayer Aktiengesellschaft Process for activating substrates for electroless metallization
US4615950A (en) 1985-03-15 1986-10-07 M&T Chemicals Inc. Printed circuit boards having improved adhesion between solder mask and metal
US4628150A (en) 1982-07-27 1986-12-09 Luc Technologies Limited Bonding and bonded products
US4666735A (en) 1983-04-15 1987-05-19 Polyonics Corporation Process for producing product having patterned metal layer
US4750889A (en) 1987-02-27 1988-06-14 Minnesota Mining & Manufacturing Company Through-board electrical component header having integral solder mask
US4753821A (en) 1984-09-19 1988-06-28 Bayer Aktiengesellschaft Process for the partial metallization of substrate surfaces
US4755265A (en) 1985-06-28 1988-07-05 Union Oil Company Of California Processes for the deposition or removal of metals
GB2201163A (en) 1987-02-17 1988-08-24 Green Anthony J Electroless silver plating compositions
US4777078A (en) 1986-03-12 1988-10-11 Brother Kogyo Kabushiki Kaisha Process for forming copper coating having excellent mechanical properties, and printed-wiring board with conductor pattern formed of such copper coating
US4781980A (en) 1986-03-28 1988-11-01 Fukuda Metal Foil & Powder Co., Ltd. Copper powder for use in conductive paste
US4800132A (en) 1986-10-22 1989-01-24 Macdermid, Incorporated Mechanical plating with oxidation-prone metals
US4821148A (en) 1985-06-14 1989-04-11 Hitachi, Ltd. Resin packaged semiconductor device having a protective layer made of a metal-organic matter compound
US4846918A (en) 1988-02-24 1989-07-11 Psi Star Copper etching process and product with controlled nitrous acid reaction
US4873139A (en) 1988-03-29 1989-10-10 Minnesota Mining And Manufacturing Company Corrosion resistant silver and copper surfaces
US4908241A (en) 1981-12-07 1990-03-13 Max-Planck-Gesellschaft Zur Foederung Der Wissenschaften E.V. Process for the currentless deposition of electropositive metal layers on the surfaces of less electropositive metals
US4940181A (en) 1989-04-06 1990-07-10 Motorola, Inc. Pad grid array for receiving a solder bumped chip carrier
US4968397A (en) 1989-11-27 1990-11-06 Asher Reginald K Non-cyanide electrode cleaning process
US4978423A (en) 1988-09-26 1990-12-18 At&T Bell Laboratories Selective solder formation on printed circuit boards
US5037482A (en) 1990-02-16 1991-08-06 Macdermid, Incorporated Composition and method for improving adhesion of coatings to copper surfaces
US5061566A (en) 1989-12-28 1991-10-29 Chomerics, Inc. Corrosion inhibiting emi/rfi shielding coating and method of its use
JPH04110474A (en) 1990-08-30 1992-04-10 Meidensha Corp Post-treatment of silver plating
US5115051A (en) * 1988-12-09 1992-05-19 Shin-Etsu Chemical Co., Ltd. Method of preventing polymer scale deposition in a polymerization vessel
US5160579A (en) 1991-06-05 1992-11-03 Macdermid, Incorporated Process for manufacturing printed circuit employing selective provision of solderable coating
US5173130A (en) 1989-11-13 1992-12-22 Shikoku Chemicals Corporation Process for surface treatment of copper and copper alloy
US5178909A (en) 1990-07-24 1993-01-12 Mitsui Kinzoku Kogyo Kabushiki Kaisha Production of silver-coated copper-based powders
US5186984A (en) 1990-06-28 1993-02-16 Monsanto Company Silver coatings
US5196053A (en) 1991-11-27 1993-03-23 Mcgean-Rohco, Inc. Complexing agent for displacement tin plating
US5235139A (en) 1990-09-12 1993-08-10 Macdermid, Incorprated Method for fabricating printed circuits
US5256275A (en) 1992-04-15 1993-10-26 Learonal, Inc. Electroplated gold-copper-silver alloys
US5277790A (en) 1992-07-10 1994-01-11 Technic Incorporated Non-cyanide electroplating solution for gold or alloys thereof
US5322553A (en) 1993-02-22 1994-06-21 Applied Electroless Concepts Electroless silver plating composition
DE4316679C1 (en) 1993-05-13 1994-07-28 Atotech Deutschland Gmbh Palladium surface-coating of copper, nickel and their alloys
