USRE45910E1 - Programming non-volatile storage including reducing impact from other memory cells - Google Patents
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- 230000015654 memory Effects 0.000 title claims abstract description 368
- 238000003860 storage Methods 0.000 title claims abstract description 111
- 230000004044 response Effects 0.000 claims abstract description 40
- 238000000034 method Methods 0.000 claims description 132
- 238000004891 communication Methods 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 3
- 230000008569 process Effects 0.000 description 106
- 238000007667 floating Methods 0.000 description 55
- 238000009826 distribution Methods 0.000 description 34
- 230000008878 coupling Effects 0.000 description 23
- 238000010168 coupling process Methods 0.000 description 23
- 238000005859 coupling reaction Methods 0.000 description 23
- 238000012360 testing method Methods 0.000 description 17
- 238000010586 diagram Methods 0.000 description 13
- 238000012937 correction Methods 0.000 description 8
- 230000008859 change Effects 0.000 description 6
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 6
- 229920005591 polysilicon Polymers 0.000 description 6
- 238000012512 characterization method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 238000011084 recovery Methods 0.000 description 3
- 238000009966 trimming Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000003466 anti-cipated effect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 230000002401 inhibitory effect Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000012795 verification Methods 0.000 description 2
- 230000005689 Fowler Nordheim tunneling Effects 0.000 description 1
- 230000006399 behavior Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000004193 electrokinetic chromatography Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 210000004072 lung Anatomy 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
- G11C16/3418—Disturbance prevention or evaluation; Refreshing of disturbed memory data
- G11C16/3427—Circuits or methods to prevent or reduce disturbance of the state of a memory cell when neighbouring cells are read or written
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
- G11C11/5621—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
- G11C11/5628—Programming or writing circuits; Data input circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
- G11C11/5621—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
- G11C11/5642—Sensing or reading circuits; Data output circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
- G11C16/3436—Arrangements for verifying correct programming or erasure
- G11C16/3454—Arrangements for verifying correct programming or for detecting overprogrammed cells
- G11C16/3459—Circuits or methods to verify correct programming of nonvolatile memory cells
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2211/00—Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C2211/56—Indexing scheme relating to G11C11/56 and sub-groups for features not covered by these groups
- G11C2211/562—Multilevel memory programming aspects
- G11C2211/5621—Multilevel programming verification
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2211/00—Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C2211/56—Indexing scheme relating to G11C11/56 and sub-groups for features not covered by these groups
- G11C2211/562—Multilevel memory programming aspects
- G11C2211/5622—Concurrent multilevel programming of more than one cell
Abstract
A system for programming non-volatile storage is proposed that reduces the impact of interference from the boosting of neighbors. Memory cells are divided into two or more groups. In one example, the memory cells are divided into odd and even memory cells; however, other groupings can also be used. Prior to a first trigger, a first group of memory cells are programmed together with a second group of memory cells using a programming signal that increases over time. Subsequent to the first trigger and prior to a second trigger, the first group of memory cells are programmed separately from the second group of memory cells using a programming signal that has been lowered in magnitude in response to the first trigger. Subsequent to the second trigger, the first group of memory cells are programmed together with the second group of memory cells with the programming signal being raised in response to the second trigger. Before and after both triggers, the first group of memory cells are verified together with the second group of memory cells.
Description
1. Field
The present invention relates to technology for non-volatile storage.
2. Description of the Related Art
Semiconductor memory has become more popular for use in various electronic devices. For example, non-volatile semiconductor memory is used in cellular telephones, digital cameras, personal digital assistants, mobile computing devices, non-mobile computing devices and other devices. Electrical Erasable Programmable Read Only Memory (EEPROM) and flash memory are among the most popular non-volatile semiconductor memories.
Both EEPROM and flash memory utilize a floating gate that is positioned above and insulated from a channel region in a semiconductor substrate. The floating gate is positioned between the source and drain regions. A control gate is provided over and insulated from the floating gate. The threshold voltage of the transistor is controlled by the amount of charge that is retained on the floating gate. That is, the minimum amount of voltage that must be applied to the control gate before the transistor is turned on to permit conduction between its source and drain is controlled by the level of charge on the floating gate. Thus, a memory cell (which can include one or more transistors) can be programmed and/or erased by changing the level of charge on a floating gate in order to change the threshold voltage.
Each memory cell can store data (analog or digital). When storing one bit of digital data (referred to as a binary memory cell), possible threshold voltages of the memory cell are divided into two ranges which are assigned logical data “1” and “0.” In one example of a NAND type flash memory, the threshold voltage is negative after the memory cell is erased, and defined as logic “1.” After programming, the threshold voltage is positive and defined as logic “0.” When the threshold voltage is negative and a read is attempted by applying 0 volts to the control gate, the memory cell will turn on to indicate logic one is being stored. When the threshold voltage is positive and a read operation is attempted by applying 0 volts to the control gate, the memory cell will not turn on, which indicates that logic zero is stored.
A memory cell can also store multiple levels of information (referred to as a multi-state memory cell). In the case of storing multiple levels of data, the range of possible threshold voltages is divided into the number of levels of data. For example, if four levels of information is stored, there will be four threshold voltage ranges assigned to the data values “11”, “10”, “01”, and “00.” In one example of a NAND type memory, the threshold voltage after an erase operation is negative and defined as “11.” Positive threshold voltages are used for the states of “10”, “01”, and “00.” If eight levels of information (or states) are stored in each memory cell (e.g. for three bits of data), there will be eight threshold voltage ranges assigned to the data values “000”, “001”, “010”, “011” “100”, “101”, “110” and “111.” The specific relationship between the data programmed into the memory cell and the threshold voltage levels of the memory cell depends upon the data encoding scheme adopted for the memory cells. For example, U.S. Pat. No. 6,222,762 and U.S. Patent Application Publication No. 2004/0255090, both of which are incorporated herein by reference in their entirety, describe various data encoding schemes for multi-state flash memory cells. In one embodiment, data values are assigned to the threshold voltage ranges using a Gray code assignment so that if the threshold voltage of a floating gate erroneously shifts to its neighboring physical state, only one bit will be affected. In some embodiments, the data encoding scheme can be changed for different word lines, the data encoding scheme can be changed over time, or the data bits for random word lines may be inverted to reduce data pattern sensitivity and even wear on the memory cells. Different encoding schemes can be used.
When programming an EEPROM or flash memory device, such as a NAND flash memory device, typically a program voltage is applied to the control gate and the bit line is grounded. Electrons from the channel are injected into the floating gate. When electrons accumulate in the floating gate, the floating gate becomes negatively charged and the threshold voltage of the memory cell is raised so that the memory cell is in a programmed state. More information about programming can be found in U.S. Pat. No. 6,859,397, titled “Source Side Self Boosting Technique For Non-Volatile Memory,” and in U.S. Patent Application Publication 2005/0024939, titled “Detecting Over Programmed Memory,” both of which are incorporated herein by reference in their entirety. In many devices, the program voltage applied to the control gate during a program operation is applied as a series of pulses in which the magnitude of the pulses is increased by a predetermined step size for each successive pulse.
Many non-volatile storage systems include an array of memory cells arranged in columns and rows. Control lines (e.g., word lines, bit lines, or other types of control lines) connect to the various rows and columns. In one example, word lines are used to access rows of memory cells while bit lines are used to access columns of memory cell. In this arrangement, the series of pulses of the program voltage are applied to a selected word line that is connected to a set of selected memory cells. Each of the selected memory cells receiving the pulses potentially has its threshold voltage raised in response thereto. As the memory cells reach their target threshold voltage, they are locked out from further programming. It has been observed that as memory cells become locked out, they interfere with the expected programming rate of their neighbor memory cells. This effect can cause the neighbor memory cells to overshoot their intended target threshold voltage and, therefore, become over-programmed. In some cases, an over-programmed memory cell will cause an error when being read.
