WO1996018589A1 - Substrate of a ceramic material - Google Patents
Substrate of a ceramic material Download PDFInfo
- Publication number
- WO1996018589A1 WO1996018589A1 PCT/IB1995/000963 IB9500963W WO9618589A1 WO 1996018589 A1 WO1996018589 A1 WO 1996018589A1 IB 9500963 W IB9500963 W IB 9500963W WO 9618589 A1 WO9618589 A1 WO 9618589A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ceramic material
- substrate
- substrates
- composition
- ceramic
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 49
- 229910010293 ceramic material Inorganic materials 0.000 title claims abstract description 40
- 239000000463 material Substances 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims abstract description 14
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 claims abstract description 9
- 239000000203 mixture Substances 0.000 claims description 28
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 21
- 239000000843 powder Substances 0.000 claims description 14
- 238000005245 sintering Methods 0.000 claims description 8
- 238000010304 firing Methods 0.000 claims description 7
- 229910052593 corundum Inorganic materials 0.000 claims 1
- 229910001845 yogo sapphire Inorganic materials 0.000 claims 1
- 238000005516 engineering process Methods 0.000 abstract description 6
- 239000004065 semiconductor Substances 0.000 abstract description 6
- 238000000465 moulding Methods 0.000 abstract description 4
- 239000000919 ceramic Substances 0.000 description 6
- 229910017083 AlN Inorganic materials 0.000 description 4
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 4
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 4
- 239000000395 magnesium oxide Substances 0.000 description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000004411 aluminium Substances 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 238000007731 hot pressing Methods 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- -1 MgSiNj Chemical class 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- 101100313763 Arabidopsis thaliana TIM22-2 gene Proteins 0.000 description 1
- 229910017488 Cu K Inorganic materials 0.000 description 1
- 229910017541 Cu-K Inorganic materials 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910000836 magnesium aluminium oxide Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- ZBZHVBPVQIHFJN-UHFFFAOYSA-N trimethylalumane Chemical compound C[Al](C)C.C[Al](C)C ZBZHVBPVQIHFJN-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/10—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
- C04B35/111—Fine ceramics
- C04B35/117—Composites
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
- C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
- C04B35/581—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on aluminium nitride
Definitions
- the invention relates to a substrate made from a ceramic material.
- the invention also relates to a ceramic material and to methods of manufacturing .such a ceramic material.
- Substrates made from a ceramic material are known per se. They are generally composed of a thin sheet of sintered ceramic material, such as the binary compounds aluminium oxide (Al 2 O 3 ), magnesium oxide (MgO), beryllium oxide (BeO), aluminium nitride (A1 ) or silicon carbide (SiC). Substrates made from ternary compounds, such as MgSiNj, .are also known. Because of their .satisfactory electrically insulating properties, said known substrates are used in passive and active electrical components, such as resistors, capacitors, transformers and power transistors. In these applications, they serve as supports of current-conducting structures. In Patent Application US 5.411.924, filed by Applicant, the advantages and disadvantages of a number of substrates are briefly stated.
- Si-semiconductor technology An important field of application of ceramic substrates is formed by the Si-semiconductor technology.
- Substrates suitable for said technology must have a high electrical resistance R (ohm), a satisfactory strength ⁇ (MPa) and a high thermal conductance k (W/m.K).
- the coefficient of expansion a (1/K) of the substrates should be substantially equal to that of Si. Said last-mentioned measure ensures that Si structures provided on the substrate do not crack and/or become detached under the influence of variations in temperature.
- the coefficient of expansion of silicon is approximately 4.8.10* K 1 .
- silicon carbide has a relatively high dielectric constant.
- this material is less suitable for use as a substrate in electronic components.
- Ceramic bodies of beryllium oxide have the important disadvantage that they comprise toxic beryllium.
- Substrates of aluminium nitride exhibit a favourable, high thermal conductance (approximately 150 W/m.K) and a coefficient of expansion (4.8.10* K" 1 ) which is substantially identical to that of Si.
- this material is difficult to manufacture and hence relatively expensive.
- the invention more particularly aims at providing a ceramic substrate which has a relatively high thermal conductance, a coefficient of expansion substantially equal to that of Si and which can be manufactured relatively easily and hence at low cost.
- a substrate of a ceramic material which is characterized in accordance with the invention in that the material comprises 44-47 at. % Al, 31-39 at. % O, 8-13 at. % C and 8-12 at. % N.