US5348590A (en) 1992-08-31 1994-09-20 Hitachi, Ltd. Surface treating agent for copper or copper alloys
WO1994026954A1 (en) 1993-05-13 1994-11-24 Atotech Deutschland Gmbh Palladium layers deposition process
US5393861A (en) * 1989-10-18 1995-02-28 Toray Thiokol Co., Ltd. Polysulfide polyether and polymer composition comprising polysulfide and polyether
US5468515A (en) 1994-10-14 1995-11-21 Macdermid, Incorporated Composition and method for selective plating
US5518760A (en) 1994-10-14 1996-05-21 Macdermid, Incorporated Composition and method for selective plating
WO1996017975A1 (en) * 1994-12-09 1996-06-13 Alpha Fry Limited Printed circuit board manufacture
WO1996017974A1 (en) * 1994-12-09 1996-06-13 Alpha Fry Limited Silver plating
US5567357A (en) 1993-08-25 1996-10-22 Tatsuta Electric Wire & Cable Co., Ltd. Conductive paint having good adhesion to molding of metallic oxide
US5576053A (en) 1993-05-11 1996-11-19 Murata Manufacturing Co., Ltd. Method for forming an electrode on an electronic part
EP0797380A1 (en) 1996-03-22 1997-09-24 Macdermid Incorporated Method for enhancing the solderability of a surface
US5725640A (en) 1993-03-18 1998-03-10 Atotech Usa, Inc. Composition and process for treating a surface coated with a self-accelerating and replenishing non-formaldehyde immersion coating
US5733598A (en) 1992-10-05 1998-03-31 Matsushita Electric Industrial Co., Ltd. Flexible wiring board and its fabrication method
US5824631A (en) * 1994-06-03 1998-10-20 Wagenknecht; John H. Compositions for dissolution of soft metals
US5876517A (en) 1994-12-07 1999-03-02 Atotech Deutschland Gmbh Chromate-plating bath and process for finishing zinc zinc alloy or cadmium surfaces
US6183545B1 (en) 1998-07-14 2001-02-06 Daiwa Fine Chemicals Co., Ltd. Aqueous solutions for obtaining metals by reductive deposition
US6200451B1 (en) 1996-03-22 2001-03-13 Macdermid, Incorporated Method for enhancing the solderability of a surface
US6235348B1 (en) * 1998-05-13 2001-05-22 Shin-Etsu Chemical Co., Ltd. Rust prevention
US6319543B1 (en) 1999-03-31 2001-11-20 Alpha Metals, Inc. Process for silver plating in printed circuit board manufacture
US6331201B1 (en) 1997-04-28 2001-12-18 Fry's Metals, Inc. Bismuth coating protection for copper
US6375822B1 (en) 2000-10-03 2002-04-23 Lev Taytsas Method for enhancing the solderability of a surface
US6544397B2 (en) 1996-03-22 2003-04-08 Ronald Redline Method for enhancing the solderability of a surface
US6905587B2 (en) 1996-03-22 2005-06-14 Ronald Redline Method for enhancing the solderability of a surface

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0100598B1 (en) * 1982-07-09 1987-06-24 Emhart Industries, Inc. Feeder mechanism for supplying gobs of plastic material

Patent Citations (102)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB592443A (en) 1944-09-14 1947-09-18 Westinghouse Electric Int Co Improvements in or relating to electro-plating
GB602591A (en) 1945-02-12 1948-05-31 Du Pont Improvements in or relating to the electro-deposition of metals
US2555375A (en) 1948-11-13 1951-06-05 Battelle Development Corp Process of plating bright silver alloy
US2757104A (en) 1953-04-15 1956-07-31 Metalholm Engineering Corp Process of forming precision resistor
US2883288A (en) 1955-08-17 1959-04-21 Lewco Inc Silver plating bath
US2777810A (en) 1956-10-03 1957-01-15 Elechem Corp Bath for electroplating silver
US3162512A (en) 1961-03-21 1964-12-22 Engelhard Ind Inc Immersion plating with noble metals and the product thereof
US3130072A (en) 1961-09-22 1964-04-21 Sel Rex Corp Silver-palladium immersion plating composition and process
US3285754A (en) 1962-07-05 1966-11-15 Johnson Matthey Co Ltd Deposition of palladium
US3230098A (en) 1962-10-09 1966-01-18 Engelhard Ind Inc Immersion plating with noble metals