Technology is described herein that reduces the impact of interference between neighboring memory cells during programming.
In one set of embodiments, memory cells are divided into two or more groups. In one example, the memory cells are divided into odd and even memory cells; however, other groupings can also be used. Prior to a first trigger, a first group of memory cells are programmed together with a second group of memory cells using a programming signal that increases over time. Subsequent to the first trigger and prior to a second trigger, the first group of memory cells are programmed separately from the second group of memory cells using a programming signal that has been lowered in magnitude in response to the first trigger. Subsequent to the second trigger, the first group of memory cells are programmed together with the second group of memory cells with the programming signal being raised in response to the second trigger. Before and after both triggers, the first group of memory cells are verified together with the second group of memory cells. Some embodiments may make use of the first trigger without using the second trigger.
The technology described herein can be used with various types of non-volatile storage systems. One example is a flash memory system uses the NAND structure, which includes arranging multiple transistors in series, sandwiched between two select gates. The transistors in series and the select gates are referred to as a NAND string. FIG. 1 is a top view showing one NAND string. FIG. 2 is an equivalent circuit thereof. The NAND string depicted in FIGS. 1 and 2 includes four transistors 100, 102, 104 and 106 in series and sandwiched between a first (or drain side) select gate 120 and a second (or source side) select gate 122. Select gate 120 connects the NAND string to a bit line via bit line contact 126. Select gate 122 connects the NAND string to source line 128. Select gate 120 is controlled by applying the appropriate voltages to select line SGD. Select gate 122 is controlled by applying the appropriate voltages to select line SGS. Each of the transistors 100, 102, 104 and 106 has a control gate and a floating gate. For example, transistor 100 has control gate 100CG and floating gate 100FG. Transistor 102 includes control gate 102CG and a floating gate 102FG. Transistor 104 includes control gate 104CG and floating gate 104FG. Transistor 106 includes a control gate 106CG and a floating gate 106FG. Control gate 100CG is connected to word line WL3, control gate 102CG is connected to word line WL2, control gate 104CG is connected to word line WL1, and control gate 106CG is connected to word line WL0.
Note that although FIGS. 1 and 2 show four memory cells in the NAND string, the use of four memory cells is only provided as an example. A NAND string can have less than four memory cells or more than four memory cells. For example, some NAND strings will include eight memory cells, 16 memory cells, 32 memory cells, 64 memory cells, 128 memory cells, etc. The discussion herein is not limited to any particular number of memory cells in a NAND string.
A typical architecture for a flash memory system using a NAND structure will include several NAND strings. Each NAND string is connected to the source line by its source select gate controlled by select line SGS and connected to its associated bit line by its drain select gate controlled by select line SGD. Each bit line and the respective NAND string(s) that are connected to that bit line via a bit line contact comprise the columns of the array of memory cells. Bit lines are shared with multiple NAND strings. Typically, the bit line runs on top of the NAND strings in a direction perpendicular to the word lines and is connected to one or more sense amplifiers.
Relevant examples of NAND type flash memories and their operation are provided in the following U.S. Patents/Patent Applications, all of which are incorporated herein by reference: U.S. Pat. Nos. 5,570,315; 5,774,397; 6,046,935; 6,456,528; and U.S. Pat. Publication No. US2003/0002348. The discussion herein can also apply to other types of flash memory in addition to NAND, as well as other types of non-volatile memory.
Other types of non-volatile storage devices, in addition to NAND flash memory, can also be used. For example, non-volatile memory devices are also manufactured from memory cells that use a dielectric layer for storing charge. Instead of the conductive floating gate elements described earlier, a dielectric layer is used. Such memory devices utilizing dielectric storage element have been described by Eitan et al., “NROM: A Novel Localized Trapping, 2-Bit Nonvolatile Memory Cell,” IEEE Electron Device Letters, vol. 21, no. 11, November 2000, pp. 543-545. An ONO dielectric layer extends across the channel between source and drain diffusions. The charge for one data bit is localized in the dielectric layer adjacent to the drain, and the charge for the other data bit is localized in the dielectric layer adjacent to the source. For example, U.S. Pat. Nos. 5,768,192 and 6,011,725 disclose a nonvolatile memory cell having a trapping dielectric sandwiched between two silicon dioxide layers. Multi-state data storage is implemented by separately reading the binary states of the spatially separated charge storage regions within the dielectric. Other types of non-volatile storage can also be used.
In one embodiment, one or any combination of control circuitry 220, power control circuit 226, decoder circuit 224, state machine circuit 222, decoder circuit 242A, decoder circuit 242B, decoder circuit 240A, decoder circuit 240B, read/write circuits 230A, read/write circuits 230B, and/or controller 244 can be referred to as one or more managing circuits. The one or more managing circuits perform the processes described herein.
A block contains a set of NAND stings which are accessed via bit lines (e.g., bit lines BL0-BL69623) and word lines (WL0, WL1, WL2, WL3). FIG. 4 shows four memory cells connected in series to form a NAND string. Although four cells are shown to be included in each NAND string, more or less than four can be used (e.g., 16, 32, 64, 128 or another number or memory cells can be on a NAND string). One terminal of the NAND string is connected to a corresponding bit line via a drain select gate (connected to select gate drain line SGD), and another terminal is connected to the source line via a source select gate (connected to select gate source line SGS).
Each block is typically divided into a number of pages. In one embodiment, a page is a unit of programming. Other units of programming can also be used. One or more pages of data are typically stored in one row of memory cells. For example, one or more pages of data may be stored in memory cells connected to a common word line. A page can store one or more sectors. A sector includes user data and overhead data (also called system data). Overhead data typically includes header information and Error Correction Codes (ECC) that have been calculated from the user data of the sector. The controller (or other component) calculates the ECC when data is being programmed into the array, and also checks it when data is being read from the array. Alternatively, the ECCs and/or other overhead data are stored in different pages, or even different blocks, than the user data to which they pertain. A sector of user data is typically 512 bytes, corresponding to the size of a sector in magnetic disk drives. A large number of pages form a block, anywhere from 8 pages, for example, up to 32, 64, 128 or more pages. Different sized blocks, pages and sectors can also be used.
During read or sensing, the operation of the system is under the control of state machine 222 that controls (using power control 226) the supply of different control gate voltages to the addressed memory cell(s). As it steps through the various predefined control gate voltages corresponding to the various memory states supported by the memory, the sense module 480 may trip at one of these voltages and an output will be provided from sense module 480 to processor 492 via bus 472. At that point, processor 492 determines the resultant memory state by consideration of the tripping event(s) of the sense module and the information about the applied control gate voltage from the state machine via input lines 493. It then computes a binary encoding for the memory state and stores the resultant data bits into data latches 494. In another embodiment of the core portion, bit line latch 482 serves double duty, both as a latch for latching the output of the sense module 480 and also as a bit line latch as described above.
It is anticipated that some implementations will include multiple processors 492. In one embodiment, each processor 492 will include an output line (not depicted in FIG. 5 ) such that each of the output lines is wired-OR'd together. In some embodiments, the output lines are inverted prior to being connected to the wired-OR line. This configuration enables a quick determination during the program verification process of when the programming process has completed because the state machine receiving the wired-OR line can determine when all bits being programmed have reached the desired level. For example, when each bit has reached its desired level, a logic zero for that bit will be sent to the wired-OR line (or a data one is inverted). When all bits output a data 0 (or a data one inverted), then the state machine knows to terminate the programming process. In embodiments where each processor communicates with eight sense modules, the state machine may (in some embodiments) need to read the wired-OR line eight times, or logic is added to processor 492 to accumulate the results of the associated bit lines such that the state machine need only read the wired-OR line one time.
Data latch stack 494 contains a stack of data latches corresponding to the sense module. In one embodiment, there are three (or four or another number) data latches per sense module 480. In one embodiment, the latches are each one bit.