- a ceramic substrate whose composition is in accordance with the invention has substantially ideal properties for use in the Si- semiconductor technology.
- the coefficient of expansion of the inventive substrate material is equal to that of Si, namely 4.8.10* K "1 .
- the theorectical thermal conductance at 300 K is approximately 120 W/m.K.
- the strength of the material is 295 MPa.
- compositions outside said range generally comprise considerable quantities of other phases, such as aluminium oxide, aluminium oxynitride and or aluminium oxycarbide.
- the presence of such foreign phases causes unfavourable properties, such as a substantial reduction of the thermal conductance.
- a small part (up to 10 at. %) of Al can be replaced by B without this leading to a drastic change of the structure and properties of the inventive substrate.
- the composition of the main component of the inventive substrate preferably corresponds to the formula AljgOjjC-jN ⁇ .
- the above-mentioned properties regarding thermal conductance, coefficient of expansion and strength are found to be optimal 3 in substrates of this material composition. It is noted that the error in the element analysis of said composition is approximately 1 at. % per element. It is further noted that the composition formula is based on the crystal structure of the inventive material.
- the overall composition may differ slightly from the composition based on the crystal structure. This may be caused by the fact that the glass phase of the ceramic material differs from the crystalline phase. The glass phase is situated between the crystalline grains.
- the expression "main component" is to be understood to mean herein the crystalline phase of the material.
- the invention also relates to a ceramic material.
- this material is characterized in that it comprises 44-47 at % Al, 31-39 at. % O, 8- 13 at % C and 8-12 at % N.
- the composition of the main component of the material corresponds to the formula AlaOjiC f N ⁇ .
- the ceramic material in accordance with the invention may be in the form of a moulding or a powder.
- the invention also relates to a method of manufacturing a ceramic material.
- a first embodiment is characterized in that the method comprises the following steps a) pre-firing a mixture of Al 2 O 3 , AI 4 C, and A1N in a ratio based on the intended composition of the ceramic material, b) grinding the pre-fired product thus formed into a powder, c) sintering the powder to form a ceramic material.
- a substantially monophase material is obtained which comprises 44-47 at. % Al, 31-39 at.% O, 8-13 at.% C and 8-12 at. % N.
- Pre- firing preferably takes place in the temperature range between 1500 and 1700°C
- sintering preferably takes place in the temperature range between 1700 and 1900°C.
- a second embodiment of the inventive method is characterized in that a mixture of Al 2 O 3 , A1 4 C 3 and A1N, in a ratio based on the intended composition of the ceramic material, is sintered under pressure to form said ceramic material.
- This method is commonly referred to as reactive sintering.
- pre-firing and grinding of the pre-fired product formed are dispensed with.
- Fig. 1 shows a substrate of a ceramic material in accordance with the invention
- Fig. 2 shows an X-ray diffraction pattern of the ceramic material in accordance with the invention.
- reference numeral (1) refers to a flat substrate of a ceramic material.
- the dimensions of this substrate are 40 x 60 x 4 mm 3 .
- the composition of the main component of this ceramic material corresponds to the formula Al ⁇ O ⁇ ON ⁇
- the substrate was manufactured as described hereinbelow.
- the starting materials used were powders of Al 2 O-) (CR-56, Baikowski), A- (WI, Cerac) and A1N (Tokuyoma Soda, F-Grade). These starting materials were used to prepare a mixture comprising 57.2 wt.% aluminium oxide, 23.1 wt.% aluminium carbide and 19.7 wt.% aluminium nitride. This powder mixture was compressed into pellets under a pressure of 5 MPa, said pellets were subsequently pre-fired at a temperature ranging between 1600 and 1650°C. The heating and cooling rates were 10°C per minute. After pre-firing of the pellets, they were ground into a powder having an average grain size of approximately 2 micrometers. Said powder was of a white colour.
- the powdered ceramic material having this optimum chemical composition was used to manufacture substrates by means of hot pressing. In this process, approximately 10 g of the powder was pressed by means of a hot-pressing apparatus (HP20, supplier Thermal Technology Ind) to form a flat substrate. The hot-pressed powder was sintered at a pressure of 75 MPa for 3 hours at 1800°C. The heating and cooling rates were 10°C per minute. After the hot-pressing operation, the substrate was subjected to a number of measurements. The density of the substrate was 97%. The heat conductance of this substrate was found to be above 20 W/m.K.
- the ceramic materials in accordance with exemplary embodiments 1 and 7 are not in accordance with the invention.