US3294578A (en) 1963-10-22 1966-12-27 Gen Aniline & Film Corp Deposition of a metallic coat on metal surfaces
US3202488A (en) 1964-03-04 1965-08-24 Chomerics Inc Silver-plated copper powder
US3468804A (en) 1964-03-13 1969-09-23 Winfield Brooks Co Inc Silver cleaning composition
US3330672A (en) 1964-06-29 1967-07-11 Hunt Chem Corp Philip A Silver antitarnish compositions
GB1120583A (en) 1965-05-19 1968-07-17 British Aircraft Corp Ltd Improvements relating to printed circuits
US3576662A (en) 1965-07-16 1971-04-27 Basf Ag Metallizing plastics surfaces
US3460953A (en) 1966-05-27 1969-08-12 Pennsalt Chemicals Corp Process for depositing brasslike coatings and composition therefor
US3531315A (en) 1967-07-17 1970-09-29 Minnesota Mining & Mfg Mechanical plating
AU5019272A (en) 1971-12-20 1974-06-20 Ici Australia Limited Composition and process
US4187198A (en) 1972-08-07 1980-02-05 Kollmorgen Technologies Corp. Novel precious metal sensitizing solutions
US3993845A (en) 1973-07-30 1976-11-23 Ppg Industries, Inc. Thin films containing metallic copper and silver by replacement without subsequent accelerated oxidation
JPS5127819A (en) 1974-09-02 1976-03-09 Mitsubishi Gas Chemical Co Do oyobi dogokinyokagakushorieki
US4246077A (en) 1975-03-12 1981-01-20 Technic, Inc. Non-cyanide bright silver electroplating bath therefor, silver compounds and method of making silver compounds
US3978271A (en) 1975-04-15 1976-08-31 Ppg Industries, Inc. Thin metallic nickel-silver films by chemical replacement
US4440805A (en) 1975-10-23 1984-04-03 Nathan Feldstein Stabilized dispersion for electroless plating catalysts using corrosion inhibitors as stabilizers
US4024031A (en) 1975-10-28 1977-05-17 Amp Incorporated Silver plating
US4088549A (en) 1976-04-13 1978-05-09 Oxy Metal Industries Corporation Bright low karat silver gold electroplating
US4067784A (en) 1976-06-09 1978-01-10 Oxy Metal Industries Corporation Non-cyanide acidic silver electroplating bath and additive therefore
US4091172A (en) 1976-12-14 1978-05-23 Ppg Industries, Inc. Uniform gold films
JPS53134759A (en) 1977-04-28 1978-11-24 Fujikura Kasei Kk Production of copmosite metal powder
US4255214A (en) 1977-11-21 1981-03-10 Falconer Plate Glass Corporation Methods of manufacturing and protecting mirrors
US4189510A (en) 1978-09-05 1980-02-19 The Dow Chemical Company Replacement plating procedure for silver on nickel
US4304846A (en) * 1979-02-09 1981-12-08 Ciba-Geigy Ag Method for processing silver dye-bleach materials
SU829727A1 (en) 1979-04-17 1981-05-15 Предприятие П/Я Г-4598 Silver-plating electrolyte
US4265715A (en) 1979-07-13 1981-05-05 Oxy Metal Industries Corporation Silver electrodeposition process
US4389431A (en) 1980-05-12 1983-06-21 Minnesota Mining And Manufacturing Company Process for mechanically depositing heavy metallic coatings
US4368223A (en) 1981-06-01 1983-01-11 Asahi Glass Company, Ltd. Process for preparing nickel layer
US4478691A (en) 1981-10-13 1984-10-23 At&T Bell Laboratories Silver plating procedure
US4908241A (en) 1981-12-07 1990-03-13 Max-Planck-Gesellschaft Zur Foederung Der Wissenschaften E.V. Process for the currentless deposition of electropositive metal layers on the surfaces of less electropositive metals
US4628150A (en) 1982-07-27 1986-12-09 Luc Technologies Limited Bonding and bonded products
US4666735A (en) 1983-04-15 1987-05-19 Polyonics Corporation Process for producing product having patterned metal layer
US4568570A (en) 1983-10-18 1986-02-04 Bayer Aktiengesellschaft Process for activating substrates for electroless metallization
JPS60100679A (en) 1983-11-04 1985-06-04 C Uyemura & Co Ltd Method for coating silver to metallic material
US4753821A (en) 1984-09-19 1988-06-28 Bayer Aktiengesellschaft Process for the partial metallization of substrate surfaces
US4615950A (en) 1985-03-15 1986-10-07 M&T Chemicals Inc. Printed circuit boards having improved adhesion between solder mask and metal