During program or verify, the data to be programmed is stored in the set of data latches 494 from the data bus 420. During the verify process, Processor 492 monitors the verified memory state relative to the desired memory state. When the two are in agreement, processor 492 sets the bit line latch 482 so as to cause the bit line to be pulled to a state designating program inhibit. This inhibits the memory cell coupled to the bit line from further programming even if it is subjected to programming pulses on its control gate. In other embodiments the processor initially loads the bit line latch 482 and the sense circuitry sets it to an inhibit value during the verify process.
In some implementations (but not required), the data latches are implemented as a shift register so that the parallel data stored therein is converted to serial data for data bus 420, and vice versa. In one preferred embodiment, all the data latches corresponding to the read/write block of m memory cells can be linked together to form a block shift register so that a block of data can be input or output by serial transfer. In particular, the bank of read/write modules is adapted so that each of its set of data latches will shift data in to or out of the data bus in sequence as if they are part of a shift register for the entire read/write block.
Additional information about the sensing operations and sense amplifiers can be found in (1) United States Patent Application Pub. No. 2004/0057287, “Non-Volatile Memory And Method With Reduced Source Line Bias Errors,” published on Mar. 25, 2004; (2) United States Patent Application Pub No. 2004/0109357, “Non-Volatile Memory And Method with Improved Sensing,” published on Jun. 10, 2004; (3) U.S. Patent Application Pub. No. 2005/0169082; (4) U.S. Patent Publication 2006/0221692, titled “Compensating for Coupling During Read Operations of Non-Attorney Volatile Memory,” Inventor Jian Chen, filed on Apr. 5, 2005; and (5) U.S. Patent Publication 2006/0158947, titled “Reference Sense Amplifier For Non-Volatile Memory,” Inventors Siu Lung Chan and Raul-Adrian Cernea, filed on Dec. 28, 2005. All five of the immediately above-listed patent documents are incorporated herein by reference in their entirety.
At the end of a successful programming process (with verification), the threshold voltages of the memory cells should be within one or more distributions of threshold voltages for programmed memory cells or within a distribution of threshold voltages for erased memory cells, as appropriate. FIG. 6 illustrates example threshold voltage distributions (or data states) for the memory cell array when each memory cell stores three bits of data. Other embodiment, however, may use more or less than three bits of data per memory cell (e.g., such as four or more bits of data per memory cell).
In the example of FIG. 6 , each memory cell stores three bits of data; therefore, there are eight valid data states S0-S7. In one embodiment, data state S0 is below 0 volts and data states S1-S7 are above 0 volts. In other embodiments, all eight data states are above 0 volts, or other arrangements can be implemented. In one embodiment, the threshold voltage distribution S0 is wider than distributions S1-S7.
Each data state corresponds to a unique value for the three bits stored in the memory cell. In one embodiment, S0=111, S1=110, S2=101, S3=100, S4=011, S5=010, S6=001 and S7=000. Other mappings of data to states S0-S7 can also be used. In one embodiment, all of the bits of data stored in a memory cell are stored in the same logical page. In other embodiments, each bit of data stored in a memory cell correspond to different pages. Thus, a memory cell storing three bits of data would include data in a first page, a second page and a third page. In some embodiments, all of the memory cells connected to the same word line would store data in the same three pages of data.
In some embodiments, the memory cells connected to a word line can be grouped in to different sets of pages (e.g., by odd and even bit lines, or by other arrangements).
In some prior art devices, the memory cells will be erased to state S0. From state S0, the memory cells can be programmed to any of states S1-S7. In one embodiment, known as full sequence programming, memory cells can be programmed from the erased state S0 directly to any of the programmed states S1-S7. For example, a population of memory cells to be programmed may first be erased so that all memory cells in the population are in erased state S0. While some memory cells are being programmed from state S0 to state S1, other memory cells are being programmed from state S0 to state S2, state S0 to state S3, state S0 to state S4, state S0 to state S5, state S0 to state S6, and state S0 to state S7. Full sequence programming is graphically depicted by the seven curved arrows of FIG. 6 .
The process of FIGS. 7A-71 assumes that each memory cell stores three bits of data, with each bit being in a different page. The first bit of data (the leftmost bit) is associated with the first page. The middle bit is associated with the second page. The rightmost bit is associated with the third page. The correlation of data states to data is as follows: S0=111, S1=110, S2=101, S3=100, S4=011, S5=010, S6=001 and S7=000. However, other embodiments can use other data encoding schemes. (e.g., such as gray codes so that only one bit changes between neighboring states).
When programming the first page (as described in FIG. 7A ), if the bit is to be data “1” then the memory cell will stay in state S0 (threshold voltage distribution 502). If the bit is to be data “0” then the memory cell is programmed to state S4 (threshold voltage distribution 504). After adjacent memory cells are programmed, capacitive coupling between adjacent floating gates may cause the state S4 to widen as depicted in FIG. 7B . State S0 may also widen, but there is sufficient margin between S0 and S1 to ignore the effect. More information about capacitive coupling between adjacent floating gates can be found in U.S. Pat. Nos. 5,867,429 and 6,657,891, both of which are incorporated herein by reference in their entirety.
When programming the second page (see FIG. 7C ), if the memory cell is in state S0 and the second page bit is data “1” then the memory cell stays in state S0. In some embodiments, the programming process for the second page will tighten threshold voltage distribution 501 to a new S0. If the memory cell was in state S0 and the data to be written to the second page is “0”, then the memory cell is moved to state S2 (threshold voltage distribution 506). State S2 has a verify point (lowest voltage) of C*. If the memory cell was in state S4 and the data to be written to the memory cell is “1” then the memory cell remains in S4. However, state S4 is tightened by moving the memory cells from threshold voltage distribution 504 to threshold voltage distribution 508 for state S4, as depicted in FIG. 7C . Threshold voltage distribution 508 has a verify point of E* (as compared to E** of threshold voltage distribution 504). If the memory cell is in state S4 and the data to be written to the second page is a “0” then the memory cell has its threshold voltage moved to state S6 (threshold voltage distribution 510), with a verify point of G*.
After the adjacent memory cells are programmed, the states S2, S4 and S6 are widened due to the floating gate to floating gate coupling, as depicted by threshold voltages distributions 506, 508 and 510 of FIG. 7D . In some cases, state S0 may also widen.
If the memory cell is in state S0 and the third page data is “1” then the memory cell remains at state S0. If the data for the third page is “0” then the threshold voltage for the memory cell is raised to be in state S1, with a verify point of B (see FIG. 7E ).
If the memory cells in state S2 and the data to be written in the third page is “1”, then the memory cell will remain in state S2 (see FIG. 7F ). However, some programming will be performed to tighten the threshold distribution 506 to a new state S2 with a verify point of C volts. If the data to be written to the third page is “0,” then the memory cell will be programmed to state S3, with a verify point of D volts.
If the memory cell is in state S4 and the data to be written to the third page is “1” then the memory cell will remain in state S4 (see FIG. 7G ). However, some programming will be performed so that threshold voltage distribution 508 will be tightened to new state S4 with a verify point of E. If the memory cell is in state S4 and the data to be written to the third page is “0” then the memory cell will have its threshold voltage raised to be in state S5, with a verify point of F.
If the memory cell is in state S6 and the data to be written to the third page is “1” then the memory cell will remain in state S6 (see FIG. 7H ). However, there will be some programming so that the threshold voltage distribution 510 is tightened to be in new state S6, with a verify point at G. If the third page data is “0” then the memory cell will have its threshold voltage programmed to state S7, with a verify point at H. At the conclusion of the programming of the third page, the memory cell will be in one of the eight states depicted in FIG. 71 .
