WO1994013777A1 - Cleaning compositions - Google Patents

Cleaning compositions Download PDF

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Publication number
WO1994013777A1
WO1994013777A1 PCT/GB1993/002464 GB9302464W WO9413777A1 WO 1994013777 A1 WO1994013777 A1 WO 1994013777A1 GB 9302464 W GB9302464 W GB 9302464W WO 9413777 A1 WO9413777 A1 WO 9413777A1
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WO
WIPO (PCT)
Prior art keywords
cleaning composition
substantially non
aqueous cleaning
aqueous
surfactant
Prior art date
Application number
PCT/GB1993/002464
Other languages
French (fr)
Inventor
Christopher John Mitchell
Neil Winterton
Original Assignee
Imperial Chemical Industries Plc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Plc filed Critical Imperial Chemical Industries Plc
Priority to AU55712/94A priority Critical patent/AU5571294A/en
Publication of WO1994013777A1 publication Critical patent/WO1994013777A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/18Hydrocarbons
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D17/00Detergent materials or soaps characterised by their shape or physical properties
    • C11D17/0008Detergent materials or soaps characterised by their shape or physical properties aqueous liquid non soap compositions
    • C11D17/0017Multi-phase liquid compositions
    • C11D17/0021Aqueous microemulsions
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16Organic compounds
    • C11D3/26Organic compounds containing nitrogen
    • C11D3/28Heterocyclic compounds containing nitrogen in the ring
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/43Solvents
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/024Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing hydrocarbons
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/26Cleaning or polishing of the conductive pattern

