WO1995034075A1 - Sensing schemes for flash memory with multilevel cells - Google Patents

Sensing schemes for flash memory with multilevel cells Download PDF

Info

Publication number
WO1995034075A1
WO1995034075A1 PCT/US1995/006230 US9506230W WO9534075A1 WO 1995034075 A1 WO1995034075 A1 WO 1995034075A1 US 9506230 W US9506230 W US 9506230W WO 9534075 A1 WO9534075 A1 WO 9534075A1
Authority
WO
WIPO (PCT)
Prior art keywords
cell
memory cell
level
memory
state
Prior art date
Application number
PCT/US1995/006230
Other languages
French (fr)
Inventor
Mark E. Bauer
Sanjay Talreja
Albert Fazio
Gregory Atwood
Johnny Javanifard
Kevin W. Frary
Original Assignee
Intel Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Intel Corporation filed Critical Intel Corporation
Priority to KR1019960706632A priority Critical patent/KR100287979B1/en
Priority to EP95920503A priority patent/EP0763242B1/en
Priority to MX9604972A priority patent/MX9604972A/en
Priority to AU25935/95A priority patent/AU2593595A/en
Priority to DE69521705T priority patent/DE69521705D1/en
Publication of WO1995034075A1 publication Critical patent/WO1995034075A1/en
Priority to HK98112482A priority patent/HK1011453A1/en

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5621Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
    • G11C11/5642Sensing or reading circuits; Data output circuits
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C2211/00Indexing scheme relating to digital stores characterized by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C2211/56Indexing scheme relating to G11C11/56 and sub-groups for features not covered by these groups
    • G11C2211/563Multilevel memory reading aspects
    • G11C2211/5632Multilevel reading using successive approximation