In step 552, memory cells are erased (in blocks or other units) prior to programming. Memory cells are erased in one embodiment by raising the p-well to an erase voltage (e.g., 20 volts) for a sufficient period of time and grounding the word lines of a selected block while the source and bit lines are floating. Due to capacitive coupling, the unselected word lines, bit lines, select lines, and the common source line are also raised to a significant fraction of the erase voltage. A strong electric field is thus applied to the tunnel oxide layers of selected memory cells and the selected memory cells are erased as electrons of the floating gates are emitted to the substrate side, typically by Fowler-Nordheim tunneling mechanism. As electrons are transferred from the floating gate to the p-well region, the threshold voltage of a selected cell is lowered. Erasing can be performed on the entire memory array, on individual blocks, or another unit of cells. In one embodiment, after erasing the memory cells, all of the erased memory cells will be in state S0 (see FIG. 6 ).
At step 554, soft programming is performed to narrow the distribution of erased threshold voltages for the erased memory cells. Some memory cells may be in a deeper erased state than necessary as a result of the erase process. Soft programming can apply programming pulses to move the threshold voltage of the deeper erased memory cells closer to the erase verify level. For example, looking at FIG. 6 , step 554 can include tightening the threshold voltage distribution associated with state S0. In step 556, the memory cells of the block are programmed as described herein. The process of FIG. 9 can be performed at the direction of the state machine using the various circuits described above. In other embodiments, the process of FIG. 9 can be performed at the direction of the controller using the various circuits described above. After performing the process of FIG. 9 , the memory cells of the block can be read.
Typically, the program signal (also called a program voltage) is applied to the control gate during a program operation as a series of program pulses. In between programming pulses are a set of verify pulses to enable verification. In many implementations, the magnitude of the program pulses is increased with each successive pulse by a predetermined step size. In step 608 of FIG. 10 , the programming voltage (Vpgm) is initialized to the starting magnitude (e.g., ˜12-16V or another suitable level) and a program counter PC maintained by state machine 222 is initialized at 1. In step 610, a program pulse of the program signal Vpgm is applied to the selected word line (the word line selected for programming). The unselected word lines receive one or more boosting voltages (e.g., ˜9 volts) to perform boosting schemes known in the art. If a memory cell should be programmed, then the corresponding bit line is grounded. On the other hand, if the memory cell should remain at its current threshold voltage, then the corresponding bit line is connected to VDD to inhibit programming. More information about boosting schemes can be found in U.S. Pat. No. 6,859,397 and U.S. Patent App. Pub. 2008/0123425, both of which are incorporated herein by reference.
In step 610, the program pulse is concurrently applied to all memory cells connected to the selected word line so that all of the memory cells connected to the selected word line are programmed together. That is, they are programmed at the same time (or during overlapping times). In this manner, all of the memory cells connected to the selected word line will concurrently have their threshold voltage change, unless they have been locked out from programming.
In step 612, the states of the selected memory cells are verified using the appropriate set of target levels. Step 612 of FIG. 10 includes performing one or more verify operations. In general, during verify operations and read operations, the selected word line is connected to a voltage, a level of which is specified for each read and verify operation (e.g. see B, C, D, E, F, G and H of FIG. 71 ) in order to determine whether a threshold voltage of the concerned memory cell has reached such level. After applying the word line voltage, the conduction current of the memory cell is measured to determine whether the memory cell turned on in response to the voltage applied to the word line. If the conduction current is measured to be greater than a certain value, then it is assumed that the memory cell turned on and the voltage applied to the word line is greater than the threshold voltage of the memory cell. If the conduction current is not measured to be greater than the certain value, then it is assumed that the memory cell did not turn on and the voltage applied to the word line is not greater than the threshold voltage of the memory cell.
There are many ways to measure the conduction current of a memory cell during a read or verify operation. In one example, the conduction current of a memory cell is measured by the rate it discharges or charges a dedicated capacitor in the sense amplifier. In another example, the conduction current of the selected memory cell allows (or fails to allow) the NAND string that included the memory cell to discharge the corresponding bit line. The voltage on the bit line is measured after a period of time to see whether it has been discharged or not. Note that the technology described herein can be used with different methods known in the art for verifying/reading. More information about verifying/reading can be found in the following patent documents that are incorporated herein by reference in their entirety: (1) United States Patent Application Pub. No. 2004/0057287, “Non-Volatile Memory And Method With Reduced Source Line Bias Errors,” published on Mar. 25, 2004; (2) United States Patent Application Pub No. 2004/0109357, “Non-Volatile Memory And Method with Improved Sensing,” published on Jun. 10, 2004; (3) U.S. Patent Application Pub. No. 2005/0169082; and (4) U.S. Patent Publication No. 2006/0221692, titled “Compensating for Coupling During Read Operations of Non-Volatile Memory.”
If it is detected that the threshold voltage of a selected memory cell has reached the appropriate target level, then the memory cell is locked out of further programming by, for example, raising its bit line voltage to Vdd during subsequent programming pulses. A pass voltage (e.g. ˜10 volts) is applied to the unselected word lines during a programming operation (e.g., step 610). The unselected word lines (at the pass voltage) couple to the unselected bit lines (at Vdd), causing a voltage (e.g. approximately eight volts) to exist in the channel of the unselected bit lines, which prevents programming. Other schemes for locking out memory cells from programming (and boosting) can also be used with the technology described herein.
Looking back at FIG. 10 , in step 614 (“verify status”) it is checked whether all of memory cells have reached their target threshold voltages. If so, the programming process is complete and successful because all selected memory cells were programmed and verified to their target states. A status of “PASS” is reported in step 616. Note that in some implementations, in step 614 it is checked whether at least a predetermined number of memory cells have been properly programmed. This predetermined number can be less than the number of all memory cells, thereby allowing the programming process to stop before all memory cells have reached their appropriate verify levels. The memory cells that are not successfully programmed can be corrected using error correction during the read process.
If, in step 614, it is determined that not all of the memory cells have reached their target threshold voltages, then the programming process continues. In step 618, the program counter PC is checked against a program limit value (PL). One example of a program limit value is 20; however, other values can be used. If the program counter PC is not less than the program limit value, then it is determined in step 630 whether the number of memory cells that have not been successfully programmed is equal to or less than a predetermined number. If the number of unsuccessfully programmed memory cells is equal to or less than the predetermined number, then the programming process is flagged as passed and a status of PASS is reported. In many cases, the memory cells that are not successfully programmed can be corrected using error correction during the read process. If however, the number of unsuccessfully programmed memory cells is greater than the predetermined number, the program process is flagged as failed and a status of FAIL is reported in step 634.
If, in step 618, it is determined that the Program Counter PC is less than the Program Limit value PL, then the process continues at step 619 during which time the Program Counter PC is incremented by 1. In step 620, it is determined whether the previous program pulse was applied to all bit lines (other than the bit lines locked out because the associated memory cell either reached its target or is to remain in the erased state) or only applied to a subset of bit lines that still need programming. As will be discussed below, there are certain circumstances when the system will only program odd bit lines or only program even bit lines. If the system is programming all bit lines that need programming then the next step is step 622 (see “together” result of step 620). If the system is programming only even bit lines or only odd bit lines that need to be programmed, then the next step after step 620 is step 640 (see “separate” result of step 620).
In step 622, it is determined whether a trigger has occurred. In one embodiment, a trigger has occurred when the magnitude of the program voltage Vpgm (e.g., a program pulse) reaches a trigger voltage. Other embodiments could use other triggers (e.g., based on time, number of bits programmed, number of pulses, current, etc.). If the trigger has not occurred, then program voltage Vpgm is stepped up to the next magnitude in step 624. For example, the next pulse will have a magnitude greater than the previous pulse by a step size (e.g., a step size of 0.1-0.4 volts). After stepping the program voltage Vpgm, the process loops back to step 610 and the next program pulse (at the new magnitude set in step 624) is applied to the selected word line so that programming on all bit lines (except those memory cells locked-out because they are at their target state) occurs. The process continues from step 610 as described above.
