UST102104I4 - Scanning optical system adapted for linewidth measurement in semiconductor devices - Google Patents
Scanning optical system adapted for linewidth measurement in semiconductor devices Download PDFInfo
- Publication number
- UST102104I4 UST102104I4 US06/173,535 US17353580A UST102104I4 US T102104 I4 UST102104 I4 US T102104I4 US 17353580 A US17353580 A US 17353580A US T102104 I4 UST102104 I4 US T102104I4
- Authority
- US
- United States
- Prior art keywords
- spot
- optical system
- lens
- aperture
- features
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
- G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
Abstract
The present invention is directed to an optical system particularly adapted for measuring the linewidth of conductors. The particular arrangement of the various components of the optical system provide a simple system with high resolution for use in measuring very small linewidths. The optical system of the present invention utilizes a DC signal which is simpler and easier to control than an AC signal used with some optical measurement systems. More particularly, the optical system of the present invention utilizes a principle used for accurate focusing or for topographical measurements to enhance the ability of the optical system to measure small linewidths.
The optical system of the claimed invention includes a high intensity light source 18, such as a laser. Means are provided for defining and focusing a spot of the light source upon a surface 12 having features to be measured. The spot defining and focusing means include in sequence between the light source and the surface, a first lens 24, an aperture 26 and a second lens 32. The arrangement of the first and second lenses and the aperture is such that the light source is focused at the aperture by the first lens to provide a spot and the spot is focused on the surface 12 by the second lens. With this arrangement, the surface is located at the focal point of the second lens so that reflected light is refocused back in the plane of the aperture. The system further includes scanning means for selectively moving the spot across the surface to encounter the features to be measured. Light collection means 60, 62 are positioned proximate to the surface for detecting varying levels of light reflected from the surface as the spot is scanned over the edges of the features of interest. An electrical DC output is produced in response to the scanning. Means are provided for analyzing the output of the light sensitive means for providing high accuracy measurements of the distance between the detected edges of the features scanned by the spot.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/173,535 UST102104I4 (en) | 1978-12-29 | 1980-07-30 | Scanning optical system adapted for linewidth measurement in semiconductor devices |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US97463978A | 1978-12-29 | 1978-12-29 | |
US06/173,535 UST102104I4 (en) | 1978-12-29 | 1980-07-30 | Scanning optical system adapted for linewidth measurement in semiconductor devices |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US97463978A Continuation | 1978-12-29 | 1978-12-29 |
Publications (1)
Publication Number | Publication Date |
---|---|
UST102104I4 true UST102104I4 (en) | 1982-08-03 |
Family
ID=25522294
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US06/173,535 Pending UST102104I4 (en) | 1978-12-29 | 1980-07-30 | Scanning optical system adapted for linewidth measurement in semiconductor devices |
Country Status (4)
Country | Link |
---|---|
US (1) | UST102104I4 (en) |
EP (1) | EP0013325B1 (en) |
JP (1) | JPS5587904A (en) |
DE (1) | DE2962243D1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7450245B2 (en) | 2005-06-29 | 2008-11-11 | Dcg Systems, Inc. | Method and apparatus for measuring high-bandwidth electrical signals using modulation in an optical probing system |
US7659981B2 (en) | 2005-08-26 | 2010-02-09 | Dcg Systems, Inc. | Apparatus and method for probing integrated circuits using polarization difference probing |
US20100039131A1 (en) * | 2005-08-26 | 2010-02-18 | Dcg Systems, Inc. | System and method for modulation mapping |
US20100277159A1 (en) * | 2009-05-01 | 2010-11-04 | Ng Yin Shyang | Systems and method for laser voltage imaging state mapping |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58501054A (en) * | 1981-07-07 | 1983-06-30 | レニシヨウ パブリツク リミテツド カンパニ− | device for measuring dimensions |
JPS60224001A (en) * | 1984-04-20 | 1985-11-08 | Citizen Watch Co Ltd | Microsize measuring instrument |
US4748335A (en) * | 1985-04-19 | 1988-05-31 | Siscan Systems, Inc. | Method and aparatus for determining surface profiles |
US4707610A (en) * | 1985-07-03 | 1987-11-17 | Siscan Systems, Inc. | Method and apparatus for measuring surface profiles |
DE3903560A1 (en) * | 1988-02-09 | 1989-08-17 | Zeiss Carl Fa | Microscope having a device for surveying microscopic structures |
EP0407625B1 (en) * | 1989-07-08 | 1993-01-13 | International Business Machines Corporation | Method and apparatus for determining line centers in a microminiature element |
JPH10227617A (en) * | 1997-02-12 | 1998-08-25 | Nikon Corp | Mocroline width measuring method and apparatus |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3858983A (en) * | 1973-11-13 | 1975-01-07 | Autech Corp | Shaped product measurement |
GB1474191A (en) * | 1974-01-21 | 1977-05-18 | Nat Res Dev | Measurement of surface roughness |
US4200396A (en) * | 1977-12-19 | 1980-04-29 | Rca Corporation | Optically testing the lateral dimensions of a pattern |
-
1979
- 1979-10-19 JP JP13431779A patent/JPS5587904A/en active Pending
- 1979-11-27 EP EP79104713A patent/EP0013325B1/en not_active Expired
- 1979-11-27 DE DE7979104713T patent/DE2962243D1/en not_active Expired
-
1980
- 1980-07-30 US US06/173,535 patent/UST102104I4/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7450245B2 (en) | 2005-06-29 | 2008-11-11 | Dcg Systems, Inc. | Method and apparatus for measuring high-bandwidth electrical signals using modulation in an optical probing system |
US7659981B2 (en) | 2005-08-26 | 2010-02-09 | Dcg Systems, Inc. | Apparatus and method for probing integrated circuits using polarization difference probing |
US20100039131A1 (en) * | 2005-08-26 | 2010-02-18 | Dcg Systems, Inc. | System and method for modulation mapping |
US7733100B2 (en) | 2005-08-26 | 2010-06-08 | Dcg Systems, Inc. | System and method for modulation mapping |
US7990167B2 (en) | 2005-08-26 | 2011-08-02 | Dcg Systems, Inc. | System and method for modulation mapping |
US8686748B2 (en) | 2005-08-26 | 2014-04-01 | Dcg Systems, Inc. | System and method for modulation mapping |
US9239357B2 (en) | 2005-08-26 | 2016-01-19 | Dcg Systems, Inc. | System and method for modulation mapping |
US9915700B2 (en) | 2005-08-26 | 2018-03-13 | Fei Efa, Inc. | System and method for modulation mapping |
US20100277159A1 (en) * | 2009-05-01 | 2010-11-04 | Ng Yin Shyang | Systems and method for laser voltage imaging state mapping |
US8754633B2 (en) | 2009-05-01 | 2014-06-17 | Dcg Systems, Inc. | Systems and method for laser voltage imaging state mapping |
US9244121B2 (en) | 2009-05-01 | 2016-01-26 | Dcg Systems, Inc. | Systems and method for laser voltage imaging state mapping |
Also Published As
Publication number | Publication date |
---|---|
EP0013325B1 (en) | 1982-03-03 |
EP0013325A3 (en) | 1980-08-06 |
JPS5587904A (en) | 1980-07-03 |
EP0013325A2 (en) | 1980-07-23 |
DE2962243D1 (en) | 1982-04-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
STPP | Information on status: patent application and granting procedure in general |
Free format text: DEFENSIVE PUBLICATION OR SIR FILE |