WO1996019911A3 - Process for preparing an insulated multilayer structure - Google Patents

Process for preparing an insulated multilayer structure Download PDF

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Publication number
WO1996019911A3
WO1996019911A3 PCT/US1995/016366 US9516366W WO9619911A3 WO 1996019911 A3 WO1996019911 A3 WO 1996019911A3 US 9516366 W US9516366 W US 9516366W WO 9619911 A3 WO9619911 A3 WO 9619911A3
Authority
WO
WIPO (PCT)
Prior art keywords
preparing
peak temperature
multilayer structure
contacted
oxygen
Prior art date
Application number
PCT/US1995/016366
Other languages
French (fr)
Other versions
WO1996019911A2 (en
Inventor
Kalman F Zsamboky
Leon M Balents
Original Assignee
Ceramic Packaging Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ceramic Packaging Inc filed Critical Ceramic Packaging Inc
Priority to EP95944334A priority Critical patent/EP0871565A4/en
Priority to AU46407/96A priority patent/AU4640796A/en
Priority to JP51990996A priority patent/JPH10510954A/en
Publication of WO1996019911A2 publication Critical patent/WO1996019911A2/en
Publication of WO1996019911A3 publication Critical patent/WO1996019911A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/0072—Heat treatment
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
    • C04B41/81—Coating or impregnation
    • C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00—Details of transformers or inductances, in general
    • H01F27/28—Coils; Windings; Conductive connections
    • H01F27/2804—Printed windings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814—Conductive parts
    • H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
    • H01L21/4867—Applying pastes or inks, e.g. screen printing
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N1/00—Electrostatic generators or motors using a solid moving electrostatic charge carrier
    • H02N1/002—Electrostatic motors
    • H02N1/004—Electrostatic motors in which a body is moved along a path due to interaction with an electric field travelling along the path
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805—Shape
    • H01L2224/4809—Loop shape
    • H01L2224/48091—Arched
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481—Disposition
    • H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42—Wire connectors; Manufacturing methods related thereto
    • H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481—Disposition
    • H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732—Location after the connecting process
    • H01L2224/73251—Location after the connecting process on different surfaces
    • H01L2224/73265—Layer and wire connectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181—Encapsulation
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K3/00—Details of windings
    • H02K3/04—Windings characterised by the conductor shape, form or construction, e.g. with bar conductors
    • H02K3/26—Windings characterised by the conductor shape, form or construction, e.g. with bar conductors consisting of printed conductors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal

Abstract

A process for preparing an insulated metallized substrate, wherein a specified metallized substrate is heated from ambient temperature to a peak temperature of at least about 800 degrees centigrade while contacting the substrate with an inert atmosphere containing less than 10 parts per million of oxygen, maintained at such peak temperature for a specified period of time while being contacted with said inert gas, and thereafter heated at a peak temperature of at least about 800 degrees centigrade while being contacted with a gas containing at least 100 parts per million of oxygen.
PCT/US1995/016366 1994-12-16 1995-12-14 Process for preparing an insulated multilayer structure WO1996019911A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP95944334A EP0871565A4 (en) 1994-12-16 1995-12-14 Process for preparing an insulated multilayer structure
AU46407/96A AU4640796A (en) 1994-12-16 1995-12-14 Process for preparing an insulated multilayer structure
JP51990996A JPH10510954A (en) 1994-12-16 1995-12-14 Method for preparing an insulated multilayer structure

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/358,203 US5716713A (en) 1994-12-16 1994-12-16 Stacked planar transformer
US08/358,203 1994-12-16

Publications (2)

Publication Number Publication Date
WO1996019911A2 WO1996019911A2 (en) 1996-06-27
WO1996019911A3 true WO1996019911A3 (en) 1996-08-29

Family

ID=23408689

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1995/016366 WO1996019911A2 (en) 1994-12-16 1995-12-14 Process for preparing an insulated multilayer structure

Country Status (6)