The trigger of step 622 is set so that it signals or otherwise indicates a lock-out condition that involves capacitive coupling. In general, there is capacitive coupling between neighboring floating gates. When both neighboring floating gates (first floating gate and second floating gate) are being programmed, the capacitive coupling remains constant and/or predictable. When the first floating gate locks-out from programming because it reaches its target state, the voltage potential of that first floating gate will increase because of boosting. Because the first floating gate has the higher voltage potential, capacitive coupling to the second floating gate increases. The higher capacitive coupling will increase the voltage on the second floating gate, which will increase the speed of programming of the second floating gate. This can cause over-programming. The risk over over-programming is greater at the transition from the slower programming (when both neighbor memory cells are still being programmed) to the faster programming (when a memory cell is being programmed and its neighbor memory cell is inhibited from programming).
Although shield 805 between the floating gates 806 and 810 helps to reduce the capacitive coupling, when a large voltage is applied to the word line, the polysilicon shield 805 becomes depleted. For example, FIG. 11B shows the same two floating gates 806 and 810 with a dotted line 812 in the word line polysilicon layer 802. The area below dotted line 812 is depleted. Because the area below dotted line 812 is depleted, it does not provide full shielding to the capacitive coupling described above.
In one embodiment device characterization (including simulation) is used to determine at what word line voltage the polysilicon word line layer 802 becomes depleted so that coupling occurs, as described with respect to FIG. 11C . In other embodiments, this word line voltage can be measured by testing actual silicon. In some embodiments, every piece of silicon can be tested. In other embodiments, a sample of parts can be tested and the measured voltage can be used on an entire group of parts. Other means for determining the voltage that starts depletion can also be used.
That word line voltage in which the depletion is severe enough to cause increase in programming speed as described above is the trigger voltage used in step 622 of FIG. 10 . Thus, if the magnitude of the Vpgm program pulse has reached the trigger voltage for which there is sufficient depletion in the word line polysilicon layer to allow coupling, then the trigger is met and the process proceeds to step 630 of FIG. 10 . The condition at which the word line polysilicon layer is depleted and allows coupling when one neighbor is locked-out and the other neighbor is still programming, thereby potentially speeding up the programming, is referred to herein as the lock-out condition.
Another embodiment of a trigger for step 622 is when at least a predetermined amount of the memory cells (e.g., the memory cells connected to both the odd word lines and the even word lines) that are supposed to be programmed to a particular set of one or more data states have successfully been programmed to the particular set of one or more data states. For example, the trigger could be when all of the memory cells intended to be programmed to state S1 have been verified to have successfully reached data state S1. In an alternative, the system can test for all, or a predetermined number of memory cells, intended to be programmed to state S1 being verified to have successfully reached data state S1. The predetermined number would be all of the memory cells intended to reach data state 1 less a small number that can be corrected during the read process using error correction codes (or other error recovery process). In another alternative, instead triggering based on memory cells reaching one data state (e.g., data stat S1), the system can trigger based on memory cells reaching multiple data states, such as data states S1, S2 and S3 (the lowest three states). Other sets of data states can also be sued.
When there is a reasonable chance that the lock-out condition exists (signaled by the trigger of step 622), the system will program memory cells connected to odd bit lines separately from memory cells connected to even bits lines. In this manner, the coupling from neighbors is fully predictable since it is guaranteed, for a given memory cell that will be programmed by the next programming pulse, that its neighbors on the same word lines are inhibited. Because it is known that both neighbors are inhibited and that inhibiting both neighbors speeds up the programming (which can lead to over-programming), the system will reduce the voltage magnitude of the program pulses of Vpgm to compensate for the lock-out condition. That is, lowering the voltage magnitude of the program pulses of Vpgm slows down programming, which should compensate for the lock-out condition speeding up the programming.
In step 630 of FIG. 10 , the voltage magnitude of the programming signal (e.g., the program pulses) is reduced. In some embodiments, the voltage magnitude is reduced by 0.5 volts. In other embodiments, the reduction in voltage can be different than 5 volts. In some embodiments, the reduction is voltage magnitude of the program signal is based on a parameter that is set at the time of manufacturing, product design, testing, or another time. After a sample set of parts are manufactured for a given process or design, engineers can test how much the lock-out condition effects the speed of programming and then choose an appropriate amount of voltage to lower the program signal to counter act the lock-out condition. Device simulation can also be used to determine an appropriate amount of voltage to lower the program signal to counter act the lock-out condition.
In step 632, a program pulse is applied to the selected word line in order to program only those memory cells connected to even bit lines. Thus, the even bit lines will be at zero volts while the odd bit lines will have Vdd applied. During step 632, only even bit lines will be programmed. After step 632 is performed, step 634 is performed, which includes applying a program pulse to the same selected word line. During step 634, only memory cells connected to odd bit lines will be programmed. Thus, step 634 will include applying zero volts to odd bit lines and Vdd to even bit lines. Thus, steps 632 and 634 include applying two successive program pulses to the same word line (and, thus, to the same set of memory cells connected to that word line); however, only even memory cells are programmed during the first pulse (step 632) and only odd memory cells are programmed during the second pulse (step 634). Therefore, memory cells connected to even bit lines (even memory cells) are programmed separately from memory cells connected to odd bit lines (odd memory cells). For example, if WL2_i is the selected word line (see FIG. 4 ), then memory cells connected to BL0, BL2, BL4 and WL2_i will be programmed in step 632 and memory cells connected to BL1, BL3, BL5 and WL2_i will be programmed in step 634. Although the odd memory cells receive the program pulse of step 632, they are inhibited from programming during step 632. Although the even memory cells receive program pulses during step 634, they are inhibited from programming during step 634. After step 634, the process loops back to step 612 and memory cells on even bit lines and odd bit lines are all verified together (unless, in some implementations, they have previously been locked out because they reached their target). The process continues from step 612, as described above. There is no verify operation performed between steps 632 and 634.
Looking back at FIG. 4 , a block of memory cells is depicted (block i). In one embodiment, the memory cells along a word line are broken up into two groups. The first group are all those memory cells connected to odd bit lines (e.g., BL1, BL3, BL5, . . . ). The second group includes all memory cells connected to even bit lines (e.g., BL0, BL2, BL4, . . . ). As can be seen from FIG. 4 , the even bit lines and odd bit lines are interleaved. Thus, the group of memory cells connected to the even bit lines are interleaved with the memory cells connected to the odd bit lines. If only even bit lines are being programmed, then all of the memory cells connected to the odd bit lines would be locked-out. This would guarantee a situation where any memory cell being programmed would have both its neighbors locked-out. Although this could cause coupling, since it is guaranteed that both neighbors are locked-out, the coupling is predictable and constant. As a result, over-programming is not likely. The memory cells connected to a word line can be divided into more than two groups and can be divided into types of groups other than odd and even groups.
If, in step 620, it is determined that the previous iteration of program-verify applied separate pulses for even and odd bit lines, then the process continues at step 640. the system decides whether to continue proving the compensation for the potential lock-out condition.
In one embodiment of step 640, the system ends the compensation (e.g., separate pulses for odd and even bit line programming) when the number of programming pulses (or program-verify iterations) has reached a predetermined number. For example, the system can test for whether PC is less than a predetermined number.
In another embodiment of step 640, the system ends the compensation (e.g., separate pulses for odd and even bit line programming) when at least a predetermined amount of the memory cells (e.g., the memory cells connected to both the odd word lines and the even word lines) that are supposed to be programmed to a particular set of one or more data states have successfully been programmed to the particular set of one or more data states. For example, the system can end compensation when all or almost all memory cells intended for data state S6 have successfully been verified to be in S6. Or, the system can end compensation when all or almost all memory cells intended for data states S5 and S6 have successfully been verified to be in S5 and S6, respectively. The system can test for all memory cells intended for a data state to be successfully programmed or all minus a small predetermined number that can be corrected during the read process using error correction codes (or other error recovery process).