Definitions

  • the present invention relates generally to determining the state of a semiconductor memory cell and specifically to sensing the state of a flash memory cell that stores more than a single bit of data.
  • Nonvolatile semiconductor memory devices are fundamental building blocks in prior art computer system designs.
  • the primary mechanism by which data is stored in nonvolatile memory is the memory cell.
  • Typical prior memory technologies provide a maximum storage capacity of one bit, or two states, per cell.
  • Semiconductor memory cells having more than two possible states are known in the prior art, and specific references are cited at the close of the Background of the Invention.
  • flash electrically-erasable programmable read-only memory flash electrically-erasable programmable read-only memory
  • flash EEPROM flash electrically-erasable programmable read-only memory
  • Prior art flash EEPROMs typically allow for the simultaneous reading of several flash cells. Further, typical prior flash EEPROMs have a storage capacity that is much greater than the amount of data that can be output at any one time. Accordingly, each output of a flash EEPROM is typically associated with an array of flash cells that is arranged into rows and columns, where each flash cell in an array is uniquely addressable. When a user provides an address, row and column decoding logic in the flash EEPROM selects the corresponding flash cell.
  • a typical prior flash memory cell is comprised of a single field effect transistor ("FET") including a select gate, a floating gate, a source, and a drain. Information is stored in the flash cell by altering the amount of charge on the floating gate, which causes the threshold voltage Vt of the flash cell to be varied.
  • the typical prior art flash memory cell is in one of two possible states, being either "programmed” or "erased.”
  • Figure 1 illustrates flash cell distribution as a function of V for a prior art flash device. As can be seen, the erased state and the programmed state each specify a range of Vt voltages.
  • the flash cell can theoretically possess a separate identifiable state for each electron that is added to the floating gate. Practically speaking, however, prior flash cells typically have only two possible states because of inconsistencies in flash cell structure, charge loss over time, thermal considerations and inaccuracies in sensing the charge on the floating gate that affect the ability to determine the data stored in the flash cell.
  • the states are separated by a separation range.
  • the current conducted by the flash cell is compared to a current conducted by reference flash cell having a threshold voltage Vt set to a predetermined reference voltage that is a voltage in the separation range.
  • Vt threshold voltage
  • a single comparator typically makes the comparison and outputs the result.
  • a biasing voltage is applied to the select gate. Simultaneously, the same biasing voltage is applied to the select gate of the reference cell. If the flash cell is programmed, excess electrons are trapped on the floating gate, and the threshold voltage Vt of flash cell has increased such that the selected flash cell conducts less drain current than the reference flash cell. The programmed state of the prior flash cell is typically indicated by a logic 0. If the prior flash cell is erased, little or no excess electrons are on the floating gate, and the flash cell conducts more drain-source current than the reference cell. The erased state of the prior flash cell is typically indicated by a logic 1.
  • U.S. Patent No. 4,415,992 describes a sensing scheme for sensing the state of a memory cell capable of storing n states in which (n-1) comparators and (n-1) voltage references are used in parallel to determine the state of the memory cell. Each comparator compares a corresponding one of the (n-1) voltage references to a voltage determined by the drain-source current of the memory cell. Decoding logic is required to translate the outputs of the (n-1) comparators into (log2n) binary bits.
  • U.S. Patent No. 5, 163,021 describes a sensing scheme in which n comparators are sequentially used to compare the state of a memory cell capable of storing n states to a corresponding n references. Again, decoding logic is required to translate the outputs of the (n-1) comparators into (log2n) binary bits.
  • one object of the present invention is to provide a method for determining the state of a memory cell having more than two possible states.
  • Another object of the present invention is to provide a circuit for determining the state of a memory cell having n possible states, wherein the circuit uses one comparator per bit stored in the memory cell.
  • a sensing circuit for determining a state of a memory cell having n possible states, where n is greater than 2, is described.
  • the sensing circuit includes a first reference corresponding to a first threshold voltage level and a first comparator coupled to the memory cell and to the first reference.
  • the first comparator compares a threshold voltage level of the memory cell to the first reference.
  • the first comparator outputs a first result of the comparison.
  • the sensing circuit further includes a second reference corresponding to a second threshold voltage level and a third reference corresponding to a third voltage level.
  • a second comparator has one of its inputs coupled to the memory cell and its second input is selectively coupled to either the second reference or the third reference.
  • a selector circuit selects between the second and third references in response to the first result.
  • the selector circuit couples the second reference to the second comparator if the threshold voltage level of the memory cell is less than the first threshold voltage level.
  • the selector circuit couples the third reference to the second comparator if the threshold voltage level of the
  • sensing circuit that includes a single comparator.
  • a selector circuit selects between n-1 voltage references.
  • At least two data latches are provided for storing and outputting the result of comparisons made between the cell voltage level and the voltage levels of selected voltage references.
  • FIGURE 1 illustrates flash cell distribution as a function of VT for a prior art flash device.
  • FIGURE 2 is a block diagram of a computer system according to one embodiment
  • FIGURE 3 illustrates a distribution of multi-level flash cells as a function of VT wherein each flash cell has four possible states.
  • FIGURE 4A shows a flow chart for performing a binary search of reference cells for a flash cell having four possible states.
  • FIGURE 4B is a more conventional flow chart of the binary search method
  • FIGURE 5 illustrates a sensing circuit using two comparators for sensing the state of a flash cell having four possible states.
  • FIGURE 6 illustrates a distribution of multi-level flash cells as a function of VT wherein each flash cell has eight possible states.
  • FIGURE 7 shows a flow chart for performing a binary search of reference cells for a flash cell having eight possible states.
  • FIGURE 8 shows a sensing circuit utilizing a single comparator to determine the state of a flash cell having four possible states.
  • Illustrative embodiments of the present invention relate to determining the state of a semiconductor memory cell having n possible states, wherein n is greater than two.
  • a comparator is provided for every two states stored in the memory cell.
  • a single comparator is used. Both embodiments implement a binary search method for selecting which of the (n-1) references are compared to the state of the memory cell.
  • FIG. 2 shows a computer system of one embodiment.
  • the computer system generally includes a bus 11, to which may be coupled a processor 12, main memory 14, static memory 16, mass storage device 17, and integrated circuit controller 18.
  • Static memory 16 may include a flash electrically eraseable programmable read only memory (“flash EEPROM”) or other nonvolatile memory device that stores multiple bits of data per cell.
  • flash EEPROM flash electrically eraseable programmable read only memory
  • mass storage device 17 may be a solid state hard drive 17 using multiple bit per cell nonvolatile memory devices for storing data.
  • Integrated circuit cards 19 and 20 may be included in the computer system and are coupled to a Personal Computer Memory Card Industry (PCMCIA) bus 26.
  • PCMCIA bus 26 is coupled to bus 11 and to integrated circuit (IC) controller 18 for providing communication information . between cards 19 and 20 and the remainder of the computer system.
  • IC controller 18 provides control and address information to IC cards 19 and 20 via PCMCIA bus 26 and is coupled to bus 11.
  • the computer system may further include a display device 21, a keyboard 22, a cursor control device 23, a hard copy device, and a sound sampling device 25.
  • the specific components and configuration of the computer system is determined by the particular applications for which the computer system is to be used.
  • the computer system of Figure 2 may be a personal digital assistant (PDA), a pen-based computer system, a mainframe computer, or a personal computer.
  • PDA personal digital assistant
  • each memory cell is a flash cell.
  • Each flash cell in the array is capable of being in one of four analog states, and the state of the flash cell is indicated by two binary bits.
  • Figure 3 shows a distribution of multi-level flash cells as a function of threshold voltage Vt- As can be seen, each state is separated by a separation range, and three references, Refi , Ref2 and Ref3, are provided, one each from the three separation ranges. The references are provided to distinguish between the analog states.
  • State 1 encompasses the lowest range of Vt voltages of the four states and is indicated by both bits being logic l's (both erased).
  • State 2 is indicated when the high order bit (Bit 1) is a logic 1 and the lower order bit (Bit 0) is a logic 0.
  • State 3 is indicated by Bit 1 being a logic 0 and Bit 0 being a logic 1.
  • State 4 is indicated by both bits being logic 0's (both programmed).
  • the number n of possible states is not limited to four.
  • the number of states can be three, five, sixteen, etc.
  • the mapping of binary bits to analog states may be varied.
  • the lowest range of Vt voltages can be indicated by both bits being logic 0's.
  • nonvolatile memory devices other than flash EEPROM's and volatile memory devices such as Dynamic Random Access Memories (DRAM) are capable of storing three or more analog states.
  • analog states of nonvolatile devices having a floating gate may be expressed in terms other than the threshold voltage V -
  • analog states may be expressed as ranges of threshold voltages Vt as shown in Figure 3, as ranges of drain currents ID, or as ranges of charge stored on the floating gate.
  • Volatile memory cells such as DRAM memory cells are typically comprised of a capacitor and may similarly be expressed as ranges of charge, currents or voltages.
  • a nonvolatile memory cell that has a floating gate behaves as a field effect transistor having a threshold voltage Vt that increases as charge is added to the floating gate.
  • the memory cell drain current ID (“cell current”) decreases as the threshold voltage Vt and cell charge level increase.
  • the memory cell threshold voltage Vt is related to the memory cell drain current ID by the expression:
  • Gm is the transconductance of the memory cell
  • VQ is the memory cell gate voltage
  • VTJ is the memory cell drain voltage
  • Vt is the memory cell threshold voltage.
  • One type of reference is a reference memory cell programmed to have a known threshold voltage Vt that is typically between defined states. Sensing circuitry for the memory cell may be replicated for the reference memory cell and the outputs of the sensing circuitry and reference sensing circuitry may be compared using a differential comparator. Because sensing the cell charge level of a memory cell typically requires the comparison of either voltages or currents, the reference may be provided by using voltage supplies or current sources to supply voltages or currents that correspond to reference memory cells having a cell charge level between defined analog states. For this reason, the references Refi , Ref2, and Ref3 are not specified as being threshold voltages, cell currents, or levels of charge stored on a floating gate.
  • references shown in Figure 3 correspond to the characteristics of the memory cell as defined by the relationship between cell charge level, cell current ID, and threshold voltage Vt-
  • the references Refi, Ref2, and Ref3 will expressed as threshold voltages VRI, VR2 and VR3, respectively.
  • FIG. 4A is a block diagram showing a binary search method for determining the state of a memory cell having more than two possible states.