- the ceramic materials in accordance with exemplary embodiments 2-6 are in accordance with the invention.
- the Table clearly shows that a monophase material is obtained if the ceramic material in accordance with the invention comprises 44-47 at. % Al, 31-39 at. % O, 8-13 at % C and 8-12 at. % N.
- the invention relates to a substrate made from a novel type of ceramic material. Said material comprises 44-47 at. % Al, 31-39 at. % O, 8-13 at. % C and 8-12 at. % N.
- substrates made from this material exhibit a relatively high thermal conductance, a relatively great strength and their coefficient of expansion is equal to that of Si. Consequently, the substrates in accordance with the invention are very suitable for use in the Si-semiconductor technology.
- the main component of the ceramic material of the substrates preferably corresponds to the formula Al 2 ,O 2 ⁇ C 6 N ⁇ .
- the invention also provides methods of manufacturing substrates and other mouldings from this material.
Abstract
The invention relates to a substrate made from a novel type of ceramic material. This material comprises 44-47 at. % Al, 31-39 at. % O, 8-13 at. % C and 8-12 at. % N. Substrates made from this material exhibit a relatively high heat conductance, a relatively great strength and their coefficient of expansion is equal to that of Si. Consequently, the substrates in accordance with the invention are very suitable for use in the Si-semiconductor technology. The main component of the ceramic material of the substrates preferably corresponds to the formula Al28O21C6N6. The invention also provides methods of manufacturing substrates and other mouldings from this material.
Description
Substrate of a ceramic material.
The invention relates to a substrate made from a ceramic material. The invention also relates to a ceramic material and to methods of manufacturing .such a ceramic material.
Substrates made from a ceramic material are known per se. They are generally composed of a thin sheet of sintered ceramic material, such as the binary compounds aluminium oxide (Al2O3), magnesium oxide (MgO), beryllium oxide (BeO), aluminium nitride (A1 ) or silicon carbide (SiC). Substrates made from ternary compounds, such as MgSiNj, .are also known. Because of their .satisfactory electrically insulating properties, said known substrates are used in passive and active electrical components, such as resistors, capacitors, transformers and power transistors. In these applications, they serve as supports of current-conducting structures. In Patent Application US 5.411.924, filed by Applicant, the advantages and disadvantages of a number of substrates are briefly stated.
An important field of application of ceramic substrates is formed by the Si-semiconductor technology. Substrates suitable for said technology must have a high electrical resistance R (ohm), a satisfactory strength σ (MPa) and a high thermal conductance k (W/m.K). In addition, the coefficient of expansion a (1/K) of the substrates should be substantially equal to that of Si. Said last-mentioned measure ensures that Si structures provided on the substrate do not crack and/or become detached under the influence of variations in temperature. The coefficient of expansion of silicon is approximately 4.8.10* K 1.
As a result of said requirements, the use of magnesium oxide and aluminium oxide as the substrate material is not optimal because their thermal conductance is too low and their coefficient of expansion is too high. Said disadvantages apply in particular when these substrates are used in large Si-semiconductor structures and/or "power devices". The coefficient of expansion of MgSiN2 (5.8.10* K*1) is much closer to that of Si than that of aluminium oxide and magnesium oxide. However, particularly in the case of relatively large substrate surfaces of MgSiN2, on which complex semiconductor structures are provided, the difference between the coefficients of expansion of Si and MgSiN-j is still too large. Ceramic substrates of silicon carbide are relatively expensive because this material is difficult to
process. In addition, silicon carbide has a relatively high dielectric constant. As a result, this material is less suitable for use as a substrate in electronic components. Ceramic bodies of beryllium oxide have the important disadvantage that they comprise toxic beryllium. Substrates of aluminium nitride exhibit a favourable, high thermal conductance (approximately 150 W/m.K) and a coefficient of expansion (4.8.10* K"1) which is substantially identical to that of Si. However, this material is difficult to manufacture and hence relatively expensive.
It is an object of the invention to provide a substrate of a ceramic material which does not have the above-mentioned disadvantages. The invention more particularly aims at providing a ceramic substrate which has a relatively high thermal conductance, a coefficient of expansion substantially equal to that of Si and which can be manufactured relatively easily and hence at low cost.
These and other objects of the invention are achieved by a substrate of a ceramic material which is characterized in accordance with the invention in that the material comprises 44-47 at. % Al, 31-39 at. % O, 8-13 at. % C and 8-12 at. % N.