Definitions

  • the present invention relates to cleaning compositions, particularly cleaning compositions in which contaminated articles such as, for example, metals, glass, electronic components and printed circuit boards, are contacted with a cleaning composition and the
  • Solvent cleaning applications wherein contaminated articles are immersed in or washed with halogenated hydrocarbon solvents and/or the vapours thereof are well known and are in common use.
  • chlorofluorocarbons may be damaging the ozone layer surrounding the earth and it has been agreed that the manufacture and use thereof should be severely restricted and eventually curtailed.
  • Non-halogenated solvents eg terpenes
  • terpenes have been proposed as substitutes for halogenated hydrocarbon solvents in US 4, 640, 719.
  • terpenes are often completely insoluble in water and cannot be directly flushed away thereby and it has been further proposed therein to incorporate one or more emulsifying
  • hydrocarbons and dibasic esters often in the presence of a so-called compatibilising component, and mixtures of aliphatic hydrocarbons and certain polar organic radicals, and mixtures of aliphatic hydrocarbons and certain polar organic radicals, and mixtures of aliphatic hydrocarbons and certain polar organic radicals, and mixtures of aliphatic hydrocarbons and certain polar organic radicals, and mixtures of aliphatic hydrocarbons and certain polar organic
  • Multi-component mixtures including terpenes
  • NMP N-methylpyrrolidinone
  • various additives have been proposed as cleaning compositions for certain applications in Research Disclosure, January 1988, 44, No 28555, EP 0,354,027 and US 4,983,224; and cleaning compositions comprising NMP, a water-miscible
  • alkanolamine and a hydrocarbon have been proposed in US 4, 276, 186.
  • aqueous microemulsions for use in cleaning systems have been disclosed in WO 92/03528, WO 90/02665, US 5,230,821, US 5,171,475, US 5,112,516, US 5,213,624 and US 5, 158,710.
  • WO 93/13246 discloses mixtures of a C 8 -C 15 hydrocarbon and a C 5 -C 15 aliphatic alcohol for use as cleaning solvents.
  • WO 93/03102 discloses the cleaning of the surfaces of solid articles by wiping with a rag containing a mixture of propylene glycol methyl ether acatate and at least one of propylene glycol methyl ether, methyl isoamyl ketone, isoparaffin and n-butyl acatate.
  • US 4, 867, 800 and US 4, 983, 224 discloses certain cleaning compositions derived from terpene hydrocarbons.
  • US 5, Oil, 620 discloses certain cleaning compositions derived from dibasic esters.
  • non-combustible we mean that the solvent has a flash point above about 60°C measured by the Tag Closed Cup method.
  • a substantially non-aqueous cleaning composition which comprises a dipolar aprotic or protic organic compound, an aliphatic compound and a surfactant.
  • non-aqueous cleaning composition is in the form of a non-aqueous microemulsion.
  • non-aqueous microemulsion we mean a
  • microemulsions have low viscosity and small domain size and are thermodynamically stable.
  • Non-aqueous microemulsions wherein the first organic liquid is formamide have been studied (Lattes et al, Colloids Surf, 1989, 35, 221-35; Friberg et al, Langmuir, 1988, 4, 796-801; Das et al, J Phys. Chem.
  • dipolar aprotic or protic solvents of which the cleaning composition according to the presentmvention may be comprised may be mentioned inter alia glycols, eg ethylene glycol; amides, eg dimethyl formamide; sulphoxides, eg dimethyl sulphoxide; or preferably an N-alkyl pyrolidinone, more preferably NMP.
  • the aliphatic compound of which the cleaning composition according to the present invention may be comprised has a flash point of more than 60 oC and boils m the range 150-300oC, preferably in the range
  • the aliphatic compound is preferably an alkane, more preferably a C 10-13 alkane or a mixture thereof and particularly more preferably dodecane.
  • the aliphatic compound may contain one or more rings, eg it may a "naphthene” derivative, i.e. "naphthenic"; however, this is not preferred.
  • the aliphatic compound may bear one or more substituents which do not unduly inhibit the solvent power of the aliphatic compound or unduly increase its
  • dipolar aprotic or protic organic compound eg NMP
  • the cleaning composition of the present invention may contain a small amount, up to about 5% w/w say, of an aromatic compound, although this is not preferred.
  • the surfactant in the non-aqueous cleaning composition according to the present invention is any surfactant.
  • a non-ionic surfactant preferably a non-ionic surfactant, although we do not exclude the possibility that an ionic surfactant, e. g. a cationic or an anionic surfactant, may be used.