  • step 301 the cell charge level of the selected cell is sensed and compared to a first reference flash cell having its Vt equal to VR2- Depending on the result of the initial comparison, the sensed cell charge level of the selected cell is compared to a selected one of a second reference flash cell having its Vt equal to VRI and a third reference flash cell having its Vt equal to VR3. If the sensed cell charge level of the selected flash is less than that of the first reference flash cell, the sensed cell charge level is compared to the second reference flash cell at step 2, and the selected flash cell is either in state 1 or state 302.
  • the sensed cell charge level of the selected flash is greater than that of the first reference flash cell, the sensed cell charge level is compared to the third reference flash cell at step 303, and the selected flash cell is either in state 3 or state 4. Sensing of the cell charge level may be done according to any of the methods previously discussed.
  • Figure 4B is a conventional flow chart showing the binary search method of the present embodiment.
  • the cell charge level of the memory cell is sensed.
  • step 314 it is determined whether the cell charge of the memory cell is less than the cell charge level of the reference Ref . If the cell charge level of the memory cell is less than the cell charge level of the reference Ref , the memory cell is indicated as being in state 1 at step 315. If the cell charge level of the memory cell is greater than the cell charge level of the reference Refi, the memory cell is indicated as being in state 2 at step 316.
  • Ref3 is selected at step 317.
  • Figure 5 shows a sensing circuit for determining the state of a memory cell having more than two possible states.
  • This circuit implements the method of Figures 4A-4B.
  • the circuit uses a constant- gate- voltage/ variable-cell-current sensing scheme wherein a constant biasing voltage Vs is applied to the select gates of a selected flash cell 401 and reference flash cells 486, 487 and 488.
  • the state of the selected flash cell 401 is determined by comparing the cell current of the selected flash cell 401 to the reference cell currents of a reference flash cell 486 and a selected one of the reference flash cells 487 and 488.
  • a load is coupled to the drains of the respective flash cells to give rise to a voltage drop. In this manner, the cell charge level of the selected flash cell is sensed and used to determine the analog state of the selected flash cell.
  • the multi-level flash cell 401 of the present embodiment includes a select gate, a floating gate 402, a drain and a source.
  • the selected flash cell 401 is one of an array 410 of such multi-level flash cells arranged in a matrix of rows and columns.
  • the selected flash cell 401 is selected when column decoder 420 and row decoder 430 select the selected flash cell 401 in response to a user-provided address.
  • a biasing voltage Vs is applied to the select gate of flash cell 401 and the drain of flash cell 401 is coupled to the drain bias circuit 440 via column decoder 420.
  • Vs biasing voltage
  • the cell charge level on the floating gate 402 of the selected flash cell 401 determines the amount of cell current that flows through selected flash cell 401 when the biasing voltage Vs is applied to the select gate of selected flash cell 401 by defining the cell threshold voltage Vt- When the selected flash cell 401 is conducting current, a corresponding current is produced across the column load 445, resulting in a voltage drop from VCC to the node 450.
  • the voltage at node 450 is sensed by the differential comparators 460 and 470 used to determine the state of the flash cell 401.
  • the column load 445 is shown as an n-channel FET 446 coupled as a resistor having its source coupled to node 450, its drain coupled to VCC and its gate coupled to a constant voltage VCL-
  • the constant voltage VCL is preferably such that the FET 446 operates in the saturated region.
  • the column load may be a resistor.
  • a drain bias circuit 440 is also coupled between the array 410 and node 450. The function of the drain bias circuit 440 is to isolate the column load 445 fro the drain of the selected flash cell 401 while biasing the drain of the selected flash cell 401.
  • the drain bias circuit includes an n-channel FET 441 having its drain coupled to node 450, its source coupled to the selected flash cell 401 via the column decode 420, and its gate coupled to the output of an inverter 442 which has an input coupled to the source of FET 441.
  • the n-channel FET 441 may be coupled as a static gate cascode.
  • the voltage at node 450 is a function of the drain-source current of the selected flash cell 401.
  • the cell current of the selected flash cell 401 is a function of the amount of charge on the floating gate 402. As Vt increases, the cell current decreases. Similarly, the cell current increases as Vt decreases. Thus, if the selected flash cell 401 is in state 1, the voltage at node 450 is less than if the selected flash cell 401 is in state 2.
  • comparators 460 and 470 determine the state of the selected flash cell 401 by comparing the voltage at node 450 to the voltages at reference nodes 465 and 475, respectively.
  • the voltage at reference node 465 is determined by a reference flash cell 486 that has a Vt set to at VR2- Thus, the voltage at reference node 465 is greater than the voltage at node 450 if the selected flash cell 401 is programmed to state 1 or state 2.
  • the voltage at node 465 is less than the voltage at node 450 if the selected flash cell 401 is programmed to state 3 or state 4.
  • the reference flash cell 486 has its source coupled to ground, its gate coupled to the biasing voltage Vs, and its drain coupled to a reference drain bias circuit 467, which is preferably identical to the drain bias circuit 440.
  • the drain bias circuit 467 is coupled to a reference column load circuit 466, which is preferably identical to column load 445.
  • the voltage at reference node 475 is determined by a selected one of reference flash cells 487 and 488 having Vts equal to VRI and VR3, respectively.
  • Reference node 475 is similarly coupled to a reference column load 466 and a reference drain bias 467. There are a number of different ways for providing a reference voltage to sense the state of the selected flash cell.
  • one scheme is to provide two reference cells having different threshold voltages Vt with their drains coupled together.
  • Two identical column load circuits are coupled in parallel to the drains of the two reference cells at the reference node.
  • the voltage at the reference node is equivalent to a single reference cell having a cell current equal to the average of the cell currents of the two reference cells multiplied by the resistance of a single column load circuit.
  • the voltage reference may be generated using a single reference cell with its gate driven to one of (n-1) different values by a digital-to-analog converter.
  • the current across the reference column load 466 may be produced by circuits other than reference flash cells.
  • a constant current source or current mirror may be used.
  • the use of current mirror circuits in conjunction with an array of reference flash cells provides the needed reference currents for sensing multiple flash cells simultaneously without having to reproduce the array of reference flash cells for each output of the memory device.
  • comparators 460 and 470 are both coupled to node 450 for sensing the voltage resulting from applying the biasing voltage Vs to the select gate of the selected flash cell 401.
  • Comparator 460 has its positive terminal coupled to reference node 465.
  • the positive terminal of comparator 470 is coupled to reference node 475.
  • the selection between the reference flash cells 487 and 488 is made in response to the output of comparator 460.
  • a selector circuit 480 is coupled between the output signal line 491 of the comparator 460 and the first and second reference cells.
  • the selector circuit 480 includes a first n-channel FET 481 coupled between the drain bias circuit 467 and the reference flash cell 487, and a second n-channel FET 482 coupled between the drain bias circuit 467 and the reference flash cell 488.
  • the signal line 490 which is the output of the comparator 460, is coupled to the gate of FET 481.
  • An inverter 483 is coupled between the output signal line 490 and the gate of the second FET 477. If the output of the first comparator 460 is a logic 1, indicating that the selected flash cell 401 has a lower Vt than the reference flash cell 486, the first FET 481 is switched on, and the second comparator 470 is coupled to the reference flash cell 487.
  • the inverter inverts the output to switch the FET 482 on, coupling the second comparator 470 to the reference flash cell 488.
  • the second comparator 470 outputs the result of the second comparison via output signal line 491.
  • the output signal line 490 outputs the high order bit Bit 1 and the output signal line 491 outputs the low order bit Bit 0. In this manner, no decoding logic is necessary as the outputs of the comparators 460 and 470 correspond directly to the state of the selected flash cell 401.
  • Output signal lines 490 and 491 may thus be mapped directly to the outputs of a memory device such that both bits of athe selected flash cell 401 are read out in a parallel fashion.
  • the sensing circuit of this embodiment is especially useful when the number n of possible states is a power of two, i.e. when (log2 n) is an integer, because the circuit is configured to perform a binary search.
  • n is equal to 4 the threshold voltage Vt of the first reference cell is preferably in the separation range between the (n/2) state and the (n/2 + 1) state. If the threshold voltage Vt voltage of the first reference cell is greater than the threshold voltage Vt of the selected flash cell, the threshold voltage Vt of the second reference cell is preferably in the separation range between the (n/4) state and the (n/4 + 1) state.
  • the threshold voltage Vt of the first reference cell is less than the threshold voltage Vt of the selected flash cell
  • the threshold voltage Vt of the second reference cell is preferably in the separation range between the (3n/4) state and the ((3n/4) + 1)) state.
  • a single comparator is preferably added and the selector circuit is modified.
  • Figure 6 is a distribution of flash cells versus Vt for a flash device capable of having eight states.
  • Figure 7 shows a flow chart for a binary search when the number of states is equal to 8.
  • the binary search of the eight reference cells begins at step 711 with the initial comparison of the cell charge level of the selected cell to the cell charge level of a first reference cell having a Vt equal to VR4. If the sensed cell charge level is less than that of the first reference cell, the search continues in steps 712, 713 and 714 as described in steps 301, 302 and 303 of Figure 4A. If the sensed cell charge level is greater than that of the first reference cell, the search continues as shown in steps 722, 723 and 724. Each state is represented by three binary bits.
  • Figure 8 illustrates a sensing circuit utilizing a single comparator to determine the state of a flash cell having four possible states.
  • this embodiment is a synchronous circuit.
  • the negative terminal of comparator 460 is coupled to node 450, and the positive terminal of comparator 460 is coupled to reference node 465.
  • a decode circuit 563 determines which one of the three reference flash cells 486, 487, and 488 is to be coupled to the reference drain bias circuit 467.
  • the counter 566 starts with a count of 0 and has a maximum count of one. The maximum count is increased by one for each additional bit of data stored in a flash cell. For a three bit cell, the maximum count would be two.
  • the clock generator 567 provides a clock signal to the counter 566, which increases its count by one, each clock cycle. The frequency of the clock generator may be determined by methods that are well-known in the art.
  • the decode circuit 563 has the output of the counter 566 and the output of the first latch 580 as inputs.
  • An exemplary truth table for the decode circuit 563 is illustrated in Table 2.
  • the counter is initialized to 0 such that the drain bias 467 is coupled to reference flash cell 486.
  • the reference flash cell 486 has a threshold voltage Vt equal to VR2-
  • the result of the first comparison is stored in latch 580.
  • the first result is output by the latch 580 via signal line 590, which is fed back to the decoding circuit 563. If the first result is a logic 1, the reference flash cell 487, which has a threshold voltage Vt equal to VRI, is selected, and the voltage at node 555 is compared to the voltage at node 550. If the first result is a logic 0, the reference flash cell 488 having a threshold voltage Vt equal to VR3 is selected.
  • the second result is output by the comparator 560 and stored in the latch 585. The second result is output by the latch 585 via signal line 591.
  • Output signal line 590 outputs the high order bit Bit 1
  • output signal line 591 outputs the low order bit Bit 0.

