WO1987006725A3 - Method and apparatus for spreading resin by centrifugation - Google Patents

Method and apparatus for spreading resin by centrifugation Download PDF

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Publication number
WO1987006725A3
WO1987006725A3 PCT/FR1987/000134 FR8700134W WO8706725A3 WO 1987006725 A3 WO1987006725 A3 WO 1987006725A3 FR 8700134 W FR8700134 W FR 8700134W WO 8706725 A3 WO8706725 A3 WO 8706725A3
Authority
WO
WIPO (PCT)
Prior art keywords
centrifugation
spread
spreading
resins
resin
Prior art date
Application number
PCT/FR1987/000134
Other languages
French (fr)
Other versions
WO1987006725A2 (en
Inventor
Eugene Tonnel
Paul Patruno
Original Assignee
Thomson Csf
Eugene Tonnel
Paul Patruno
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson Csf, Eugene Tonnel, Paul Patruno filed Critical Thomson Csf
Publication of WO1987006725A2 publication Critical patent/WO1987006725A2/en
Publication of WO1987006725A3 publication Critical patent/WO1987006725A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Abstract

The invention relates to the fabrication of integrated circuits. In photoengraving operations, it is necessary to spread resins, particularly photosensitive resins. Such spreading is carried out by centrifugation after deposition of a resin droplet. For semiconductor wafers of large diameter, the tangential speed of the wafer is very high which causes breaks in the inherent flatness of the spread resin layer. This phenomenon is corrected by carrying out the centrifugation in a rarefied atmosphere.
PCT/FR1987/000134 1986-04-22 1987-04-22 Method and apparatus for spreading resin by centrifugation WO1987006725A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR86/05802 1986-04-22
FR8605802A FR2597372B3 (en) 1986-04-22 1986-04-22 CENTRIFUGATION RESIN SPREADING METHOD AND APPARATUS

Publications (2)

Publication Number Publication Date
WO1987006725A2 WO1987006725A2 (en) 1987-11-05
WO1987006725A3 true WO1987006725A3 (en) 1987-12-17

Family

ID=9334491

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/FR1987/000134 WO1987006725A2 (en) 1986-04-22 1987-04-22 Method and apparatus for spreading resin by centrifugation

Country Status (4)

Country Link
EP (1) EP0271503A1 (en)
JP (1) JPS63503046A (en)
FR (1) FR2597372B3 (en)
WO (1) WO1987006725A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2017719C (en) * 1990-05-29 1999-01-19 Zarlink Semiconductor Inc. Moisture-free sog process
US6248398B1 (en) * 1996-05-22 2001-06-19 Applied Materials, Inc. Coater having a controllable pressurized process chamber for semiconductor processing
US6302960B1 (en) 1998-11-23 2001-10-16 Applied Materials, Inc. Photoresist coater
JP2007260895A (en) * 2006-03-28 2007-10-11 Erich Thallner Apparatus and method of coating micro-structured and/or nano-structured structural substrate
EP1840940B8 (en) * 2006-03-28 2014-11-26 Thallner, Erich, Dipl.-Ing. Apparatus and process for coating micro or nanostructured substrates

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB584615A (en) * 1945-01-10 1947-01-20 Pictorial Machinery Ltd Improvements in or relating to methods of drying coated plates for photo-lithographic and like purposes, and apparatus therefor
JPS55166923A (en) * 1979-06-15 1980-12-26 Toshiba Corp Manufacture of semiconductor device
JPS57107032A (en) * 1980-12-25 1982-07-03 Toshiba Corp Coating device for semiconductor substrate
US4385083A (en) * 1980-08-25 1983-05-24 Applied Magnetics Corporation Apparatus and method for forming a thin film of coating material on a substrate having a vacuum applied to the edge thereof
JPS58103132A (en) * 1981-12-16 1983-06-20 Konishiroku Photo Ind Co Ltd Spinner device
JPS58178522A (en) * 1982-04-14 1983-10-19 Hitachi Ltd Device and process of coating
JPS59106120A (en) * 1982-12-11 1984-06-19 Toshiba Corp Forming of resist film

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB584615A (en) * 1945-01-10 1947-01-20 Pictorial Machinery Ltd Improvements in or relating to methods of drying coated plates for photo-lithographic and like purposes, and apparatus therefor
JPS55166923A (en) * 1979-06-15 1980-12-26 Toshiba Corp Manufacture of semiconductor device
US4385083A (en) * 1980-08-25 1983-05-24 Applied Magnetics Corporation Apparatus and method for forming a thin film of coating material on a substrate having a vacuum applied to the edge thereof
JPS57107032A (en) * 1980-12-25 1982-07-03 Toshiba Corp Coating device for semiconductor substrate
JPS58103132A (en) * 1981-12-16 1983-06-20 Konishiroku Photo Ind Co Ltd Spinner device
JPS58178522A (en) * 1982-04-14 1983-10-19 Hitachi Ltd Device and process of coating
JPS59106120A (en) * 1982-12-11 1984-06-19 Toshiba Corp Forming of resist film

Non-Patent Citations (6)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN, Volume 5, No. 44 (E-50)(716 24 Mars 1981, voir le document en entier & JP, A, 55166923 (Tokyo Shibaura Denki K.K.) 26 December 1980 *
PATENT ABSTRACTS OF JAPAN, Volume 6, No. 200 (E-135)(1078) 9 OCTOBRE 1982, voir le document en entier & JP, A, 57107032 (Tokyo Shibaura Denki K.K.) 3 Juillet 1982 *
PATENT ABSTRACTS OF JAPAN, Volume 7, No. 204 (E-197)(1349, 9 Septembre 1983, & JP, A, 58103132 (Konishiroku Shashin Kogyo K.K.) 20 Juin 1983 *
PATENT ABSTRACTS OF JAPAN, Volume 8, No. 119 (E-248)(1556), 5 Juin 1984, voir le document en entier & JP, A, 5932132 (Tokyo Shibaura Denki K.K.) 21 Fevrier 1984 *
PATENT ABSTRACTS OF JAPAN, Volume 8, No. 13 (E-222)(1450) 20 Janvier 1984, & JP, A, 58178522 (Hitachi Seisakusho K.K.) 19 Octobre 1983 *
PATENT ABSTRACTS OF JAPAN, volume 8, No. 226 (E-272)(1663) 17 Octobre 1984, & JP, A, 59106120 (Toshiba K.K.) 19 Juin 1984 *

Also Published As

Publication number Publication date
JPS63503046A (en) 1988-11-10
EP0271503A1 (en) 1988-06-22
FR2597372B3 (en) 1988-07-08
WO1987006725A2 (en) 1987-11-05
FR2597372A1 (en) 1987-10-23

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