In another embodiment of step 640, the system ends the compensation (e.g., separate pulses for odd and even bit line programming) when it is determined that the chance of additional lock-out conditions is low. As discussed above, a lock-out condition occurs when one memory cell is being programmed, a neighbor memory cell is locked-out from programming, and the word line voltage is high enough. A lockout condition causes faster programming. Over-programming can occur when there is a transition from slower programming to faster programming. Thus, in one embodiment, the system checks to see if there are potential transitions from slow to fast programming that can occur due to onset of the lockout condition. The system checks for potential transitions from slow to fast programming by checking the potential number of new/additional lock-out conditions. In some embodiments, the system can tolerate a small number of errors because these errors can be corrected during the read process using error correction schemes known in the art. Therefore, if the number of potential lock-out conditions is small enough, the system can tolerate the potential for error and not have to correct for it during programming.
If, in step 640, it is determined that the compensation will not end at this time, then the process proceeds to perform steps 632 and 634 which includes programming memory cells on even bit lines separately and at a different time than programming memory cells on odd bit lines.
If, in step 640, it is determined that the compensation will end at this time, then the memory system will continue the programming process by programming odd and even bit lines together. In one embodiment, the system will also raise the magnitude of the programming voltage (step 642) when switching back to programming odd and even bit lines together. After raising the magnitude of the programming voltage in step 642, the process continues at step 610 and applies the next programming pulse to program memory cells on both odd and even bit lines. In some embodiments, step 642 is skipped so that the magnitude of the programming voltage is not raised when switching back to programming odd and even bit lines together.
Step 642 includes raising the magnitude of the programming voltage. In one embodiment, the magnitude of the programming voltage is raised by a predetermined fixed amount to obtain the desired speed of programming. In another embodiment, the magnitude of the programming voltage is raised to a value based on a magnitude of the programming signal (which had been increasing at a particular rate) had it not been lowered in response to determining that the trigger exists (step 622). That, had magnitude of the programming voltage Vpgm not been lowered in step 630, it would now be at a magnitude of X volts. Therefore, step 642 includes raising the magnitude of Vpgm to X volts.
In one example implementation, the magnitude of the programming voltage Vpgm is raised to its target in one step (step 642). In another implementation, the magnitude of the programming voltage Vpgm is raised to its target over multiple steps. For example, the magnitude of the programming voltage Vpgm can be raised to its target voltage over a set of multiple program-verify iterations (steps 610 and 612). Consider that at the time it is decided to end the compensation in step 640, the programming voltage Vpgm is lower than it would have been if it was never lowered in step 630 by 0.7 volts. In this alternative, the programming voltage Vpgm can be raised 0.45 volts for the next programming pulse in step 610 and then raised an additional 0.45 volts for the subsequent programming pulse in the next iteration of step 610. The programming voltage Vpgm is raised 0.9 v instead of 0.7 v to account for the step of 0.2 v volts between programming pulses. To accomplish this, the subsequent step 624 must be modified to raise the programming voltage Vpgm by 0.45 rather than the step of 0.2. In another alternative, the programming voltage Vpgm is raised to its target over more than two steps (e.g., three steps or more than three steps).
If, in step 640, it is determined that the potential number of new/additional lock-out conditions is low, then the compensation will continue and the memory system will continue the programming process by programming odd and even bit lines separately. Thus, the process will continue by performing steps 632 and 634, which includes programming memory cells on even bit lines separately and at a different time than programming memory cells on odd bit lines.
As described above, a set of verify operations are performed between programming pulses. In one embodiment, a verify pulse is applied to the selected word line for each verify operation. For example, if there are eight potential data states that memory cells can be in, then there will be seven verify operations and, therefore, seven verify pulses. FIG. 14 shows an example of programming pulses 706, 708 and 710 (see also FIG. 12 ) and the verify pulses that are applied between the programming pulses 706, 708 and 710. Each verify pulse of FIG. 14 is associated with a verify operation, as described above.
During period (1) of the Bit Lines Pre-charge Phase, the source select transistor is turned off by maintaining SGS at 0V while the drain select transistor is turned on by SGD going high to VSG, thereby allowing a bit line to access a NAND string. During period (2) of the Bit Lines Pre-charge Phase, the bit line voltage of a program-inhibited NAND string (BL inhibit) is allowed to rise to a predetermined voltage given by VDD. When the bit line voltage of the program-inhibited NAND string rises to VDD, the program-inhibited NAND string will float when the gate voltage SGD on the drain select transistor drops to VDD in period (3). The bit line voltage of a programming NAND string (BL pgm) is actively pulled down to 0V. In some alternative embodiments, the bit line voltage of the programming NAND string is biased based on whether one or both of its neighbors is in program-inhibit mode or not. More information about this bias can be found in U.S. Pat. No. 7,187,585, incorporated herein by reference in its entirety.
During period (4) of the Program Phase, the unselected word lines (WL_unsel) are set to VPASS to enable boosting of the NAND string. Since a program-inhibited NAND string is floating, the high VPASS applied to the control gates of the unaddressed memory transistors boost up the voltages of their channels and charge storage elements, thereby inhibiting programming. VPASS is typically set to some intermediate voltage (e.g., ˜10V) relative to Vpgm (e.g., ˜12-24V).
During period (5) of the Program Phase, the programming voltage Vpgm is applied to the selected word line (WL_sel) as a programming pulse. The memory cells being inhibited (i.e., with boosted channels and charge storage units) will not be programmed. The selected memory cells (connected to the selected word line) will be programmed. During period (6) of the Discharge Phase, the various control lines and bit lines are allowed to discharge.
Looking back at FIG. 10 , a trigger is used (step 622) to change the programming process from programming odd and even memory cells together to programming odd and even memory cells separately. One embodiment includes using device characterization (including simulation) to determine an appropriate trigger voltage. In some embodiments, the trigger voltage can be trimmed separately for each integrated circuit. That is, subsequent to manufacturing the integrated circuits, each integrated circuit can be tested. Based on that test, the trigger voltage can be set or adjusted.
In step 1002 of FIG. 21 , the particular block (or blocks) under test is erased. The process will then program the even cells on one selected word line. In one embodiment, only one word line will receive programming. Based on that one word line, a new trigger value will be determined for the entire block, entire chip, or the entire memory system. In other embodiments, multiple word lines can be programmed and the data can be averaged or each word line can have its own trigger value. In step 1004, memory cells connected to the selected word line are programmed. The programming process of step 1004 includes all of the memory cells connected to the odd bit lines and even bit lines be enabled for programming and applying programming pulses with increasing magnitude until the programming pulses reach a magnitude of Vpgm_test. In one embodiment, the Vpgm_test is initially set at two volts below the trigger voltage determined from device characterization. The programming process of step 1004 is similar to the process of FIG. 10 with the exception that after step 620, the process continues at step 624 (there is no step 622 or 630-642). After the programming process of step 1004 is complete, then the top and bottom of the threshold voltage distribution for the memory cells connected to even bit lines are measured in step 1006. In step 1008, the block is erased.