Abstract

Methods and apparatus for determining the state of a memory cell having more than two possible states are disclosed. For a first embodiment, the state of a flash cell (401) having n states, where n is a power of two, is determined by selectively comparing the threshold voltage Vt of a selected memory cell to (n-1) reference voltages. For every two states, a single comparator (460 and 470) is provided such that the total number of comparators is equal to the number of bits stored in the memory cell.

Description

-i-
SENSLNG SCHEMES FOR FLASH MEMORY WITH MULTILEVEL CELLS
FIELD OF THE INVENTION
The present invention relates generally to determining the state of a semiconductor memory cell and specifically to sensing the state of a flash memory cell that stores more than a single bit of data. BACKGROUND OF THE INVENTION
Nonvolatile semiconductor memory devices are fundamental building blocks in prior art computer system designs. The primary mechanism by which data is stored in nonvolatile memory is the memory cell. Typical prior memory technologies provide a maximum storage capacity of one bit, or two states, per cell. Semiconductor memory cells having more than two possible states are known in the prior art, and specific references are cited at the close of the Background of the Invention.
One type of prior nonvolatile semiconductor memory is the flash electrically-erasable programmable read-only memory ("flash EEPROM"). Prior art flash EEPROMs typically allow for the simultaneous reading of several flash cells. Further, typical prior flash EEPROMs have a storage capacity that is much greater than the amount of data that can be output at any one time. Accordingly, each output of a flash EEPROM is typically associated with an array of flash cells that is arranged into rows and columns, where each flash cell in an array is uniquely addressable. When a user provides an address, row and column decoding logic in the flash EEPROM selects the corresponding flash cell.
A typical prior flash memory cell is comprised of a single field effect transistor ("FET") including a select gate, a floating gate, a source, and a drain. Information is stored in the flash cell by altering the amount of charge on the floating gate, which causes the threshold voltage Vt of the flash cell to be varied. The typical prior art flash memory cell is in one of two possible states, being either "programmed" or "erased." Figure 1 illustrates flash cell distribution as a function of V for a prior art flash device. As can be seen, the erased state and the programmed state each specify a range of Vt voltages. The flash cell can theoretically possess a separate identifiable state for each electron that is added to the floating gate. Practically speaking, however, prior flash cells typically have only two possible states because of inconsistencies in flash cell structure, charge loss over time, thermal considerations and inaccuracies in sensing the charge on the floating gate that affect the ability to determine the data stored in the flash cell.
To distinguish between the two possible states, the states are separated by a separation range. According to one prior method, when a flash cell is read, the current conducted by the flash cell is compared to a current conducted by reference flash cell having a threshold voltage Vt set to a predetermined reference voltage that is a voltage in the separation range. A single comparator typically makes the comparison and outputs the result.
When a flash cell is selected for reading, a biasing voltage is applied to the select gate. Simultaneously, the same biasing voltage is applied to the select gate of the reference cell. If the flash cell is programmed, excess electrons are trapped on the floating gate, and the threshold voltage Vt of flash cell has increased such that the selected flash cell conducts less drain current than the reference flash cell. The programmed state of the prior flash cell is typically indicated by a logic 0. If the prior flash cell is erased, little or no excess electrons are on the floating gate, and the flash cell conducts more drain-source current than the reference cell. The erased state of the prior flash cell is typically indicated by a logic 1.
When a flash cell has three or more possible states, the prior art sensing schemes and circuits similar to that described above are inadequate. First, as a general rule, there must be at least (n-1) references for n states. This can be implemented as (n-1) reference cells. Thus, for three states, there must be two references. Typical prior art sensing schemes discriminate between two states and provide only one voltage reference. Second, the use of a single comparator in typical prior sensing schemes, without more, is not adequate to retrieve data from a multi¬ level flash cell.
U.S. Patent No. 4,415,992 describes a sensing scheme for sensing the state of a memory cell capable of storing n states in which (n-1) comparators and (n-1) voltage references are used in parallel to determine the state of the memory cell. Each comparator compares a corresponding one of the (n-1) voltage references to a voltage determined by the drain-source current of the memory cell. Decoding logic is required to translate the outputs of the (n-1) comparators into (log2n) binary bits.
U.S. Patent No. 5, 163,021 describes a sensing scheme in which n comparators are sequentially used to compare the state of a memory cell capable of storing n states to a corresponding n references. Again, decoding logic is required to translate the outputs of the (n-1) comparators into (log2n) binary bits.
SUMMARY AND OBTECTS OF THE INVENTION
Therefore, one object of the present invention is to provide a method for determining the state of a memory cell having more than two possible states.
Another object of the present invention is to provide a circuit for determining the state of a memory cell having n possible states, wherein the circuit uses one comparator per bit stored in the memory cell.
A sensing circuit for determining a state of a memory cell having n possible states, where n is greater than 2, is described. The sensing circuit includes a first reference corresponding to a first threshold voltage level and a first comparator coupled to the memory cell and to the first reference. The first comparator compares a threshold voltage level of the memory cell to the first reference. The first comparator outputs a first result of the comparison. The sensing circuit further includes a second reference corresponding to a second threshold voltage level and a third reference corresponding to a third voltage level. A second comparator has one of its inputs coupled to the memory cell and its second input is selectively coupled to either the second reference or the third reference. A selector circuit selects between the second and third references in response to the first result. The selector circuit couples the second reference to the second comparator if the threshold voltage level of the memory cell is less than the first threshold voltage level. The selector circuit couples the third reference to the second comparator if the threshold voltage level of the memory cell is greater than the first voltage level.
The above-mentioned objects and other objects of the invention are also provided for by sensing circuit that includes a single comparator. A selector circuit selects between n-1 voltage references. At least two data latches are provided for storing and outputting the result of comparisons made between the cell voltage level and the voltage levels of selected voltage references. Other objects, features, and advantages of the present invention will be apparent from the accompanying drawings and from the detailed description which follows below.
BRIEF DESCRIPTION OF THE DRAWINGS
The present invention is illustrated by way of example and not limitation in the figures of the accompanying drawings, in which like references indicate similar elements, and in which:
FIGURE 1 illustrates flash cell distribution as a function of VT for a prior art flash device.
FIGURE 2 is a block diagram of a computer system according to one embodiment
FIGURE 3 illustrates a distribution of multi-level flash cells as a function of VT wherein each flash cell has four possible states.
FIGURE 4A shows a flow chart for performing a binary search of reference cells for a flash cell having four possible states.
FIGURE 4B is a more conventional flow chart of the binary search method
FIGURE 5 illustrates a sensing circuit using two comparators for sensing the state of a flash cell having four possible states.
FIGURE 6 illustrates a distribution of multi-level flash cells as a function of VT wherein each flash cell has eight possible states.
FIGURE 7 shows a flow chart for performing a binary search of reference cells for a flash cell having eight possible states.
FIGURE 8 shows a sensing circuit utilizing a single comparator to determine the state of a flash cell having four possible states.
DETAILED DESCRIPTION
Illustrative embodiments of the present invention relate to determining the state of a semiconductor memory cell having n possible states, wherein n is greater than two. According to one embodiment, a comparator is provided for every two states stored in the memory cell. In a second embodiment, a single comparator is used. Both embodiments implement a binary search method for selecting which of the (n-1) references are compared to the state of the memory cell.
Figure 2 shows a computer system of one embodiment. The computer system generally includes a bus 11, to which may be coupled a processor 12, main memory 14, static memory 16, mass storage device 17, and integrated circuit controller 18. Static memory 16 may include a flash electrically eraseable programmable read only memory ("flash EEPROM") or other nonvolatile memory device that stores multiple bits of data per cell. Similarly, mass storage device 17 may be a solid state hard drive 17 using multiple bit per cell nonvolatile memory devices for storing data.
Integrated circuit cards 19 and 20 may be included in the computer system and are coupled to a Personal Computer Memory Card Industry (PCMCIA) bus 26. PCMCIA bus 26 is coupled to bus 11 and to integrated circuit (IC) controller 18 for providing communication information . between cards 19 and 20 and the remainder of the computer system. IC controller 18 provides control and address information to IC cards 19 and 20 via PCMCIA bus 26 and is coupled to bus 11.
The computer system may further include a display device 21, a keyboard 22, a cursor control device 23, a hard copy device, and a sound sampling device 25. The specific components and configuration of the computer system is determined by the particular applications for which the computer system is to be used. For example, the computer system of Figure 2 may be a personal digital assistant (PDA), a pen-based computer system, a mainframe computer, or a personal computer. For each embodiment, each memory cell is a flash cell. Each flash cell in the array is capable of being in one of four analog states, and the state of the flash cell is indicated by two binary bits. Figure 3 shows a distribution of multi-level flash cells as a function of threshold voltage Vt- As can be seen, each state is separated by a separation range, and three references, Refi , Ref2 and Ref3, are provided, one each from the three separation ranges. The references are provided to distinguish between the analog states. State 1 encompasses the lowest range of Vt voltages of the four states and is indicated by both bits being logic l's (both erased). State 2 is indicated when the high order bit (Bit 1) is a logic 1 and the lower order bit (Bit 0) is a logic 0. State 3 is indicated by Bit 1 being a logic 0 and Bit 0 being a logic 1. State 4 is indicated by both bits being logic 0's (both programmed). The number n of possible states is not limited to four. For example, the number of states can be three, five, sixteen, etc. Further, the mapping of binary bits to analog states may be varied. For example, the lowest range of Vt voltages can be indicated by both bits being logic 0's.
It should be noted that nonvolatile memory devices other than flash EEPROM's and volatile memory devices such as Dynamic Random Access Memories (DRAM) are capable of storing three or more analog states. Further, it should be noted that the analog states of nonvolatile devices having a floating gate may be expressed in terms other than the threshold voltage V - For example, analog states may be expressed as ranges of threshold voltages Vt as shown in Figure 3, as ranges of drain currents ID, or as ranges of charge stored on the floating gate. Volatile memory cells such as DRAM memory cells are typically comprised of a capacitor and may similarly be expressed as ranges of charge, currents or voltages.
A nonvolatile memory cell that has a floating gate behaves as a field effect transistor having a threshold voltage Vt that increases as charge is added to the floating gate. The memory cell drain current ID ("cell current") decreases as the threshold voltage Vt and cell charge level increase. The memory cell threshold voltage Vt is related to the memory cell drain current ID by the expression:
ID α Gm x (VG - Vt) for VD > VC - Vt
Gm is the transconductance of the memory cell;
VQ is the memory cell gate voltage;
VTJ is the memory cell drain voltage; and
Vt is the memory cell threshold voltage. Given this relationship, there are a number of different ways to sense the amount of charge stored on of the floating gate of the memory cell including: sensing the cell current of a memory cell when a constant voltage is applied to the select gate of the memory cell; sensing the amount of voltage required at the select gate to give rise to an expected cell current for the memory cell; sensing a voltage drop across a load that is coupled to the drain of the memory cell when a constant voltage is applied to the select gate of the memory cell, wherein the cell current determines the amount of the voltage drop across the load; and sensing the amount of voltage required at the select gate to give rise to an expected voltage drop across a load that is coupled to the drain of the memory cell. To determine the analog state of the memory cell, however, it is not necessary to quantify the precise amount of charge stored on the floating gate. It is sufficient to compare a characteristic of the memory cell to a known reference.
One type of reference is a reference memory cell programmed to have a known threshold voltage Vt that is typically between defined states. Sensing circuitry for the memory cell may be replicated for the reference memory cell and the outputs of the sensing circuitry and reference sensing circuitry may be compared using a differential comparator. Because sensing the cell charge level of a memory cell typically requires the comparison of either voltages or currents, the reference may be provided by using voltage supplies or current sources to supply voltages or currents that correspond to reference memory cells having a cell charge level between defined analog states. For this reason, the references Refi , Ref2, and Ref3 are not specified as being threshold voltages, cell currents, or levels of charge stored on a floating gate. Instead, it is to be understood that the references shown in Figure 3 correspond to the characteristics of the memory cell as defined by the relationship between cell charge level, cell current ID, and threshold voltage Vt- For the purposes of simplifying the remaining discussion, the references Refi, Ref2, and Ref3 will expressed as threshold voltages VRI, VR2 and VR3, respectively.