US4821148A (en) 1985-06-14 1989-04-11 Hitachi, Ltd. Resin packaged semiconductor device having a protective layer made of a metal-organic matter compound
US4755265A (en) 1985-06-28 1988-07-05 Union Oil Company Of California Processes for the deposition or removal of metals
US4777078A (en) 1986-03-12 1988-10-11 Brother Kogyo Kabushiki Kaisha Process for forming copper coating having excellent mechanical properties, and printed-wiring board with conductor pattern formed of such copper coating
US4781980A (en) 1986-03-28 1988-11-01 Fukuda Metal Foil & Powder Co., Ltd. Copper powder for use in conductive paste
US4800132A (en) 1986-10-22 1989-01-24 Macdermid, Incorporated Mechanical plating with oxidation-prone metals
GB2201163A (en) 1987-02-17 1988-08-24 Green Anthony J Electroless silver plating compositions
US4750889A (en) 1987-02-27 1988-06-14 Minnesota Mining & Manufacturing Company Through-board electrical component header having integral solder mask
US4846918A (en) 1988-02-24 1989-07-11 Psi Star Copper etching process and product with controlled nitrous acid reaction
US4873139A (en) 1988-03-29 1989-10-10 Minnesota Mining And Manufacturing Company Corrosion resistant silver and copper surfaces
US4978423A (en) 1988-09-26 1990-12-18 At&T Bell Laboratories Selective solder formation on printed circuit boards
US5115051A (en) * 1988-12-09 1992-05-19 Shin-Etsu Chemical Co., Ltd. Method of preventing polymer scale deposition in a polymerization vessel
US4940181A (en) 1989-04-06 1990-07-10 Motorola, Inc. Pad grid array for receiving a solder bumped chip carrier
US5393861A (en) * 1989-10-18 1995-02-28 Toray Thiokol Co., Ltd. Polysulfide polyether and polymer composition comprising polysulfide and polyether
US5173130A (en) 1989-11-13 1992-12-22 Shikoku Chemicals Corporation Process for surface treatment of copper and copper alloy
US4968397A (en) 1989-11-27 1990-11-06 Asher Reginald K Non-cyanide electrode cleaning process
US5061566A (en) 1989-12-28 1991-10-29 Chomerics, Inc. Corrosion inhibiting emi/rfi shielding coating and method of its use
US5037482A (en) 1990-02-16 1991-08-06 Macdermid, Incorporated Composition and method for improving adhesion of coatings to copper surfaces
US5186984A (en) 1990-06-28 1993-02-16 Monsanto Company Silver coatings
US5178909A (en) 1990-07-24 1993-01-12 Mitsui Kinzoku Kogyo Kabushiki Kaisha Production of silver-coated copper-based powders
JPH04110474A (en) 1990-08-30 1992-04-10 Meidensha Corp Post-treatment of silver plating
US5235139A (en) 1990-09-12 1993-08-10 Macdermid, Incorprated Method for fabricating printed circuits
US5160579A (en) 1991-06-05 1992-11-03 Macdermid, Incorporated Process for manufacturing printed circuit employing selective provision of solderable coating
US5196053A (en) 1991-11-27 1993-03-23 Mcgean-Rohco, Inc. Complexing agent for displacement tin plating
JPH05263258A (en) 1991-11-27 1993-10-12 Mcgean Rohco Inc Complexing agent for displacement tin plating
US5256275A (en) 1992-04-15 1993-10-26 Learonal, Inc. Electroplated gold-copper-silver alloys
US5277790A (en) 1992-07-10 1994-01-11 Technic Incorporated Non-cyanide electroplating solution for gold or alloys thereof
US5348590A (en) 1992-08-31 1994-09-20 Hitachi, Ltd. Surface treating agent for copper or copper alloys
US5733598A (en) 1992-10-05 1998-03-31 Matsushita Electric Industrial Co., Ltd. Flexible wiring board and its fabrication method
US5322553A (en) 1993-02-22 1994-06-21 Applied Electroless Concepts Electroless silver plating composition
US5725640A (en) 1993-03-18 1998-03-10 Atotech Usa, Inc. Composition and process for treating a surface coated with a self-accelerating and replenishing non-formaldehyde immersion coating
US5576053A (en) 1993-05-11 1996-11-19 Murata Manufacturing Co., Ltd. Method for forming an electrode on an electronic part