It lias been found that a ceramic substrate whose composition is in accordance with the invention has substantially ideal properties for use in the Si- semiconductor technology. For example, the coefficient of expansion of the inventive substrate material is equal to that of Si, namely 4.8.10* K"1. In .addition, the theorectical thermal conductance at 300 K is approximately 120 W/m.K. Further, the strength of the material is 295 MPa. These data show that the material has approximately the same favourable properties as A1N. Substrates in accordance with the invention, however, are much simpler and hence much cheaper to manufacture.
Experiments leading to the invention have shown that substantially monophase material can only be obtained within the above-mentioned composition range. Compositions outside said range generally comprise considerable quantities of other phases, such as aluminium oxide, aluminium oxynitride and or aluminium oxycarbide. The presence of such foreign phases causes unfavourable properties, such as a substantial reduction of the thermal conductance. It is noted that a small part (up to 10 at. %) of Al can be replaced by B without this leading to a drastic change of the structure and properties of the inventive substrate.
The composition of the main component of the inventive substrate preferably corresponds to the formula AljgOjjC-jNβ. The above-mentioned properties regarding thermal conductance, coefficient of expansion and strength are found to be optimal
3 in substrates of this material composition. It is noted that the error in the element analysis of said composition is approximately 1 at. % per element. It is further noted that the composition formula is based on the crystal structure of the inventive material. The overall composition may differ slightly from the composition based on the crystal structure. This may be caused by the fact that the glass phase of the ceramic material differs from the crystalline phase. The glass phase is situated between the crystalline grains. The expression "main component" is to be understood to mean herein the crystalline phase of the material. The invention also relates to a ceramic material. In accordance with the invention, this material is characterized in that it comprises 44-47 at % Al, 31-39 at. % O, 8- 13 at % C and 8-12 at % N. Preferably, the composition of the main component of the material corresponds to the formula AlaOjiCfNβ. The ceramic material in accordance with the invention may be in the form of a moulding or a powder.
The invention also relates to a method of manufacturing a ceramic material. A first embodiment is characterized in that the method comprises the following steps a) pre-firing a mixture of Al2O3, AI4C, and A1N in a ratio based on the intended composition of the ceramic material, b) grinding the pre-fired product thus formed into a powder, c) sintering the powder to form a ceramic material. By means of the inventive method, a substantially monophase material is obtained which comprises 44-47 at. % Al, 31-39 at.% O, 8-13 at.% C and 8-12 at. % N. Pre- firing preferably takes place in the temperature range between 1500 and 1700°C, and sintering preferably takes place in the temperature range between 1700 and 1900°C. Under these conditions, the quantity of foreign-phase material is less than 20 wt.%. A second embodiment of the inventive method is characterized in that a mixture of Al2O3, A14C3 and A1N, in a ratio based on the intended composition of the ceramic material, is sintered under pressure to form said ceramic material. This method is commonly referred to as reactive sintering. In this method, pre-firing and grinding of the pre-fired product formed are dispensed with. These and other .aspects of the invention will be apparent from and elucidated with reference to the embodiments described hereinafter. In the drawings:
Fig. 1 shows a substrate of a ceramic material in accordance with the invention,
Fig. 2 shows an X-ray diffraction pattern of the ceramic material in accordance with the invention.
In Fig. 1, reference numeral (1) refers to a flat substrate of a ceramic material. The dimensions of this substrate are 40 x 60 x 4 mm3. The composition of the main component of this ceramic material corresponds to the formula Al^O^ON^ The substrate was manufactured as described hereinbelow.