Country Link
US (1) US5716713A (en)
EP (1) EP0871565A4 (en)
JP (1) JPH10510954A (en)
AU (1) AU4640796A (en)
CA (1) CA2207305A1 (en)
WO (1) WO1996019911A2 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6911887B1 (en) * 1994-09-12 2005-06-28 Matsushita Electric Industrial Co., Ltd. Inductor and method for producing the same
US6033764A (en) * 1994-12-16 2000-03-07 Zecal Corp. Bumped substrate assembly
US6099974A (en) * 1997-07-16 2000-08-08 Thermal Spray Technologies, Inc. Coating that enables soldering to non-solderable surfaces
US6164522A (en) * 1998-06-29 2000-12-26 Delphi Technologies, Inc. Method of manufacturing a thick film circuit with constrained adhesive spreading
US6054914A (en) * 1998-07-06 2000-04-25 Midcom, Inc. Multi-layer transformer having electrical connection in a magnetic core
US6198374B1 (en) 1999-04-01 2001-03-06 Midcom, Inc. Multi-layer transformer apparatus and method
US7152291B2 (en) 2002-04-15 2006-12-26 Avx Corporation Method for forming plated terminations
US7167074B2 (en) * 2005-01-12 2007-01-23 Medtronic, Inc. Integrated planar flyback transformer
US8159825B1 (en) 2006-08-25 2012-04-17 Hypres Inc. Method for fabrication of electrical contacts to superconducting circuits
US8093983B2 (en) * 2006-08-28 2012-01-10 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Narrowbody coil isolator
US8385043B2 (en) * 2006-08-28 2013-02-26 Avago Technologies ECBU IP (Singapoare) Pte. Ltd. Galvanic isolator
US7948067B2 (en) * 2009-06-30 2011-05-24 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Coil transducer isolator packages
US20080278275A1 (en) * 2007-05-10 2008-11-13 Fouquet Julie E Miniature Transformers Adapted for use in Galvanic Isolators and the Like
US7791900B2 (en) * 2006-08-28 2010-09-07 Avago Technologies General Ip (Singapore) Pte. Ltd. Galvanic isolator
US8427844B2 (en) * 2006-08-28 2013-04-23 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Widebody coil isolators
US7852186B2 (en) * 2006-08-28 2010-12-14 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Coil transducer with reduced arcing and improved high voltage breakdown performance characteristics
US8061017B2 (en) * 2006-08-28 2011-11-22 Avago Technologies Ecbu Ip (Singapore) Pte. Ltd. Methods of making coil transducers
US9019057B2 (en) * 2006-08-28 2015-04-28 Avago Technologies General Ip (Singapore) Pte. Ltd. Galvanic isolators and coil transducers
US9105391B2 (en) * 2006-08-28 2015-08-11 Avago Technologies General Ip (Singapore) Pte. Ltd. High voltage hold-off coil transducer
JP4900019B2 (en) * 2007-04-19 2012-03-21 富士電機株式会社 Insulation transformer and power converter
US8069559B2 (en) * 2007-08-24 2011-12-06 World Properties, Inc. Method of assembling an insulated metal substrate
US8258911B2 (en) 2008-03-31 2012-09-04 Avago Technologies ECBU IP (Singapor) Pte. Ltd. Compact power transformer components, devices, systems and methods
JP5798034B2 (en) * 2008-09-21 2015-10-21 ウェイン・ステイト・ユニバーシティ Genus-WideChlamydial Peptide Vaccine Antigen
KR101673727B1 (en) * 2010-03-05 2016-11-07 가부시키가이샤 무라타 세이사쿠쇼 Ceramic electronic component and method for producing ceramic electronic component
EP2936513B1 (en) * 2012-12-19 2017-02-15 Telefonaktiebolaget LM Ericsson (publ) Planar transformer

Citations (2)

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US5058799A (en) * 1986-07-24 1991-10-22 Zsamboky Kalman F Metallized ceramic substrate and method therefor
US5100714A (en) * 1986-07-24 1992-03-31 Ceramic Packaging, Inc. Metallized ceramic substrate and method therefor

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US5058799A (en) * 1986-07-24 1991-10-22 Zsamboky Kalman F Metallized ceramic substrate and method therefor
US5100714A (en) * 1986-07-24 1992-03-31 Ceramic Packaging, Inc. Metallized ceramic substrate and method therefor

Also Published As

Publication number Publication date
US5716713A (en) 1998-02-10
EP0871565A4 (en) 1999-06-02
CA2207305A1 (en) 1996-06-27
JPH10510954A (en) 1998-10-20
WO1996019911A2 (en) 1996-06-27
AU4640796A (en) 1996-07-10
EP0871565A2 (en) 1998-10-21

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