  • an ionic surfactant e. g. a cationic or an anionic surfactant
  • non-ionic surfactants may be mentioned inter alia surfactants derived by the alkoxylation, eg ethoxylation, of a hydroxy-containing compound, eg a phenol, sugar, or preferably an alcohol. It is often preferred that the non-ionic surfactant is an ethoxylated long-chain alcohol.
  • long-chain alcohol we mean an alcohol having between 7 and 20 carbon atoms, preferably between 9 and 15 carbon atoms. Conveniently a mixture of C 9 and C 11 alcohols is used.
  • the long-chain is preferably linear although we do not exclude the possibility that it may be branched, e. g. a 2-methyl isomer.
  • the ratio of the number of ethoxy groups to the length of the alcohol chain in the surfactant will be chosen in the light of inter alia the dipolar aprotic or protic organic compound and the aliphatic hydrocarbon present in the cleaning
  • composition The skilled man, by simple experiment, will be able to determine a suitable ratio of the number of ethoxy groups to the length of the alcohol chain in the surfactant.
  • the mixture should contain sufficient surfactant to render the cleaning composition clear to the naked eye.
  • the concentration of the non-ionic surfactant is typically between 5 and 50 w/w%, preferably between 10 and 25 w/w%; the concentration of NMP is between 2 and 30 w/w%, preferably between 5 and 20 w/w%; and the concentration of the aliphatic compound is between 50 and 95 w/w%, preferably between 60 and
  • the concentration of the non-ionic surfactant is about 18% w/w
  • the concentration of the dipolar aprotic or protic organic compound is about 12% w/w
  • the concentration of the aliphatic compound is about 70% w/w, particularly where the non-ionic surfactant is Synperonic ( RTM ) 91/2.5, the dipolar aprotic or protic organic compound is NMP and the aliphatic compound is dodecane.
  • cleaning composition in the form of a micremulsion comprising a surfactant, an aliphatic compound and a dipolar aprotic or protic organic compound in the
  • a non-aqueous cleaning composition in the form of a microemulsion comprising a surfactant, an aliphatic compound and a dipolar aprotic or protic organic compound in the proportions falling within the shaded area shown in the diagram of Figure 2.
  • the cleaning composition may contain additives, for example a stabiliser, or a corrosion inhibitor.
  • the cleaning composition may be used in cold cleaning applications but will typically be employed at an elevated temperature up to its flash point. Cleaning is conveniently carried out at about 20-55°C.
  • a process for the cleaning of an article which process comprises the step of contacting the article with the cleaning composition according to the first aspect of the present invention, for a suitable period of time, removing the article from contact with the cleaning composition and rinsing the article with an aqueous medium to remove residual cleaning composition therefrom.
  • the method of contacting the article with the cleaning composition in the process according to the further aspect of the present invention is not critical.
  • the article, or an appropriate portion thereof may be contacted with the liquid cleaning composition, typically by immersion in a bath thereof.
  • the article is subjected to ultrasonic radiation or mechanical agitation, e. g. stirring or vibration, during the
  • the article is removed from contact with the cleaning composition, eg by removing the article from a bath of the liquid cleaning composition, and residual cleaning composition thereon is removed by rinsing with an aqueous rinsing medium.
  • the aqueous rinsing medium is water. Rinsing is conveniently carried out at 20-55°C, e. g. ambient temperature.
  • the cleaning composition is preferably recovered from the liquid mixture produced in the rinsing step and recycled.
  • the article cleaned in the process of the present invitation is typically an electronic component.
  • flux residues may be removed from a printed circuit board after soldering.
  • Figure 1 is a phase diagram for systems containing dodecane, Synperonic (RTM) 91/25 and NMP;
  • Figure 2 is a part of the phase diagram shown in Fig 1 to a bigger scale.
  • Figure 3 is a phase diagram for systems containing dodecane, a propoxylated surfactant and NMP.
  • portions 2 indicate two-phase compositions.
  • Examples 1-2 illustrate cleaning compositions according to the present invention
  • Examples 3-6 are Comparative Tests.
  • NMP was added to a 20% w/w Synperonic 91/2.5 (ex ICI; Synperonic is an RTM ) /dodecane mixture to give the cleaning compositions shown in the Table.