Figure 4A is a block diagram showing a binary search method for determining the state of a memory cell having more than two possible states. In step 301, the cell charge level of the selected cell is sensed and compared to a first reference flash cell having its Vt equal to VR2- Depending on the result of the initial comparison, the sensed cell charge level of the selected cell is compared to a selected one of a second reference flash cell having its Vt equal to VRI and a third reference flash cell having its Vt equal to VR3. If the sensed cell charge level of the selected flash is less than that of the first reference flash cell, the sensed cell charge level is compared to the second reference flash cell at step 2, and the selected flash cell is either in state 1 or state 302. If the sensed cell charge level of the selected flash is greater than that of the first reference flash cell, the sensed cell charge level is compared to the third reference flash cell at step 303, and the selected flash cell is either in state 3 or state 4. Sensing of the cell charge level may be done according to any of the methods previously discussed.
Figure 4B is a conventional flow chart showing the binary search method of the present embodiment. At step 311, the cell charge level of the memory cell is sensed. At step 312, it is determined whether the cell charge of the memory cell is less than the cell charge level of the reference Ref2- If the cell charge level of the memory cell is less than the cell charge level of the reference Ref2, the threshold voltage Vt of the memory cell is less than that of a reference memory cell having a Vt equal to V 2- Similarly, the cell current ID of the memory cell is greater than the cell current IR2 of a reference memory cell having a cell current of l 2- If the cell charge level of the memory cell is less than the cell charge level of reference Ref2, Refi is selected at step 313. At step 314, it is determined whether the cell charge of the memory cell is less than the cell charge level of the reference Ref . If the cell charge level of the memory cell is less than the cell charge level of the reference Ref , the memory cell is indicated as being in state 1 at step 315. If the cell charge level of the memory cell is greater than the cell charge level of the reference Refi, the memory cell is indicated as being in state 2 at step 316.
If the cell charge level of the memory cell is less than the cell charge level of reference Ref2, Ref3 is selected at step 317. At step 318, it is determined whether the cell charge of the memory cell is less than the cell charge level of the reference Ref3- If the cell charge level of the memory cell is less than the cell charge level of the reference Ref3, the memory cell is indicated as being in state 3 at step 319. If the cell charge level of the memory cell is greater than the cell charge level of the reference Ref3, the memory cell is indicated as being in state 4 at step 320.
Figure 5 shows a sensing circuit for determining the state of a memory cell having more than two possible states. This circuit implements the method of Figures 4A-4B. The circuit uses a constant- gate- voltage/ variable-cell-current sensing scheme wherein a constant biasing voltage Vs is applied to the select gates of a selected flash cell 401 and reference flash cells 486, 487 and 488. The state of the selected flash cell 401, as a function of the level of charge on floating gate 142 of the flash cell 141, is determined by comparing the cell current of the selected flash cell 401 to the reference cell currents of a reference flash cell 486 and a selected one of the reference flash cells 487 and 488. To sense the respective cell currents, a load is coupled to the drains of the respective flash cells to give rise to a voltage drop. In this manner, the cell charge level of the selected flash cell is sensed and used to determine the analog state of the selected flash cell.
The multi-level flash cell 401 of the present embodiment includes a select gate, a floating gate 402, a drain and a source. The selected flash cell 401 is one of an array 410 of such multi-level flash cells arranged in a matrix of rows and columns. The selected flash cell 401 is selected when column decoder 420 and row decoder 430 select the selected flash cell 401 in response to a user-provided address. When the selected flash cell 401 is selected, a biasing voltage Vs is applied to the select gate of flash cell 401 and the drain of flash cell 401 is coupled to the drain bias circuit 440 via column decoder 420. It will be understood that several flash cells of the array 410 can be concurrently selected in a similar manner such that multiple bits of data may be read simultaneously. Accordingly, each selected cell would be coupled to sensing circuitry similar to that shown in Figure 5.
The cell charge level on the floating gate 402 of the selected flash cell 401 determines the amount of cell current that flows through selected flash cell 401 when the biasing voltage Vs is applied to the select gate of selected flash cell 401 by defining the cell threshold voltage Vt- When the selected flash cell 401 is conducting current, a corresponding current is produced across the column load 445, resulting in a voltage drop from VCC to the node 450. The voltage at node 450 is sensed by the differential comparators 460 and 470 used to determine the state of the flash cell 401.
In Figure 5, the column load 445 is shown as an n-channel FET 446 coupled as a resistor having its source coupled to node 450, its drain coupled to VCC and its gate coupled to a constant voltage VCL- The constant voltage VCL is preferably such that the FET 446 operates in the saturated region. Alternatively, the column load may be a resistor. A drain bias circuit 440 is also coupled between the array 410 and node 450. The function of the drain bias circuit 440 is to isolate the column load 445 fro the drain of the selected flash cell 401 while biasing the drain of the selected flash cell 401. The drain bias circuit includes an n-channel FET 441 having its drain coupled to node 450, its source coupled to the selected flash cell 401 via the column decode 420, and its gate coupled to the output of an inverter 442 which has an input coupled to the source of FET 441. Alternatively, the n-channel FET 441 may be coupled as a static gate cascode.
The voltage at node 450 is a function of the drain-source current of the selected flash cell 401. In turn, the cell current of the selected flash cell 401 is a function of the amount of charge on the floating gate 402. As Vt increases, the cell current decreases. Similarly, the cell current increases as Vt decreases. Thus, if the selected flash cell 401 is in state 1, the voltage at node 450 is less than if the selected flash cell 401 is in state 2.
In this circuit, comparators 460 and 470 determine the state of the selected flash cell 401 by comparing the voltage at node 450 to the voltages at reference nodes 465 and 475, respectively. In this embodiment, the voltage at reference node 465 is determined by a reference flash cell 486 that has a Vt set to at VR2- Thus, the voltage at reference node 465 is greater than the voltage at node 450 if the selected flash cell 401 is programmed to state 1 or state 2. The voltage at node 465 is less than the voltage at node 450 if the selected flash cell 401 is programmed to state 3 or state 4. The reference flash cell 486 has its source coupled to ground, its gate coupled to the biasing voltage Vs, and its drain coupled to a reference drain bias circuit 467, which is preferably identical to the drain bias circuit 440. The drain bias circuit 467 is coupled to a reference column load circuit 466, which is preferably identical to column load 445. For the comparator 470, the voltage at reference node 475 is determined by a selected one of reference flash cells 487 and 488 having Vts equal to VRI and VR3, respectively. Reference node 475 is similarly coupled to a reference column load 466 and a reference drain bias 467. There are a number of different ways for providing a reference voltage to sense the state of the selected flash cell. For example, one scheme is to provide two reference cells having different threshold voltages Vt with their drains coupled together. Two identical column load circuits are coupled in parallel to the drains of the two reference cells at the reference node. Assuming that the same voltage is applied to the select gates of the reference cells, the voltage at the reference node is equivalent to a single reference cell having a cell current equal to the average of the cell currents of the two reference cells multiplied by the resistance of a single column load circuit. Also, the voltage reference may be generated using a single reference cell with its gate driven to one of (n-1) different values by a digital-to-analog converter. For a further discussion of one reference circuit, see U.S. Patent No. 5,289,412, of Frary et al, and commonly assigned to Intel Corporation of Santa Clara, California.
Additionally, the current across the reference column load 466 may be produced by circuits other than reference flash cells. For example, a constant current source or current mirror may be used. The use of current mirror circuits in conjunction with an array of reference flash cells provides the needed reference currents for sensing multiple flash cells simultaneously without having to reproduce the array of reference flash cells for each output of the memory device.
The negative terminals of comparators 460 and 470 are both coupled to node 450 for sensing the voltage resulting from applying the biasing voltage Vs to the select gate of the selected flash cell 401. Comparator 460 has its positive terminal coupled to reference node 465. The positive terminal of comparator 470 is coupled to reference node 475. The selection between the reference flash cells 487 and 488 is made in response to the output of comparator 460. A selector circuit 480 is coupled between the output signal line 491 of the comparator 460 and the first and second reference cells. The selector circuit 480 includes a first n-channel FET 481 coupled between the drain bias circuit 467 and the reference flash cell 487, and a second n-channel FET 482 coupled between the drain bias circuit 467 and the reference flash cell 488. The signal line 490, which is the output of the comparator 460, is coupled to the gate of FET 481. An inverter 483 is coupled between the output signal line 490 and the gate of the second FET 477. If the output of the first comparator 460 is a logic 1, indicating that the selected flash cell 401 has a lower Vt than the reference flash cell 486, the first FET 481 is switched on, and the second comparator 470 is coupled to the reference flash cell 487. If the output of the first comparator 460 is a logic 0, the inverter inverts the output to switch the FET 482 on, coupling the second comparator 470 to the reference flash cell 488. The second comparator 470 outputs the result of the second comparison via output signal line 491. For this embodiment, the output signal line 490 outputs the high order bit Bit 1 and the output signal line 491 outputs the low order bit Bit 0. In this manner, no decoding logic is necessary as the outputs of the comparators 460 and 470 correspond directly to the state of the selected flash cell 401. Output signal lines 490 and 491 may thus be mapped directly to the outputs of a memory device such that both bits of athe selected flash cell 401 are read out in a parallel fashion.
The sensing circuit of this embodiment is especially useful when the number n of possible states is a power of two, i.e. when (log2 n) is an integer, because the circuit is configured to perform a binary search. When n is equal to 4 the threshold voltage Vt of the first reference cell is preferably in the separation range between the (n/2) state and the (n/2 + 1) state. If the threshold voltage Vt voltage of the first reference cell is greater than the threshold voltage Vt of the selected flash cell, the threshold voltage Vt of the second reference cell is preferably in the separation range between the (n/4) state and the (n/4 + 1) state. If the threshold voltage Vt of the first reference cell is less than the threshold voltage Vt of the selected flash cell, the threshold voltage Vt of the second reference cell is preferably in the separation range between the (3n/4) state and the ((3n/4) + 1)) state. For each additional bit of stored per cell, a single comparator is preferably added and the selector circuit is modified.
When n is equal to 8, 16, 32, etc., the selection of reference cells continues in a similar manner, the remaining states being bisected until the states of all bits stored in the flash cell are determined. Figure 6 is a distribution of flash cells versus Vt for a flash device capable of having eight states. Figure 7 shows a flow chart for a binary search when the number of states is equal to 8. According to Figure 7, the binary search of the eight reference cells begins at step 711 with the initial comparison of the cell charge level of the selected cell to the cell charge level of a first reference cell having a Vt equal to VR4. If the sensed cell charge level is less than that of the first reference cell, the search continues in steps 712, 713 and 714 as described in steps 301, 302 and 303 of Figure 4A. If the sensed cell charge level is greater than that of the first reference cell, the search continues as shown in steps 722, 723 and 724. Each state is represented by three binary bits.
Figure 8 illustrates a sensing circuit utilizing a single comparator to determine the state of a flash cell having four possible states. Unlike the first embodiment, this embodiment is a synchronous circuit. Like the first embodiment, the negative terminal of comparator 460 is coupled to node 450, and the positive terminal of comparator 460 is coupled to reference node 465. A decode circuit 563 determines which one of the three reference flash cells 486, 487, and 488 is to be coupled to the reference drain bias circuit 467. When the number of states is equal to four, the counter 566 starts with a count of 0 and has a maximum count of one. The maximum count is increased by one for each additional bit of data stored in a flash cell. For a three bit cell, the maximum count would be two. The clock generator 567 provides a clock signal to the counter 566, which increases its count by one, each clock cycle. The frequency of the clock generator may be determined by methods that are well-known in the art.
The decode circuit 563 has the output of the counter 566 and the output of the first latch 580 as inputs. An exemplary truth table for the decode circuit 563 is illustrated in Table 2. The FETs 610, 615, 620 and 625, along with the inverters 605 and 630, implement the truth table of Table 2, which is a binary search similar to that shown in Figures 4A-4B.
Table 2
COUNT FIRST RESULT VREF
0 X VR2 1 1 VRI 1 0 VR3
During a read operation, the counter is initialized to 0 such that the drain bias 467 is coupled to reference flash cell 486. The reference flash cell 486 has a threshold voltage Vt equal to VR2- The result of the first comparison is stored in latch 580. The first result is output by the latch 580 via signal line 590, which is fed back to the decoding circuit 563. If the first result is a logic 1, the reference flash cell 487, which has a threshold voltage Vt equal to VRI, is selected, and the voltage at node 555 is compared to the voltage at node 550. If the first result is a logic 0, the reference flash cell 488 having a threshold voltage Vt equal to VR3 is selected. The second result is output by the comparator 560 and stored in the latch 585. The second result is output by the latch 585 via signal line 591. Output signal line 590 outputs the high order bit Bit 1, and output signal line 591 outputs the low order bit Bit 0.
In the foregoing specification the invention has been described with reference to specific exemplary embodiments thereof. It will, however, be evident that various modifications and changes may be made thereto without departing from the broader spirit and scope of the invention as set forth in the appended claims. The specification and drawings are, accordingly, to be regarded in an illustrative rather than restrictive sense.