The starting materials used were powders of Al2O-) (CR-56, Baikowski), A- (WI, Cerac) and A1N (Tokuyoma Soda, F-Grade). These starting materials were used to prepare a mixture comprising 57.2 wt.% aluminium oxide, 23.1 wt.% aluminium carbide and 19.7 wt.% aluminium nitride. This powder mixture was compressed into pellets under a pressure of 5 MPa, said pellets were subsequently pre-fired at a temperature ranging between 1600 and 1650°C. The heating and cooling rates were 10°C per minute. After pre-firing of the pellets, they were ground into a powder having an average grain size of approximately 2 micrometers. Said powder was of a white colour. An X-ray diffraction pattern was recorded of the powder thus manufactured, as shown in Fig. 2. In said figure, the intensity (random unit) of the radiation measured is plotted as a function of 2 θ (°). The pattern was recorded by means of a Philips PW1800 diffractometer, while using monochromatic Cu-K radiation. All the lines of the pattern can be assigned to a rhombohedral structure (R-3m, #166, wherein a = 5.459 A and c « 14.952 A). This diamond-like structure explains why the material in accordance with the invention has a relatively high heat conductance. It could be derived from this diffraction pattern that the quantity of foreign-phase material is less man 5 wt. %. Element analysis showed that the composition of the ceramic material manufactured corresponded to the formula
The error in the element analysis is maximally 1 at.%. The powdered ceramic material having this optimum chemical composition was used to manufacture substrates by means of hot pressing. In this process, approximately 10 g of the powder was pressed by means of a hot-pressing apparatus (HP20, supplier Thermal Technology Ind) to form a flat substrate. The hot-pressed powder was sintered at a pressure of 75 MPa for 3 hours at 1800°C. The heating and cooling rates were 10°C per minute. After the hot-pressing operation, the substrate was subjected to a number of measurements. The density of the substrate was 97%. The heat conductance of this substrate was found to be above 20 W/m.K. Calculations revealed that the theoretical heat conductance is approximately 141 W/m.K. This can be achieved by optimizing the sintering process. The average coefficient of expansion of the substrate thus manufactured was 4.8 10*
K M The .strength of the material was 295 MPa.
In further experiments, a mixture of the above-mentioned aluminium oxide, aluminium oxycarbide and aluminium nitride were mixed and, immediately afterwards, subjected to a sintering treatment at an increased pressure for 3 hours at 1880-1900°C. The density of the material obtained ranges between 2.97 and 3.01 g/cm3. A favourable aspect of this so-called "reactive hot sintering method" is that the time-consuming pre-firing .step as well as the grinding step can be dispensed with. In this manner, substrates or other mouldings can be manufactured rapidly and at low cost
In still further experiments, a number of ceramic powders were manufactured, in which the quantity of the various elements of the ceramic material was varied around the above-mentioned optimum composition. .Also of these powders an X-ray diffraction pattern was recorded under the same conditions as described hereinabove. The quantity of different-phase material was estimated by means of the surface area of non- assignable peaks. The chemical composition and the corresponding quantity of monophase material (pure phase) are listed in the Table
The ceramic materials in accordance with exemplary embodiments 1 and 7 are not in accordance with the invention. The ceramic materials in accordance with exemplary embodiments 2-6 are in accordance with the invention. The Table clearly shows that a monophase material is obtained if the ceramic material in accordance with the invention comprises 44-47 at. % Al, 31-39 at. % O, 8-13 at % C and 8-12 at. % N.
In summary, the invention relates to a substrate made from a novel type of ceramic material. Said material comprises 44-47 at. % Al, 31-39 at. % O, 8-13 at. % C and 8-12 at. % N. Substrates made from this material exhibit a relatively high thermal conductance, a relatively great strength and their coefficient of expansion is equal to that of Si. Consequently, the substrates in accordance with the invention are very suitable for use in the Si-semiconductor technology. The main component of the ceramic material of the substrates preferably corresponds to the formula Al2,O2ιC6N<. The invention also provides methods of manufacturing substrates and other mouldings from this material.
Claims
1. A substrate of a ceramic material, characterized in that said material comprises 44-47 at. % Al, 31-39 at. % O, 8-13 at. % C and 8-12 at.% N.
2. A substrate as claimed in Claim 1, characterized in that the composition of the main component of the material corresponds to the formula 
3. A ceramic material, characterized in that said material comprises 44-47 at. % .Al, 31-39 at. % O, 8-13 at. % C and 8-12 at.% N.
4. A ceramic material as claimed in Claim 3, characterized in that the composition of the main component of the material corresponds to the formula 
5. A method of manufacturing a ceramic material as claimed in Claim 3 or 4, characterized in that the method comprises the following steps a) pre-firing a mixture of Al2O3, AI4C3 and A1N in a ratio based on the intended composition of the ceramic material, b) grinding the pre-fired product into a powder, c) sintering the powder to form a ceramic material.
6. A method as claimed in Claim 5, characterized in that pre-firing takes place in the temperature range between 1500 and 1700°C and in that sintering takes place in the temperature range between 1700 and 1900°C.