In step 1010, the memory cells connected to the even bit lines are again programmed; however, the memory cells connected to the odd bit lines are inhibited from programming for all of the programming pulses of step 1010. Step 1010 includes applying a series of programming pulses with increasing magnitude until the magnitude of a program pulse is equal to the same Vpgm_test as step 1004. In step 1012, the threshold voltage distribution of the memory cells connected to the even bit lines is measured. In step 1014, the top and bottom of the threshold voltage distributions measured in steps 1012 and 1006 are compared. In one embodiment, the lower bounds of the two threshold voltage distributions are compared. In another embodiment, the upper bounds of each threshold voltage distribution are compared. If the difference between the lower bounds (or upper bounds) of the threshold voltage distributions is not greater than a threshold, then Vpgm_test is increased by a predetermined amount (e.g., 0.5 volts or other value) and the process repeats by looping back to step 1002. If the difference between the lowest points of the two threshold voltage distributions is greater than a threshold, then the trigger voltage (from the value determined by device characterization) is modified to become the current value of Vpgm_test in step 1020. In some embodiments, Vpgm_test can be further modified by adding some margining offset to account for consideration that the sample size may not capture the actual worst case. In one embodiment, the threshold of step 1016 is equal to 0.5 volts and the program pulse step size used for programming in steps 1004 and 1010 is 0.4 volts.
Looking back at FIG. 23 , in step 1108, one more programming pulse is applied to the selected word line. While that programming pulse is being applied at step 1108, all memory cells connected to odd bit lines are inhibited from programming. Those memory cells that reached threshold voltage of Vy in step 1104 will remain locked-out during step 1108. Thus, the programming pulse of step 1108 will only program those memory cells which had not already reached a threshold voltage of Vy. In step 1110, the number of over-programmed memory cells is again measured. In step 1112, the number of over-programmed cells measured in step 1110 is compared to the number of over-programmed memory cells measured in step 1106. If the difference in the number of over-programmed memory cells is greater than a threshold, then the trigger voltage is set to the magnitude of the pulse applied in step 1108. One example of a threshold from step 1114 is five memory cells. If the difference is not greater than the threshold (step 1114), then the voltage level of Vy is increased (e.g., by 0.5 volts) at step 1116 and the process loops back to step 1102 and repeats.
In some embodiments, a non-volatile storage system can make dynamic adjustments to the triggering voltage in order to account for changes due to environmental or usage conditions, such as cycling history, temperature, etc. FIG. 24 is a flow chart describing one embodiment for dynamically changing the trigger voltage based on the number of program/erase cycles. A program/erase cycle includes performing an erase process and a program process. As the non-volatile storage system performs many programming/erase cycles, charge may get trapped in the dielectric region between the floating gate and the channel. This condition may decrease the depletion region discussed above with respect to FIGS. 11A-C . Therefore, as the device becomes cycled many times, it may be possible to increase the trigger voltage so that the separate programming of odd and even memory cells happens later in the programming process. In step 1240 of FIG. 24 , the memory device performs X program/erase cycles. In one example, X program cycles could be 10,000 program/erase cycles. Other values for X could also be used. After performing X program/erase cycles, the trigger voltage is raised (e.g., by 0.5 volts) in step 1242. After raising the trigger voltage in step 1242, the memory system will perform Y program/erase cycles in step 1244. In one example, Y program/erase cycles could be 5,000 program/erase cycles. In step 1246, the trigger voltage will again be raised (e.g., by 0.2 volts). After raising the trigger voltage in step 1246, the memory system will continue performing program/erase cycles (step 1248). FIG. 24 shows the memory device raising the trigger voltage twice. However, in other embodiments, the trigger voltage can be raised only once or more times than twice. Different values of X and Y can be determined based on device characterization or experimental means.
One embodiment includes programming together and verifying together a first group of non-volatile storage elements and a second group of non-volatile storage elements using a programming signal, determining that a first condition exists, lowering the programming signal in response to determining that the first condition exists, and programming the first group of non-volatile storage elements separately from programming the second group of non-volatile storage elements using the lowered programming signal in response to determining that the first condition exists.
In one example, the first group of non-volatile storage elements and the second group of non-volatile storage elements are connected to a common control line and receive the programming signal on the common control line. One example of a common control line is a word line.
One embodiment includes a plurality of non-volatile storage elements, including a first group of non-volatile storage elements and a second group of non-volatile storage elements, and one or more managing circuits in communication with the non-volatile storage elements. The one or more managing circuits program together and verify together the first group of non-volatile storage elements and the second group of non-volatile storage elements using a programming signal. The one or more managing circuits determining that a first condition exists and lower the programming signal in response to determining that the first condition exists. The one or more managing circuits program the first group of non-volatile storage elements separately from programming the second group of non-volatile storage elements using the lowered programming signal in response to determining that the first condition exists.
One embodiment includes a method for programming non-volatile storage. Before a first trigger, the method includes programming together and verifying together a first group of non-volatile storage elements and a second group of non-volatile storage elements using a common programming signal that includes programming pulses that increase over time to a reference magnitude at the first trigger. After the first trigger, the method includes programming the first group of non-volatile storage elements separately from programming the second group of non-volatile storage elements using separate programming pulses that are lower in magnitude than the reference magnitude and verifying the first group of non-volatile storage elements together with the second group of non-volatile storage elements.
The foregoing detailed description of the invention has been presented for purposes of illustration and description. It is not intended to be exhaustive or to limit the invention to the precise form disclosed. Many modifications and variations are possible in light of the above teaching. The described embodiments were chosen in order to best explain the principles of the invention and its practical application, to thereby enable others skilled in the art to best utilize the invention in various embodiments and with various modifications as are suited to the particular use contemplated. It is intended that the scope of the invention be defined by the claims appended hereto.
Claims (31)
1. A method for programming non-volatile storage, comprising:
programming together and verifying together a first group of non-volatile storage elements and a second group of non-volatile storage elements using a programming signal;
determining that a first condition exists;
lowering the programming signal in response to determining that the first condition exists; and
programming the first group of non-volatile storage elements separately from programming the second group of non-volatile storage elements using the lowered programming signal in response to determining that the first condition exists.
2. The method of claim 1 , wherein:
the first group of non-volatile storage elements and the second group of non-volatile storage elements are connected to a common control line and receive the programming signal on the common control line.
3. The method of claim 1 , further comprising:
verifying the first group of non-volatile storage elements together with the second group of non-volatile storage elements after determining that the first condition exists.
4. The method of claim 3 , wherein:
the first group of non-volatile storage elements and the second group of non-volatile storage elements are connected to a common control line and receive the programming signal on the common control line.
5. The method of claim 1 , further comprising:
determining that a second conditions exists; and
programming together and verifying together the first group of non-volatile storage elements and the second group of non-volatile storage elements using the programming signal in response to determining that the second conditions exists.
6. The method of claim 1 , further comprising:
determining that a second conditions exists;
raising the programming signal in response to determining that the second condition exists; and
programming together and verifying together the first group of non-volatile storage elements and the second group of non-volatile storage elements using the raised programming signal in response to determining that the second conditions exists.
7. The method of claim 6 , wherein:
the determining that the second condition exists comprises determining at least a predetermined amount of non-volatile storage elements of the first group of non-volatile storage elements and the second group of non-volatile storage elements that are supposed to be programmed to a subset of one or more data states have successfully been programmed to the subset of one or more data states.
8. The method of claim 6 , wherein:
determining that the second condition exists comprises determining that a predetermined amount of programming has been performed.
9. The method of claim 1 , further comprising:
determining that a second conditions exists;
in response to determining that the second condition exists, raising the programming signal over a set of multiple program-verify iterations; and
programming together and verifying together the first group of non-volatile storage elements and the second group of non-volatile storage elements using the raised programming signal in response to determining that the second conditions exists.
10. The method of claim 9 , wherein:
prior to the determining that the first condition exists the programming signal had a magnitude that was increasing at a particular rate; and
the raising the programming signal comprises raising the programming signal to a value based on a magnitude of the programming signal had it not been lowered in response to determining that the first conditions exists.
11. The method of claim 1 , further comprising:
determining that a second conditions exists, prior to the determining that the first condition exists the programming signal had a magnitude that was increasing at a particular rate;
in response to determining that the second condition exists, raising the programming signal to a value based on a magnitude of the programming signal had it not been lowered in response to determining that the first conditions exists; and
programming together and verifying together the first group of non-volatile storage elements and the second group of non-volatile storage elements using the raised programming signal in response to determining that the second conditions exists.