Claims

CLAIMSWhat is claimed is:
1. In a memory device including at least one memory cell having a cell charge level that indicates one of n possible states, wherein n is greater than 2, each state corresponding to a predetermined range of charge levels, a method for determining a state of the memory cell, the method comprising the steps of: sensing the cell charge level of the memory cell; comparing the cell charge level of the memory cell to a first reference; outputting a first result of comparing the cell charge level of the memory cell to the first reference; comparing the cell charge level of the memory cell to a selected one of a second reference and a third reference, wherein selection between the second and third references is done in response to the first result; and outputting a second result of comparing the cell charge level of the memory cell to the selected one of the second and third references.
2. The method of claim 1, wherein the step of comparing the cell charge level of the memory cell to the selected one of the second reference and the third reference includes the further steps of: comparing the cell charge level of the memory cell to the second reference if the cell charge level of the memory cell is less than the first reference as indicated by the first result; and comparing the cell charge level of the memory cell to the third reference if the cell charge level of the memory cell is greater than the first reference as indicated by the first result.
3. The method of claim 2, wherein n is equal to four, the steps of outputting the first and second results comprising the steps of: indicating that the memory cell is in a first state if the cell charge level of the memory cell is less than both the first and second references; indicating that the memory cell is in a second state if the cell charge level of the memory cell is less than the first reference and greater than the second reference; indicating that the memory cell is in a third state if the cell charge level of the memory cell is greater than the first reference and less than third reference; and indicating that the memory cell is in a fourth state if the cell charge level of the memory cell is greater than both the first and third references.
4. The method of claim 2, wherein the memory cell is a nonvolatile memory cell having a floating gate for storing charge.
5. The method of claim 4, wherein the first reference is a first reference memory cell and the second reference is a second reference memory cell, the first and second references memory cells having floating gates for storing charge.
6. The method of claim 5, wherein the first reference memory cell has a first cell charge level corresponding to a level of charge between the second and third states.
7. The method of claim 6, wherein the second reference memory cell has a second cell charge level corresponding to a level of charge between the first and second states.
8 The method of claim 7, wherein the step of sensing the cell charge level of the memory cell comprises the step of generating a cell current for the memory cell.
9. The method of claim 8, wherein the step of comparing the cell charge level of the memory cell to the first reference comprises the steps of generating a reference cell current for the first reference memory cell, and comparing the cell current to the reference cell current.
10. The method of claim 7, wherein the step of sensing the cell charge level of the memory cell comprises the steps of generating a cell current for the memory cell, and generating a voltage in response to the cell current.
11. The method of claim 10, wherein the step of comparing the cell charge level of the memory cell to the first reference comprises the steps of: generating a reference cell current for the first reference memory cell; generating a reference voltage in response to the reference cell current; and comparing the voltage to the reference cell voltage.
12. The method of claim 7, wherein the first reference is a first current source for generating a c irrent equal to a cell current of a memory cell that stores a level of charge between the second and third states.
13. The method of claim 4, wherein the first reference is provided by applying a first gate voltage to a first reference cell, the second reference is provided by applying a second gate voltage to the first reference cell, and the third reference is provided by applying a third gate voltage to the first reference cell, the first reference cell having a floating gate for storing charge.
14. In a memory device including at least one memory cell having a cell charge level that indicates one of three possible states, each state corresponding to a predetermined range of charge levels, a method for determining a state of the memory cell, the method comprising the steps of: sensing the cell charge level of the memory cell; comparing the cell charge level of the memory cell to a first reference; selecting a second reference if the cell charge level of the memory cell is less than the first reference; comparing the cell charge level of the memory cell to the second reference; indicating that the memory cell is in a first state if the cell charge level is less than the second reference; indicating that the memory cell is in a second state if the cell charge level is greater than the second reference; and indicating that the memory cell is in a third state if the cell charge level is greater than the first reference.
15. The memory device of claim 14, wherein the memory cell is a nonvolatile memory cell having a floating gate for storing charge.
16. The memory device of claim 15, wherein the first reference is a first reference memory cell and the second reference is a second reference memory cell, the first and second references memory cells having floating gates for storing charge.
17. The memory device of claim 16, wherein the first reference memory cell has a first cell charge level corresponding to a level of charge between the second and third states.
18. The memory device of claim 17, wherein the second reference memory cell has a second cell charge level corresponding to a level of charge between the first and second states.
19. The memory device of claim 18, wherein the step of sensing the cell charge level of the memory cell comprises the step of generating a cell current for the memory cell.
20. The memory device of claim 19, wherein the step of comparing the cell charge level of the memory cell to the first reference comprises the steps of generating a reference cell current for the first reference memory cell, and comparing the cell current to the reference cell current.
21. The memory device of claim 18, wherein the step of sensing the cell charge level of the memory cell comprises the steps of generating a cell current for the memory cell, and generating a voltage in response to the cell current.
22. The memory device of claim 21, wherein the step of comparing the cell charge level of the memory cell to the first reference comprises the steps of generating a reference cell current for the first reference memory cell, generating a reference voltage in response to the reference cell current, and comparing the voltage to the reference cell voltage.
23. The memory device of claim 18, wherein the first reference is a first current source for generating a current equal to a cell current of a memory cell that stores a level of charge between the second and third states.
24. The method of claim 15, wherein the first reference is provided by applying a first gate voltage to a first reference cell and the second reference is provided by applying a second gate voltage to the first reference cell, the first reference cell having a floating gate for storing charge.
25. In a memory device including at least one memory cell having a cell charge level that indicates one of four possible states, each state corresponding to a predetermined range of charge levels, a method for determining a state of the memory cell, the method comprising the steps of: sensing the cell charge level of the memory cell; comparing the cell charge level of the memory cell to a first reference; selecting a second reference if the cell charge level of the memory cell is less than the first reference; comparing the cell charge level of the memory cell to the second reference; indicating that the memory cell is in a first state if the cell charge level is less than the second reference; indicating that the memory cell is in a second state if the cell charge level is greater than the second reference; and selecting a third reference if the cell charge level of the memory cell is greater than the first reference; comparing the cell charge level of the memory cell to the third reference; indicating that the memory cell is in a third state if the cell charge level is less than the second reference; and indicating that the memory cell is in a fourth state if the cell charge level is greater than the second reference; and
26. The memory device of claim 25, wherein the memory cell is a nonvolatile memory cell having a floating gate for storing charge.
27. The memory device of claim 26, wherein the first reference is a first reference memory cell and the second reference is a second reference memory cell, the first and second references memory cells having floating gates for storing charge.
28. The memory device of claim 27, wherein the first reference memory cell has a first cell charge level corresponding to a level of charge between the second and third states.
29. The memory device of claim 28, wherein the second reference memory cell has a second cell charge level corresponding to a level of charge between the first and second states.
30. The memory device of claim 29, wherein the third reference memory cell has a third cell charge level corresponding to a level of charge between the third and fourth states.
31. The memory device of claim 30, wherein the step of sensing the cell charge level of the memory cell comprises the step of generating a cell current for the memory cell.
32. The memory device of claim 31, wherein the step of comparing the cell charge level of the memory cell to the first reference comprises the steps of generating a reference cell current for the first reference memory cell, and comparing the cell ctirrent to the reference cell current.
33. The memory device of claim 30, wherein the step of sensing the cell charge level of the memory cell comprises the steps of generating a cell current for the memory cell, and generating a voltage in response to the cell current.
34. The memory device of claim 30, wherein the step of comparing the cell charge level of the memory cell to the first reference comprises the steps of generating a reference cell current for the first reference memory cell, generating a reference voltage in response to the reference cell current, and comparing the voltage to the reference cell voltage.
35. The memory device of claim 25, wherein the first reference is a first current source for generating a current equal to a cell current of a memory cell that stores a level of charge between the second and third states.
36. In a memory device including at least one memory cell having a threshold voltage level that indicates one of n possible states, wherein n is greater than 2, each state corresponding to a predetermined range of threshold voltage levels, a method for determining a state of the memory cell, the method comprising the steps of: providing m references, where m is equal to at least n-1, each of the m references corresponding to a threshold voltage level between two states; sensing the threshold voltage level of the memory cell; comparing the threshold voltage level of the memory cell to a first reference; outputting a first result of comparing the threshold voltage level of the memory cell to the first reference; comparing the threshold voltage level of the memory cell to a selected one of a second reference and a third reference in response to the first result; and outputting a second result of comparing the threshold voltage level of the memory cell to the selected one of the second reference and the third reference.
37. The method of claim 36, wherein the step of comparing the threshold voltage level of the memory cell to the selected one of the second reference and the third reference includes the further steps of: if the threshold voltage level of the memory cell, is less than the first reference as indicated by the first result, comparing the threshold voltage level of the memory cell to the second voltage reference; and if the threshold voltage level of the memory cell is greater than the first reference as indicated by the first result, comparing the threshold voltage level of the memory cell to the third reference.
38. The method of claim 37, wherein the first reference corresponds to a threshold voltage level between a n/2 state and a (n/2 + 1) state.
39. The method of claim 38, wherein the second reference corresponds to a threshold voltage level between a (n/4) state and a (n/4 +1) state.
40. The method of claim 39, wherein the third reference corresponds to a threshold voltage level between a (3n/4) state and a (3n/4 + 1) state.
41. The method of claim 37, wherein the first and second results are each expressed using a single binary bit.
42. The method of claim 37, wherein (log2 n) is equal to an integer.
43. The method of claim 37, wherein n is equal to four.
44. The method of claim 37, wherein n is equal to eight.
45. In a memory device including at least one memory cell having a threshold voltage level that indicates one of n possible states, where n is greater than 2, each state corresponding to a predetermined range of threshold voltage levels, a sensing circuit for determining a state of the memory cell, the sensing circuit comprising: a first reference corresponding to a first threshold voltage level; a first comparator coupled to the memory cell and to the first reference, the first comparator for comparing the threshold voltage level of the memory cell to the first reference, and for outputting a first result; a second reference corresponding to a second threshold voltage level; a third reference corresponding to a third threshold voltage level; a second comparator coupled to the memory cell and a selected one of the second reference and the third reference, the second comparator for comparing the threshold voltage level of the memory cell to the selected one of the second reference and the third reference, and for outputting a second result; and a selector circuit coupled for receiving the first result, the selector circuit for selectively coupling the one of the second reference and the third reference to the second comparator in response to the first result.
46. The sensing circuit of claim 45, wherein the selector circuit couples the second reference to the second comparator if the threshold voltage level of the memory cell is less than the first reference.
47. The sensing circuit of claim 46, wherein the selector circuit couples the third reference to the second comparator if the threshold voltage level of the memory cell is greater than the first reference.
48. The sensing circuit of claim 47, wherein the first threshold voltage level is between a n/2 state and a (n/2 + 1) state.
49. The sensing circuit of claim 48, wherein the third threshold voltage level is between a 3n/4 state and a (3n/4 + 1) state.
50. The sensing circuit of claim 49, wherein the second threshold voltage level is between a n/4 state and a (n/4 + 1) state.
51. The sensing circuit of claim 50, wherein n is equal to four.
52. The sensing circuit of claim 50, wherein n is equal to eight.
53. The sensing circuit of claim 45, wherein the sensing circuit further comprises a first reference cell having a select gate and a floating gate for storing charge, the first reference cell for providing the first reference in response to a first gate voltage, for providing the second reference in response to a second gate voltage, and for providing the third reference in response to a third gate voltage, the first, second, and third gate voltages being applied to the select gate of the first reference cell.
54. In a memory device including at least one memory cell having a threshold voltage level that indicates one of n possible states, where n is greater than 2, each state corresponding to a predetermined range of voltage levels, a sensing circuit for determining a state of the memory cell, the sensing circuit comprising: a number m references, where m is equal to n-1, each of the m references corresponding to a threshold voltage level between two states; a comparator coupled to the memory cell and a selected one of the m references, the second comparator for comparing the threshold voltage level of the memory cell to a first reference, for outputting a first result, for comparing the cell voltage level to a one of a second and third reference, and for outputting a second result; and a selector circuit coupled for receiving the first result, the selector circuit for initially coupling the first reference to the comparator, and for selectively coupling the one of the second reference and the third reference to the comparator in response to the first result.
55. The sensing circuit of claim 54, wherein the selector circuit couples the second reference to the second comparator if the threshold voltage level of the memory cell is less than the first reference.
56. The sensing circuit of claim 55, wherein the selector circuit couples the third reference to the second comparator if the threshold voltage level of the memory cell is greater than the first reference.
57. The sensing circuit of claim 56, wherein the first voltage level is between a n/2 state and a (n/2 + 1) state.
58. The sensing circuit of claim 57, wherein the third voltage level is between a 3n/4 state and a (3n/4 + 1) state.
59. The sensing circuit of claim 58, wherein the second voltage level is between a n/4 state and a (n/4 + 1) state.
60. The sensing circuit of claim 54, wherein n is equal to four.
61. The sensing circuit of claim 54, wherein n is equal to eight.
62. The sensing circuit of claim 54, wherein the sensing circuit further comprises a first reference cell having a select gate and a floating gate for storing charge, the first reference cell for providing the first reference in response to a first gate voltage, for providing the second reference in response to a second gate voltage, and for providing the third reference in response to a third gate voltage, the first, second, and third gate voltages being applied to the select gate of the first reference cell.
PCT/US1995/006230 1994-06-02 1995-05-18 Sensing schemes for flash memory with multilevel cells WO1995034075A1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
KR1019960706632A KR100287979B1 (en) 1994-06-02 1995-05-18 Detection method and circuit of flash memory with multilevel cells
EP95920503A EP0763242B1 (en) 1994-06-02 1995-05-18 Sensing schemes for flash memory with multilevel cells
MX9604972A MX9604972A (en) 1995-05-18 1995-05-18 Sensing schemes for flash memory with multilevel cells.
AU25935/95A AU2593595A (en) 1994-06-02 1995-05-18 Sensing schemes for flash memory with multilevel cells
DE69521705T DE69521705D1 (en) 1994-06-02 1995-05-18 SCAN PROCEDURE FOR A FLASH MEMORY WITH MULTI-STAGE CELLS
HK98112482A HK1011453A1 (en) 1994-06-02 1998-11-30 Sensing schemes for flash memory with multilevel cells

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US25268094A 1994-06-02 1994-06-02
US08/252,680 1994-06-02

Publications (1)

Publication Number Publication Date
WO1995034075A1 true WO1995034075A1 (en) 1995-12-14

Family

ID=22957051

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1995/006230 WO1995034075A1 (en) 1994-06-02 1995-05-18 Sensing schemes for flash memory with multilevel cells

Country Status (9)

Country Link
US (2) US5828616A (en)
EP (1) EP0763242B1 (en)
KR (1) KR100287979B1 (en)
CN (1) CN1147866C (en)
AU (1) AU2593595A (en)
DE (1) DE69521705D1 (en)
HK (1) HK1011453A1 (en)
RU (1) RU2190260C2 (en)
WO (1) WO1995034075A1 (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5748535A (en) * 1994-10-26 1998-05-05 Macronix International Co., Ltd. Advanced program verify for page mode flash memory
US5754469A (en) * 1996-06-14 1998-05-19 Macronix International Co., Ltd. Page mode floating gate memory device storing multiple bits per cell
US5835414A (en) * 1996-06-14 1998-11-10 Macronix International Co., Ltd. Page mode program, program verify, read and erase verify for floating gate memory device with low current page buffer
EP0940752A1 (en) * 1998-03-05 1999-09-08 Nec Corporation Method for error correction in a multilevel semiconductor memory
US5999451A (en) * 1998-07-13 1999-12-07 Macronix International Co., Ltd. Byte-wide write scheme for a page flash device
US6115285A (en) * 1996-06-14 2000-09-05 Siemens Aktiengesellschaft Device and method for multi-level charge/storage and reading out
EP1291881A2 (en) * 2001-09-06 2003-03-12 Sharp Kabushiki Kaisha Output sense amplifier for a multibit memory cell
WO2003100786A2 (en) * 2002-05-17 2003-12-04 Intel Corporation Serially sensing the output of multilevel cell arrays