Abstract

An article may be cleaned by (i) contacting it with a substantially non-aqueous cleaning composition which comprises a dipolar aprotic or protic organic compound, an aliphatic compound and a surfactant and which is preferably in the form of a non-aqueous microemulsion and (ii) removing residual substantially non-aqueous cleaning composition from the article by contacting it with an aqueous rinsing medium.

Description

CLEANING COMPOSITIONS
The present invention relates to cleaning compositions, particularly cleaning compositions in which contaminated articles such as, for example, metals, glass, electronic components and printed circuit boards, are contacted with a cleaning composition and the
residual cleaning composition is removed from the
articles by rinsing in water.
Solvent cleaning applications wherein contaminated articles are immersed in or washed with halogenated hydrocarbon solvents and/or the vapours thereof are well known and are in common use.
It is now widely recognised that certain
chlorine-containing compounds, particularly
chlorofluorocarbons, may be damaging the ozone layer surrounding the earth and it has been agreed that the manufacture and use thereof should be severely restricted and eventually curtailed.
Non-halogenated solvents, eg terpenes, have been proposed as substitutes for halogenated hydrocarbon solvents in US 4, 640, 719. However, terpenes are often completely insoluble in water and cannot be directly flushed away thereby and it has been further proposed therein to incorporate one or more emulsifying
surfactants with water to facilitate removal of the terpene from the article. Recently, mixtures of
hydrocarbons and dibasic esters, often in the presence of a so-called compatibilising component, and mixtures of aliphatic hydrocarbons and certain polar organic
compounds have been proposed as cleaning solvents for certain applications in EP O, 412, 475 and WO 91/06690 respectively. The aforementioned mixtures tend to suffer from certain disadvantages, e. g. one or more components thereof cannot be recycled, is toxic or is flammable.
Multi-component mixtures including terpenes,
N-methylpyrrolidinone (CAS 872-50-4; hereinafter referred to for convenience as "NMP") and various additives have been proposed as cleaning compositions for certain applications in Research Disclosure, January 1988, 44, No 28555, EP 0,354,027 and US 4,983,224; and cleaning compositions comprising NMP, a water-miscible
alkanolamine and a hydrocarbon have been proposed in US 4, 276, 186.
Certain aqueous microemulsions for use in cleaning systems have been disclosed in WO 92/03528, WO 90/02665, US 5,230,821, US 5,171,475, US 5,112,516, US 5,213,624 and US 5, 158,710.
WO 93/13246 discloses mixtures of a C8-C15 hydrocarbon and a C5-C15 aliphatic alcohol for use as cleaning solvents. WO 93/03102 discloses the cleaning of the surfaces of solid articles by wiping with a rag containing a mixture of propylene glycol methyl ether acatate and at least one of propylene glycol methyl ether, methyl isoamyl ketone, isoparaffin and n-butyl acatate.
US 4, 867, 800 and US 4, 983, 224 discloses certain cleaning compositions derived from terpene hydrocarbons. US 5, Oil, 620 discloses certain cleaning compositions derived from dibasic esters.
We have now invented a non-halogenated solvent suitable for cleaning applications which is ozone benign, non-corrosive, non-combustible and has low toxicity.
By "non-combustible" we mean that the solvent has a flash point above about 60°C measured by the Tag Closed Cup method.
According to the first aspect of the present invention there is provided a substantially non-aqueous cleaning composition which comprises a dipolar aprotic or protic organic compound, an aliphatic compound and a surfactant.
According to a preferred aspect of the present invention the non-aqueous cleaning composition is in the form of a non-aqueous microemulsion. By "non-aqueous microemulsion" we mean a
combination of a first organic liquid and a second organic liquid substantially immiscible therewith which are mixed in the presence of a surfactant such that an optically clear, optically isotropic liquid is formed. Typically, such microemulsions have low viscosity and small domain size and are thermodynamically stable.
Non-aqueous microemulsions wherein the first organic liquid is formamide have been studied (Lattes et al, Colloids Surf, 1989, 35, 221-35; Friberg et al, Langmuir, 1988, 4, 796-801; Das et al, J Phys. Chem.
1987, 9, 2 938-2946; Warnheim et al, J. Coll. Int. Sci., 1989, 131, 402-8), particularly as a medium for organic synthesis (Rico et al, J Amer. Chem. Soc., 1989, III, 7266-7; Rico et al, J Chem. Soc. Chem. Comm., 1987, 1205-6) and non-aqueous microemulsions wherein the first organic liquid is glycerol have been reported (Friberg et al, Surf. Sci. Ser. 24 (Microemulsion Systems); Fletcher et al, J. Chem. Soc. Faraday Trans., I, 1984, 80,
3307-14; Martino et al, J. Phys. Chem. 1990, 94,
1627-1631).
As examples of dipolar aprotic or protic solvents of which the cleaning composition according to the presentmvention may be comprised may be mentioned inter alia glycols, eg ethylene glycol; amides, eg dimethyl formamide; sulphoxides, eg dimethyl sulphoxide; or preferably an N-alkyl pyrolidinone, more preferably NMP.
The aliphatic compound of which the cleaning composition according to the present invention may be comprised has a flash point of more than 60 ºC and boils m the range 150-300ºC, preferably in the range
180-275°C.
The aliphatic compound is preferably an alkane, more preferably a C10-13 alkane or a mixture thereof and particularly more preferably dodecane. We do not exclude the possibility that the aliphatic compound may contain one or more rings, eg it may a "naphthene" derivative, i.e. "naphthenic"; however, this is not preferred.
We do not exclude the possibility that the aliphatic compound may bear one or more substituents which do not unduly inhibit the solvent power of the aliphatic compound or unduly increase its
miscibility/compatibility with the dipolar aprotic or protic organic compound, eg NMP, or its stability to the operational conditions in which the cleaning composition may be used.
We do not exclude the possibility that the cleaning composition of the present invention may contain a small amount, up to about 5% w/w say, of an aromatic compound, although this is not preferred.
The surfactant in the non-aqueous cleaning composition according to the present invention is
preferably a non-ionic surfactant, although we do not exclude the possibility that an ionic surfactant, e. g. a cationic or an anionic surfactant, may be used.