12. The method of claim 1 , wherein:
the determining that the first condition exists comprises determining at least a predetermined amount of non-volatile storage elements of the first group of non-volatile storage elements and the second group of non-volatile storage elements that are supposed to be programmed to a particular set of one or more data states have successfully been programmed to the particular set of one or more data states.
13. The method of claim 1 , wherein:
the first group of non-volatile storage elements and the second group of non-volatile storage elements are being programmed to a group of data states; and
the particular set of one or more data states are a subset of the group of data states that are closest to the erased state.
14. A method for programming non-volatile storage, comprising:
before a first trigger, programming together and verifying together a first group of non-volatile storage elements and a second group of non-volatile storage elements using a common programming signal that includes programming pulses that increase over time to a reference magnitude at the first trigger; and
after the first trigger, programming the first group of non-volatile storage elements separately from programming the second group of non-volatile storage elements using separate programming pulses that are lower in magnitude than the reference magnitude and verifying the first group of non-volatile storage elements together with the second group of non-volatile storage elements.
15. The method of claim 14 , further comprising:
in response to the a second trigger, raising a magnitude of the common programming signal; and
in response to the second trigger, programming together and verifying together the first group of non-volatile storage elements and the second group of non-volatile storage elements using the common programming signal after being raised in response to the second trigger.
16. The method of claim 14 , wherein:
the first group of non-volatile storage elements and the second group of non-volatile storage elements are multi-state NAND flash memory devices that are connected to a common word line.
17. The method of claim 14 , further comprising:
in response to the a second trigger, raising a magnitude of the common programming signal to a value based on a magnitude of the common programming signal had it not been lowered after the first trigger; and
in response to the second trigger, programming together and verifying together the first group of non-volatile storage elements and the second group of non-volatile storage elements using the common programming signal after being raised in response to the second trigger.
18. A non-volatile storage apparatus, comprising:
a plurality of non-volatile storage elements including a first group of non-volatile storage elements and a second group of non-volatile storage elements; and
one or more managing circuits in communication with the non-volatile storage elements, the one or more managing circuits program together and verify together the first group of non-volatile storage elements and the second group of non-volatile storage elements using a programming signal, the one or more managing circuits determining that a first condition exists and lower the programming signal in response to determining that the first condition exists, the one or more managing circuits program the first group of non-volatile storage elements separately from programming the second group of non-volatile storage elements using the lowered programming signal in response to determining that the first condition exists.
19. The apparatus of claim 18 , wherein:
the first group of non-volatile storage elements and the second group of non-volatile storage elements are connected to a common control line and receive the programming signal on the common control line.
20. The apparatus of claim 18 , wherein:
the first group of non-volatile storage elements and the second group of non-volatile storage elements are multi-state non-volatile storage elements.
21. The apparatus of claim 18 , wherein:
the one or more managing circuits verify the first group of non-volatile storage elements together with the second group of non-volatile storage elements after determining that the first condition exists.
22. The apparatus of claim 18 , wherein:
the one or more managing circuits determine that a second conditions exists; and
the one or more managing circuits program together and verify together the first group of non-volatile storage elements and the second group of non-volatile storage elements using the programming signal in response to determining that the second conditions exists.
23. The apparatus of claim 18 , wherein:
the one or more managing circuits determine that a second conditions exists;
the one or more managing circuits raise the programming signal in response to determining that the second condition exists; and
the one or more managing circuits program together and verifying together the first group of non-volatile storage elements and the second group of non-volatile storage elements using the raised programming signal in response to determining that the second conditions exists.
24. The apparatus of claim 18 , wherein:
the one or more managing circuits determine that a second conditions exists;
in response to determining that the second condition exists, the one or more managing circuits raise the programming signal over a set of multiple program-verify iterations; and
the one or more managing circuits program together and verifying together the first group of non-volatile storage elements and the second group of non-volatile storage elements using the raised programming signal in response to determining that the second conditions exists.
25. The apparatus of claim 24 , wherein:
prior to the determining that the first condition exists the programming signal had a magnitude that was increasing at a particular rate; and
the one or more managing circuits raise the programming signal to a value based on a magnitude of the programming signal had it not been lowered in response to determining that the first conditions exists.
26. The apparatus of claim 18 , wherein:
the one or more managing circuits determine that a second conditions exists;
prior to the determining that the first condition exists the programming signal had a magnitude that was increasing at a particular rate;
in response to determining that the second condition exists, the one or more managing circuits raise the programming signal to a value based on a magnitude of the programming signal had it not been lowered in response to determining that the first conditions exists; and
the one or more managing circuits program together and verifying together the first group of non-volatile storage elements and the second group of non-volatile storage elements using the raised programming signal in response to determining that the second conditions exists.
27. The method according to claim 1, wherein:
the first group of non-volatile storage elements and the second group of non-volatile storage elements are part of a three dimensional memory structure.
28. The method according to claim 5, wherein:
the first group of non-volatile storage elements and the second group of non-volatile storage elements are part of a three dimensional memory structure.
29. The method according to claim 14, wherein:
the first group of non-volatile storage elements and the second group of non-volatile storage elements are part of a three dimensional memory structure.
30. The non-volatile storage system according to claim 18, wherein:
the plurality of non-volatile storage elements are part of a three dimensional memory structure.
31. The non-volatile storage system according to claim 18, wherein:
the plurality of non-volatile storage elements are part of a three dimensional memory array; and
the plurality of non-volatile storage elements include storage areas disposed above a substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14/290,927 USRE45910E1 (en) | 2010-04-18 | 2014-05-29 | Programming non-volatile storage including reducing impact from other memory cells |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/762,342 US8218366B2 (en) | 2010-04-18 | 2010-04-18 | Programming non-volatile storage including reducing impact from other memory cells |
US14/290,927 USRE45910E1 (en) | 2010-04-18 | 2014-05-29 | Programming non-volatile storage including reducing impact from other memory cells |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/762,342 Reissue US8218366B2 (en) | 2010-04-18 | 2010-04-18 | Programming non-volatile storage including reducing impact from other memory cells |
Publications (1)
Publication Number | Publication Date |
---|---|
USRE45910E1 true USRE45910E1 (en) | 2016-03-01 |
Family
ID=44120993
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/762,342 Ceased US8218366B2 (en) | 2010-04-18 | 2010-04-18 | Programming non-volatile storage including reducing impact from other memory cells |
US14/290,927 Active 2031-02-01 USRE45910E1 (en) | 2010-04-18 | 2014-05-29 | Programming non-volatile storage including reducing impact from other memory cells |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/762,342 Ceased US8218366B2 (en) | 2010-04-18 | 2010-04-18 | Programming non-volatile storage including reducing impact from other memory cells |
Country Status (7)
Country | Link |
---|---|
US (2) | US8218366B2 (en) |
EP (1) | EP2561511B1 (en) |
JP (1) | JP2013525935A (en) |
KR (1) | KR101736414B1 (en) |
CN (1) | CN102985976B (en) |
TW (1) | TW201203258A (en) |
WO (1) | WO2011133404A1 (en) |
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Also Published As
Publication number | Publication date |
---|---|
KR20130101976A (en) | 2013-09-16 |
JP2013525935A (en) | 2013-06-20 |
US20110255345A1 (en) | 2011-10-20 |
EP2561511A1 (en) | 2013-02-27 |
EP2561511B1 (en) | 2014-09-03 |
KR101736414B1 (en) | 2017-05-16 |
US8218366B2 (en) | 2012-07-10 |
CN102985976A (en) | 2013-03-20 |
CN102985976B (en) | 2015-11-25 |
TW201203258A (en) | 2012-01-16 |
WO2011133404A1 (en) | 2011-10-27 |
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