Families Citing this family (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6002614A (en) 1991-02-08 1999-12-14 Btg International Inc. Memory apparatus including programmable non-volatile multi-bit memory cell, and apparatus and method for demarcating memory states of the cell
US6222762B1 (en) * 1992-01-14 2001-04-24 Sandisk Corporation Multi-state memory
US7071060B1 (en) 1996-02-28 2006-07-04 Sandisk Corporation EEPROM with split gate source side infection with sidewall spacers
JP3205658B2 (en) 1993-12-28 2001-09-04 新日本製鐵株式会社 Reading method of semiconductor memory device
US6353554B1 (en) 1995-02-27 2002-03-05 Btg International Inc. Memory apparatus including programmable non-volatile multi-bit memory cell, and apparatus and method for demarcating memory states of the cell
US6857099B1 (en) * 1996-09-18 2005-02-15 Nippon Steel Corporation Multilevel semiconductor memory, write/read method thereto/therefrom and storage medium storing write/read program
KR100226746B1 (en) * 1996-12-30 1999-10-15 구본준 Data sensing device and data sensing method of multibit cell in semiconductor memory device
JP3169858B2 (en) * 1997-06-20 2001-05-28 日本電気アイシーマイコンシステム株式会社 Multi-level semiconductor memory device
JPH11176178A (en) * 1997-12-15 1999-07-02 Sony Corp Non-volatile semiconductor storage and ic memory card using it
KR100339023B1 (en) * 1998-03-28 2002-09-18 주식회사 하이닉스반도체 Sensing circuit for threshold voltage regulatable flash memory device
US6038166A (en) * 1998-04-01 2000-03-14 Invox Technology High resolution multi-bit-per-cell memory
CA2277717C (en) 1999-07-12 2006-12-05 Mosaid Technologies Incorporated Circuit and method for multiple match detection in content addressable memories
US6188606B1 (en) 1999-08-06 2001-02-13 Advanced Micro Devices, Inc. Multi state sensing of NAND memory cells by varying source bias
US6141244A (en) * 1999-09-02 2000-10-31 Advanced Micro Devices, Inc. Multi level sensing of NAND memory cells by external bias current
US6550028B1 (en) * 1999-10-19 2003-04-15 Advanced Micro Devices, Inc. Array VT mode implementation for a simultaneous operation flash memory device
US6219279B1 (en) * 1999-10-29 2001-04-17 Zilog, Inc. Non-volatile memory program driver and read reference circuits
JP4249352B2 (en) * 1999-11-09 2009-04-02 富士通株式会社 Nonvolatile semiconductor memory device
US6292395B1 (en) * 1999-12-30 2001-09-18 Macronix International Co., Ltd. Source and drain sensing
US6363008B1 (en) 2000-02-17 2002-03-26 Multi Level Memory Technology Multi-bit-cell non-volatile memory with maximized data capacity
US6396744B1 (en) 2000-04-25 2002-05-28 Multi Level Memory Technology Flash memory with dynamic refresh
US7079422B1 (en) 2000-04-25 2006-07-18 Samsung Electronics Co., Ltd. Periodic refresh operations for non-volatile multiple-bit-per-cell memory
US6856568B1 (en) 2000-04-25 2005-02-15 Multi Level Memory Technology Refresh operations that change address mappings in a non-volatile memory
EP1160794B1 (en) 2000-05-31 2008-07-23 STMicroelectronics S.r.l. Circuit structure for programming data in reference cells of a multibit non-volatile memory device
DE60037504T2 (en) 2000-05-31 2008-12-11 Stmicroelectronics S.R.L., Agrate Brianza Reference cell array arrangement for data reading in a nonvolatile memory device
US6744671B2 (en) * 2000-12-29 2004-06-01 Intel Corporation Kicker for non-volatile memory drain bias
US6535423B2 (en) * 2000-12-29 2003-03-18 Intel Corporation Drain bias for non-volatile memory
US6477086B2 (en) 2000-12-29 2002-11-05 Intel Corporation Local sensing of non-volatile memory
US6570789B2 (en) 2000-12-29 2003-05-27 Intel Corporation Load for non-volatile memory drain bias
US6456540B1 (en) 2001-01-30 2002-09-24 Intel Corporation Method and apparatus for gating a global column select line with address transition detection
DE60136330D1 (en) 2001-04-10 2008-12-11 St Microelectronics Srl Read circuit and associated method for non-volatile multi-level memory
TW559814B (en) * 2001-05-31 2003-11-01 Semiconductor Energy Lab Nonvolatile memory and method of driving the same
US6700815B2 (en) * 2002-04-08 2004-03-02 Advanced Micro Devices, Inc. Refresh scheme for dynamic page programming
US6594181B1 (en) * 2002-05-10 2003-07-15 Fujitsu Limited System for reading a double-bit memory cell
TW564426B (en) * 2002-07-09 2003-12-01 Macronix Int Co Ltd Circuit and method of sensing amplifier with adjustable reference terminal bit line load
US6847550B2 (en) * 2002-10-25 2005-01-25 Nexflash Technologies, Inc. Nonvolatile semiconductor memory having three-level memory cells and program and read mapping circuits therefor
JP4113423B2 (en) * 2002-12-04 2008-07-09 シャープ株式会社 Semiconductor memory device and reference cell correction method
JP2005092923A (en) * 2003-09-12 2005-04-07 Renesas Technology Corp Semiconductor memory device
JP3924568B2 (en) * 2004-02-20 2007-06-06 Necエレクトロニクス株式会社 Data access control method and data access control program in flash memory
ITMI20041988A1 (en) * 2004-10-20 2005-01-20 Atmel Corp "METHOD AND SYSTEM FOR THE DELIVERY OF DETECTION IN A MULTIPLE BENCH MEMORY DEVICE."
ITMI20042538A1 (en) * 2004-12-29 2005-03-29 Atmel Corp METHOD AND SYSTEM FOR THE REDUCTION OF SOFT-WRITING IN A FLASH MEMORY AT MULTIPLE LEVELS
KR100666174B1 (en) * 2005-04-27 2007-01-09 삼성전자주식회사 Nonvolatile semiconductor memory device having three-level memory cells and operating method therefor
ITMI20051075A1 (en) * 2005-06-10 2006-12-11 Atmel Corp "SYSTEM AND METHOD TO COMPARE THE RESISTANCE IN A NON-VOLATILE MEMORY"
US7656710B1 (en) * 2005-07-14 2010-02-02 Sau Ching Wong Adaptive operations for nonvolatile memories
JP4660353B2 (en) * 2005-11-01 2011-03-30 株式会社東芝 Storage medium playback device
US7941590B2 (en) * 2006-11-06 2011-05-10 Marvell World Trade Ltd. Adaptive read and write systems and methods for memory cells
DE102007001859B3 (en) * 2007-01-12 2008-04-24 Qimonda Ag Integrated circuit e.g. dynamic RAM, for use in electronic device, has resistive memory cell, and p-channel transistor that produces predetermined reading voltage for smaller resistance range which has reference conditions of reference cell
US7400521B1 (en) 2007-01-12 2008-07-15 Qimoda Ag Integrated circuit, memory chip and method of evaluating a memory state of a resistive memory cell
KR101261008B1 (en) * 2007-08-14 2013-05-06 삼성전자주식회사 Operating method of nonvolatile memory device having three-level nonvolatile memory cells and nonvolatile memory device using the same
US8255623B2 (en) * 2007-09-24 2012-08-28 Nvidia Corporation Ordered storage structure providing enhanced access to stored items
US7916537B2 (en) * 2009-06-11 2011-03-29 Seagate Technology Llc Multilevel cell memory devices having reference point cells
CN102081959B (en) * 2009-11-26 2013-06-12 中国科学院微电子研究所 Storage reading circuit and storage
CN102932609B (en) * 2012-10-15 2015-06-24 清华大学 Method of reading data of image sensor based on flash memory
CN102932611B (en) * 2012-10-15 2015-10-28 清华大学 A kind of data reading circuit of the imageing sensor based on flash memory
CN102932610B (en) * 2012-10-15 2016-03-23 清华大学 A kind of image sensor array structure based on flash memory
US9946495B2 (en) 2013-04-25 2018-04-17 Microsoft Technology Licensing, Llc Dirty data management for hybrid drives
KR20180016854A (en) * 2016-08-08 2018-02-20 에스케이하이닉스 주식회사 Semiconductor memory device and method for operating the same
US11605434B1 (en) * 2021-08-31 2023-03-14 Micron Technology, Inc. Overwriting at a memory system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5283761A (en) * 1992-07-22 1994-02-01 Mosaid Technologies Incorporated Method of multi-level storage in DRAM