DE4316679C1 (en) 1993-05-13 1994-07-28 Atotech Deutschland Gmbh Palladium surface-coating of copper, nickel and their alloys
WO1994026954A1 (en) 1993-05-13 1994-11-24 Atotech Deutschland Gmbh Palladium layers deposition process
US5567357A (en) 1993-08-25 1996-10-22 Tatsuta Electric Wire & Cable Co., Ltd. Conductive paint having good adhesion to molding of metallic oxide
US5824631A (en) * 1994-06-03 1998-10-20 Wagenknecht; John H. Compositions for dissolution of soft metals
US5518760A (en) 1994-10-14 1996-05-21 Macdermid, Incorporated Composition and method for selective plating
US5468515A (en) 1994-10-14 1995-11-21 Macdermid, Incorporated Composition and method for selective plating
US5876517A (en) 1994-12-07 1999-03-02 Atotech Deutschland Gmbh Chromate-plating bath and process for finishing zinc zinc alloy or cadmium surfaces
US6395329B2 (en) 1994-12-09 2002-05-28 Soutar Andrew Mcintosh Printed circuit board manufacture
JPH08255968A (en) 1994-12-09 1996-10-01 Alpha Metals Ltd Manufacturing of printed-circuit board
WO1996017975A1 (en) * 1994-12-09 1996-06-13 Alpha Fry Limited Printed circuit board manufacture
WO1996017974A1 (en) * 1994-12-09 1996-06-13 Alpha Fry Limited Silver plating
US6860925B2 (en) 1994-12-09 2005-03-01 Enthone Incorporated Printed circuit board manufacture
US20020150692A1 (en) 1994-12-09 2002-10-17 Soutar Andrew Mcintosh Printed circuit board manufacture
US5955141A (en) 1994-12-09 1999-09-21 Alpha Metals, Inc. Process for silver plating in printed circuit board manufacture
US5935640A (en) 1996-03-22 1999-08-10 Macdermid, Incorporated Method for enhancing the solderability of a surface
US6200451B1 (en) 1996-03-22 2001-03-13 Macdermid, Incorporated Method for enhancing the solderability of a surface
US6444109B1 (en) 1996-03-22 2002-09-03 Ronald Redline Method for enhancing the solderability of a surface
US5733599A (en) 1996-03-22 1998-03-31 Macdermid, Incorporated Method for enhancing the solderability of a surface
US6544397B2 (en) 1996-03-22 2003-04-08 Ronald Redline Method for enhancing the solderability of a surface
EP0797380A1 (en) 1996-03-22 1997-09-24 Macdermid Incorporated Method for enhancing the solderability of a surface
US6905587B2 (en) 1996-03-22 2005-06-14 Ronald Redline Method for enhancing the solderability of a surface
US6331201B1 (en) 1997-04-28 2001-12-18 Fry's Metals, Inc. Bismuth coating protection for copper
US6235348B1 (en) * 1998-05-13 2001-05-22 Shin-Etsu Chemical Co., Ltd. Rust prevention
US6183545B1 (en) 1998-07-14 2001-02-06 Daiwa Fine Chemicals Co., Ltd. Aqueous solutions for obtaining metals by reductive deposition
US6319543B1 (en) 1999-03-31 2001-11-20 Alpha Metals, Inc. Process for silver plating in printed circuit board manufacture
US6375822B1 (en) 2000-10-03 2002-04-23 Lev Taytsas Method for enhancing the solderability of a surface

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
F. A. Lowenheim, Modern Electroplating, John Wiley & Sons, Inc., New York, 1974, pp. 36-38, 358-365. *
Li et al., Tarnish Protection for Silver Electrodeposits, Plating and Surface Finishing, pp. 58-61, Feb. 1988.
Philpott, An Economic Process for the Deposition of Thin Tarnish Resistant Coatings, Platinum Metals Rev., vol. 6, pp. 144-146, 1962.
Russev et al., Immersion Silvering of Copper, Metal Finishing, pp. 27-30, Jan. 1983.
Singh et al., Silver tarnishing and its prevention-A review, Anti-Corrosion, pp. 4-8, Jul. 1983.
Singh et al., Silver tarnishing and its prevention—A review, Anti-Corrosion, pp. 4-8, Jul. 1983.

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10184189B2 (en) 2016-07-18 2019-01-22 ECSI Fibrotools, Inc. Apparatus and method of contact electroplating of isolated structures
US10480092B2 (en) 2016-07-18 2019-11-19 ECSI Fibrotools Inc. Apparatus and method of contact electroplating of isolated structures

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