As examples of suitable non-ionic surfactants may be mentioned inter alia surfactants derived by the alkoxylation, eg ethoxylation, of a hydroxy-containing compound, eg a phenol, sugar, or preferably an alcohol. It is often preferred that the non-ionic surfactant is an ethoxylated long-chain alcohol.
By "long-chain alcohol" we mean an alcohol having between 7 and 20 carbon atoms, preferably between 9 and 15 carbon atoms. Conveniently a mixture of C9 and C11 alcohols is used. The long-chain is preferably linear although we do not exclude the possibility that it may be branched, e. g. a 2-methyl isomer.
Where the surfactant is derived from an
ethoxylated long-chain alcohol the ratio of the number of ethoxy groups to the length of the alcohol chain in the surfactant will be chosen in the light of inter alia the dipolar aprotic or protic organic compound and the aliphatic hydrocarbon present in the cleaning
composition. The skilled man, by simple experiment, will be able to determine a suitable ratio of the number of ethoxy groups to the length of the alcohol chain in the surfactant.
The concentration or ratio of dipolar aprotic or protic organic compound, aliphatic compound and
surfactant in the non-aqueous cleaning composition according to the preferred aspect of the present
invention may vary within wide limits but the mixture should contain sufficient surfactant to render the cleaning composition clear to the naked eye.
Where the dipolar aprotic or protic organic compound is NMP the concentration of the non-ionic surfactant is typically between 5 and 50 w/w%, preferably between 10 and 25 w/w%; the concentration of NMP is between 2 and 30 w/w%, preferably between 5 and 20 w/w%; and the concentration of the aliphatic compound is between 50 and 95 w/w%, preferably between 60 and
80 w/w%, wherein the sum of %w/w's of the aforementioned components is 100%.
According to a preferred embodiment of the present invention the concentration of the non-ionic surfactant is about 18% w/w, the concentration of the dipolar aprotic or protic organic compound is about 12% w/w and the concentration of the aliphatic compound is about 70% w/w, particularly where the non-ionic surfactant is Synperonic ( RTM ) 91/2.5, the dipolar aprotic or protic organic compound is NMP and the aliphatic compound is dodecane.
According to a further preferred aspect of the present invention there is provided a non-aqueous
cleaning composition in the form of a micremulsion comprising a surfactant, an aliphatic compound and a dipolar aprotic or protic organic compound in the
proportions falling within the cross-hatched area shown in the diagram of Figure 1.
According to a yet further preferred aspect of the present invention there is provided a non-aqueous cleaning composition in the form of a microemulsion comprising a surfactant, an aliphatic compound and a dipolar aprotic or protic organic compound in the proportions falling within the shaded area shown in the diagram of Figure 2.
We do not exclude the possibility that in addition to the dipolar aprotic or protic organic compound, the aliphatic compound and the non-ionic surfactant the cleaning composition may contain additives, for example a stabiliser, or a corrosion inhibitor.
The cleaning composition may be used in cold cleaning applications but will typically be employed at an elevated temperature up to its flash point. Cleaning is conveniently carried out at about 20-55°C.
According to a further aspect of the present invention there is provided a process for the cleaning of an article which process comprises the step of contacting the article with the cleaning composition according to the first aspect of the present invention, for a suitable period of time, removing the article from contact with the cleaning composition and rinsing the article with an aqueous medium to remove residual cleaning composition therefrom.
The method of contacting the article with the cleaning composition in the process according to the further aspect of the present invention is not critical. For example, the article, or an appropriate portion thereof, may be contacted with the liquid cleaning composition, typically by immersion in a bath thereof. However, we do not exclude the possibility that the article may be subjected to a spray of the cleaning composition or the cleaning composition may flow over the stationary article. In a further embodiment the article is subjected to ultrasonic radiation or mechanical agitation, e. g. stirring or vibration, during the
contacting step. The article is removed from contact with the cleaning composition, eg by removing the article from a bath of the liquid cleaning composition, and residual cleaning composition thereon is removed by rinsing with an aqueous rinsing medium. Typically, the aqueous rinsing medium is water. Rinsing is conveniently carried out at 20-55°C, e. g. ambient temperature.
The cleaning composition is preferably recovered from the liquid mixture produced in the rinsing step and recycled.
The article cleaned in the process of the present invitation is typically an electronic component. For example, flux residues may be removed from a printed circuit board after soldering.
The present invention is further illustrated by reference to the accompanying drawings which show, by way of example only, certain compositions useful in the present invention.
In the drawings:
Figure 1 is a phase diagram for systems containing dodecane, Synperonic (RTM) 91/25 and NMP;
Figure 2 is a part of the phase diagram shown in Fig 1 to a bigger scale; and
Figure 3 is a phase diagram for systems containing dodecane, a propoxylated surfactant and NMP.
In Figures 1, 2 and 3, the optically clear compositions are indicated by the hatched portions 1;
portions 2 indicate two-phase compositions.
In Figures 1 and 2, the cross-hatched portion 3 indicates preferred compositions; and in Figure 2, the shaded portion 4 indicates more preferred compositions.
Examples 1-6
Examples 1-2 illustrate cleaning compositions according to the present invention; Examples 3-6 are Comparative Tests. In Examples 1 and 2, NMP was added to a 20% w/w Synperonic 91/2.5 (ex ICI; Synperonic is an RTM ) /dodecane mixture to give the cleaning compositions shown in the Table.
Test boards to which approximately 0.6g of Multicore PRAB 3 Solder Cream had been applied and then reflowed in a Micro Vapour Phase Soldering Unit were individually immersed and gently agitated in the solvent shown in the Table at 35°C for 3 minutes. The test boards were then rinsed in deionised water for 1 minute at room temperature and dried using compressed air. Residual ionic contamination was measured using a Protonique
Contaminometer.
The results are shown in the Table from which it can be seen that higher flux removal and boards of better appearance were obtained in Examples 1 and 2 than in the Comparative Tests.
Figure imgf000011_0001