Family Cites Families (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3142824A (en) * 1963-10-16 1964-07-28 Control Data Corp Analog storage circuit
US3304103A (en) * 1965-12-22 1967-02-14 Ibm Cut card continuous forms
US3505655A (en) * 1968-06-21 1970-04-07 Ibm Digital storage system operating in the magnitude-time domain
FR2246022B1 (en) * 1973-09-28 1979-06-01 Siemens Ag
US4181980A (en) * 1978-05-15 1980-01-01 Electronic Arrays, Inc. Acquisition and storage of analog signals
US4202044A (en) * 1978-06-13 1980-05-06 International Business Machines Corporation Quaternary FET read only memory
US4287570A (en) * 1979-06-01 1981-09-01 Intel Corporation Multiple bit read-only memory cell and its sense amplifier
IT1224062B (en) * 1979-09-28 1990-09-26 Ates Componenti Elettron PROGRAMMING METHOD FOR AN ELECTRICALLY ALTERABLE NON-VOLATILE SEMICONDUCTOR MEMORY
JPS5660247A (en) * 1979-10-22 1981-05-25 Hiraoka Shokusen Soft sheet
US4415992A (en) * 1981-02-25 1983-11-15 Motorola, Inc. Memory system having memory cells capable of storing more than two states
JPS57176598A (en) * 1981-04-20 1982-10-29 Sanyo Electric Co Ltd Write-in circuit for non-volatile analog memory
US4388702A (en) * 1981-08-21 1983-06-14 Mostek Corporation Multi-bit read only memory circuit
US4460982A (en) * 1982-05-20 1984-07-17 Intel Corporation Intelligent electrically programmable and electrically erasable ROM
JPS5949022A (en) * 1982-09-13 1984-03-21 Toshiba Corp Multi-value logical circuit
JPS6013398A (en) * 1983-07-04 1985-01-23 Hitachi Ltd Semiconductor multi-value storage device
EP0136119B1 (en) * 1983-09-16 1988-06-29 Fujitsu Limited Plural-bit-per-cell read-only memory
US4771404A (en) * 1984-09-05 1988-09-13 Nippon Telegraph And Telephone Corporation Memory device employing multilevel storage circuits
US4701884A (en) * 1985-08-16 1987-10-20 Hitachi, Ltd. Semiconductor memory for serial data access
US5012448A (en) * 1985-12-13 1991-04-30 Ricoh Company, Ltd. Sense amplifier for a ROM having a multilevel memory cell
US4943948A (en) * 1986-06-05 1990-07-24 Motorola, Inc. Program check for a non-volatile memory
US5034922A (en) * 1987-12-21 1991-07-23 Motorola, Inc. Intelligent electrically erasable, programmable read-only memory with improved read latency
US4875188A (en) * 1988-01-12 1989-10-17 Intel Corporation Voltage margining circuit for flash eprom
US5222046A (en) * 1988-02-17 1993-06-22 Intel Corporation Processor controlled command port architecture for flash memory
US5053990A (en) * 1988-02-17 1991-10-01 Intel Corporation Program/erase selection for flash memory
US5293560A (en) * 1988-06-08 1994-03-08 Eliyahou Harari Multi-state flash EEPROM system using incremental programing and erasing methods
US5095344A (en) * 1988-06-08 1992-03-10 Eliyahou Harari Highly compact eprom and flash eeprom devices
US5043940A (en) * 1988-06-08 1991-08-27 Eliyahou Harari Flash EEPROM memory systems having multistate storage cells
US4989179A (en) * 1988-07-13 1991-01-29 Information Storage Devices, Inc. High density integrated circuit analog signal recording and playback system
US4890259A (en) * 1988-07-13 1989-12-26 Information Storage Devices High density integrated circuit analog signal recording and playback system
JPH07105146B2 (en) * 1988-07-29 1995-11-13 三菱電機株式会社 Non-volatile storage device
US5163021A (en) * 1989-04-13 1992-11-10 Sundisk Corporation Multi-state EEprom read and write circuits and techniques
US5172338B1 (en) * 1989-04-13 1997-07-08 Sandisk Corp Multi-state eeprom read and write circuits and techniques
EP0617363B1 (en) * 1989-04-13 2000-01-26 SanDisk Corporation Defective cell substitution in EEprom array
FR2650109B1 (en) * 1989-07-20 1993-04-02 Gemplus Card Int INTEGRATED MOS CIRCUIT WITH ADJUSTABLE THRESHOLD VOLTAGE
US5200920A (en) * 1990-02-08 1993-04-06 Altera Corporation Method for programming programmable elements in programmable devices
US5289406A (en) * 1990-08-28 1994-02-22 Mitsubishi Denki Kabushiki Kaisha Read only memory for storing multi-data
US5126967A (en) * 1990-09-26 1992-06-30 Information Storage Devices, Inc. Writable distributed non-volatile analog reference system and method for analog signal recording and playback
JPH04154212A (en) * 1990-10-17 1992-05-27 Mitsubishi Electric Corp Output circuit for semiconductor memory device
JP2573416B2 (en) * 1990-11-28 1997-01-22 株式会社東芝 Semiconductor storage device
US5220531A (en) * 1991-01-02 1993-06-15 Information Storage Devices, Inc. Source follower storage cell and improved method and apparatus for iterative write for integrated circuit analog signal recording and playback
JP2680198B2 (en) * 1991-02-08 1997-11-19 三菱電機株式会社 Audio digital 1-link connection system
US5218569A (en) * 1991-02-08 1993-06-08 Banks Gerald J Electrically alterable non-volatile memory with n-bits per memory cell
FR2672709B1 (en) * 1991-02-11 1994-09-30 Intel Corp ORDER STATUS MACHINE.
JP3408552B2 (en) * 1991-02-11 2003-05-19 インテル・コーポレーション Circuit and method for programming and erasing nonvolatile semiconductor memory
US5287305A (en) * 1991-06-28 1994-02-15 Sharp Kabushiki Kaisha Memory device including two-valued/n-valued conversion unit
US5245572A (en) * 1991-07-30 1993-09-14 Intel Corporation Floating gate nonvolatile memory with reading while writing capability
JPH0574181A (en) * 1991-09-10 1993-03-26 Nec Corp Data readout circuit of semiconductor memory device
US5237535A (en) * 1991-10-09 1993-08-17 Intel Corporation Method of repairing overerased cells in a flash memory
US5388064A (en) * 1991-11-26 1995-02-07 Information Storage Devices, Inc. Programmable non-volatile analog voltage source devices and methods
US5289412A (en) * 1992-06-19 1994-02-22 Intel Corporation High-speed bias-stabilized current-mirror referencing circuit for non-volatile memories
US5375097A (en) * 1993-06-29 1994-12-20 Reddy; Chitranjan N. Segmented bus architecture for improving speed in integrated circuit memories
US5537350A (en) * 1993-09-10 1996-07-16 Intel Corporation Method and apparatus for sequential programming of the bits in a word of a flash EEPROM memory array
US5440505A (en) * 1994-01-21 1995-08-08 Intel Corporation Method and circuitry for storing discrete amounts of charge in a single memory element
US5497354A (en) * 1994-06-02 1996-03-05 Intel Corporation Bit map addressing schemes for flash memory
US5450363A (en) * 1994-06-02 1995-09-12 Intel Corporation Gray coding for a multilevel cell memory system
US5539690A (en) * 1994-06-02 1996-07-23 Intel Corporation Write verify schemes for flash memory with multilevel cells
US5515317A (en) * 1994-06-02 1996-05-07 Intel Corporation Addressing modes for a dynamic single bit per cell to multiple bit per cell memory
US5594691A (en) * 1995-02-15 1997-01-14 Intel Corporation Address transition detection sensing interface for flash memory having multi-bit cells

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5283761A (en) * 1992-07-22 1994-02-01 Mosaid Technologies Incorporated Method of multi-level storage in DRAM

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP0763242A4 *

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5748535A (en) * 1994-10-26 1998-05-05 Macronix International Co., Ltd. Advanced program verify for page mode flash memory
US5754469A (en) * 1996-06-14 1998-05-19 Macronix International Co., Ltd. Page mode floating gate memory device storing multiple bits per cell
US5835414A (en) * 1996-06-14 1998-11-10 Macronix International Co., Ltd. Page mode program, program verify, read and erase verify for floating gate memory device with low current page buffer
US6115285A (en) * 1996-06-14 2000-09-05 Siemens Aktiengesellschaft Device and method for multi-level charge/storage and reading out
EP0940752A1 (en) * 1998-03-05 1999-09-08 Nec Corporation Method for error correction in a multilevel semiconductor memory
US6289481B1 (en) 1998-03-05 2001-09-11 Nec Corporation Multi-value type semiconductor memory device and its defect removal method
US5999451A (en) * 1998-07-13 1999-12-07 Macronix International Co., Ltd. Byte-wide write scheme for a page flash device
EP1291881A2 (en) * 2001-09-06 2003-03-12 Sharp Kabushiki Kaisha Output sense amplifier for a multibit memory cell
EP1291881A3 (en) * 2001-09-06 2005-03-30 Sharp Kabushiki Kaisha Output sense amplifier for a multibit memory cell
WO2003100786A2 (en) * 2002-05-17 2003-12-04 Intel Corporation Serially sensing the output of multilevel cell arrays
WO2003100786A3 (en) * 2002-05-17 2004-02-26 Intel Corp Serially sensing the output of multilevel cell arrays
CN100538893C (en) * 2002-05-17 2009-09-09 英特尔公司 The output of series read-out multi-level unit array

Also Published As

Publication number Publication date
EP0763242B1 (en) 2001-07-11
CN1147866C (en) 2004-04-28
US5828616A (en) 1998-10-27
AU2593595A (en) 1996-01-04
KR100287979B1 (en) 2001-05-02
CN1150494A (en) 1997-05-21
US5748546A (en) 1998-05-05
RU2190260C2 (en) 2002-09-27
EP0763242A1 (en) 1997-03-19
EP0763242A4 (en) 1998-08-12
DE69521705D1 (en) 2001-08-16
HK1011453A1 (en) 1999-07-09

Similar Documents

Publication Publication Date Title
EP0763242B1 (en) Sensing schemes for flash memory with multilevel cells
EP0763240B1 (en) Bit map addressing schemes for flash memory
US5594691A (en) Address transition detection sensing interface for flash memory having multi-bit cells
US5485422A (en) Drain bias multiplexing for multiple bit flash cell
US5539690A (en) Write verify schemes for flash memory with multilevel cells
US6097637A (en) Dynamic single bit per cell to multiple bit per cell memory
EP1023731B1 (en) Sense amplifier for flash memories
US6847550B2 (en) Nonvolatile semiconductor memory having three-level memory cells and program and read mapping circuits therefor
US7002869B2 (en) Voltage regulator circuit
US11875859B2 (en) Memory devices for comparing input data to data stored in memory cells coupled to a data line
EP1014382B1 (en) Floating gate content addressable memory
US6028813A (en) NOR type semiconductor memory device and a method for reading data stored therein
JP2697665B2 (en) Semiconductor storage device and method of reading data from semiconductor storage device
JPH10199269A (en) Apparatus and method for sensing data of multi bit memory cell
JP2000228092A (en) Semiconductor integrated circuit device
US6452853B2 (en) Nonvolatile semiconductor memory
US6404679B1 (en) Multiple level floating-gate memory
US20230245699A1 (en) Sense amplifier architecture for a non-volatile memory storing coded information
KR101261052B1 (en) Multi level cell memory device and data store method of the memory device
KR100564070B1 (en) sense amplifier circuit

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 95193398.1

Country of ref document: CN

AK Designated states

Kind code of ref document: A1

Designated state(s): AM AT AT AU BB BG BR BY CA CH CN CZ CZ DE DE DK DK EE ES FI FI GB GE HU IS JP KE KG KP KR KZ LK LR LT LU LV MD MG MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SK TJ TM TT UA UG UZ VN

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): KE MW SD SZ UG AT BE CH DE DK ES FR GB GR IE IT LU MC NL PT SE BF BJ CF CG CI CM GA GN ML MR NE SN TD TG

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 1995920503

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 1019960706632

Country of ref document: KR

WWP Wipo information: published in national office

Ref document number: 1995920503

Country of ref document: EP

REG Reference to national code

Ref country code: DE

Ref legal event code: 8642

NENP Non-entry into the national phase

Ref country code: CA

WWG Wipo information: grant in national office

Ref document number: 1995920503

Country of ref document: EP