7. A method of manufacturing a ceramic material as claimed in Claim 3 or
4, characterized in that a mixture of Al.O3, AI4C3 and Aln, in a ratio based on the intended composition of the ceramic material, is sintered under pressure to form said ceramic material.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE69503472T DE69503472T2 (en) | 1994-12-12 | 1995-11-06 | SUBSTRATE FROM A CERAMIC MATERIAL |
| JP8518508A JPH09509394A (en) | 1994-12-12 | 1995-11-06 | Ceramic material substrate |
| EP95934785A EP0743929B1 (en) | 1994-12-12 | 1995-11-06 | Substrate of a ceramic material |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP94203601 | 1994-12-12 | ||
| EP94203601.3 | 1994-12-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1996018589A1 true WO1996018589A1 (en) | 1996-06-20 |
Family
ID=8217447
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/IB1995/000963 WO1996018589A1 (en) | 1994-12-12 | 1995-11-06 | Substrate of a ceramic material |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US5571757A (en) |
| EP (1) | EP0743929B1 (en) |
| JP (1) | JPH09509394A (en) |
| KR (1) | KR100404815B1 (en) |
| DE (1) | DE69503472T2 (en) |
| TW (1) | TW314506B (en) |
| WO (1) | WO1996018589A1 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69610673T2 (en) * | 1995-08-03 | 2001-05-10 | Ngk Insulators Ltd | Sintered aluminum nitride bodies and their manufacturing process |
| US6495912B1 (en) * | 2001-09-17 | 2002-12-17 | Megic Corporation | Structure of ceramic package with integrated passive devices |
| US7374738B2 (en) * | 2001-10-11 | 2008-05-20 | Arizona Board Of Regents, Acting For And On Behalf Of, Arizona State University | Superhard dielectric compounds and methods of preparation |
| US7396779B2 (en) * | 2003-09-24 | 2008-07-08 | Micron Technology, Inc. | Electronic apparatus, silicon-on-insulator integrated circuits, and fabrication methods |
| JP2007508688A (en) | 2003-10-10 | 2007-04-05 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Electronic device and carrier substrate therefor |
| CN109053161B (en) * | 2018-08-31 | 2021-05-18 | 武汉科技大学 | Directly foamed Al2O3-AlN porous composite material and preparation method thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0490480A1 (en) * | 1990-12-10 | 1992-06-17 | Ford Motor Company Limited | Preparation of aluminum oxynitride from organosiloxydihaloalanes |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE417818B (en) * | 1979-09-03 | 1981-04-13 | Sandvik Ab | CERAMIC ALLOY EXTREMELY COMPREHENSIVE ALUMINUM OXIDE AND NITRIDES AND / OR CARBON NITRIDES OF ONE OR MULTIPLE METALS OF GROUP IV B, V B AND WE B OF THE PERIODIC SYSTEM AND ONE OR MORE ... |
| FR2628414B1 (en) * | 1988-03-11 | 1992-01-17 | Pechiney Electrometallurgie | POLYPHASE ALUMINUM, OXYCARBON AND ALUMINUM OXYNITRIDE POLISHED MATERIAL |
| DE69407832T2 (en) * | 1993-02-18 | 1998-07-16 | Koninkl Philips Electronics Nv | Ceramic body |
-
1995
- 1995-11-06 KR KR1019960704373A patent/KR100404815B1/en not_active IP Right Cessation
- 1995-11-06 EP EP95934785A patent/EP0743929B1/en not_active Expired - Lifetime
- 1995-11-06 JP JP8518508A patent/JPH09509394A/en active Pending
- 1995-11-06 WO PCT/IB1995/000963 patent/WO1996018589A1/en active IP Right Grant
- 1995-11-06 DE DE69503472T patent/DE69503472T2/en not_active Expired - Fee Related
- 1995-11-30 TW TW084112786A patent/TW314506B/zh active
- 1995-12-07 US US08/568,774 patent/US5571757A/en not_active Expired - Lifetime
-
1996
- 1996-07-17 US US08/682,216 patent/US5635429A/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0490480A1 (en) * | 1990-12-10 | 1992-06-17 | Ford Motor Company Limited | Preparation of aluminum oxynitride from organosiloxydihaloalanes |
Also Published As
| Publication number | Publication date |
|---|---|
| TW314506B (en) | 1997-09-01 |
| US5635429A (en) | 1997-06-03 |
| KR970701158A (en) | 1997-03-17 |
| KR100404815B1 (en) | 2004-02-05 |
| DE69503472D1 (en) | 1998-08-20 |
| EP0743929B1 (en) | 1998-07-15 |
| EP0743929A1 (en) | 1996-11-27 |
| JPH09509394A (en) | 1997-09-22 |
| DE69503472T2 (en) | 1999-03-04 |
| US5571757A (en) | 1996-11-05 |
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