Claims

1. A substantially non-aqueous cleaning composition which comprises a dipolar aprotic or protic organic solvent, an aliphatic compound and a surfactant.
2. A substantially non-aqueous cleaning composition as claimed m Claim 1 in the form of a microemulsion.
3. A substantially non-aqueous cleaning composition as claimed in Claim 1 or 2 wherein the dipolar aprotic or protic organic solvent is an N-alkyl pyrrolidinone.
4. A substantially non-aqueous cleaning composition as claimed in Claim 3 wherein the N-alkyl pyrrolidinone is N-methyl pyrrolidinone.
5. A substantially non-aqueous cleaning composition as claimed in Claim 1 wherein the aliphatic compound is a
C10-C13 alkane.
6. A substantially non-aqueous cleaning composition as claimed in Claim 5 wherein the C10-C13 alkane is dodecane.
7. A substantially non-aqueous cleaning composition as claimed in Claim 1 wherein the surfactant is a
non-ionic surfactant.
8. A substantially non-aqueous cleaning composition as claimed in Claim 7 wherein the non-ionic surfactant is an ethoxylated long-chain alcohol.
9. A substantially non-aqueous cleaning composition as claimeid in Claim 8 wherein the ethoxylated long-chain alcohol is a Synperonic (RTM).
10. A substantially non-aqueous cleaning composition as claimed in Claim 4, wherein the concentration of the NMP is between 5%w/w and 20%w/w, the concentration of the aliphatic compound is between 60%w/w and 80%w/w and the concentration of the non-ionic surfactant is between 10%w/w and 25%w/w.
11. A substantially non-aqueous cleaning composition as claimed in Claim 4, 6 or 9 wherein the concentration of the NMP is about 12%w/w, the concentration of the dodecane is about 70%w/w and the concentration of
Synperonic (RTM) 91/2.5 is about 18%w/w.
12. A process for cleaning an article, or a portion thereof , comprising the step of contacting it with the substantially non-aqueous cleaning composition claimed in any one of Claims 1-11 at about 20-55ºC.
13. A process as claimed in Claim 12 comprising the further step of removing residual substantially
non-aqueous cleaning composition from the article by rinsing it with an aqueous rinsing medium.
PCT/GB1993/002464 1992-12-07 1993-11-30 Cleaning compositions WO1994013777A1 (en)

Priority Applications (1)

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WO1995006102A1 (en) * 1993-08-27 1995-03-02 Colgate-Palmolive Company Nonaqueous liquid microemulsion compositions
US6432445B1 (en) 1999-05-28 2002-08-13 Novartis Ag Pharmaceutical capsules comprising a cyclosporin
US7725976B1 (en) 2004-08-26 2010-06-01 The Sherwin-Williams Company Apparatus and method for the automated cleaning of articles
US8501433B2 (en) * 2002-11-01 2013-08-06 Pierce Biotechnology, Inc. Solvent for chromogenic substrate solution

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WO1991006690A1 (en) * 1989-11-01 1991-05-16 Henkel Kommanditgesellschaft Auf Aktien Mixture for cleaning printed circuit boards

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* Cited by examiner, † Cited by third party
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WO1995006102A1 (en) * 1993-08-27 1995-03-02 Colgate-Palmolive Company Nonaqueous liquid microemulsion compositions
US6432445B1 (en) 1999-05-28 2002-08-13 Novartis Ag Pharmaceutical capsules comprising a cyclosporin
US6767555B2 (en) 1999-05-28 2004-07-27 Novartis Ag Pharmaceutical compositions
US8501433B2 (en) * 2002-11-01 2013-08-06 Pierce Biotechnology, Inc. Solvent for chromogenic substrate solution
US9046495B2 (en) 2002-11-01 2015-06-02 Pierce Biotechnology, Inc. Non-toxic solvent for chromogenic substrate solution and uses thereof
US7725976B1 (en) 2004-08-26 2010-06-01 The Sherwin-Williams Company Apparatus and method for the automated cleaning of articles

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GB9225540D0 (en) 1993-01-27

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